JPH10328969A - Liquid treatment device - Google Patents

Liquid treatment device

Info

Publication number
JPH10328969A
JPH10328969A JP9135203A JP13520397A JPH10328969A JP H10328969 A JPH10328969 A JP H10328969A JP 9135203 A JP9135203 A JP 9135203A JP 13520397 A JP13520397 A JP 13520397A JP H10328969 A JPH10328969 A JP H10328969A
Authority
JP
Japan
Prior art keywords
liquid
tank
magnet plate
chips
pump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9135203A
Other languages
Japanese (ja)
Other versions
JP3603541B2 (en
Inventor
Kazutaka Abe
和孝 阿部
Yoshiji Uejima
喜司 上島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Motors Corp
Original Assignee
Mitsubishi Motors Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Motors Corp filed Critical Mitsubishi Motors Corp
Priority to JP13520397A priority Critical patent/JP3603541B2/en
Publication of JPH10328969A publication Critical patent/JPH10328969A/en
Application granted granted Critical
Publication of JP3603541B2 publication Critical patent/JP3603541B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Landscapes

  • Auxiliary Devices For Machine Tools (AREA)

Abstract

PROBLEM TO BE SOLVED: To heighten cleanliness and clean liquid from a machine without accumulating foreign matters such as ships and abrasive grains at the bottom part of a tank. SOLUTION: This device A recovers used liquid containing iron group metal chips by being fed to a specified liquid use place (a), into a first tank 4 and feeds the recovered liquid flowing into a second tank 5 via the first tank 4, back to the liquid use place (a). It is provided with a rotating magnet plate 37 rotatory-driven being partially exposed from the liquid level of the first tank 4, a separating device 42 for separating chips attracted to the rotating magnet plate 37 above the liquid level, and a first pump 21 for generating circulating flow S1 circulating liquid at a bottom part in the first tank 4 toward the rotating magnet plate 37.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は各種の機械加工機等
に付設され、被加工物の冷却や洗浄を行った冷却液をク
リーン化して再び被加工物に供給できるようにした液処
理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid processing apparatus which is attached to various types of machining machines and the like, and in which a cooling liquid which has been cooled or washed for a workpiece is cleaned and supplied to the workpiece again. .

【0002】[0002]

【従来の技術】各種の機械加工機を用いての被加工物の
加工時、あるいは、加工用の回転砥石のドレッサ時等に
は各種の切り刃や被加工物が発熱し、しかも、研削によ
る切粉や砥粒等の異物が発生する。そこで、機械加工機
ではその加工部の切り刃や被加工物に冷却液を連続して
供給する研削液循環系が設けられる。この研削液循環系
の要部は液処理装置で構成され、この液処理装置は切り
刃及び被加工物の冷却や切粉の除去を連続して行うこと
ができるよう、切り刃及び被加工物から流下してきた研
削液を回収し、再使用可能な状態に清浄化する手段を備
える。
2. Description of the Related Art Various types of cutting blades and workpieces generate heat when machining workpieces using various types of machining machines or when dressing a rotary grindstone for machining. Foreign matter such as chips and abrasive grains is generated. Therefore, the machining machine is provided with a grinding fluid circulation system for continuously supplying a coolant to a cutting blade of the machining portion or a workpiece. The main part of this grinding fluid circulation system is composed of a liquid processing device. This liquid processing device continuously cools the cutting blade and the work and removes the cutting chips so that the cutting blade and the work can be removed. Means for collecting the grinding fluid flowing down from the tank and cleaning it to a reusable state.

【0003】例えば、研削盤等に用いられる液処理装置
は、図6に示すように、研削盤の加工部a1で異物が混
入した研削液を回収し、これをマグネットセパレーター
110及び研削液タンク120に順次流入させ、これら
異物除去手段により清浄化した研削液をポンプ130で
再度加工部a1に供給するよう構成される。ここでマグ
ネットセパレーター110はマグネットドラム140を
回転させて研削液中から切粉等の異物を吸着し、しかも
この切粉等の異物をマグネットドラムの上方位置に設け
た分離板150で掻き取り排除している。この種のマグ
ネットセパレーター110の分離効率は、通常、概略5
0%程度であり、回収液中の異物は更に研削液タンク1
20で除去される。ここでは複数の堰160で区切られ
た各沈殿槽170に研削液を順次導き、各沈殿槽170
において研削液中の砥粒や鉄粉等の異物を沈殿させ、清
浄化している。
For example, as shown in FIG. 6, a liquid processing apparatus used for a grinding machine or the like collects a grinding fluid mixed with foreign matter in a processing part a1 of the grinding machine, and collects the grinding fluid into a magnet separator 110 and a grinding fluid tank 120. And the grinding fluid cleaned by the foreign matter removing means is supplied again to the processing unit a1 by the pump 130. Here, the magnet separator 110 rotates the magnet drum 140 to adsorb foreign matter such as chips from the grinding fluid, and further removes and removes such foreign matter such as chips by the separation plate 150 provided above the magnet drum. ing. The separation efficiency of this type of magnet separator 110 is generally about 5
It is about 0%.
Removed at 20. Here, the grinding fluid is sequentially guided to each settling tank 170 divided by a plurality of weirs 160, and each settling tank 170
In the above, foreign substances such as abrasive grains and iron powder in the grinding fluid are precipitated and cleaned.

【0004】なお、特開平7−171735号公報に
は、洗浄室で加工物を洗浄した後の液をダーティータン
クに導き、ここからクリーンタンクヘ向かう液供給経路
にフィルタを設けている。しかも、クリーンタンク内の
清浄液をポンプで洗浄室に再度供給すると共に濾過時と
は逆方向に送り込むフィルタ清浄通路を設け、これによ
り、フィルタ交換を不要としている。
In Japanese Patent Application Laid-Open No. 7-171735, a liquid after cleaning a workpiece in a cleaning chamber is guided to a dirty tank, and a filter is provided in a liquid supply path from the dirty tank to the clean tank. In addition, a filter cleaning passage for re-supplying the cleaning liquid in the clean tank to the cleaning chamber by the pump and sending the cleaning liquid in a direction opposite to the direction at the time of filtration is provided, thereby eliminating the need for filter replacement.

【0005】[0005]

【発明が解決しようとする課題】処で、図6に示した液
処理装置の場合、基本的にマグネットセパレーター11
0で分離できなかった回収液中の切粉等は幾つかに区切
られた沈殿槽170を通過することにより沈殿し、これ
により研削液を清浄化していたが、従来の沈殿槽170
を用いた装置では十分な清浄化を図れなかった。しか
も、図6の従来装置では回収された研削液中の砥粒や鉄
粉等の異物が各沈殿槽170の底部に使用時間の経過と
共に順次堆積する。このため定期的に研削液タンク12
0の清掃を行う必要があり、結果として、研削盤等の機
械加工機を停止させ、液処理装置を含む研削液循環系内
の研削液の交換を行うこととなり、経費がかさみ、製品
コストの低下を図る上で問題と成っている。
However, in the case of the liquid processing apparatus shown in FIG.
Chips and the like in the recovered liquid that could not be separated in 0 were settled by passing through several settling tanks 170, thereby cleaning the grinding liquid.
No sufficient cleaning could be achieved with an apparatus using. Moreover, in the conventional apparatus shown in FIG. 6, foreign substances such as abrasive grains and iron powder in the collected grinding fluid are sequentially deposited on the bottom of each settling tank 170 as the use time elapses. Therefore, the grinding fluid tank 12
It is necessary to perform cleaning of 0, and as a result, a machining machine such as a grinder is stopped, and the grinding fluid in the grinding fluid circulating system including the liquid processing device is exchanged, which increases costs and reduces product costs. This is a problem in trying to lower it.

【0006】更に、特開平7−171735号公報の液
処理装置では、フィルタ清浄通路にもポンプを必要と
し、その他の部位の構成も複雑化しており、装置自体が
コスト増を招き易い。しかも、ダーティータンク及びク
リーンタンクの冷却液はストレーナを通過して各ポンプ
に吸い込まれるが、この時、比較的大きな切粉等の異物
はストレーナで排除され、これら切粉はそのまま両タン
クの底部に留まることになる。このため、この装置でも
頻繁にタンク内を清掃する必要が生じ、ここでも研削盤
等の機械加工機を停止させ、研削液の交換を行うことと
なり、経費がかさみ問題となっている。
Further, in the liquid processing apparatus disclosed in Japanese Patent Application Laid-Open No. 7-171735, a pump is also required in the filter cleaning passage, and the configuration of other parts is complicated, and the apparatus itself tends to increase the cost. In addition, the coolant in the dirty tank and the clean tank passes through the strainer and is sucked into each pump.At this time, foreign substances such as relatively large chips are removed by the strainer, and these chips are left at the bottoms of both tanks. Will stay. For this reason, even in this apparatus, the inside of the tank needs to be frequently cleaned. In this case as well, a machining machine such as a grinder is stopped and the grinding fluid is exchanged, which is a costly problem.

【0007】本発明の目的は、十分に清浄度を高めら
れ、しかも、タンク底部に切粉や砥粒等の異物を堆積さ
せることのない状態で加工機からの回収液を清浄化でき
る液処理装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a liquid processing apparatus capable of sufficiently improving the cleanliness and cleaning a recovery liquid from a processing machine without depositing foreign matter such as chips and abrasive grains on the bottom of the tank. It is to provide a device.

【0008】[0008]

【課題を解決するための手段】請求項1の発明は、所定
の液使用箇所に供給されることにより鉄系金属の切粉が
混入した使用後の液を第1タンクに回収し、この第1タ
ンクを経て第2タンクに流入した回収液を再び液使用箇
所に戻す循環形式の液処理装置であり、特に、回転駆動
される回転磁石板をその一部が第1タンクの液面より上
に露出するよう設け、第1タンクの液面より上方で分離
装置により回転磁石板に付着した切粉を分離させ、ポン
プからの循環流によって第1タンク内底部の液を回転磁
石板に向けて循環させる。このように、第1タンク内底
部の液をホンプからの液流によりまき上げ、これらを回
転磁石板に向けて循環させることで、底部に切粉等の異
物が滞留することを防止出来ると共に液中に浮遊する切
粉を回転磁石板付近に容易に集めることができ、しかも
この回転磁石板の磁力により回収した切粉等の異物を分
離装置により第1タンクの液面より上方位置で分離する
ため、第1タンク中の鉄粉等を効率よく回収することが
でき、液の清浄度を高めることができる。しかも、第1
タンクの底部に切粉等の異物が沈殿することを防止しな
がら液の浄化を推進でき、タンク内の定期的清掃やタン
ク内の液の交換補給の頻度が低下し、液の交換頻度を低
減できるので経費低減を図れ、加工機の停止の必要性も
無くなるので、製品の低コスト化を図れる。
According to a first aspect of the present invention, a used liquid mixed with iron-based metal chips is collected in a first tank by being supplied to a predetermined liquid use location. This is a circulation type liquid processing apparatus that returns the recovered liquid that has flowed into the second tank via the first tank to the liquid use point again. In particular, the rotary magnet plate that is driven to rotate is partially moved above the liquid level of the first tank. To separate the chips attached to the rotating magnet plate by a separator above the liquid level of the first tank, and the liquid at the bottom of the first tank is directed to the rotating magnet plate by the circulating flow from the pump. Circulate. In this way, the liquid at the bottom of the first tank is pumped up by the liquid flow from the pump and circulated toward the rotating magnet plate, so that foreign matters such as chips can be prevented from staying at the bottom and the liquid can be prevented. Chips floating inside can be easily collected near the rotating magnet plate, and foreign matter such as chips collected by the magnetic force of the rotating magnet plate is separated at a position above the liquid level of the first tank by the separating device. Therefore, iron powder and the like in the first tank can be efficiently collected, and the cleanliness of the liquid can be increased. And the first
Purification of liquid can be promoted while preventing foreign substances such as chips from settling at the bottom of the tank, and the frequency of periodic cleaning of the tank and replacement and replenishment of the liquid in the tank is reduced, and the frequency of liquid replacement is reduced. As a result, costs can be reduced, and there is no need to stop the processing machine, so that the cost of the product can be reduced.

【0009】請求項2の発明は、第1タンクヘの液流入
経路には、使用後の液を流入させる深底の異物溜まり部
を配し、この異物溜まり部に連続して切粉回収部を配
し、ここは浅底で底部に磁石を装着し、液を第1タンク
に流出させている。このように、深底の異物溜まり部と
浅底の切粉回収部を通過する過程で異物の除去と切粉の
回収が事前に行われることより、第1タンクに流入する
液はある程度浄化されたものになり、第1タング内の液
の清浄度を効果的に高めることができる。また、深底の
異物溜まり部から浅底の切粉回収部に液が流れる過程で
液の流れをゆるやかにできるので異物や鉄粉の回収効率
を向上させることができる。
According to a second aspect of the present invention, a liquid collecting path is provided in the liquid inflow path to the first tank. A magnet is attached to the bottom at a shallow bottom, and the liquid flows out to the first tank. In this way, the liquid flowing into the first tank is purified to some extent by the removal of the foreign matter and the collection of the chip in advance in the process of passing through the deep bottom foreign matter accumulation section and the shallow bottom chip recovery section. As a result, the cleanliness of the liquid in the first tongue can be effectively increased. In addition, since the flow of the liquid can be made gradual in the process of flowing the liquid from the deep-floor foreign matter collecting part to the shallow-floor chip collecting part, the efficiency of collecting foreign matter and iron powder can be improved.

【0010】請求項3の発明は、第1タンクヘの液流入
経路には、使用後の液に混入する切粉を回収する磁石式
セパレータが装着され、ポンプは第1タンク内の液を吸
入して循環流を発生させる他、その吐出した液の一部を
分流させてセパレータに還流させている。このように、
第1タンク内に液が流入する前に磁石式セパレータによ
り切粉の回収が行われることより、第1タンクに流入す
る液はある程度浄化されたものになり、第1タンク内の
液の清浄度をより向上できる。また、循環流を発生させ
るためのポンプを利用して第1タンク内の液を磁石式セ
パレーターに還流させるので、磁石式セパレーターを利
用して第1タンク内の液の浄化を効果的に促進すること
ができる。
According to a third aspect of the present invention, a magnetic separator for collecting chips mixed with used liquid is mounted in the liquid inflow path to the first tank, and the pump sucks the liquid in the first tank. In addition to generating a circulating flow, a part of the discharged liquid is divided and returned to the separator. in this way,
Since the chips are collected by the magnetic separator before the liquid flows into the first tank, the liquid flowing into the first tank is purified to some extent, and the cleanliness of the liquid in the first tank is improved. Can be further improved. Further, since the liquid in the first tank is returned to the magnetic separator by using a pump for generating a circulating flow, the purification of the liquid in the first tank is effectively promoted by using the magnetic separator. be able to.

【0011】請求項4の発明は、回転駆動される第2回
転磁石板をその一部が第2タンクの液面より上に露出す
るよう設け、第2タンクの液面より上方で第2分離装置
により第2回転磁石板から切粉を分離させ、第2ポンプ
により第2タンク内底部の液を第2回転磁石板に向けて
循環させる循環流を発生させ、これら回転磁石板と第2
回転磁石板とを共通の駆動手段により回転駆動できる。
このように、第1タンクと同様の手法で第2タンク中の
切粉等の異物を効率よく回収することができ、これによ
り、第1タンクで一且浄化された液をより一層浄化する
ことができる。また、第1タンク用の回転磁石板と第2
タンク用の第2回転磁石板を共通の駆動手段により回転
駆動することができ、装置を比較的簡素化できる。
According to a fourth aspect of the present invention, the second rotary magnet plate which is driven to rotate is provided so that a part thereof is exposed above the liquid level of the second tank, and the second separation plate is provided above the liquid level of the second tank. The apparatus separates chips from the second rotating magnet plate, generates a circulating flow for circulating the liquid in the bottom of the second tank toward the second rotating magnet plate by the second pump,
The rotating magnet plate can be driven to rotate by a common driving means.
As described above, foreign substances such as cutting chips in the second tank can be efficiently collected in the same manner as in the first tank, thereby further purifying the liquid once purified in the first tank. Can be. Also, the rotating magnet plate for the first tank and the second
The second rotating magnet plate for the tank can be rotationally driven by the common driving means, and the apparatus can be relatively simplified.

【0012】[0012]

【発明の実施の形態】図1には本発明の実施形態例とし
て液処理装置を示した。この液処理装置Aは、図示しな
い研削盤に付設され、同研削盤中の加工部aに研削液を
連続的に供給する研削液循環系の要部を構成している。
ここで、液処理装置Aは、研削盤の液使用個所である加
工部aから延びる液流入経路R1と、この液流入経路R
1上に設けられる磁石式のマグネットセパレーター1
(以後単にセパレーターと記す)と、このセパレーター
1から研削液を受ける砥粒溜り部2及びそれに連続する
切粉回収部3と、切粉回収部3からの研削液を受ける第
1タンクとしてのダーティータンク4と、そのダーティ
ータンク4の下流に連続配備される第2タンクとしての
クリーンタンク5と、クリーンタンク5の研削液を再度
研削盤の加工部aに供給する液流出経路R2とを備え
る。
FIG. 1 shows a liquid processing apparatus as an embodiment of the present invention. The liquid processing apparatus A is attached to a grinding machine (not shown) and constitutes a main part of a grinding fluid circulation system for continuously supplying a grinding fluid to a processing section a in the grinding machine.
Here, the liquid processing apparatus A includes a liquid inflow path R1 extending from a processing portion a, which is a liquid use point of the grinding machine, and a liquid inflow path R
Magnet-type magnetic separator 1 provided on 1
(Hereinafter simply referred to as a separator), an abrasive reservoir 2 for receiving the grinding fluid from the separator 1 and a swarf collecting unit 3 continuous therewith, and a dirty tank as a first tank for receiving the grinding fluid from the swarf collecting unit 3 It has a tank 4, a clean tank 5 as a second tank continuously provided downstream of the dirty tank 4, and a liquid outflow path R2 for supplying the grinding liquid in the clean tank 5 to the processing portion a of the grinding machine again.

【0013】液流入経路R1は加工部aよりダーティー
タンク4にまで連続形成され、その一部を成す液流入管
6は加工部aよりセパレーター1に向け連続して降下す
るように配管され、その下端部がタンク部7に連通され
る。タンク部7は後述の研削液タンク15の側壁上に枠
台16を介し取付けられる。
The liquid inflow path R1 is formed continuously from the processing part a to the dirty tank 4, and a liquid inflow pipe 6 forming a part thereof is piped so as to descend continuously from the processing part a toward the separator 1. The lower end communicates with the tank 7. The tank unit 7 is mounted on a side wall of a grinding liquid tank 15 described later via a frame base 16.

【0014】図4に示すように、タンク部7の全体は上
方開口の箱型をなし、その左右(図4では紙面表裏方
向)のタンク側板701間に回転軸8と一体のマグネッ
トドラム(以後単にMGドラムと記す)9を枢着する。
MGドラム9の周面には切粉を回収すべく磁石が設けら
れている。回転軸8の端部にはドラム駆動機構11が連
結される。タンク部7はそのタンク側板701上の所定
の高さ位置に排出口702を形成され、ここには折曲管
10が連結され、折曲管10の先端は砥粒溜り部2に対
向配備される。タンク部7に流入した研削液は排出口7
02の高さH1まで液面を保持し、それを超える液は砥
粒溜り部2に流下する。なお、タンク部7内のMGドラ
ム9はその上部を高さH1の液面より上方に突き出すよ
うに配置される。しかも、MGドラム9の上方の一部に
は同ドラムに付着した切粉等の異物を掻き採る分離板1
2が摺接する。分離板12は傾斜した状態でタンク部7
の前側壁703に支持され、その下端側をタンク部7の
近傍に配備される廃棄物入れ13の上方開口に浸入させ
ている。この廃棄物入れ13は図示しない固定手段によ
り離脱可能に枠台16上に固定される。
As shown in FIG. 4, the entire tank 7 has a box shape with an upper opening, and a magnet drum (hereinafter referred to as a magnetic drum) integrated with a rotating shaft 8 between tank side plates 701 on the left and right sides (in FIG. (Abbreviated as MG drum) 9.
A magnet is provided on the peripheral surface of the MG drum 9 to collect chips. A drum driving mechanism 11 is connected to an end of the rotating shaft 8. The tank part 7 has a discharge port 702 formed at a predetermined height position on the tank side plate 701, a bent pipe 10 is connected to the discharge port 702, and the tip of the bent pipe 10 is provided to face the abrasive grain reservoir 2. You. The grinding fluid flowing into the tank 7 is
The liquid level is maintained up to the height H1 of 02, and the liquid exceeding the liquid level flows down to the abrasive grain reservoir 2. The MG drum 9 in the tank 7 is arranged so that its upper part protrudes above the liquid surface of height H1. In addition, a separation plate 1 that scrapes off foreign matter such as chips attached to the MG drum 9 is provided above a part of the MG drum 9.
2 comes in sliding contact. The separation plate 12 is tilted and the tank 7
The lower end side of the container is supported by the front side wall 703, and its lower end is penetrated into the upper opening of the waste container 13 provided near the tank portion 7. The waste container 13 is detachably fixed on the frame 16 by fixing means (not shown).

【0015】図4に示すように、ドラム駆動機構11は
タンク部7内の上方にブラケット14を介し装着された
モータ26と、その回転を減速して回転軸8のスプロケ
ット111に伝達するチェーン減速機構112とで構成
され、モータ26は図示しない電源回路に接続され、こ
の電源回路のオン時にMGドラム9を所定回転速度で駆
動する。なお、タンク部7の上方開口の上には後述の第
2分岐管292に連通する注水栓17(図1参照)の開
口が対向配備されている。
As shown in FIG. 4, the drum driving mechanism 11 has a motor 26 mounted above the tank section 7 via the bracket 14 and a chain reduction mechanism for reducing the rotation and transmitting the rotation to the sprocket 111 of the rotating shaft 8. The motor 26 is connected to a power supply circuit (not shown), and drives the MG drum 9 at a predetermined rotation speed when the power supply circuit is turned on. Note that an opening of a water tap 17 (see FIG. 1) communicating with a second branch pipe 292 described later is provided opposite to the upper opening of the tank section 7.

【0016】図1、図5に示すように、セパレーター1
の折曲管10から研削液を受ける砥粒溜り部2及びそれ
に連続する切粉回収部3は長皿状の流路形成体Bとして
一体形成される。この流路形成体Bは液流入経路R1の
一部を成し、研削液タンク15の上部にブラケット18
を介し一体的に取付けられる。流路形成体Bの一方の半
部である砥粒溜り部2は略箱型の比較的大容量で深皿状
に形成され、セパレーター1から流入した研削液中の砥
粒や切粉等の異物を底部201に沈殿させ、上側の研削
液を切粉回収部3側に流出する。切粉回収部3は傾斜板
301とその左右のガイド壁302と、傾斜板301に
支持される永久磁石303とを備え、全体がマグネット
プレートとして形成される。傾斜板301は板金製で複
数の凹部を形成され、そこに角形の永久磁石303を嵌
着しており、特に、永久磁石303と傾斜板301の各
上面は連続平面F1と成るように形成され、これによ
り、日常のメンテナンス時の切粉や砥粒の掻き取り作業
の容易化を図っている。
As shown in FIGS. 1 and 5, the separator 1
The abrasive grain reservoir 2 receiving the grinding fluid from the bent pipe 10 and the chip recovery unit 3 continuous therewith are integrally formed as a long plate-shaped flow path forming body B. The flow path forming body B forms a part of the liquid inflow path R 1, and a bracket 18 is provided above the grinding liquid tank 15.
Can be integrally mounted via The abrasive grain reservoir 2, which is one half of the flow path forming body B, is formed in a substantially box-shaped, relatively large-capacity deep dish shape, and is used for removing abrasive grains, cutting chips, and the like in the grinding fluid flowing from the separator 1. Foreign matter is precipitated on the bottom 201, and the upper grinding fluid flows out to the chip recovery unit 3 side. The swarf collecting section 3 includes an inclined plate 301, left and right guide walls 302, and permanent magnets 303 supported by the inclined plate 301, and is entirely formed as a magnet plate. The inclined plate 301 is made of sheet metal and has a plurality of recesses formed therein, and a rectangular permanent magnet 303 is fitted therein. In particular, the upper surfaces of the permanent magnet 303 and the inclined plate 301 are formed so as to form a continuous plane F1. This facilitates scraping off chips and abrasive grains during daily maintenance.

【0017】研削液タンク15は図示しない研削盤の停
止時に研削液循環系内の研削液のほぼ全量を収容出来る
容量に設定され、図2に示すように、外周壁151と底
壁152とで箱型に形成される。更に、図3に示すよう
に、研削液タンク15の内部は屈曲した第1第2隔壁1
9,20により2分割され、ダーティータンク4とクリ
ーンタンク5を区分している。しかも外周壁151及び
第1第2隔壁19,20の上端の一部には主載置台2
3、ポンプ台24が一体的に取り付けられる。主載置台
23には後述のクリーンキットC及びダーティータンク
4の研削液を汲み上げる第1ポンプ21が装着され、ポ
ンプ台24にはクリーンタンク5の研削液を汲み上げる
第2ポンプ22がそれぞれ取付けられる。
The grinding fluid tank 15 is set to have a capacity capable of accommodating substantially all of the grinding fluid in the grinding fluid circulating system when a grinding machine (not shown) is stopped. As shown in FIG. 2, an outer peripheral wall 151 and a bottom wall 152 are provided. Formed in a box shape. Further, as shown in FIG. 3, the inside of the grinding fluid tank 15 is bent first and second partition walls 1.
The dirty tank 4 and the clean tank 5 are divided into two parts 9 and 20. In addition, the main mounting table 2 is provided on a part of the outer peripheral wall 151 and the upper end of the first and second partition walls 19 and 20.
3. The pump stand 24 is integrally mounted. The main mounting table 23 is provided with a clean pump C and a first pump 21 for pumping the grinding fluid of the dirty tank 4 described later, and the pump table 24 is provided with a second pump 22 for pumping the grinding fluid of the clean tank 5.

【0018】ダーティータンク4は、図1において外周
壁151の手前側の部位と第1第2隔壁19,20及び
底壁152とにより矩形容器状に形成される。ダーティ
ータンク4はその上方開口の一側端に切粉回収部3を対
設され、これより研削液の流し込みを受け、第1隔壁1
9の一部に形成された連通口30よりクリーンタンク5
側に研削液を流出できる。ダーティータンク4の上側に
は第1ポンプ21が配備され、同ポンプからはその直下
に吸込管28が延出する。第1ポンプ21の吐出管29
は分岐しており、一方の第1分岐管291がダーティー
タンク4の連通口30の近くの中央域r1まで延び、そ
の先端に設けたノズル35が中央域r1と反対側の上流
域r2に向け液を吐出するように構成される。他方の第
2分岐管292は上述のセパレーター1のタンク部7に
まで延出しており、その先端側が注水栓17を介しタン
ク部7に研削液を再循環可能するように形成されてい
る。
The dirty tank 4 is formed in a rectangular container shape by a portion on the near side of the outer peripheral wall 151, the first and second partition walls 19 and 20, and the bottom wall 152 in FIG. The dirty tank 4 is provided with a chip collecting portion 3 at one end of an upper opening thereof.
9 through the communication port 30 formed in a part of the clean tank 5
The grinding fluid can flow out to the side. A first pump 21 is provided above the dirty tank 4, and a suction pipe 28 extends from directly below the first pump 21. Discharge pipe 29 of first pump 21
Is branched, and one of the first branch pipes 291 extends to a central area r1 near the communication port 30 of the dirty tank 4, and a nozzle 35 provided at the tip thereof is directed toward an upstream area r2 opposite to the central area r1. It is configured to discharge a liquid. The other second branch pipe 292 extends to the tank portion 7 of the separator 1 described above, and is formed so that the tip end thereof can recirculate the grinding fluid to the tank portion 7 via the water tap 17.

【0019】クリーンタンク5は図1において後方側の
外周壁151と第1第2隔壁19,20及び底壁152
により折曲容器状に形成され、第1隔壁19の連通口3
0を介しダーティータンク4と連通する。クリーンタン
ク5の上側にはポンプ台24に支持された第2ポンプ2
2が配備され、同ポンプからはその直下に吸込管32
(図2参照)が延出する。第2ポンプ22の吐出管33
は分岐しており、一方の第1分岐管331(図1参照)
は液流出経路R2を成し、研削液をこの液流出経路R2
を介し図示しない研削盤の加工部aに供給する。他方の
第2分岐管332は、図3に示すように、連通口30と
最も離れた下流域r3にまで延び、その先端のノズル3
4が上流側の折曲域r4に向け液を吐出するように構成
される。なお、上述の第1第2ポンプ21,22は図示
しない電源回路に接続され、この電源回路のオン時に研
削液を循環させる。
The clean tank 5 includes an outer peripheral wall 151, a first and second partition walls 19 and 20, and a bottom wall 152 in FIG.
And the communication port 3 of the first partition wall 19 is formed.
It communicates with the dirty tank 4 through 0. Above the clean tank 5, the second pump 2 supported by the pump stand 24
2 is provided, and a suction pipe 32 is provided immediately below the pump.
(See FIG. 2). Discharge pipe 33 of second pump 22
Is branched, and one first branch pipe 331 (see FIG. 1)
Forms a liquid outflow path R2, and the grinding fluid is supplied to the liquid outflow path R2.
To a processing section a of a grinding machine (not shown). As shown in FIG. 3, the other second branch pipe 332 extends to the downstream area r3 farthest from the communication port 30 and has a nozzle 3
4 is configured to discharge the liquid toward the bending area r4 on the upstream side. The first and second pumps 21 and 22 are connected to a power supply circuit (not shown), and circulate the grinding fluid when the power supply circuit is turned on.

【0020】主載置台23にはクリーンキットCが載置
される。クリーンキットCはダーティータンク4の中央
域r1に配備される第1回転磁石板37と、折曲域r4
に配備される第2回転磁石板38と、両回転磁石板3
7,38を一体結合する回転軸39と、回転軸39を主
載置台23に枢支する一対の軸受部材40と、回転軸3
9を回転駆動する回転駆動手段41と、第1回転磁石板
37の回転面frに付着した切粉を分離させる一対の分
離装置42と、回転磁石板38の回転面frに付着した
切粉を分離させる一対の分離装置43とを備える。
On the main mounting table 23, a clean kit C is mounted. The clean kit C includes a first rotating magnet plate 37 provided in a central area r1 of the dirty tank 4 and a bent area r4.
The second rotating magnet plate 38 provided in the
A rotating shaft 39 that integrally connects the first and second shafts 7 and 38; a pair of bearing members 40 that pivotally support the rotating shaft 39 on the main mounting table 23;
9, a pair of separation devices 42 for separating chips attached to the rotating surface fr of the first rotating magnet plate 37, and a chip attached to the rotating surface fr of the rotating magnet plate 38. And a pair of separation devices 43 for separation.

【0021】図3に示すように、主載置台23は中央域
r1と折曲域r4との各対向部に切り込み25,27を
形成され、これら切り込みに第1、第2回転磁石板3
7,38を嵌着している。第1、第2回転磁石板37,
38は同一の構造を採り、即ち、回転軸39と結合され
たボス部371,381と、このボス部に中央が支持さ
れた一定厚の円板部372,382と、その円板部に埋
込装着された多数の永久磁石373,383とで形成さ
れる。図1に示すように、永久磁石373,383は円
板部372,382上に一様に分散して点在するよう配
備され、これら円板部372,382と多数の永久磁石
373,383とから成る回転面frは連続面として形
成される。更に、図2に示すように、第1、第2回転磁
石板37,38はその下半部をダーティタンク4やクリ
ーンタンク5の液面wfより下方に浸入させ、上半部を
露出させた状態で回転自在に保持される。
As shown in FIG. 3, cuts 25 and 27 are formed in the main mounting table 23 at opposing portions of the central area r1 and the bent area r4, and the first and second rotating magnet plates 3 are formed in these cuts.
7, 38 are fitted. The first and second rotating magnet plates 37,
38 has the same structure, that is, bosses 371 and 381 connected to the rotating shaft 39, discs 372 and 382 of a certain thickness supported at the center by the bosses, and embedded in the discs. It is formed by a large number of permanent magnets 373 and 383 mounted. As shown in FIG. 1, the permanent magnets 373 and 383 are arranged so as to be uniformly dispersed and scattered on the disk portions 372 and 382, and these disk portions 372 and 382 and a large number of permanent magnets 373 and 383 are provided. Is formed as a continuous surface. Further, as shown in FIG. 2, the first and second rotating magnet plates 37 and 38 have their lower halves penetrated below the liquid level wf of the dirty tank 4 and the clean tank 5 to expose the upper halves. It is held rotatably in the state.

【0022】回転駆動手段41は主載置台23の端部に
装着されたモータ46と、その回転を減速して回転軸3
9のスプロケット47に伝達するチェーン減速機構48
とで構成され、モータ46は図示しない電源回路に接続
され、この電源回路のオン時に第1、第2回転磁石板3
7,38を回転駆動する。
The rotation driving means 41 is provided with a motor 46 mounted on the end of the main mounting table 23 and a rotation shaft 3 for reducing the rotation thereof.
Chain transmission mechanism 48 for transmitting to the sprocket 47
The motor 46 is connected to a power supply circuit (not shown), and when the power supply circuit is turned on, the first and second rotating magnet plates 3
7, 38 are rotationally driven.

【0023】第1回転磁石板37の左右回転面frとの
対向部には切粉を分離させる一対の分離装置42がそれ
ぞれ配備される。ここで各分離装置42は主載置台23
に載置される上方開口の箱型の廃棄物入れ421と、廃
棄物入れ421の上端に支持される分離板422とを備
える。分離板422は弾性を有した樹脂板であり、回転
面frと所定幅b(図3参照)を保った状態で摺接して
おり、これにより回転面frに付着している切粉等を掻
き取り、廃棄物入れ421に落下させるように形成され
ている。なお、分離板422の所定幅bは、回転面fr
内に点在する全ての永久磁石373が第1回転磁石板3
7の回転時に順次分離板422に当接し、付着する異物
を掻き取りできるように設定される。廃棄物入れ421
は図示しない固定手段により主載置台23に離脱可能に
固定され、内部に堆積した切粉等の廃棄物は適時に排除
可能に形成されている。
A pair of separation devices 42 for separating chips are provided at the portions of the first rotating magnet plate 37 facing the left and right rotating surfaces fr. Here, each separation device 42 is connected to the main mounting table 23.
And a separation plate 422 supported on the upper end of the waste container 421. The separation plate 422 is a resin plate having elasticity, and is in sliding contact with the rotating surface fr while maintaining a predetermined width b (see FIG. 3), thereby scraping chips and the like adhering to the rotating surface fr. It is formed so that it can be dropped into the waste container 421. The predetermined width b of the separation plate 422 is equal to the rotation surface fr.
All the permanent magnets 373 scattered in the first rotating magnet plate 3
7 is set so as to sequentially come into contact with the separation plate 422 and scrape off the adhered foreign matter when the 7 rotates. Waste container 421
Is fixed to the main mounting table 23 so as to be detachable by fixing means (not shown), and is formed so that waste such as cutting chips accumulated inside can be removed in a timely manner.

【0024】なお、第1回転磁石板37に対設された分
離装置42と同様に第2回転磁石板38の左右回転面f
rにも廃棄物入れ431と分離板432とから成る分離
装置43が一対配備され、これらは同一構成を採ること
より重複説明を略す。このような図1の液処理装置の作
動を説明する。
The left and right rotating surfaces f of the second rotating magnet plate 38 are similar to the separating device 42 provided opposite the first rotating magnet plate 37.
A pair of separation devices 43 each including a waste container 431 and a separation plate 432 are also provided in r. The operation of the liquid processing apparatus of FIG. 1 will be described.

【0025】まず、図示しない研削盤が駆動されると、
図示しないポンプ駆動回路がオンし、第1ポンプ21が
ダーティータンク4の研削液を汲み上げ、ノズル35か
らの吐出液によりダーティータンク4内の研削液を循環
させ、同時にダーティータンク4の研削液の一部をセパ
レーター1のタンク部7に戻す。一方、第2ポンプ22
がクリーンタンク5の研削液を汲み上げ、ノズル34か
らの吐出液によりクリーンタンク5内の研削液を循環さ
せ、同時にクリーンタンク5の研削液を液流出経路R2
を介し再度研削盤の加工部aに供給する。これと同時に
ドラム駆動機構11の図示しない電源回路がオンし、モ
ータ26を介してMGドラム9を回転駆動し、更に、回
転駆動手段41がオンされ、モータ46、チェーン減速
機構48、回転軸39を介して第1、第2回転磁石板3
7,38が回転を開始し、第1第2回転磁石板37,3
8の各回転面frに付着した切粉が順次分離装置42,
43と対向し、回転面frに付着した切粉が分離板42
2,432により掻き採られ、各廃棄物入れ421,4
31に収容され、これによりダーティータンク4とクリ
ーンタンク5の研削液が清浄化される。
First, when a grinding machine (not shown) is driven,
A pump drive circuit (not shown) is turned on, the first pump 21 pumps up the grinding fluid in the dirty tank 4, circulates the grinding fluid in the dirty tank 4 with the fluid discharged from the nozzle 35, and simultaneously releases one of the grinding fluid in the dirty tank 4. The part is returned to the tank part 7 of the separator 1. On the other hand, the second pump 22
Pumps up the grinding fluid in the clean tank 5 and circulates the grinding fluid in the clean tank 5 with the fluid discharged from the nozzle 34, and simultaneously discharges the grinding fluid in the clean tank 5 with the fluid outflow path R2.
Again to the processing part a of the grinding machine. At the same time, a power supply circuit (not shown) of the drum driving mechanism 11 is turned on, and the MG drum 9 is rotationally driven via the motor 26. Further, the rotation driving means 41 is turned on, and the motor 46, the chain reduction mechanism 48, the rotating shaft 39 Through the first and second rotating magnet plates 3
7, 38 start rotating, and the first and second rotating magnet plates 37, 3
The chips attached to each rotating surface fr of No. 8 are sequentially
43, the chips attached to the rotating surface fr
2,432, and each waste container 421,4
The grinding fluid in the dirty tank 4 and the clean tank 5 is thereby cleaned.

【0026】このように、図示しない研削盤が駆動を開
始すると、切粉や砥粒等の異物を含む研削液が加工部a
から液流入経路R1を経てセパレーター1に流入する。
セパレーター1はタンク部7の底部に異物を沈殿させる
と共に回転するMGドラム9により滞留する研削液中の
切粉等の異物を吸着し、高さH1の液面より上方に分離
して搬送し、切粉等の異物を分離板12により掻き採
り、廃棄物入れ13に収容する。なお、タンク部7の底
部に堆積した砥粒等の異物や廃棄物入れ13に堆積した
異物は定期的に収集され、排除される。
As described above, when the grinding machine (not shown) starts to be driven, the grinding fluid containing foreign matter such as chips and abrasive grains is applied to the processing section a.
Flows into the separator 1 via the liquid inflow path R1.
The separator 1 precipitates foreign matter on the bottom of the tank part 7 and adsorbs foreign matter such as cutting chips in the grinding fluid that is retained by the rotating MG drum 9, and separates and transports the foreign matter above the liquid surface of height H 1. Foreign substances such as chips are scraped off by the separation plate 12 and stored in the waste container 13. In addition, foreign substances such as abrasive grains deposited on the bottom of the tank unit 7 and foreign substances deposited on the waste container 13 are periodically collected and eliminated.

【0027】ここで、もしセパレーター1が故障して
も、砥粒溜り部2、切粉回収部3、両タンク4,5が清
浄化処理を行うので、タンク部7よりMGドラム9等を
採り外し、その間もドラム無しの状態のままで研削盤を
駆動出来、マシン停止は必要無く、切粉処理でハンドリ
ングタイムを必要としない。セパレーター1の折曲管1
0からは研削液が砥粒溜り部2に流入する。
Here, even if the separator 1 breaks down, since the abrasive grain collecting section 2, the chip collecting section 3, and the tanks 4 and 5 carry out the cleaning process, the MG drum 9 and the like are taken from the tank section 7. The grinder can be driven without the drum during the removal, and the machine does not need to be stopped, and there is no need for handling time in chip processing. Bent tube 1 of separator 1
From 0, the grinding fluid flows into the abrasive reservoir 2.

【0028】この砥粒溜り部2は比較的容量が大きいた
め、セパレーター1で排除されなかった砥粒等の異物を
底部201に沈殿でき、ダーティータンク4に向かう異
物を排除でき、しかも上部の研削液を切粉回収部3に流
し込むことができる。切粉回収部3の傾斜した連続平面
F1を研削液が層流状態でゆるやかに流下すると、この
際、切粉や砥粒等の異物が連続平面F1上の特に永久磁
石303に吸着され、堆積する。このような砥粒溜り部
2の底部201や連続平面F1は、ダーティータンク4
に向かう異物を十分排除でき、第1ポンプ21の耐久性
を向上させることもできる。更に、砥粒溜り部2の底部
201や連続平面F1は、それらの上方が十分に開口
し、しかも、比較的浅底のため、比較的目視し易い構造
であり、この部位に堆積した切粉や砥粒等の異物の除去
作業が容易化され、作業者の日常保全負担等を低減出来
る。
Since the abrasive reservoir 2 has a relatively large capacity, foreign substances such as abrasives that have not been removed by the separator 1 can be deposited on the bottom 201, foreign substances heading for the dirty tank 4 can be removed, and the upper part of the abrasive can be ground. The liquid can be poured into the chip recovery unit 3. When the grinding fluid slowly flows down the inclined continuous plane F1 of the chip recovery unit 3 in a laminar flow state, foreign substances such as chips and abrasive grains are adsorbed by the permanent magnets 303 on the continuous plane F1 and accumulated. I do. The bottom 201 and the continuous plane F1 of the abrasive grain reservoir 2 are connected to the dirty tank 4
Foreign matter toward the first pump 21 can be sufficiently removed, and the durability of the first pump 21 can be improved. Furthermore, since the bottom 201 and the continuous plane F1 of the abrasive grain reservoir 2 are sufficiently open above them and are relatively shallow, they have a structure that is relatively easy to see. The work of removing foreign substances such as abrasives and abrasive grains is facilitated, and the daily maintenance burden on the operator can be reduced.

【0029】なお、ここでの切粉回収部3は可能な限り
切粉回収部3の流れをゆるやかに設定して、清浄化の効
率をアップすることが望ましい。なお、図1の装置では
砥粒溜り部2及び切粉回収部3を通過後の研削液をダー
ティータンク4に導くので、ダーティータンク4への切
粉や砥粒等の異物の流入量を抑えるようにでき、ダーテ
ィータンク4の清浄度を十分高めることが出来るが、場
合により、この砥粒溜り部2及び切粉回収部3を排除
し、セパレーター1よりダーティータンク4に直接研削
液を流し、装置の簡素化を図っても良い。
In this case, it is desirable that the flow of the chip recovery unit 3 is set as gently as possible to improve the efficiency of cleaning. In the apparatus shown in FIG. 1, the grinding fluid after passing through the abrasive reservoir 2 and the chip recovery unit 3 is guided to the dirty tank 4, so that the amount of foreign matter such as chips and abrasive grains flowing into the dirty tank 4 is suppressed. In this case, the cleanliness of the dirty tank 4 can be sufficiently increased. However, in some cases, the abrasive reservoir 2 and the chip recovery unit 3 are eliminated, and the grinding fluid is directly flown from the separator 1 to the dirty tank 4, The apparatus may be simplified.

【0030】ダーティータンク4では、第1ポンプ21
が駆動しており、第1分岐管291を介しノズル35か
ら吐出される液の流れS1は中央域r1より上流域r2
に向かい、再度中央域r1側の連通口30に迂回する。
この際、吐出液流S1は底壁152に堆積する切粉や砥
粒等の異物を巻き上げ、撹拌し、これらを第1回転磁石
板37の近傍に押し流すように作用する。このため、吐
出液流S1により押し流されてきた切粉や砥粒等の異物
は、回転する第1回転磁石板37上の多数の永久磁石3
73を備えた回転面frに比較的頻繁に対向することが
出来、これら切粉や切粉等の異物は多数の永久磁石37
3に付着し、水面wf上に搬送され、しかも、分離装置
42により掻き採られ、排除される。
In the dirty tank 4, the first pump 21
Is driven, and the flow S1 of the liquid discharged from the nozzle 35 through the first branch pipe 291 is higher than the central area r1 in the upstream area r2.
And detour again to the communication port 30 on the central area r1 side.
At this time, the discharged liquid flow S1 acts to wind up and agitate foreign matters such as chips and abrasive grains deposited on the bottom wall 152 and to push them to the vicinity of the first rotating magnet plate 37. For this reason, foreign matter such as chips and abrasive grains that have been swept away by the discharge liquid flow S1 are removed from the large number of permanent magnets 3 on the rotating first rotating magnet plate 37.
73 can be relatively frequently opposed to the rotating surface fr provided with the foreign matter 73.
3 is conveyed on the water surface wf, and is scraped off by the separating device 42 and removed.

【0031】このようにダーティータンク4では、常
時、吐出液流S1が底壁152に堆積しようとする切粉
や砥粒等の異物を巻き上げ、撹拌し、これら異物を第1
回転磁石板37が吸着し、排除するので、ダーティータ
ンク4の底壁152に異物を溜め無いようにでき、定期
的なタンク掃除を必要としない。更に、ここでは、第2
分岐管292がダーティータンク4の研削液の一部をセ
パレーター1に戻し、液流入経路R1上のセパレーター
1、砥粒溜り部2及び切粉回収部3に再循環させ、ここ
で再度切粉や砥粒等の異物を排除するので、この点でダ
ーティータンク4内の研削液の清浄度をより高めること
が出来る。
As described above, in the dirty tank 4, the discharged liquid flow S1 always winds up and agitates foreign matters such as chips and abrasives which are to be deposited on the bottom wall 152, and the foreign matters are removed by the first flow.
Since the rotating magnet plate 37 is attracted and removed, foreign matter can be prevented from collecting on the bottom wall 152 of the dirty tank 4, and periodic tank cleaning is not required. Further, here, the second
The branch pipe 292 returns a part of the grinding fluid in the dirty tank 4 to the separator 1 and recirculates it to the separator 1, the abrasive grain collecting part 2 and the chip collecting part 3 on the liquid inflow path R1, where the chip Since foreign matters such as abrasive grains are eliminated, the cleanliness of the grinding fluid in the dirty tank 4 can be further increased in this respect.

【0032】このようなダーティータンク4よりの研削
液は連通口30を通過してクリーンタンク5に達する。
クリーンタンク5では、第2ポンプ22が駆動してお
り、吐出管33より第2分岐管332に流入した研削液
はノズル34より吐出される。ここで生じた吐出液流S
2は下流域r3より折曲域r4側の第2回転磁石板38
に向かい、再度吸込管32に向かって迂回する。この吐
出液流S2は底壁152側の研削液を巻き上げ、撹拌を
促進し、撹拌した研削流を第2回転磁石板38の近傍に
押し流すように作用する。このクリーンタンク5に達す
る研削液は清浄化が進んでいるが、まだ切粉や砥粒等の
微細な粒子を含む場合が多く、特に、研削液中の気泡の
表面には切粉や砥粒等の微細な粒子が付着しやすく、こ
れらを吐出液流S2によって第2回転磁石板38の回転
面frに比較的頻繁に対向させ、これら切粉や鉄分等の
異物を多数の永久磁石383に付着させ、水面wf上で
分離装置43により掻き採り、排除することとなる。
The grinding fluid from the dirty tank 4 passes through the communication port 30 and reaches the clean tank 5.
In the clean tank 5, the second pump 22 is driven, and the grinding fluid flowing from the discharge pipe 33 into the second branch pipe 332 is discharged from the nozzle 34. Discharge liquid flow S generated here
2 is the second rotating magnet plate 38 on the bending area r4 side from the downstream area r3.
, And detours toward the suction pipe 32 again. This discharged liquid flow S2 acts to wind up the grinding liquid on the bottom wall 152 side, promote agitation, and push the agitated grinding flow to the vicinity of the second rotating magnet plate 38. Although the grinding fluid reaching the clean tank 5 is being cleaned, it still contains fine particles such as chips and abrasive grains in many cases. Fine particles, such as fine particles, tend to adhere to the rotating surface fr of the second rotating magnet plate 38 relatively frequently by the discharge liquid flow S2. Attached, scraped off by the separating device 43 on the water surface wf, and eliminated.

【0033】なお、クリーンタンク5で清浄化処理を済
ませた研削液は、吸込管32より第2ポンプ22に吸い
込まれ、吐出管33より第1分岐管331に流入したも
のが液流出経路R2を経て図示しない研削盤の加工部a
に供給される。このようにクリーンタンク5では、常
時、吐出液流S2が研削液を撹拌し、発生する気泡に付
着する切粉や砥粒等の微細な粒子を効率良く第2回転磁
石板38に対向させ、これら微粒子を第2回転磁石板3
8が吸着し、分離装置43に収容出来、研削液の清浄度
を十分に高めることが出来、しかも、吐出液流S2が底
壁152の研削液を巻き上げ、撹拌するので、クリーン
タンク5の底壁152に異物を溜めないようにでき、定
期的なタンク掃除を必要としない。
The grinding fluid that has been cleaned in the clean tank 5 is sucked into the second pump 22 from the suction pipe 32, and flows from the discharge pipe 33 into the first branch pipe 331 through the liquid outflow path R2. Working part a of a grinding machine not shown
Supplied to As described above, in the clean tank 5, the discharge liquid flow S2 constantly stirs the grinding liquid, and efficiently causes the fine particles, such as cutting chips and abrasive grains, attached to the generated bubbles to efficiently face the second rotating magnet plate 38, These fine particles are transferred to the second rotating magnet plate 3
8 can be adsorbed and stored in the separation device 43, the cleanliness of the grinding fluid can be sufficiently increased, and the discharge fluid flow S2 winds up and agitates the grinding fluid on the bottom wall 152. Foreign matter can be prevented from accumulating on the wall 152, and periodic tank cleaning is not required.

【0034】上述のように図1の液処理装置Aは、清浄
度を十分向上させることができる。更に、清浄化が推進
することよりクリーン液を使用でき、切り刃寿命を延長
でき、被加工物の品質向上を図れ、不良品の発生を減少
できる。更に、構成が簡素化され低コストを図りやす
い。作業者の日常保全(メンテナンス)時の作業者負担
が軽減し、汚れの発生が少なく、作業環境が向上する。
更に、機械停止必要頻度を低減出来、製品の低コスト化
を図りやすくなる。
As described above, the liquid processing apparatus A shown in FIG. 1 can sufficiently improve the cleanliness. Further, by promoting cleaning, a clean liquid can be used, the life of the cutting blade can be extended, the quality of the workpiece can be improved, and the occurrence of defective products can be reduced. Further, the configuration is simplified and the cost is easily reduced. The burden on the worker at the time of daily maintenance (maintenance) is reduced, the generation of dirt is reduced, and the working environment is improved.
Further, the frequency of stopping the machine can be reduced, and the cost of the product can be easily reduced.

【0035】図1の液処理装置は研削盤の研削液の液処
理をするものとしたが、本発明はこれに限定されるもの
ではなく、所定の液使用個所より液を回収し、清浄化
し、再度液使用個所に供給するという液循環系に同様に
適用でき、研削盤以外の各種加工機で用いる研削液の液
処理装置や、各種洗浄機の洗浄液の液処理装置としても
同様に適用出来、同様の作用効果を得られる。
Although the liquid processing apparatus shown in FIG. 1 performs the liquid processing of the grinding liquid of the grinding machine, the present invention is not limited to this. The liquid is recovered from a predetermined liquid use point, and is cleaned. It can be similarly applied to the liquid circulation system that supplies the liquid to the point where the liquid is used again, and can also be applied to the liquid processing device for the grinding liquid used in various processing machines other than the grinding machine, and the cleaning liquid for the various cleaning machines. The same operation and effect can be obtained.

【0036】[0036]

【発明の効果】以上説明したように、請求項1記載の発
明によれば、ポンプからの吐出液流により第1タンクの
底部に切粉等の異物が滞留することを防止し、しかも液
中に浮遊する切粉を回転磁石板付近に集め、この回転磁
石板の磁力により切粉等の異物を分離装置に導き分離で
き、第1タンク中の液中の切粉等を効率よく回収するこ
とができ、第1タンク中の液の清浄度を十分に向上でき
る。しかも、第1タンクの底部に切粉等の異物が沈殿す
ることを防止した上で液の浄化を推進でき、タンク内の
定期的清掃やタンク内の研削液の交換補給の頻度を低減
でき、冷却液の交換頻度を低減できるので経費低減を図
れ、加工機械の停止の必要性も無くなるので、製品の低
コスト化を図れる。
As described above, according to the first aspect of the present invention, foreign matter such as chips is prevented from staying at the bottom of the first tank due to the flow of the liquid discharged from the pump. Collecting chips in the vicinity of the rotating magnet plate, and by using the magnetic force of the rotating magnet plate, guides foreign matter such as chips to the separation device and separates it, and efficiently collects chips in the liquid in the first tank. And the cleanliness of the liquid in the first tank can be sufficiently improved. Moreover, it is possible to promote the purification of the liquid while preventing foreign substances such as chips from settling at the bottom of the first tank, to reduce the frequency of regular cleaning of the tank and replacement and replenishment of the grinding liquid in the tank, Since the frequency of replacing the coolant can be reduced, the cost can be reduced, and the necessity of stopping the processing machine is eliminated, so that the cost of the product can be reduced.

【0037】請求項2の発明は、第1タンクヘの液流入
経路に深底の異物溜まり部と浅底の切粉回収部を配備
し、これにより、第1タンクに流入する液をある程度浄
化されたものにするので、第1タング内の液の清浄度を
効果的に向上できる。また、深底の異物溜まり部から浅
底の切粉回収部に液が流れる過程で液の流れをゆるやか
にできるので異物や切粉の回収効率を向上させることが
できる。
According to a second aspect of the present invention, a deep foreign matter accumulation section and a shallow bottom chip recovery section are provided in the liquid inflow path to the first tank, whereby the liquid flowing into the first tank is purified to some extent. Therefore, the cleanliness of the liquid in the first tongue can be effectively improved. In addition, since the flow of the liquid can be made slower in the process of flowing the liquid from the deep bottom foreign matter collecting portion to the shallow bottom chip collecting portion, it is possible to improve the efficiency of collecting foreign matters and chips.

【0038】請求項3の発明は、第1タンク内に液が流
入する前に磁石式セパレータにより切粉の回収が行わ
れ、第1タンク内の液を磁石式セパレーターに還流させ
るので、磁石式セパレーターを利用して第1タンク内の
液の清浄度をより向上でき、しかも、ポンプを有効活用
して第1タンク内の液の清浄度をより効果的に向上させ
ることができる。
According to the third aspect of the present invention, the chips are collected by the magnetic separator before the liquid flows into the first tank, and the liquid in the first tank is returned to the magnetic separator. The cleanliness of the liquid in the first tank can be further improved by using the separator, and the cleanliness of the liquid in the first tank can be more effectively improved by effectively utilizing the pump.

【0039】請求項4の発明は、第1タンクと同様の手
法で第2タンク中の切粉等の異物を効率よく回収するこ
とができ、また、第1タンク用の回転磁石板と第2タン
ク用の第2回転磁石板を共通の駆動手段により回転駆動
することができるので、第1タンクで一且浄化された液
をより一層浄化することができ、しかも、装置が比較的
簡単な構成を採ることができるという利点がある。
According to a fourth aspect of the present invention, foreign substances such as chips in the second tank can be efficiently collected in the same manner as in the first tank, and the rotary magnet plate for the first tank and the second Since the second rotary magnet plate for the tank can be rotationally driven by the common driving means, the liquid once purified in the first tank can be further purified, and the apparatus has a relatively simple configuration. There is an advantage that can be adopted.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の適用された液処理装置の斜視図であ
る。
FIG. 1 is a perspective view of a liquid processing apparatus to which the present invention is applied.

【図2】図1の液処理装置の正面断面図である。FIG. 2 is a front sectional view of the liquid processing apparatus of FIG.

【図3】図1の液処理装置の平面図である。FIG. 3 is a plan view of the liquid processing apparatus of FIG.

【図4】図1の液処理装置に用いられたセパレーターの
拡大側断面図である。
FIG. 4 is an enlarged side sectional view of a separator used in the liquid processing apparatus of FIG.

【図5】図1の液処理装置に用いられた砥粒溜り部及び
切粉回収部の拡大側断面図である。
FIG. 5 is an enlarged side sectional view of an abrasive grain collecting section and a chip collecting section used in the liquid processing apparatus of FIG. 1;

【図6】従来の液処理装置の概略断面図である。FIG. 6 is a schematic sectional view of a conventional liquid processing apparatus.

【符号の説明】 1 セパレーター 2 砥粒溜り部 3 切粉回収部 4 ダーティタンク 5 クリーンタンク 21 第1ポンプ 22 第2ポンプ 37 第1回転磁石板 38 第2回転磁石板 41 回転駆動手段 42 分離装置 43 分離装置 152 底部 a 加工部 wf 液面 A 液処理装置 R1 液流入経路 S1 循環流[Description of Signs] 1 Separator 2 Abrasive grain collecting part 3 Chip collecting part 4 Dirty tank 5 Clean tank 21 First pump 22 Second pump 37 First rotating magnet plate 38 Second rotating magnet plate 41 Rotary driving means 42 Separator 43 Separation device 152 Bottom part a Processing part wf Liquid surface A Liquid treatment device R1 Liquid inflow path S1 Circulating flow

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】所定の液使用箇所に供給されることにより
鉄系金属の切粉が混入した使用後の液を第1タンクに回
収すると共に、この第1タンクを経て第2タンクに流入
した回収液を再び上記液使用箇所に供給する循環形式の
液処理装置において、 一部を上記第1タンクの液面より上に露出させて回転駆
動される回転磁石板と、 上記第1タンクの液面より上
方で上記回転磁石板に付着した切粉を分離させる分離装
置と、 上記第1タンク内底部の液を上記回転磁石板に向けて循
環させる循環流を発生させるポンプとを備えたことを特
徴とする液処理装置。
1. A used liquid mixed with iron-based metal chips by being supplied to a predetermined liquid use location is collected in a first tank, and flows into a second tank via the first tank. A circulation type liquid processing apparatus for supplying the recovered liquid to the liquid use point again, wherein a rotating magnet plate that is partly exposed above the liquid surface of the first tank and is driven to rotate; A separating device that separates chips attached to the rotating magnet plate above the surface; and a pump that generates a circulating flow that circulates the liquid at the bottom of the first tank toward the rotating magnet plate. Characteristic liquid processing equipment.
【請求項2】請求項1記載の液処理装置において、 上記第1タンクヘの液流入経路には、使用後の液が流入
する深底の異物溜まり部と、上記異物溜まり部に連続し
て設けられ浅底で底部に磁石が装着され上記液を上記第
1タンクに流出させる切粉回収部とが設けられているこ
とを特徴とする。
2. The liquid processing apparatus according to claim 1, wherein the liquid inflow path to the first tank is provided continuously with the deep bottom foreign matter reservoir into which the used liquid flows, and the foreign matter reservoir. And a chip collecting part for allowing the liquid to flow out to the first tank with a magnet attached to the bottom at a shallow bottom.
【請求項3】請求項1記載の液処理装置において、 上記第1タンクヘの液流入経路には、使用後の液に混入
する切粉を回収する磁石式セパレータが装着され、上記
ポンプは上記第1タンク内の液を吸入して上記循環流を
発生させる他、その吐出した液の一部を分流させて上記
セパレータに還流させるよう設置されていることを特徴
とする。
3. The liquid processing apparatus according to claim 1, wherein a magnetic separator for collecting chips mixed with the used liquid is mounted on the liquid inflow path to the first tank, and the pump is provided with the first pump. In addition to generating the circulation flow by sucking the liquid in one tank, a part of the discharged liquid is diverted and returned to the separator.
【請求項4】請求項1記載の液処理装置において、 一部を上記第2タンクの液面より上に露出させて回転駆
動される第2回転磁石板と、 上記第2タンクの液面より上方で上記第2回転磁石板か
ら切粉を分離させる第2分離装置と、 上記第2タンク内底部の液を上記第2回転磁石板に向け
て循環させる循環流を発生させる第2ポンプとを更に備
え、 上記回転磁石板と上記第2回転磁石板とは共通の駆動手
段により回転駆動されることを特徴とする。
4. The liquid processing apparatus according to claim 1, wherein a second rotary magnet plate is driven to rotate with a part thereof being exposed above a liquid surface of the second tank; A second separator for separating chips from the second rotary magnet plate above; and a second pump for generating a circulating flow for circulating the liquid in the bottom of the second tank toward the second rotary magnet plate. The rotating magnet plate and the second rotating magnet plate are further rotationally driven by a common driving unit.
JP13520397A 1997-05-26 1997-05-26 Liquid processing equipment Expired - Fee Related JP3603541B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13520397A JP3603541B2 (en) 1997-05-26 1997-05-26 Liquid processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13520397A JP3603541B2 (en) 1997-05-26 1997-05-26 Liquid processing equipment

Publications (2)

Publication Number Publication Date
JPH10328969A true JPH10328969A (en) 1998-12-15
JP3603541B2 JP3603541B2 (en) 2004-12-22

Family

ID=15146271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13520397A Expired - Fee Related JP3603541B2 (en) 1997-05-26 1997-05-26 Liquid processing equipment

Country Status (1)

Country Link
JP (1) JP3603541B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111451545A (en) * 2020-04-09 2020-07-28 安吉明道优术科技有限公司 Mechanical steel pipe perforating machine
CN111515752A (en) * 2020-05-07 2020-08-11 王雪峰 Numerical control lathe convenient to clean fuselage
CN115365884A (en) * 2022-09-22 2022-11-22 蒲勇 Alloy steel cutting machine tool for recycling cutting fluid

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111451545A (en) * 2020-04-09 2020-07-28 安吉明道优术科技有限公司 Mechanical steel pipe perforating machine
CN111451545B (en) * 2020-04-09 2022-10-11 青岛汇金通电力设备股份有限公司 Mechanical steel pipe perforating machine
CN111515752A (en) * 2020-05-07 2020-08-11 王雪峰 Numerical control lathe convenient to clean fuselage
CN115365884A (en) * 2022-09-22 2022-11-22 蒲勇 Alloy steel cutting machine tool for recycling cutting fluid
CN115365884B (en) * 2022-09-22 2024-05-17 深圳市德源科实业有限公司 Alloy steel cutting machine tool with cutting fluid recycled

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