JPH10107079A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH10107079A
JPH10107079A JP8260472A JP26047296A JPH10107079A JP H10107079 A JPH10107079 A JP H10107079A JP 8260472 A JP8260472 A JP 8260472A JP 26047296 A JP26047296 A JP 26047296A JP H10107079 A JPH10107079 A JP H10107079A
Authority
JP
Japan
Prior art keywords
solder
wiring board
semiconductor chip
semiconductor device
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8260472A
Other languages
Japanese (ja)
Inventor
Atsushi Komura
敦 小村
Shuichi Ishiwata
修一 石綿
Tsutomu Ohara
務 大原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP8260472A priority Critical patent/JPH10107079A/en
Publication of JPH10107079A publication Critical patent/JPH10107079A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/1012Auxiliary members for bump connectors, e.g. spacers
    • H01L2224/10152Auxiliary members for bump connectors, e.g. spacers being formed on an item to be connected not being a semiconductor or solid-state body
    • H01L2224/10175Flow barriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/38Effects and problems related to the device integration
    • H01L2924/384Bump effects
    • H01L2924/3841Solder bridging

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent solders from flowing out to the outside even if the solders are fused by a method wherein a sealing resin is injected between a semiconductor chip and a wiring board in such a way as to cover solder dams, which are formed of a solder resist on the wiring board. SOLUTION: The electrical connection of electrodes 5 on a semiconductor chip 4 with mounting pads 2 on a wiring board 1 is made by a method wherein solder bumps formed on the chip 4 are fused at the time of the connection and are connected with the pads 2. An outflow of solders 10 to a conductor pattern is inhibited by solder dams 3 formed on the board 1. A sealing resin 11 is injected between the chip 4 and the board 1 in such a way as to cover all of the solder dams 3 formed on the board 1. The resin 11 is used for the object of raising the reliability of connection of the connection parts of the electrodes 5 with the pass 2, a moisture resistance to circuits formed on the chip 4 and the board 1 and the like.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は半導体チップと配線
基板との接続構造に係わり、とくに半導体チップと配線
基板との接続にハンダを使ったフリップチップ実装を用
いて半導体チップの電極と配線基板の実装パッドとの接
続を行う半導体装置の構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a connection structure between a semiconductor chip and a wiring board, and more particularly, to the connection between the semiconductor chip and the wiring board by flip-chip mounting using solder to connect the electrodes of the semiconductor chip to the wiring board. The present invention relates to a structure of a semiconductor device for connecting to a mounting pad.

【0002】[0002]

【従来の技術】半導体チップと配線基板との接続にハン
ダバンプを使ったフリップチップ実装の従来技術として
たとえば特開平5−74858号公報が挙げられる。
2. Description of the Related Art For example, Japanese Patent Application Laid-Open No. Hei 5-74858 discloses a flip chip mounting technique using solder bumps for connecting a semiconductor chip to a wiring board.

【0003】従来技術のハンダバンプを使ったフリップ
チップ実装を用いた半導体装置の構造について図7〜図
9を用いて説明する。図7は配線基板を半導体チップ搭
載側から見た平面図である。
A structure of a conventional semiconductor device using flip chip mounting using solder bumps will be described with reference to FIGS. FIG. 7 is a plan view of the wiring board as viewed from the semiconductor chip mounting side.

【0004】配線基板12上に形成された実装パッド部
16は実装パッド13とこの実装パッド13につながる
導体パターン14とを有する。ここで導体パターン14
の一部には、他の導体パターン14よりもパターン幅を
細く形成したくびれ部15がある。このくびれ部15は
実装パッド13にハンダ接続されたハンダをこのくびれ
部15において導体パターン14への流れ出しを阻止す
ることを目的に作られている。
The mounting pad section 16 formed on the wiring board 12 has a mounting pad 13 and a conductor pattern 14 connected to the mounting pad 13. Here, the conductor pattern 14
Has a constricted portion 15 having a smaller pattern width than the other conductor patterns 14. The constricted portion 15 is formed for the purpose of preventing the solder connected to the mounting pad 13 from flowing out to the conductor pattern 14 at the constricted portion 15.

【0005】図8は半導体チップの断面図である。半導
体チップ17は電極18以外は窒化シリコン(SiN)
の絶縁膜19で覆われ、外部とは電気的に絶縁されてい
る。半導体チップ17の電極18上に蒸着法やスパッタ
リング法を用いてバリアメタル層20を形成し、バリア
メタル層20の上にハンダをメッキ法やマスク蒸着法を
用いてを堆積させ、その後ハンダの融点より高い温度で
加熱し、ハンダバンプ21を形成する。半導体チップ1
7には配線基板12の実装パッド13と対応する位置に
ハンダバンプ21を形成している。
FIG. 8 is a sectional view of a semiconductor chip. The semiconductor chip 17 is made of silicon nitride (SiN) except for the electrodes 18.
And is electrically insulated from the outside. A barrier metal layer 20 is formed on the electrode 18 of the semiconductor chip 17 using an evaporation method or a sputtering method, and solder is deposited on the barrier metal layer 20 using a plating method or a mask evaporation method. The solder bump 21 is formed by heating at a higher temperature. Semiconductor chip 1
In FIG. 7, solder bumps 21 are formed at positions corresponding to the mounting pads 13 of the wiring board 12.

【0006】図9は半導体装置の従来構造の断面図であ
る。半導体チップ17に形成したハンダバンプ21を溶
融して、配線基板12上の実装パッド13との接続を行
っている。接続の際、溶融したハンダは実装パッド部1
6上に濡れ広がる。封止樹脂24は半導体チップ17と
配線基板12との間に注入している。
FIG. 9 is a sectional view of a conventional structure of a semiconductor device. The solder bumps 21 formed on the semiconductor chip 17 are melted and connected to the mounting pads 13 on the wiring board 12. At the time of connection, the molten solder is
Spread wet on 6. The sealing resin 24 is injected between the semiconductor chip 17 and the wiring board 12.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、上述し
た半導体装置はハンダを溶融して接続を行う際、ハンダ
が実装パッドから導体パターンへ流れ出してしまう。こ
れはくびれ部を形成してもハンダの流れ出しを抑えるこ
とはかなり難しい。それに加えて半導体装置に半導体チ
ップと他の部品とを混載したり、半導体チップ以外の部
品のリペアーを行う際、そのたびに半導体チップのハン
ダは融点以上の環境下に置かれるので、図12のように
溶融したハンダが導体パターンを伝わって封止樹脂で覆
った部分より外部に流れ出してしまう。そして最悪の場
合、接続していたハンダ内部に空洞部分を作ってしま
い、半導体チップと配線基板との接続不良が発生する。
However, when the above-described semiconductor device is connected by melting the solder, the solder flows from the mounting pad to the conductor pattern. This makes it very difficult to suppress the flow of solder even if a constricted portion is formed. In addition, when a semiconductor device is mixed with a semiconductor chip and other components, or when a component other than the semiconductor chip is repaired, the solder of the semiconductor chip is placed in an environment at or above the melting point each time. The molten solder flows along the conductor pattern and flows out from the portion covered with the sealing resin. In the worst case, a cavity is formed in the connected solder, and a connection failure between the semiconductor chip and the wiring board occurs.

【0008】本発明の目的は、上記の課題を解決して、
配線基板上の導体パターンへのハンダの流れ出しを抑制
し、半導体装置をハンダの融点よりも高い温度環境にさ
らされても、半導体チップと配線基板との接続不良が発
生しない半導体装置を提供することにある。
[0008] An object of the present invention is to solve the above problems,
Provided is a semiconductor device which suppresses the flow of solder to a conductor pattern on a wiring board and does not cause a connection failure between the semiconductor chip and the wiring board even when the semiconductor device is exposed to a temperature environment higher than the melting point of the solder. It is in.

【0009】[0009]

【課題を解決するための手段】前述した目的を達成する
ために、本発明の半導体装置は、電極上に配線基板との
電気的な接続を行うためのハンダバンプを有する半導体
チップと、半導体チップの電極の配置に対応する位置に
配した実装パッドの周辺にソルダーレジストでソルダー
ダムを形成した配線基板と、半導体チップと配線基板と
の間に注入するための封止樹脂とを有し、封止樹脂は半
導体チップと配線基板との間および配線基板上にソルダ
ーレジストで形成したソルダーダムを覆うように注入す
ることを特徴とする。
In order to achieve the above-mentioned object, a semiconductor device according to the present invention comprises a semiconductor chip having solder bumps on an electrode for making electrical connection with a wiring board; A wiring board in which a solder dam is formed with a solder resist around a mounting pad arranged at a position corresponding to the electrode arrangement, and a sealing resin for injecting between the semiconductor chip and the wiring board; Is injected so as to cover a solder dam formed between the semiconductor chip and the wiring board and on the wiring board with a solder resist.

【0010】本発明の半導体装置においては、配線基板
上に形成した実装パッドの周辺にソルダーレジストで形
成したソルダーダムを備えていることと、封止樹脂を半
導体チップと配線基板との間および配線基板上に形成し
たソルダーダムを覆うように注入することで、接続時の
ハンダの形状が維持できる。よって半導体装置完成後に
ハンダが溶融する環境下に置かれても、溶融したハンダ
を導電パターンへ濡れ出したことによる半導体チップと
配線基板との接続不良を防止できる。
In the semiconductor device of the present invention, a solder dam formed of a solder resist is provided around a mounting pad formed on the wiring board, and a sealing resin is provided between the semiconductor chip and the wiring board and between the semiconductor chip and the wiring board. By injecting so as to cover the solder dam formed above, the shape of the solder at the time of connection can be maintained. Therefore, even if the semiconductor device is placed in an environment where the solder melts after completion, the connection failure between the semiconductor chip and the wiring board due to the molten solder wetting into the conductive pattern can be prevented.

【0011】[0011]

【発明の実施の形態】以下、図面を用いて本発明の半導
体装置を実施するための最良の実施形態における半導体
装置の構成の説明を行う。図1は本発明の半導体装置を
示す断面図である。この半導体装置は半導体チップ4と
配線基板1および半導体チップ4と配線基板1との間に
注入する封止樹脂11で構成している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The configuration of a semiconductor device according to a preferred embodiment for implementing the semiconductor device of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view showing a semiconductor device of the present invention. This semiconductor device comprises a semiconductor chip 4 and a wiring board 1 and a sealing resin 11 injected between the semiconductor chip 4 and the wiring board 1.

【0012】図2は本発明に用いた配線基板を半導体チ
ップ搭載側から見た平面図、図3は配線基板の断面図で
ある。配線基板1は、サブトラクティブ法を用いて実装
パッド2と導体パターン(図中に記載無し)とを形成す
る。実装パッド2の位置は、半導体チップ4に形成され
ているの電極5の配置に対応するように形成する。
FIG. 2 is a plan view of the wiring board used in the present invention as viewed from the semiconductor chip mounting side, and FIG. 3 is a sectional view of the wiring board. The wiring board 1 forms a mounting pad 2 and a conductor pattern (not shown in the drawing) using a subtractive method. The position of the mounting pad 2 is formed so as to correspond to the arrangement of the electrode 5 formed on the semiconductor chip 4.

【0013】ソルダーダム3は紫外線硬化型液状フォト
ソルダーレジストを配線基板1全面にスクリーン印刷法
で塗布し、実装パッド2周辺部のみのパターンが露出す
るように作製したパターンマスクを配線基板1上にあ
て、紫外線露光し、現像を行い実装パターン2を露出
し、実装パッド2に隣接するように残した液状フォトソ
ルダーレジストでソルダーダム3を形成する。
The solder dam 3 is formed by applying an ultraviolet-curable liquid photo solder resist to the entire surface of the wiring substrate 1 by screen printing, and applying a pattern mask formed so that only the peripheral portion of the mounting pad 2 is exposed on the wiring substrate 1. Then, the solder pattern 3 is formed by exposing the mounting pattern 2 by exposing to ultraviolet rays and developing, and leaving the liquid photo solder resist adjacent to the mounting pad 2.

【0014】ソルダーダム3の幅Lの寸法は半導体チッ
プ4に形成するハンダバンプ8の直径と同寸法から直径
の2倍の寸法以内の幅にする。実装パッド2の形状は図
1のような円形の他に正方形や長方形等でも良い。これ
は配線基板12上のパターンの引き回しによって使い分
ければ構わない。ただし、すべての実装パッド2の面積
は、同じ面積にする必要がある。
The size of the width L of the solder dam 3 is the same as the diameter of the solder bump 8 formed on the semiconductor chip 4 and is within a range of twice the diameter. The shape of the mounting pad 2 may be square, rectangular, or the like in addition to the circular shape as shown in FIG. This may be properly used depending on the layout of the pattern on the wiring board 12. However, the area of all the mounting pads 2 needs to be the same.

【0015】実装パッド2の表面は半導体チップ実装時
にハンダの濡れ性を良好にするために、無電解Ni/A
uメッキを施している。
The surface of the mounting pad 2 is made of electroless Ni / A to improve solder wettability when mounting a semiconductor chip.
u-plated.

【0016】図4は半導体チップの断面図である。半導
体チップ4は電極5以外を窒化シリコン(SiN)など
の絶縁性被膜である絶縁膜6で覆われ外部とは電気的に
絶縁されている。半導体チップ4の電極5上に蒸着法や
スパッタリング法等を用いてバリアメタル層7を形成
し、バリアメタル層7の上にハンダをメッキ法やマスク
真空蒸着法を用いて形成し、その後ハンダの融点より高
い温度で加熱し、ハンダバンプ8を形成する。このバン
プのハンダは共晶ハンダである。
FIG. 4 is a sectional view of a semiconductor chip. The semiconductor chip 4 is covered with an insulating film 6, which is an insulating film such as silicon nitride (SiN), except for the electrodes 5, and is electrically insulated from the outside. A barrier metal layer 7 is formed on the electrode 5 of the semiconductor chip 4 by using an evaporation method, a sputtering method, or the like, and solder is formed on the barrier metal layer 7 by using a plating method or a mask vacuum evaporation method. The solder bumps 8 are formed by heating at a temperature higher than the melting point. The solder of this bump is eutectic solder.

【0017】半導体チップ4の電極5と配線基板1の実
装パッド2の電気的な接続は半導体チップ4に形成した
ハンダバンプ8を接続時に溶融し、実装パッド2との接
続を行う。配線基板1上に形成したソルダーダム3は導
体パターンへのハンダ10の流れ出しを抑制している。
The electrical connection between the electrodes 5 of the semiconductor chip 4 and the mounting pads 2 of the wiring board 1 is accomplished by melting the solder bumps 8 formed on the semiconductor chip 4 at the time of connection, and connecting the mounting pads 2. The solder dam 3 formed on the wiring board 1 suppresses the flow of the solder 10 into the conductor pattern.

【0018】封止樹脂11は半導体チップ4と配線基板
1との間および配線基板2上に形成したソルダーダム3
すべてを覆うように注入する。封止樹脂11は接続部の
接続信頼性、半導体チップ4や配線基板1に形成された
回路に対する耐湿性向上などを目的に使用している。
The sealing resin 11 is formed between the semiconductor chip 4 and the wiring board 1 and on the solder dam 3 formed on the wiring board 2.
Inject to cover everything. The sealing resin 11 is used for the purpose of improving the connection reliability of the connection portion and improving the moisture resistance of the semiconductor chip 4 and the circuit formed on the wiring board 1.

【0019】封止樹脂11にはエポキシ樹脂をベースに
アルミナやシリカなどのフィラーを混入して構成してい
る。フィラー量の割合は30重量%から60重量%で混
入している。
The sealing resin 11 is formed by mixing a filler such as alumina or silica based on an epoxy resin. The proportion of the filler amount is from 30% by weight to 60% by weight.

【0020】つぎに図1に示す本発明の半導体装置の構
造を形成するための製造方法を図1と図5と図6とを用
いて簡単に説明する。
Next, a manufacturing method for forming the structure of the semiconductor device of the present invention shown in FIG. 1 will be briefly described with reference to FIGS. 1, 5 and 6.

【0021】図5のように半導体チップ4に形成したハ
ンダバンプ8の先端にハンダバンプ4表面の酸化膜を清
浄化とハンダ濡れ性を良くするためにフラックス9を転
写法を用いて供給する。
As shown in FIG. 5, a flux 9 is supplied to the tip of the solder bump 8 formed on the semiconductor chip 4 by using a transfer method in order to clean an oxide film on the surface of the solder bump 4 and improve solder wettability.

【0022】半導体チップ4に形成したハンダバンプ8
の配置と配線基板1の実装パッド2の配置との位置合わ
せ行い、位置を合わせた後に半導体チップ4を配線基板
1上に設置する。その後、窒素雰囲気リフロー炉を用い
て、ハンダバンプ10の融点(183℃)よりも高い温
度で加熱し、ハンダバンプ10を溶融する。この溶融し
たハンダ10で図6のように半導体チップ4の電極5と
配線基板1の実装パッド2との接続を行う。
Solder bump 8 formed on semiconductor chip 4
Is aligned with the arrangement of the mounting pads 2 of the wiring board 1, and after the alignment, the semiconductor chip 4 is placed on the wiring board 1. Thereafter, the solder bump 10 is heated by using a reflow furnace in a nitrogen atmosphere at a temperature higher than the melting point (183 ° C.) of the solder bump 10. The connection between the electrode 5 of the semiconductor chip 4 and the mounting pad 2 of the wiring board 1 is performed with the molten solder 10 as shown in FIG.

【0023】接続したハンダ10の周囲や配線基板1と
半導体チップ4との間に残っているフラックス残渣を取
り除くために溶剤等を使用して洗浄を行う。
Cleaning is performed using a solvent or the like to remove the flux residue remaining around the connected solder 10 and between the wiring board 1 and the semiconductor chip 4.

【0024】そして、配線基板1と半導体チップ4との
間と、実装パッド2上のハンダ10周りと、ソルダーダ
ム3を覆うように封止樹脂11を注入し、硬化させて図
1のような半導体装置を作製する。
Then, a sealing resin 11 is injected so as to cover between the wiring board 1 and the semiconductor chip 4, around the solder 10 on the mounting pad 2, and the solder dam 3. Make the device.

【0025】[0025]

【発明の効果】フリップチップ実装の接続に使うハンダ
バンプが融点の低い共晶ハンダを用いた半導体装置にお
いて、配線基板に形成したソルダーダムと半導体チップ
と配線基板との間、実装パッドから導体パターンへの流
れ出しソルダーレジストで形成したソルダーダムで流れ
止まったハンダ周りおよびソルダーダムを封止樹脂で覆
うことで、半導体装置を他の部品と混載したり、半導体
チップ以外の部品のリペアーを行う際、そのたびに半導
体チップのハンダは融点以上の環境下に置かれても、接
続に使うハンダが溶融しても外部に流れ出すことがな
い。したがって、本発明の半導体装置においては、半導
体チップと配線基板との電気的接続が安定して得られ
る。
According to the present invention, in a semiconductor device using a eutectic solder having a low melting point, a solder bump used for connection in flip-chip mounting is provided between a solder dam formed on a wiring board, the semiconductor chip and the wiring board, between a mounting pad and a conductive pattern. Covering the solder around the solder dam formed by the outflow solder resist and the solder dam with the sealing resin with the sealing resin allows the semiconductor device to be mixed with other components or to repair components other than semiconductor chips every time. Even if the solder of the chip is placed in an environment at or above the melting point, the solder used for the connection does not flow out even if the solder is melted. Therefore, in the semiconductor device of the present invention, the electrical connection between the semiconductor chip and the wiring board can be stably obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態における半導体装置を示す
断面図である。
FIG. 1 is a sectional view showing a semiconductor device according to an embodiment of the present invention.

【図2】本発明の実施の形態における半導体装置を構成
する配線基板を示す平面図である。
FIG. 2 is a plan view showing a wiring board constituting the semiconductor device according to the embodiment of the present invention;

【図3】本発明の実施の形態における半導体装置を構成
する配線基板を示す断面図である。
FIG. 3 is a cross-sectional view illustrating a wiring board included in the semiconductor device according to the embodiment of the present invention;

【図4】本発明の実施の形態における半導体装置を構成
する半導体チップを示す断面図である。
FIG. 4 is a cross-sectional view illustrating a semiconductor chip included in the semiconductor device according to the embodiment of the present invention.

【図5】本発明の実施の形態における半導体装置を構成
する半導体チップにフラックスを供給した状態を示す断
面図である。
FIG. 5 is a cross-sectional view showing a state where a flux is supplied to a semiconductor chip included in the semiconductor device according to the embodiment of the present invention;

【図6】本発明の実施の形態における半導体装置を構成
する半導体チップが配線基板と接続した状態を示す断面
図である。
FIG. 6 is a cross-sectional view showing a state where a semiconductor chip constituting the semiconductor device according to the embodiment of the present invention is connected to a wiring board.

【図7】従来技術における半導体装置を構成する配線基
板を示す平面図である。
FIG. 7 is a plan view showing a wiring board constituting a semiconductor device according to a conventional technique.

【図8】従来技術における半導体装置を構成する半導体
チップの断面図である。
FIG. 8 is a cross-sectional view of a semiconductor chip constituting a semiconductor device according to a conventional technique.

【図9】従来技術における半導体装置を示す断面図であ
る。
FIG. 9 is a cross-sectional view showing a semiconductor device according to a conventional technique.

【図10】従来技術における半導体装置の不良状態を説
明するために示す断面図である。
FIG. 10 is a cross-sectional view for explaining a defective state of a semiconductor device according to a conventional technique.

【符号の説明】 1 配線基板 2 実装パッド 3 ソルダーダム 4 半導体チップ 10 ハンダ 11 封止樹脂[Description of Signs] 1 Wiring board 2 Mounting pad 3 Solder dam 4 Semiconductor chip 10 Solder 11 Sealing resin

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電極上に配線基板との電気的な接続を行
うためのハンダバンプを有する半導体チップと、半導体
チップの電極の配置に対応する位置に配した実装パッド
の周辺にソルダーレジストでソルダーダムを形成した配
線基板と、半導体チップと配線基板との間に注入するた
めの封止樹脂とを有し、封止樹脂は半導体チップと配線
基板との間および配線基板上にソルダーレジストで形成
したソルダーダムを覆うように注入することを特徴とす
る半導体装置。
1. A semiconductor chip having solder bumps for making electrical connection with a wiring board on an electrode, and a solder dam formed of a solder resist around a mounting pad arranged at a position corresponding to the arrangement of the electrode of the semiconductor chip. A solder dam formed between the semiconductor chip and the wiring board and between the semiconductor chip and the wiring board and on the wiring board with a solder resist. A semiconductor device that is implanted so as to cover the semiconductor device.
JP8260472A 1996-10-01 1996-10-01 Semiconductor device Pending JPH10107079A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8260472A JPH10107079A (en) 1996-10-01 1996-10-01 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8260472A JPH10107079A (en) 1996-10-01 1996-10-01 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH10107079A true JPH10107079A (en) 1998-04-24

Family

ID=17348430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8260472A Pending JPH10107079A (en) 1996-10-01 1996-10-01 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH10107079A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030084513A (en) * 2002-04-27 2003-11-01 엘지이노텍 주식회사 Method of flip-chip fabrication of diode
KR100908674B1 (en) * 2006-06-15 2009-07-22 알프스 덴키 가부시키가이샤 Method for manufacturing circuit board, circuit board and circuit module using the circuit board
CN105112812A (en) * 2014-12-02 2015-12-02 铜陵翔宇商贸有限公司 Low chromium wear resistant ball and processing technology thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030084513A (en) * 2002-04-27 2003-11-01 엘지이노텍 주식회사 Method of flip-chip fabrication of diode
KR100908674B1 (en) * 2006-06-15 2009-07-22 알프스 덴키 가부시키가이샤 Method for manufacturing circuit board, circuit board and circuit module using the circuit board
CN105112812A (en) * 2014-12-02 2015-12-02 铜陵翔宇商贸有限公司 Low chromium wear resistant ball and processing technology thereof

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