JPH10153510A - Vacuum apparatus and diaphragm vacuum gauge - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the invasion of particles and prevent accuracy deterioration of a diaphragm vacuum gauge, by connecting a vacuum chamber and the diaphragm vacuum gauge via a filter. SOLUTION: A diaphragm vacuum gauge 2 confirms that the interior of a vacuum chamber 1 is evacuated to a predetermined degree of vacuum by a vacuum pump. A wafer on a heater in the vacuum chamber 1 is heated to a predetermined temperature. After the wafer is heated to the predetermined temperature, a reaction gas is supplied, thereby adhering a deposit onto the wafer. When a filter 3 covering a communication hole 2a is driven without being heated by the heater 4, a product not yet reacting and a side reaction product which sublimate or dissolve by the heating come in touch with and adhere to the filter 3. Therefore, the product not yet reacting and the side reaction product passing through the filter 3 to adhere to the communication hole 2a and diaphragm vacuum gauge 2 are reduced. Particles which do not sublimate or dissolve by the heating also come in touch with and adhere to the filter 3. Accordingly, the diaphragm vacuum gauge 2 is prevented from being deteriorated in accuracy.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a diaphragm gauge for measuring the degree of vacuum of a vacuum device and a vacuum device provided with the diaphragm gauge.

[0002]

2. Description of the Related Art Diaphragm gauges are widely used to measure the degree of vacuum in vacuum equipment. In the case of a vacuum apparatus for CVD or ion etching, a large amount of reaction products, unreacted products, and by-products are generated in a vacuum chamber of the vacuum device. These adhere to the vacuum chamber and eventually become a source of particles on the wafer. These products also adhere to the gas contact inside the diaphragm gauge that communicates with the vacuum chamber.

[0003] If these adults adhere to the diaphragm inside the diaphragm gauge, the accuracy of the diaphragm gauge is deteriorated, causing an error, and the diaphragm gauge needs to be replaced early.

[0004] It is known that many of these unreacted products and by-products are generally not easily fixed when heated to 100 ° C or higher. It is also known that once adhered, they are decomposed or sublimated and detached. In order to solve this problem, there is a diaphragm vacuum gauge provided with a built-in heater for heating all gas contact parts including the diaphragm to a predetermined temperature or higher.

[0005]

However, unreacted products that do not decompose or sublime even when heated to a predetermined temperature,
There are particles of by-products and by-products,
Of these, those that entered the vacuum gauge could not be removed. This hastened the deterioration of the accuracy of the diaphragm gauge.

[0006]

SUMMARY OF THE INVENTION The present invention has been proposed to solve the above-mentioned problems. In a vacuum apparatus in which a vacuum gauge having a heater for heating a diaphragm is connected to a vacuum chamber, a vacuum chamber and a diaphragm vacuum are provided. A vacuum device is provided, wherein the vacuum device is connected to a meter via a filter. This prevents particles from entering the vacuum gauge from the vacuum chamber and prevents the accuracy of the vacuum gauge from deteriorating.

In addition, there is provided a vacuum apparatus in which a filter heating heater is provided on a filter. As a result, unreacted products and by-products that can be decomposed or sublimated and adhere to the filter can be removed by heating.

In addition, there is provided a vacuum apparatus in which filters are exchangeably disposed. Thus, when the filter is clogged with particles that are not decomposed or sublimated by heating, the diaphragm gauge can be continuously used by replacing the filter.

In addition, the present invention provides a diaphragm gauge in which a filter is provided in a communication part of the diaphragm gauge with a vacuum chamber, a filter heating heater is provided in the filter, and a filter is replaceably provided. Or you may.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIG.

In FIG. 1, reference numeral 1 denotes a vacuum chamber of a CVD apparatus, 2 denotes a diaphragm gauge having a communication hole 2a communicating with the vacuum chamber 1 and a diaphragm 2b provided with a heater 2c, and 3 denotes a tip of the communication hole 2a. The filters 4 and 4 are heaters for heating the filter 3 wound around the filter 3.

The operation status will be described below together with the structure.

Evacuation is performed by a vacuum pump (not shown),
After confirming with the diaphragm vacuum gauge 2 that the inside of the vacuum chamber 1 of the D apparatus has reached a predetermined vacuum, the wafer (not shown) mounted on the heater (not shown) in the vacuum chamber 1 is removed by a predetermined amount. Heat to temperature. When the temperature of the wafer reaches a predetermined temperature, a reaction gas is supplied to deposit a precipitate on the heated wafer. At this time, a small amount of reaction precipitate also adheres to places other than on the wafer. This reaction precipitate may be scattered as particles. Unreacted products and by-products also adhere. These deposits also occur in the vacuum chamber 1, the diaphragm gauge 2, which is in contact with the gas, and the communication holes 2a and the filter 3, which communicate these. Further, the deposit once adhered to the wafer may be peeled off, scattered, and adhered to another place.

When the filter 3 covered with the communication hole 2a is operated without being heated by the heater 4, unreacted products and sub-reacted products sublimated or decomposed by heating come into contact with the filter 3 and adhere thereto. The amount of unreacted products and side-reacted products that pass through the filter 3 and adhere to the communication hole 2a and the diaphragm vacuum gauge 2 is significantly reduced. Particles that do not sublimate or decompose due to heating of reaction products and the like in the vacuum chamber 1 also adhere to the filter 3,
Through the communication hole 2a and adhere to the diaphragm vacuum gauge 2 very little. At this time, particles sublimated or decomposed by heating also adhere to the filter 3, so that the filter 3 is clogged and fine particles also adhere. When the clogging of the filter 3 increases, the filter 3 is heated by the heater 4 to remove particles which sublime or decompose by heating when the CVD growth is not performed.

By heating the diaphragm 2b with the heater 2c of the diaphragm vacuum gauge 2 during operation of the CVD apparatus, the substance which sublimates or decomposes due to the heating does not adhere to the diaphragm 2b of the diaphragm vacuum gauge 2; It does not affect accuracy. On the other hand, particles of a substance that does not sublimate or decompose due to heating are affected. However, due to the filter 3,
Most of the heating removes particles of substances that do not sublime or decompose, thus reducing the effects of the particles.

On the other hand, when the filter 3 is heated by the heater 4 during operation, substances which can be sublimated or decomposed by heating pass without adhering to the filter 3 and only particles which cannot be sublimated or decomposed by heating are filtered. Adheres to Further, since the diaphragm 2b is also heated by the heater 2c, substances that can be sublimated or decomposed by heating do not affect the accuracy of the diaphragm vacuum gauge 2, but only particles that cannot be sublimated or decomposed by heating are affected. give. At this time, the substance that can be sublimated or decomposed by heating passes without adhering to the filter 3, so that clogging of the filter is small. Therefore, particles that cannot be sublimated or decomposed by more heating adhere to the diaphragm 2b. For this reason, when compared with the case where the filter 3 is not heated during operation, the influence on the accuracy of the diaphragm gauge 2 appears earlier.

These phenomena can be effectively achieved not only in a CVD apparatus but also in a wide range of vacuum apparatuses such as an ion etching apparatus.

When the diaphragm gauge 2 is incorporated in a vacuum device, the communication hole 2a may be covered with a filter 3, or a heater 4 may be provided in the filter 3. In addition, the communication hole 2a
May be treated as a diaphragm gauge 2 in which a heater 4 is disposed on the filter 3. Glass fiber is widely used for the filter 3, and there is no influence such as melting at 100 ° C. heating required for sublimation or decomposition.

Further, by making the filter 3 replaceable, even if the filter 3 is clogged, it is possible to prevent the influence on the accuracy of the diaphragm gauge 2 for a long time by replacing the filter 3. it can.

It is necessary to select and manage the filter 3 so that the filter 3 itself or the filter 3 is not clogged and the response of the diaphragm gauge 2 to the degree of vacuum is not delayed.

[0021]

According to the present invention, by covering the communication hole between the vacuum chamber and the diaphragm gauge with a filter, unreacted products, by-products and particles are prevented from entering the gauge, thereby deteriorating the accuracy of the gauge. Disappears. Further, the deterioration of accuracy can be delayed.

[Brief description of the drawings]

FIG. 1 is a sectional view of a main part of a vacuum apparatus of the present invention.

[Explanation of symbols]

 Reference Signs List 1 vacuum chamber 2 diaphragm vacuum gauge 2b diaphragm 2c heater 3 filter

Claims (6)

[Claims] 1. A vacuum apparatus, wherein a vacuum gauge having a heater for heating a diaphragm is connected to a vacuum chamber, wherein the vacuum chamber and the diaphragm gauge are connected via a filter. 2. The vacuum apparatus according to claim 1, wherein a heater for heating the filter is provided on the filter. 3. The vacuum apparatus according to claim 1, wherein the filter is replaceably disposed. 4. A diaphragm gauge in which a filter is provided in a communication part with a vacuum chamber. 5. A diaphragm vacuum gauge according to claim 4, wherein a heater for heating the filter is provided on said filter. 6. The diaphragm vacuum gauge according to claim 4, wherein said filter is replaceably disposed.