JPH1029148A - Method of polishing and tool therefor - Google Patents

Method of polishing and tool therefor

Info

Publication number
JPH1029148A
JPH1029148A JP8185195A JP18519596A JPH1029148A JP H1029148 A JPH1029148 A JP H1029148A JP 8185195 A JP8185195 A JP 8185195A JP 18519596 A JP18519596 A JP 18519596A JP H1029148 A JPH1029148 A JP H1029148A
Authority
JP
Japan
Prior art keywords
polishing
workpiece
polishing tool
tool
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8185195A
Other languages
Japanese (ja)
Inventor
Noboru Usui
登 臼井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP8185195A priority Critical patent/JPH1029148A/en
Publication of JPH1029148A publication Critical patent/JPH1029148A/en
Withdrawn legal-status Critical Current

Links

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  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

PROBLEM TO BE SOLVED: To polish effectively and accurately complicated curved surface without changing and exchanging polishing tools. SOLUTION: This method makes a polishing tool 1 press against a to-be- machined work and rotate and if necessary rock to conduct the polishing work. In this case the polishing tool 1 provides a rubber portion 50 whose variation of hardness with respect to the thermal influence is large, so by controlling the temperature of rubber portion 50, the hardness of the rubber is adjusted, consequently, the contacting surface area is controlled accordingly.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、被加工物の加工面
に研磨工具を押し当て、被加工物及び/又は研磨工具を
回転させ、必要に応じそれに揺動を加え、て被加工物の
研磨を実行する研磨方法、及びこの研磨方法に用いる研
磨工具に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing tool which presses a polishing tool against a processing surface of a workpiece, rotates the workpiece and / or the polishing tool, and oscillates the polishing tool if necessary. The present invention relates to a polishing method for performing polishing and a polishing tool used for the polishing method.

【0002】[0002]

【従来の技術】[Prior art]

(第1の従来技術)第1の従来技術に係る研磨方法は、
ゴム硬度が70Hs以下の弾性体に多数の繊維や金属線
を埋め込んだ研磨工具を用いて被加工物の研磨を行なう
研磨方法であって、特開昭53−140693号公報に
開示されている。
(First Prior Art) The polishing method according to the first prior art is as follows.
A polishing method for polishing a workpiece using a polishing tool in which a number of fibers or metal wires are embedded in an elastic body having a rubber hardness of 70 Hs or less, which is disclosed in Japanese Patent Application Laid-Open No. 53-140693.

【0003】(第2の従来技術)第2の従来技術に係る
研磨方法は、球状の研磨工具を用い加工力の検出手段を
もうけ所望の加工力となるように制御する研磨方法であ
って、特開平4−244373号公報に開示されてい
る。
(Second Prior Art) A polishing method according to a second prior art is a polishing method which uses a spherical polishing tool and provides means for detecting a processing force to control the processing force to a desired processing force. It is disclosed in JP-A-4-244373.

【0004】(第3の従来技術)第3の従来技術に係る
研磨方法は、被加工物の面粗さにより、荒研磨、仕上げ
研磨の2段階研磨を行うことにより所望の外観品質を得
るという研磨方法である。より複雑な自由曲面を研磨す
る場合には、その曲面の形状精度を崩さないようにする
必要があるため、研磨工具の接触面積をさらに小さくし
たり、加工面を細かく分割してそれぞれ加工条件を変
え、形状の異なる何種類もの研磨工具を用いて研磨加工
していた。
(Third Prior Art) The polishing method according to the third prior art is to obtain a desired appearance quality by performing two-stage polishing of rough polishing and finish polishing depending on the surface roughness of a workpiece. This is a polishing method. When polishing a more complicated free-form surface, it is necessary to keep the accuracy of the shape of the curved surface.Therefore, the contact area of the polishing tool can be further reduced, and the processing conditions can be reduced by dividing the processing surface into smaller pieces. Instead, it was polished using several types of polishing tools having different shapes.

【0005】[0005]

【発明が解決しようとする課題】しかし、第1の従来技
術では繊維、金属線の磨耗、脱落により研磨加工中に研
磨条件が変わってしまうという問題があった。第2の従
来技術では加工力検出装置が必要であり、かつ加工力変
化の大きい場合形状精度が得られないと言った問題があ
った。このため、上記したいずれの従来技術において
も、自由曲面を有する光学レンズ、光学レンズ成形用
型、光学ミラー等を精度よく研磨することが実用上不可
能であった。
However, in the first prior art, there is a problem that the polishing conditions are changed during the polishing process due to the wear and falling off of the fibers and metal wires. The second prior art has a problem that a working force detection device is required, and the shape accuracy cannot be obtained when the working force change is large. For this reason, it has been practically impossible to accurately polish an optical lens having a free-form surface, a mold for molding an optical lens, an optical mirror, and the like with any of the above-described conventional techniques.

【0006】第3の従来技術では、荒研磨では除去量が
多いため、被加工物の形状を崩さないように、ゴム硬度
の高いものを用い、被加工物と研磨工具との接触面積を
小さくして研磨していた。また、除去量に応じ研磨パッ
トの砥粒の大きさ及びゴム硬度(接触面積)を変える必
要があった。接触面積を変えるには荷重を増加させるこ
とで可能であるが、この方法では形状精度が得られない
という欠点がある。除去量の少ない仕上げ研磨では短時
間化を図りかつ研磨力を高めるために、形状を崩さない
範囲で可能な限りゴム硬度を低くし接触面積を大きく取
る必要があり、形状によってゴム硬度の異なった研磨工
具を使い分けていた。
In the third prior art, since the removal amount is large in rough polishing, a material having a high rubber hardness is used so that the contact area between the workpiece and the polishing tool is reduced so as not to lose the shape of the workpiece. Had been polished. Further, it is necessary to change the size of the abrasive grains of the polishing pad and the rubber hardness (contact area) according to the removal amount. It is possible to change the contact area by increasing the load, but this method has a drawback that shape accuracy cannot be obtained. In finish polishing with a small amount of removal, in order to shorten the time and increase the polishing power, it is necessary to reduce the rubber hardness as much as possible and take a large contact area as long as the shape is not destroyed. They used different polishing tools.

【0007】また、被加工物がより複雑な形状の場合、
特に自由曲面の最小曲率が研磨工具の曲率より小さい場
合は、研磨工具と被加工物との接触面積が極端に大きく
なり形状精度を劣化させる要因となっていた。そこで、
研磨工具自体の形状を小さくする。または被加工物の曲
率に応じて研磨工具と研磨条件を組み合わせ研磨してい
た。
When the workpiece has a more complicated shape,
In particular, when the minimum curvature of the free-form surface is smaller than the curvature of the polishing tool, the contact area between the polishing tool and the workpiece becomes extremely large, which is a factor of deteriorating the shape accuracy. Therefore,
Reduce the shape of the polishing tool itself. Alternatively, polishing is performed by combining a polishing tool and polishing conditions in accordance with the curvature of the workpiece.

【0008】以上のことから第3の従来技術では、被加
工物の形状精度を確保するためには、ゴム硬度が異なる
何種類もの研磨工具が必要となり、研磨工具のコストア
ップ、研磨作業の複雑化、及び研磨加工時間の増大とい
う問題を有していた。
From the above, in the third prior art, in order to ensure the shape accuracy of the workpiece, several types of polishing tools having different rubber hardnesses are required, which increases the cost of the polishing tool and complicates the polishing operation. And increase in polishing time.

【0009】[0009]

【課題を解決するための手段】第1の発明に係る研磨方
法は、被加工物(3、4)の加工面に研磨工具(1)を
押し当て、前記被加工物(3、4)及び/又は前記研磨
工具(1)を回転させ、必要に応じそれに揺動を加え、
て前記被加工物(3、4)の研磨を実行する研磨方法に
おいて、前記研磨工具(1)として、ゴム硬度の熱変化
率が大きいゴム部分(50)を有する研磨工具(1)を
用い、前記ゴム部分(50)の温度を調節することによ
り前記ゴム部分(50)のゴム硬度を調節して、前記研
磨工具(1)と前記被加工物(3、4)との接触面積を
調節することを特徴とする。
According to a first aspect of the present invention, there is provided a polishing method, wherein a polishing tool (1) is pressed against a processing surface of a workpiece (3, 4), and the workpieces (3, 4) and And / or rotate the polishing tool (1) and add rocking to it if necessary,
In the polishing method for performing the polishing of the workpieces (3, 4), a polishing tool (1) having a rubber portion (50) having a large rate of change in rubber hardness is used as the polishing tool (1). The contact area between the polishing tool (1) and the workpiece (3, 4) is adjusted by adjusting the temperature of the rubber portion (50) to adjust the rubber hardness of the rubber portion (50). It is characterized by the following.

【0010】第2の発明に係る研磨方法は、第1の発明
に係る研磨方法において、研磨液の温度を調節するこ
と、前記ゴム部分に送風される空気の温度を調節するこ
と、又は抵抗線の発熱量を調節すること、により前記ゴ
ム部分(50)の温度を調節することを特徴とする。
The polishing method according to a second aspect of the present invention is the polishing method according to the first aspect, wherein the temperature of the polishing liquid is adjusted, the temperature of the air blown to the rubber portion is adjusted, or the resistance wire is adjusted. The temperature of the rubber portion (50) is adjusted by adjusting the calorific value of the rubber portion.

【0011】第3の発明に係る研磨工具は、被加工物
(3、4)の加工面に研磨工具(1)を押し当て、前記
被加工物(3、4)及び/又は前記研磨工具(1)を回
転させ、必要に応じそれに揺動を加え、て前記被加工物
研磨を実行する研磨方法に用いられる研磨工具におい
て、この研磨工具は、ゴム硬度の熱変化率が大きいゴム
部分(50)を備え、前記ゴム部分(50)の温度を調
節することにより前記ゴム部分(50)のゴム硬度を調
節して、前記被加工物(3、4)と前記研磨工具(1)
との接触面積が調節可能であることを特徴とする。
In the polishing tool according to a third aspect of the present invention, a polishing tool (1) is pressed against a processing surface of a workpiece (3, 4), and the workpiece (3, 4) and / or the polishing tool (3) is pressed. In the polishing tool used in the polishing method for performing the above-mentioned workpiece polishing by rotating 1) and swinging the workpiece as necessary, the polishing tool has a rubber portion (50) having a large thermal change rate of rubber hardness. ), The rubber hardness of the rubber portion (50) is adjusted by adjusting the temperature of the rubber portion (50), and the workpiece (3, 4) and the polishing tool (1) are adjusted.
Characterized in that the contact area with the contact is adjustable.

【0012】[0012]

【作用】ゴム部分の温度を低めて研磨工具の硬度を高め
ると、被加工物への接触面積を小さくでき、除去量が大
きい荒研磨での使用が可能となる。逆に、ゴム部分の温
度を高めて研磨工具の硬度を低めると、被加工物への接
触面積を大きくでき、仕上げ研磨への適応が可能とな
る。
When the hardness of the polishing tool is increased by lowering the temperature of the rubber portion, the contact area with the workpiece can be reduced, and it can be used in rough polishing with a large removal amount. Conversely, if the temperature of the rubber portion is increased to lower the hardness of the polishing tool, the contact area with the workpiece can be increased, and adaptation to finish polishing can be performed.

【0013】また、より複雑な形状においては加工中の
形状(曲率)に対応させ温度を調節(変化)させること
で、最適な接触面積での研磨が可能となり、精度よく研
磨をすることが可能となる。
Further, in a more complicated shape, by adjusting (changing) the temperature in accordance with the shape (curvature) being processed, it becomes possible to polish with an optimum contact area, and it is possible to polish accurately. Becomes

【0014】以上のように、本発明の研磨方法及び研磨
工具を用いると、ゴム部分の温度を調節してゴム硬度を
調節し、被加工物と研磨工具との接触面積を調節するこ
とで、複数の研磨工具の使い分けを不必要とし一の研磨
工具での研磨が可能となる。また、形状の変化に対して
も一の研磨工具で研磨が可能なことから研磨工具の削減
につながる。さらに、複雑な加工面形状を有する被加工
物の研磨においても研磨工具の削減、研磨工程簡素化及
び作業時間を短縮することができる。さらにまた、被加
工物の形状に応じ接触面積が調整できるため形状精度を
向上することができる。
As described above, by using the polishing method and the polishing tool of the present invention, the temperature of the rubber portion is adjusted to adjust the rubber hardness, and the contact area between the workpiece and the polishing tool is adjusted. It is not necessary to use a plurality of polishing tools properly, and polishing with one polishing tool becomes possible. In addition, since polishing can be performed with one polishing tool even when the shape is changed, the number of polishing tools is reduced. Further, even in the polishing of a workpiece having a complicated processed surface shape, the number of polishing tools can be reduced, the polishing process can be simplified, and the operation time can be reduced. Furthermore, since the contact area can be adjusted according to the shape of the workpiece, the shape accuracy can be improved.

【0015】[0015]

【発明の実施の形態】BEST MODE FOR CARRYING OUT THE INVENTION

(実施例1)実施例1は2段階研磨の場合の実施例であ
る。
(Embodiment 1) Embodiment 1 is an embodiment in the case of two-stage polishing.

【0016】図1は本実施例による半球状の研磨工具1
の断面図である。研磨工具1は半休状の形状を有してお
り、ニトリル・ブタジエン・ラバー(NBR)でできた
ゴム部分50を有する。
FIG. 1 shows a hemispherical polishing tool 1 according to this embodiment.
FIG. The polishing tool 1 has a semi-rest shape and has a rubber portion 50 made of nitrile butadiene rubber (NBR).

【0017】この研磨工具1を用い光学レンズを研磨す
る様子を図2に示す。2はプラスチックレンズ用の研磨
パットであり、3は被加工物であり、この実施例の場合
はプラスチック製の単焦点眼鏡レンズである。研磨パッ
ト2を貼り付けた研磨工具1及び取り付け治具5を被加
工物に2〜20Kgの任意の一定荷重で押しつけ、被加
工物3と研磨工具1及び取り付け治具5を逆回転させレ
ンズ外周から中心に向け螺旋または螺旋に揺動(振幅)
を加えた軌跡を描かせながら移動させ研磨を行う。
FIG. 2 shows how the polishing tool 1 is used to polish an optical lens. Reference numeral 2 denotes a polishing pad for a plastic lens, and reference numeral 3 denotes an object to be processed. In this embodiment, the lens is a plastic single-focus spectacle lens. The polishing tool 1 to which the polishing pad 2 is attached and the mounting jig 5 are pressed against the workpiece with an arbitrary constant load of 2 to 20 kg, and the workpiece 3 and the polishing tool 1 and the mounting jig 5 are rotated in reverse to rotate the lens periphery. Swinging spirally or spirally from the center to the center (amplitude)
Polishing is performed while moving while drawing a locus to which is added.

【0018】荒研磨では、研磨工具に荒研磨用の#12
00の砥粒のついた研磨パット2を貼り付け、加工開始
時に研磨液供給口6から供給される研磨液(又は水)の
温度を10℃に設定し研磨工具1自体のゴム硬度を60
Hsに高める。この研磨工具1を4Kgの一定荷重で被
加工物3に押しあて接触面積を約φ10(mm2)とし
研磨する。
In the rough polishing, a polishing tool # 12 for rough polishing is used.
The polishing pad 2 with abrasive grains of 00 is attached, the temperature of the polishing liquid (or water) supplied from the polishing liquid supply port 6 at the start of processing is set at 10 ° C., and the rubber hardness of the polishing tool 1 itself is set at 60 ° C.
Hs. The polishing tool 1 is pressed against the workpiece 3 with a constant load of 4 kg to make a contact area of about φ10 (mm 2).

【0019】一方、仕上げ研磨では研磨工具1に植毛タ
イプの研磨パット2を貼り付け研磨液供給口6から供給
される研磨液((株)フジミインコーポレーテッド製ポ
リプラ203Z)の温度を80℃に上げゴム硬度を40
Hsに低下させ荷重4Kgで押しあて接触面積を約φ3
0(mm2)と広くして研磨する。両研磨とも加工中の
接触面積を維持するため上記温度の研磨液を吐出し続け
行った。これにより研磨工具1を変更することなく、単
焦点眼鏡レンズとして十分な外観品質、形状精度を有す
る被加工物3が得られた。
On the other hand, in the final polishing, the flocking pad 2 of the flocking type is attached to the polishing tool 1 and the temperature of the polishing liquid (Polyplastic 203Z manufactured by Fujimi Incorporated) supplied from the polishing liquid supply port 6 is raised to 80 ° C. Rubber hardness 40
Hs and press with 4Kg load to reduce the contact area to about φ3
Polishing with a width of 0 (mm2). In both polishing operations, the polishing liquid at the above temperature was continuously discharged in order to maintain the contact area during processing. As a result, the workpiece 3 having sufficient appearance quality and shape accuracy as a single focus spectacle lens was obtained without changing the polishing tool 1.

【0020】(比較例1)実施例1で用いた研磨工具1
を使用し、荒研磨は同一条件で行い、仕上げ研磨での荷
重を12Kg、研磨液の温度10℃とし実施例1と同様
の被加工物3の研磨を実施した。仕上げ研磨時の接触面
積は約φ30(mm2)と同面積となる。しかし、形状
精度が著しく崩れてしまい一枚のレンズ内での度数がば
らつき、規格内の精度で得ることができなかった。ま
た、加工中に研磨パット2が破けてしまい研磨条件の統
一が難しく、繰り返し同結果を得ることが困難であっ
た。
(Comparative Example 1) Polishing tool 1 used in Example 1
Rough polishing was performed under the same conditions, the load in the final polishing was set to 12 kg, and the temperature of the polishing liquid was set to 10 ° C., and the workpiece 3 was polished in the same manner as in Example 1. The contact area at the time of finish polishing is the same as about φ30 (mm 2). However, the shape precision was remarkably degraded, and the power within one lens fluctuated, and it was not possible to obtain the precision within the standard. Further, the polishing pad 2 was broken during processing, making it difficult to unify polishing conditions, and it was difficult to repeatedly obtain the same result.

【0021】同様に研磨荷重4Kg、研磨液の温度10
℃で仕上げ研磨を行った場合、形状精度は得られるが、
研磨時間が大幅にアップし生産性が低下する。
Similarly, the polishing load is 4 kg and the temperature of the polishing liquid is 10 kg.
When the final polishing is performed at ℃, shape accuracy can be obtained,
Polishing time is greatly increased and productivity is reduced.

【0022】(実施例2)実施例2は、より複雑な形状
を有する被加工物を研磨する場合の実施例である。
(Embodiment 2) Embodiment 2 is an embodiment in which a workpiece having a more complicated shape is polished.

【0023】本実施例の被加工物4は、複雑な形状をし
たプラスチック製多焦点眼鏡レンズである。図3は曲率
が小さい部分を研磨する様子を示し、図4は曲率が大き
い部分を研磨する様子を示したものである。本実施例で
は、ゴム硬度の調節は、研磨液の温度を調節するのでは
なく、研磨工具のゴム部分に送風される空気の温度を調
節することいより行った。そのため、ゴム部分の温度を
迅速に変化させることが容易であり、曲率の変化に即応
してゴム硬度を調節することができ、複雑な形状を有す
る被加工物を精度よく研磨することが可能となった。
The workpiece 4 of this embodiment is a plastic multifocal spectacle lens having a complicated shape. FIG. 3 shows a state where a portion having a small curvature is polished, and FIG. 4 shows a state where a portion having a large curvature is polished. In this example, the rubber hardness was adjusted not by adjusting the temperature of the polishing liquid but by adjusting the temperature of air blown to the rubber portion of the polishing tool. Therefore, it is easy to quickly change the temperature of the rubber portion, it is possible to adjust the rubber hardness in response to the change in curvature, and it is possible to accurately polish a workpiece having a complicated shape. became.

【0024】また、本実施例のプラスチック製眼鏡レン
ズは熱に弱いため80℃を越える研磨液温度を用いる
と、その熱により形状が崩れる可能性があり、温度を極
端に上げゴム硬度を変更することは不可能である。この
ため加工中にゴム硬度の変更が必要な時は送風による温
度変更手段が最適である。表面に植毛タイプの研磨パッ
ト2を貼り付け研磨液供給口6からは常温(20度)の
研磨液を供給する。研磨液の温度を常温にすることで多
焦点眼鏡レンズ4の表面温度を80度以下に維持してい
る。このような最小曲率100R以下で最大曲率が50
0R以上からなる複雑な形状である場合、曲率が小さい
部分の研磨(図3)は送風口7から5℃の冷風を送風し
荷重8Kgで押しあて接触面積を約φ20(mm2)と
小さくし研磨する。曲率が大きくなる部分(図4)で
は、その曲率に対応し送風温度を100℃まで上昇させ
接触面積を約φ50(mm2)まで変化させ研磨する。
この方法を繰り返すことにより研磨工具の交換なしで全
面研磨可能となり高精度な研磨面が得られた。
Further, since the plastic spectacle lens of this embodiment is weak to heat, if a polishing liquid temperature exceeding 80 ° C. is used, the shape may be lost due to the heat, and the temperature is extremely increased to change the rubber hardness. It is impossible. Therefore, when it is necessary to change the rubber hardness during processing, a means for changing the temperature by blowing air is optimal. A flocked polishing pad 2 is adhered to the surface, and a polishing liquid at room temperature (20 ° C.) is supplied from a polishing liquid supply port 6. By keeping the temperature of the polishing liquid at room temperature, the surface temperature of the multifocal spectacle lens 4 is maintained at 80 degrees or less. When the minimum curvature is 100R or less, the maximum curvature is 50.
In the case of a complicated shape composed of 0R or more, polishing of a portion having a small curvature (FIG. 3) is performed by blowing cold air at 5 ° C. from the blower opening 7 and pressing it with a load of 8 kg to reduce the contact area to about φ20 (mm 2). I do. In the portion where the curvature is large (FIG. 4), the air is blown up to 100 ° C. corresponding to the curvature and the contact area is changed to about φ50 (mm 2) for polishing.
By repeating this method, the entire surface can be polished without changing the polishing tool, and a highly accurate polished surface was obtained.

【0025】なお、研磨工具1の形状は半球状に限らず
球状または被加工物4の形状と加工条件により任意の
(半)非球面形状でもよい。さらに、研磨工具1のゴム
部分の温度調節を、ニクロム線、コイル等の抵抗線の発
熱量を調節すること、によって行なうこともできる。
The shape of the polishing tool 1 is not limited to a hemispherical shape, but may be a spherical shape or an arbitrary (semi-) aspherical shape depending on the shape of the workpiece 4 and processing conditions. Further, the temperature of the rubber portion of the polishing tool 1 can be adjusted by adjusting the amount of heat generated by a resistance wire such as a nichrome wire or a coil.

【0026】[0026]

【発明の効果】以上述べたように本発明の研磨方法及び
研磨工具によれば、2種類以上の研磨工具が必要であっ
た2段階研磨及び複雑な形状を有する被加工物の研磨に
おいて、研磨工具の変更及び交換なしで研磨を行なうこ
とが可能となった。これにより研磨工具の削減(コスト
ダウン)、研磨作業の簡略化、及び作業時間の短縮が図
られた。
As described above, according to the polishing method and the polishing tool of the present invention, in the two-stage polishing and the polishing of a workpiece having a complicated shape, which required two or more types of polishing tools, polishing is performed. Polishing can be performed without changing or changing tools. As a result, reduction in the number of polishing tools (cost reduction), simplification of the polishing operation, and shortening of the operation time were achieved.

【0027】さらに自由曲面の研磨の場合、研磨加工中
の被加工物の形状等に応じ接触面積が調整できるため形
状精度の向上という効果も有する。
Furthermore, in the case of polishing a free-form surface, the contact area can be adjusted according to the shape of the workpiece to be polished and the like, so that there is also an effect of improving the shape accuracy.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 実施例1の半球状研磨工具の断面図。FIG. 1 is a cross-sectional view of a hemispherical polishing tool according to a first embodiment.

【図2】 実施例1において単焦点眼鏡レンズを研磨す
る様子を示した図。
FIG. 2 is a diagram showing a state of polishing a single focus spectacle lens in the first embodiment.

【図3】 実施例2において多焦点眼鏡レンズの曲率の
小さい部分を研磨する様子を示した図。
FIG. 3 is a diagram showing a state in which a portion of a multifocal spectacle lens having a small curvature is polished in Example 2.

【図4】 実施例2において多焦点眼鏡レンズの曲率の
大きい部分を研磨する様子を示した図。
FIG. 4 is a diagram showing a state in which a portion of a multifocal spectacle lens having a large curvature is polished in Example 2.

【符号の説明】[Explanation of symbols]

1 研磨工具 3、4 被加工物 7 送風手段 50 ゴム部分 DESCRIPTION OF SYMBOLS 1 Polishing tool 3, 4 Workpiece 7 Blowing means 50 Rubber part

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 被加工物(3、4)の加工面に研磨工具
(1)を押し当て、前記被加工物(3、4)及び/又は
前記研磨工具(1)を回転させ、必要に応じそれに揺動
を加え、て前記被加工物(3、4)の研磨を実行する研
磨方法において、 前記研磨工具(1)として、ゴム硬度の熱変化率が大き
いゴム部分(50)を有する研磨工具(1)を用い、 前記ゴム部分(50)の温度を調節することにより前記
ゴム部分(50)のゴム硬度を調節して、前記研磨工具
(1)と前記被加工物(3、4)との接触面積を調節す
ることを特徴とする研磨方法。
1. A polishing tool (1) is pressed against a processing surface of a workpiece (3, 4) to rotate said workpiece (3, 4) and / or said polishing tool (1), The polishing method according to claim 1, wherein said polishing tool (1) has a rubber portion (50) having a large thermal change rate of rubber hardness as said polishing tool (1). Using the tool (1), adjusting the temperature of the rubber portion (50) to adjust the rubber hardness of the rubber portion (50) so that the polishing tool (1) and the workpiece (3, 4) A polishing method characterized by adjusting the contact area with the polishing.
【請求項2】 請求項1に記載の研磨方法において、 研磨液の温度を調節すること、前記ゴム部分に送風され
る空気の温度を調節すること、又は抵抗線の発熱量を調
節すること、により前記ゴム部分(50)の温度を調節
することを特徴とする研磨方法。
2. The polishing method according to claim 1, wherein the temperature of the polishing liquid is adjusted, the temperature of air blown to the rubber portion is adjusted, or the calorific value of the resistance wire is adjusted. A polishing method, wherein the temperature of the rubber portion (50) is adjusted by the following method.
【請求項3】 被加工物(3、4)の加工面に研磨工具
(1)を押し当て、前記被加工物(3、4)及び/又は
前記研磨工具(1)を回転させ、必要に応じそれに揺動
を加え、て前記被加工物研磨を実行する研磨方法に用い
られる研磨工具において、 この研磨工具は、ゴム硬度の熱変化率が大きいゴム部分
(50)を備え、 前記ゴム部分(50)の温度を調節することにより前記
ゴム部分(50)のゴム硬度を調節して、前記被加工物
(3、4)と前記研磨工具(1)との接触面積が調節可
能であることを特徴とする研磨工具。
3. A polishing tool (1) is pressed against a processing surface of a workpiece (3, 4) to rotate the workpiece (3, 4) and / or the polishing tool (1), and A polishing tool used in a polishing method for performing the workpiece polishing by oscillating the polishing tool accordingly, the polishing tool includes a rubber portion (50) having a large thermal change rate of rubber hardness; The contact area between the workpiece (3, 4) and the polishing tool (1) can be adjusted by adjusting the temperature of the rubber part (50) by adjusting the temperature of the rubber part (50). A characteristic polishing tool.
JP8185195A 1996-07-15 1996-07-15 Method of polishing and tool therefor Withdrawn JPH1029148A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8185195A JPH1029148A (en) 1996-07-15 1996-07-15 Method of polishing and tool therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8185195A JPH1029148A (en) 1996-07-15 1996-07-15 Method of polishing and tool therefor

Publications (1)

Publication Number Publication Date
JPH1029148A true JPH1029148A (en) 1998-02-03

Family

ID=16166530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8185195A Withdrawn JPH1029148A (en) 1996-07-15 1996-07-15 Method of polishing and tool therefor

Country Status (1)

Country Link
JP (1) JPH1029148A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6527632B1 (en) 1999-12-01 2003-03-04 Gerber Coburn Optical, Inc. Lap having a layer conformable to curvatures of optical surfaces on lenses and a method for finishing optical surfaces
EP1366858A1 (en) * 2001-01-05 2003-12-03 Seiko Epson Corporation Polisher and polishing method
WO2023032489A1 (en) * 2021-09-03 2023-03-09 ホヤ レンズ タイランド リミテッド Method for polishing spectacle lens, and method for manufacturing spectacle lens

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6527632B1 (en) 1999-12-01 2003-03-04 Gerber Coburn Optical, Inc. Lap having a layer conformable to curvatures of optical surfaces on lenses and a method for finishing optical surfaces
EP1366858A1 (en) * 2001-01-05 2003-12-03 Seiko Epson Corporation Polisher and polishing method
EP1366858A4 (en) * 2001-01-05 2006-03-15 Seiko Epson Corp Polisher and polishing method
WO2023032489A1 (en) * 2021-09-03 2023-03-09 ホヤ レンズ タイランド リミテッド Method for polishing spectacle lens, and method for manufacturing spectacle lens

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