JPH10189686A - Conveyor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To determine the exchanging time of a belt beforehand properly when the revolution and driving of a motor are transmitted to a screw shaft through a pulley and the belt, and an article to be conveyed is conveyed by a moving body along the screw shaft by the rotation of the screw shaft. SOLUTION: A moving body 32 is moved linearly by the revolution of a ball screw shaft 31. A timing belt 36 is stretched between a following pulley 33 for the ball screw shaft 31 and a driving pulley 35 for the shaft of a motor 34. Each signal of a first encoder 38 detecting the angular displacement of the shaft of the motor 34 and a second encoder 39 detecting the angular displacement of the ball screw shaft 31 is input to a controller 37, and a correlation value is obtained, and compared with a beforehand acquired reference value. A waning is issued properly on the basis of the difference of the comparison.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer device used for transferring an object to be transferred such as an object to be processed.

[0002]

2. Description of the Related Art In a so-called photoresist processing step in a semiconductor manufacturing process, for example, a substrate to be processed such as a semiconductor wafer (hereinafter, referred to as a "wafer") is washed, or a resist liquid is applied to the surface to form a resist film. After forming and exposing in a predetermined pattern, development processing is performed with a developing solution. To perform such a series of processing, conventionally, for example, a resist coating / development processing system 101 as shown in FIG. Used.

This resist coating / developing system 10
In 1, a cassette 102, which is a storage body for accommodating a plurality of wafers, is arranged and a plurality of mounting units 102 are mounted thereon, and a wafer W in the cassette C mounted on the mounting unit 102 is taken out. Sub-transport device 1 that transports to main transport device 103
04, and the sub-transport device 104
Path 1 provided along the alignment direction (X direction)
05 is freely movable. Various processing apparatuses that perform predetermined processing on the wafer W are disposed on both sides of each of the transfer paths 107 and 108 of the two main transfer apparatuses 103 and 106.

[0004] More specifically, first, in order to clean the surface of the wafer W taken out of the cassette C, a brush cleaning device 111 that performs brush cleaning while rotating the wafer W,
Rinse-cleaning apparatus 1 for high-pressure jet cleaning of wafer W
12. An adhesion processing device 113 for improving the fixability of the resist by hydrophobizing the surface of the wafer W; a cooling device 114 for cooling the wafer W to a predetermined temperature; a resist for applying a resist liquid to the surface of the rotating wafer W The liquid coating apparatuses 115 and 115, a heating processing apparatus 116 for heating the wafer W after application of the resist liquid or for heating the wafer W after pattern exposure, and supplying a developing solution to the surface of the exposed wafer W while rotating the wafer W. Processing unit 11 for developing
7, 117 are arranged. Each of these processing apparatuses is integrated to some extent, and the installation space is reduced and the processing efficiency is improved by collecting the processing apparatuses into an appropriate group of processing apparatuses. The loading and unloading of the wafer W to and from these various processing apparatuses is performed by the two main transfer apparatuses 103 and 10 described above.
6 is performed.

[0005] As shown in FIG. 9, the linear movement of the main transport devices 103 and 106 and the sub-transport device 104 is basically performed by the screw shaft 1 rotated by the rotation of the driven pulley 121.
22, the driven pulley 121 and the timing belt 12
3, a driving pulley 124 driven by the motor 3, a motor 125 for rotating the driving pulley 124, and a moving body 126 that moves along the screw shaft 122 by the rotation of the screw shaft 122 by a ball screw mechanism. For example, the main transport device 103, 1
06 and the supporting portion of the sub-transport device 104 are fixed.
As described above, the driven pulley 121, the timing belt 123, and the driving pulley 124 rotate the screw shaft 122.
The reason why is used is that when a metal gear or the like is used, there is a concern about dust generation due to contact between metal parts and contamination due to grease or the like.

[0006] The motor 125
An encoder 127 for detecting the angular displacement of the shaft is attached, and a separate control device (not shown) is provided based on a signal from the encoder 127, for example, a pulse signal.
However, the rotation of the motor 125 is controlled. Accordingly, the movement or stop of the moving body 126 to a predetermined position is determined based on a signal from the encoder 127, and for example, by counting a predetermined pulse,
It is stopped at a preset position.

[0007]

In the above-mentioned drive system, a timing belt 123 is stretched between a driven pulley 121 and a drive pulley 124. This type of belt is made of a material such as synthetic resin. Timing belt 12
In No. 3, it is inevitable that the belt itself elongates or the original elasticity deteriorates depending on the use period, use frequency, and the like. However, in such a case, if the stop position of the moving body 126 is controlled based on only the signal from the encoder 127, the position may be shifted from the expected position. Moreover, while the stop position or the like due to the deviation is still within the allowable range, the accumulation of the deviation may cause a serious accident.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a conveyor having a drive mechanism using a timing belt as described above, in which the belt itself expands or loses its original elasticity. It is an object of the present invention to solve the above-mentioned problem by enabling accurate stop control even when the belt is deteriorated, and furthermore, when deviations accumulate, informing a belt replacement time in advance.

[0009]

According to one aspect of the present invention, there is provided a screw shaft which is rotated by rotation of a driven pulley, a driving pulley which drives the driven pulley via a belt, and a driving pulley. A motor that rotates a pulley, and a moving body that moves along the screw shaft by the rotation of the screw shaft; and an apparatus that conveys an object to be conveyed to a predetermined position by moving the moving body; A first encoder for detecting the angular displacement of the rotating shaft of
A second encoder for detecting the angular displacement of the screw shaft.

As described above, not only the first encoder for detecting the angular displacement of the rotary shaft on the motor side but also the second encoder for detecting the angular displacement of the screw shaft is provided.
For example, this second encoder has an absolute (abso
If a (lute) type encoder is used, the deviation on the motor side can be detected from the correlation between the output values of the first encoder and the second encoder.

Therefore, even if the value based on the output from the first encoder is different from the initial value due to the belt being stretched, the control for appropriately correcting based on the output from the second encoder is performed. If performed, stop control at a predetermined stop position becomes possible. If the deviation exceeds a certain threshold value or the like, an appropriate warning is issued so that the timing of belt replacement can be known in advance, thereby preventing an unexpected accident due to belt deterioration or the like. can do.

[0012] According to a second aspect of the present invention, there is provided a transfer device comprising: a screw shaft that rotates by rotation of a driven pulley; a driving pulley that drives the driven pulley via a belt; a motor that rotates the driving pulley; and a rotation of the screw shaft. A moving body that moves along the screw axis, and a device that conveys the object to be conveyed to a predetermined position by moving the moving body. An encoder, a second encoder that detects an angular displacement of the screw shaft, a detection device that obtains a relationship between signals from the first encoder and the second encoder, and based on data obtained by the detection, And a signal generator for notifying a predetermined warning to the outside. Therefore, it is possible to know in advance the timing for replacing the belt. Of course, the detection device and the signal generation device may be configured to be incorporated in one control device.

[0013]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the accompanying drawings. FIGS. 1 to 3 show a wafer coating and developing system incorporating a transfer device according to an embodiment of the present invention. 1 is a diagram of the overall configuration, FIG.
FIG. 2 shows a front view, and FIG. 3 shows a rear view.

The coating and developing system 1 loads and unloads wafers W as substrates to be processed into and out of the system in units of cassettes C, for example, in units of 25 wafers. A cassette station 10 for unloading, and one in the coating and developing process.
A processing station 11 in which various single-wafer processing apparatuses for performing predetermined processing on wafers W one by one are arranged in multiple stages at predetermined positions.
And an interface unit 13 for transferring a wafer W between the processing station 11 and a pattern exposure apparatus 12 which is an apparatus outside the system provided adjacent to the processing station 11.
And are integrally connected.

In the cassette station 10, FIG.
As shown in FIG. 2, a plurality of cassettes C, for example, up to four cassettes are respectively set at the positions of the positioning projections 20a on the cassette mounting table 20 serving as a mounting portion, with the respective wafer entrances and exits at the processing station 1.
1 are arranged in a line in the X direction (the vertical direction in FIG. 1).
The wafer transfer device 21 according to the present embodiment, which is movable in the wafer arrangement direction (Z direction; vertical direction) of the wafers stored in the cassette, is movable along the transfer path 22 and is selected for each cassette C. Is accessible. The wafer transfer apparatus 21 further is configured to be rotatable θ direction, alignment units belonging to the multi-stage unit of the third processing unit group G ₃ of the process station 11 side as described later (ALIM) and an extension The unit (EXT) can also be accessed.

The wafer transfer device 21 has a configuration as shown in FIGS. That is, the wafer transfer device 21
The device itself is provided with tweezers 24 movable in the Y direction in the figure on a transfer base 23, and the transfer base 23 itself is rotated in a θ direction on a lift 26 via a rotating shaft 25. Mounted freely. The elevating table 26 itself is supported by a horizontal moving table 27 so as to be able to move up and down in the vertical direction. Further, the horizontal moving table 27 itself moves along a guide rail 28 set along the X direction, that is, along the transport path 22. It is slidably supported.

A Y-direction drive unit for moving the tweezers 24 in the Y-direction in FIGS. 4 and 5 is constituted by a drive motor and a belt (both not shown) built in the transport base 23. . A rotation drive unit for rotating and driving the transport base 23 in the θ direction is configured by a drive motor (not shown) built in the lift 26. A Z-direction drive unit for vertically moving the elevating table 26 in the vertical direction, that is, the Z direction, is configured by a motor and a ball screw shaft provided in the horizontal moving table 27.

More specifically, as shown in FIG. 6, the base of the lift 26 is supported by a movable body 32 that is movable along the ball screw shaft 31 by the rotation of the ball screw shaft 31. . That is, the moving body 32 has a ball nut mechanism therein, and can move freely along the ball screw shaft 31 as shown by a reciprocating arrow in the drawing according to the normal / reverse rotation of the ball screw shaft 31. .

A driven pulley 33 is mounted on the ball screw shaft 31, and a timing belt 36 is stretched between the driven pulley 33 and a driving pulley 35 mounted on a rotating shaft of a motor 34. ing. Therefore, when the motor 34 is operated, these drive pulleys 3
5. When the timing belt 36 and the driven pulley 33 rotate and the moving body 32 moves along the ball screw shaft 31 and stops the motor 34, the moving body 32 stops at the position at that time.

The rotation of the motor 34 is controlled by the controller 3
7 done. More specifically, the motor 34 is provided with a first encoder 38, which detects the angular displacement of the rotating shaft of the motor 34 and determines the corresponding pulse number.
7 is output. On the other hand, the ball screw shaft 31 is provided with a second encoder 39 for detecting the angular displacement of the ball screw shaft 31 and outputting an encoded absolute angle signal to the control device 37.

The control device 37 performs, for example, the following control. First, the correlation between the signal from the first encoder 38 and the signal from the second encoder 39 as an initial value is obtained (for example, the ratio of the number of pulses when the moving body 32 moves to a predetermined position). ), And store this as a reference value. Thereafter, for the motor 34,
The same control as that of this type of conventional transport device is performed, and the rotation and stop of the first encoder 38 are numerically controlled based on the signal of the first encoder 38. Thereby, the stop position of the moving body 32 is accurately controlled. In this case, the stop position (absolute position) of the moving body 32
Is determined by the signal from the second encoder 39, so that the motor 3
The rotation and stop of the motor 4 may be controlled.

For example, the reference value is set to S0, and a change in the correlation value R between the signal from the first encoder 38 and the signal from the second encoder 39 over time is compared. As shown in FIG.
Is monitored, and the point of change of the correlation value R is
An appropriate signal is output to the notification device 40. In the present embodiment, when the first change point a, the next change point b, and the point c when the value exceeds the range of the allowable values S1 and S2 are reached, corresponding different signals are output. A predetermined warning is issued from the notification device 40. The allowable values S1 and S2 are set in a range where there is no hindrance to the operation by appropriate correction even if the initial control cannot be performed by the signal from the first encoder 38 due to the expansion and contraction of the belt. It can be set arbitrarily, for example, in a range where there is no problem in operation.

The processing station 11 is provided with a main wafer transfer device 51 at the center thereof, and various processing devices are multi-tiered and arranged around the main wafer transfer device 51 in one or more sets to constitute a processing device group. doing. In the coating and developing processing system 1 according to the present embodiment, five processing device groups G ₁ , G ₂ , G ₃ , G ₄ , and G ₅ can be arranged, and the first and second processing device groups G ₁ and G ₂ are arranged on the front side (front side in FIG. 1) of the system, the third processing unit group G ₃ is arranged adjacent to the cassette station 10,
The fourth processing unit group G ₄ is disposed adjacent to the interface section 13, and, optionally, it has been possible to fifth processing unit group G ₅ to separately disposed on the rear side.

As shown in FIG. 2, the first processing unit group G ₁
Then, two spinner-type processing apparatuses, for example, a resist liquid coating apparatus (COT) and a developing processing apparatus (D), which perform a predetermined processing by placing the wafer W on a spin chuck in the cup CP.
EV) are stacked in two stages in order from the bottom. Similarly, in the second processing unit group G _2, 2 units of spinner type processing apparatus, for example, resist coating unit (COT) and developing unit (DEV) are two-tiered from the bottom in order.
It is preferable to dispose the resist liquid coating apparatus (COT) in the lower stage because drainage of the resist liquid is troublesome both mechanically and in terms of maintenance. However, it is also possible to dispose it on the upper stage as needed.

As shown in FIG. 3, the third processing unit group G ₃
Then, an oven-type processing apparatus for performing a predetermined processing by placing the wafer W on a mounting table (not shown), for example, a cooling apparatus (COL) for performing a cooling processing, and a so-called hydrophobic processing for improving the fixability of the resist are performed. Adhesion device (AD) to perform alignment and alignment device (ALI to perform positioning)
M), an extension device (EXT), a pre-baking device (PREBAKE) for performing a heating process before the exposure process
A post-baking apparatus (POBAKE) for performing a heating process after the exposure process is stacked, for example, in eight stages from the bottom.

[0026] In the fourth processing unit group G _4, oven-type processing units, for example, a cooling unit (COL), an extension and cooling unit (EXTCOL), extension device (EXT), a cooling device (CO
L), a pre-baking device (PREBAKE) and a post-baking device (POBAKE) are stacked in order from the bottom, for example, in eight stages. Thus, the cooling device (COL) and the extension cooling device (EXTCOL) having a low processing temperature are arranged in the lower stage, and the baking device (PREBAKE), the post-baking device (POBAKE) and the adhesion device (AD) having a high processing temperature are arranged. By arranging them in the upper stage, thermal mutual interference between the devices can be reduced.

Further in this coating and developing processing system 1, even the rear side of the main wafer transfer device 51 as described above, although to be able to place the processing unit group G ₅ of the fifth indicated by the broken line, this multistage device of the fifth processing unit group G ₅ is viewed from the main wafer transfer device 51 along the guide rails 52 are configured to be shifted laterally. Therefore, even when provided as a multi-stage apparatus of the fifth processing unit group G ₅ shown, the space portion is secured by sliding along the guide rail 52, the main wafer transfer apparatus 51 Maintenance work can be easily performed from behind. In addition, the multi-stage apparatus of the _fifth processing apparatus group G5 includes:
The present invention is not limited to such a linear slide shift along the guide rail 52, and may be configured such that the system is shifted to the outside of the system as shown by a reciprocating rotation arrow indicated by a chain line in FIG. In addition, it is easy to secure a space for maintenance work for the main wafer transfer device 51.

The main wafer transfer unit 51 is movable vertically and rotatable by θ, and the first to fifth five processing unit groups G ₁ , G ₂ ,
Each unit of G ₃ , G ₄ and G ₅ is freely accessible. The main wafer transfer device 51 also has three tweezers 51a vertically holding the wafer directly. By any of the tweezers 23a, it is possible with respect to the first to fifth five processing unit groups _{G 1, G 2, G 3} , G 4, each unit G _5, carried into and out of the wafer.

In the coating and developing processing system 1, the cassette mounting table 20, the transfer path 22 of the wafer transfer device 21, the first to fifth processing device groups G ₁ , G ₂ , G ₃ , G ₄ ,
As shown in FIG. 2, a high-performance filter such as an ULPA filter or a chemical filter is provided on the upper part of the system so that a clean air downflow is formed from above with respect to the G ₅ and the interface unit 13. The configured filter device 53 is provided for each of the three zones (the cassette station 10, the processing station 11, and the interface unit 13). When the air supplied from the upstream side of the filter device 53 passes through the filter device 25, particles and organic components are removed, and as shown by the solid arrows and the dashed arrows in FIG. Is formed. Also, especially for a resist solution coating device (COT) and a development processing device (DEV) that generate organic components in the apparatus, duct pipes are appropriately provided so that a clean downflow is formed also in the inside. ing.

The interface unit 13 has the same dimensions as the processing station 11 in the depth direction (X direction), but is set smaller in the width direction. And this interface unit 13
The transport path 6 provided on the base 13a in the X direction
A wafer transfer device 62 is provided that is movable along 1. The wafer transfer device 62 has the same structure as that of the above-described wafer transfer device 21, is rotatable also in the θ direction, and has a fourth processing unit group G on the processing station 11 side.
_The extension device (EXT) belonging to ₄ can be freely accessed.

The interface section 13 is provided with a substrate mounting section 33 at an end near the exposure processing apparatus 12. The substrate mounting portion 63 is set at a position where the transfer arm 12a serving as transfer means on the exposure device 12 side can access, and a wafer is transferred between the wafer transfer device 62 and the transfer arm 12a on the exposure device 12 side. It is provided to temporarily place the wafer when it is exchanged. Further, the substrate mounting portion 63 has a multi-stage structure,
The wafer W can be placed on the N side and the OUT side separately.

A peripheral exposure processing device 64 for performing peripheral exposure processing on the wafer W is provided near the end of the interface unit 13 opposite to the end of the substrate mounting unit 63, that is, near the back of the system. The wafer transfer device 62 is also accessible to the peripheral exposure processing device 64.

The coating and developing system 1 incorporating the wafer transfer device 21 as the transfer device according to the present embodiment is configured as described above. Next, the operation of the coating and developing system 1 will be described. In the cassette station 10, the wafer transfer device 21 accesses the cassette C containing the unprocessed wafers on the cassette mounting table 20 and takes out one wafer W from the cassette C. Then the wafer transfer device 21, as shown in FIG. 4, moves to the alignment device (ALIM) disposed in the first processing Steen Deployment 11 side third processing unit group G ₃ in a multistage device, the alignment Device (A
(LIM).

The alignment device (ALIM)
When the alignment and centering of the wafer W are completed, the main wafer transfer device 23 receives the aligned wafer W. Thereafter, the processing devices in the processing station 11, that is, the adhesion device (AD) and the cooling device (COL), resist liquid coating device (COT), pre-bake device (PREBAK)
E), extension cooling device (EXTCO
L), and after completion of each of the predetermined processes, the wafer W is transported to an extension device (EXT), and the wafer W is placed on a predetermined mounting table (not shown) in the extension device (EXT). I do.

When the wafer W is mounted on the mounting table of the extension device (EXT), the interface unit 13
The wafer transfer device 62 accesses the wafer W from the opposite side, receives the wafer W, and then loads the wafer W into the edge exposure device 64. When a predetermined edge exposure process is completed, the wafer transfer device 62 places the wafer W on the substrate. Placed on the unit 63. Here, the wafer transfer device 62 receives the wafer W on which the exposure processing by the exposure device 12 has been completed, and then transfers the wafer W to the extension device (EXT), and then to the post-baking device (POBAKE) and the developing device (DEV). The wafers are sequentially conveyed, and predetermined processing is performed. When all the predetermined processes in the processing station 11 have been completed in this way, the main wafer transfer device 51 transfers the processed wafer W to the alignment device (ALIM), and this time the wafer transfer device 21 transfers the processed wafer W to the alignment device (ALIM). The wafer is received, and the wafer is transferred into a predetermined cassette C.

As can be seen from the above processes, in the coating and developing system 1, the wafer transfer device 21 is responsible for transferring the wafer W between the cassette station 10 and the processing station 11.
The wafer transfer device 21 sequentially takes out the wafers W in each cassette C placed in the cassette station 10 and sequentially delivers the wafers W. This kind of cassette C
Can usually store about 25 wafers, and each wafer is stored in a vertically aligned multi-tiered manner in a horizontal state with the peripheral edge portion supported by a groove formed facing the inside of the cassette C. It has become. Therefore, when the tweezers 24 of the wafer transfer device 21 takes out the wafer W or reversely stores the wafer W, the Z is accurately adjusted so as not to damage another wafer W.
It is necessary to stop at a predetermined position in the direction.

In this regard, according to the wafer transfer apparatus 21 of the present embodiment, it is possible to deal with deterioration of the timing belt 36 of the driving force transmission system over time and breakage very accurately and effectively. That is, as described above, the vertical movement (movement in the Z direction) of the wafer transfer device 21 is caused by the movement of the moving body 32 accompanying the rotation of the ball screw shaft 31 as shown in FIG.
This wafer transfer device 21 includes:
Since not only the first encoder 38 for detecting the angular displacement of the rotating shaft of the motor 34 but also the second encoder 39 for detecting the angular change of the ball screw shaft 31 itself is provided, for example, the second encoder 39 as needed. , It is possible to confirm the absolute stop position of the moving body 32, and thereby to accurately control the stopping of the moving body 32, that is, control the movement of the wafer transfer device 21 in the Z direction.

By comparing the correlation value R of each signal from the first encoder 38 and the second encoder 39 with the aforementioned reference value S0, the timing belt 3
6 can be monitored at any time. And FIG.
It can be confirmed that the timing belt 36 has changed from the initial state by the signal output at the change point a in the graph shown in FIG. 4. At this point, for example, the control of the motor 34 is changed to change the reference value S0 and the correlation value. The motor 34 may be controlled by appropriately correcting the difference from R.

Further, at the changing point b, the correlation value R is still within the allowable range, but indicates that the correlation value R is changing rapidly, so that the degree of expansion and contraction of the timing belt 36 suddenly increases. It is shown that. Therefore,
If the timing belt 36 is replaced at this stage, an unexpected accident or the like due to expansion and contraction of the timing belt 36 can be prevented.

When the change point c is indicated, the correlation value R has exceeded the allowable range, and the timing belt 36 needs to be replaced immediately. Therefore, at this point, an appropriate warning may be issued by the notification device 40, and the motor 34 and other devices in the system may be controlled so as to be stopped.

The comparison between the correlation value R and the reference value S 0, and consequently the calculation of the correlation value R, are performed at any time, but need not always be performed. It may be carried out periodically every predetermined period.

As described above, the transport device 2 according to the present embodiment
According to 1, accurate stop control is possible, and it is possible to know in advance the appropriate timing of replacement of the timing belt 36 employed in the drive transmission system. Therefore, an unexpected situation or the like due to expansion and contraction and deterioration of the timing belt 36 can be prevented.

In the coating and developing system 1, the wafer transfer device 62 has the same configuration as the wafer transfer device 21 according to the present embodiment. In the transfer, the vertical movement of the wafer transfer device 62 is also accurately controlled, so that it is possible to know in advance the appropriate timing for replacing the timing belt, thereby preventing the timing belt from being deteriorated and accidentally caused by expansion and contraction. it can.

Further, in the transfer device 21 according to the present embodiment, the ball screw shaft 31 and the motor 34, which perform the vertical movement, that is, the movement in the Z direction, are provided with encoders respectively. The present invention is not limited to this, and can be applied to a drive system that is responsible for movement in the X direction, that is, movement of the transport path 22. Further, the present invention is also applicable to a drive system for moving the main wafer transfer device 51 in the Z direction. In addition, the present invention provides a screw shaft that rotates by rotation of a driven pulley, a drive pulley that drives the driven pulley via a belt, a motor that rotates the drive pulley, and a screw shaft that is rotated by rotation of the screw shaft. And a moving body that moves along the moving body, and is applicable to an apparatus that conveys an object to be conveyed to a predetermined position by moving the moving body.

[0045]

According to the first aspect of the present invention, even if the belt is stretched and the control of the moving body is different from the initial control, the control based on the output from the second encoder is performed. Can be appropriately corrected. Therefore, it is possible to improve the control instability due to the deterioration of the belt and the like as compared with the conventional transport apparatus of this type, and it is possible to accurately control the stop position of the moving body and the like. Further, according to the transfer device of the second aspect, it is possible to know in advance the timing of replacing the belt, and it is possible to prevent an unexpected situation due to deterioration of the belt or the like.

[Brief description of the drawings]

FIG. 1 is a plan view of a coating and developing system incorporating a transport device according to an embodiment of the present invention.

FIG. 2 is an explanatory view of the coating and developing processing system of FIG. 1 as viewed from the front.

FIG. 3 is an explanatory diagram of the coating and developing treatment system of FIG. 1 as viewed from the back.

FIG. 4 is an explanatory plan view of the transport device according to the embodiment of the present invention;

FIG. 5 is an explanatory side view of the transport device according to the embodiment of the present invention;

FIG. 6 is an explanatory diagram of a vertical drive system of the transport device according to the embodiment of the present invention.

FIG. 7 is a graph showing an example of a time-series change with a correlation value with respect to a reference value in the transport device according to the embodiment of the present invention.

FIG. 8 is a perspective view showing the appearance of a coating and developing system incorporating a transport device according to the related art.

FIG. 9 is an explanatory diagram of a drive system of a transport device according to the related art.

[Explanation of symbols]

 Reference Signs List 1 coating / developing processing system 10 cassette station 11 processing station 21 wafer transfer device 22 transfer path 31 ball screw shaft 32 moving body 33 driven pulley 34 motor 35 drive pulley 36 timing belt 37 control device 38 first encoder 39 second encoder 40 Notification device W wafer

Claims (2)

[Claims] 1. A screw shaft that is rotated by rotation of a driven pulley, a driving pulley that drives the driven pulley via a belt, a motor that rotates the driving pulley, and a rotation of the screw shaft along the screw shaft. A first encoder for detecting an angular displacement of a rotating shaft on the motor side, wherein the screw shaft comprises: a first encoder for detecting an angular displacement of a rotating shaft on the motor side; And a second encoder for detecting the angular displacement of the transfer device. 2. A screw shaft that is rotated by rotation of a driven pulley, a driving pulley that drives the driven pulley via a belt, a motor that rotates the driving pulley, and a rotation of the screw shaft along the screw shaft. A first encoder for detecting an angular displacement of a rotating shaft on the motor side, wherein the screw shaft comprises: a first encoder for detecting an angular displacement of a rotating shaft on the motor side; A second encoder for detecting an angular displacement of the sensor, a detecting device for obtaining a relationship between signals from the first encoder and the second encoder, and a predetermined warning to the outside based on data obtained by the detecting device. And a signal generation device for notifying the user of the transfer.