JPH10194718A - Production of polycrystalline silicon ingot for solar cell - Google Patents
Production of polycrystalline silicon ingot for solar cellInfo
- Publication number
- JPH10194718A JPH10194718A JP34998096A JP34998096A JPH10194718A JP H10194718 A JPH10194718 A JP H10194718A JP 34998096 A JP34998096 A JP 34998096A JP 34998096 A JP34998096 A JP 34998096A JP H10194718 A JPH10194718 A JP H10194718A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- silicon
- solar cell
- ingot
- polycrystalline silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、太陽電池用多結晶
シリコン・インゴットの製造方法に関し、詳しくは、太
陽電池の光電効率を高めるため、結晶粒の成長方向がそ
ろったインゴットになるよう、溶融シリコンを鋳型に注
入する技術である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a polycrystalline silicon ingot for a solar cell. This is a technique for injecting silicon into a mold.
【0002】[0002]
【従来の技術】現在、エネルギー源の多様化要求から、
太陽光発電が脚光を浴びているが、コストが高いため、
電力用としては一般に普及していない。また、太陽電池
用基板材料のほとんどはシリコンであるが、該シリコン
専用の製造プロセスが存在していないので、そのシリコ
ンの製造は、図3に示すように、半導体用シリコンの製
造プロセスで発生した高純度シリコンのスクラップある
いは単結晶引き上げの際に発生したスクラップに依存し
ている。なお、図3の高純度シリコンは、金属シリコン
を塩酸と反応させてトリクロロ・シランとしてガス化
し、該ガスを精留して不純物元素を除き、水素ガスと反
応させる所謂CVD法でガスから析出させたものであ
る。2. Description of the Related Art At present, due to the demand for diversification of energy sources,
Solar power is in the limelight, but because of its high cost,
It is not widely used for electric power. Further, most of the substrate material for solar cells is silicon, but since there is no manufacturing process dedicated to the silicon, the manufacturing of the silicon occurred in the manufacturing process of silicon for a semiconductor as shown in FIG. It relies on scrap of high-purity silicon or scrap generated during single crystal pulling. The high-purity silicon shown in FIG. 3 is obtained by reacting metallic silicon with hydrochloric acid to gasify it as trichlorosilane, rectifying the gas to remove impurity elements, and depositing it from the gas by a so-called CVD method of reacting with hydrogen gas. It is a thing.
【0003】この図3に示す方法では、化学的プロセス
におけるシリコンの精製、析出工程にコストと時間がか
かり、単結晶引上げや鋳造をしなければならないので、
手間がかかる上に、歩留が悪く、再溶解の設備、エネル
ギーも別途必要で、製造費用が嵩むという問題があっ
た。そのため、現在入手可能な太陽電池は高価なものと
なり、その一般的な普及の障害となっている。また、上
記のような化学プロセスが主体の金属シリコンの精製で
は、シラン、塩化物等の公害物質の多量発生が避けられ
ず、量産の障害になるという問題もあった。さらに、半
導体産業の活況に伴い、半導体に向けられる高純度シリ
コンの量が不足してきており、太陽電池用に向けられる
シリコンは、今後さらに少なくなると予想される。かか
る現状においては、太陽電池用に使用できるシリコン源
を、高純度シリコンよりさらに上流に位置する金属シリ
コンを主体にして、従来より一層安価に得るようにする
必要がある。In the method shown in FIG. 3, the cost and time are required for the purification and deposition steps of silicon in a chemical process, and a single crystal must be pulled or cast.
In addition to being troublesome, there is a problem that the yield is low, re-melting equipment and energy are separately required, and the production cost increases. Therefore, currently available solar cells are expensive and hinder their general spread. Further, in the purification of metallic silicon mainly based on the above-described chemical process, there is a problem that a large amount of pollutants such as silane and chloride is inevitably generated, which hinders mass production. Furthermore, with the booming semiconductor industry, the amount of high-purity silicon used for semiconductors is becoming insufficient, and the amount of silicon used for solar cells is expected to decrease further in the future. Under such circumstances, it is necessary to obtain a silicon source that can be used for a solar cell at a lower cost than before by mainly using metallic silicon located further upstream than high-purity silicon.
【0004】そこで、本出願人は、上記のような化学プ
ロセスによる金属シリコンの高純度化を改め、先般(P
CT/JP96/02965で)、図4に示すような冶
金プロセスのみで、太陽電池に適した純度のシリコンを
多量に製造し、それを鋳造して一気にシリコン基板まで
にする方法を提案している。それは、珪石を炭材で還元
して得た金属シリコン(純度98〜99重量%Si)を
出発原料とし、真空精錬によってP、Al,Ca等の易
揮発性不純物元素を除去すると共に、溶湯を凝固精製し
て不純物金属元素(Fe,Ti,Al,Ca)を粗く精
製する。そして、得られた鋳塊を再度溶解し、酸化精錬
でB,Cを除き、脱酸してから、一方向凝固で上記不純
物金属元素の仕上凝固精製した後、鋳塊の一部を切り捨
て、残部をスライスして太陽電池用シリコン基板を連続
的な流れ作業として生産するものである。かかる製造方
法によれば、太陽電池用シリコンを従来よりかなり安価
に量産できる目処が立っている。Therefore, the present applicant has revised the purification of metallic silicon by the above chemical process, and
CT / JP96 / 02965), a method is proposed in which a large amount of silicon having a purity suitable for a solar cell is produced only by a metallurgical process as shown in FIG. 4 and then cast into a silicon substrate at a stretch. . It uses metallic silicon (purity 98-99% by weight Si) obtained by reducing silica stone as a starting material, removes easily volatile impurity elements such as P, Al and Ca by vacuum refining and removes molten metal. By coagulation and purification, impurity metal elements (Fe, Ti, Al, Ca) are roughly refined. Then, the obtained ingot is again melted, B and C are removed by oxidative refining, deoxidized, and then subjected to one-way solidification to finish solidification and purification of the impurity metal element. Then, a part of the ingot is cut off, The remaining portion is sliced to produce a silicon substrate for a solar cell as a continuous flow operation. According to such a manufacturing method, there is a prospect that silicon for solar cells can be mass-produced at a considerably lower cost than before.
【0005】ところで、上記した化学プロセスや冶金プ
ロセスは、いずれも最終工程で溶融シリコンを鋳型に鋳
込みインゴットとし、それをスライスして基板にしてい
る。この基板を太陽電池とするには、通常、その表面を
弗酸や硝酸水溶液で処理してエッチングする。つまり、
表面を図5に示すような所謂ピラミッド構造1とし、入
射太陽光の光電効率を向上させるのである。このピラミ
ッド構造1は、結晶方位が一方向に揃った単結晶インゴ
ットからスライスした基板2では、容易に得られる。In the above-mentioned chemical and metallurgical processes, molten silicon is cast into a mold in the final step to form an ingot, which is sliced into a substrate. In order to make this substrate a solar cell, its surface is usually treated and etched with an aqueous solution of hydrofluoric acid or nitric acid. That is,
The surface has a so-called pyramid structure 1 as shown in FIG. 5 to improve the photoelectric efficiency of incident sunlight. The pyramid structure 1 can be easily obtained in a substrate 2 sliced from a single crystal ingot having a uniform crystal orientation in one direction.
【0006】しかしながら、多結晶インゴットからの基
板3では、表面にある結晶粒4の方位がまちまちなの
で、エッチングにより凹凸が多方向に形成され、ピラミ
ッド構造1となり難い。特に、その傾向は、インゴット
下部から得た最初に凝固し結晶粒4の小さい基板に多
い。そのため、多結晶シリコン・インゴットの場合、単
結晶インゴットに比し、有効な基板としての歩留が低く
なり、コスト・アップの要因になる。これでは、太陽電
池用シリコンを量産し、その製造コストをより一層安価
にするという出願人の開発目標が達成できない。However, in the case of the substrate 3 made of a polycrystalline ingot, since the orientation of the crystal grains 4 on the surface is different, irregularities are formed in multiple directions by etching, and it is difficult to form the pyramid structure 1. In particular, the tendency is more likely to occur in the first solidified substrate having small crystal grains 4 obtained from the lower part of the ingot. Therefore, in the case of a polycrystalline silicon ingot, the yield as an effective substrate is lower than that of a single crystal ingot, which causes an increase in cost. This does not meet the applicant's development goal of mass-producing silicon for solar cells and further reducing the production cost.
【0007】[0007]
【発明が解決しようとする課題】本発明は、かかる事情
を鑑み、太陽電池用シリコン基板にしても、結晶粒の方
位が一方向に揃い、光電効率に優れたものになる太陽電
池用多結晶シリコン・インゴットの製造方法を提供する
ことを目的としている。SUMMARY OF THE INVENTION In view of the above circumstances, the present invention is directed to a polycrystalline silicon for a solar cell, in which the orientation of crystal grains is aligned in one direction and the photoelectric efficiency is excellent even in a silicon substrate for a solar cell. It is an object of the present invention to provide a method for manufacturing a silicon ingot.
【0008】[0008]
【課題を解決するための手段】発明者は、上記目的を達
成するため、溶融シリコンの鋳造時に種基板を利用する
ことに着眼した研究を鋭意進め、それを具現化した。す
なわち、本発明は、高純度の溶融シリコンを鋳型に注入
し、該鋳型の底部から上方に向け一方向凝固させるに際
し、上記鋳型内の底面に、凝固時の種結晶となるよう単
結晶シリコン基板を配置し、その上に溶融シリコンを注
ぐことを特徴とする太陽電池用多結晶シリコン・インゴ
ットの製造方法である。Means for Solving the Problems In order to achieve the above object, the inventor has intensively studied and focused on using a seed substrate in casting molten silicon, and has embodied it. That is, the present invention is to inject high-purity molten silicon into a mold and, when unidirectionally solidifying upward from the bottom of the mold, a single-crystal silicon substrate is formed on the bottom surface in the mold to become a seed crystal at the time of solidification. And pouring molten silicon thereon. 2. A method for producing a polycrystalline silicon ingot for solar cells, comprising:
【0009】また、本発明は、上記単結晶シリコン基板
を、その(100)面が上方に向くようにしたことを特
徴とする太陽電池用多結晶シリコン・インゴットの製造
方法である。さらに、本発明は、上記単結晶基板を、鋳
型底面と同形状、且つ同一面積としたことを特徴とする
太陽電池用多結晶シリコン・インゴットの製造方法であ
る。Further, the present invention is a method for manufacturing a polycrystalline silicon ingot for a solar cell, wherein the (100) plane of the single crystal silicon substrate is oriented upward. Further, the present invention is a method for producing a polycrystalline silicon ingot for a solar cell, wherein the single crystal substrate has the same shape and the same area as the bottom of the mold.
【0010】本発明では、上記のような構成で太陽電池
用多結晶シリコン・インゴットを製造するようにしたの
で、該インゴットを形成する結晶粒の方位が一定にな
る。その結果、そのインゴットをスライスして得た基板
の表面を、弗酸あるいは硝酸でエッチッグすると、適切
なピラミッド構造の表面となり、該基板で製作した太陽
電池の光電効率は、従来の多結晶シリコン基板で製作し
たものよりも向上した。また、シリコン・インゴットか
らの有効な基板が増加したので、太陽電池用多結晶シリ
コン基板が従来より安価に製造できるようになった。In the present invention, since the polycrystalline silicon ingot for a solar cell is manufactured with the above configuration, the orientation of the crystal grains forming the ingot becomes constant. As a result, when the surface of the substrate obtained by slicing the ingot is etched with hydrofluoric acid or nitric acid, the surface of the substrate becomes an appropriate pyramid structure, and the photoelectric efficiency of the solar cell manufactured on the substrate is reduced by the conventional polycrystalline silicon substrate. It was better than the one made in. Further, since the number of effective substrates from silicon ingots has increased, polycrystalline silicon substrates for solar cells can be manufactured at lower cost than before.
【0011】[0011]
【発明の実施の形態】図1に、本発明に係る太陽電池用
多結晶シリコン・インゴットの製造方法を実施している
状況を示す。それは、まず、図示していない大気を遮断
した小部屋に、内面にインゴットの付着を防止する離型
剤を塗布した水冷銅あるいは黒鉛製の鋳型5を配置す
る。そして、その中に凝固に際し種基板6となる単結晶
を置き、シリコン融点直下まで鋳型を予熱しておき、そ
の上に、ほぼ太陽電池用シリコンの純度までに精製され
た溶融シリコン(溶湯ともいう)7を取鍋8を介して注
ぐ。なお、該溶湯7の精製は、前記図4に示した冶金プ
ロセスにより行ない、脱ボロン、脱燐、脱酸、さらには
Fe,Ti等の不純物金属元素が粗く凝固精製されてい
る。また、小部屋内は、インゴットが空気で汚染されな
いように、アルゴン・ガス雰囲気とするのが好ましい。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a situation in which a method for manufacturing a polycrystalline silicon ingot for a solar cell according to the present invention is performed. First, a mold 5 made of water-cooled copper or graphite coated with a release agent for preventing the ingot from adhering to the inner surface is arranged in a small room (not shown) in which the atmosphere is blocked. Then, a single crystal serving as a seed substrate 6 during solidification is placed therein, the mold is preheated to just below the melting point of silicon, and molten silicon (also referred to as molten metal) that has been purified to approximately the purity of silicon for solar cells is placed thereon. Pour 7 through ladle 8; The refining of the molten metal 7 is carried out by the metallurgical process shown in FIG. 4, and deboron, dephosphorization, deoxidation, and coarse metal elements such as Fe and Ti are coarsely coagulated and refined. The interior of the small room is preferably set to an argon gas atmosphere so that the ingot is not contaminated with air.
【0012】目標サイズのインゴットを形成する量の溶
湯7を注入したら、鋳型5の底部に配置した水冷ジャケ
ット9の冷却水量及び鋳型5の上方に配置した加熱源
(図示していないが、通常、電熱ヒータを使用)の出力
を設定し、底部から上方に向けて固液界面が一定速度で
ゆっくりと上昇するように凝固を開始する。特に、この
凝固は、インゴットを製造するだけでなく、溶湯7を太
陽電池用シリコンとして許容される純度に仕上精製する
役割も果たす。そのため、凝固は一方向凝固とし、凝固
速度(固液界面の移動速度)は、精製が効率良く行われ
る観点から予め定められている。 凝固途中でのインゴ
ット10の結晶成長状況を模式的に図2に示す。本発明
によれば、種結晶6にほぼ一致した結晶方位が上方に向
けて成長するので、どの高さで切断してもほぼ100面
に近い結晶方位となる。この事実は、凝固完了後のイン
ゴット10の縦断面観察で確認している。After injecting the molten metal 7 in such an amount as to form an ingot of the target size, the amount of cooling water in the water cooling jacket 9 arranged at the bottom of the mold 5 and the heating source arranged above the mold 5 (not shown, usually, (Using an electric heater) and start solidification so that the solid-liquid interface slowly rises at a constant speed from the bottom upward. In particular, this solidification not only produces an ingot, but also plays a role in finishing and refining the molten metal 7 to a purity acceptable as silicon for solar cells. Therefore, the solidification is unidirectional solidification, and the solidification speed (moving speed of the solid-liquid interface) is predetermined from the viewpoint of efficient purification. FIG. 2 schematically shows the state of crystal growth of the ingot 10 during solidification. According to the present invention, the crystal orientation substantially matching the seed crystal 6 grows upward, so that the crystal orientation is almost 100 even if cut at any height. This fact has been confirmed by observing the longitudinal section of the ingot 10 after the completion of the solidification.
【0013】また、上記種結晶とする単結晶シリコン板
としては、(100)面を有するものが好ましい。それ
は、インゴットをスライスして得たシリコン基板を太陽
電池とした際、最も光電効率が高くなるからである。さ
らに、上記種結晶とする単結晶シリコン基板は鋳型底面
と同一形状、且つ同一面積のものが好ましい。それは、
結晶の生長開始が全て単結晶基材から発生するためでイ
ンゴット中の結晶方位が最も高い比率でそろうからであ
る。The single crystal silicon plate used as the seed crystal preferably has a (100) plane. The reason is that when a silicon substrate obtained by slicing an ingot is used as a solar cell, the photoelectric efficiency becomes highest. Further, the single crystal silicon substrate used as the seed crystal preferably has the same shape and the same area as the bottom of the mold. that is,
This is because the start of crystal growth is all generated from the single crystal base material, and the crystal orientation in the ingot is aligned at the highest ratio.
【0014】[0014]
【実施例】前処理でほぼ太陽電池用シリコンの純度にし
た溶融シリコン50kgを、取鍋8に保持し、内寸が3
20×320×H400mmの鋳型5に注入し、一方向
凝固させてインゴットを製造した。その際、鋳型5に予
め配置する種結晶6としての単結晶シリコン板には、そ
の面方位が種々のもの、及び160×160mmの角型
単結晶基板を4枚ならべ320×320mmとしたもの
を用意し、それぞれについてインゴット10の製造を試
行した。また、種結晶6を用いない従来通りの製造も、
ほぼ同一条件で行った。表1に溶湯7の不純物量、表2
に溶湯温度、凝固速度等の条件を示す。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS 50 kg of molten silicon, which has been pretreated to approximately the purity of silicon for solar cells, is held in a ladle 8 and has an inner size of 3 kg.
It was poured into a mold 5 of 20 × 320 × H400 mm, and was unidirectionally solidified to produce an ingot. At this time, the single crystal silicon plate as the seed crystal 6 previously arranged in the mold 5 has various plane orientations, and a single crystal silicon substrate having a total of 320 × 320 mm with four 160 × 160 mm square single crystal substrates. The ingots were prepared and the production of the ingot 10 was tried for each. In addition, conventional production without using the seed crystal 6 is also possible.
Performed under almost the same conditions. Table 1 shows the amount of impurities in the molten metal 7 and Table 2
Shows conditions such as the melt temperature and the solidification rate.
【0015】[0015]
【表1】 [Table 1]
【0016】[0016]
【表2】 [Table 2]
【0017】凝固完了後の各インゴット10を、その上
端から20%の位置で切断し、その部分をスクラップと
して除いた。そして、残りの部分をワイヤ・ソーを用い
て厚み450μmでスライスし、太陽電池用多結晶シリ
コン基板とし、その一部を分析試料及び太陽電池セル化
テスト用試料とした。ここで、太陽電池セル化テストと
は、該基板を弗化水素酸と硝酸の混合液につけて表面を
50μm程度除去し、ピラミッド構造の形成を行い、そ
の後pn接合を形成して太陽電池セルを製作し、光電変
換効率を測定することである。表3に分析及び太陽電池
セル化・テストの結果を一括して示す。After completion of solidification, each ingot 10 was cut at a position 20% from its upper end, and the portion was removed as scrap. Then, the remaining portion was sliced at a thickness of 450 μm using a wire saw to obtain a polycrystalline silicon substrate for a solar cell, and a part thereof was used as an analysis sample and a sample for a solar cell conversion test. Here, the solar cell conversion test means that the substrate is immersed in a mixed solution of hydrofluoric acid and nitric acid to remove the surface by about 50 μm, to form a pyramid structure, and then to form a pn junction to form the solar cell. It is to manufacture and measure the photoelectric conversion efficiency. Table 3 summarizes the results of the analysis and the solar cell production / test.
【0018】[0018]
【表3】 [Table 3]
【0019】表3より、本発明に係る方法を採用する
と、基板表面が適切なピラミッド構造1となるため、従
来法による場合に比し、いずれも高い光電変換効率を示
している。なかでも、(100)面の結晶方位を有する
単結晶シリコン板を種結晶6とした場合に最も良い結果
が得られている。さらに、鋳型底部全面を種結晶とした
場合にはさらに変換効率を示した。また、不純物元素に
関しては、表1と比較してみれば明らかなように、いず
れの場合も良く仕上精製がされていた。As can be seen from Table 3, when the method according to the present invention is employed, the substrate surface has an appropriate pyramid structure 1. Therefore, all of them show higher photoelectric conversion efficiency than the conventional method. Among them, the best result is obtained when the single crystal silicon plate having the (100) plane crystal orientation is used as the seed crystal 6. Further, when the entire bottom surface of the mold was formed as a seed crystal, the conversion efficiency was further improved. In addition, regarding the impurity elements, as is clear from comparison with Table 1, the finish purification was well performed in each case.
【0020】[0020]
【発明の効果】以上述べたように、本発明により、光電
変換効率に優れた太陽電池用多結晶シリコン基板が安定
して製造できるようになった。その結果、基板の段階で
不合格としていた量が減り、太陽電池用シリコン基板の
生産性が向上すると共に、製造コストの低下も可能にな
った。As described above, according to the present invention, a polycrystalline silicon substrate for a solar cell having excellent photoelectric conversion efficiency can be stably manufactured. As a result, the amount of rejects at the stage of the substrate is reduced, the productivity of the silicon substrate for solar cells is improved, and the manufacturing cost can be reduced.
【図1】本発明に係る太陽電池用多結晶シリコン・イン
ゴットの製造方法を実施している状況を示す縦断面図で
ある。FIG. 1 is a longitudinal sectional view showing a state in which a method of manufacturing a polycrystalline silicon ingot for a solar cell according to the present invention is being performed.
【図2】凝固途中のインゴットの結晶成長を示す模式図
である。FIG. 2 is a schematic diagram showing crystal growth of an ingot during solidification.
【図3】従来の化学プロセスを主体とした太陽電池用シ
リコン基板の製造工程図である。FIG. 3 is a manufacturing process diagram of a silicon substrate for a solar cell mainly using a conventional chemical process.
【図4】本出願人の提案した冶金プロセスによる太陽電
池用シリコン基板の製造工程図である。FIG. 4 is a manufacturing process diagram of a silicon substrate for a solar cell by a metallurgical process proposed by the present applicant.
【図5】シリコン基板の表面処理を説明する図である。FIG. 5 is a diagram illustrating a surface treatment of a silicon substrate.
1 ピラミッド構造 2 単結晶インゴットからスライスした基板 3 多結晶インゴットからスライスした基板 4 結晶粒 5 鋳型 6 種結晶 7 溶融シリコン(溶湯) 8 取鍋 9 水冷ジャケット 10 インゴット 11 結晶成長方向(凝固方向) 12 結晶粒界 DESCRIPTION OF SYMBOLS 1 Pyramid structure 2 Substrate sliced from single crystal ingot 3 Substrate sliced from polycrystalline ingot 4 Crystal grain 5 Template 6 Seed crystal 7 Molten silicon (molten metal) 8 Ladle 9 Water cooling jacket 10 Ingot 11 Crystal growth direction (solidification direction) 12 Grain boundaries
───────────────────────────────────────────────────── フロントページの続き (72)発明者 阿部 正道 千葉市中央区川崎町1番地 川崎製鉄株式 会社技術研究所内 (72)発明者 阪口 泰彦 千葉市中央区川崎町1番地 川崎製鉄株式 会社技術研究所内 (72)発明者 加藤 嘉英 千葉市中央区川崎町1番地 川崎製鉄株式 会社技術研究所内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Masamichi Abe 1 Kawasaki-cho, Chuo-ku, Chiba City Inside Kawasaki Steel Research & Technology Company (72) Inventor Yasuhiko Sakaguchi 1 Kawasaki-cho, Chuo-ku Chiba City Kawasaki Steel Technical Research Company In-house (72) Inventor Yoshihide Kato 1 Kawasaki-cho, Chuo-ku, Chiba City Kawasaki Steel Corp.
Claims (3)
該鋳型の底部から上方に向け一方向凝固させるに際し、 上記鋳型内の底面に、凝固時の種結晶となるよう単結晶
シリコン基板を配置し、その上に溶融シリコンを注ぐこ
とを特徴とする太陽電池用多結晶シリコン・インゴット
の製造方法。1. Injecting high purity molten silicon into a mold,
When unidirectionally solidifying upward from the bottom of the mold, a single crystal silicon substrate is arranged on the bottom surface in the mold so as to be a seed crystal at the time of solidification, and molten silicon is poured thereon. Manufacturing method of polycrystalline silicon ingot for battery.
0)面が上方に向くようにしたことを特徴とする請求項
1記載の太陽電池用多結晶シリコン・インゴットの製造
方法。2. The method according to claim 1, wherein the single crystal silicon substrate is
2. The method for producing a polycrystalline silicon ingot for a solar cell according to claim 1, wherein the (0) face is directed upward.
面と同形、且つ同面積にすることを特徴とする請求項1
または2記載の太陽電池用多結晶シリコン・インゴット
の製造方法。3. The single crystal silicon substrate has the same shape and the same area as the bottom surface of the mold.
Or a method for producing a polycrystalline silicon ingot for a solar cell according to 2 above.
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JP34998096A JP3852147B2 (en) | 1996-12-27 | 1996-12-27 | Method for producing polycrystalline silicon ingot for solar cell |
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