JPH10115925A5 - - Google Patents

Info

Publication number
JPH10115925A5
JPH10115925A5 JP1997200017A JP20001797A JPH10115925A5 JP H10115925 A5 JPH10115925 A5 JP H10115925A5 JP 1997200017 A JP1997200017 A JP 1997200017A JP 20001797 A JP20001797 A JP 20001797A JP H10115925 A5 JPH10115925 A5 JP H10115925A5
Authority
JP
Japan
Prior art keywords
group
methacrylate
acrylate
tricyclo
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997200017A
Other languages
English (en)
Japanese (ja)
Other versions
JP3865474B2 (ja
JPH10115925A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP20001797A priority Critical patent/JP3865474B2/ja
Priority claimed from JP20001797A external-priority patent/JP3865474B2/ja
Publication of JPH10115925A publication Critical patent/JPH10115925A/ja
Publication of JPH10115925A5 publication Critical patent/JPH10115925A5/ja
Application granted granted Critical
Publication of JP3865474B2 publication Critical patent/JP3865474B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP20001797A 1996-08-20 1997-07-25 ポジ型レジスト組成物 Expired - Fee Related JP3865474B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20001797A JP3865474B2 (ja) 1996-08-20 1997-07-25 ポジ型レジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8-218803 1996-08-20
JP21880396 1996-08-20
JP20001797A JP3865474B2 (ja) 1996-08-20 1997-07-25 ポジ型レジスト組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2004171742A Division JP3932195B2 (ja) 1996-08-20 2004-06-09 ２‐ヒドロキシ‐３‐ピナノンのアクリレート又はメタクリレートの共重合体

Publications (3)

Publication Number Publication Date
JPH10115925A JPH10115925A (ja) 1998-05-06
JPH10115925A5 true JPH10115925A5 (enExample) 2004-10-21
JP3865474B2 JP3865474B2 (ja) 2007-01-10

Family

ID=26511910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20001797A Expired - Fee Related JP3865474B2 (ja) 1996-08-20 1997-07-25 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP3865474B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3856270B2 (ja) * 1998-09-24 2006-12-13 富士フイルムホールディングス株式会社 ポジ型レジスト組成物
US6303266B1 (en) 1998-09-24 2001-10-16 Kabushiki Kaisha Toshiba Resin useful for resist, resist composition and pattern forming process using the same
KR100520181B1 (ko) * 1999-10-11 2005-10-10 주식회사 하이닉스반도체 신규한 포토레지스트 단량체, 그의 중합체 및 이를 함유하는 포토레지스트 조성물
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
JP4841823B2 (ja) * 2004-10-04 2011-12-21 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法

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