JPH10242342A - Semiconductor mounting structure - Google Patents

Semiconductor mounting structure

Info

Publication number
JPH10242342A
JPH10242342A JP3882397A JP3882397A JPH10242342A JP H10242342 A JPH10242342 A JP H10242342A JP 3882397 A JP3882397 A JP 3882397A JP 3882397 A JP3882397 A JP 3882397A JP H10242342 A JPH10242342 A JP H10242342A
Authority
JP
Japan
Prior art keywords
circuit board
mounting structure
insulating film
semiconductor
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3882397A
Other languages
Japanese (ja)
Inventor
Yoshio Ozeki
良雄 大関
Naoya Isada
尚哉 諌田
Masaaki Okunaka
正昭 奥中
Yasuhiro Narukawa
泰弘 成川
Toyoki Asada
豊樹 浅田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3882397A priority Critical patent/JPH10242342A/en
Publication of JPH10242342A publication Critical patent/JPH10242342A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16237Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bonding area disposed in a recess of the surface of the item

Abstract

PROBLEM TO BE SOLVED: To smooth an irregularities caused by a conductor wiring or holes such as through holes to the utmost by an insulating film or conductive particles, etc., on a circuit board by forming the insulating film, etc., on a part of the circuit board which faces a semiconductor device. SOLUTION: In a semiconductor mounting structure wherein a semiconductor device 6 is mounted with face down on a circuit board 8 using connection material 2 such as a conductive adhesive and conductor particles of an anisotripic conductive film and thereby the device 6 and the circuit board 8 are electrically connected, a space between the device 6 and the circuit board 8 is filled with sealing resin 1 such as filling resin and an anisotripic conductive film and then the sealing resin 1 is hardened. In order to secure a connection reliability of such a semiconductor mounting structure, it is necessary to reduce the chances that voids appear. Then, an insulating film 7 is formed on a part of the circuit board 8 which faces the device 6. By this method, a part of the surface of the circuit board 8 which faces the device 6 is smoothed to the utmost and thereby the chances that voids appear can be reduced regardless of the existence of the conductor interconnection 3, through holes 4 or via holes 5.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は回路基板と半導体素
子との実装構造体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mounting structure of a circuit board and a semiconductor element.

【0002】[0002]

【従来の技術】近年、ノートパソコン、携帯電話、PH
S、PDAなどの携帯情報機器、またムービ、カメラな
どの携帯映像機器などで高密度実装のニーズが益々高く
なっている。これに対応すべく、半導体素子の実装は従
来のパッケージ品を実装する方法から、半導体素子を直
接回路基板に実装する、いわゆる、ベアチップ実装方式
が主流になりつつある。
2. Description of the Related Art In recent years, notebook computers, mobile phones, PHs
The need for high-density packaging is increasing in portable information devices such as S and PDA, and portable video devices such as movies and cameras. In order to cope with this, the so-called bare chip mounting method, in which the semiconductor element is directly mounted on a circuit board, is becoming the mainstream, instead of the conventional method of mounting a packaged product.

【0003】従来のベアチップ実装方法は半導体素子を
フェースアップで基板に接続し、半導体素子と回路基板
のパッド間をワイヤボンディング法で接続する方法であ
る。
The conventional bare chip mounting method is a method in which a semiconductor element is connected face-up to a substrate, and a pad between the semiconductor element and a circuit board is connected by a wire bonding method.

【0004】[0004]

【発明が解決しようとする課題】従来のベアチップ実装
構造体は、半導体素子の面積以外にもワイヤボンディン
グ用のパッド面積及びワイヤボンディングによる配線長
を必要とする。これに対し、はんだ、金、導電性接着
剤、異方性導電フィルムなどを接続材料として半導体素
子をフェースダウンで基板に接続接着する(フリップチ
ップアタッチ)方法は、回路基板上の必要搭載面積はチ
ップサイズであり、接続配線長も数十μmであるため、
究極の高密度実装方式であると考えられる。このフリッ
プチップアタッチは、半導体素子と回路基板を充填樹脂
及び異方性導電フィルムの封止樹脂を硬化して接続信頼
性を確保する方法であるが、回路基板の導体配線によっ
て生じる凹凸が充填樹脂の流動性を低下させ、さらにス
ルーホール等の穴に気泡が残留するため、半導体素子と
回路基板の間隙または半導体素子周辺のフィレット部に
ボイドが発生し、接続信頼性が低下するという問題を有
していた(図3)。また、半導体素子面と対向する回路
基板にスルーホール等が存在することにより、充填樹脂
が裏面に流動して搭載部品の実装を困難にするという問
題も有していた(図4)。
The conventional bare chip mounting structure requires a pad area for wire bonding and a wiring length by wire bonding in addition to the area of the semiconductor element. On the other hand, the method of connecting and bonding a semiconductor element to a substrate face down using a solder, gold, a conductive adhesive, an anisotropic conductive film, or the like as a connection material (flip chip attach) requires a required mounting area on a circuit board. Since it is a chip size and the connection wiring length is several tens of μm,
It is considered to be the ultimate high-density mounting method. This flip-chip attach is a method of securing the connection reliability by filling the semiconductor element and the circuit board with the filling resin and the sealing resin of the anisotropic conductive film. Of the semiconductor device and the circuit board, or a fillet around the semiconductor device, resulting in a decrease in connection reliability. (Fig. 3). In addition, the presence of through holes and the like in the circuit board facing the semiconductor element surface also causes a problem that the filling resin flows to the back surface, making it difficult to mount the mounted components (FIG. 4).

【0005】[0005]

【課題を解決するための手段】本発明は、上記問題を解
決すべく、半導体素子面と対向する回路基板上に絶縁膜
等を設けることで、導体配線により生じる凹凸やスルー
ホール等の穴を回路基板の該絶縁膜や導電粒子等によっ
て極力平滑化したことを特徴とする半導体実装構造体の
構成を備えたものである。
SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides an insulating film or the like on a circuit board facing a semiconductor element surface to reduce unevenness caused by conductor wiring and holes such as through holes. The semiconductor mounting structure is characterized by being smoothed as much as possible by the insulating film and the conductive particles of the circuit board.

【0006】[0006]

【発明の実施の形態】本発明の実施例について図面を用
いて説明する。
Embodiments of the present invention will be described with reference to the drawings.

【0007】図1は、本発明の半導体の実装構造体の断
面図である。すなわち、はんだ、金、導電性接着剤、あ
るいは異方性導電フイルムの導電粒子等の接続材料2を
用いて、半導体素子6をフェースダウンで回路基板8に
搭載し半導体素子6と回路基板8との電気的接続を行う
実装構造体で、半導体素子6と回路基板8の隙間に充填
樹脂や異方性導電フィルム等の封止樹脂1を充填し硬化
して本発明の半導体の実装構造体を得る。半導体の実装
構造体の接続信頼性を確保するためには、図3に示すボ
イド10の発生量を低減する必要がある。そこで、半導
体素子6面に対向する回路基板8上に絶縁膜7を設ける
ことで、導体配線3やスルーホール4及びビアホール5
の有無に関係なく、半導体素子6に対向する面の回路基
板8上を極力平坦化してボイド10の発生量を低減する
ことができる。絶縁膜7は、絶縁膜7の厚さh1と導体
配線3の高さh2及び接続材料6の高さh3によりh2
+h3+>h1>h2を満足する厚さとする。この条件
によって、導体配線3やスルーホール4及びビアホール
5の有無に関係なく、半導体素子6に対向する面の回路
基板8上を極力平坦化することができる。そのため、封
止樹脂1の流動性の低下を防止し、ボイド10の発生量
を低減し、半導体素子6と回路基板8との絶縁性も確保
できる構造となるため、接続信頼性が向上する。
FIG. 1 is a sectional view of a semiconductor mounting structure according to the present invention. That is, the semiconductor element 6 is mounted face down on the circuit board 8 using the connection material 2 such as solder, gold, conductive adhesive, or conductive particles of an anisotropic conductive film. In the mounting structure for electrically connecting the semiconductor device 6, the gap between the semiconductor element 6 and the circuit board 8 is filled with a sealing resin 1 such as a filling resin or an anisotropic conductive film and cured to form the semiconductor mounting structure of the present invention. obtain. In order to ensure the connection reliability of the semiconductor mounting structure, it is necessary to reduce the amount of voids 10 shown in FIG. Therefore, by providing the insulating film 7 on the circuit board 8 facing the surface of the semiconductor element 6, the conductor wiring 3, the through hole 4, and the via hole 5 are provided.
Irrespective of the presence / absence, the surface of the circuit board 8 facing the semiconductor element 6 can be made as flat as possible to reduce the amount of voids 10 generated. The insulating film 7 has a thickness h2 according to the thickness h1 of the insulating film 7, the height h2 of the conductor wiring 3, and the height h3 of the connection material 6.
+ H3 +>h1> h2. Under these conditions, the surface facing the semiconductor element 6 on the circuit board 8 can be made as flat as possible irrespective of the presence or absence of the conductor wiring 3, the through hole 4, and the via hole 5. Therefore, the fluidity of the sealing resin 1 is prevented from being reduced, the amount of the voids 10 is reduced, and the insulating property between the semiconductor element 6 and the circuit board 8 is ensured, so that the connection reliability is improved.

【0008】図2は本発明の半導体の実装構造体の断面
図である。図2は、図1で絶縁膜7の厚さがh1≧h2
の場合でも、スルーホール4やビアホール5の穴を絶縁
膜7で埋めることができない場合が存在する。そこで、
回路基板作製時に、メッキ工程でメッキを成長させてス
ルーホール4やビアホール5の穴を埋めること、もしく
は導電粒子等によってスルーホール4やビアホール5の
穴を埋めることでボイド9の発生量を低減して、接続信
頼性を向上させることができる。
FIG. 2 is a sectional view of a semiconductor mounting structure according to the present invention. FIG. 2 shows that the thickness of the insulating film 7 in FIG.
In some cases, the through holes 4 and the via holes 5 cannot be filled with the insulating film 7 in some cases. Therefore,
In producing the circuit board, the plating 9 is grown in a plating step to fill the holes of the through holes 4 and the via holes 5, or the holes 9 of the through holes 4 and the via holes 5 are filled with conductive particles or the like to reduce the amount of voids 9 generated. Thus, connection reliability can be improved.

【0009】[0009]

【発明の効果】本発明は、半導体素子と対向面に設けた
回路基板上の絶縁膜等により、半導体素子と回路基板と
の絶縁性が向上し、絶縁膜によってボイドの発生量を低
減できるとともに樹脂の流動時間を短くできる効果があ
り、半導体の実装構造体の接続信頼性を向上することが
できる。また、導体配線のスルーホールを絶縁膜もしく
は導体粒子等を形成して表面層を埋めることで、回路基
板裏面への封止樹脂の流出を防ぐことができる。
According to the present invention, the insulating property between the semiconductor element and the circuit board is improved by the insulating film on the circuit board provided on the surface facing the semiconductor element, and the amount of voids can be reduced by the insulating film. There is an effect that the flow time of the resin can be shortened, and the connection reliability of the semiconductor mounting structure can be improved. Further, by forming an insulating film or conductive particles in the through holes of the conductor wiring and filling the surface layer, it is possible to prevent the sealing resin from flowing out to the back surface of the circuit board.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の半導体の実装構造体の一実施例の断面
図。
FIG. 1 is a sectional view of an embodiment of a semiconductor mounting structure of the present invention.

【図2】本発明の半導体の実装構造体の第二実施例の断
面図。
FIG. 2 is a sectional view of a second embodiment of the semiconductor mounting structure of the present invention.

【図3】半導体素子と対向する面の回路基板が導体配線
によって生じる凹凸を持った状態で実装した半導体実装
構造体の断面図。
FIG. 3 is a cross-sectional view of a semiconductor mounting structure in which a circuit board on a surface facing a semiconductor element is mounted with irregularities caused by conductor wiring.

【図4】半導体素子と対向する面の回路基板が導体配線
によって生じるスルーホール等の穴が存在した状態で実
装した半導体実装構造体の断面図。
FIG. 4 is a cross-sectional view of a semiconductor mounting structure in which a circuit board on a surface facing a semiconductor element is mounted in a state where holes such as through holes formed by conductor wiring exist.

【符号の説明】[Explanation of symbols]

1…封止樹脂、 2…接続材料、 3…電極パッド、 4…スルーホール、 5…ビアホール、 6…半導体素子、 7…絶縁膜、 8…回路基板、 9…導電粒子、 10…ボイド、 11…樹脂の裏面流出。 DESCRIPTION OF SYMBOLS 1 ... sealing resin, 2 ... connection material, 3 ... electrode pad, 4 ... through hole, 5 ... via hole, 6 ... semiconductor element, 7 ... insulating film, 8 ... circuit board, 9 ... conductive particles, 10 ... void, 11 ... Resin on the back of the resin.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 成川 泰弘 神奈川県横浜市戸塚区吉田町292番地株式 会社日立製作所生産技術研究所内 (72)発明者 浅田 豊樹 神奈川県横浜市戸塚区吉田町292番地株式 会社日立製作所生産技術研究所内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Yasuhiro Narukawa 292 Yoshidacho, Totsuka-ku, Yokohama-shi, Kanagawa Prefecture Inside of Hitachi, Ltd. Hitachi, Ltd. Production Technology Laboratory

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】半導体素子をフェースダウンで実装する場
合、半導体素子面と対向する回路基板の絶縁性を、基板
側の絶縁膜により確保することを特徴とする半導体の実
装構造体。
1. A semiconductor mounting structure, wherein when a semiconductor element is mounted face down, insulation of a circuit board facing the semiconductor element surface is ensured by an insulating film on the substrate side.
【請求項2】請求項1に記載の上記絶縁膜により、上記
回路基板の導体配線によって生じる表面層の凹凸を極力
小さくした半導体の実装構造体。
2. A semiconductor mounting structure in which the insulating film according to claim 1 minimizes unevenness of a surface layer caused by conductor wiring of the circuit board.
【請求項3】請求項1に記載の上記絶縁膜により、上記
回路基板の導体配線によって生じる基板内層への穴を絶
縁膜により穴の表面を埋めて極力平滑化した半導体の実
装構造体。
3. A semiconductor mounting structure in which a hole in an inner layer of a substrate, which is formed by conductor wiring of the circuit board, is smoothed as much as possible by filling the surface of the hole with an insulating film by the insulating film according to claim 1.
【請求項4】半導体素子をフェースダウンで実装する場
合、上記半導体素子の面と対向する回路基板の平滑性
を、上記回路基板の導体配線によって生じる上基板内層
への穴を上記導体粒子によって穴の表面を埋めて極力平
滑化したことを特徴とする半導体の実装構造体。
4. When the semiconductor element is mounted face down, the smoothness of the circuit board facing the surface of the semiconductor element is improved by using a hole in the upper substrate inner layer caused by conductor wiring of the circuit board. A semiconductor mounting structure characterized in that the surface of the semiconductor is filled and smoothed as much as possible.
JP3882397A 1997-02-24 1997-02-24 Semiconductor mounting structure Pending JPH10242342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3882397A JPH10242342A (en) 1997-02-24 1997-02-24 Semiconductor mounting structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3882397A JPH10242342A (en) 1997-02-24 1997-02-24 Semiconductor mounting structure

Publications (1)

Publication Number Publication Date
JPH10242342A true JPH10242342A (en) 1998-09-11

Family

ID=12535976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3882397A Pending JPH10242342A (en) 1997-02-24 1997-02-24 Semiconductor mounting structure

Country Status (1)

Country Link
JP (1) JPH10242342A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009135428A (en) * 2007-11-09 2009-06-18 Panasonic Corp Mounted structural body and method of manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009135428A (en) * 2007-11-09 2009-06-18 Panasonic Corp Mounted structural body and method of manufacturing the same

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