JPH10199804A - 投影露光装置及び投影露光方法並びにデバイス製造方法 - Google Patents

投影露光装置及び投影露光方法並びにデバイス製造方法

Info

Publication number
JPH10199804A
JPH10199804A JP9330863A JP33086397A JPH10199804A JP H10199804 A JPH10199804 A JP H10199804A JP 9330863 A JP9330863 A JP 9330863A JP 33086397 A JP33086397 A JP 33086397A JP H10199804 A JPH10199804 A JP H10199804A
Authority
JP
Japan
Prior art keywords
substrate
substrate stage
projection
mark
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9330863A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10199804A5 (enExample
Inventor
Nobutaka Umagome
伸貴 馬込
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP9330863A priority Critical patent/JPH10199804A/ja
Publication of JPH10199804A publication Critical patent/JPH10199804A/ja
Publication of JPH10199804A5 publication Critical patent/JPH10199804A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9330863A 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法 Pending JPH10199804A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9330863A JPH10199804A (ja) 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP31865796 1996-11-14
JP8-318657 1996-11-14
JP9330863A JPH10199804A (ja) 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
JPH10199804A true JPH10199804A (ja) 1998-07-31
JPH10199804A5 JPH10199804A5 (enExample) 2005-11-04

Family

ID=26569458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9330863A Pending JPH10199804A (ja) 1996-11-14 1997-11-14 投影露光装置及び投影露光方法並びにデバイス製造方法

Country Status (1)

Country Link
JP (1) JPH10199804A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006139040A (ja) * 2004-11-12 2006-06-01 Integrated Solutions:Kk 液晶表示装置用基板の製造方法
JP2017142538A (ja) * 2004-11-18 2017-08-17 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006139040A (ja) * 2004-11-12 2006-06-01 Integrated Solutions:Kk 液晶表示装置用基板の製造方法
JP2017142538A (ja) * 2004-11-18 2017-08-17 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

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