JPH10326406A - 磁気ヘッドスライダおよびその製造方法 - Google Patents
磁気ヘッドスライダおよびその製造方法Info
- Publication number
- JPH10326406A JPH10326406A JP30172197A JP30172197A JPH10326406A JP H10326406 A JPH10326406 A JP H10326406A JP 30172197 A JP30172197 A JP 30172197A JP 30172197 A JP30172197 A JP 30172197A JP H10326406 A JPH10326406 A JP H10326406A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- head slider
- diamond
- carbon film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 24
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 9
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 9
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 21
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 18
- 239000011241 protective layer Substances 0.000 abstract description 16
- 239000000463 material Substances 0.000 abstract description 9
- 238000010494 dissociation reaction Methods 0.000 abstract description 3
- 230000005593 dissociations Effects 0.000 abstract description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 abstract description 3
- 239000002994 raw material Substances 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 87
- 238000012360 testing method Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 16
- 238000005299 abrasion Methods 0.000 description 11
- 239000010409 thin film Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000007373 indentation Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000010790 dilution Methods 0.000 description 3
- 239000012895 dilution Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000005001 rutherford backscattering spectroscopy Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30172197A JPH10326406A (ja) | 1997-03-28 | 1997-11-04 | 磁気ヘッドスライダおよびその製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7686597 | 1997-03-28 | ||
| JP9-76865 | 1997-03-28 | ||
| JP30172197A JPH10326406A (ja) | 1997-03-28 | 1997-11-04 | 磁気ヘッドスライダおよびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10326406A true JPH10326406A (ja) | 1998-12-08 |
| JPH10326406A5 JPH10326406A5 (enExample) | 2004-12-24 |
Family
ID=26417988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30172197A Pending JPH10326406A (ja) | 1997-03-28 | 1997-11-04 | 磁気ヘッドスライダおよびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10326406A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6722785B1 (en) * | 1999-06-25 | 2004-04-20 | Tdk Corporation | Fluid dynamic bearing |
| US6958888B2 (en) * | 2001-10-05 | 2005-10-25 | Headway Technologies, Inc. | Slider of thin-film magnetic head and method of manufacturing same |
| JP2014182869A (ja) * | 2013-03-15 | 2014-09-29 | Nhk Spring Co Ltd | ヘッドジンバルアセンブリ |
| CN111378927A (zh) * | 2020-04-20 | 2020-07-07 | 海南大学 | 一种敷设在弹性基底上的硬质薄膜结构及制备方法 |
-
1997
- 1997-11-04 JP JP30172197A patent/JPH10326406A/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6722785B1 (en) * | 1999-06-25 | 2004-04-20 | Tdk Corporation | Fluid dynamic bearing |
| US6958888B2 (en) * | 2001-10-05 | 2005-10-25 | Headway Technologies, Inc. | Slider of thin-film magnetic head and method of manufacturing same |
| JP2014182869A (ja) * | 2013-03-15 | 2014-09-29 | Nhk Spring Co Ltd | ヘッドジンバルアセンブリ |
| CN111378927A (zh) * | 2020-04-20 | 2020-07-07 | 海南大学 | 一种敷设在弹性基底上的硬质薄膜结构及制备方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041019 |
|
| A977 | Report on retrieval |
Effective date: 20070221 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070227 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20070626 |