JPH1036958A - Metal vapor deposited nylon film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a metal vapor deposited nylon film excellent in adhesion for metal vapor deposition and usable in hot water without generating whitening after the coating of pressure sensitive adhesives or adhesives and interference film by successively forming a metal vapor deposition layer with nucleus and a metal vapor deposition layer under plasma discharge on an oriented nylon film. SOLUTION: As a preferable example, on the surface of an oriented nylon film having 12 to 25μm thickness, a metal vapor deposition layer of copper having 0.02 to 1.0nm average film thickness is formed under plasma discharge with 1 to 12kW/m strength in which the discharge gas is composed of oxygen, and on the surface, an Al metal vapor deposition layer having 10 to 100nm average film thickness is formed. This metal vapor deposition nylon film is the one in which the grain size of the metal vapor deposition layer is smaller than that free from metal vapor deposition with nucleus, and the falling resistance of the vapor deposition layers is improved.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a metal-deposited nylon film, and more particularly to a metal-deposited nylon film wherein water resistance and hot water resistance are imparted by improving the adhesion of a metal-deposited layer.

[0002]

2. Description of the Related Art Nylon films metal-deposited on nylon films are widely used as packaging materials. However, the adhesion between the nylon film and the metal-deposited layer was insufficient only by depositing the metal on the nylon film. As a method for improving the adhesion, there is already known a method in which an anchor coat layer made of a resin is previously provided on a nylon film, and a metal is vapor-deposited thereon. However, the metallized nylon film obtained by this method,
In this case, when the adhesive or the adhesive is coated, there is a disadvantage that the solvent dissolves the resin anchor coat layer to cause whitening, or an interference film is formed due to thermal deterioration due to heating and drying. Further, there is a disadvantage in that the resin anchor coat layer is deteriorated by the hot water and the adhesion of the metal deposition layer cannot be obtained.

Further, as a method of improving the adhesion of the metal deposition layer, a simple nucleation treatment (Japanese Patent Publication No. 52-25868) and a simple plasma treatment (Japanese Patent Publication No. 1-294875).
), But none of these methods has sufficient performance.

[0004]

DISCLOSURE OF THE INVENTION The present invention provides a metal vapor deposition that can be used in hot water without causing whitening and interference film after coating of an adhesive or an adhesive, having excellent adhesion of a metal vapor deposited layer. An object of the present invention is to provide a nylon film.

[0005]

As a result of intensive studies by the present inventors, the above object of the present invention has been industrially advantageously achieved by the following present invention.

[1] A metal-deposited nylon film formed by forming a metal-deposited layer with a nucleus by plasma discharge on a surface of a stretched nylon film and a metal-deposited layer thereon.

[2] Plasma discharge intensity of 1 to 12 kW
/ M, the metal-deposited nylon film according to the above [1].

[3] The metal-deposited nylon film according to the above [1] or [2], wherein the discharge gas is oxygen.

[4] The above [1] to [1], wherein the metal of the nucleated metal deposition layer under plasma discharge is copper.
[3] The metal-deposited nylon film according to [3].

[5] The metal-deposited nylon film according to the above [1] to [4], wherein the metal of the metal-deposited layer is aluminum.

[6] The average film thickness of the cored metal deposition layer is 0.0
[1] to characterized in that the thickness is 2 to 1.0 nm.
[5] The metal-deposited nylon film according to [5].

[7] The average thickness of the metal deposition layer is 10 to 10
The metal-deposited nylon film according to the above [1] to [6], which has a thickness of 0 nm.

[8] The stretched nylon film has a thickness of 12
[1] to [7], characterized in that the particle diameter is
The metal-deposited nylon film described in the above.

The most important feature of the present invention is that a nucleated metal deposition layer, preferably an average thickness of 0.02 to 1.0 nm, is formed on a stretched nylon film surface by plasma discharge. Preferably an average film thickness of 10
The point is that the adhesion between the metal deposited layer of about 100 nm and the nylon film is improved.

[0015]

Next, the present invention will be described in detail.

In the present invention, the nylon film is not particularly limited.
-Nylon films are preferred. The reason for this is that the object of the present invention is to provide water resistance and hot water resistance, which can cope with this condition, and that it is available at low cost. When used as a packaging material, the thickness of the nylon film of the present invention is preferably in the range of 12 to 25 μm. Further, the nylon film needs to be stretched.

The film to be deposited may have been subjected to a known surface treatment, for example, a corona discharge treatment, a flame treatment, a roughening treatment such as a sand mat treatment and a hair-line treatment, or a printing on the non-deposited surface.

The nucleated metal deposition under the plasma discharge in the present invention is usually carried out as follows.

That is, the current supplied from the high-frequency power supply is discharged between the cathode and the anode of the magnetron electrode in an oxygen gas atmosphere, preferably in an atmosphere of 0.1 to 100 Pa. At this time, copper constituting a metal deposition layer with a nucleus is used as a cathode. Gas cations are attracted to the cathode and sputter the cathode metal. The sputtered metal adheres to the nylon film to form a nucleated metal deposition layer. The processing intensity of the plasma discharge is preferably 1 to 12 kW / m. At this time, when the discharge treatment intensity is less than 1 kW / m, the amount of sputtered metal adhered on the film is less than 0.1 nm, and the surface treatment effect of the plasma discharge treatment on the film is reduced, so that the treatment intensity is 1 kW / m or more. It is preferred that In addition, 12kW /
If it exceeds m, the thickness of the nucleated metal deposition layer on the nylon film exceeds 1 nm, and its metal color can be confirmed, which is not preferable in appearance.

The metal deposited on the cored metal deposition layer is not particularly limited, but includes tin, chromium, copper and aluminum. Among them, aluminum is most preferable from the viewpoint of color tone and vapor deposition suitability. The vapor deposition method is not particularly limited, but a vacuum vapor deposition method, an ion plating method, a sputtering method, an ion beam method and the like are used. The average thickness of this metal deposition layer is usually 10 to 100 nm.
And

[0021]

EXAMPLES Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited thereto.

The physical properties in Examples and Comparative Examples were measured as follows.

(1) Oxygen Permeability According to ASTM D-3985, oxygen permeability was measured at 20 ° C. and 0% RH using an oxygen permeability measuring device (OX-TRAN100 manufactured by Modern Control Co., Ltd.).

(2) Laminate strength A urethane-based two-component adhesive was dry-coated to a thickness of 2 μm on the surface to be vapor-deposited, and an unstretched PP film of 60 μm and a laminate were coated.
And aged at 40 ° C. for 18 hours. After that, it was cut into 15 mm width × 200 mm length, and the tensile speed was set to 200 using an Orientec Tensilon universal testing machine.
mm / min. Was evaluated as the non-chuck strength at 90 ° peeling. (Dry Lamination Strength) Further, 2-3 drops of distilled water were dropped on the peeling interface at the time of peeling at 90 °, and the adhesion strength was evaluated in the same manner. (Wet Laminate Strength) The method of preparing a vapor-deposited film sample is as follows.

(1) Boil treatment A two-part urethane adhesive is coated on the vapor-deposited surface of the vapor-deposited film in an amount equivalent to a thickness of 2 μm for a solid part. Aging.
After aging, the laminate film is cut into 12 cm square. Two unstretched PP films each having a thickness of 60 μm are overlapped so as to face the inside, and three-way sealing is performed. 100 ml of distilled water is put into the bag-shaped portion, and the open portion is sealed so as not to allow air to enter, and the bag is sealed. This sample was allowed to stand in boiling water at 95 ° C. for 30 minutes, and then taken out and cut off the seal portion to obtain a sample for measuring water vapor transmission rate and oxygen transmission rate.

[Example 1] to [Example 4], [Comparative Example 1] to [Comparative Example 6] A plastic film having a thickness of 15 μm and a thickness of 1000 m
Using a biaxially stretched nylon film having a width of m and a roll-to-roll type evaporator under a vacuum of 1 × 10 ^-3 mmHg, the purity of the magnetron electrode was 99.9%. 0.5 l / min. Is supplied in a discharge atmosphere. Further, a voltage was applied to the magnetron electrode, and a nucleated metal deposition layer having the following average thickness was formed on the nylon film in a plasma discharge atmosphere of a discharge current. Then, under vacuum of 1 × 10 ⁻⁴ mmHg, the aluminum deposition layer is
Formed.

Example 1: 0.01 nm Example 2: 0.1 nm Example 3: 1.0 nm Example 4: 2.0 nm On the other hand, Comparative Example 1 shows 4 without forming a cored metal deposition layer.
An aluminum deposited layer of 0 nm was formed. In Comparative Example 2, a similar vapor deposition layer was formed on the corona discharge treated surface. In Comparative Example 3, a nylon film was passed through a plasma discharge atmosphere without forming a nucleated vapor deposition layer, and a 40 nm aluminum vapor deposition layer was subsequently formed. In Comparative Example 4, a nucleated metal vapor-deposited layer of copper was formed to a thickness of 1.0 nm by a resistance heating method, and subsequently a 40 nm-thick aluminum vapor-deposited layer was formed. In Comparative Example 5, a 1.0-nm nucleated metal vapor-deposited layer was formed using nitrogen gas instead of oxygen gas as a discharge gas, and subsequently a 40-nm aluminum vapor-deposited layer was formed. In Comparative Example 6, a 1.0-nm nucleated metal vapor-deposited layer was formed using argon gas instead of oxygen gas as a discharge gas, and subsequently a 40-nm aluminum vapor-deposited layer was formed.

Table 1 summarizes the measurement results of the characteristics of Examples 1 to 4 and Comparative Examples 1 to 6.

[0029]

[Table 1] As is clear from Table 1, the metal vapor-deposited films obtained in Examples 1 to 4 have higher gas barrier properties (untreated, boiled) than those of Comparative Examples 1 to 6 regardless of the treatment. The same result was obtained for the laminate strength (water resistance).

[0030]

According to the present invention, by sequentially forming a specific nucleated metal deposition layer and a metal deposition layer on a plastic film, the grain size of the metal deposition layer is smaller than that without the nucleation deposition layer. The resulting nylon film has an improved removal of the deposited layer. Therefore, the present invention is particularly effective for a vapor-deposited film for food packaging requiring a laminate strength.

Claims (8)

[Claims] 1. A metal-deposited nylon film formed by forming a metal-deposited layer with a nucleus by plasma discharge on a surface of a stretched nylon film and a metal-deposited layer thereon. 2. The metal-deposited nylon film according to claim 1, wherein the intensity of the plasma discharge is 1 to 12 kW / m. 3. The metal-deposited nylon film according to claim 1, wherein the discharge gas is oxygen. 4. The metal-deposited nylon film according to claim 1, wherein the metal of the metal-deposited nucleation layer under plasma discharge is copper. 5. The metal-deposited nylon film according to claim 1, wherein the metal of the metal-deposited layer is aluminum. 6. The cored metal has an average thickness of 0.02 to 1.0 n.
The metal-deposited nylon film according to any one of claims 1 to 5, wherein m is m. 7. The metal deposited layer has an average thickness of 10 to 100 nm.
The metallized nylon film according to any one of claims 1 to 6, wherein 8. The stretched nylon film has a thickness of 12 to 25.
The metal-deposited nylon film according to any one of claims 1 to 7, wherein the thickness is μm.