JP2000098367A - Liquid crystal display device and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a high quality and high aperture ratio liquid crystal display device in a high yield without paying attention to position-shifting in the case where two substrates constituting the liquid crystal display device are stuck together. SOLUTION: A projecting part 11a is formed at the boundary of adjacent pixels by recessedly etching a pixel part of an interlayer insulating film 11 which is formed on a TFT and electrode wiring of a TFT array substrate and flattens its surface. Succeedingly a pixel electrode 13 and a color filter 14 are formed in a region separated by the projecting parts 11a.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] 1. Field of the Invention [0002] The present invention relates to a liquid crystal display device equipped with a thin film transistor (hereinafter, referred to as TFT) and a method of manufacturing the same.

[0002]

2. Description of the Related Art Liquid crystal display devices are being actively researched and developed as one of flat panel displays replacing CRTs. In particular, they are characterized by low power consumption and thinness. It has been put to practical use in notebook computers, car navigation systems and the like. As a driving method of a liquid crystal display device, an active matrix type TFT array using TFTs as switching elements is mainly used from the viewpoint of high quality display. Conventional active matrix type liquid crystal display devices
A first electrode having a scanning electrode, a signal electrode, a pixel electrode made of a transparent conductive film and a TFT made of a semiconductor layer, and a scanning electrode, a signal electrode, a pixel electrode made of a transparent conductive film, and an electrode wiring formed around the pixel electrode on a transparent insulating substrate Substrate (TFT array substrate)
And a second substrate (opposite substrate) having a color filter, a black matrix (hereinafter, referred to as BM) and an opposing electrode on another transparent insulating substrate, and adhering the first substrate and the second substrate. It is constituted by injecting a liquid crystal material between substrates.

In order to reduce the power consumption of a liquid crystal display device,
It is effective to increase the effective display area of the pixel portion of the liquid crystal display panel, that is, to improve the aperture ratio of the pixel. However, a conventional liquid crystal display device has a first substrate having pixel electrodes and a color filter. It is necessary to increase the area where the BM is formed so as to cover the peripheral portion of the pixel electrode in consideration of the displacement at the time of bonding with the second substrate. This makes it difficult to increase the aperture ratio of the pixel. As a method of forming a liquid crystal display device without considering a positional shift at the time of bonding the first substrate and the second substrate, a TFT, a pixel electrode, and the like are formed, and a color filter is formed by using an electrodeposition method. A color filter on array structure formed on the substrate side is disclosed in
874.

Japanese Patent Application Laid-Open No. 9-127553 discloses that after forming a TFT and an electrode wiring on a transparent insulating substrate, an interlayer insulating film made of a transparent resin is formed so as to cover the TFT and the electrode wiring. A pixel electrode having a large area is formed on the interlayer insulating film so as to overlap with a scanning electrode and the like below the interlayer insulating film, and an electrical connection between the pixel electrode formed on the interlayer insulating film and a drain electrode of the TFT is formed. Discloses a TFT array structure for the purpose of improving the aperture ratio through a contact hole formed in an interlayer insulating film and suppressing alignment defects of liquid crystal molecules due to rubbing defects.

[0005]

As described above, in order to realize a high aperture ratio TFT array, a first substrate (TFT) is required.
As a method of forming a liquid crystal display device without considering a positional shift at the time of laminating an array substrate) and a second substrate (a counter substrate), a structure in which a color filter is formed on a TFT array substrate side by using an electrodeposition method. However, since the color filter film formed by the electrodeposition method grows in the lateral direction to be equal to or more than the thickness direction, a short circuit occurs between the pixels by contacting adjacent pixel electrodes. There was a problem of letting it. In addition, even when a step formed by the electrode wiring formed around the pixel electrode is used as a partition, the step formed by the electrode wiring is thinner than the thickness of the color filter film and easily gets over, thereby causing a short circuit.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems, and has been made without taking into account a positional shift at the time of bonding two substrates constituting a liquid crystal display device.
It is an object of the present invention to obtain a liquid crystal display device having a high quality and a high aperture ratio at a high yield. It is another object of the present invention to provide a manufacturing method suitable for this device.

[0007]

A liquid crystal display device according to the present invention comprises a transparent insulating substrate, a plurality of scanning lines formed in a row direction on the transparent insulating substrate, and a column direction intersecting the scanning lines. A plurality of signal lines formed in, a switching element formed in a pixel region partitioned by two parallel scanning lines and signal lines, respectively, a scanning line, formed in a layer above the signal line and the switching element, An interlayer insulating film that absorbs steps of scanning lines, signal lines, and switching elements, and is formed in each pixel region on the interlayer insulating film, and is electrically connected to the switching elements via contact holes provided in the interlayer insulating film. A pixel electrode, a first substrate having a color filter formed on the pixel electrode, a second substrate holding a liquid crystal material together with the first substrate, and the interlayer insulating film has a pixel region having a concave shape. It is, between adjacent pixels has a structure which is isolated by protrusions of the interlayer insulating film, the pixel electrode and the color filter are those formed in the concave shape portion which are separated by protrusions of the interlayer insulating film.

A transparent insulating substrate, a plurality of scanning lines formed in a row direction on the transparent insulating substrate, and a plurality of signal lines formed in a column direction intersecting the scanning lines are parallel to each other. A switching element formed in a pixel region partitioned by two scanning lines and a signal line; and a switching element formed in a layer above the scanning line, the signal line and the switching element to absorb a step between the scanning line, the signal line and the switching element. An interlayer insulating film, a color filter formed on the interlayer insulating film so as to match each pixel region, and a switching element electrically connected to the switching element through a contact hole formed on the color filter and provided in the interlayer insulating film and the color filter. A first substrate having a pixel electrode connected to the first substrate, a second substrate sandwiching a liquid crystal material together with the first substrate, the interlayer insulating film is etched in a concave pixel area, Between adjacent pixels has a structure which is isolated by protrusions of the interlayer insulating film, a color filter and the pixel electrode is being formed in a concave shape portion which are separated by protrusions of the interlayer insulating film.

A transparent insulating substrate, a plurality of scanning lines formed in a row direction on the transparent insulating substrate, and a plurality of signal lines formed in a column direction intersecting the scanning lines are parallel to each other. A switching element formed in a pixel region partitioned by two scanning lines and a signal line; and a switching element formed in a layer above the scanning line, the signal line and the switching element to absorb a step between the scanning line, the signal line and the switching element. A second color filter having an interlayer insulating film and a conductive color filter formed on the interlayer insulating film in alignment with each pixel region and electrically connected to the switching element through a contact hole provided in the interlayer insulating film; One substrate, a second substrate sandwiching a liquid crystal material together with the first substrate, the pixel region of the interlayer insulating film is etched into a concave shape, and adjacent pixels are separated by protrusions of the interlayer insulating film. Has the structure, color filters are those formed in the concave shape portion which are separated by protrusions of the interlayer insulating film.

Further, the color filter having conductivity is formed of a low-resistance material so as to function as a pixel electrode. Further, the depth of the concave portion of the interlayer insulating film is within ± 200 nm of the total thickness of the pixel electrode and the color filter formed in the concave portion, or the thickness of the conductive color filter.

In addition, a transparent insulating substrate, a plurality of scanning lines formed in a row direction on the transparent insulating substrate, and a plurality of signal lines formed in a column direction intersecting the scanning lines are parallel. A switching element formed in a pixel region partitioned by two scanning lines and a signal line; and a switching element formed in a layer above the scanning line, the signal line and the switching element to absorb a step between the scanning line, the signal line and the switching element. At the same time, an interlayer insulating film having a protrusion formed between adjacent pixels by etching the pixel region into a concave shape on the surface, an opaque film formed on the protrusion of the interlayer insulating film, and an interlayer insulating film. A first substrate having a pixel electrode formed at the bottom of the concave shape and electrically connected to the switching element via a contact hole provided in the interlayer insulating film, and a color filter formed on the pixel electrode Comprising a second substrate which sandwich a liquid crystal material with the first substrate, the color filter is one which is formed by overhanging the opaque film formed on the projecting portion of the interlayer insulating film.

Further, the opaque film is a metal film, and the color filter is made of an insulating resin. The opaque film is an insulating film, and the color filter is made of a conductive resin. Further, the width of the protrusion of the interlayer insulating film is formed smaller than the width of the scanning line and the signal line, and the pixel electrode and the color filter formed in the concave portion of the interlayer insulating film overlap the scanning line and the signal line. It is formed by Further, the color filter is formed by laminating a plurality of colors constituting the color filter in the outer peripheral portion of the display area.

Further, according to the manufacturing method of the present invention, two transparent insulating substrates having electrodes formed on at least one of them are opposed to each other and bonded, and a liquid crystal is provided between the two transparent insulating substrates. In the method for manufacturing a liquid crystal display device in which a material is sandwiched, a plurality of scanning lines in a row direction on one of two transparent insulating substrates, a plurality of signal lines in a column direction intersecting the scanning lines, and Forming a switching element in a pixel region partitioned by two scanning lines and signal lines, applying a transparent resin having photosensitivity to a layer above the scanning lines, signal lines and switching elements, exposing, developing Forming an interlayer insulating film having a contact hole at a predetermined position; forming a resist pattern; etching a pixel region of the interlayer insulating film into a concave shape to form a protrusion of the interlayer insulating film between adjacent pixels; A transparent conductive film is formed on the interlayer insulating film and in the contact hole, and the transparent conductive film on the protrusion of the interlayer insulating film is etched to be electrically connected to the switching element via the contact hole. The method includes a step of forming a pixel electrode on the concave bottom of the interlayer insulating film, and a step of forming a color filter on the pixel electrode in the concave portion separated by the protrusion of the interlayer insulating film using a colored resin.

[0014] At least one of the two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. In the method of manufacturing a liquid crystal display device, a plurality of scanning lines in the row direction on one of the two transparent insulating substrates,
Forming a plurality of signal lines in a column direction intersecting the scanning lines, forming a switching element in a pixel region divided by two scanning lines and the signal lines in parallel, and scanning lines, signal lines, and switching elements. A step of applying a transparent resin having photosensitivity to the upper layer, forming an interlayer insulating film having a contact hole at a predetermined position by exposure and development, forming a resist pattern, and etching a pixel region of the interlayer insulating film into a concave shape. Forming a protruding portion of the interlayer insulating film between adjacent pixels, and forming a transparent conductive film on the interlayer insulating film and in the contact hole with the resist used for forming the protruding portion of the interlayer insulating film remaining. By forming the film and removing the resist, the transparent conductive film on the protruding portion of the interlayer insulating film is removed by a lift-off method, and the film is removed through the switching element and the contact hole. Forming a pixel electrode electrically connected to the concave bottom of the interlayer insulating film, and forming a color filter on the pixel electrode in the concave portion separated by the protrusion of the interlayer insulating film using a colored resin This includes the step of performing

Further, the method includes a step of forming a color filter in a concave portion separated by a protrusion of the interlayer insulating film on the pixel electrode, and removing the color filter overhanging on the protrusion by an etch-back process.

Further, at least one of the two transparent insulating substrates having electrodes formed thereon is adhered to and opposed to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. In the method of manufacturing a liquid crystal display device, a plurality of scanning lines in the row direction on one of the two transparent insulating substrates,
Forming a plurality of signal lines in a column direction intersecting the scanning lines, forming a switching element in a pixel region divided by two scanning lines and the signal lines in parallel, and scanning lines, signal lines, and switching elements. A step of applying a transparent resin having photosensitivity to the upper layer, forming an interlayer insulating film having a contact hole at a predetermined position by exposure and development, forming a resist pattern, and etching a pixel region of the interlayer insulating film into a concave shape. Forming a protrusion of the interlayer insulating film between adjacent pixels, forming a transparent conductive film on the interlayer insulating film and in the contact hole, and forming a concave shape isolated by the protrusion of the interlayer insulating film. Applying a colored resin in the portion, forming a color filter on the transparent conductive film in the concave portion, etching the transparent conductive film using the color filter as a mask, The pixel electrode which is electrically connected via a contact hole is intended to include the step of forming the concave portion of the interlayer insulating film.

Further, at least one of the two transparent insulating substrates having electrodes formed thereon is adhered to and opposed to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. In the method of manufacturing a liquid crystal display device, a plurality of scanning lines in the row direction on one of the two transparent insulating substrates,
Forming a plurality of signal lines in a column direction intersecting the scanning lines, forming a switching element in a pixel region divided by two scanning lines and the signal lines in parallel, and scanning lines, signal lines, and switching elements. A step of applying a transparent resin having photosensitivity to the upper layer, forming an interlayer insulating film having a contact hole at a predetermined position by exposure and development, a step of forming an opaque metal film on the interlayer insulating film, and a resist Forming a protrusion of the interlayer insulating film having a metal film on the surface between adjacent pixels by etching the pixel region of the interlayer insulating film into a concave shape; and forming a transparent portion on the interlayer insulating film and in the contact hole. A conductive film is formed, the transparent conductive film on the protrusion of the interlayer insulating film is etched, and the pixel electrode electrically connected to the switching element via the contact hole is formed on the concave bottom of the interlayer insulating film. And forming a color filter on the pixel electrode in the concave portion separated by the protrusion of the interlayer insulating film using an insulating colored resin, and overhanging the metal film formed on the protrusion of the interlayer insulating film. The process includes a step of forming the substrate.

Further, at least one of the two transparent insulating substrates having electrodes formed thereon is adhered to and opposed to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. In the method of manufacturing a liquid crystal display device, a plurality of scanning lines in the row direction on one of the two transparent insulating substrates,
Forming a plurality of signal lines in a column direction intersecting the scanning lines, forming a switching element in a pixel region divided by two scanning lines and the signal lines in parallel, and scanning lines, signal lines, and switching elements. A step of applying a transparent resin having photosensitivity to the upper layer, forming an interlayer insulating film having a contact hole at a predetermined position by exposure and development, forming a resist pattern, and etching a pixel region of the interlayer insulating film into a concave shape. Forming a protruding portion of the interlayer insulating film between adjacent pixels and applying a colored resin having photosensitivity on the interlayer insulating film, and exposing and developing the opening at the same position as the contact hole of the interlayer insulating film. Forming a color filter having a color filter, forming a transparent conductive film on the interlayer insulating film on which the color filter is formed, in the contact holes and in the openings, and etching the transparent conductive film. The pixel electrode which is electrically connected via the switching element and the contact hole and the opening portion is intended to include a step of forming on the color filter.

At least one of the two transparent insulating substrates having electrodes formed thereon is adhered to and opposed to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. In the method of manufacturing a liquid crystal display device, a plurality of scanning lines in the row direction on one of the two transparent insulating substrates,
Forming a plurality of signal lines in a column direction intersecting the scanning lines, forming a switching element in a pixel region divided by two scanning lines and the signal lines in parallel, and scanning lines, signal lines, and switching elements. A step of applying a transparent resin having no photosensitivity to the upper layer to form an interlayer insulating film, forming a resist pattern, etching a pixel region of the interlayer insulating film into a concave shape, and projecting the interlayer insulating film between adjacent pixels. Forming a portion, applying a colored resin having photosensitivity in the concave portion of the interlayer insulating film, exposing, developing to form a color filter having an opening at a predetermined position, using the color filter as a mask Forming a contact hole at the same position as the opening of the color filter by etching the interlayer insulating film; and forming a contact hole on the interlayer insulating film on which the color filter is formed and the contact hole. A transparent conductive film in the opening and,
Forming a pixel electrode electrically connected to the switching element via the contact hole and the opening by etching on the color filter. The color filter is made of a colored resin having no photosensitivity, and forms an opening by etching after forming a resist pattern.

Further, at least one of the two transparent insulating substrates having electrodes formed thereon is adhered to and opposed to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. In the method of manufacturing a liquid crystal display device, a plurality of scanning lines in the row direction on one of the two transparent insulating substrates,
Forming a plurality of signal lines in a column direction intersecting the scanning lines, forming a switching element in a pixel region divided by two scanning lines and the signal lines in parallel, and scanning lines, signal lines, and switching elements. A step of applying a transparent resin having photosensitivity to the upper layer, forming an interlayer insulating film having a contact hole at a predetermined position by exposure and development, forming a resist pattern, and etching a pixel region of the interlayer insulating film into a concave shape. Forming a protruding portion of the interlayer insulating film between adjacent pixels, forming a colored resin having conductivity in the concave portion of the interlayer insulating film, and electrically connecting the switching element through the contact hole of the interlayer insulating film. Forming a color filter, which is electrically connected, wherein the color filter is made of a low-resistance material so as to function as a pixel electrode.

The colored resin has conductivity and is applied by an electrodeposition method using a pixel electrode as an electrode. The colored resin is applied by an ink jet method, a pigment dispersion method, a laminating method, or the like.

[0022]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiment 1 Hereinafter, a liquid crystal display device and a method of manufacturing the same according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a sectional view showing a TFT array substrate of a liquid crystal display device having a TFT mounted thereon as a switching element according to a first embodiment of the present invention, and FIG.
It is sectional drawing which shows a part of manufacturing process of a T array substrate. In the figure, 1 is a transparent insulating substrate such as a glass substrate, 2 is a gate electrode formed on the transparent insulating substrate 1 by extending from a scanning line (gate electrode wiring), 3 is formed on the transparent insulating substrate 1 4 is a gate insulating film formed on the gate electrode 2 and the common wiring 3, 5 is a semiconductor layer formed on the gate electrode 2 via the gate insulating film 4, and 6 is a semiconductor layer 5 on the semiconductor layer 5. The formed ohmic contact layer 7 is a signal line (source electrode wiring) on the ohmic contact layer 6.
, A drain electrode forming a pair with the source electrode 7 formed on the ohmic contact layer 6, 9 a channel portion, 10 a passivation film for protecting the TFT, and 11 a passivation film. An interlayer insulating film formed on the film 10;
Reference numeral 1 denotes a protrusion, 12 denotes a contact hole formed in the passivation film 10 and the interlayer insulating film 11, and 13 denotes a pixel electrode formed on the interlayer insulating film 11, which is electrically connected to the drain electrode 8 through the contact hole 12. Connected. 1
4 is a color filter, 14a is red, 14b is green, 14
c indicates a blue color filter. Reference numeral 15 denotes a mask having a light-shielding film pattern, and reference numeral 16 denotes a resist.

Next, the steps of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. First,
A Cr film is formed on the surface of the transparent insulating substrate 1 by a sputtering method or the like, and is etched by using a resist pattern formed by a photolithography method. The gate electrode 2, the gate electrode wiring (not shown), and the common wiring 3 are formed. To form Next, a silicon nitride film, an amorphous silicon film, and a low-resistance amorphous silicon film doped with impurities are sequentially formed by a plasma CVD method or the like, and then a resist pattern formed by a photolithography method is formed. To form a semiconductor layer 5 and an ohmic contact layer 6. Next, film formation by a sputtering method and patterning by a photolithography method are performed to form a source electrode 7 on the ohmic contact layer 6.
A source electrode wiring (not shown) and a drain electrode 8 are formed, and a portion of the low-resistance amorphous silicon film (an ohmic contact layer 6) not covered with the source electrode 7 and the drain electrode 8 is etched to form a channel portion 9. Then, a TFT is formed. Note that one end of the drain electrode 8 faces the common wiring 3 made of a low-resistance metal with the gate insulating film 4 made of an inorganic insulating film interposed therebetween, and forms a capacitance (capacitor) in the formation region of the pixel electrode 13.

Next, a passivation film 10 for protecting the TFT is formed by a CVD method or the like. Next, an acrylic transparent resin having photosensitivity is applied so as to absorb a step caused by the TFT and the electrode wiring so that the surface is flattened, and exposed to light through a mask 15 having a light-shielding film pattern on a predetermined portion. (FIG. 2A), drain electrode 8
A contact hole and an opening (not shown) for a terminal contact are formed on a portion facing the common wiring 3 via the gate insulating film 4 and forming a storage capacitor. afterwards,
Baking is performed to form the interlayer insulating film 11. Next, FIG.
As shown in FIG. 2B, a resist 16 is formed at the boundary between adjacent pixels, and the interlayer insulating film 11 in the pixel portion (the region where the pixel electrode 13 is formed) is etched into a concave shape (FIG. 2).
(Dotted line shape in (b)), and a protrusion 11a of the interlayer insulating film 11 is formed at a boundary between adjacent pixels. Subsequently, using the interlayer insulating film 11 as a mask, the passivation film 10 exposed by the contact hole provided in the interlayer insulating film 11 is etched to form a contact hole 12 to expose the drain electrode 8. At the same time, the passivation film 10 in the terminal contact portion is also removed.

Next, as shown in FIG. 2C, after a transparent conductive film such as ITO is formed on the interlayer insulating film 11, etching is performed using a resist pattern formed by a photolithography method. The pixel electrode 13 is formed on the concave bottom of the film 11. At this time, the pixel electrode 13 is electrically connected to the drain electrode 8 via the contact hole 12. Next, as shown in FIG. 2D, a color filter 14 (red (R) 14a, green (G) 14b, blue (B) 14c) made of a conductive colored resin is interlayer-insulated using the pixel electrode 13 as an electrode. Electrodeposition is sequentially and selectively performed in the concave portion of the film 11. At this time, each color filter 14 is isolated by the protruding portion 11a of the interlayer insulating film 11, so that contact between adjacent pixels can be prevented. Also, color filter 1
Reference numeral 4 has a peripheral BM function by stacking three colors of red (R) 14a, green (G) 14b, and blue (B) 14c at the outer periphery of the display area.

An alignment film is formed on the surface of the TFT array substrate (first substrate) formed by the above steps and on the surface of a counter substrate (second substrate) having a counter electrode formed on another transparent insulating substrate. A liquid crystal display element is formed by injecting a liquid crystal material during the rear facing.

The depth of the concave portion formed in the interlayer insulating film 11, that is, the height h of the protrusion 11a of the interlayer insulating film 11 is determined by the height of the pixel electrode 13 and the color filter 14 formed in the concave shape. The thickness is within ± 200 nm of the combined thickness. In addition, as shown in FIG.
By making the width w of 1a smaller than the width w1 of the gate electrode wiring or the source electrode wiring below the protrusion 11a, the pixel electrode 13 and the color filter 14 overlap the gate electrode wiring and the source electrode wiring. It is formed.

The pixel electrode 13 may be formed using another transparent conductive film such as an indium oxide film or tin oxide. Further, the colored resin forming the color filter 14 may be formed by using an inkjet method, a pigment dispersion method, a lamination method, or the like. Further, the color filter 14 may be formed using an insulating resin. Further, although the passivation film 10 is provided in the present embodiment, a similar effect can be obtained in a liquid crystal display device having no passivation film 10.

According to the present invention, since the color filter 14 is formed in a region isolated by the protrusion 11a of the interlayer insulating film 11 formed at the boundary between adjacent pixels on the TFT array substrate side, conductive color is provided. Even if resin is used for the color filter, contact with adjacent pixels can be prevented, the yield can be improved, and the color filter 14 is formed so as to be aligned with each pixel portion. It is not necessary to consider the displacement, and the aperture ratio of the pixel can be improved. The color filter 14 has a red (R) 14a and a green (G) 14 at the outer peripheral portion of the display area.
Since the three colors of b and blue (B) 14c are stacked and have the function of the peripheral BM, light leakage in the peripheral portion of the display area can be prevented. In addition, the step due to the TFT and the electrode wiring is flattened by the interlayer insulating film 11, and the depth h of the concave portion formed in the interlayer insulating film 11 is reduced by the pixel electrode 13 and the color filter 14 formed in the concave portion. Since the surface of the TFT array substrate can be flattened by making the thickness equal to the combined thickness, rubbing defects can be prevented and display defects due to abnormal alignment of liquid crystal molecules can be prevented. Further, by forming the pixel electrode 13 on the interlayer insulating film 11, the pixel electrode 13 and the color filter 14 can be formed so as to overlap the gate electrode wiring and the source electrode wiring, so that the aperture ratio of the pixel can be improved.

Embodiment 2 FIG. FIG. 3 is a cross-sectional view showing a part of the manufacturing process of the TFT array substrate of the liquid crystal display according to Embodiment 2 of the present invention. The reference numerals in the figure are the same as those shown in FIG.

Next, a method of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. In the same manner as in the first embodiment, a gate electrode 2, a common wiring (not shown), a gate insulating film 4, a semiconductor layer 5, an ohmic contact layer 6, a source electrode 7, a drain electrode 8, Channel part 9, passivation film 10
Then, the pixel portion is etched into a concave shape, and an interlayer insulating film 11 having a protrusion 11a at a boundary portion between adjacent pixels is sequentially formed. In the passivation film 10 and the interlayer insulating film 11, a portion (not shown) in which the drain electrode faces the common wiring via the gate insulating film and forms a storage capacitor.
A contact hole and an opening for terminal contact are formed thereon, and the drain electrode is exposed through the contact hole and the opening.

Next, after forming a transparent conductive film constituting the pixel electrode 13 on the interlayer insulating film 11, the color filter 14 is formed.
(Red (R) 14a, green (G) 14b, blue (B) 14c)
Are sequentially formed in the concave portion of the interlayer insulating film 11 by an ink-jet method, a pigment dispersion method, a laminating method or the like (FIG. 3).
(A)). Next, the transparent conductive film is patterned using the color filter 14 as a mask to form the pixel electrode 13 (FIG. 3B). Using the TFT array substrate formed by the above steps, a liquid crystal display element is formed by the same method as in the first embodiment.

According to the present embodiment, the color filter 1
In the case where 4 is formed by an ink-jet method, a pigment dispersion method, or a laminating method, the same effect as that of the first embodiment can be obtained, and further, a photoengraving process for forming the pixel electrode 13 can be omitted.

Embodiment 3 FIG. 4 is a cross-sectional view showing a part of the manufacturing process of the TFT array substrate of the liquid crystal display according to Embodiment 3 of the present invention. The reference numerals in the figure are the same as those shown in FIG.

Next, a method of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. In the same manner as in the first embodiment, a gate electrode 2, a common wiring (not shown), a gate insulating film 4, a semiconductor layer 5, an ohmic contact layer 6, a source electrode 7, a drain electrode 8, Channel part 9, passivation film 10
Then, the pixel portion is etched into a concave shape, and an interlayer insulating film 11 having a protrusion 11a at a boundary portion between adjacent pixels is sequentially formed. In the passivation film 10 and the interlayer insulating film 11, a portion (not shown) in which the drain electrode faces the common wiring via the gate insulating film and forms a storage capacitor.
A contact hole and an opening for terminal contact are formed thereon, and the drain electrode is exposed through the contact hole and the opening.

Next, a transparent conductive film forming the pixel electrode 13 is formed with the resist 16 used when the interlayer insulating film 11 is etched into a concave shape (FIG. 4A).
Subsequently, the resist 16 is removed, and the pixel electrode 13 is formed by a lift-off method (FIG. 4B). Thereafter, the color filter 14 (red (R)) is formed in the same manner as in the first embodiment.
14a, green (G) 14b and blue (B) 14c) to form a TFT array substrate to form a liquid crystal display element.

According to the present embodiment, the same effects as those of the first embodiment can be obtained, and the photoengraving step for forming the pixel electrode 13 can be omitted.

Embodiment 4 FIG. FIG. 5 is a cross-sectional view showing a part of the manufacturing process of the TFT array substrate of the liquid crystal display according to Embodiment 4 of the present invention. The reference numerals in the figure are the same as those shown in FIG.

Next, a method of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. In the same manner as in the first embodiment, a gate electrode 2, a common wiring (not shown), a gate insulating film 4, a semiconductor layer 5, an ohmic contact layer 6, a source electrode 7, a drain electrode 8, Channel part 9, passivation film 1
0, the pixel portion is etched into a concave shape, and an interlayer insulating film 11 having a protrusion 11a at a boundary portion between adjacent pixels and a pixel electrode 13 are sequentially formed. In the passivation film 10 and the interlayer insulating film 11, a contact hole and a terminal contact opening are formed on a portion (not shown) in which the drain electrode faces the common wiring via the gate insulating film and forms a storage capacitor. The pixel electrode 13 is electrically connected to the drain electrode 8 via a contact hole.

Next, color filters 14 (red (R) 14a, green (G), blue (B) 14) made of conductive colored resin are used.
(c) is formed in the concave portion of the interlayer insulating film 11 by an electrodeposition method, an inkjet method, or a photosensitive color resist having photosensitivity by a photolithography method or the like (FIG. 5).
(A)). Next, an etch-back process is performed to remove the color filter 14 protruding from the protrusion 11a of the interlayer insulating film 11 provided at the boundary between adjacent pixels (FIG. 5).
(B)). Using the TFT array substrate formed by the above steps, a liquid crystal display element is formed by the same method as in the first embodiment.

According to the present embodiment, a further effect can be obtained in preventing a short circuit between adjacent pixels due to the conductive color filter.

Embodiment 5 FIG. FIG. 6 is a sectional view showing a part of the manufacturing process of the TFT array substrate of the liquid crystal display according to the fifth embodiment of the present invention. In the figure, reference numeral 17 denotes a metal film (opaque film) having a low reflectance formed on the interlayer insulating film 11. The same parts as those in FIG. 2 are denoted by the same reference numerals, and description thereof will be omitted.

Next, a method of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. The gate electrode 2, the common wiring 3, the gate insulating film 4, the semiconductor layer 5, the ohmic contact layer 6, the source electrode 7, the drain electrode 8, the channel 9, A passivation film 10 and an interlayer insulating film 11 having a contact hole are sequentially formed.
Next, after a metal film 17 is formed on the interlayer insulating film 11, a resist 16 is formed at a boundary between adjacent pixels.
(A)), the metal film 17 is etched using this.
Subsequently, the interlayer insulating film 11 in the pixel portion is formed using the resist 16.
Is etched into a concave shape, and a protrusion 11a of the interlayer insulating film 11 is formed at the boundary between adjacent pixels. Subsequently, the passivation film 10 exposed through the contact holes provided in the interlayer insulating film 11 using the interlayer insulating film 11 as a mask.
Is etched to form a contact hole 12, and then the resist 16 is removed (FIG. 6B).

Next, after a transparent conductive film such as ITO is formed on the interlayer insulating film 11, etching is performed using a resist pattern formed by photolithography, and a pixel electrode is formed on the concave bottom of the interlayer insulating film 11. 13 is formed. At this time, the pixel electrode 13 is electrically connected to the drain electrode 8 via the contact hole 12. Next, the color filters 14 (red (R) 14a, green (G), blue (B) 14c) made of an insulating resin are applied to the protrusions 11 of the interlayer insulating film 11 by an ink jet method, a pigment dispersion method, a laminating method or the like.
overhanging the metal film 17 on the interlayer insulating film 1
1 are sequentially formed in the concave portion. Using the TFT array substrate formed by the above steps, a liquid crystal display element is formed by the same method as in the first embodiment. The metal film 17
Instead, an insulating opaque film such as a ceramic may be used. When an insulating opaque film is used, a color filter having conductivity can be used.

According to the present embodiment, the same effect as in the first embodiment can be obtained, and the opaque film (not shown) formed on the protrusion 11a of the interlayer insulating film 11 provided at the boundary between adjacent pixels. The color filter 14 formed by overhanging on the metal film 17) and the opaque film has the function of BM, can improve the contrast ratio between adjacent pixels, and can prevent light leakage in the TFT portion.

Embodiment 6 FIG. FIG. 7 is a sectional view showing a TFT array substrate of a liquid crystal display according to a sixth embodiment of the present invention, and FIG. 8 is a sectional view showing a part of a manufacturing process of the TFT array substrate of FIG. In the figure, reference numeral 12a denotes an opening formed in the color filter 14 communicating with the contact hole 12 formed in the passivation film 10 and the interlayer insulating film 11. 1 and 2 are denoted by the same reference numerals, and description thereof is omitted.

Next, a method of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. The gate electrode 2, the common wiring 3, the gate insulating film 4, the semiconductor layer 5, the ohmic contact layer 6, the source electrode 7, the drain electrode 8, the channel portion 9, and the like are formed on the transparent insulating substrate 1 in the same manner as in the first embodiment. A passivation film 10 is sequentially formed. Next, an acrylic transparent resin having photosensitivity is applied so as to absorb a step caused by the TFT and the electrode wiring so that the surface is flattened, and exposed to light through a mask 15 having a light-shielding film pattern on a predetermined portion. Alms (Fig. 8
(A)) A contact hole and an opening (not shown) for a terminal contact are formed on a portion where the drain electrode 8 faces the common wiring 3 via the gate insulating film 4 and forms a storage capacitor. Thereafter, baking is performed to form the interlayer insulating film 11. Next, as shown in FIG. 8B, a resist 16 is formed at the boundary between adjacent pixels, and the interlayer insulating film 11 in the pixel portion is etched into a concave shape (dotted line shape in FIG. 8B). A protrusion 11a of the interlayer insulating film 11 is formed at a boundary between adjacent pixels. Subsequently, using the interlayer insulating film 11 as a mask, the passivation film 10 exposed by the contact hole provided in the interlayer insulating film 11 is etched to form a contact hole 12, and the drain electrode 8 is exposed. At the same time, the passivation film 10 in the terminal contact portion is also removed.

Next, the color filter 14 (red (R) 14
a, green (G) 14b, and blue (B) 14c) are formed on the interlayer insulating film 11, and then have openings 12a corresponding to the contact holes 12 by exposure and development. A color filter 14 matching each pixel is formed in the concave portion. The color filter 14
Are red (R) 14a and green (G) at the outer periphery of the display area.
The three colors of 14b and blue (B) 14c are stacked to have a peripheral BM function. Next, after forming a transparent conductive film such as ITO (FIG. 8C), etching is performed using a resist pattern formed by a photolithography method, and the color filter 14 in the concave portion of the interlayer insulating film 11 is formed.
The pixel electrode 13 is formed thereon (FIG. 8D). At this time, the pixel electrode 13 is electrically connected to the drain electrode 8 via the opening 12 a provided in the color filter 14 and the contact hole 12. Using the TFT array substrate formed by the above steps, a liquid crystal display element is formed by the same method as in the first embodiment.

The pixel electrode 13 may be formed using another transparent conductive film such as an indium oxide film or tin oxide. The color filter 14 is formed using a photosensitive color resist, but may be formed by forming a non-photosensitive colored resin and using a photolithography method using the resist. Further, the method of applying the color resist is not limited to the above-described method and the like. The colored resin constituting the color filter 14 may be either conductive or insulating. According to the present embodiment, the same effect as that of the first embodiment can be obtained.

Embodiment 7 FIG. FIG. 9 is a cross-sectional view showing a part of the manufacturing process of the TFT array substrate of the liquid crystal display according to Embodiment 7 of the present invention. The reference numerals in the figure are the same as those shown in FIG.

Next, a method of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. The gate electrode 2, the common wiring 3, the gate insulating film 4, the semiconductor layer 5, the ohmic contact layer 6, the source electrode 7, the drain electrode 8, the channel portion 9, and the like are formed on the transparent insulating substrate 1 in the same manner as in the first embodiment. A passivation film 10 is sequentially formed. Next, the non-photosensitive insulating transparent resin is
The interlayer insulating film 11 is formed by applying the film so that the surface is flattened by absorbing a step due to the FT and the electrode wiring, and baking is performed. Next, etching is performed using a resist pattern formed by a photolithography method, the interlayer insulating film 11 in the pixel portion is formed in a concave shape, and a protrusion 11a of the interlayer insulating film 11 is formed at a boundary portion between adjacent pixels.

Next, the color filter 14 (red (R) 14
a, green (G) 14b and blue (B) 14c) are formed on the interlayer insulating film 11, and are formed in the concave portion by photolithography so as to be aligned with each pixel. The color filter 14 is connected to the drain electrode 8
The opening 12a and an opening (not shown) for a terminal contact are formed on a portion facing the common wiring 3 via the gate insulating film 4 and forming a storage capacitor (FIG. 9).
(A)). Next, using the color filter 14 as a mask, the interlayer insulating film 11 and the passivation film 10 exposed through the opening 12a are etched to form the contact hole 1
2 is formed to expose the drain electrode 8. At the same time, the interlayer insulating film 11 and the passivation film 10 in the terminal contact portion are also removed. Next, after forming a transparent conductive film such as ITO, the pixel electrode 13 is formed on the color filter 14 in the concave portion of the interlayer insulating film 11 by etching using a resist pattern formed by a photolithography method ( FIG. 9 (b). At this time, the pixel electrode 13 is electrically connected to the drain electrode 8 via the opening 12 a formed in the color filter 14 and the contact hole 12. Using the TFT array substrate formed by the above steps, a liquid crystal display element is formed by the same method as in the first embodiment.

According to the present embodiment, as compared with the sixth embodiment, an inexpensive non-photosensitive resin can be used as the transparent resin forming the interlayer insulating film 11, and the contact holes 12 and the color filters 14 can be used. Opening 1 formed in
No alignment of 2a is required.

Embodiment 8 FIG. FIG. 10 is a cross-sectional view showing a part of the manufacturing process of the TFT array substrate of the liquid crystal display according to Embodiment 8 of the present invention. The reference numerals in the figure are the same as those shown in FIG.

Next, a method of manufacturing the TFT array substrate of the liquid crystal display according to the present embodiment will be described. The gate electrode 2, the common wiring 3, the gate insulating film 4, the semiconductor layer 5, the ohmic contact layer 6, the source electrode 7, the drain electrode 8, the channel 9, The passivation film 10 and the pixel portion are etched into a concave shape, and an interlayer insulating film 11 having a protrusion 11a at a boundary portion between adjacent pixels is sequentially formed (FIG. 10A). In the passivation film 10 and the interlayer insulating film 11, a contact hole 12 and an opening for terminal contact are formed on a portion where the drain electrode 8 faces the common wiring 3 via the gate insulating film 4 and forms a storage capacitor. (Not shown) are formed, and the drain electrode 8 is exposed through the contact hole 12 and the opening.

Next, a color filter 14 (red (R) 14a, green (G) 14b, blue (B) 14) made of a resin in which a pigment, conductive powder (ITO) or the like is dispersed in a binder.
c) is sequentially formed by an inkjet method, a pigment dispersion method, a laminating method, or the like so as to match each pixel in the concave portion of the interlayer insulating film 11 and to have the same thickness as the depth of the concave portion (FIG. 10B). ). At this time, the color filter 14 having conductivity has a function as a pixel electrode by being electrically connected to the drain electrode 8 through the contact hole 12. Using the TFT array substrate formed by the above steps, a liquid crystal display element is formed by the same method as in the first embodiment.

According to the present embodiment, the same effect as that of the first embodiment can be obtained, and the color filter 14 can be made to function as a pixel electrode by using a resin having good conductivity. The manufacturing process of the pixel electrode can be omitted.

[0058]

As described above, according to the present invention, TF
The pixel portion (pixel electrode formation region) of the interlayer insulating film formed on the TFT and the electrode wiring of the T-array substrate and flattening the surface is etched into a concave shape to form a protrusion at a boundary portion between adjacent pixels. Since a color filter is formed in a region isolated by the projection, even if a conductive colored resin is used for the color filter, contact with adjacent pixels can be prevented, and defects due to short circuit between pixels can be prevented. The yield can be improved. Further, since the color filters can be formed so as to be aligned with the respective pixel portions, there is no need to consider a positional shift at the time of bonding the TFT array substrate and the counter substrate, and a high quality and high aperture ratio liquid crystal display device can be provided. Obtainable. In addition, the step due to the TFT and the electrode wiring is flattened by the interlayer insulating film, and the depth of the concave portion formed in the interlayer insulating film is equal to the combined thickness of the pixel electrode and the color filter formed in the concave portion. By doing so, the surface of the TFT array substrate can be flattened, so that rubbing defects can be prevented and display defects due to abnormal alignment of liquid crystal molecules can be prevented. Further, by forming the pixel electrode on the interlayer insulating film, the pixel electrode and the color filter can be formed so as to overlap with the gate electrode wiring and the source electrode wiring, so that the aperture ratio of the pixel can be improved.

Further, by patterning the pixel electrode using a color filter as a mask or a resist formed when a concave portion is provided in the interlayer insulating film, the photolithography method for forming the pixel electrode can be omitted. Thus, productivity can be improved. Further, by forming the color filter using a low-resistance material, the pixel electrode can be omitted, the manufacturing process can be simplified, and the productivity can be improved and the cost can be reduced.

[Brief description of the drawings]

FIG. 1 is a sectional view showing a TFT array substrate of a liquid crystal display according to a first embodiment of the present invention.

FIG. 2 is a cross-sectional view showing a step of manufacturing the TFT array substrate of the liquid crystal display device according to Embodiment 1 of the present invention.

FIG. 3 is a cross-sectional view showing a step of manufacturing a TFT array substrate of a liquid crystal display device according to Embodiment 2 of the present invention.

FIG. 4 is a cross-sectional view showing a step of manufacturing a TFT array substrate of a liquid crystal display device according to Embodiment 3 of the present invention.

FIG. 5 is a cross-sectional view showing a step of manufacturing a TFT array substrate of a liquid crystal display device according to Embodiment 4 of the present invention.

FIG. 6 is a sectional view illustrating a manufacturing process of a TFT array substrate of a liquid crystal display device according to a fifth embodiment of the present invention.

FIG. 7 is a sectional view showing a TFT array substrate of a liquid crystal display according to a sixth embodiment of the present invention.

FIG. 8 is a sectional view illustrating a manufacturing process of a TFT array substrate of a liquid crystal display according to a sixth embodiment of the present invention.

FIG. 9 is a cross-sectional view showing a step of manufacturing a TFT array substrate of a liquid crystal display device according to Embodiment 7 of the present invention.

FIG. 10 is a sectional view illustrating a manufacturing process of a TFT array substrate of a liquid crystal display device according to an eighth embodiment of the present invention.

[Explanation of symbols]

1 transparent insulating substrate, 2 gate electrode, 3 common wiring,
4 gate insulating film, 5 semiconductor layer, 6 ohmic contact layer, 7 source electrode, 8 drain electrode, 9 channel portion, 10 passivation film, 11 interlayer insulating film, 11a protrusion, 12 contact hole, 13 pixel electrode, 14 color filter , 14a red, 14b
Green, 14c blue, 15 mask, 16 resist, 17
Metal film.

 ──────────────────────────────────────────────────続 き Continued on the front page F term (Reference) 2H048 BA45 BA62 BA64 BB02 BB14 BB24 BB28 BB42 2H091 FA02Y FC05 FC06 FC12 FC26 FD06 GA07 GA13 LA12 LA16 2H092 JA24 JA46 JB52 JB57 JB58 KA05 KA12 KA18 KB04 MA22 MA05 MA08 MA08 NA07 NA16 NA19 NA29 PA08 PA09

Claims (21)

[Claims] A transparent insulating substrate; a plurality of scanning lines formed in a row direction on the transparent insulating substrate; a plurality of signal lines formed in a column direction intersecting the scanning lines; A switching element formed in a pixel region defined by each of the two parallel scanning lines and signal lines; and a switching element formed in a layer above the scanning line, the signal line, and the switching element, and the scanning line, the signal line, and the switching element. An interlayer insulating film that absorbs a step of a pixel electrode formed in each of the pixel regions on the interlayer insulating film and electrically connected to the switching element via a contact hole provided in the interlayer insulating film; A first substrate having a color filter formed on the pixel electrode, a second substrate sandwiching a liquid crystal material together with the first substrate, wherein the interlayer insulating film has a concave pixel region. It is etched and has a structure in which adjacent pixels are separated by a protrusion of the interlayer insulating film, and the pixel electrode and the color filter are formed in a concave portion separated by the protrusion of the interlayer insulating film. A liquid crystal display device characterized by the above-mentioned. 2. A transparent insulating substrate; a plurality of scanning lines formed in a row direction on the transparent insulating substrate; a plurality of signal lines formed in a column direction intersecting the scanning lines; A switching element formed in a pixel region defined by each of the two parallel scanning lines and signal lines; and a switching element formed in a layer above the scanning line, the signal line, and the switching element, and the scanning line, the signal line, and the switching element. An interlayer insulating film that absorbs a step of; a color filter formed on the interlayer insulating film so as to match the pixel regions; formed on the color filter and provided on the interlayer insulating film and the color filter. A first substrate having a pixel electrode electrically connected to the switching element via a contact hole; and a second substrate sandwiching a liquid crystal material with the first substrate. The interlayer insulating film has a structure in which the pixel region is etched into a concave shape, adjacent pixels are separated by a protrusion of the interlayer insulating film, and the color filter and the pixel electrode are formed by protrusions of the interlayer insulating film. A liquid crystal display device formed in an isolated concave portion. 3. A transparent insulating substrate; a plurality of scanning lines formed in a row direction on the transparent insulating substrate; a plurality of signal lines formed in a column direction intersecting the scanning lines; A switching element formed in a pixel region defined by each of the two parallel scanning lines and signal lines; and a switching element formed in a layer above the scanning line, the signal line, and the switching element, and the scanning line, the signal line, and the switching element. And an interlayer insulating film that absorbs a step of, formed on the interlayer insulating film in alignment with each of the pixel regions, and electrically connected to the switching element through a contact hole provided in the interlayer insulating film. A first substrate having a color filter having conductivity, a second substrate sandwiching a liquid crystal material together with the first substrate, wherein the interlayer region is etched in such a manner that the pixel region is concave. Liquid crystal characterized in that adjacent pixels have a structure separated by a protrusion of the interlayer insulating film, and the color filter is formed in a concave portion separated by the protrusion of the interlayer insulating film. Display device. 4. The liquid crystal display device according to claim 3, wherein the conductive color filter is made of a low-resistance material so as to function as a pixel electrode. 5. The depth of the concave portion of the interlayer insulating film is within ± 200 nm of the total thickness of the pixel electrode and the color filter formed in the concave portion or the thickness of the conductive color filter. The liquid crystal display device according to claim 1, wherein: 6. A transparent insulating substrate, a plurality of scanning lines formed in a row direction on the transparent insulating substrate, a plurality of signal lines formed in a column direction intersecting the scanning lines, A switching element formed in a pixel region defined by each of the two parallel scanning lines and signal lines; and a switching element formed in a layer above the scanning line, the signal line, and the switching element, and the scanning line, the signal line, and the switching element. And an interlayer insulating film having a protrusion formed between adjacent pixels by etching the pixel region into a concave shape on the surface, and an opaque film formed on the protrusion of the interlayer insulating film. A film, a pixel electrode formed on the concave bottom of the interlayer insulating film, and electrically connected to the switching element via a contact hole provided in the interlayer insulating film; and A first substrate having a color filter formed thereon, comprising a second substrate sandwiching a liquid crystal material together with the first substrate, wherein the color filter is formed on the opaque film formed on a protrusion of the interlayer insulating film. A liquid crystal display device characterized by being formed overhanging. 7. The liquid crystal display device according to claim 6, wherein the opaque film is a metal film, and the color filter is made of an insulating resin. 8. The liquid crystal display device according to claim 6, wherein the opaque film is an insulating film, and the color filter is made of a conductive resin. 9. The width of the projection of the interlayer insulating film is formed smaller than the width of the scanning line and the signal line, and the pixel electrode and the color filter formed in the concave portion of the interlayer insulating film are formed of the scanning line and the signal line. The liquid crystal display device according to claim 1, wherein the liquid crystal display device is formed so as to overlap a line. 10. The liquid crystal display device according to claim 1, wherein a plurality of colors constituting the color filter are laminated on an outer peripheral portion of the display area. 11. At least one of two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. A method of manufacturing a liquid crystal display device, comprising: a plurality of scanning lines in a row direction on one of the two transparent insulating substrates; a plurality of signal lines in a column direction intersecting the scanning lines; Forming a switching element in a pixel area defined by the scanning line and the signal line; applying a transparent resin having photosensitivity to a layer above the scanning line, the signal line and the switching element; and exposing and developing the resin. Forming an interlayer insulating film having a contact hole at a position, forming a resist pattern, etching the pixel region of the interlayer insulating film into a concave shape, and forming the interlayer insulating film between adjacent pixels. Forming a projecting portion, forming a transparent conductive film on the interlayer insulating film and in the contact hole, etching the transparent conductive film on the projecting portion of the interlayer insulating film, and contacting the switching element with the switching element. Forming a pixel electrode electrically connected through a hole on the concave bottom of the interlayer insulating film; and forming the pixel in the concave portion separated by a protrusion of the interlayer insulating film using a colored resin. A method for manufacturing a liquid crystal display device, comprising a step of forming a color filter on an electrode. 12. At least one of two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. A method of manufacturing a liquid crystal display device, comprising: a plurality of scanning lines in a row direction on one of the two transparent insulating substrates; a plurality of signal lines in a column direction intersecting the scanning lines; Forming a switching element in a pixel area defined by the scanning line and the signal line; applying a transparent resin having photosensitivity to a layer above the scanning line, the signal line and the switching element; and exposing and developing the resin. Forming an interlayer insulating film having a contact hole at a position, forming a resist pattern, etching the pixel region of the interlayer insulating film into a concave shape, and forming the interlayer insulating film between adjacent pixels. Forming a protrusion; and forming a transparent conductive film on the interlayer insulating film and in the contact hole with the resist used for forming the protrusion of the interlayer insulating film remaining. By removing the resist, the transparent conductive film on the protrusion of the interlayer insulating film is removed by a lift-off method,
Forming a pixel electrode electrically connected to the switching element via the contact hole at the concave bottom of the interlayer insulating film; and isolating the pixel electrode by a protrusion of the interlayer insulating film using a colored resin. A method for manufacturing a liquid crystal display device, comprising a step of forming a color filter on the pixel electrode in the concave portion. 13. A step of forming a color filter in a concave portion separated by a protrusion of an interlayer insulating film on a pixel electrode, and removing the color filter overhanging on the protrusion by an etch-back process. 13. The method for manufacturing a liquid crystal display device according to claim 11, wherein: 14. At least one of two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. A method of manufacturing a liquid crystal display device, comprising: a plurality of scanning lines in a row direction on one of the two transparent insulating substrates; a plurality of signal lines in a column direction intersecting the scanning lines; Forming a switching element in a pixel area defined by the scanning line and the signal line; applying a transparent resin having photosensitivity to a layer above the scanning line, the signal line and the switching element; and exposing and developing the resin. Forming an interlayer insulating film having a contact hole at a position, forming a resist pattern, etching the pixel region of the interlayer insulating film into a concave shape, and forming the interlayer insulating film between adjacent pixels. A step of forming a protrusion, a step of forming a transparent conductive film on the interlayer insulating film and in the contact hole, and applying a colored resin in a concave portion separated by the protrusion of the interlayer insulating film; Forming a color filter on the transparent conductive film in the concave portion, and etching the transparent conductive film using the color filter as a mask, and electrically connecting the switching element to the switching element via the contact hole. A method for manufacturing a liquid crystal display device, comprising a step of forming an electrode in a concave portion of the interlayer insulating film. 15. At least one of two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. A method of manufacturing a liquid crystal display device, comprising: a plurality of scanning lines in a row direction on one of the two transparent insulating substrates; a plurality of signal lines in a column direction intersecting the scanning lines; Forming a switching element in a pixel area defined by the scanning line and the signal line; applying a transparent resin having photosensitivity to a layer above the scanning line, the signal line and the switching element; and exposing and developing the resin. Forming an opaque metal film on the interlayer insulating film, forming a resist pattern, and recessing the pixel region of the interlayer insulating film. Forming a protruding portion of the interlayer insulating film having the metal film on the surface between adjacent pixels by forming a transparent conductive film on the interlayer insulating film and in the contact hole; Forming a pixel electrode electrically connected to the switching element and the contact hole via the contact hole by etching the transparent conductive film on the protrusion of the interlayer insulating film, at a concave bottom of the interlayer insulating film; Using a colored insulating resin, a color filter overhangs the metal film formed on the projection of the interlayer insulating film on the pixel electrode in the concave portion separated by the projection of the interlayer insulating film. A method for manufacturing a liquid crystal display device, comprising a step of forming. 16. At least one of two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. A method of manufacturing a liquid crystal display device, comprising: a plurality of scanning lines in a row direction on one of the two transparent insulating substrates; a plurality of signal lines in a column direction intersecting the scanning lines; Forming a switching element in a pixel area defined by the scanning line and the signal line; applying a transparent resin having photosensitivity to a layer above the scanning line, the signal line and the switching element; and exposing and developing the resin. Forming an interlayer insulating film having a contact hole at a position, forming a resist pattern, etching the pixel region of the interlayer insulating film into a concave shape, and forming the interlayer insulating film between adjacent pixels. Forming a protrusion, applying a colored resin having photosensitivity on the interlayer insulating film,
Forming a color filter having an opening at the same position as the contact hole of the interlayer insulating film by exposure and development; and forming a transparent conductive film on the interlayer insulating film on which the color filter is formed and in the contact hole and the opening. Manufacturing a liquid crystal display device, comprising: forming a film on the color filter, and forming a pixel electrode electrically connected to the switching element via the contact hole and the opening by etching. Method. 17. A method in which at least one of two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. A method of manufacturing a liquid crystal display device, comprising: a plurality of scanning lines in a row direction on one of the two transparent insulating substrates; a plurality of signal lines in a column direction intersecting the scanning lines; Forming a switching element in a pixel area defined by the scanning line and the signal line; and applying a transparent resin having no photosensitivity to a layer above the scanning line, the signal line and the switching element to form an interlayer insulating film. Forming a resist pattern, etching the pixel region of the interlayer insulating film into a concave shape to form a protrusion of the interlayer insulating film between adjacent pixels, and forming a concave shape of the interlayer insulating film. Inside the department A step of applying a colored resin having optical properties, forming a color filter having an opening at a predetermined position by exposure and development, and etching the interlayer insulating film using the color filter as a mask, and opening the color filter. Forming a contact hole at the same position as above; and forming a transparent conductive film on the interlayer insulating film on which the color filter is formed and in the contact hole and the opening, and etching the switching element and the contact hole by etching. And forming a pixel electrode electrically connected through the opening on the color filter. 18. The liquid crystal display device according to claim 16, wherein the color filter is made of a colored resin having no photosensitivity, and an opening is formed by etching after forming a resist pattern. Method. 19. At least one of two transparent insulating substrates having electrodes formed thereon is opposed to and bonded to each other, and a liquid crystal material is sandwiched between the two transparent insulating substrates. A method of manufacturing a liquid crystal display device, comprising: a plurality of scanning lines in a row direction on one of the two transparent insulating substrates; a plurality of signal lines in a column direction intersecting the scanning lines; Forming a switching element in a pixel area defined by the scanning line and the signal line; applying a transparent resin having photosensitivity to a layer above the scanning line, the signal line and the switching element; and exposing and developing the resin. Forming an interlayer insulating film having a contact hole at a position, forming a resist pattern, etching the pixel region of the interlayer insulating film into a concave shape, and forming the interlayer insulating film between adjacent pixels. Forming a protrusion, forming a colored resin having conductivity in the concave portion of the interlayer insulating film, and forming a color filter electrically connected to the switching element through a contact hole of the interlayer insulating film. A method for manufacturing a liquid crystal display device, comprising a step of forming, wherein the color filter is made of a low-resistance material so as to function as a pixel electrode. 20. The method for manufacturing a liquid crystal display device according to claim 11, wherein the colored resin has conductivity and is applied by an electrodeposition method using a pixel electrode as an electrode. 21. The method according to claim 11, wherein the colored resin is applied by an ink-jet method, a pigment dispersion method, a lamination method, or the like.