JPH10221854A5 - - Google Patents
Info
- Publication number
- JPH10221854A5 JPH10221854A5 JP1997025369A JP2536997A JPH10221854A5 JP H10221854 A5 JPH10221854 A5 JP H10221854A5 JP 1997025369 A JP1997025369 A JP 1997025369A JP 2536997 A JP2536997 A JP 2536997A JP H10221854 A5 JPH10221854 A5 JP H10221854A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- photoresist composition
- positive photoresist
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02536997A JP3802179B2 (ja) | 1997-02-07 | 1997-02-07 | ポジ型フォトレジスト組成物 |
| US09/018,883 US6004721A (en) | 1997-02-07 | 1998-02-05 | Positive photoresist composition |
| KR1019980003611A KR100530914B1 (ko) | 1997-02-07 | 1998-02-07 | 포지티브포토레지스트조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02536997A JP3802179B2 (ja) | 1997-02-07 | 1997-02-07 | ポジ型フォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH10221854A JPH10221854A (ja) | 1998-08-21 |
| JPH10221854A5 true JPH10221854A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 2004-10-07 |
| JP3802179B2 JP3802179B2 (ja) | 2006-07-26 |
Family
ID=12163926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02536997A Expired - Fee Related JP3802179B2 (ja) | 1997-02-07 | 1997-02-07 | ポジ型フォトレジスト組成物 |
Country Status (3)
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100533402B1 (ko) * | 1998-04-14 | 2005-12-02 | 후지 샤신 필름 가부시기가이샤 | 포지티브 감광성 조성물 |
| JP3974718B2 (ja) * | 1998-11-09 | 2007-09-12 | Ａｚエレクトロニックマテリアルズ株式会社 | 感放射線性樹脂組成物 |
| US6251569B1 (en) * | 1999-08-13 | 2001-06-26 | International Business Machines Corporation | Forming a pattern of a negative photoresist |
| TW495646B (en) * | 1999-12-27 | 2002-07-21 | Fuji Photo Film Co Ltd | Positive-working radiation-sensitive composition |
| US6534241B2 (en) * | 2000-01-12 | 2003-03-18 | Howard A. Fromson | Method of actinically imaging a semiconductor |
| TW453612U (en) * | 2000-04-26 | 2001-09-01 | Ritdisplay Corp | Surface processing device of display panel |
| JP4562240B2 (ja) * | 2000-05-10 | 2010-10-13 | 富士フイルム株式会社 | ポジ型感放射線性組成物及びそれを用いたパターン形成方法 |
| KR100583095B1 (ko) * | 2000-06-30 | 2006-05-24 | 주식회사 하이닉스반도체 | 광산 발생제와 함께 광 라디칼 발생제(ｐｒｇ)를 포함하는포토레지스트 조성물 |
| TW594383B (en) * | 2001-02-21 | 2004-06-21 | Fuji Photo Film Co Ltd | Positive resist composition for electron beam |
| JP4595275B2 (ja) * | 2001-09-28 | 2010-12-08 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| US7303852B2 (en) * | 2001-12-27 | 2007-12-04 | Shin-Etsu Chemical Co., Ltd. | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method |
| US7510822B2 (en) * | 2002-04-10 | 2009-03-31 | Fujifilm Corporation | Stimulation sensitive composition and compound |
| JP4115322B2 (ja) | 2003-03-31 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US7541131B2 (en) * | 2005-02-18 | 2009-06-02 | Fujifilm Corporation | Resist composition, compound for use in the resist composition and pattern forming method using the resist composition |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3290234B2 (ja) * | 1993-03-26 | 2002-06-10 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| JP3198915B2 (ja) * | 1996-04-02 | 2001-08-13 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料 |
| JP3808140B2 (ja) * | 1996-09-10 | 2006-08-09 | Ａｚエレクトロニックマテリアルズ株式会社 | 新規酸感応性基で保護されたヒドロキシスチレン重合体およびこれらを含む放射線感応性材料 |
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1997
- 1997-02-07 JP JP02536997A patent/JP3802179B2/ja not_active Expired - Fee Related
-
1998
- 1998-02-05 US US09/018,883 patent/US6004721A/en not_active Expired - Fee Related
- 1998-02-07 KR KR1019980003611A patent/KR100530914B1/ko not_active Expired - Fee Related