JPH1022763A - Mounting method for surface acoustic wave device - Google Patents

Mounting method for surface acoustic wave device

Info

Publication number
JPH1022763A
JPH1022763A JP17226896A JP17226896A JPH1022763A JP H1022763 A JPH1022763 A JP H1022763A JP 17226896 A JP17226896 A JP 17226896A JP 17226896 A JP17226896 A JP 17226896A JP H1022763 A JPH1022763 A JP H1022763A
Authority
JP
Japan
Prior art keywords
substrate
base substrate
acoustic wave
mounting
wave device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17226896A
Other languages
Japanese (ja)
Other versions
JP3710560B2 (en
Inventor
Masayuki Sawano
正之 沢野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP17226896A priority Critical patent/JP3710560B2/en
Publication of JPH1022763A publication Critical patent/JPH1022763A/en
Application granted granted Critical
Publication of JP3710560B2 publication Critical patent/JP3710560B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide the mount method for the surface acoustic wave device by which the package cost is reduced and which is easily manufactured. SOLUTION: In the mount method of the surface acoustic wave device in which a substrate 25 made of a piezoelectric material with an interdigital transducer (IDT) mounted thereon is mounted on a base substrate 21 and they are sealed, input and output terminals of the substrate 25 made of the piezoelectric material with the IDT formed thereon are mounted via a bonding member 24 are mounted while a function face 25a of the substrate 25 is directed downward so as to be opposite to a connection pad on the base substrate 21 thereby forming a very small air gap 27.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、表面弾性波デバイ
スの実装方法に関するものである。
The present invention relates to a method for mounting a surface acoustic wave device.

【0002】[0002]

【従来の技術】近年、携帯電話やPHSの普及が著し
く、更に、電子機器のパーソナル通信化が進んでおり、
それに伴い無線通信の送受信機能を形成する、高周波の
アナログ電子部品が非常に重要となっている。その中で
も表面弾性波を利用したデバイスは、小型化、低コスト
化などの面から非常に有効であり、共振子やフィルタな
どに使用されている。
2. Description of the Related Art In recent years, portable telephones and PHS have become remarkably widespread, and personal communication of electronic devices has been advanced.
Accordingly, high-frequency analog electronic components that form a transmission / reception function of wireless communication have become very important. Among them, devices utilizing surface acoustic waves are very effective in terms of miniaturization and cost reduction, and are used for resonators and filters.

【0003】一般的に表面弾性波を利用したデバイスに
おいては、電気信号から表面弾性波への変換、あるいは
その逆の変換を行う変換器(トランスデューサ)が必要
であり、そのための材料としては圧電体が使われること
が多い。圧電体に電界を印加すると、歪み、すなわち変
形が生じ、逆に応力を加えると電界が生じる、いわゆる
圧電効果が発生するため、上記した電気信号および表面
弾性波のトランスデューサは、この圧電効果を利用して
電気および表面弾性波の変換を行っている。圧電単結晶
材料としては、水晶やニオブ酸リチウム(LiNb
3 )、タンタル酸リチウム(LiTaO3 )などが多
く使われている。
In general, a device using a surface acoustic wave requires a transducer for converting an electric signal into a surface acoustic wave or vice versa, and a piezoelectric material is used as a material therefor. Is often used. When an electric field is applied to a piezoelectric body, distortion, that is, deformation occurs, and conversely, an electric field occurs when a stress is applied. This causes a so-called piezoelectric effect. Therefore, the transducer of the electric signal and the surface acoustic wave uses the piezoelectric effect. To convert electric and surface acoustic waves. Quartz or lithium niobate (LiNb
O 3 ), lithium tantalate (LiTaO 3 ) and the like are often used.

【0004】図6はかかる従来のSAW(Surfac
e Acoustic Wave)トランスバーサル型
のフィルタの構成を示す図であり、図6(a)はそのS
AWトランスバーサル型のフィルタの平面図、図6
(b)はそのSAWトランスバーサル型のフィルタの側
面図である。これらの図に示すように、SAWトランス
バーサル型のフィルタは、圧電効果を有する基板1と、
送信側のIDT2(Interdijidal Tra
nsducer:すだれ状電極トランスデューサ)と、
受信側のIDT3から構成されている。
FIG. 6 shows a conventional SAW (Surfac).
e Acoustic Wave) is a diagram showing a configuration of a transversal type filter, FIG.
FIG. 6 is a plan view of an AW transversal type filter.
(B) is a side view of the SAW transversal type filter. As shown in these figures, a SAW transversal type filter includes a substrate 1 having a piezoelectric effect,
IDT2 (Interdigial Tra) on the transmitting side
nsducer: interdigital transducer)
It comprises an IDT 3 on the receiving side.

【0005】入力信号4より送信側のIDT2にRF電
圧が印加されると、送信側のIDT2部に印加電界分布
に対応して、圧電効果により基板1表面近傍に周期的な
歪みが生じ、SAW(表面弾性波またはレイリー波)を
励振する。更に、SAWは基板1表面を伝搬した後、受
信側のIDT3により再度電気信号に変換されて出力信
号5となる。また、SAWの波長λは、IDTの電極周
期2dに一致する周波数f0(=V/2d、v:表面波
速度)で、各電極脂から励起されたSAWが同相に加わ
るので、送受間の感度が最も高くなる。
When an RF voltage is applied to the IDT 2 on the transmitting side from the input signal 4, periodic distortion occurs near the surface of the substrate 1 due to the piezoelectric effect in accordance with the applied electric field distribution in the IDT 2 on the transmitting side, and the SAW (Surface acoustic wave or Rayleigh wave). Further, after the SAW propagates on the surface of the substrate 1, the SAW is converted again into an electric signal by the IDT 3 on the receiving side and becomes an output signal 5. The wavelength λ of the SAW has a frequency f0 (= V / 2d, v: surface wave velocity) corresponding to the electrode period 2d of the IDT, and the SAW excited from each electrode is added to the same phase, so that the sensitivity between transmission and reception is high. Is the highest.

【0006】このような従来の表面弾性波デバイスの実
装方法としては、図7に示すように、ベース基板11へ
の電気的接続は、W/B(Wire Bonding)
接続法やバンプ接続法など、通常のLSIと同様な接続
方法が可能である。このように、実装された基板1はキ
ャビティを有するベース基板11に搭載され、封止リッ
ド12により封止される。なお、1aは表面弾性波デバ
イスの機能面、13はエアギャップである。
As a conventional method for mounting such a surface acoustic wave device, as shown in FIG. 7, electrical connection to a base substrate 11 is performed by W / B (Wire Bonding).
A connection method similar to a normal LSI, such as a connection method or a bump connection method, is possible. Thus, the mounted substrate 1 is mounted on the base substrate 11 having a cavity, and is sealed by the sealing lid 12. 1a is a functional surface of the surface acoustic wave device, and 13 is an air gap.

【0007】しかし、先にも述べたように、表面弾性波
デバイスは基板1表面をSAWが伝搬するため、基板1
にエアギャップ13が必要不可欠であり、従って、図7
に示すように、キャビティを有するベース基板11へ封
止リッド12を搭載して封止し、基板1表面のSAW伝
搬部分にエアギャップ13を形成している構造が、現在
最も一般的な表面弾性波デバイスのパッケージである。
However, as described above, in the surface acoustic wave device, since the SAW propagates on the surface of the substrate 1,
The air gap 13 is indispensable in FIG.
As shown in the figure, the structure in which the sealing lid 12 is mounted on the base substrate 11 having the cavity and sealed, and the air gap 13 is formed in the SAW propagation portion on the surface of the substrate 1 is the most general surface elasticity at present. Wave device package.

【0008】しかしながら、このような表面弾性波デバ
イスのパッケージは、一般的なLSIのパッケージ(例
えばトランスファモールドなど)に比較して、エアギャ
ップを確保するための構造上の問題から、パッケージコ
ストが非常に高価になり、更にパッケージサイズの小型
化が困難である。そのためエアギャップを確保しつつ、
かつ低コストな表面弾性波デバイスのパッケージングの
報告が行われている。例えば、基板にSAW伝搬部分を
囲むように環状部材を配置して、樹脂封止を行ったバン
プ接続構造パッケージや(特開平5−90882号公報
参照)、基板のSAW伝搬部を除く部分にエアギャップ
を形成するためのスペースを設け、対向部に封止リッド
を接着するパッケージ(特開平3−21112号公報参
照)、またキャビティを有するベース基板へ基板をバン
プ接続し、基板の裏面へ封止リッドを接着するパッケー
ジ(特開平6−61778号公報参照)などがある。
However, such a surface acoustic wave device package has a very high package cost compared to a general LSI package (eg, transfer mold) due to a structural problem for securing an air gap. And it is difficult to reduce the package size. Therefore, while securing the air gap,
In addition, there is a report on packaging of a low-cost surface acoustic wave device. For example, an annular member is disposed on the substrate so as to surround the SAW propagation portion, and the resin is sealed in a bump connection package (see Japanese Patent Application Laid-Open No. 5-90882), or air is applied to a portion of the substrate other than the SAW propagation portion. A package for providing a space for forming a gap and bonding a sealing lid to an opposing portion (see JP-A-3-21112), and connecting a substrate to a base substrate having a cavity by bumps and sealing the back surface of the substrate There is a package for bonding the lid (see JP-A-6-61778).

【0009】[0009]

【発明が解決しようとする課題】しかしながら、上記し
た従来の表面弾性波デバイスの実装方法では、エアギャ
ップを形成するために必要な構造部材が増加し、更にそ
れに伴う実装プロセスが必要であり、パッケージ部材費
や量産性を考慮すると、パッケージコストの低減は非常
に難しいという問題点があった。
However, in the above-described conventional method for mounting a surface acoustic wave device, the number of structural members required to form an air gap increases, and a mounting process is required accordingly. There is a problem that it is very difficult to reduce the package cost in consideration of the material cost and mass productivity.

【0010】本発明は、上記問題点を除去し、パッケー
ジコストを低減するとともに、容易に製造することがで
きる表面弾性波デバイスの実装方法を提供することを目
的とする。
An object of the present invention is to provide a method of mounting a surface acoustic wave device which eliminates the above problems, reduces the package cost, and can be easily manufactured.

【0011】[0011]

【課題を解決するための手段】本発明は、上記目的を達
成するために、 〔1〕ベース基板上にIDTが形成された圧電性材料か
らなる基板を実装し、封止を行う表面弾性波デバイスの
実装方法において、前記ベース基板上に接続パッドに対
向するように、IDTが形成された圧電性材料からなる
基板の入出力端子を接合部材を介して前記基板の機能面
を下方にして実装し、微小なエアギャップを形成するよ
うにしたものである。
In order to achieve the above object, the present invention provides: [1] a surface acoustic wave for mounting and sealing a substrate made of a piezoelectric material having an IDT formed on a base substrate. In the device mounting method, an input / output terminal of a substrate made of a piezoelectric material on which an IDT is formed is mounted on the base substrate with a functional surface of the substrate downward through a bonding member so as to face connection pads. Then, a minute air gap is formed.

【0012】〔2〕ベース基板上にIDTが形成された
圧電性材料からなる基板を実装し、封止を行う表面弾性
波デバイスの実装方法において、前記ベース基板上に接
続パッドに対向するように、IDTが形成された圧電性
材料からなる基板の入出力端子を接合部材を介して前記
基板の機能面を下方にして実装し、微小なエアギャップ
を形成する工程と、封止剤を用いた封止工程を施すよう
にしたものである。
[2] In a surface acoustic wave device mounting method for mounting a substrate made of a piezoelectric material on which an IDT is formed on a base substrate and performing sealing, the substrate is arranged so as to face connection pads on the base substrate. Mounting the input / output terminals of the substrate made of the piezoelectric material on which the IDT is formed with the functional surface of the substrate down via a bonding member to form a minute air gap, and using a sealant. The sealing process is performed.

【0013】〔3〕上記〔1〕又は〔2〕記載の表面弾
性波デバイスの実装方法において、前記基板の機能面と
同平面内にある入出力端子へバンプ状の接合部材を形成
し、前記ベース基板の接続パッドのサイズを前記接合部
材のサイズより大きく形成し、前記接続パッド形成用の
絶縁層が施された前記ベース基板へ対向させるように、
前記基板の機能面を前記ベース基板へ搭載した後、前記
基板と前記ベース基板を前記接合部材で接続するように
したものである。
[3] In the method of mounting a surface acoustic wave device according to [1] or [2], a bump-like joining member is formed on an input / output terminal located on the same plane as a functional surface of the substrate. The size of the connection pad of the base substrate is formed larger than the size of the bonding member, so as to face the base substrate on which the insulating layer for forming the connection pad has been applied,
After mounting the functional surface of the substrate on the base substrate, the substrate and the base substrate are connected by the bonding member.

【0014】〔4〕上記〔1〕又は〔2〕記載の表面弾
性波デバイスの実装方法において、前記ベース基板の接
続パッドへバンプ状接合部材を形成し、前記基板の入出
力端子のサイズを前記接合部材のサイズより大きく形成
し、更に、前記接続パッド形成用の絶縁層が形成された
ベース基板へ対向させるように、前記基板の機能面を前
記ベース基板へ搭載した後、前記基板と前記ベース基板
を前記接合部材で接続するようにしたものである。
[4] In the method of mounting a surface acoustic wave device according to the above [1] or [2], a bump-like joining member is formed on the connection pad of the base substrate, and the size of the input / output terminal of the substrate is reduced. After forming a functional surface of the substrate on the base substrate so as to face the base substrate on which the insulating layer for forming the connection pad is formed, the substrate and the base are formed larger than the size of the joining member. The substrate is connected by the joining member.

【0015】〔5〕上記〔1〕又は〔2〕記載の表面弾
性波デバイスの実装方法において、前記接合部材に絶縁
層の厚み寸法より高さ寸法の小さい金属スタッドバンプ
を、前記基板の機能面と同平面内にある入出力端子へ形
成し、導電性接着剤を前記金属スタッドバンプへ転写す
るか、もしくは前記接続パッド形成用の絶縁層が施され
たベース基板の接続パッド部分へ前記導電性接着剤を塗
布した後、前記基板の機能面を前記ベース基板側へ対向
させて、荷重を加えながら前記導電性接着剤を硬化する
ことにより、前記基板と前記ベース基板を接続するよう
にしたものである。
[5] In the method for mounting a surface acoustic wave device according to [1] or [2], a metal stud bump having a height smaller than a thickness of an insulating layer is provided on the bonding member. The conductive adhesive is transferred to the metal stud bumps, or the conductive adhesive is transferred to the connection pad portions of the base substrate provided with the insulating layer for forming the connection pads. After applying an adhesive, the functional surface of the substrate is opposed to the base substrate, and the conductive adhesive is cured while applying a load, thereby connecting the substrate and the base substrate. It is.

【0016】上記のように構成したので、 (A)封止剤がベース基板及び基板のギャップへ流れ込
まないように、ベース基板及び基板の距離を限りなく零
に近づけることにより、基板の機能面部(SAW伝搬
面)に数μm程度のエアギャップを形成することができ
る。 (B)より確実に封止剤がベース基板及び基板のギャッ
プへ流れ込むことを防止して、基板の機能面(SAW伝
搬面)に数μm程度のエアギャップを形成するために、
基板外形より若干大きな外形寸法のキャビティを有する
絶縁層をベース基板へ形成し、そのキャビティ内へ基板
が収まるよう、その基板の機能面をベース基板側へ対向
させた後、封止剤を用いた封止を行うことができる。
With the above-mentioned structure, (A) the distance between the base substrate and the substrate is made as close as possible to zero so that the sealing agent does not flow into the gap between the base substrate and the substrate, so that the functional surface portion ( An air gap of about several μm can be formed on the SAW propagation surface). (B) To more reliably prevent the sealant from flowing into the gap between the base substrate and the substrate and form an air gap of about several μm on the functional surface (SAW propagation surface) of the substrate,
An insulating layer having a cavity having a slightly larger outer dimension than the outer shape of the substrate was formed on the base substrate, and the functional surface of the substrate was opposed to the base substrate side so that the substrate could be accommodated in the cavity. Sealing can be performed.

【0017】(C)IDTが形成されている基板の機能
面と同平面内にある入出力端子へバンプ状の接合部材を
形成し、前記ベース基板の接続パッドのサイズを接合部
材のサイズより大きく形成し、更に、接続パッド形成用
の絶縁層が施されたベース基板へ対向させるように、基
板の機能面を前記ベース基板へ搭載した後、前記基板及
び前記ベース基板を接合部材で接続し、その後、封止剤
を用いた封止工程を行うことによって、前記基板の機能
面及びベース基板の間にエアギャップを形成することが
できる。
(C) A bump-like joining member is formed on the input / output terminal located on the same plane as the functional surface of the substrate on which the IDT is formed, and the size of the connection pad of the base substrate is made larger than the size of the joining member. Forming, further, after mounting the functional surface of the substrate on the base substrate, so as to face the base substrate on which the insulating layer for connection pad formation has been applied, the substrate and the base substrate are connected by a joining member, Then, by performing a sealing step using a sealing agent, an air gap can be formed between the functional surface of the substrate and the base substrate.

【0018】(D)ベース基板の接続パッドへバンプ状
の接合部材を形成し、基板の入出力端子のサイズを該接
合部材サイズより明らかに大きく形成し、更に、接続パ
ッド形成用の絶縁層が施されたベース基板へ対向させる
ように、前記基板の機能面をベース基板へ搭載した後、
前記基板及びベース基板を接合部材で接続し、その後、
封止剤を用いた封止工程を行うことによって、基板の機
能面及びベース基板間にエアギャップを形成することが
できる。
(D) A bump-shaped joining member is formed on the connection pad of the base substrate, and the size of the input / output terminals of the substrate is clearly larger than the size of the joining member. After mounting the functional surface of the substrate on the base substrate so as to face the applied base substrate,
Connecting the substrate and the base substrate with a joining member,
By performing a sealing step using a sealing agent, an air gap can be formed between the functional surface of the substrate and the base substrate.

【0019】(E)接合部材に絶縁層の厚み寸法より高
さ寸法の小さい金属スタッドバンプを、前記基板の機能
面と同平面内にある入出力端子へ形成し、導電性接着剤
を金属スタッドバンプへ転写するか、もしくは接続パッ
ド形成用の絶縁層が施されたベース基板の接続パッドへ
導電性接着剤を塗布した後、前記基板の機能面をベース
基板側へ対向させて、荷重を加えながら導電性接着剤を
硬化することにより、前記基板及びベース基板を接続
し、その後の封止剤を用いた封止を行うことによって、
前記基板の機能面とベース基板の間にエアギャップを形
成することができる。
(E) A metal stud bump having a height smaller than the thickness of the insulating layer is formed on an input / output terminal located on the same plane as the functional surface of the substrate, and a conductive adhesive is applied to the metal stud. After transferring to a bump or applying a conductive adhesive to connection pads of a base substrate provided with an insulating layer for forming connection pads, the functional surface of the substrate is opposed to the base substrate side, and a load is applied. By curing the conductive adhesive while connecting the substrate and the base substrate, by performing sealing using a subsequent sealing agent,
An air gap may be formed between the functional surface of the substrate and the base substrate.

【0020】[0020]

【発明の実施の形態】以下、本発明の実施の形態につい
て図面を参照しながら詳細に説明する。図1は本発明の
第1実施例を示す表面弾性波デバイスの全体構成を示す
断面図、図2は図1のA部拡大断面図、図3はその表面
弾性波デバイスのエアギャップの形成方法の説明図であ
る。
Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a sectional view showing the entire configuration of a surface acoustic wave device according to a first embodiment of the present invention, FIG. 2 is an enlarged sectional view of a portion A in FIG. 1, and FIG. 3 is a method for forming an air gap of the surface acoustic wave device. FIG.

【0021】これらの図において、21はベース基板、
22はそのベース基板21上に形成される接続パッド、
23はそのベース基板21上に形成される絶縁層、24
は絶縁層23にホールが形成され、そのホールに形成さ
れた接合部材であり、その接合部材24に基板25に形
成される入出力端子26を接合する。なお、25aは基
板25の機能面、27はエアギャップ、28は封止剤で
ある。
In these figures, 21 is a base substrate,
22 is a connection pad formed on the base substrate 21;
23 is an insulating layer formed on the base substrate 21;
Is a joining member formed in the insulating layer 23 with a hole formed therein, and the input / output terminal 26 formed on the substrate 25 is joined to the joining member 24. 25a is a functional surface of the substrate 25, 27 is an air gap, and 28 is a sealant.

【0022】以下、その構成を詳細に説明する。IDT
が形成された圧電性材料(例えば、水晶、LiNb
3 、LiTaO3など)より成る基板25とベース基
板21を、接合部材24により電気的に接続する。この
時に使用する接合部材24の材料は、一般的に入手可能
なPb/Sn系のハンダが比較的安価であり、更にパッ
ケージは搭載基板に共晶ハンダで接続されるため、共晶
ハンダ以上の融点を有する高温ハンダ(例えば、95P
b/5Snなど)が良い。しかし、その他の金属系ハン
ダを用いても問題はない。
Hereinafter, the configuration will be described in detail. IDT
Is formed on the piezoelectric material (for example, quartz, LiNb
A substrate 25 made of O 3 , LiTaO 3 or the like) and the base substrate 21 are electrically connected by a joining member 24. As a material of the joining member 24 used at this time, generally available Pb / Sn-based solder is relatively inexpensive, and the package is connected to the mounting substrate by eutectic solder. High-temperature solder having a melting point (for example, 95P
b / 5Sn). However, there is no problem even if other metal-based solder is used.

【0023】その接続方法としては、基板25の機能面
25a(SAW伝搬面)側にある入出力端子26に、メ
ッキ法やボール搭載法などでバンプ状の接合部材24を
形成するか、もしくはボール搭載法や印刷法を用いて、
ベース基板21の接続パッド22へバンプ状の接合部材
24を形成し、基板25をその機能面25aがベース基
板21へ対向するように搭載して加熱する。
As the connection method, a bump-shaped joining member 24 is formed on the input / output terminal 26 on the functional surface 25a (SAW propagation surface) side of the substrate 25 by plating, ball mounting, or the like. Using mounting method and printing method,
A bump-shaped bonding member 24 is formed on the connection pad 22 of the base substrate 21, and the substrate 25 is mounted and heated so that its functional surface 25 a faces the base substrate 21.

【0024】なお、上記実施例では、バンプ状の接合部
材24をベース基板21側に形成するように構成した
が、バンプ状の接合部材24を基板25の入出力端子2
6側に形成するようにしても良い。更に、別の接続方法
として、ボール状のハンダをベース基板21及び基板2
5の間に挟んだ状態で加熱しても良好な接続が得られ
る。加熱方法はベルト炉によるリフローや、ホットプレ
ートなどで行う。
In the above embodiment, the bump-shaped joining member 24 is formed on the base substrate 21 side.
It may be formed on the sixth side. Further, as another connection method, a ball-shaped solder is attached to the base substrate 21 and the substrate 2.
Good connection can be obtained even when heating is carried out in a state sandwiched between the five. The heating is performed by a reflow using a belt furnace or a hot plate.

【0025】このベース基板21と基板25との接続の
際に重要なことは、ベース基板21と基板25の接続後
に行う封止剤28を塗布する際に、封止剤28がベース
基板21及び基板25のエアギャップ27へ流れ込まな
いよう、ベース基板21及び基板25の距離を限りなく
零に近くすることである。これにより、基板25の機能
面25a部に数μm程度のエアギャップ27領域を確保
することが可能になる。
What is important in connecting the base substrate 21 and the substrate 25 is that when the sealant 28 is applied after the connection between the base substrate 21 and the substrate 25, the sealant 28 The purpose is to make the distance between the base substrate 21 and the substrate 25 as close to zero as possible so as not to flow into the air gap 27 of the substrate 25. Thereby, it is possible to secure an air gap 27 region of about several μm in the functional surface 25a of the substrate 25.

【0026】ベース基板21と基板25の接続後の状態
は、外観上ほとんど接触しているが、ミクロ的には数μ
m程度のエアギャップ27が存在しており、よって数μ
mのエアギャップ27があれば、封止剤28を塗布して
も、よほど高圧力を負荷するか、超低粘度の封止剤28
でない限り、塗布された封止剤28がベース基板21及
び基板25のエアギャップ27へ流れ込むようなことは
なく、基板25の機能面25a部にエアギャップ27を
確保することが可能となる。
The state after connection between the base substrate 21 and the substrate 25 is almost in contact with the external appearance, but is microscopically several μm.
m, an air gap 27 of about m
m air gap 27, even if the sealant 28 is applied, a very high pressure is applied or the ultra-low viscosity sealant 28 is applied.
Otherwise, the applied sealant 28 does not flow into the air gap 27 between the base substrate 21 and the substrate 25, and the air gap 27 can be secured at the functional surface 25a of the substrate 25.

【0027】次に、ベース基板21及び基板25の距離
を限りなく零に近く形成する方法を以下に説明する。ま
ず、図3(a)に示すように、ベース基板21には接続
パッド22が形成されるが、基板25との接続側へ絶縁
層23(例えば、ベース基板21材料にセラミックを適
用する場合はアルミナコート、FR4材料などのような
プリント基板の場合ではソルダレジストなど)を施し
て、この時に接続パッド22の形状をパターンニングし
て形成する。
Next, a method for forming the distance between the base substrate 21 and the substrate 25 as close to zero as possible will be described below. First, as shown in FIG. 3A, connection pads 22 are formed on the base substrate 21, and the insulating layer 23 (for example, when ceramic is applied to the material of the base substrate 21) is formed on the connection side with the substrate 25. In the case of a printed board such as an alumina coat or FR4 material, a solder resist or the like is applied, and at this time, the shape of the connection pad 22 is formed by patterning.

【0028】また、ベース基板21と基板25の接続用
に、どちらか一方にバンプ状の接合部材24を形成する
が、例えば、ベース基板21側へバンプ状の接合部材2
4を形成する場合は、基板25の機能面25aにある入
出力端子26のサイズを、形成したバンプ状の接合部材
24サイズより明らかに大きくしておく。このように構
成することにより、加熱されて溶融した接合部材24は
入出力端子26へ充分に濡れ拡がり、よって、基板25
はその自重によって沈み込み、ベース基板21と基板2
5は、ほとんど接触している状態となる。
In order to connect the base substrate 21 and the substrate 25, a bump-shaped joining member 24 is formed on one of the two.
In the case of forming 4, the size of the input / output terminal 26 on the functional surface 25a of the substrate 25 is clearly larger than the size of the formed bump-shaped joining member 24. With this configuration, the joining member 24 that has been heated and melted sufficiently wets and spreads to the input / output terminals 26, and thus the substrate 25.
Sinks by its own weight, and the base substrate 21 and the substrate 2
5 is almost in contact.

【0029】逆に、基板25側へ接合部材24を形成す
る場合は、ベース基板21上の接続パッド22のサイズ
を、バンプ状接合部材24のサイズより明らかに大きく
しておくこととなる。この時の接合部材24の高さは、
ベース基板21の基板25側に形成された絶縁層23の
高さとほぼ同じ程度とする。また、接合前の接合部材2
4の高さは、少なくとも絶縁層23の厚さ寸法より高く
しておくことが必要である。
Conversely, when the bonding member 24 is formed on the substrate 25 side, the size of the connection pad 22 on the base substrate 21 must be clearly larger than the size of the bump-shaped bonding member 24. The height of the joining member 24 at this time is
The height is almost the same as the height of the insulating layer 23 formed on the substrate 25 side of the base substrate 21. Also, the joining member 2 before joining
The height of 4 needs to be higher than at least the thickness of the insulating layer 23.

【0030】実験では、FR4材料を用いたベース基板
21に、厚さ40μmのソルダレジストで接続パッド2
2をφ0.1mmのサイズで形成し、これにφ0.1m
mのハンダボールを使用してボール搭載法により、バン
プ状の接合部材24を形成し、基板25の機能面25a
にある入出力端子26のサイズを、約0.25mm□程
度として接続を行ったところ、ベース基板21と基板2
5のギャップは、5〜10μm程度となり、必要なエア
ギャップ27は確実に形成することが可能であることが
わかった。また、非常に小さなエアギャップ27ではあ
るが、フィルタの周波数特性などにおいて問題ないこと
も確認することができた。
In the experiment, a connection pad 2 was formed on a base substrate 21 using FR4 material with a solder resist having a thickness of 40 μm.
2 is formed in a size of φ0.1 mm, and
The bump-shaped joining member 24 is formed by a ball mounting method using a solder ball having a thickness of m.
When the connection was made with the size of the input / output terminal 26 in
The gap of No. 5 was about 5 to 10 μm, and it was found that the necessary air gap 27 could be formed reliably. Further, it was confirmed that although the air gap 27 was very small, there was no problem in the frequency characteristics of the filter.

【0031】ベース基板21と基板25を接続した後
は、封止剤28(例えば、液状エポキシ樹脂、Eペレッ
トなど)で封止を行う。なお、本発明の構造によるベー
ス基板21及び基板25の接続構造においても、従来通
り、封止リッドなどを用いた封止構造の使用が可能であ
ることは言うまでもない。このように第1実施例によれ
ば、特別な構造部材や、それに伴う複雑な実装プロセス
を用いずに、基板25の機能面25a部へ確実にエアギ
ャップ27を形成することができる。したがって、パッ
ケージコストの低減を図り、かつ量産性の高い表面弾性
波デバイスの実装を行うことが可能となる。
After connecting the base substrate 21 and the substrate 25, sealing is performed with a sealant 28 (for example, liquid epoxy resin, E pellet, or the like). In the connection structure of the base substrate 21 and the substrate 25 according to the structure of the present invention, it goes without saying that a sealing structure using a sealing lid or the like can be used as before. As described above, according to the first embodiment, the air gap 27 can be reliably formed on the functional surface 25a of the substrate 25 without using a special structural member or a complicated mounting process associated therewith. Therefore, it is possible to reduce the package cost and mount a surface acoustic wave device having high mass productivity.

【0032】次に、本発明の第2実施例について説明す
る。図4は本発明の第2実施例を示す表面弾性波デバイ
スの実装方法を示す図である。この実施例においても、
上記した第1実施例と基本的な構造、原理は変わらない
が、ベース基板31と基板35の接続方法として、図4
(a)に示すように、接合部材として、Auスタッドバ
ンプ37を基板35側に形成し、ベース基板31の導電
性接着剤34に接続する。つまり、Auスタッドバンプ
37と導電性接着剤34とを併用して行うものである。
Next, a second embodiment of the present invention will be described. FIG. 4 is a view showing a mounting method of a surface acoustic wave device according to a second embodiment of the present invention. Also in this example,
Although the basic structure and principle are the same as those of the first embodiment, the method of connecting the base substrate 31 and the substrate 35 is as shown in FIG.
As shown in (a), an Au stud bump 37 is formed on the substrate 35 side as a joining member, and is connected to the conductive adhesive 34 on the base substrate 31. That is, the Au stud bump 37 and the conductive adhesive 34 are used in combination.

【0033】この場合に重要なことは、Auスタッドバ
ンプ37の高さ寸法を絶縁層33の厚さ寸法より小さく
設定することであり、その後、導電性接着剤34をAu
スタッドバンプ37へ転写するか、もしくはベース基板
31の接続パッド32部分へ印刷やディスペンスなどの
方法により導電性接着剤34を塗布し、ベース基板31
へ基板35を搭載し硬化する。
In this case, it is important to set the height of the Au stud bump 37 to be smaller than the thickness of the insulating layer 33, and then to apply the conductive adhesive 34 to the Au.
The conductive adhesive 34 is transferred to the stud bumps 37 or applied to the connection pads 32 of the base substrate 31 by a method such as printing or dispensing.
The substrate 35 is mounted and cured.

【0034】すると、図4(b)に示すように、硬化時
に基板35へ荷重を加えることにより、基板35はベー
ス基板31側へ沈み込み、硬化後にはベース基板31と
基板35は、ほとんど接触している状態となり、よっ
て、ベース基板31と基板35の間のギャップはほぼ零
に近い状態となる。なお、36は入出力端子である。そ
の後の封止工程は第1実施例に示した通りである。
Then, as shown in FIG. 4B, by applying a load to the substrate 35 during curing, the substrate 35 sinks into the base substrate 31 side, and after curing, the base substrate 31 and the substrate 35 are almost in contact with each other. Therefore, the gap between the base substrate 31 and the substrate 35 is almost zero. 36 is an input / output terminal. The subsequent sealing step is as described in the first embodiment.

【0035】次に、本発明の第3実施例について説明す
る。図5は本発明の第3実施例を示す表面弾性波デバイ
スの実装構造を示す断面図である。この実施例において
も、第1実施例及び第2実施例の基本的な構造、原理お
よび接合プロセスを適用する。
Next, a third embodiment of the present invention will be described. FIG. 5 is a sectional view showing a mounting structure of a surface acoustic wave device according to a third embodiment of the present invention. Also in this embodiment, the basic structure, principle, and joining process of the first and second embodiments are applied.

【0036】図5に示すように、より確実に封止剤47
がベース基板41と基板46の間に存在するエアギャッ
プ45を形成するための方法として、絶縁層42部に基
板46の外形より若干大きい外形寸法を有する1段のキ
ャビティ44を設ける。この絶縁層42は、先にも説明
したように、ベース基板41の接続パッド(図示なし)
を形成するために、接続パッドの形状が、パターンニン
グされた状態で、ベース基板41上へ基板46の機能面
46a面が対向する面へ形成されるものである。
As shown in FIG. 5, the sealant 47 is more reliably formed.
As a method for forming an air gap 45 existing between the base substrate 41 and the substrate 46, a one-stage cavity 44 having an outer dimension slightly larger than the outer dimension of the substrate 46 is provided in the insulating layer 42. As described above, the insulating layer 42 is connected to a connection pad (not shown) of the base substrate 41.
Is formed on the base substrate 41 in a state where the functional surface 46a of the substrate 46 is opposed to the connection pad in a state where the connection pad is patterned.

【0037】これにより、仮にベース基板41と基板4
6とのエアギャップ45に封止剤47が流れ込もうとし
ても、キャビティ44を設けているために、封止剤47
がSAW伝搬面である基板46の機能面46aまで到達
する距離が長くなっており、よって、エアギャップ45
をより確実に形成することが可能である。なお、43は
接合部材である。
Thus, if the base substrate 41 and the substrate 4
6. Even if the sealant 47 flows into the air gap 45 between the sealant 47 and the sealant 47, since the cavity 44 is provided, the sealant 47
Has a longer distance to the functional surface 46a of the substrate 46, which is the SAW propagation surface, so that the air gap 45
Can be formed more reliably. In addition, 43 is a joining member.

【0038】絶縁層42部に1段のキャビティ44を設
けることは非常に容易である。一般的に絶縁層42のア
ルミナコートやソルダレジストは、ペースト状の絶縁材
料を印刷工程により塗布及び硬化を行って形成してお
り、キャビティ44を設けるにはキャビティ形状に合わ
せた窓枠状のパターンで、更に、印刷を追加するだけで
ある。
It is very easy to provide the one-stage cavity 44 in the insulating layer 42. In general, the alumina coat and the solder resist of the insulating layer 42 are formed by applying and curing a paste-like insulating material by a printing process. In order to provide the cavity 44, a window frame-like pattern matching the cavity shape is provided. Then, only printing is added.

【0039】なお、本発明は上記実施例に限定されるも
のではなく、本発明の趣旨に基づいて種々の変形が可能
であり、これらを本発明の範囲から排除するものではな
い。
It should be noted that the present invention is not limited to the above embodiment, and various modifications are possible based on the spirit of the present invention, and these are not excluded from the scope of the present invention.

【0040】[0040]

【発明の効果】以上、詳細に説明したように、本発明に
よれば、以下のような効果を奏することができる。 (1)封止剤がベース基板及び基板のギャップへ流れ込
まないように、ベース基板及び基板の距離を限りなく零
に近づけることにより、基板の機能面(SAW伝搬面)
に数μm程度のエアギャップを形成することができる。
As described above, according to the present invention, the following effects can be obtained. (1) By making the distance between the base substrate and the substrate as close to zero as possible so that the sealant does not flow into the gap between the base substrate and the substrate, the functional surface of the substrate (SAW propagation surface)
Can form an air gap of about several μm.

【0041】したがって、コンパクトで、かつパッケー
ジコストの低減された表面弾性波デバイスを得ることが
できるとともに、その製造を容易にすることができる。 (2)より確実に封止剤がベース基板及び基板のギャッ
プへ流れ込むことを防止して、基板の機能面(SAW伝
搬面)に数μm程度のエアギャップを形成するために、
基板外形より若干大きな外形寸法のキャビティを有する
絶縁層をベース基板へ形成し、そのキャビティ内へ基板
が収まるよう、その基板の機能面をベース基板側へ対向
させた後、封止剤を用いた封止を行うことができる。
Therefore, it is possible to obtain a compact surface acoustic wave device with reduced package cost and to facilitate the manufacture thereof. (2) In order to more reliably prevent the sealant from flowing into the gap between the base substrate and the substrate and form an air gap of about several μm on the functional surface (SAW propagation surface) of the substrate,
After forming an insulating layer having a cavity with an external dimension slightly larger than the external shape of the substrate on the base substrate, facing the functional surface of the substrate to the base substrate side so that the substrate fits into the cavity, a sealing agent was used. Sealing can be performed.

【0042】(3)IDTが形成されている基板の機能
面と同平面内にある入出力端子へバンプ状の接合部材を
形成し、前記ベース基板の接続パッドのサイズを接合部
材のサイズより大きく形成し、更に、接続パッド形成用
の絶縁層が施されたベース基板へ対向させるように、基
板の機能面を前記ベース基板へ搭載した後、前記基板及
び前記ベース基板を接合部材で接続し、その後、封止剤
を用いた封止工程を行うことによって、前記基板の機能
面及びベース基板の間にエアギャップを形成することが
できる。
(3) A bump-like joining member is formed on the input / output terminal located on the same plane as the functional surface of the substrate on which the IDT is formed, and the size of the connection pad on the base substrate is made larger than the size of the joining member. Forming, further, after mounting the functional surface of the substrate to the base substrate, so as to face the base substrate on which the insulating layer for connection pad formation has been applied, the substrate and the base substrate are connected by a joining member, Then, by performing a sealing step using a sealing agent, an air gap can be formed between the functional surface of the substrate and the base substrate.

【0043】(4)ベース基板の接続パッドへバンプ状
の接合部材を形成し、基板の入出力端子のサイズを該接
合部材サイズより明らかに大きく形成し、更に、接続パ
ッド形成用の絶縁層が施されたベース基板へ対向させる
ように、前記基板の機能面をベース基板へ搭載した後、
前記基板及びベース基板を接合部材で接続し、その後、
封止剤を用いた封止工程を行うことによって、基板の機
能面及びベース基板間にエアギャップを形成することが
できる。
(4) A bump-shaped joining member is formed on the connection pad of the base substrate, the size of the input / output terminals of the substrate is formed to be clearly larger than the size of the joining member, and an insulating layer for forming the connection pad is formed. After mounting the functional surface of the substrate on the base substrate so as to face the applied base substrate,
Connecting the substrate and the base substrate with a joining member,
By performing a sealing step using a sealing agent, an air gap can be formed between the functional surface of the substrate and the base substrate.

【0044】(5)接合部材に絶縁層の厚み寸法より高
さ寸法の小さい金属スタッドバンプを、前記基板の機能
面と同平面内にある入出力端子へ形成し、導電性接着剤
を金属スタッドバンプへ転写するか、もしくは接続パッ
ド形成用の絶縁層が施されたベース基板の接続パッドへ
導電性接着剤を塗布した後、前記基板の機能面をベース
基板側へ対向させて、荷重を加えながら導電性接着剤を
硬化することにより、前記基板及びベース基板を接続
し、その後の封止剤を用いた封止を行うことによって、
前記基板の機能面とベース基板の間にエアギャップを形
成することができる。
(5) A metal stud bump having a height smaller than the thickness of the insulating layer is formed on the input / output terminals on the same plane as the functional surface of the substrate, and a conductive adhesive is applied to the metal stud. After transferring to a bump or applying a conductive adhesive to connection pads of a base substrate provided with an insulating layer for forming connection pads, the functional surface of the substrate is opposed to the base substrate side, and a load is applied. By curing the conductive adhesive while connecting the substrate and the base substrate, by performing sealing using a subsequent sealing agent,
An air gap may be formed between the functional surface of the substrate and the base substrate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1実施例を示す表面弾性波デバイス
の全体構成を示す断面図である。
FIG. 1 is a cross-sectional view illustrating an overall configuration of a surface acoustic wave device according to a first embodiment of the present invention.

【図2】図1のA部拡大断面図である。FIG. 2 is an enlarged sectional view of a portion A in FIG.

【図3】本発明の第1実施例を示す表面弾性波デバイス
のエアギャップの形成方法の説明図である。
FIG. 3 is an explanatory diagram of a method for forming an air gap of the surface acoustic wave device according to the first embodiment of the present invention.

【図4】本発明の第2実施例を示す表面弾性波デバイス
の実装方法を示す図である。
FIG. 4 is a diagram illustrating a method of mounting a surface acoustic wave device according to a second embodiment of the present invention.

【図5】本発明の第3実施例を示す表面弾性波デバイス
の実装構造を示す断面図である。
FIG. 5 is a sectional view showing a mounting structure of a surface acoustic wave device according to a third embodiment of the present invention.

【図6】従来のSAWトランスバーサル型のフィルタの
構成を示す図である。
FIG. 6 is a diagram showing a configuration of a conventional SAW transversal type filter.

【図7】従来の表面弾性波デバイスの実装構造を示す断
面図である。
FIG. 7 is a cross-sectional view showing a mounting structure of a conventional surface acoustic wave device.

【符号の説明】[Explanation of symbols]

21,31,41 ベース基板 22,32 接続パッド 23,33,42 絶縁層 24,43 接合部材 25,35,46 基板 25a,46a 基板の機能面 26,36 入出力端子 27,45 エアギャップ 28,47 封止剤 34 導電性接着剤 37 Auスタッドバンプ 44 キャビティ 21, 31, 41 Base substrate 22, 32 Connection pad 23, 33, 42 Insulating layer 24, 43 Joining member 25, 35, 46 Substrate 25a, 46a Functional surface 26, 36 Input / output terminal 27, 45 Air gap 28, 47 Sealant 34 Conductive Adhesive 37 Au Stud Bump 44 Cavity

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 ベース基板上にIDTが形成された圧電
性材料からなる基板を実装し、封止を行う表面弾性波デ
バイスの実装方法において、 前記ベース基板上に接続パッドに対向するように、ID
Tが形成された圧電性材料からなる基板の入出力端子を
接合部材を介して前記基板の機能面を下方にして実装
し、微小なエアギャップを形成することを特徴とする表
面弾性波デバイスの実装方法。
1. A method of mounting a surface acoustic wave device on which a substrate made of a piezoelectric material having an IDT formed thereon is mounted on a base substrate, and sealing is performed. ID
A surface acoustic wave device characterized in that the input / output terminals of a substrate made of a piezoelectric material on which T is formed are mounted with the functional surface of the substrate facing downward via a bonding member to form a minute air gap. Implementation method.
【請求項2】 ベース基板上にIDTが形成された圧電
性材料からなる基板を実装し、封止を行う表面弾性波デ
バイスの実装方法において、(a)前記ベース基板上に
接続パッドに対向するように、IDTが形成された圧電
性材料からなる基板の入出力端子を接合部材を介して前
記基板の機能面を下方にして実装し、微小なエアギャッ
プを形成する工程と、(b)封止剤を用いた封止工程を
施すことを特徴とする表面弾性波デバイスの実装方法。
2. A method of mounting a surface acoustic wave device in which a substrate made of a piezoelectric material having an IDT formed thereon is mounted on a base substrate and sealing is performed, (a) opposing connection pads on the base substrate. Thus, the step of mounting the input / output terminals of the substrate made of the piezoelectric material on which the IDT is formed with the functional surface of the substrate down via the joining member to form a minute air gap; A method of mounting a surface acoustic wave device, comprising performing a sealing step using a stopper.
【請求項3】 請求項1又は2記載の表面弾性波デバイ
スの実装方法において、前記基板の機能面と同平面内に
ある入出力端子へバンプ状の接合部材を形成し、前記ベ
ース基板の接続パッドのサイズを前記接合部材のサイズ
より大きく形成し、前記接続パッド形成用の絶縁層が施
された前記ベース基板へ対向させるように、前記基板の
機能面を前記ベース基板へ搭載した後、前記基板と前記
ベース基板を前記接合部材で接続することを特徴とする
表面弾性波デバイスの実装方法。
3. The method for mounting a surface acoustic wave device according to claim 1, wherein a bump-shaped joining member is formed on an input / output terminal located on the same plane as a functional surface of the substrate, and the base substrate is connected. The size of the pad is formed larger than the size of the bonding member, and after mounting the functional surface of the substrate to the base substrate so as to face the base substrate provided with the insulating layer for forming the connection pad, A method for mounting a surface acoustic wave device, comprising connecting a substrate and the base substrate with the joining member.
【請求項4】 請求項1又は2記載の表面弾性波デバイ
スの実装方法において、前記ベース基板の接続パッドへ
バンプ状接合部材を形成し、前記基板の入出力端子のサ
イズを前記接合部材のサイズより大きく形成し、更に、
前記接続パッド形成用の絶縁層が形成されたベース基板
へ対向させるように、前記基板の機能面を前記ベース基
板へ搭載した後、前記基板と前記ベース基板を前記接合
部材で接続することを特徴とする表面弾性波デバイスの
実装方法。
4. The method of mounting a surface acoustic wave device according to claim 1, wherein a bump-shaped bonding member is formed on a connection pad of the base substrate, and the size of input / output terminals of the substrate is reduced by the size of the bonding member. Formed larger,
After mounting a functional surface of the substrate on the base substrate so as to face the base substrate on which the insulating layer for forming the connection pad is formed, the substrate and the base substrate are connected by the joining member. Mounting method of the surface acoustic wave device.
【請求項5】 請求項1又は2記載の表面弾性波デバイ
スの実装方法において、前記接合部材に絶縁層の厚み寸
法より高さ寸法の小さい金属スタッドバンプを、前記基
板の機能面と同平面内にある入出力端子へ形成し、導電
性接着剤を前記金属スタッドバンプへ転写するか、もし
くは前記接続パッド形成用の絶縁層が施されたベース基
板の接続パッド部分へ前記導電性接着剤を塗布した後、
前記基板の機能面を前記ベース基板側へ対向させて、荷
重を加えながら前記導電性接着剤を硬化することによ
り、前記基板と前記ベース基板を接続することを特徴と
する表面弾性波デバイスの実装方法。
5. The mounting method of a surface acoustic wave device according to claim 1, wherein a metal stud bump having a height smaller than a thickness of an insulating layer is provided on the joining member in the same plane as a functional surface of the substrate. Or the conductive adhesive is transferred to the metal stud bumps, or the conductive adhesive is applied to connection pad portions of a base substrate provided with an insulating layer for forming the connection pads. After doing
Mounting the surface acoustic wave device by connecting the substrate and the base substrate by setting the functional surface of the substrate to the base substrate side and curing the conductive adhesive while applying a load. Method.
JP17226896A 1996-07-02 1996-07-02 Surface acoustic wave device mounting structure and mounting method Expired - Lifetime JP3710560B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17226896A JP3710560B2 (en) 1996-07-02 1996-07-02 Surface acoustic wave device mounting structure and mounting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17226896A JP3710560B2 (en) 1996-07-02 1996-07-02 Surface acoustic wave device mounting structure and mounting method

Publications (2)

Publication Number Publication Date
JPH1022763A true JPH1022763A (en) 1998-01-23
JP3710560B2 JP3710560B2 (en) 2005-10-26

Family

ID=15938760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17226896A Expired - Lifetime JP3710560B2 (en) 1996-07-02 1996-07-02 Surface acoustic wave device mounting structure and mounting method

Country Status (1)

Country Link
JP (1) JP3710560B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6467139B1 (en) 1998-08-03 2002-10-22 Nec Corporation Mounting structure and mounting method for surface acoustic wave element
WO2004109912A1 (en) * 2003-06-03 2004-12-16 Toyo Communication Equipment Co., Ltd. Saw device manufacturing method
JP2007028172A (en) * 2005-07-15 2007-02-01 Alps Electric Co Ltd Surface acoustic wave device
US7898360B2 (en) 2007-11-22 2011-03-01 Panasonic Corporation Surface acoustic wave filter and surface acoustic wave duplexer
US20140354114A1 (en) * 2013-06-03 2014-12-04 Taiyo Yuden Co., Ltd. Acoustic wave device and method of fabricating the same
US20210031433A1 (en) * 2017-11-08 2021-02-04 Hytech Worldwide, Inc. Three Dimensional Thermoforming and Lamination
US11843221B2 (en) 2020-03-30 2023-12-12 Namuga, Co., Ltd. Light source module for emitting high density beam and method for controlling the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6467139B1 (en) 1998-08-03 2002-10-22 Nec Corporation Mounting structure and mounting method for surface acoustic wave element
WO2004109912A1 (en) * 2003-06-03 2004-12-16 Toyo Communication Equipment Co., Ltd. Saw device manufacturing method
US7183125B2 (en) 2003-06-03 2007-02-27 Toyo Communication Equipment Co., Ltd. Method for manufacturing surface acoustic wave device
JP2007028172A (en) * 2005-07-15 2007-02-01 Alps Electric Co Ltd Surface acoustic wave device
US7898360B2 (en) 2007-11-22 2011-03-01 Panasonic Corporation Surface acoustic wave filter and surface acoustic wave duplexer
US20140354114A1 (en) * 2013-06-03 2014-12-04 Taiyo Yuden Co., Ltd. Acoustic wave device and method of fabricating the same
US9751109B2 (en) * 2013-06-03 2017-09-05 Taiyo Yuden Co., Ltd. Acoustic wave device and method of fabricating the same
US20210031433A1 (en) * 2017-11-08 2021-02-04 Hytech Worldwide, Inc. Three Dimensional Thermoforming and Lamination
US11685102B2 (en) * 2017-11-08 2023-06-27 Hytech Worldwide, Inc. Three dimensional thermoforming and lamination
US11843221B2 (en) 2020-03-30 2023-12-12 Namuga, Co., Ltd. Light source module for emitting high density beam and method for controlling the same
US11888289B2 (en) 2020-03-30 2024-01-30 Namuga, Co., Ltd. Light source module allowing differential control according to distance to subject and method for controlling the same

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