JPH10221716A - Electrode substrate for liquid crystal display element, and liquid crystal display element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain an image display of high quality with high reliability and a high yield through a small number of manufacturing processes without any decrease in pixel rate by forming a colored insulating layer at each pixel operture part of a pixel area, providing a cut part above a switching element, and forming an electric connection part between the pixel electrode and switching element at the cut part. SOLUTION: On a transparent substrate 1 where a gate line 2 is formed, a gate insulating film 3 is formed and on the gate insulating film 3, a semiconductor layer 14 which constitutes a TFT 4 is formed. Further, a signal line 5.and a source electrode 6 are formed so that the semiconductor layer 14 is overlaid with each of them partially, and the TFT 4 is arranged in every pixel area. In respective pixel areas on the gate insulating film 3, colored insulating layers 27R, 27G... of red, green, and blue are formed by patterning photosensitive resin by photolithography. Then the respective colored insulating layers 27R, 27G... have cut parts 28 formed where electric connection parts between source electrodes 6 and pixel electrodes 8 are formed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an electrode substrate for a liquid crystal display device and a liquid crystal display device.

[0002]

2. Description of the Related Art A display element using a liquid crystal can be reduced in weight and thickness, and has characteristics such as a low driving voltage and a low power consumption, which are not available in a light-emitting display. -Widely used as displays for computers and word processors. In particular, in recent years, active matrix type liquid crystal display devices are becoming display devices which are replaced with color cathode ray tubes.

FIG. 6 is a schematic sectional structural view of a conventional active matrix type liquid crystal display device.

[0006] The conventional active matrix type liquid crystal display device shown in FIG. 6 is configured as follows. That is, the scanning lines 2 are arranged on the transparent substrate 1 on the side forming the array substrate 32 which is an electrode substrate for a liquid crystal display element, and the insulating film 3 is formed over the entire surface. A semiconductor layer 14, a signal line 5, and a source electrode 6 are provided at predetermined positions on the insulating film 3 corresponding to the scanning lines 2, and a switching element (TF
T (Thin Film Transistor) 4. A light-shielding film 9 formed by patterning a black resin into a predetermined shape is formed on a portion where the switching element 4, the electrode wiring, and the like are provided, and a pigment dispersion method, an electrodeposition method Red, green, and blue colored insulating layers 7R, 7G, and 7B are formed by a printing method, a dyeing method, or the like. On the colored insulating layers 7R, 7G, 7B of each color, I
A pixel electrode 8 made of TO (Indium Tin Oxide) is formed. However, since a voltage is applied to the pixel electrode 8 by the switching element 4, the pixel electrode penetrates a part of the light shielding film 9 and has a source. It is connected to the electrode 6. Further, an alignment film 24 made of polyimide is formed as an uppermost layer.

On the other hand, on the transparent electrode 1 on the side constituting the counter substrate 31, a counter electrode 22 made of ITO and an alignment film 24 made of polyimide are sequentially formed on the entire surface.

Further, a counter substrate 31 and an array substrate 32
The opposing surfaces on which the wiring electrodes and the like are formed face each other,
The liquid crystal layer 23 is sealed in a liquid crystal cell assembled by setting and holding a substrate interval at a predetermined interval by a spacer (not shown), thereby forming a liquid crystal display element 30. The active matrix type liquid crystal display device of FIG. 6 is composed of a polarizing plate (not shown) attached on the outer surface of the counter substrate 31 and the array substrate 32, respectively.

In this liquid crystal display device, the TFT 4 is switched, and a video signal is applied to the pixel electrode 8 so that the liquid crystal layer 23 is switched.
Controlling the orientation of the liquid crystal composition in the colored insulating layers 7R and 7R.
It can be used as a display element by modulating light passing through G and 7B.

[0008]

However, in the case where the pixel electrode 8 and the TFT 4 are connected to each other through the through hole 11 of the insulating layer having spectral characteristics, the through hole 1
In order to form 1 at a high yield, the size of the through-hole portion 11 must be, for example, a square having a side of about 15 μm or a circle having a diameter of about 15 μm, and there is a problem that a pixel aperture ratio becomes small. .

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to reduce the pixel aperture ratio, increase reliability and yield, reduce the number of manufacturing steps, and provide high quality image display. It is intended to provide an inexpensive electrode substrate for a liquid crystal display element and a liquid crystal display element having a configuration capable of realizing the above.

[0010]

According to an electrode substrate for a liquid crystal display device according to the present invention, a transparent substrate and a plurality of signal lines and a plurality of scanning lines formed on a transparent substrate so as to intersect each other are provided. A switching element disposed at each intersection of the signal line and the scanning line; and a coloring formed in each pixel opening of the pixel region in which the switching element is disposed, and having a cutout portion on the switching element. An insulating layer, a pixel electrode formed on each colored insulating layer in each pixel opening, and electrically connected to a predetermined electrode of the switching element in a cutout portion;
A signal line, a scanning line, a switching element, a colored insulating layer, and an alignment film formed over the entire surface of the transparent substrate so as to cover the pixel electrode. Since the electrical connection with the electrode is formed in the cutout portion of the colored insulating layer, the electrical connection is reliably formed and maintained, and the electrical connection is formed even if the size is reduced. No defect occurs, and as a result, without lowering the pixel aperture ratio,
High reliability and yield, small number of manufacturing steps, and
An electrode substrate for a liquid crystal display element having a configuration capable of realizing high-quality image display can be provided at low cost.

Among the colored insulating layers, the colored insulating layer having a sufficient and sufficient patterning accuracy in the patterning step has a through hole instead of a notch, and the colored insulating layer having a through hole is formed. Light leakage from the periphery of the switching element in the pixel region can be effectively prevented.

According to the liquid crystal display device of the present invention, the electrode substrate for a liquid crystal display device is used as an array substrate.
Since the electrical connection between the pixel electrode and the predetermined electrode of the switching element is formed in the cutout of the colored insulating layer, the electrical connection is reliably formed and maintained, and the size is reduced. Also, no defective formation of the electrical connection portion occurs, and as a result, high reliability and yield, high number of manufacturing steps, and high quality image display are realized without lowering the pixel aperture ratio. It is possible to provide a liquid crystal display element having a configuration capable of performing the operation at low cost.

[0013]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of an electrode substrate for a liquid crystal display device and a liquid crystal display device according to the present invention will be described below with reference to the drawings.

FIG. 1 is a plan view of an electrode substrate (array substrate) for a liquid crystal display element according to a first embodiment of the present invention, and FIG. 2 is a cross section taken along line XX 'in FIG. FIG. The electrode substrate for a liquid crystal display element according to the first embodiment of the present invention is manufactured and configured as follows by a process similar to that for manufacturing a conventional active matrix liquid crystal display element. ing.

The switching element T on the transparent substrate 1
The FT 4 is formed as follows by repeating film formation and patterning. First, a gate line 2 is formed on a transparent substrate 1,
A film is formed by sputtering to a thickness of about 0.3 μm using molybdenum, and a pattern is formed in a predetermined shape by photolithography. A gate insulating film 3 made of silicon dioxide or silicon nitride is formed to a thickness of 0.15 μm on the transparent substrate 1 on which the gate line 2 is formed, and a gate insulating film corresponding to a gate electrode which is a part of the gate line 2 A semiconductor layer 14 forming the TFT 4 is formed at a position above the TFT 3. further,
Part of each of the signal line 5 and the source electrode 6 is a semiconductor layer 1
The TFTs 4 are formed so as to overlap with each other, and the TFTs 4 are provided for each pixel region. In each pixel region on the gate insulating film 3, red, green, and blue colored insulating layers 27R, 27G, and 27B in which a photosensitive resin is patterned by photolithography are formed as insulating layers having predetermined spectral characteristics. The colored insulating layers 27R, 27R
A pixel electrode 8 made of ITO having a thickness of 0.1 μm is formed on G and 27B.

Then, as shown in FIGS. 1 and 2,
Each of the colored insulating layers 27R, 27G, and 27B has a portion where an electrical connection between the source electrode 6 and the pixel electrode 8 is formed.
The notch 28 is formed, and this is the most significant feature of the liquid crystal display device according to the present invention, as described later. The source electrode 6 and the pixel electrode 8 are connected to each colored insulating layer 27R,
7G and 27B are electrically connected at cutouts 28.

The formation of the red insulating layer 27R is performed, for example, as follows. That is, a 20 wt% organic red pigment dispersed in a photocurable acrylic resist solution that can be developed with alkali is applied on the gate insulating film 3 after the formation of the signal line 5 and the source electrode 6 by a spinner, and the temperature is 90 ° C. For 5 minutes, and using an ultraviolet ray of 150 mJ / cm ² , the electrical connection between the pixel electrode 8 and the source electrode 6 is changed to a red insulating layer 27.
Exposure is performed using a photomask having a predetermined shape such as that formed in the notch 28 of R, and 0.1 wt% of TMA is exposed.
After developing with an H (tetramethylammonium hydride) aqueous solution for 60 seconds, washing with water, and post-baking at a temperature of 200 ° C. for 1 hour, a red insulating layer 27R is formed.
The green and blue insulating layers 27G and 27B are formed by the same method. Each colored insulating layer 27R on the pixel opening,
The thickness of 27G and 27B was about 4 μm.

In the electrode substrate for a liquid crystal display element according to the first embodiment of the present invention, the pixel electrode 8 and the source electrode 6
Electrical connection with the red, green and blue insulating layers 27
R, 27G, and 27B are formed in the cutout portions 28, so that the electrical connection portions are reliably formed and maintained, and have a size of, for example, 7 μm × 10 μm.
Even when the size of the rectangular shape is reduced, no defective formation of the electrical connection portion in the notch portion 28 does not occur, and a highly reliable liquid crystal display element can be manufactured with a high yield.

When the transmission type liquid crystal display device is used, when the array substrate side is arranged on the backlight side, the notch 2
The leakage of light from the backlight 8 from the backlight is shielded by disposing the TFT 4, and the shape of the pixel electrode 8 is changed except for the electrical connection between the pixel electrode 8 and the source electrode 6 by the colored insulating layers 27R, By making the shapes 27G and 27B the same, the signal line 5 and the pixel electrode 8 and the gate line 2 and the pixel electrode 8 are prevented from approaching each other without lowering the pixel aperture ratio.

FIG. 3 shows a colored insulating layer 27 having a cutout 28 in the electrode substrate for a liquid crystal display element according to the present invention.
R, 27G, 27B and the colored insulating layers 27R ', 27G', 2
FIG. 3B is an explanatory view comparing and contrasting with FIG. 7B ′, and specifically, FIGS. 3A and 3B are a plan view and a cross-sectional view of the colored insulating layers 27R, 27G, and 27B in which the cutout portions 28 are formed. 3 (2a) and (2b) are a plan view and a cross-sectional view of the colored insulating layers 27R ', 27G', and 27B 'in which the through-hole portions 29 are formed.

When forming the through-hole portions 29 as shown in FIGS. 3 (2a) and 3 (2b), when patterning the colored insulating layers 27R ', 27G' and 27B ', the through-hole portions 29 are formed. Since a resist residue is likely to be generated, defective formation is likely to occur at an electrical connection between the pixel electrode and the source electrode, and as a result, the reliability and the yield of the liquid crystal display element are reduced.

On the other hand, when forming the notches 28 as shown in FIGS. 3A and 3B, when patterning the colored insulating layers 27R, 27G and 27B, a resist is formed in the notches 28. No residue is generated, and the electrical connection between the pixel electrode and the source electrode is reliably formed and maintained. As a result, the reliability and yield of the liquid crystal display device can be improved.

Next, an electrode substrate for a liquid crystal display device according to a second embodiment of the present invention will be described.

FIG. 4 is a plan view of a liquid crystal display element electrode substrate (array substrate) according to a second embodiment of the present invention, and FIG. 5 is a cross-sectional view taken along line YY 'in FIG. FIG. The electrode substrate for a liquid crystal display element according to the second embodiment of the present invention has the same cutouts as the first embodiment in the red and blue colored insulating layers 27R and 27B, which are the first colored insulating layers. 28, but differs from the first embodiment in that a through-hole portion 29 similar to the conventional configuration is formed in the green colored insulating layer 27G as the second colored insulating layer.

The electrode substrate for a liquid crystal display element according to the second embodiment of the present invention is also manufactured by the same process as that for manufacturing a conventional active matrix type liquid crystal display element as follows. ,It is configured.

The switching element T on the transparent substrate 1
The FT 4 is formed as follows by repeating film formation and patterning. First, a gate line 2 is formed on a transparent substrate 1,
A film is formed by sputtering to a thickness of about 0.3 μm using aluminum, and a pattern is formed in a predetermined shape by photolithography. A gate insulating film 3 made of silicon dioxide or silicon nitride is formed to a thickness of 0.15 μm on the transparent substrate 1 on which the gate line 2 is formed, and a gate insulating film corresponding to a gate electrode which is a part of the gate line 2 A semiconductor layer forming the TFT 4 is formed at a position above the TFT 3. Further, the signal line 5 and the source electrode 6 are formed so as to partially overlap the semiconductor layer, and the TFT 4 is provided for each pixel region. Further, in each pixel region on the gate insulating film 3, as an insulating layer having a predetermined spectral characteristic, a red-, green-, and blue-colored negative resist containing a pigment of red, green, and blue is patterned by photolithography. Colored insulating layers 27R, 27G ', and 27B are formed, respectively.
A pixel electrode 23 made of ITO having a thickness of 0.1 μm is formed on each of the colored insulating layers 27R, 27G ′, and 27B.

Then, as shown in FIGS. 4 and 5,
The red and blue insulating layers 27R and 27B have a source electrode 6
The notch 28 is formed in the portion where the electrical connection between the pixel electrode 8 and the green insulating layer 27G 'is formed.
Has a through-hole portion 29 formed in the same portion as in the conventional configuration for the reason described later. Source electrode 6
And the pixel electrode 8 are connected to the colored insulating layers 27R, 27G ′, 27
B is electrically connected at the cutout portion 28 or through hole portion 29.

The green insulating layer 27G 'is formed, for example, as follows. That is, a 20 wt% organic green pigment dispersed in a photo-curable acrylic resist solution that can be alkali-developed is applied on the gate insulating film 3 after the formation of the signal line 5 and the source electrode 6 by a spinner, and the temperature of 90 ° C. Pre-baking for 5 minutes, and using 150 mJ / cm ² of ultraviolet light, red, green, and blue colored insulating layers 2 in the non-opening portions of the pixel region.
7R, 27G, and 27B overlap, and the pixel electrode 8
The electrical connection between the electrode and the source electrode 6 is a green insulating layer 27G '.
Exposure is performed using a photomask having a predetermined shape as formed in the through hole portion 29 of FIG.
After developing with an aqueous solution of MAH (tetramethylammonium hydride) for 60 seconds, washing with water, and post-baking at a temperature of 200 ° C. for 1 hour, a green insulating layer 27G ′ is formed. The red and blue insulating layers 27R and 27B are formed by the same method, but the red and blue insulating layers 27R and 27B are formed.
In the case of, the electrical connection between the pixel electrode 8 and the source electrode 6 is formed in such a shape as to be formed in the notch 28, and the source electrode 6 and the pixel electrode 8 in the notch 28 are formed.
In a portion where does not overlap, the signal lines 5 and the pixel electrodes 8 and the gate lines 2 and the pixel electrodes 8 approach each other by forming the red and blue insulating layers 27R and 27B so as to overlap each other. The occurrence of electrical coupling which has an electrical effect and light leakage are prevented. Each colored insulating layer 27R, 27G, 27 on the pixel opening
The thickness of B was about 3.5 μm. The portion where the three color insulating layers 27R, 27G and 27B overlap has a height of about 5 μm from the surface of only one insulating layer, and the distance between the opposing substrate and the array substrate (transparent substrate 21). (Not shown).

In the electrode substrate for a liquid crystal display element according to the second embodiment of the present invention, in this case, the pixel electrode 8 and the source electrode 6 on the green insulating layer 27G 'on which the necessary and sufficient patterning accuracy is obtained can be obtained. While the electrical connection portion is formed by the through-hole portion 29, the electrical connection portion between the pixel electrode 8 and the source electrode 6 on the red and green insulating layers 27R and 27B where the necessary and sufficient patterning accuracy cannot be obtained is cut out. 28
Therefore, even if the size of the electric connection portion is reduced to, for example, a square having a side of 7 μm, a poor electric connection between the pixel electrode 8 and the source electrode 6 does not occur. A high-yield, high-quality liquid crystal display device could be manufactured.

Most of the light leakage from the cutouts 28 of the red and blue insulating layers 27R and 27B is shielded by disposing the TFT 4, and the shape of the pixel electrode 8 is changed to the pixel electrode 8 and the source electrode. The shape of each of the colored insulating layers 27R, 27G, and 27B is the same except for the electrical connection with the pixel line 6, so that the signal line 5 and the pixel electrode 8, and the gate line 2 and the pixel The electrodes 8 are prevented from approaching each other. On the other hand, since the green insulating layer 27G 'having sufficient and sufficient patterning accuracy is formed with a through hole instead of a notch, light leakage from the peripheral portion of the TFT 4 in the pixel region where the green insulating layer 27G' is formed. Has been prevented.

The liquid crystal display element according to the present invention is constructed by using the above-described electrode substrate for a liquid crystal display element according to the present invention as an array substrate. Has the same configuration as the active matrix type liquid crystal display element.

The embodiments of the electrode substrate for a liquid crystal display element and the liquid crystal display element according to the present invention have been described above.
Hereinafter, components that can be changed in each of the above embodiments will be described. (1) In each of the above embodiments, a TFT is used as a switching element, but a TFD (Thin Film D) is used.
iode) may be used. (2) Each of the above embodiments has been described as a configuration example of an active matrix type liquid crystal display element, but the configuration of the present invention can be applied to other matrix type display elements such as a simple matrix type liquid crystal display element. (3) The semiconductor layer forming the TFT in each of the above embodiments may be made of amorphous silicon or polysilicon. When polysilicon is used, a driving circuit may be mounted on an array substrate. (4) Although each of the embodiments has been described as a configuration example of the transmission type liquid crystal display element, the configuration of the present invention can be applied to a reflection type liquid crystal display element. (5) In each of the above embodiments, a photosensitive organic material is used as a material of the colored insulating layer, but a non-photosensitive material may be used. (6) In each of the above embodiments, the colored insulating layer has the pigment dispersed therein. However, any other material may be used as long as the required spectral characteristics can be obtained, such as a dispersed pigment. (7) In each of the above embodiments, the colored insulating layer is a light-absorbing colored layer in which a pigment is dispersed. However, a non-light-absorbing type such as an interference type, a selective reflection type, or the like may be used, which is required. What is necessary is just to obtain a spectral characteristic. (8) In the second embodiment, the insulating layer at the portion where the electrical connection between the pixel electrode and the source electrode is formed is provided with a through-hole portion in a green insulating layer and a red and blue insulating layer. In the above, a notch portion was formed, but the insulating layer having that portion as a through-hole portion is not limited to a green insulating layer, and a one-color or two-color insulating layer capable of obtaining sufficient patterning accuracy is appropriately selected. Good.

[0033]

According to the electrode substrate for a liquid crystal display element according to the present invention, the colored insulating layer is formed in each pixel opening of the pixel region where the switching element is provided, and a notch is formed in a portion on the switching element. Since the electrical connection between the pixel electrode and the switching element is formed in the notch, the electrical connection is securely formed and maintained, and the size is reduced. Therefore, the formation of the electrical connection portion does not occur even if the process is performed, and as a result, the reliability and the yield are high, the number of manufacturing steps is small, and the high quality image display is performed without lowering the pixel aperture ratio. Can be provided at a low cost.

Among the colored insulating layers, the colored insulating layer having a sufficient and sufficient patterning accuracy in the patterning step has a through-hole instead of a notched portion. Light leakage from the periphery of the switching element in the formed pixel region can be effectively prevented.

Further, according to the liquid crystal display device of the present invention, since the above-mentioned electrode substrate for a liquid crystal display device is used as an array substrate, the electric connection between the pixel electrode and the predetermined electrode of the switching element is established. The connection portion is formed in the cutout portion of the colored insulating layer. As a result, the electrical connection portion is reliably formed and maintained, and even if the size is reduced, the formation of the electrical connection portion is defective. Does not occur, and as a result, without lowering the pixel aperture ratio, reliability and yield are high, the number of manufacturing steps is small,
In addition, a liquid crystal display device having a configuration capable of realizing high-quality image display can be provided at low cost.

[Brief description of the drawings]

FIG. 1 is a plan view of a liquid crystal display element electrode substrate according to a first embodiment of the present invention.

FIG. 2 is a sectional view taken along the line X-X 'in FIG.

FIG. 3 is an explanatory diagram comparing and contrasting a colored insulating layer in which a cutout portion is formed and a colored insulating layer in which a through-hole portion is formed as in the conventional configuration, in the liquid crystal display element electrode substrate according to the present invention.

FIG. 4 is a plan view of an electrode substrate for a liquid crystal display element according to a second embodiment of the present invention.

FIG. 5 is a sectional view taken along the line Y-Y ′ in FIG. 4;

FIG. 6 is a schematic sectional structural view of a conventional active matrix type liquid crystal display element.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Transparent substrate 2 Scanning line 3 Insulating film 4 Switching element (TFT) 5 Signal line 6 Source electrode 7R, 7G, 7B, 27R, 27G, 27B, 27
R ', 27G', 27B 'colored insulating layer 8 pixel electrode 9 light-shielding film 11, 29 through-hole portion 14 semiconductor layer 22 counter electrode (common electrode) 23 liquid crystal layer 24 alignment film 28 cutout portion 30 liquid crystal display element 31 counter substrate 32 array board

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yasuharu Tanaka 8 Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Prefecture Inside the Toshiba Yokohama office (72) Inventor Masumi Okamoto Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa No. 8 In the Toshiba Yokohama office of the Company Limited (72) Inventor Daisuke Miyazaki 8 in Shinsugita-cho, Isogo-ku, Yokohama-shi, Kanagawa Prefecture Inside the Toshiba Yokohama office of the Company Limited (72) 8 Tochiba Corporation Toshiba Yokohama Office (72) Inventor Koichi Mon Ma 7-1 Nisshincho, Kawasaki-ku, Kawasaki-shi, Kanagawa Prefecture Toshiba Electronic Engineering Co., Ltd.

Claims (8)

[Claims] A transparent substrate; a plurality of signal lines and a plurality of scanning lines formed on the transparent substrate so as to intersect with each other; and a plurality of signal lines and a plurality of scanning lines provided at intersections of the signal lines and the scanning lines. A switching element, a colored insulating layer formed in each pixel opening of a pixel region in which the switching element is provided, and having a cutout in a portion on the switching element; and the coloring of each pixel opening. A pixel electrode formed on an insulating layer and electrically connected to a predetermined electrode of the switching element at the notch; and the signal line, the scanning line, the switching element, the colored insulating layer, and the pixel electrode. And an alignment film formed on the entire surface of the transparent substrate. 2. A transparent substrate; a plurality of signal lines and a plurality of scanning lines formed on the transparent substrate so as to intersect each other; and a plurality of signal lines and a plurality of scanning lines provided at respective intersections of the signal lines and the scanning lines. A first colored insulating layer of at least one color, which is formed in any one of the pixel openings of the pixel region in which the switching element is provided, and has a cutout in a portion on the switching element. A second colored insulating layer of at least one color formed in any one of the pixel openings of the pixel region in which the switching element is provided, and having a through hole in a portion on the switching element; A pixel electrode formed on each of the colored insulating layers in the opening and electrically connected to a predetermined electrode of the switching element at the cutout or the through hole; Covering the line, the switching element, the first and second colored insulating layer and the pixel electrode,
An electrode substrate for a liquid crystal display device, comprising: an alignment film formed on the entire surface of the transparent substrate. 3. The liquid crystal display device electrode substrate according to claim 2, wherein the second colored insulating layer is a colored insulating layer capable of obtaining a necessary and sufficient patterning accuracy in a patterning step. Electrode substrate for display element. 4. The liquid crystal display element according to claim 1, wherein the colored insulating layer is made of a photosensitive resin having a spectral characteristic. Electrode substrate. 5. A first transparent substrate, a plurality of signal lines and a plurality of scanning lines formed on the first transparent substrate so as to intersect each other, and each of the signal lines and the scanning lines A switching element disposed at the intersection, a colored insulating layer formed in each pixel opening of the pixel region in which the switching element is disposed, and having a cutout in a portion on the switching element; A pixel electrode formed on each of the colored insulating layers in the opening and electrically connected to a predetermined electrode of the switching element in the cutout; and the signal line, the scanning line, the switching element, and the coloring. A first alignment film formed on the entire surface of the first transparent substrate so as to cover an insulating layer and the pixel electrode; a second transparent substrate; and a common electrode formed on the entire surface of the second transparent substrate. And the entire surface on the common electrode A liquid crystal assembled by bonding the formed second alignment film, the first alignment film and the second alignment film, and bonding the first transparent substrate and the second transparent substrate together A liquid crystal display element comprising: a liquid crystal layer sealed and sandwiched between cell substrates. 6. A first transparent substrate, a plurality of signal lines and a plurality of scanning lines formed on the first transparent substrate so as to intersect each other, and each of the signal lines and the scanning lines A switching element disposed at the intersection, and at least one of a first color formed at one of the pixel openings of the pixel region in which the switching element is disposed and having a cutout portion on the switching element; A second colored insulating layer of at least one color formed in any one of the pixel openings of the pixel region in which the switching element is disposed, and having a through hole in a portion on the switching element. A pixel electrode formed on each of the colored insulating layers in each of the pixel openings, and electrically connected to a predetermined electrode of the switching element in the cutout portion or the through hole portion; A first alignment film formed on the entire surface of the first transparent substrate, covering a line, the scanning line, the switching element, the colored insulating layer, and the pixel electrode; a second transparent substrate; 2, a common electrode formed on the entire surface of the transparent substrate, a second alignment film formed on the entire surface of the common electrode, and the first alignment film and the second alignment film facing each other. A liquid crystal display device, comprising: a liquid crystal layer sealed and sandwiched between substrates of a liquid crystal cell assembled by laminating the first transparent substrate and the second transparent substrate. 7. The liquid crystal display device according to claim 6, wherein said second colored insulating layer is a colored insulating layer capable of obtaining a necessary and sufficient patterning accuracy in a patterning step. 8. The liquid crystal display device according to claim 5, wherein said colored insulating layer is made of a photosensitive resin having spectral characteristics.