JP2000122074A - Liquid crystal display device - Google Patents

Liquid crystal display device

Info

Publication number
JP2000122074A
JP2000122074A JP10289305A JP28930598A JP2000122074A JP 2000122074 A JP2000122074 A JP 2000122074A JP 10289305 A JP10289305 A JP 10289305A JP 28930598 A JP28930598 A JP 28930598A JP 2000122074 A JP2000122074 A JP 2000122074A
Authority
JP
Japan
Prior art keywords
liquid crystal
shielding layer
light
display device
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10289305A
Other languages
Japanese (ja)
Inventor
Koichi Monma
公一 門馬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Development and Engineering Corp
Original Assignee
Toshiba Corp
Toshiba Electronic Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Electronic Engineering Co Ltd filed Critical Toshiba Corp
Priority to JP10289305A priority Critical patent/JP2000122074A/en
Publication of JP2000122074A publication Critical patent/JP2000122074A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To reduce the number of production steps of a picture frame lightproof layer, besides not to prevent injection of a liquid crystal composition into a liquid crystal cell by the picture frame lightproof layer at a position for a sealant injection port, to prevent light leakage from the injection port and to improve display quality. SOLUTION: A picture frame lightproof layer 31 is formed on a periphery of a display region by laminating colored layers 26, 27, 28 corresponding to three primary colors of a color filter 32. Also the film thickness of a picture frame light shielding layer 31a in the vicinity of an injection port 16a of a sealant 16 is reduced by patterning with decreased exposure using a stripe patterned photomask. A gap 33 for injecting a liquid crystal composition 14 between a counter substrate 13 and the layer 31a is formed thereby.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電極基板上に額縁
遮光層を有する液晶表示装置に関する。
The present invention relates to a liquid crystal display device having a frame light-shielding layer on an electrode substrate.

【0002】[0002]

【従来の技術】薄型軽量且つ低消費電力であり、パーソ
ナルOA機器の表示装置やテレビ等の映像表示装置に多
用される液晶表示装置にあっては、高機能高精細で良質
の画像を得るために、薄膜トランジスタ(以下TFTと
称する。)等のスイッチング素子にてマトリクス状に配
列される画素電極を駆動するアクティブマトリクス型の
カラー液晶表示装置の開発がなされている。そしてこの
ようなアクティブマトリクス型のカラー液晶表示装置
は、赤(R)、緑(G)、青(B)の絶縁性着色層及
び、クロム(Cr)等の金属膜からなりTFT上方を被
覆するTFT遮光層並びに、クロム(Cr)等からなり
表示領域周縁を被覆する額縁遮光層を有するカラーフィ
ルタを対向基板側に設け、カラー表示を行うと共にTF
T遮光層や額縁遮光層によりTFTへの光の進入を防い
だり表示領域周辺からの光漏れを防いでいた。
2. Description of the Related Art In a liquid crystal display device which is thin and light and has low power consumption and is frequently used for a display device of a personal OA device and a video display device such as a television, it is necessary to obtain a high-performance, high-definition and high-quality image. Further, an active matrix type color liquid crystal display device in which pixel electrodes arranged in a matrix are driven by switching elements such as thin film transistors (hereinafter referred to as TFTs) has been developed. Such an active matrix type color liquid crystal display device includes an insulating colored layer of red (R), green (G), and blue (B) and a metal film of chromium (Cr) or the like, and covers the upper part of the TFT. A color filter having a TFT light-shielding layer and a frame light-shielding layer made of chrome (Cr) or the like and covering the periphery of the display area is provided on the counter substrate side to perform color display and TF
The T light-shielding layer and the frame light-shielding layer prevent light from entering the TFT and prevent light leakage from around the display area.

【0003】しかしながら、TFT遮光層及び額縁遮光
層を有するカラーフィルタを対向基板側に設けた場合、
TFT及び画素電極が形成されるアレイ基板と対向基板
との合わせズレや、TFT遮光層とTFTとのピッチず
れ等によるマージンを考慮して、TFT遮光層及び額縁
遮光層等の遮光幅を広く設計しなければならず、液晶表
示装置の開口率を低減してしまい、輝度の低下により液
晶表示装置の表示品位の低下を来たすという問題を有し
ていた。
However, when a color filter having a TFT light shielding layer and a frame light shielding layer is provided on the counter substrate side,
The width of the light-shielding layer such as the TFT light-shielding layer and the frame light-shielding layer is designed to be large in consideration of the misalignment between the array substrate on which the TFT and the pixel electrode are formed and the counter substrate, and the margin due to the pitch shift between the TFT light-shielding layer and the TFT. Therefore, there is a problem that the aperture ratio of the liquid crystal display device is reduced, and the display quality of the liquid crystal display device is deteriorated due to a decrease in luminance.

【0004】このため近年、アレイ基板と対向基板との
合わせズレや、TFT遮光層とTFTとのピッチずれを
配慮し、遮光層を拡大する事により生じる開口率の低下
を解消するため、カラーフィルタをアレイ基板側に設け
る液晶表示装置が開発されている。但しこの場合、TF
T遮光層や額縁遮光層等の遮光膜材料としては金属等の
導電性の材料を使用する事が出来ず絶縁性の高い材料を
用いる必要が有る。具体的には有機樹脂絶縁膜からなる
赤(R)、緑(G)、青(B)の3原色の着色層をスト
ライプ状に形成し、更に黒色の有機樹脂絶縁膜にてTF
T遮光層及び額縁遮光層の遮光膜を形成してカラーフィ
ルタを完成し、その後液晶セルの間隙を均一に保持する
ための絶縁性の柱状スペーサ及び枠状のスペーサを更に
遮光膜上に形成していた。又遮光膜形成時、アレイ基板
及び対向基板間への液晶組成物の注入の妨げになること
から、シール剤の注入口と隣接する位置においては額縁
遮光層は設けられていなかった。
For this reason, in recent years, color filters have been developed to reduce the aperture ratio caused by enlarging the light-shielding layer in consideration of misalignment between the array substrate and the counter substrate and the pitch shift between the TFT light-shielding layer and the TFT. A liquid crystal display device in which is provided on the array substrate side has been developed. However, in this case, TF
As a light-shielding film material such as a T light-shielding layer and a frame light-shielding layer, a conductive material such as a metal cannot be used, and it is necessary to use a material having a high insulating property. Specifically, colored layers of three primary colors of red (R), green (G), and blue (B) made of an organic resin insulating film are formed in a stripe shape, and TF is formed with a black organic resin insulating film.
A color filter is completed by forming a light-shielding film of a T light-shielding layer and a frame light-shielding layer, and thereafter, an insulating columnar spacer and a frame-shaped spacer for uniformly maintaining a gap between liquid crystal cells are further formed on the light-shielding film. I was Further, at the time of forming the light-shielding film, a frame light-shielding layer was not provided at a position adjacent to the injection port of the sealant, because it hindered the injection of the liquid crystal composition between the array substrate and the counter substrate.

【0005】[0005]

【発明が解決しようとする課題】従来のアレイ基板側に
カラーフィルタを設けるカラー液晶表示装置にあって
は、カラーフィルタ形成時、赤(R)、緑(G)、青
(B)の3原色の着色層の他に黒色の絶縁性樹脂を用い
て遮光層を形成しなければならず、その上、基板間の間
隙を保持するための枠状スペーサ及び柱状スペーサを形
成していた事から、夫々の成膜及びパターン形成に時間
を要し、ひいては製造コストの上昇を招くという問題を
有していた。
In a conventional color liquid crystal display device in which a color filter is provided on the array substrate side, three primary colors of red (R), green (G), and blue (B) are formed when the color filter is formed. Since the light-shielding layer had to be formed by using a black insulating resin in addition to the colored layer described above, since the frame-shaped spacer and the column-shaped spacer for holding the gap between the substrates were formed, It takes a long time to form a film and form a pattern, which leads to an increase in manufacturing cost.

【0006】又、シール剤の注入口近傍にあっては、額
縁遮光層が形成されない事から、注入口からの光漏れに
より部分的にコントラストの低下を来たし表示品位を低
下するという問題も生じていた。
[0006] Further, since no frame light-shielding layer is formed in the vicinity of the injection port for the sealant, there is also a problem that the contrast is partially reduced due to light leakage from the injection port and the display quality is lowered. Was.

【0007】そこで本発明は上記課題を除去するもの
で、開口率の向上を図り且つカラーフィルタを有する基
板の製造工程数を低減し、製造時間の短縮によるコスト
の低価格化を図り、さらには表示品位の高い液晶表示装
置を提供する事を目的とする。
Accordingly, the present invention has been made to solve the above-mentioned problems, and aims to improve the aperture ratio, reduce the number of manufacturing steps of a substrate having a color filter, reduce the manufacturing time, and reduce the cost. It is an object to provide a liquid crystal display device with high display quality.

【0008】[0008]

【課題を解決するための手段】本発明は上記課題を解決
する為の手段として、対向配置される2枚の基板の周囲
をシール手段にて固着し、前記シール手段により囲繞さ
れる間隙に液晶組成物を封入して成る液晶表示装置にお
いて、何れか一方の基板にて前記シール手段に囲繞され
る表示領域周縁に設けられ少なくとも2種類以上の絶縁
性層を積層して成る額縁遮光層を設けるものである。
According to the present invention, as a means for solving the above-mentioned problems, a periphery of two substrates arranged opposite to each other is fixed by a sealing means, and a liquid crystal is filled in a gap surrounded by the sealing means. In a liquid crystal display device enclosing the composition, a frame light-shielding layer provided by laminating at least two or more types of insulating layers provided on the periphery of the display area surrounded by the sealing means on one of the substrates is provided. Things.

【0009】上記構成により本発明は、黒色の遮光膜を
設ける事無く絶縁っ製基板に形成される絶縁性膜を2種
類以上積層して額縁遮光層とする事により、基板の製造
工程数の低減を図り、製造コストの低減を図るものであ
る。
With the above structure, the present invention provides a frame light-shielding layer by laminating two or more types of insulating films formed on an insulating substrate without providing a black light-shielding film. It is intended to reduce the manufacturing cost.

【0010】又本発明は上記課題を解決する為の手段と
して、上記構成において、シール手段が注入口を具備
し、前記注入口近傍の額縁遮光層が、それ以外の領域に
おける額縁遮光層より薄く形成されるものである。
According to the present invention, as a means for solving the above-mentioned problems, in the above structure, the sealing means has an inlet, and the frame light-shielding layer near the inlet is thinner than the frame light-shielding layer in other areas. Is formed.

【0011】このように注入口近傍の額縁遮光層を薄く
する事により、基板間隙への液晶組成物の注入を妨げる
事無く注入口からの光漏れを防止し、表示品位の向上を
図るものである。
By reducing the thickness of the frame light-shielding layer in the vicinity of the injection port, light leakage from the injection port is prevented without hindering the injection of the liquid crystal composition into the gap between the substrates, thereby improving display quality. is there.

【0012】[0012]

【発明の実施の形態】以下本発明を図1乃至図4に示す
第1の実施の形態を参照して説明する。10は、アクテ
ィブマトリクス型のカラー液晶表示装置であり、TFT
11を有するアレイ基板12及び対向基板13を対向配
置して成り、シール剤16で囲繞される表示領域内の所
定の間隙に配向膜15a、15bを介し液晶組成物14
を封入してなっている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to a first embodiment shown in FIGS. Reference numeral 10 denotes an active matrix type color liquid crystal display device,
A liquid crystal composition 14 is disposed in a predetermined gap in a display area surrounded by a sealant 16 via alignment films 15a and 15b.
Is enclosed.

【0013】ここでアレイ基板12は、ガラス基板17
上にポリシリコン(p−Si)からなる半導体層18が
マトリクス状にパターン形成され、半導体層18を被覆
するシリコン酸化膜(SiOx)等からなるゲート絶縁
膜20を介し半導体層18のチャネル層に対応する領域
には走査線(図示せず)と一体のゲート電極21がパタ
ーン形成されている。ゲート電極21を覆うシリコン酸
化膜(SiOx)22a、シリコン窒化膜(SiNx)
22bからなる層間絶縁膜22上には信号線(図示せ
ず)と一体のドレイン電極23、及びソース電極24が
パターン形成され、ゲート絶縁膜20、層間絶縁膜22
に形成されるスルーホールを介して半導体層18のソー
ス領域に接続されている。
The array substrate 12 is a glass substrate 17
A semiconductor layer 18 made of polysilicon (p-Si) is patterned and formed in a matrix on the semiconductor layer 18. In a corresponding area, a gate electrode 21 integral with a scanning line (not shown) is pattern-formed. A silicon oxide film (SiOx) 22a covering the gate electrode 21, a silicon nitride film (SiNx)
A drain electrode 23 and a source electrode 24 integral with a signal line (not shown) are pattern-formed on the interlayer insulating film 22 made of 22b, and the gate insulating film 20, the interlayer insulating film 22
Is connected to the source region of the semiconductor layer 18 via a through hole formed in the semiconductor layer 18.

【0014】これ等の上には、有機樹脂絶縁膜からなる
赤(R)、緑(G)、青(B)の3原色の着色層26、
27、28がストライプ状にパターン形成される。着色
層26、27、28上のTFT11上方には、他の2色
の着色層26、27、28をそれぞれ積層する事により
TFT11を遮光し、更にアレイ基板12及び対向基板
13間の間隙を一定に保持するスペーサを兼用する柱状
のTFT遮光層30が形成され、着色層26、27、2
8周縁の額縁遮光領域には、3原色の着色層26、2
7、28を積層する事により着色層26、27、28周
縁を遮光し、更にアレイ基板12及び対向基板13間の
間隙を一定に保持するスペーサを兼用する枠状の額縁遮
光層31が設けられ、カラーフィルタ32を形成してい
る。
On these, colored layers 26 of three primary colors of red (R), green (G) and blue (B) made of an organic resin insulating film,
27 and 28 are patterned in a stripe pattern. Above the TFT 11 on the colored layers 26, 27 and 28, the other two colored layers 26, 27 and 28 are respectively laminated to shield the TFT 11 from light, and furthermore, the gap between the array substrate 12 and the counter substrate 13 is kept constant. A columnar TFT light-shielding layer 30 also serving as a spacer to be held is formed.
In the frame light-shielding area around the eight edges, the coloring layers 26, 2
A frame-shaped frame light-shielding layer 31 which also serves as a spacer for shielding the periphery of the colored layers 26, 27 and 28 by laminating the layers 7 and 28 and for keeping the gap between the array substrate 12 and the counter substrate 13 constant is provided. , A color filter 32.

【0015】但しシール剤16に形成される注入口16
a近傍に位置する額縁遮光層31aは、額縁遮光層31
を構成する3原色の着色層26、27、28が、それ以
外の領域の額縁遮光層31bに比し薄く形成され、図2
に示す様に対向基板13との間に、液晶組成物14を注
入するための間隙33が形成される。このようにしてな
るカラーフィルタ32上にインジウム錫酸化物(以下I
TOと称する。)からなる画素電極34がマトリクス状
にパターン形成され、画素電極34は、着色層26、2
7、28に形成されるスルーホールを介しソース電極2
4に接続している。
However, an inlet 16 formed in the sealant 16
The frame light-shielding layer 31a located in the vicinity of
2 are formed to be thinner than the frame light-shielding layer 31b in the other region, and the three primary color layers 26, 27, and 28 constituting FIG.
A gap 33 for injecting the liquid crystal composition 14 is formed between the liquid crystal composition 14 and the counter substrate 13 as shown in FIG. An indium tin oxide (hereinafter referred to as I) is formed on the color filter 32 thus formed.
Called TO. ) Are formed in a pattern in a matrix, and the pixel electrodes 34 are
Source electrode 2 through through holes formed in 7 and 28
4 is connected.

【0016】一方対向基板13は、ガラス基板36上に
ITOからなる対向電極37を有している。そしてアレ
イ基板12及び対向基板13はシール剤16により固着
され、注入口16aから両基板12、13間の間隙に液
晶組成物14を注入後、注入口16aを封止して、液晶
表示装置10を形成する。この注入口16aからの液晶
組成物14の注入時、注入口16a近傍の額縁遮光層3
1aと対向基板13との間には間隙33が形成されてお
り、液晶組成物14はこの間隙33から表示領域内に容
易に注入される事となる。
On the other hand, the counter substrate 13 has a counter electrode 37 made of ITO on a glass substrate 36. The array substrate 12 and the opposing substrate 13 are fixed by a sealant 16, and after injecting the liquid crystal composition 14 into the gap between the substrates 12 and 13 from the injection port 16a, the injection port 16a is sealed. To form When the liquid crystal composition 14 is injected from the injection port 16a, the frame light-shielding layer 3 near the injection port 16a is formed.
A gap 33 is formed between 1a and the opposing substrate 13, and the liquid crystal composition 14 is easily injected into the display area from the gap 33.

【0017】この様にして成るカラー液晶表示装置10
のアレイ基板12にあっては、第1の絶縁基板17上に
TFT11、ゲート絶縁膜20、ゲート電極21、層間
絶縁膜22更にはドレイン電極23及びソース電極24
を形成後、次のような製造方法によりアレイ基板12上
にカラーフィルタ32を形成する。
The color liquid crystal display device 10 thus constructed
In the array substrate 12, the TFT 11, the gate insulating film 20, the gate electrode 21, the interlayer insulating film 22, the drain electrode 23, and the source electrode 24 are formed on the first insulating substrate 17.
Is formed, a color filter 32 is formed on the array substrate 12 by the following manufacturing method.

【0018】即ち信号線(図示せず)、ドレイン電極2
3、ソース電極24のパターン上方に赤色の顔料を分散
させた紫外線硬化型アクリル樹脂レジストCR−200
0(富士ハントテクノロジ(株)製)をスピンナーにて
全面塗布し、表示領域及び額縁遮光領域の赤(R)を着
色したい部分に光を照射するフォトマスク38を介し、
365nmの波長光を100mJ/cm2照射し、水酸
化カリウム(KOH)の1%水溶液で10秒間現像し、
赤(R)のレジストCR−2000を配置し230℃で
1時間焼成して膜厚2.0μmの赤色の着色層26を形
成する。
That is, the signal line (not shown) and the drain electrode 2
3. UV-curable acrylic resin resist CR-200 in which a red pigment is dispersed above the pattern of the source electrode 24
0 (manufactured by Fuji Hunt Technology Co., Ltd.) using a spinner, and applying a light to a portion of the display area and the frame light-shielding area where red (R) is to be colored through a photomask 38,
Irradiate 100 mJ / cm2 with 365 nm wavelength light, develop with 1% aqueous solution of potassium hydroxide (KOH) for 10 seconds,
A red (R) resist CR-2000 is arranged and baked at 230 ° C. for 1 hour to form a 2.0 μm-thick red colored layer 26.

【0019】但し、フォトマスク38のシール剤16の
注入口16a近傍の額縁遮光層31aに相当する領域に
はストライプパターン38aが形成され、レジストCR
−2000への照射光量がそれ以外の領域への照射光量
に比し低減されるため、現像及び焼成後に形成される注
入口16a近傍の額縁遮光層31aの赤色の着色層26
aの膜厚は、0.5〜1.0μmとなり、それ以外の領
域の膜厚に比し薄くされる。
However, a stripe pattern 38a is formed in a region corresponding to the frame light-shielding layer 31a near the injection port 16a of the sealant 16 of the photomask 38, and the resist CR
Since the irradiation light amount to −2000 is reduced as compared with the irradiation light amount to other regions, the red colored layer 26 of the frame light-shielding layer 31a near the injection port 16a formed after development and baking is formed.
The film thickness of “a” is 0.5 to 1.0 μm, which is smaller than the film thickness in other regions.

【0020】同様にフォトリソグラフィにより緑色
(G)の顔料を分散させた紫外線硬化型アクリル樹脂レ
ジストCG−2000(富士ハントテクノロジ(株)
製)及び青色(B)の顔料を分散させた紫外線硬化型ア
クリル樹脂レジストCB−2000(富士ハントテクノ
ロジ(株)製)を必要部分に配置し、それぞれ230℃
で1時間焼成しそれぞれ膜厚2.0μmの着色層27、
28を形成する。これにより、表示領域には3原色の着
色層26、27、28が夫々ストライプ状に形成される
フィルタ部分と3原色の着色層26、27、28が積層
されるTFT遮光層30とを形成され、額縁領域には3
原色の着色層26、27、28が積層される額縁遮光層
31を形成される。
Similarly, a UV-curable acrylic resin resist CG-2000 (Fuji Hunt Technology Co., Ltd.) in which a green (G) pigment is dispersed by photolithography
UV-curable acrylic resin resist CB-2000 (manufactured by Fuji Hunt Technology Co., Ltd.) in which pigments of blue and blue (B) are dispersed.
For 1 hour, and each of the colored layers 27 having a thickness of 2.0 μm.
28 are formed. As a result, in the display region, a filter portion in which the three primary color layers 26, 27, and 28 are formed in stripes, respectively, and a TFT light-shielding layer 30 in which the three primary color layers 26, 27, and 28 are stacked are formed. , 3 in the frame area
A frame light-shielding layer 31 on which the primary color layers 26, 27, and 28 are laminated is formed.

【0021】但し、シール剤16の注入口16a近傍の
額縁遮光層31aに相当する領域にあっては、赤色
(R)と同様、緑色(G)、青色(B)の場合にもレジ
ストCG−2000、レジストCB−2000への照射
光量がそれ以外の領域への照射光量に比し低減されるた
め、現像及び焼成後に形成される注入口16a近傍の額
縁遮光層31aの緑色(G)、青色(B)の着色層27
a,28aの膜厚は、夫々0.5〜1.0μmとなり、
それ以外の領域の膜厚に比し薄くされ、注入口16a近
傍の位置にあっては額縁遮光層31aと対向基板13と
の間に液晶組成物14を注入するための間隙33が形成
される。
However, in the region corresponding to the frame light-shielding layer 31a near the injection port 16a of the sealant 16, the resist CG-color is also used for green (G) and blue (B) as well as red (R). 2000, since the amount of light applied to the resist CB-2000 is reduced as compared to the amount of light applied to other regions, the green (G) and blue colors of the frame light-shielding layer 31a near the injection port 16a formed after development and baking. (B) Colored layer 27
a and 28a each have a thickness of 0.5 to 1.0 μm,
A gap 33 for injecting the liquid crystal composition 14 is formed between the frame light-shielding layer 31a and the counter substrate 13 at a position near the injection port 16a, which is thinner than the film thickness of the other region. .

【0022】この様にしてカラーフィルタ32形成後フ
ォトエッチング法によりソース電極24に達するスルー
ホールを形成して、これ等の上にITOをスパッタ法に
より1500オングストローム成膜し、フォトエッチン
グ法により所定の形状にパターンニングして画素電極3
4を形成する。これにより、スルーホールを介し画素電
極34はソース電極24に電気的に接続する。その後、
ポリイミドであるAL−1051(日本合成ゴム(株)
製)を全面に500オングストローム塗布し、ラビング
処理を行い配向膜15aを形成しする。
After the color filter 32 is formed in this way, a through hole reaching the source electrode 24 is formed by a photo-etching method, and a 1500 angstrom film of ITO is formed on the through-hole by a photo-etching method. Pattern the pixel electrode 3
4 is formed. Thereby, the pixel electrode 34 is electrically connected to the source electrode 24 via the through hole. afterwards,
AL-1051 which is a polyimide (Nippon Synthetic Rubber Co., Ltd.)
Is coated on the entire surface to a thickness of 500 angstroms, and a rubbing process is performed to form an alignment film 15a.

【0023】次に対向基板13にあっては、透明絶縁基
板36上にスパッタ法によりITOから成る厚さ150
0オングストロームの対向電極37を全面に形成し、ポ
リイミドであるAL−1051(日本合成ゴム(株)
製)を全面に500オングストローム塗布し、ラビング
処理を行い配向膜15bを形成する。
Next, in the counter substrate 13, the transparent insulating substrate 36 is sputtered to a thickness of 150
A counter electrode 37 of 0 angstrom is formed on the entire surface, and polyimide AL-1051 (Nippon Synthetic Rubber Co., Ltd.)
Is coated on the entire surface by 500 angstroms, and a rubbing process is performed to form an alignment film 15b.

【0024】この後アレイ基板12の表示領域周辺に沿
って、注入口16aを設けてシール剤16を印刷し、ア
レイ基板12から対向電極13に電圧を印加するための
電極転移材(図示せず)をシール剤16の周辺の電極転
移電極上(図示せず)に形成し、配向膜15a、15b
のそれぞれのラビング方向が90度となるようアレイ基
板12及び対向基板313を対向配置し、シール剤16
を加熱硬化して両基板12、13を固着して液晶セルを
形成する。
Thereafter, an injection port 16a is provided along the periphery of the display area of the array substrate 12, a sealant 16 is printed, and an electrode transfer material (not shown) for applying a voltage from the array substrate 12 to the counter electrode 13 is provided. ) Is formed on the electrode transfer electrode (not shown) around the sealing agent 16 and the alignment films 15a and 15b are formed.
The array substrate 12 and the opposing substrate 313 are arranged to face each other so that the rubbing directions of the
Is heat-cured to fix both substrates 12 and 13 to form a liquid crystal cell.

【0025】次に減圧注入法等により注入口16aから
液晶組成物14であるZLI−1565(E.メルク社
製)にカイラル剤を0.lwt%添加したものを注入す
る。この液晶組成物14の注入時、注入口16a近傍の
額縁遮光層31aは、パターン形成時に各着色層26
a、27a、28aが薄く形成されており、アレイ基板
12との間に間隙33が形成されている事から、液晶組
成物14は、間隙33からスムースに注入される。そし
て液晶組成物14注入後、注入口16aを紫外線硬化樹
脂46で封止しカラー液晶表示装置10を完成する。尚
この様にして得られたカラー液晶表示装置10は、注入
口16aにおける光漏れが無く、表示領域全域にわたり
均一且つ良好なコントラストを得られた。
Next, a chiral agent was added to the liquid crystal composition 14 (ZLI-1565 (manufactured by E. Merck)) from the injection port 16a by a vacuum injection method or the like. The one added with lwt% is injected. When the liquid crystal composition 14 is injected, the frame light-shielding layer 31a near the injection port 16a becomes the colored layer 26 during pattern formation.
The liquid crystal composition 14 is smoothly injected from the gap 33 because a, 27a, and 28a are thinly formed and the gap 33 is formed between the liquid crystal composition 14 and the array substrate 12. After the liquid crystal composition 14 is injected, the injection port 16a is sealed with an ultraviolet curable resin 46 to complete the color liquid crystal display device 10. In the color liquid crystal display device 10 thus obtained, there was no light leakage at the injection port 16a, and a uniform and good contrast was obtained over the entire display region.

【0026】このように構成すれば、スペーサを兼用す
るTFT遮光層30及び額縁遮光層31を、カラーフィ
ルタ32のストライプ状の3原色の着色層26、27、
28と同一材料且つ同一工程にて形成出来ることから、
従来のように、3原色の着色層の他に黒色の遮光層を別
に層形成してTFT遮光層あるいは額縁遮光層を形成す
る必要が無い。又、スペーサの散布あるいは柱状スペー
サの製造工程等が不要と成ることからも、従来に比しア
レイ基板12の製造工程数を低減出来、製造時間の短縮
を得られひいてはコストの低減による低価格化を図れ
る。
According to this structure, the TFT light-shielding layer 30 and the frame light-shielding layer 31 which also function as spacers are formed of the stripe-shaped colored layers 26 and 27 of the color filter 32,
Since it can be formed by the same material and the same process as 28,
Unlike the conventional case, there is no need to separately form a black light-shielding layer in addition to the three primary color layers to form the TFT light-shielding layer or the frame light-shielding layer. Further, since the step of dispersing the spacers or the step of manufacturing the columnar spacers becomes unnecessary, the number of manufacturing steps of the array substrate 12 can be reduced as compared with the related art, and the manufacturing time can be shortened. Can be achieved.

【0027】またカラーフィルタ32がアレイ基板12
側に設けられることから、アレイ基板12と対向基板1
3との合わせズレや、TFT11とのピッチずれ等によ
るTFT遮光層30のマージンを考慮する事無く、TF
T遮光層30を必要最小限のサイズとする事が出来、開
口率を向上出来輝度の向上を図れる。更に額縁遮光層3
1形成時、注入口16a近傍の位置においては、ストラ
イプパターンが形成されるフォトマスクを用いて露光々
量を低減して各着色層26、27、28をパターン形成
するのみで、容易に他の領域に比し層厚を薄く出来、額
縁遮光層31aと対向基板12との間に間隙33を形成
出来、液晶組成物14の注入時、注入操作を妨げる事無
く且つ注入口16aからの光漏れによるコントラストの
低下を防止出来表示品位の向上を図れる。
The color filter 32 is used for the array substrate 12.
Side, the array substrate 12 and the opposing substrate 1
3 without considering the margin of the TFT light shielding layer 30 due to the misalignment with the TFT 3 or the pitch shift from the TFT 11.
The size of the T light-shielding layer 30 can be reduced to a necessary minimum, the aperture ratio can be improved, and the luminance can be improved. Further, the frame light shielding layer 3
At the time of formation 1, at the position near the injection port 16a, the amount of exposure is reduced using a photomask on which a stripe pattern is formed, and only the colored layers 26, 27, and 28 are pattern-formed. The thickness of the liquid crystal composition 14 can be made smaller than that of the liquid crystal composition 14, and a gap 33 can be formed between the frame light-shielding layer 31a and the counter substrate 12, so that the liquid crystal composition 14 does not hinder the injection operation and leaks light from the injection port 16a. And the display quality can be improved.

【0028】尚本発明は上記実施の形態に限られるもの
でなくその趣旨を変えない範囲での変更は可能であっ
て、例えば着色層は、材質や形成方法あるいは層厚等限
定されず、染色法、印刷法、電着法等により形成する等
任意であるし、着色層を積層して成る遮光層をスペーサ
と兼用する場合には電極基板間の間隙に応じてその層厚
も任意である。又注入口近傍の額縁遮光層の厚さも、液
晶組成物を注入可能であれば限定されないし、フォトリ
ソグラフィ技術を用いて額縁遮光層を形成する際にドッ
トパターンや市松模様を有するフォトマスクにてその厚
さを調整する等しても良い。更に着色層と画素電極の積
層順位も限定されず、画素電極上方に着色層を設ける等
しても良い。
The present invention is not limited to the above-described embodiment, and can be changed without departing from the spirit of the present invention. For example, the coloring layer is not limited in material, forming method, layer thickness and the like. Method, a printing method, an electrodeposition method, or the like. In the case where a light-shielding layer formed by laminating a coloring layer is also used as a spacer, its layer thickness is also arbitrary according to the gap between the electrode substrates. . Also, the thickness of the frame light-shielding layer near the injection port is not limited as long as the liquid crystal composition can be injected, and when forming the frame light-shielding layer using photolithography technology, a photomask having a dot pattern or a checkered pattern is used. The thickness may be adjusted. Further, the stacking order of the coloring layer and the pixel electrode is not limited, and a coloring layer may be provided above the pixel electrode.

【0029】[0029]

【発明の効果】以上説明したように本発明によれば、カ
ラーフィルタに用いる異なる色の着色層を複数層積層し
て遮光層を形成する事により、遮光層のためのみの新た
な層形成工程を行う必要が無く、製造工程数の低減を図
れ、製造時間の短縮更にはコストの低価格化を図れる。
又遮光層をスペーサと兼用する事によってもその散布工
程あるいは形成工程が不要となり、製造工程数を一層低
減出来る。又階調を有するフォトマスクにて着色層をパ
ターン形成して、注入口近傍の部分の遮光層厚を低減す
ることにより、液晶組成物の注入操作を妨げる事無く注
入口の遮光を行え、コントラストの均一化による表示品
位の向上を図れる。
As described above, according to the present invention, by forming a light shielding layer by laminating a plurality of colored layers of different colors used for a color filter, a new layer forming process only for the light shielding layer is performed. Need not be performed, the number of manufacturing steps can be reduced, the manufacturing time can be reduced, and the cost can be reduced.
Also, by using the light shielding layer also as a spacer, the dispersing step or the forming step becomes unnecessary, and the number of manufacturing steps can be further reduced. In addition, by forming a colored layer with a photomask having a gradation and reducing the thickness of the light-shielding layer in the vicinity of the injection port, the injection port can be shielded from light without hindering the injection operation of the liquid crystal composition. The display quality can be improved by making the display uniform.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態のカラー液晶表示装置を平
面から見た概略説明図である。
FIG. 1 is a schematic explanatory view of a color liquid crystal display device according to an embodiment of the present invention as viewed from a plane.

【図2】本発明の実施の形態のカラー液晶表示装置の図
1のA−A´線における概略断面図である。
FIG. 2 is a schematic sectional view taken along line AA ′ of FIG. 1 of the color liquid crystal display device according to the embodiment of the present invention.

【図3】本発明の実施の形態のカラー液晶表示装置の図
1のB−B´線における概略断面図である。
FIG. 3 is a schematic sectional view taken along line BB ′ of FIG. 1 of the color liquid crystal display device according to the embodiment of the present invention.

【図4】本発明の実施の形態のフォトマスクを示す概略
平面図である。
FIG. 4 is a schematic plan view showing a photomask according to the embodiment of the present invention.

【符号の説明】[Explanation of symbols]

10…カラー液晶表示装置 11…TFT 12…アレイ基板 13…対向基板 14…液晶組成物 16…シール剤 16a…注入口 17…ガラス基板 18…半導体層 21…ゲート電極 22…層間絶縁膜 23…ドレイン電極 24…ソース電極 26、27、28…着色層 30…TFT遮光層 31…額縁遮光層 32…カラーフィルタ 33…間隙 34…画素電極 DESCRIPTION OF SYMBOLS 10 ... Color liquid crystal display device 11 ... TFT 12 ... Array substrate 13 ... Opposite substrate 14 ... Liquid crystal composition 16 ... Sealant 16a ... Injection port 17 ... Glass substrate 18 ... Semiconductor layer 21 ... Gate electrode 22 ... Interlayer insulating film 23 ... Drain Electrode 24: Source electrode 26, 27, 28: Colored layer 30: TFT light-shielding layer 31: Frame light-shielding layer 32: Color filter 33: Gap 34: Pixel electrode

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H042 AA06 AA15 AA26 2H089 LA09 LA11 LA13 LA42 NA07 PA05 QA12 QA16 2H091 FA02Y FA34Y LA12 LA13 LA17  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H042 AA06 AA15 AA26 2H089 LA09 LA11 LA13 LA42 NA07 PA05 QA12 QA16 2H091 FA02Y FA34Y LA12 LA13 LA17

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 対向配置される2枚の基板の周囲をシー
ル手段にて固着し、前記シール手段により囲繞される間
隙に液晶組成物を封入して成る液晶表示装置において、
何れか一方の基板にて前記シール手段に囲繞される表示
領域周縁に設けられ少なくとも2種類以上の絶縁性層を
積層して成る額縁遮光層を具備する事を特徴とする液晶
表示装置。
1. A liquid crystal display device comprising: two substrates disposed opposite to each other; and a liquid crystal composition sealed in a gap surrounded by the sealing means.
A liquid crystal display device comprising a frame light-shielding layer provided on one of the substrates around a display area surrounded by the sealing means and formed by laminating at least two or more types of insulating layers.
【請求項2】 対向配置される2枚の基板の周囲をシー
ル手段にて固着し、前記シール手段により囲繞される間
隙に液晶組成物を封入して成る液晶表示装置において、
何れか一方の基板設けられ複数の絶縁性着色層からなる
フィルタ層と、このフィルタ層と同一基板上に設けられ
前記シール手段に囲繞される表示領域周縁にて少なくと
も2種類以上の前記絶縁性着色層を積層して成る額縁遮
光層とを具備する事を特徴とする液晶表示装置。
2. A liquid crystal display device comprising: two substrates arranged opposite to each other; and a liquid crystal composition sealed in a gap surrounded by the sealing means.
A filter layer provided on one of the substrates and comprising a plurality of insulative colored layers, and at least two or more types of the insulative colored layers provided on the same substrate as the filter layer and surrounding the display area surrounded by the sealing means; A liquid crystal display device comprising a frame light-shielding layer formed by stacking layers.
【請求項3】 シール手段が注入口を具備し、前記注入
口近傍の額縁遮光層が、それ以外の領域における額縁遮
光層より薄く形成される事を特徴とする請求項1又は請
求項2のいずれかにおける液晶表示装置。
3. The sealing device according to claim 1, wherein the sealing means has an inlet, and the frame light-shielding layer in the vicinity of the inlet is formed thinner than the frame light-shielding layer in other areas. Liquid crystal display device in any of them.
JP10289305A 1998-10-12 1998-10-12 Liquid crystal display device Pending JP2000122074A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10289305A JP2000122074A (en) 1998-10-12 1998-10-12 Liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10289305A JP2000122074A (en) 1998-10-12 1998-10-12 Liquid crystal display device

Publications (1)

Publication Number Publication Date
JP2000122074A true JP2000122074A (en) 2000-04-28

Family

ID=17741470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10289305A Pending JP2000122074A (en) 1998-10-12 1998-10-12 Liquid crystal display device

Country Status (1)

Country Link
JP (1) JP2000122074A (en)

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