JPH10154461A - Manufacture of shadow mask and etching-resistant layer coating device used for it - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent bubbles from being left in small hole side recesses by providing a gravure roll with a specific diameter having a doctor blade below the first principal plane of a belt-like metal thin sheet, bringing it onto contact with the thin sheet via the rotation at a specific peripheral speed in the direction opposite to the conveying direction, and filling an etching-resistant layer coating liquid in the recesses of the first principal plane. SOLUTION: A belt-like metal thin sheet 21, formed with multiple recesses on the first principal plane by etching and formed with multiple openings on the second principal plane, is conveyed to the left direction, while the first principal plane is set to the lower side. A gravure roll 23 provided below it and having a diameter so about 20-60mm is rotated at a peripheral speed which is 4-25 times the conveying speed in the direction opposite to the conveying direction of the thin sheet 21. An etching-resistant layer coating liquid 27 is fed to a carving section 24 on the surface of the roll 23 from a coating liquid feed nozzle 26, and a surplus is scraped off by a doctor blade 28. Large shearing force is generated at the time of coating by a small contact area with the roll 23 and the opposite rotation at a relatively large peripheral speed, and the air in the recesses is easily replaced by the coating liquid 27.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a shadow mask for a color picture tube, and more particularly to a method called a two-stage etching method.

[0002] The present invention also relates to an etching-resistant layer coating device used in a two-stage etching method.

[0003]

2. Description of the Related Art In recent years, a color display tube for displaying characters, figures, and the like has been strongly demanded to have higher definition and higher quality. Along with this, the opening size of the shadow mask has been reduced, and the variation in the opening size has been reduced.

[0004] The openings of the shadow mask are roughly classified into those having a circular opening shape and those having a rectangular opening shape. A color display tube for displaying characters and figures has a circular opening shape. 2. Description of the Related Art A shadow mask is used, and a shadow mask having a rectangular opening is mainly used in a color picture tube used in ordinary households.

The openings of the shadow mask are conventionally formed by a photo-etching method. In particular, shadow masks for color display tubes that require high definition and high quality are mainly formed by a two-step etching method.

In the two-stage etching, first, a concave portion corresponding to a small hole on the electron gun side is formed on one surface of a thin metal plate by etching. An etching-resistant layer is formed on the surface where the concave portions corresponding to the small holes are formed. Thereafter, the other surface is etched in a pattern corresponding to the large hole, and an opening is formed by penetrating the concave portion corresponding to the small hole from the large hole side. It can be considered that the pore diameter of the substantially obtained pores is controlled on the small pore side.

In the double-sided etching method of simultaneously etching from both the small hole and the large hole, it is difficult to control the side etching phenomenon in which the opening size of the concave portion obtained by etching is larger than the opening size of the resist. Even after the connection of the small hole and the large hole, the etching of the small hole proceeds, so that it is difficult to control the opening diameter. On the other hand, in the two-stage etching method, in the second etching step, the recess on the small hole side is filled with an etching resistant layer so that the small hole is not etched again. Thereby, a precise small hole pattern in the first etching step can be maintained, and an opening smaller than the thickness of the thin metal plate is enabled.

[0008] As a method for applying an etching resistant layer, conventionally, a spray coater, a roll coater,
A method using a gravure coater or a PDN (pipe doctor nozzle) coater is used. However,
With the recent increase in definition, holes having a smaller diameter are required, and these coating methods have become insufficient. If the openings are small, bubbles tend to remain in the recesses on the side of the small holes when the etching-resistant layer is applied, causing defects in the etching-resistant layer. For this reason, in the second etching step, the etching phenomenon of the small holes easily proceeds. The side-etching phenomenon causes enlargement and deformation of the hole shape and a defect in the hole diameter, and causes a variation in the hole diameter and a deterioration in uneven quality.

In recent years, a color picture tube having a rectangular aperture shape has been required to be miniaturized for use in multimedia, and a two-stage etching method has begun to be applied to a shadow mask of such a color picture tube. I have. However, such a rectangular opening has an anisotropy in a small hole shape as compared with a circular opening, and the depth of the small hole is deep, so that it is difficult to form an etching resistant layer.

[0010]

SUMMARY OF THE INVENTION According to the present invention, the opening shape and the opening are improved by preventing bubbles from remaining in the concave portion on the side of the small hole at the time of applying the etching resistant layer, thereby preventing defects from being generated in the etching resistant layer. It is an object of the present invention to provide a method of manufacturing a shadow mask having a uniform hole diameter and a uniform quality.

Another object of the present invention is to provide an etching-resistant layer coating apparatus which prevents a bubble from remaining in a concave portion on the side of a small hole when forming an etching-resistant layer and forms a uniform etching-resistant layer without defects. Aim.

[0012]

SUMMARY OF THE INVENTION The present invention firstly has a first main surface on which a plurality of recesses are formed by etching and a second main surface on which a resist layer having a plurality of openings is formed. A strip-shaped sheet metal is disposed with the first main surface facing downward, and a diameter of about 20 mm to about 60 m below the first main surface.
m, a member for supplying an etching-resistant layer coating liquid onto the gravure roll, and an etching-resistant layer coating apparatus having a doctor blade provided on the gravure roll, and the belt-shaped metal sheet is moved substantially horizontally. The gravure roll is rotated in a direction opposite to the conveying direction of the strip of metal at a peripheral speed of 4 to 25 times the conveying speed of the strip of metal while contacting the first main surface. And keeping the gravure roll in contact with the gravure roll while keeping the position on the second main surface opposite to the position on the first main surface in contact with the gravure roll. After the doctor blade scrapes off the excess etch-resistant layer coating solution on the gravure roll,
Is applied to the first main surface while filling the recesses of the main surface of
A method of manufacturing a shadow mask, comprising: forming an etching-resistant layer; and subjecting the second main surface to etching to form an opening from the second main surface to a recess.

The present invention secondly provides a strip-shaped metal sheet having a first main surface in which a plurality of concave portions are formed by etching and a second main surface in which a resist layer having a plurality of openings is formed. Providing a first etching-resistant layer coating device on the first main surface, supplying an etching-resistant layer coating solution in advance, disposing the first main surface on the lower side, On the surface, a gravure roll with a diameter of about 20 mm to about 60 mm,
A member for supplying an etching-resistant layer coating solution on the gravure roll, and a second etching-resistant layer coating device having a doctor blade provided on the gravure roll,
The gravure roll is rotated in a direction opposite to the conveying direction of the strip-shaped metal sheet at a peripheral speed of 4 to 25 times the conveying speed of the strip-shaped metal sheet while conveying the strip-shaped metal sheet substantially horizontally. 1 while contacting the gravure roll with the gravure roll and keeping the position on the second main surface opposite to the position on the first main surface in contact with the gravure roll. The coating liquid is supplied to the gravure roll, and the doctor blade is used to scrape off the excess etching-resistant layer coating liquid on the gravure roll, and then apply the coating liquid to the first main surface.
A step of forming an etching-resistant layer by regulating the thickness of the layer of the coating liquid supplied in advance, and forming the opening from the second main surface to the concave portion by subjecting the second main surface to etching. A method of manufacturing a shadow mask, comprising the steps of:

The step of supplying the etching-resistant layer coating solution according to the second invention in advance includes the following.

The first preferable step is a step similar to that of the first aspect of the invention, that is, a first step in which a resist layer having a plurality of openings and a first main surface having a plurality of recesses formed by etching is formed. A gravure roll having a diameter of about 20 mm to about 60 mm and an anti-etching layer coating solution supplied onto the gravure roll while transporting the strip-shaped metal sheet having the second main surface substantially horizontally with the first main surface facing down. The gravure roll of the anti-etching layer coating apparatus having the anti-etching layer coating liquid supply member and the doctor blade provided on the gravure roll is moved at a conveying speed of 4 mm for the strip-shaped metal sheet.
At a peripheral speed of 2 to 25 times, the belt-shaped metal sheet is rotated in a direction opposite to the conveying direction to make contact with the first main surface, and a position on the first main surface where the gravure roll is contacted While keeping the position on the second main surface opposite to the free state, supplying the etching-resistant layer coating solution to the gravure roll, and using the doctor blade to remove the excess etching-resistant layer on the gravure roll. After the application liquid is scraped off, the first main surface is applied, and an etching-resistant layer coating liquid is supplied.

Further, as a second preferred step, the peripheral speed of the gravure roll is set at 4 to the transport speed of the metal sheet.
Except for making it smaller than twice, the same steps as the first preferable step can be mentioned.

Further, the third preferable step is the same as the first preferable step except that a doctor blade for scraping off the excess etching-resistant layer coating solution is removed from the gravure roll. In this case, the peripheral speed of the gravure roll is not particularly limited.

As a fourth preferred step, there is a step of forming an etching resistant layer using an etching resistant layer coating apparatus using a slit nozzle without using a gravure roll.

Third, the present invention relates to a method for manufacturing a semiconductor device, comprising:
A resist layer coating apparatus for a shadow mask, comprising: a gravure roll of 0 mm; a member for supplying an etching-resistant layer coating liquid on the gravure roll; and a doctor blade provided on the gravure roll. Has a first main surface on which a concave portion is formed, and a second main surface on which a resist layer having a plurality of openings is formed, and is disposed substantially horizontally with the first main surface facing down. The gravure roll is disposed on the first main surface side with respect to the strip-shaped metal sheet to be formed, and the gravure roll is rotated at a peripheral speed of 4 to 25 times the transport speed of the strip-shaped metal sheet, in a direction opposite to the transport direction of the strip-shaped metal sheet. The gravure roll is brought into contact with the first main surface, and the position on the second main surface opposite to the position on the first main surface with which the gravure roll is in contact is set in a free state. Keep the etching resistant coating solution And supplying the liquid to the gravure roll, and scraping off the excess etching-resistant layer coating solution on the gravure roll with the doctor blade, and then filling the concave portion of the first main surface with the first main surface. Provided is an etching-resistant layer coating device for a shadow mask, which is applied to form an etching-resistant layer.

Fourth, the present invention provides a first coating apparatus, a gravure roll having a diameter of about 20 mm to about 60 mm, a member for supplying an etching-resistant layer coating solution onto the gravure roll, A second coating device having a doctor blade provided thereon, wherein the first coating device has a plurality of concave portions formed by etching. And disposed on the first main surface side of the strip-shaped metal sheet having a second main surface on which a resist layer having a plurality of openings is formed,
The second coating device is disposed on the first main surface side with respect to the strip-shaped metal sheet that is transported substantially horizontally, with the first main surface facing down, and the gravure roll is disposed on the first main surface side. At a peripheral speed of 4 to 25 times the conveying speed of the strip-shaped metal sheet, the sheet-shaped sheet metal is rotated in a direction opposite to the conveying direction to contact the first main surface, and the gravure roll is contacted. First
While maintaining the position on the second main surface opposite to the position on the main surface in a free state, the etching-resistant layer coating solution is supplied to the gravure roll, and by the doctor blade,
The present invention provides an etching-resistant layer coating device for a shadow mask, which forms an etching-resistant layer by scraping off excess coating solution of the etching-resistant layer on the gravure roll and applying the scraping solution to the first main surface.

The first apparatus for applying an etching-resistant layer used in the fourth invention is as follows.

The first preferable coating apparatus includes a gravure roll having a first diameter of about 20 mm to about 60 mm, an etching-resistant layer coating liquid supply member for supplying an etching-resistant layer coating liquid onto the gravure roll, and a gravure roll. A coating device having a doctor blade provided on a roll, wherein the gravure roll is transported at a peripheral speed of 4 to 25 times the transport speed of the strip-shaped metal sheet, and in a transport direction of the strip-shaped metal sheet. Is rotated in the opposite direction to contact the first main surface, and the position on the second main surface opposite to the position on the first main surface with which the gravure roll is in contact is freely set. While maintaining the state, the etching-resistant layer coating solution is supplied to the gravure roll, and the first doctor blade scrapes off the excess etching-resistant layer coating solution on the gravure roll. It is applied to the surface.

A second preferred coating device is the same as the first preferred coating device, except that the peripheral speed of the gravure roll is less than four times the conveying speed of the metal sheet.

A third preferred coating device is the same as the first preferred coating device except that a doctor blade for scraping off the excess anti-etching layer coating solution from the gravure roll is removed. In this case, the peripheral speed of the gravure roll is not particularly limited.

A fourth preferred coating apparatus is an etching resistant layer coating apparatus using a slit nozzle without using a gravure roll.

According to a fourth aspect of the present invention, there is provided a shadow mask for forming an etching resistant layer by further controlling the thickness of a coating layer of the etching resistant layer coating liquid applied by a first coating apparatus by a second coating apparatus. An etching-resistant layer coating device is provided.

[0027]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method of manufacturing a shadow mask according to the present invention is directed to a method of manufacturing a shadow mask by forming a first main surface on which a plurality of concave portions are formed by etching and a second main surface on which a resist layer having a plurality of openings is formed. A metal sheet having a diameter of about 20 mm below the first main surface.
A gravure roll having a thickness of about 60 mm, a member for supplying an etching-resistant layer coating solution on the gravure roll, and at least one etching-resistant layer coating device having a doctor blade provided on the gravure roll are provided. While transporting substantially horizontally, the gravure roll is rotated at a peripheral speed of 4 to 25 times the transport speed of the strip-shaped metal sheet in a direction opposite to the transport direction of the strip-shaped metal sheet, and brought into contact with the first main surface, While maintaining the position on the second main surface opposite to the position on the first main surface in contact with the gravure roll in a free state, the etching-resistant layer coating solution is supplied to the gravure roll, and the doctor blade is used. Removing the excess coating solution of the anti-etching layer on the gravure roll, applying the coating solution to the first main surface to form an anti-etching layer, and etching the second main surface. Subjected to grayed, comprising the step of forming an opening leading into the recess from the second major surface.

Here, "keeping the position on the second principal surface free" means that there is no support member such as a back roll facing the gravure roll on the second principal surface. That means.

The gravure roll has a groove of a predetermined depth carved on its surface or a thin metal wire wound on its surface, and has a diameter of about 20 mm to about 60 m, for example.
Rolls having a relatively small diameter of m can be used.

In order to form a plurality of recesses by etching, for example, a first etching resist layer having a plurality of openings on a first main surface and a second etching resist layer having a plurality of openings on the second main surface are provided. The first main surface can be subjected to etching by preparing the strip-shaped metal sheet on which the etching resist layer is formed.

In the present invention, a diameter of about 20 mm to about 60 mm
By rotating the small-diameter gravure roll in the opposite direction at a high speed, a large shearing force is generated, the pushing force for forming the etching resistant layer into the concave portion is increased, the air is easily replaced with the air in the concave portion, and the small size of the shadow mask is reduced. It becomes possible to easily fill the concave portion of the concave and convex base material such as the concave portion with the coating liquid.

In the present invention, since a surplus etching-resistant layer forming agent is scraped off from the surface of the gravure coater with a doctor blade and applied, a constant film thickness can be easily obtained.

As the etch-resistant layer forming agent used in the method for producing a shadow mask of the present invention, a water-soluble thermosetting resin, a solvent-type thermosetting resin, and a solventless UV
Curable resin, hot melt resin, or the like can be used. In particular, a solventless UV-curable resin is suitable for the shadow mask manufacturing apparatus of the present invention. When the etching-resistant layer forming agent is a UV-curable resin, a UV curing lamp can be used to cure the applied resin film.

Preferably, an auxiliary roll can be further provided at a stage subsequent to the position on the second main surface. Thereby, the replacement of air and the control of the film thickness are performed more effectively.

The viscosity of the etching resistant layer forming agent at the time of coating is preferably adjusted to 40 cps to 1500 cps, more preferably 70 to 200 cps.
In addition, the temperature of the etching resistant layer forming agent at the time of coating,
Preferably from 20 ° C to 70 ° C, more preferably from 30 to 5 ° C.
It is adjusted to 0 ° C. Since the coating device used in the present invention has a relatively small heat capacity, it is possible to easily apply a coating solution by heating, and can easily supply an etching resistant layer forming agent heated to 20 to 70 ° C. The coating apparatus used in the present invention can easily adjust the temperature so that coating can be performed under favorable optimum coating liquid conditions such as viscosity and surface tension. In this case, the metal sheet is 20
By heating to between 70 ° C and 70 ° C, the coating state can be further improved.

In this method, one or more etching-resistant layer coating apparatuses can be provided as necessary. When two or more etching-resistant layer coating devices are provided, the air in the recesses can be more reliably replaced with a coating solution, the recesses can be filled with the coating solution, and the film thickness can be better controlled.

When only one etching-resistant layer coating device is provided, the air in the concave portion can be sufficiently replaced with a coating solution and the film thickness can be controlled. This method is, for example, 40 to 50 μm in depth and 80 to 120 μm in pore size.
It can be preferably applied to a recess having a size of at least m and a dot shape. However, depending on the size and shape of the concave portion, replacement of air and control of the film thickness may not be performed sufficiently.

The method for manufacturing a shadow mask described below is applicable to such a case, and shows one preferred embodiment of the method for manufacturing a shadow mask according to the present invention. In this method, at least two first and second etching-resistant layer coating devices are arranged and arranged in two stages, and the coating is performed in at least two steps.

More specifically, according to this preferred embodiment, a strip-shaped metal sheet having a first main surface in which a plurality of concave portions are formed by etching and a second main surface in which a resist layer having a plurality of openings is formed. A step of providing a first etching-resistant layer coating device on the first main surface, supplying an etching-resistant layer coating solution in advance, disposing the first main surface on the lower side, On the surface, a gravure roll having a diameter of about 20 mm to about 60 mm, a member for supplying an etching-resistant layer coating liquid on the gravure roll, and a second etching-resistant layer coating apparatus having a doctor blade provided on the gravure roll. The gravure roll is transported substantially horizontally while the gravure roll is transported approximately four to two times as fast as the transport speed of the ribbon.
At a peripheral speed of five times, the belt-shaped sheet metal is rotated in the opposite direction to the conveying direction to make contact with the first main surface, and the gravure roll is brought into contact with the first main surface at a position opposite to the position on the first main surface. While maintaining the position on the main surface of 2 in a free state, the anti-etching layer coating solution is supplied to the gravure roll, and the excess anti-etching layer coating solution on the gravure roll is scraped off with a doctor blade. A step of forming an etching-resistant layer by applying a coating liquid applied to the main surface of the first and controlling the thickness of the coating liquid supplied in advance, and subjecting the second main surface to etching, and forming a recess from the second main surface. And a method of manufacturing a shadow mask, comprising a step of forming an opening leading to a hole.

As the first anti-etching layer coating apparatus,
For example, a coating apparatus having a configuration similar to the second etching liquid coating apparatus, that is, a gravure roll having a diameter of about 20 mm to about 60 mm, and an etching-resistant layer coating liquid supply member that supplies an etching-resistant layer coating liquid onto the gravure roll, An apparatus having a doctor blade provided on a gravure roll can be used. In this apparatus, two first and second etching resistant layer coating apparatuses having the same configuration are arranged side by side and arranged in two stages, and the coating can be performed in two steps.

In addition, a coating apparatus using a slit coater or a coating apparatus having the same configuration as the first etching resistant layer coating apparatus except that a doctor blade is not used is preferably used.

When a slit coater is used and when a doctor blade is not used, the coating solution for the etching resistant layer can be excessively supplied onto the metal sheet. When the doctor blade is not used, the peripheral speed of the gravure coater can be rotated at any speed.

When a coating apparatus having the same structure as the second etching-resistant layer coating apparatus is used, the peripheral speed of the gravure coater is set to be 4 to 2 times the transport speed of the metal sheet.
If it is maintained at 5 times, an appropriate amount of the coating solution for the etching resistant layer can be supplied, and if it is maintained at 4 times or less, an excessive amount of the coating solution for the etching resistant layer can be supplied.

When a slit coater is used, the strip-shaped metal sheet is preferably directed upward. When a gravure coater is used, the strip-shaped metal sheet is preferably directed downward.

In the coating method using these devices, the first method
The thickness of the coating layer of the coating liquid applied by the coating device of
Since the etching-resistant layer is further regulated by the second coating device, the air in the recess is sufficiently replaced with the etching-resistant coating solution, and then the film thickness is sufficiently controlled by the second coating device. Can do it.

Further, according to the method using these apparatuses, it is possible to sufficiently fill the deeper concave portion, the finer concave portion, and the small hole concave portion of the shadow mask with the resist remaining with the coating liquid. Becomes

In the first anti-etching layer coating apparatus, an anti-etching layer coating solution is supplied in advance onto a thin metal plate. The second coating apparatus can perform coating while sufficiently replacing the air in the concave portion with the etching layer coating liquid supplied in advance, and can control the film thickness.

Further, in this method, for example, two-stage etching of a thick shadow mask for a large-sized consumer color picture tube having a rectangular opening shape, for example, a depth of 80 to 120 μm,
The present invention can also be preferably applied to a rectangular recess having a size of 70 μm × 170 μm to 200 μm × 700 μm. In particular, when an excessive amount of the coating liquid for the etching layer is provided, the air in the rectangular recess can be sufficiently replaced without running out of the coating liquid for the etching layer.

Further, even if the step of peeling off the resist layer around the small hole recess after the first etching is omitted, the application and the filling of the etching resistant layer coating liquid can be performed, so that the cost can be reduced. it can.

In the above-described method of the present invention, a coating apparatus to be used can be appropriately selected according to a desired opening size and opening shape of the shadow mask.

Hereinafter, the present invention will be specifically described with reference to the drawings.

FIG. 1 is a schematic view showing an example of an etching-resistant layer coating apparatus according to the first invention.

In FIG. 1, reference numeral 21 denotes a strip-shaped metal thin plate which is a base material of a shadow mask. The strip-shaped metal sheet 21 is
2 which can be moved up and down by a driving device (not shown)
It is hung by the individual spreading rolls 22 and 122.
The strip-shaped thin metal plate 21 is transported from the right side to the left side in the drawing, and travels substantially horizontally in the application area. About 20 mm to about 60 mm below the metal sheet 21
Is provided.
The gravure roll 23 is rotated directly or indirectly at a high speed in a direction opposite to the running direction of the metal sheet 21 by a drive motor (not shown). On the outer peripheral surface of the gravure roll 23, an engraving part 24 for filling the etching-resistant layer coating liquid is provided. The engraved portion 24 of the gravure roll 23 is provided with a spiral groove having a pitch of approximately 0.120 mm to 0.260 mm, a depth of approximately 30 μm to 100 μm, and a tilt of approximately 70 ° with respect to the roll axis. Below the gravure roll 23, a container 25 for receiving an overflow of the etching-resistant layer coating solution placed on a base (not shown) is fixed. On this container 25,
A coating liquid supply nozzle 26 that supplies an etching resistant layer coating liquid 27 to the gravure roll 23 is provided. Further, the doctor blade 2 is positioned at a position on the engraved portion 24 of the gravure roll 23 immediately before the etching-resistant layer coating liquid 27 supplied from the coating liquid supply nozzle 26 moves to the metal sheet 21.
8 are provided. The surplus etching-resistant layer coating liquid 27 applied to the engraved portion 24 can be scraped off by the doctor blade 28.

At the time of coating, the lower surfaces of the stretching rolls 22 and 122 are located below the upper surface of the metal thin plate 21 in contact with the gravure roll 23, and the angle between the gravure roll 23 and the metal thin plate 21 The contact area is regulated. In addition, at the time of non-application, the stretching rolls 22 and 1
Reference numeral 22 moves upward, and separates the lower surface of the thin metal plate 21 from the gravure roll 23. Further, at the position where the gravure roll is arranged, the upper surface of the thin metal plate is in a free state without being provided with a support roll such as a back roll.

The coating apparatus according to the present invention has a diameter of about 20 mm.
Since the gravure roll 23 having a small diameter of about 60 mm is used, the contact area with the metal sheet 21 is small. Also,
Since the traveling speed of the metal sheet 11 and the peripheral speed of the gravure roll 23 are set differently at the application section and the reverse rotation is performed at a relatively large peripheral speed, a large shearing force can be generated at the time of application. As a result, the force with which the etching resistant coating solution is pushed into the recesses is enhanced, and the air in the recesses can be easily replaced with the etching resistant coating solution. As described above, according to the present invention, the etching-resistant layer coating liquid 27 can be easily applied to the metal sheet 21 having irregularities. Also, the doctor blade 28
The thickness of the etching-resistant layer coating solution 27 on the engraved portion 24 is always adjusted to a predetermined uniform thickness.
, A stable film thickness and coating state can be obtained.

FIG. 2 shows that the application liquid supply nozzle 26 shown in FIG.
FIG. 4 is a view schematically showing a coating liquid supply system for supplying a heated coating liquid 27 for an etching resistant layer. In FIG. 2, 3
1 is a method for removing the etching-resistant layer coating solution 27 accumulated on a container 25 for receiving an overflow into a service tank 3.
2 is a diaphragm pump for sending to the second pump. Here, the etching resistant coating solution 27 sent to the service tank 32 is subjected to defoaming treatment and heating treatment, and is sent to a working tank 34 by a diaphragm pump 33. The coating liquid 27 for the etching resistant layer is heated and adjusted to the final coating liquid temperature in the working tank 34, and then the diaphragm pump 35 is heated.
To the application liquid supply nozzle 26. 36 and 37 are a service tank 32 and a working tank 34.
Is a pipe for flowing hot water for heating.

The process flow of the two-stage etching method using the etching-resistant layer coating apparatus shown in FIGS. 1 and 2 is as follows.

First Etching Step First, a strip-shaped metal sheet on which a resist film having openings of a predetermined pattern on both surfaces is formed is prepared. In this opening, the surface of the metal sheet is exposed. A recess is formed on the surface of the metal sheet at the opening by etching with the one surface of the band-shaped metal sheet on which the resist film is formed facing downward.
Thereafter, the resist film on this surface is peeled off.

Next, an etching-resistant layer coating solution is applied using the etching-resistant layer coating apparatus of the present invention, with the surface on which the concave portion is formed by the first etching step facing downward. Then, the concave portion is filled with an etching resistant layer coating solution to form an etching resistant layer. In this device, the diameter is about 20 mm to about 60 m
m gravure rolls are placed below a strip of sheet metal running at a speed V (m / min). The gravure roll is rotated at a peripheral speed of about 4 V (m / min) to 25 V (m / min) or more in a direction opposite to the transport direction of the metal sheet. At this time, the upper surface of the thin metal plate is free at the position where the gravure roll is arranged. The etching-resistant layer coating solution is supplied to the surface of the gravure roll, the excess etching-resistant layer coating solution is scraped off from the surface of the gravure roll by a doctor blade, and the etching-resistant layer coating solution is applied to the lower surface of the strip-shaped metal sheet.

Second Etching Step Thereafter, the strip-shaped thin metal plate is subjected to an etching treatment, so that the surface opposite to the surface provided with the etching resistant layer is etched in accordance with the opening of the resist. An opening is formed to communicate with the recess formed in step (1).

FIG. 3 is a schematic view showing an example of an etching-resistant layer coating apparatus according to the second invention.

The etching-resistant layer coating device shown in FIG. 3 has a structure in which two coating devices having the same configuration as the coating device shown in FIG. 1 are arranged.

In the apparatus shown in FIG. 3, the air in the recess is sufficiently replaced with the etching-resistant layer coating liquid by the first coating apparatus, and then the film thickness is sufficiently controlled by the second coating apparatus. it can. Further, when this apparatus is used, a deep concave portion, a finer concave portion, and a small hole concave portion of a shadow mask in which a resist remains can be sufficiently filled with the coating liquid.

FIG. 4 is a schematic diagram showing another example of the etching-resistant layer coating apparatus according to the second invention.

The anti-etching layer coating apparatus shown in FIG. 4 has the same configuration as the apparatus shown in FIG. 1 except that the doctor blade 28 is not provided. The second has the same configuration as the coating device shown in FIG.
Coating device.

FIG. 5 is a schematic view showing still another example of the etching-resistant layer coating apparatus according to the second invention.

The anti-etching layer coating apparatus shown in FIG. 5 includes a slit nozzle 40 provided as a first coating apparatus,
And a second coating having a configuration similar to that of the coating apparatus shown in FIG.

In the apparatus shown in FIG. 5, since the slit nozzle 40 is used in the front stage, the thin metal plate is arranged so that the surface to be coated is up in the first stage and the surface to be coated is down in the second stage. .

When the apparatus shown in FIGS. 4 and 5 is used, the first
The coating device of (1) supplies an etching-resistant layer coating solution excessively onto the metal sheet, and then controls the film thickness while pushing the excessively supplied etching layer coating solution into the concave portion by the second coating device. Thus, a uniform coating layer having a desired thickness can be formed.

According to the apparatus shown in FIGS. 4 and 5,
The concave portions having a depth that cannot be filled by the apparatus shown in FIGS. 1 and 3 can be filled with the coating liquid.

The apparatus shown in FIG. 6 is a schematic view showing one preferred embodiment of the etching-resistant layer coating apparatus according to the first invention.

As shown in the figure, this apparatus has the same configuration as that of the first embodiment except that an auxiliary roll 29 is provided slightly downstream of a position on the surface opposite to the surface on which the gravure roll 23 is in contact. 1 has the same configuration as the device shown in FIG. When the auxiliary roll 29 is used, the air in the concave portion can be more effectively replaced with the etching-resistant layer coating solution, and better film thickness control can be performed. Further, the etching-resistant layer coating device using the auxiliary roll 29 can be sufficiently applied to a concave portion having a relatively small hole diameter and a large depth without providing two coating devices as in the device shown in FIG. I can do it.

An example of a color picture tube using a shadow mask obtained by the method of the present invention will be described below.

FIG. 7 is a schematic view showing an example of a color picture tube using a shadow mask obtained by the method of the present invention.

As shown in FIG. 7, the shadow mask type color picture tube has a vacuum envelope 6 and red, green, and red colors provided on the inner surface of the panel 1 constituting a part of the vacuum envelope 6. The present invention is a fluorescent screen 2 composed of a phosphor layer emitting three colors of blue, and a color selection electrode in which a large number of apertures are arranged at a predetermined distance from the fluorescent screen 2 on the entire surface at a predetermined size and pitch. Is located. The shadow mask obtained by the present invention is
Since there is no variation in the aperture shape and aperture diameter, and the quality of unevenness is good, the electron beams 5 emitted from the electron gun 4 are selected so as to land more precisely on a predetermined phosphor layer.

[0076]

【Example】

Example 1 FIGS. 8 to 16 are views showing the flow of the two-stage etching method and the change in the cross-sectional shape of a metal thin plate. First, the metal sheet 7
A 0.12 mm thick invar material made of an iron-nickel alloy containing 36% by weight of nickel is prepared.

Photosensitive film forming step Rolling oil and rust preventive oil adhering to the surface of the metal sheet 7 are degreased, washed, and dried. Then, as shown in FIG. 8, a water-soluble photosensitive agent mainly composed of casein and dichromate is applied to both surfaces of the thin metal plate 7 in a predetermined thickness and dried to form a photosensitive film 8 having a thickness of several μm. , 108 are formed.

Exposure Step Next, a pair of an original 9 having a pattern corresponding to the small hole on the electron gun side of the opening of the shadow mask and an original 109 having a pattern corresponding to the large hole on the fluorescent screen side are formed. A photomask was prepared. As shown in FIG.
The originals 9 and 109 were brought into close contact with the photosensitive films 8 and 108 on both sides, respectively, and exposed, and the patterns of the originals 9 and 109 were printed.

Developing Step Thereafter, the photosensitive films 8 on both sides on which the pattern has been printed are removed.
It was developed with water, and the unexposed portion was removed to expose a part of the metal surface. As a result, as shown in FIG. 10, resist patterns 10 and 110 composed of patterns corresponding to the patterns of the pair of originals 9 and 109 were formed.

First Etching Step Further, as shown in FIG. 11, a protective film 111 having a structure in which an adhesive material was applied to an etching-resistant resin film such as CPP was adhered to the surface on which the resist 110 was formed. Also, on the surface side on which the resist 10 is formed,
Etching was performed by spraying a ferric chloride solution as an etchant. By etching, a small concave hole 12 on the electron gun side of the shadow mask was formed in the exposed metal portion on the surface on which the resist 10 was formed.

First Etching Stop Step After the end of the first etching, industrial water is sprayed on the metal thin plate 7, and the etching liquid 16 remaining on the surface of the metal thin plate 7, particularly in the small recesses 12, is uniformly and industrially water-washed. High-speed displacement cleaning. Thereby, as shown in FIG.
Of the etching solution 16 remaining on the surface of the
Is removed.

Next, the resist layer 10 on the 12 side after the etching is removed by peeling off with an aqueous solution of sodium hydroxide, spray-washing and drying with industrial water and pure water, and then formed on the resist 110 side. The protective film 111 was removed, and as shown in FIG. 13, the anti-etching layer coating liquid was applied and filled in the small concave holes 12 using the coating apparatus shown in FIGS. As the coating solution for the etching resistant layer, a coating solution for the etching resistant layer composed of water-soluble casein-acrylic resin was used. The viscosity of the coating solution was 60 cps at 25 ° C.

Thereafter, in the case of a coating solution for an etching-resistant layer comprising a water-soluble casein-acrylic resin,
The resultant was dried by heating to form an etching-resistant layer 13. The thickness of the obtained etching resistant layer was about 15 μm to 20 μm. Further, the protective film 11 was stuck on the etching resistant layer 13.

Second Etching Step As shown in FIG. 14, the surface on which the resist 110 is formed is etched by spraying an etching solution composed of a ferric chloride solution, and the surface on which the resist 110 is formed is etched. Large hole 1 on the fluorescent screen side of the shadow mask
12 was formed, and an opening was formed through the small concave hole 12.

Etching stop step After the completion of the second etching, industrial water is sprayed on the metal thin plate 7, and the etching solution 16 remaining on the surface of the metal thin plate 7, particularly in the large concave hole 112, is uniformly and industrially water-washed. Replaced at high speed. Thus, as shown in FIG.
The etching solution 16 remaining on the surface of the metal sheet 7, particularly in the large concave hole 112, was sufficiently removed.

Thereafter, the protective film 111 adhered to the other surface is removed, and then, using a peeling device (not shown), an aqueous solution of sodium hydroxide is used to remove the resist 110 on the surface on which the large holes 112 are formed. The etching-resistant layer 13 on the side where the small holes 12 were formed was peeled off. Further, by washing with water and drying, as shown in FIG.
2 and a plurality of dot-shaped apertures 14 communicating with the large apertures 112
Was formed on a sheet metal. The shadow mask according to this example had a small hole diameter of 120 μm, a small hole depth of 50 μm, and a pitch of openings of 0.25 mm.

In the above manufacturing process, the ratio of the peripheral speed of the gravure roll to the transport speed of the strip-shaped metal sheet in the etching-resistant layer forming process was changed from 1.07 to 25.2,
In each case, the hole filling property, that is, the state in which the small holes were filled with the etching resistant layer, was inspected after the etching resistant layer forming step. In addition, after the second etching, the presence or absence of occurrence of a defective hole diameter was inspected. Table 1 shows a comprehensive evaluation of the hole filling properties and the occurrence of defective hole diameters. In the table, は indicates that the filling state is good and there is no problem after the second etching, and △ indicates that one out of ten products has a defective filling at about one place and a problem occurs in the second etching. X shows the case where the filling state is incomplete and many defects are generated in the second etching.

Example 2 A shadow mask was manufactured in the same manner as in Example 1 except that the small hole diameter was set to 80 μm, the depth of the small holes was set to 40 μm, and the pitch of the openings was set to 0.20 mm. An evaluation was performed. Table 1 shows the results.

Example 3 A shadow mask was manufactured in the same manner as in Example 1 except that the size of the opening was 70 × 170 μm, the shape was rectangular, and the depth of the small hole was 40 μm. Was performed. Table 1 shows the results.

Comparative Examples 1 to 3 In the steps of forming the etching resistant layer, a conventional pipe doctor nozzle coater was used instead of the coating apparatus shown in FIGS. 1 and 2, respectively. 3
A shadow mask was manufactured in the same manner as described above, and each was comprehensively evaluated. Table 1 shows the results.

[0091]

[Table 1]

As can be seen from Table 1, when the peripheral speed of the gravure roll with respect to the traveling speed of the metal sheet is set to approximately 4 or more and 25 or less, it is possible to obtain a filling property higher than the conventional one.
In addition, it can be seen that the present invention makes it possible to easily fill a rectangular opening, which is difficult to fill with a conventional method and has a small hole diameter, which is difficult to fill, or a deep hole, which is difficult to fill.

The etching-resistant layer obtained by setting the peripheral speed of the gravure roll to the running speed of the metal sheet to be approximately 4 to 25 is uniform in thickness and film quality, and each shadow mask has excellent quality. Met. Thus, it can be understood that by using the present invention, an undesirable etching phenomenon of the small holes in the second etching step can be prevented, and a good shadow mask can be obtained.

Example 4 In the step of forming an etching-resistant layer, water-soluble casein
Instead of using an etching-resistant layer coating solution made of an acrylic resin, a UV-curable etching-resistant layer coating solution made of a solvent-free acrylate resin having a viscosity of 100 cps at 50 ° C.-acrylate monomer-photopolymerization initiator A shadow mask was manufactured in the same manner as in Example 1 except that the shadow mask was used, and each was evaluated comprehensively. Table 2 shows the results.

Example 5 The desired small hole diameter was 80 μm and the small hole depth was 40 μm.
A shadow mask was manufactured in the same manner as in Example 5, except that m and the pitch of the holes were set to 0.20 mm, and each was subjected to comprehensive evaluation. Table 2 shows the results.

Example 6 A desired opening has a small hole diameter of 70 × 170 μm and a rectangular shape.
Example 4 except that the depth of the small holes was set to 40 μm.
A shadow mask was manufactured in the same manner as described above, and each was comprehensively evaluated. Table 2 shows the results.

Example 7 The thickness of a thin metal plate was 0.22 mm, the desired small hole diameter was 130 × 450 μm, the shape was rectangular, and the small hole depth was 80 μm.
A shadow mask was manufactured in the same manner as in Example 4 except that m and the opening pitch were set to 0.65 mm, and each was subjected to comprehensive evaluation. Table 2 shows the results.

Example 8 In the etching resistant layer forming step, the apparatus shown in FIG. 4 was used, the thickness of the metal sheet was 0.25 mm, the desired small hole diameter was 130 × 550 μm, the shape was rectangular, and the small hole was small. A shadow mask was manufactured in the same manner as in Example 4 except that the depth was set to 100 μm and the pitch of the openings was set to 0.60 mm, and each was subjected to comprehensive evaluation. Table 2 shows the results.

Comparative Examples 4 to 8 A shadow mask was manufactured in the same manner as in Examples 4 to 8 except that a conventional pipe doctor nozzle coater was used in the etching resistant layer forming step, and a comprehensive evaluation was performed. Table 2 shows the results.

[0100]

[Table 2]

Example 9 In the step of forming an etching resistant layer, the resist 10 on the 12 side after the etching was left on the surface of the metal thin plate 7, and the coating apparatus was changed to the one-stage arrangement apparatus shown in FIGS.
A single-stage arrangement device with an auxiliary roll shown in FIG. 4, a two-stage arrangement device of an apparatus without a blade and an apparatus with a blade shown in FIG.
A shadow mask was manufactured in the same manner as in Example 4, except that the apparatus was changed to a two-stage arrangement apparatus having a blade shown in FIG. The thickness of the etching-resistant layer was 30 μm to 40 μm in the case of a single-stage arrangement, and was 15 μm to 20 μm in the case of a two-stage arrangement and a roll.

A comprehensive evaluation was made for each shadow mask. Table 3 shows the obtained results.

[0103]

[Table 3]

As shown in Table 3, even in the case of coating and filling before peeling of the resist pattern, which was difficult to fill by the conventional method for forming an etching resistant layer, it was possible to use the apparatus for coating an etching resistant layer of the present invention to run a thin metal body. It can be seen that if the peripheral speed of the gravure roll with respect to the speed is appropriately selected, coating and filling can be performed. Further, since the resist pattern does not need to be removed in advance, the entire process can be simplified.

Although a good coating state was obtained at a speed ratio of about 10 or more even in a single-stage arrangement, there is a problem that the film thickness is large.

[0106]

According to the present invention, a small-diameter gravure roll rotated in a direction opposite to the transport direction of a thin metal sheet at a high speed of 4 to 25 times the transport speed of the thin metal sheet is used. By applying the coating solution for the etching layer, the coating solution for the etching-resistant layer can be easily filled in the concave portions of the uneven substrate such as the small hole concave portions of the shadow mask.

In the etching resistant layer obtained by using the present invention, a uniform etching resistant layer can be obtained, especially with a small amount of bubbles remaining in the concave portions. As a result, the undesirable etching phenomenon of the small holes in the second-stage etching process is prevented,
An excellent quality shadow mask can be obtained.

[Brief description of the drawings]

FIG. 1 is a schematic diagram illustrating an example of an etching-resistant layer coating apparatus according to the present invention.

FIG. 2 is a schematic diagram showing a supply system for supplying an etching-resistant layer coating solution to the apparatus shown in FIG.

FIG. 3 is a schematic view showing another example of the etching-resistant layer coating apparatus according to the present invention.

FIG. 4 is a schematic view showing still another example of the etching-resistant layer coating apparatus according to the present invention.

FIG. 5 is a schematic view showing still another example of the etching-resistant layer coating apparatus according to the present invention.

FIG. 6 is a schematic view showing still another example of the etching-resistant layer coating apparatus according to the present invention.

FIG. 7 is a schematic diagram illustrating a configuration example of a color picture tube using a shadow mask obtained according to the present invention.

FIG. 8 is a view for explaining a method of manufacturing a shadow mask according to the present invention.

FIG. 9 is a view for explaining a method of manufacturing a shadow mask according to the present invention.

FIG. 10 is a view for explaining a method of manufacturing a shadow mask according to the present invention.

FIG. 11 is a view for explaining a method of manufacturing a shadow mask according to the present invention.

FIG. 12 is a view for explaining a method of manufacturing a shadow mask according to the present invention.

FIG. 13 is a view for explaining the shadow mask manufacturing method of the present invention.

FIG. 14 is a diagram illustrating a method of manufacturing a shadow mask according to the present invention.

FIG. 15 is a view for explaining a method of manufacturing a shadow mask according to the present invention.

FIG. 16 is a view for explaining a method of manufacturing a shadow mask of the present invention.

Claims (16)

[Claims] 1. A strip-shaped thin metal plate having a first main surface on which a plurality of recesses are formed by etching and a second main surface on which a resist layer having a plurality of openings is formed, wherein the first main surface is It is arranged on the lower side, and has a diameter of about 2 below the first main surface.
A gravure roll of 0 mm to about 60 mm, a member for supplying an etching-resistant layer coating liquid on the gravure roll, and an etching-resistant layer coating apparatus having a doctor blade provided on the gravure roll; While rotating the gravure roll at a peripheral speed of 4 to 25 times the transport speed of the strip-shaped metal sheet in a direction opposite to the transport direction of the strip-shaped metal sheet while transporting the first main surface substantially horizontally. While keeping the position on the second main surface opposite to the position on the first main surface contacted with the gravure roll in a free state, Supplying to the gravure roll, scraping off the excess etch-resistant layer coating solution on the gravure roll with the doctor blade, and then applying the solution on the first main surface to form an etch-resistant layer; and Said second subjected principal surface etching method of a shadow mask comprising a step of forming an opening leading into the recess from the main surface of the second. 2. The method according to claim 1, wherein an auxiliary roll is further provided at a stage subsequent to the position on the second main surface. 3. The method according to claim 1, wherein the etching-resistant layer coating liquid is substantially composed of a UV-curable resin. 4. The method according to claim 1, wherein a first etching resist layer having a plurality of openings on the first main surface and a second etching resist layer having a plurality of openings on the second main surface are formed. The method according to claim 1, wherein the concave portion is formed by providing a strip-shaped metal sheet and subjecting the first main surface to etching. 5. The method according to claim 4, wherein the etching-resistant layer coating solution is applied before removing the first etching resist layer. 6. A strip-shaped metal sheet having a first main surface on which a plurality of recesses are formed by etching and a second main surface on which a resist layer having a plurality of openings is formed, is provided.
Providing a first etching-resistant layer coating device on the main surface of, and supplying an etching-resistant layer coating solution in advance; disposing the first main surface on the lower side; A gravure roll of about 20 mm to about 60 mm, a member for supplying an etching-resistant layer coating solution on the gravure roll, and a second etching-resistant layer coating apparatus having a doctor blade provided on the gravure roll, The gravure roll is rotated at a peripheral speed of 4 to 25 times the transport speed of the strip-shaped metal sheet in a direction opposite to the transport direction of the strip-shaped metal sheet while transporting the strip-shaped metal sheet substantially horizontally. 1 while contacting the gravure roll with the gravure roll and keeping the position on the second main surface opposite to the position on the first main surface in contact with the gravure roll. Supply the coating liquid to the gravure roll Then, after the doctor blade scrapes off the excess etching-resistant layer coating solution on the gravure roll, it is applied to the first main surface, and the thickness of the layer of the coating solution supplied in advance is regulated. Forming an etching-resistant layer by etching, and subjecting the second main surface to etching to form an opening extending from the second main surface to the concave portion. 7. The first etching-resistant layer coating device,
A gravure roll having a diameter of about 20 mm to about 60 mm; and an etching-resistant coating liquid supply member for supplying an etching-resistant coating liquid onto the gravure roll. While transferring the thin plate almost horizontally, the gravure roll is rotated in a direction opposite to the transfer direction of the strip-shaped metal thin plate to make contact with the first main surface, and the gravure roll is brought into contact with the first main plate. 7. The method according to claim 6, further comprising: applying to the first main surface and supplying an etching-resistant coating solution while maintaining a position on the second main surface opposite to the position on the surface in a free state. The described method. 8. A doctor blade is further provided on the gravure roll of the first etching-resistant layer coating device, and the etching-resistant layer coating solution is supplied to the gravure roll, and the doctor blade causes an excessive etching resistance. The method according to claim 7, comprising supplying the first coating surface after the layer coating solution is scraped off. 9. The method according to claim 8, wherein a peripheral speed of the gravure roll of the first etching-resistant layer coating device is a peripheral speed of 4 to 25 times a transport speed of the strip-shaped metal sheet. 10. The method according to claim 6, wherein the first etching-resistant layer applying device includes a slit nozzle. 11. A shadow mask resist comprising: a gravure roll having a diameter of about 20 mm to about 60 mm; a member for supplying an etching-resistant coating solution on the gravure roll; and a doctor blade provided on the gravure roll. A layer coating apparatus, comprising: a first main surface on which a plurality of recesses are formed by etching; and a second main surface on which a resist layer having a plurality of openings is formed. The gravure roll is disposed on the first main surface side with respect to the strip-shaped metal sheet conveyed substantially horizontally, and the gravure roll is rotated at a peripheral speed of 4 to 25 times the conveyance speed of the strip-shaped metal sheet. Rotating the strip-shaped metal sheet in a direction opposite to the conveying direction to contact the first main surface, and contacting the gravure roll with a second side opposite to the position on the first main surface contacted with the gravure roll. Free position on main surface Keeping while the resistant etching layer coating solution was supplied to the gravure roll, by the doctor blade, after scraping the excess etching resistant layer coating liquid on the gravure roll,
An etching-resistant layer coating apparatus for a shadow mask, which is applied to the first main surface to form an etching-resistant layer. 12. The apparatus according to claim 11, further comprising an auxiliary roll subsequent to a position on the second main surface. 13. A first etching-resistant layer coating apparatus, a gravure roll having a diameter of about 20 mm to about 60 mm, which is located at a subsequent stage of the first etching-resistant layer coating apparatus, and an etching-resistant layer coating on the gravure roll. An etching-resistant layer applying apparatus for a shadow mask, comprising: a member for supplying a liquid; and a second etching-resistant layer applying apparatus having a doctor blade provided on the gravure roll, wherein the second etching-resistant layer is provided. The layer coating apparatus includes a first main surface on which a plurality of concave portions are formed by etching and a second main surface on which a resist layer having a plurality of openings is formed. The gravure roll is disposed on the first main surface side with respect to the strip-shaped metal sheet conveyed substantially horizontally, and the gravure roll is rotated four to 25 times the conveyance speed of the strip-shaped metal sheet. Then, the belt-shaped metal sheet is rotated in a direction opposite to the conveying direction to make contact with the first main surface, and a second side opposite to the position on the first main surface with which the gravure roll is contacted. While maintaining the position on the main surface of the gravure roll in a free state, the etching-resistant layer coating solution was supplied to the gravure roll, and the excess etching-resistant layer coating solution on the gravure roll was scraped off by the doctor blade. rear,
The thickness of the coating layer of the etching resistant coating solution applied to the first main surface and applied by the first etching resistant layer applying apparatus is further regulated by a second etching resistant layer applying apparatus. An etching-resistant layer coating device for a shadow mask that forms an etching layer. 14. The first etching-resistant layer coating device is arranged on the first main surface side with respect to a substantially horizontally conveyed strip-shaped metal sheet arranged with the first main surface facing downward. A gravure roll having a diameter of about 20 mm to about 60 mm, an etching-resistant layer coating liquid supply member for supplying an etching-resistant layer coating liquid on the gravure roll, and a first gravure roll provided on the first gravure roll. 14. The device according to claim 13, comprising a doctor blade. 15. The apparatus according to claim 14, wherein the peripheral speed of the gravure roll of the first etching-resistant layer coating device is 4 to 25 times the transport speed of the strip-shaped metal sheet. 16. The apparatus according to claim 13, wherein said first etching coating apparatus comprises a slit nozzle.