JPH10275825A - Package - Google Patents

Package

Info

Publication number
JPH10275825A
JPH10275825A JP7942097A JP7942097A JPH10275825A JP H10275825 A JPH10275825 A JP H10275825A JP 7942097 A JP7942097 A JP 7942097A JP 7942097 A JP7942097 A JP 7942097A JP H10275825 A JPH10275825 A JP H10275825A
Authority
JP
Japan
Prior art keywords
electrically connected
adhesive
package
base
connection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7942097A
Other languages
Japanese (ja)
Inventor
Itsuo Watanabe
伊津夫 渡辺
Kenzo Takemura
賢三 竹村
Aizo Kaneda
愛三 金田
Noriyuki Taguchi
矩之 田口
Noburu Kikuchi
宣 菊地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7942097A priority Critical patent/JPH10275825A/en
Publication of JPH10275825A publication Critical patent/JPH10275825A/en
Pending legal-status Critical Current

Links

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  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To simplify a packaging process by a method, wherein a connection electrode protruding from the one surface of a base is electrically connected to a conductor circuit formed on the other surface of the base, where a semiconductor is connected in a flip-chip connection manner through bonding agent, and the connection electrode is electrically connected to a motherboard through the intermediary of adhesive agent. SOLUTION: A conductor circuit 2, formed on the one surface of a base 3 which is formed of a high-molecular film of polyimide or polyester and mounted with an electronic part 1, such as a semiconductor, is electrically connected to an electrode 7 which is made to protrude from the other surface of the base 3 facing the electrode 7 of a mother board 8 which is formed of the same material with the base 3 through the intermediary of an adhesive agent 5 of thermosetting resin or thermoplastic resin. By this setup, an inner stresses inducing in reliability tests, such as a thermal shock test can be absorbed by the adhesive agent 5, a packaging process is simplified as a result, and a package which is improved in connection reliability is obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電子部品が搭載さ
れた基材表面の導体回路と導通した前記基材の他方の表
面から突出した接続電極を接着剤を介して、マザーボー
ドと電気的に導通させたパッケージに関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for electrically connecting a connection electrode protruding from the other surface of a base material on a surface of the base material on which an electronic component is mounted to the mother board through an adhesive. The present invention relates to a package that is made conductive.

【0002】[0002]

【従来の技術】従来、半導体などの電子部品は、ワイヤ
ボンディング法やはんだバンプによるフリップチップ接
続によって電子回路基板に搭載されている。しかしなが
ら、前者の方法では、半導体電極及びワイヤを保護する
目的でトランスファ成形法によるエポキシ樹脂封止を、
後者の方法では、半導体と基板の熱膨張係数の差に基づ
く熱応力によるはんだ接続部のクラック発生を抑制する
ために、流動性の良いエポキシ樹脂を半導体と基板の隙
間に注入するアンダフィル封止を行う必要があり、パッ
ケージ工程が繁雑あるという問題がある。また、このよ
うな電子回路基板を別の電子回路基板に接続する際に
は、電子部品が搭載された基材表面の導体回路と導通し
たはんだボールをパッケージ裏面に設け、このはんだボ
ールを溶融してマザーボードと電気的に接続するいわゆ
るBGA方式が用いられている。従来、半導体などの電
子部品が搭載された基板をプリント基板のようなマザー
ボードに接続する際には、電子部品が搭載された基板表
面の導体回路と導通したはんだボールをパッケージ裏面
に設け、このはんだボールを溶融してマザーボードと電
気的に接続するいわゆるBGA方式が用いられている。
しかしながら、従来のBGA方式では、パッケージの電
子部品が搭載された基板が半導体などの電子部品実装の
際、基板との熱膨張係数差に基づく応力によって反るた
め、パッケージをマザーボードへ実装する際には、パッ
ケージ裏面のはんだボールとマザーボードの接続電極が
充分に接触できなという問題があった。また、接触でき
た場合においても電子部品が搭載されたパッケージと、
マザーボード間の熱膨張係数差に基づく応力によっては
んだ接続部にクラックが生じ、接続不良が生じるといっ
た問題があった。さらに、はんだボールの大きさは50
0〜800ミクロンと大きく、接続密度を大きくできな
いといった問題もあった。
2. Description of the Related Art Conventionally, electronic components such as semiconductors are mounted on an electronic circuit board by a wire bonding method or flip-chip connection using solder bumps. However, in the former method, epoxy resin encapsulation by transfer molding method for the purpose of protecting semiconductor electrodes and wires,
In the latter method, underfill sealing in which epoxy resin with good fluidity is injected into the gap between the semiconductor and the substrate in order to suppress the occurrence of cracks in the solder joint due to thermal stress based on the difference in thermal expansion coefficient between the semiconductor and the substrate. And there is a problem that the packaging process is complicated. Also, when connecting such an electronic circuit board to another electronic circuit board, a solder ball conducting to a conductor circuit on the surface of the substrate on which the electronic component is mounted is provided on the back surface of the package, and the solder ball is melted. A so-called BGA method is used in which the device is electrically connected to a motherboard. Conventionally, when connecting a board on which electronic components such as semiconductors are mounted to a motherboard such as a printed circuit board, solder balls that are electrically connected to conductor circuits on the surface of the board on which the electronic components are mounted are provided on the back of the package, A so-called BGA system in which balls are melted and electrically connected to a motherboard is used.
However, in the conventional BGA method, when a board on which electronic components of a package are mounted is mounted on an electronic component such as a semiconductor, the board is warped due to a stress based on a difference in thermal expansion coefficient from the substrate. However, there is a problem that the solder balls on the back surface of the package and the connection electrodes of the motherboard cannot be sufficiently contacted. In addition, even when contact is made, a package on which electronic components are mounted,
There is a problem that cracks occur in the solder joints due to the stress based on the thermal expansion coefficient difference between the motherboards, resulting in poor connection. Furthermore, the size of the solder ball is 50
There is also a problem that the connection density cannot be increased because of the large size of 0 to 800 microns.

【0003】[0003]

【発明が解決しようとする課題】本発明は、以上の従来
の問題点に鑑みてなされたものであって、パッケージ工
程が簡易で接続信頼性が高く、高接続密度のパッケージ
を提供することを目的とするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned conventional problems, and an object of the present invention is to provide a package having a simple connection process, high connection reliability, and high connection density. It is the purpose.

【0004】[0004]

【課題を解決するための手段】本発明のパッケ−ジは、
半導体が接着剤を介してフリップチップ接続された基材
表面の導体回路と導通しかつ前記基材の他方の表面から
突出した接続電極を、接着剤を介してマザーボードと電
気的に導通させたことを特徴とする。本発明者らは、従
来のワイヤボンディングやはんだボールによって電気的
に導通させた半導体パッケージと異なり、半導体が接着
剤を介してフリップチップ接続された基材表面の導体回
路と導通しかつ前記基材の他方の表面から突出した接続
電極を接着剤を介して、マザーボードと電気的に導通さ
せることによって、従来の問題を解決するパッケージ工
程が簡易で接続信頼性が高く、高接続密度のパッケージ
を見い出した。
According to the present invention, there is provided a package comprising:
The semiconductor is electrically connected to a conductor circuit on the surface of the substrate flip-chip connected via an adhesive, and the connection electrode protruding from the other surface of the substrate is electrically connected to the motherboard via the adhesive. It is characterized by. The present inventors have found that, unlike a conventional semiconductor package electrically connected by wire bonding or solder balls, a semiconductor is electrically connected to a conductor circuit on the surface of a substrate which is flip-chip connected via an adhesive and the substrate By connecting the connection electrodes protruding from the other surface to the motherboard via an adhesive, the package process that solves the conventional problems is simplified, the connection reliability is high, and a package with a high connection density is found. Was.

【0005】[0005]

【発明の実施の形態】以下、図面を用いて本発明を説明
する。本発明の電子部品1が搭載された基材3表面の導
体回路2と導通した前記基材3の他方の表面から突出し
た接続電極4は、電子部品1が搭載された基材3表面の
導体回路2と導通し、図1の如く表面から突出していれ
ば良く、電極の材質として銅、金、ニッケル、はんだな
どの電気抵抗が低い金属が用いられる。この接続電極4
の基材3表面からの突出量は、接着剤の厚み、突出電極
の形成性を考慮すると100ミクロン以下が好ましい。
さらに好ましくは、50ミクロン以下が好ましい。本発
明の電子部品1搭載された基材3及びマザーボード8と
しては、ポリイミド、ポリエステルなどの高分子フィル
ムやポリイミド、エポキシやシアネートエステル系樹脂
とガラスクロスから作成されるリジット基板が用いられ
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. The connection electrode 4 that protrudes from the other surface of the substrate 3 that is electrically connected to the conductor circuit 2 on the surface of the substrate 3 on which the electronic component 1 is mounted is a conductor on the surface of the substrate 3 on which the electronic component 1 is mounted. It suffices if it is electrically connected to the circuit 2 and protrudes from the surface as shown in FIG. 1, and a metal having a low electric resistance such as copper, gold, nickel or solder is used as a material of the electrode. This connection electrode 4
Is preferably 100 μm or less in consideration of the thickness of the adhesive and the formability of the protruding electrode.
More preferably, it is 50 microns or less. As the base material 3 and the mother board 8 on which the electronic component 1 of the present invention is mounted, a rigid film made of a polymer film such as polyimide or polyester, or a glass cloth made of polyimide, epoxy or cyanate ester-based resin is used.

【0006】本発明の接着剤5としては、エポキシ系、
ポリイミド系、シアネートエステル系、フェノキシ系、
ウレタン系、ポリスチレン系、アクリル系樹脂などの熱
硬化性樹脂や熱可塑性樹脂を用いることができ、この中
でも特に、エポキシ系樹脂は接着性、耐熱性に優れるこ
とから好適に用いられる。エポキシ系樹脂として、エピ
クロルヒドリンとビスフェノールAやF、ADなどから
誘導されるビスフェノール型エポキシ樹脂、エピクロル
ヒドリンとフェノールノボラックやクレゾールノボラッ
クから誘導されるエポキシノボラック樹脂やナフタレン
環を含んだ骨格を有するナフタレン環を含んだ骨格を有
するナフタレン系エポキシ樹脂、グリシジルアミン、グ
リシジルエステル、ビフェニル、脂環式などの1分子中
に2個以上のグリシジル基を有する各種のエポキシ化合
物などを、単独にあるいは2種以上を混合して用いるこ
とが可能である。これらのエポキシ樹脂には、速硬化性
と保存安定性を得る目的でイミダゾール系、ヒドラジド
系、三フッ化ホウ素−アミン錯体、スルホニウム塩、ア
ミンイミド、ポリアミンの塩、ジシアンジアミド等の潜
在硬化剤を混合することが好適である。潜在硬化剤とし
ては、イミダゾール系、ヒドラジド系、三フッ化ホウ素
−アミン錯体、スルホニウム塩、アミンイミド、ポリア
ミンの塩、ジシアンジアミド等及びこれらの変性物があ
り、これらは単独あるいは2種以上の混合体として使用
できる。特に、エポキシ化合物とアミン化合物またはエ
ポキシ化合物、アミン化合物と活性水素化合物の各成分
を反応させたアミンアダクト型の潜在性硬化剤が速硬化
性、保存性の点で好適である。
As the adhesive 5 of the present invention, an epoxy-based adhesive,
Polyimide, cyanate ester, phenoxy,
Thermosetting resins such as urethane-based, polystyrene-based, and acrylic-based resins and thermoplastic resins can be used, and among them, epoxy-based resins are particularly preferably used because of their excellent adhesiveness and heat resistance. Epoxy resins include bisphenol-type epoxy resins derived from epichlorohydrin and bisphenol A, F, AD, etc., epoxy novolak resins derived from epichlorohydrin and phenol novolak or cresol novolak, and naphthalene rings having a skeleton containing naphthalene rings. Naphthalene-based epoxy resins having a skeletal skeleton, various epoxy compounds having two or more glycidyl groups in one molecule, such as glycidylamine, glycidyl ester, biphenyl, alicyclic, etc., alone or as a mixture of two or more. Can be used. These epoxy resins are mixed with a latent curing agent such as imidazole, hydrazide, boron trifluoride-amine complex, sulfonium salt, amine imide, polyamine salt, dicyandiamide, etc. for the purpose of obtaining fast curing property and storage stability. Is preferred. Examples of the latent curing agent include imidazole-based, hydrazide-based, boron trifluoride-amine complex, sulfonium salt, amine imide, polyamine salt, dicyandiamide, and the like, and modified products thereof. Can be used. In particular, an amine adduct-type latent curing agent obtained by reacting an epoxy compound with an amine compound or an epoxy compound, or an amine compound and an active hydrogen compound, is suitable in terms of rapid curability and storage stability.

【0007】本発明のエポキシ樹脂を主成分とする接着
剤は、エポキシ樹脂100重量部に対して、潜在硬化剤
1〜200重量部混合することによって作製できる。接
着剤は、熱衝撃試験などの環境下で生じる接続部の熱応
力を吸収あるいは緩和する上で低弾性率を示すものが好
適であり、溶融粘度を考慮すると接着後の40℃での弾
性率が、100〜2000MPaである接着剤が特に好
適である。接着後の40℃での弾性率が100〜200
0MPaになるようにするために、接着剤には分子量2
0万以上のアクリルゴムを配合することができる。ゴム
成分の配合量が多くなると弾性率が低下し、内部応力緩
和には有効であるが、接続電極間の保持力が充分でなく
なり、また、40wt%を越えると接続時の溶融粘度も
高くなり、接続電極間の電気的導通を妨げるのでゴム成
分の配合は、15〜40tw%程度が好ましい。また、
この接着剤にはフィルム形成性をより容易にするため
に、フェノキシ樹脂などの熱可塑性樹脂を配合すること
もできる。特に、フェノキシ樹脂は、エポキシ樹脂と構
造が類似しているため、エポキシ樹脂との相溶性、接着
性に優れるなどの特徴を有するので好ましい。
The adhesive of the present invention containing an epoxy resin as a main component can be prepared by mixing 1 to 200 parts by weight of a latent curing agent with respect to 100 parts by weight of an epoxy resin. The adhesive preferably has a low modulus of elasticity in absorbing or relaxing the thermal stress of the connection part generated in an environment such as a thermal shock test, and the elastic modulus at 40 ° C. after bonding in consideration of the melt viscosity. However, an adhesive having a pressure of 100 to 2000 MPa is particularly suitable. The elastic modulus at 40 ° C. after bonding is 100 to 200.
In order to obtain 0 MPa, the adhesive has a molecular weight of 2
More than 100,000 acrylic rubbers can be compounded. If the compounding amount of the rubber component increases, the elastic modulus decreases, which is effective in relieving internal stress. However, the holding force between the connection electrodes becomes insufficient, and if it exceeds 40 wt%, the melt viscosity at the time of connection increases. In order to prevent electrical conduction between the connection electrodes, the rubber component is preferably blended at about 15 to 40 tw%. Also,
A thermoplastic resin such as a phenoxy resin can be added to the adhesive to make the film formability easier. In particular, the phenoxy resin is preferable because it has a similar structure to the epoxy resin, and has characteristics such as excellent compatibility with the epoxy resin and excellent adhesiveness.

【0008】本発明の接着剤5には、接続電極の高さば
らつきを吸収するために、異方導電性を積極的に付与す
る目的で導電粒子6を分散することもできる。本発明に
おいて導電粒子6は、例えばAu、Ni、Ag、Cu、
Wやはんだなどの金属粒子またはこれらの金属粒子表面
に、金やパラジウムなどの薄膜をめっきや蒸着によって
形成した金属粒子であり、ポリスチレンなどの高分子の
球状の核材に、Ni、Cu、Au、はんだ等の導電層を
設けた導電粒子を用いることができる。粒径は、基板の
電極の最小の間隔よりも小さいことが必要で、電極の高
さばらつきがある場合、高さばらつきよりも大きいこと
が好ましく、1μm〜10μmが好ましい。また、接着
剤に分散される導電粒子量は、0.01〜30体積%で
あり、好ましくは0.1〜15体積%である。本発明の
フィルム状接着剤の形成は、エポキシ樹脂、フェノキシ
樹脂、潜在性硬化剤、導電粒子などからなる接着剤組成
物を有機溶剤に溶解あるいは分散により液状化して、剥
離性基材上に塗布し、硬化剤の活性温度以下で溶剤を除
去することにより行われる。
In the adhesive 5 of the present invention, conductive particles 6 can be dispersed for the purpose of positively imparting anisotropic conductivity in order to absorb variations in height of the connection electrodes. In the present invention, the conductive particles 6 include, for example, Au, Ni, Ag, Cu,
Metal particles such as W and solder or metal particles formed by plating or vapor-depositing a thin film such as gold or palladium on the surface of these metal particles. Ni, Cu, Au Alternatively, conductive particles provided with a conductive layer such as solder can be used. The particle size must be smaller than the minimum distance between the electrodes on the substrate, and if there is a variation in the height of the electrodes, it is preferably larger than the variation in height, and more preferably 1 μm to 10 μm. The amount of the conductive particles dispersed in the adhesive is 0.01 to 30% by volume, and preferably 0.1 to 15% by volume. The film adhesive of the present invention is formed by dissolving or dispersing an adhesive composition comprising an epoxy resin, a phenoxy resin, a latent curing agent, and conductive particles in an organic solvent or by dispersing the adhesive composition on an exfoliable substrate. This is performed by removing the solvent below the activation temperature of the curing agent.

【0009】接着剤5による接続は、加熱、加圧によっ
て行うことができる。例えば、電子部品が搭載された基
材表面の導体回路を導通した前記基材の他方の表面から
突出した接続電極4とマザーボードの電極7を接着剤5
を介して対向させ、電子部品が搭載された基材側から1
80℃、30kg/cm2、20秒間加熱、加圧して電
気的に導通させることができる。
The connection by the adhesive 5 can be performed by heating and pressing. For example, the connection electrodes 4 protruding from the other surface of the base material on which the conductive circuits on the surface of the base material on which the electronic components are mounted are electrically connected to the electrodes 7 of the motherboard are bonded with an adhesive 5.
From the substrate side on which the electronic components are mounted.
Electrical conduction can be achieved by heating and pressing at 80 ° C., 30 kg / cm 2 for 20 seconds.

【0010】[0010]

【発明の効果】以上のように本発明によれば、従来のは
んだボールによって電気的に導通させたパッケージと異
なり、電子部品が搭載された基材表面の導体回路と導通
した前記基材の他方の表面から突出した接続電極を接着
剤を介して、マザーボードと電気的に導通させているた
め、接着剤によって熱衝撃試験などの信頼性試験におい
て生じる内部応力を吸収でき、結果として接続信頼性が
向上したパッケージが得られる。また、前記突出電極
は、従来のはんだボールに比べ、小さくすることができ
るため、高接続密度のパッケージを提供することができ
る。
As described above, according to the present invention, unlike the conventional package electrically connected by the solder balls, the other of the base which is electrically connected to the conductor circuit on the surface of the base on which the electronic component is mounted. Since the connection electrodes protruding from the surface are electrically connected to the motherboard via an adhesive, the adhesive can absorb internal stress generated in reliability tests such as thermal shock tests, resulting in improved connection reliability. An improved package is obtained. Further, since the projecting electrodes can be made smaller than conventional solder balls, a package having a high connection density can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明のパッケ−ジの一実施例の断面図であ
る。
FIG. 1 is a sectional view of one embodiment of a package of the present invention.

【符号の説明】[Explanation of symbols]

1.電子部品 2.導体回路 3.基材 4.接続電極 5.接着剤 6.導電粒子 7.電極 8.マザーボード 1. Electronic components 2. 2. Conductor circuit Base material 4. Connection electrode 5. Adhesive 6. Conductive particles 7. Electrode 8. Motherboard

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田口 矩之 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 (72)発明者 菊地 宣 茨城県つくば市和台48 日立化成工業株式 会社筑波開発研究所内 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor Noriyuki Taguchi 48 Wadai, Tsukuba, Ibaraki Prefecture, Hitachi Chemical Co., Ltd. Inside Tsukuba Development Laboratory Co., Ltd. Tsukuba Development Laboratory

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 半導体が接着剤を介してフリップチップ
接続された基材表面の導体回路と導通しかつ前記基材の
他方の表面から突出した接続電極を、接着剤を介してマ
ザーボードと電気的に導通させたことを特徴とするパッ
ケージ。
1. A connection electrode, which is electrically connected to a conductor circuit on a surface of a substrate to which a semiconductor is flip-chip connected via an adhesive and protrudes from the other surface of the substrate, is electrically connected to a motherboard via the adhesive. A package characterized by being electrically connected to the package.
【請求項2】 接着剤の接着後の40℃での弾性率が、
100〜2000MPaである請求項1記載のパッケー
ジ。
2. The elastic modulus at 40 ° C. after bonding of the adhesive is
The package according to claim 1, wherein the pressure is 100 to 2000 MPa.
【請求項3】 突出した接続電極の基材表面からの突出
高さが、100ミクロン以下である請求項1及び2記載
のパッケージ。
3. The package according to claim 1, wherein the projecting height of the projecting connection electrode from the substrate surface is 100 μm or less.
【請求項4】 0.01〜30vol%の導電粒子が分
散されている異方性導電接着剤である請求項1、2又は
3各項記載のパッケージ。
4. The package according to claim 1, which is an anisotropic conductive adhesive in which 0.01 to 30 vol% of conductive particles are dispersed.
JP7942097A 1997-03-31 1997-03-31 Package Pending JPH10275825A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7942097A JPH10275825A (en) 1997-03-31 1997-03-31 Package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7942097A JPH10275825A (en) 1997-03-31 1997-03-31 Package

Publications (1)

Publication Number Publication Date
JPH10275825A true JPH10275825A (en) 1998-10-13

Family

ID=13689383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7942097A Pending JPH10275825A (en) 1997-03-31 1997-03-31 Package

Country Status (1)

Country Link
JP (1) JPH10275825A (en)

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