JPH10261630A5 - - Google Patents

Info

Publication number
JPH10261630A5
JPH10261630A5 JP1997065984A JP6598497A JPH10261630A5 JP H10261630 A5 JPH10261630 A5 JP H10261630A5 JP 1997065984 A JP1997065984 A JP 1997065984A JP 6598497 A JP6598497 A JP 6598497A JP H10261630 A5 JPH10261630 A5 JP H10261630A5
Authority
JP
Japan
Prior art keywords
gas
vacuum chamber
dielectric
deposition
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1997065984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10261630A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP6598497A priority Critical patent/JPH10261630A/ja
Priority claimed from JP6598497A external-priority patent/JPH10261630A/ja
Publication of JPH10261630A publication Critical patent/JPH10261630A/ja
Publication of JPH10261630A5 publication Critical patent/JPH10261630A5/ja
Pending legal-status Critical Current

Links

JP6598497A 1997-03-19 1997-03-19 プラズマ処理方法及び装置 Pending JPH10261630A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6598497A JPH10261630A (ja) 1997-03-19 1997-03-19 プラズマ処理方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6598497A JPH10261630A (ja) 1997-03-19 1997-03-19 プラズマ処理方法及び装置

Publications (2)

Publication Number Publication Date
JPH10261630A JPH10261630A (ja) 1998-09-29
JPH10261630A5 true JPH10261630A5 (enrdf_load_html_response) 2005-02-17

Family

ID=13302792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6598497A Pending JPH10261630A (ja) 1997-03-19 1997-03-19 プラズマ処理方法及び装置

Country Status (1)

Country Link
JP (1) JPH10261630A (enrdf_load_html_response)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4756540B2 (ja) * 2005-09-30 2011-08-24 東京エレクトロン株式会社 プラズマ処理装置と方法
JP4522980B2 (ja) * 2005-11-15 2010-08-11 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
WO2007052711A1 (ja) * 2005-11-02 2007-05-10 Matsushita Electric Industrial Co., Ltd. プラズマ処理装置
JP2010183092A (ja) * 2005-11-15 2010-08-19 Panasonic Corp プラズマ処理装置
JP2023112780A (ja) * 2022-02-02 2023-08-15 東京エレクトロン株式会社 基板処理装置、および基板処理方法
KR102842519B1 (ko) * 2022-11-07 2025-08-05 (주)이오테크닉스 웨이퍼 가공 장치

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