JPH10135353A5 - - Google Patents

Info

Publication number
JPH10135353A5
JPH10135353A5 JP1996308685A JP30868596A JPH10135353A5 JP H10135353 A5 JPH10135353 A5 JP H10135353A5 JP 1996308685 A JP1996308685 A JP 1996308685A JP 30868596 A JP30868596 A JP 30868596A JP H10135353 A5 JPH10135353 A5 JP H10135353A5
Authority
JP
Japan
Prior art keywords
active layer
channel
region
thin film
film transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996308685A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10135353A (ja
JP3886577B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP30868596A priority Critical patent/JP3886577B2/ja
Priority claimed from JP30868596A external-priority patent/JP3886577B2/ja
Priority to US08/963,977 priority patent/US6118148A/en
Publication of JPH10135353A publication Critical patent/JPH10135353A/ja
Priority to US09/546,637 priority patent/US6251733B1/en
Priority to US09/875,407 priority patent/US6690075B2/en
Publication of JPH10135353A5 publication Critical patent/JPH10135353A5/ja
Application granted granted Critical
Publication of JP3886577B2 publication Critical patent/JP3886577B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP30868596A 1996-11-04 1996-11-04 半導体装置およびその作製方法 Expired - Fee Related JP3886577B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP30868596A JP3886577B2 (ja) 1996-11-04 1996-11-04 半導体装置およびその作製方法
US08/963,977 US6118148A (en) 1996-11-04 1997-11-04 Semiconductor device and manufacturing method thereof
US09/546,637 US6251733B1 (en) 1996-11-04 2000-04-07 Semiconductor device and manufacturing method thereof
US09/875,407 US6690075B2 (en) 1996-11-04 2001-06-04 Semiconductor device with channel having plural impurity regions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30868596A JP3886577B2 (ja) 1996-11-04 1996-11-04 半導体装置およびその作製方法

Publications (3)

Publication Number Publication Date
JPH10135353A JPH10135353A (ja) 1998-05-22
JPH10135353A5 true JPH10135353A5 (cg-RX-API-DMAC10.html) 2004-11-04
JP3886577B2 JP3886577B2 (ja) 2007-02-28

Family

ID=17984060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30868596A Expired - Fee Related JP3886577B2 (ja) 1996-11-04 1996-11-04 半導体装置およびその作製方法

Country Status (1)

Country Link
JP (1) JP3886577B2 (cg-RX-API-DMAC10.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN121335129A (zh) * 2024-07-09 2026-01-13 广东省大湾区集成电路与系统应用研究院 一种半导体器件的制造方法

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