JPH0996514A - Measuring apparatus for surface shape - Google Patents

Measuring apparatus for surface shape

Info

Publication number
JPH0996514A
JPH0996514A JP7274864A JP27486495A JPH0996514A JP H0996514 A JPH0996514 A JP H0996514A JP 7274864 A JP7274864 A JP 7274864A JP 27486495 A JP27486495 A JP 27486495A JP H0996514 A JPH0996514 A JP H0996514A
Authority
JP
Japan
Prior art keywords
inspected
face
shape
angle
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7274864A
Other languages
Japanese (ja)
Other versions
JP3230963B2 (en
Inventor
Nobuaki Ueki
伸明 植木
Hideo Kanda
秀雄 神田
Kenichi Noguchi
憲一 野口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujinon Corp
Original Assignee
Fuji Photo Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Optical Co Ltd filed Critical Fuji Photo Optical Co Ltd
Priority to JP27486495A priority Critical patent/JP3230963B2/en
Publication of JPH0996514A publication Critical patent/JPH0996514A/en
Application granted granted Critical
Publication of JP3230963B2 publication Critical patent/JP3230963B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a measuring apparatus by which the uneven shape of a face to be inspected can be measured easily by making a parallel luminous flux incident from a direction at a prescribed angle to the normal direction of the face to be inspected and making the parallel luminous flux; which is focused by an image- formation lens, a peripheral-edge light source. SOLUTION: When the uneven shape of a face 2a to be inspected on an object 2 to be inspected is measured, a tilt stage 20 is turned by a prescribed angle around the axial line (Y-axis) in the length direction of the face 2a to be inspected. Thereby, a parallel luminous flux from a collimating lens 18 enters the face 2a, to be inspected, from a direction at an angle θ to the normal direction of the face 2a to be inspected inside a plane (Z-X plane) at a right angle to the Y-axis. Consequently, reflected light from the face 2a to be inspected becomes a beam in a direction at an angle 2θ to the Z-axis (optical axis). Thereby, when reflected light from every part on the face 2a to be inspected is at a different angle to the direction of the optical axis due to its wavy uneven shape, an image height is changed largely with reference to change in the angle. Thereby, the wavy shape of the face 2a to be inspected, which is image- picked up by an image-pickup part 24 can be monitored 26 clearly so as to be measured easily.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、細長形状の被検面
を有する被検体の被検面凹凸形状を測定する表面形状測
定装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface shape measuring apparatus for measuring the uneven shape of a test surface of a test object having an elongated test surface.

【0002】[0002]

【従来の技術】従来より、磁気ヘッドの製造方法とし
て、磁気ヘッド材料を細長ブロック状に形成しておき、
これをスライスして磁気ヘッドを切り出す方法が知られ
ている。磁気ヘッドにおいてはそのヘッド表面の面形状
が品質上重要になるが、上記細長ブロックの段階におい
てそのヘッド表面となるべき面が長手方向に波打った凹
凸形状となっているような場合には、この細長ブロック
からの切出しを行っても表面形状に優れた磁気ヘッドを
得ることができない。したがって、上記細長ブロックの
段階においてその表面の凹凸形状を予め測定し、良品に
対してのみ切出しを行うようにすれば、品質の保証され
た磁気ヘッドを製造することが可能となる。
2. Description of the Related Art Conventionally, as a method of manufacturing a magnetic head, a magnetic head material is formed in an elongated block shape,
A method of slicing this and cutting out a magnetic head is known. In the magnetic head, the surface shape of the head surface is important for quality, but when the surface to be the head surface at the stage of the elongated block has an uneven shape wavy in the longitudinal direction, A magnetic head having an excellent surface shape cannot be obtained even by cutting out from this elongated block. Therefore, if the uneven shape of the surface is measured in advance at the stage of the elongated block and only the good product is cut out, it is possible to manufacture a magnetic head of guaranteed quality.

【0003】[0003]

【発明が解決しようとする課題】上記細長ブロックの表
面の凹凸形状を測定する方法として、干渉計を用いて干
渉縞を形成させてその縞模様を観察する方法が考えられ
るが、長手方向の波打ち形状を縞模様から読み取ること
は容易ではなく、特に、磁気ヘッドの製造ラインにおい
て短時間で表面凹凸の有無判定を行うことは困難であ
る。本発明は、このような事情に鑑みてなされたもので
あって、細長形状の被検面を有する被検体の被検面凹凸
形状を容易に測定することができる表面形状測定装置を
提供することを目的とするものである。
As a method of measuring the uneven shape of the surface of the elongated block, a method of forming an interference fringe by using an interferometer and observing the fringe pattern is conceivable. It is not easy to read the shape from the striped pattern, and in particular, it is difficult to determine the presence / absence of surface unevenness in a short time in a magnetic head manufacturing line. The present invention has been made in view of the above circumstances, and provides a surface shape measuring apparatus capable of easily measuring the unevenness shape of a test surface of a test object having an elongated test surface. The purpose is.

【0004】[0004]

【課題を解決するための手段】本発明に係る表面形状測
定装置は、細長形状の被検面を有する被検体の前記被検
面の凹凸形状を測定する表面形状測定装置であって、前
記被検体を支持する被検体支持手段と、前記被検面に平
行光を照射する平行光照射手段と、前記被検面を結像す
る結像レンズとを備え、前記被検体支持手段による前記
被検体の支持が、前記被検面の長手方向と直交する平面
内において該被検面の法線方向と所定角度をなす方向か
ら該被検面に前記平行光を入射させるように行われてお
り、前記結像レンズが、前記平行光入射方向に配置され
るとともに、該結像レンズにより形成される略平行光束
に球面収差が生じるように構成されていることを特徴と
するものである。
The surface profile measuring apparatus according to the present invention is a surface profile measuring apparatus for measuring the uneven shape of the test surface of a test object having an elongated test surface, The subject supporting means for supporting the specimen, the parallel light irradiating means for irradiating the surface to be examined with parallel light, and the imaging lens for forming an image on the surface to be examined are provided. Is carried out so that the parallel light is incident on the surface to be inspected from a direction forming a predetermined angle with the normal direction of the surface to be inspected in a plane orthogonal to the longitudinal direction of the surface to be inspected, It is characterized in that the image forming lens is arranged in the parallel light incident direction, and spherical aberration is generated in a substantially parallel light beam formed by the image forming lens.

【0005】[0005]

【発明の実施の形態】以下、図面を用いて、本発明の実
施例について説明する。図1は、本発明に係る表面形状
測定装置の一実施例を示す側面図である。図示のよう
に、この表面形状測定装置10は、細長形状の被検面2
aを有する被検体2(磁気ヘッド材料を細長ブロック状
に形成したもの)の被検面凹凸形状を測定する装置であ
る。すなわち、この表面形状測定装置10は、レーザ装
置12と、発散レンズ14と、ハーフミラー16と、コ
リメータレンズ18と、チルトステージ20と、結像レ
ンズ22と、撮像部24と、モニタ26とを備えてなっ
ている。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a side view showing an embodiment of the surface profile measuring apparatus according to the present invention. As shown in the figure, the surface shape measuring apparatus 10 is provided with an elongated surface 2 to be measured.
It is an apparatus for measuring the unevenness shape of a test surface of a test object 2 having a (a magnetic head material formed in an elongated block shape). That is, the surface shape measuring device 10 includes a laser device 12, a diverging lens 14, a half mirror 16, a collimator lens 18, a tilt stage 20, an image forming lens 22, an image pickup unit 24, and a monitor 26. Be prepared.

【0006】そして、レーザ装置12から射出されたレ
ーザ光を発散レンズ14で発散させた後、この発散光を
ハーフミラー16で反射させ、これをコリメータレンズ
18で平行光にしてチルトステージ20上の被検体に入
射させ、このチルトステージ20上の被検体からの反射
光を再びコリメータレンズ18で集束させ、この集束光
をさらに結像レンズ22の集光作用で撮像部24の撮像
面24a上に略平行照射し、これにより得られた被検体
の画像をモニタ26の画面上に表示するようになってい
る。上記表面形状測定装置10は、さらに、コリメータ
レンズ18とチルトステージ20との間の光路上(図中
2点鎖線で示す位置)に、基準板28を配置し得る構成
とされており、この位置に基準板28を配置した状態
で、被検面2aを基準板28に対して水平に配置するこ
とによりフィゾー型干渉計として使用することができる
ようになっている。
After the laser light emitted from the laser device 12 is diverged by the diverging lens 14, the diverging light is reflected by the half mirror 16 and collimated by the collimator lens 18 into parallel light, which is placed on the tilt stage 20. The collimator lens 18 focuses the reflected light from the subject on the tilt stage 20 again on the tilt stage 20, and the focused light is further focused on the imaging surface 24a of the imaging unit 24 by the condensing action of the imaging lens 22. Substantially parallel irradiation is performed, and the image of the subject obtained by this is displayed on the screen of the monitor 26. The surface profile measuring apparatus 10 is further configured such that the reference plate 28 can be arranged on the optical path between the collimator lens 18 and the tilt stage 20 (the position indicated by the chain double-dashed line in the figure). By arranging the surface 2a to be inspected horizontally with respect to the reference plate 28 with the reference plate 28 arranged in the position, it can be used as a Fizeau interferometer.

【0007】図示のように、被検体2はチルトステージ
20上に支持されるようになっているが、被検体2の被
検面2aの凹凸形状を測定する際には、チルトステージ
20を被検面2aの長手方向の軸線(図示のように座標
系を設定した場合におけるY軸)回りに所定角度回転さ
せて、被検面2aを水平面に対して所定角度傾斜させる
ようになっている。そして、これにより、コリメータレ
ンズ18からの平行光を、ZX平面(上記長手方向の軸
線と直交する平面)内において被検面2aの法線方向と
上記所定角度をなす方向から被検面2aに入射させるよ
うになっている。図2は、チルトステージ20の詳細構
造を示す斜視図である。図示のように、チルトステージ
20は、ベースプレート30の上に、Yステージ32
と、Xステージ34と、チルトステージ本体36とが積
層されてなっている。
As shown in the figure, the subject 2 is supported on the tilt stage 20, but when measuring the uneven shape of the subject surface 2a of the subject 2, the tilt stage 20 is not supported. The inspection surface 2a is rotated about a longitudinal axis (Y axis when the coordinate system is set as shown) around the inspection surface 2a by a predetermined angle so that the inspection surface 2a is inclined at a predetermined angle with respect to the horizontal plane. Then, by this, the parallel light from the collimator lens 18 is directed from the direction forming the above-mentioned predetermined angle with the normal direction of the surface 2a to be detected in the ZX plane (the plane orthogonal to the longitudinal axis). It is designed to be incident. FIG. 2 is a perspective view showing the detailed structure of the tilt stage 20. As shown, the tilt stage 20 includes a Y stage 32 on the base plate 30.
The X stage 34 and the tilt stage body 36 are laminated.

【0008】上記Yステージ32は調整ネジ38により
ベースプレート30に対してY軸方向に移動可能であ
り、上記Xステージ34は調整ネジ40によりYステー
ジ32に対してX軸方向に移動可能であり、上記チルト
ステージ本体36は調整ネジ42、44によりXステー
ジ34に対して各々Y軸回り、X軸回りに傾動可能であ
る。上記チルトステージ本体36には上記傾動の際の支
点作用を果たすバネ46が設けられている。
The Y stage 32 can be moved in the Y axis direction with respect to the base plate 30 by the adjusting screw 38, and the X stage 34 can be moved in the X axis direction with respect to the Y stage 32 by the adjusting screw 40. The tilt stage body 36 can be tilted about the Y axis and the X axis with respect to the X stage 34 by adjusting screws 42 and 44, respectively. The tilt stage main body 36 is provided with a spring 46 that functions as a fulcrum when tilting.

【0009】上記チルトステージ20には、さらに、そ
のベースプレート30に支持された4本の調整ネジ48
に遮蔽板50が高さ調整可能に取り付けられている。こ
の遮蔽板50には、Y軸方向に延びる細長形状のスリッ
ト50aが形成されており、このスリット50aにより
被検体2の被検面2aの形状を規定するようになってい
る。上記遮蔽板50は、上記チルトステージ20のYス
テージ32、Xステージ34およびチルトステージ本体
36により位置および傾斜角度が設定された被検体2に
対して、上記4本の調整ネジ48の調整によりその被検
面2aとなるべき表面近傍に配置されるようになってい
る。
The tilt stage 20 is further provided with four adjusting screws 48 supported by the base plate 30 thereof.
A shielding plate 50 is attached to the height adjustable member. The shielding plate 50 is formed with an elongated slit 50a extending in the Y-axis direction, and the slit 50a defines the shape of the surface 2a to be inspected of the subject 2. The shielding plate 50 is adjusted by adjusting the four adjusting screws 48 with respect to the subject 2 whose position and inclination angle are set by the Y stage 32, the X stage 34 of the tilt stage 20, and the tilt stage body 36. It is arranged in the vicinity of the surface to be the test surface 2a.

【0010】図3(a)に示すように、上記結像レンズ
22は、該結像レンズ22により形成される被検体の像
に球面収差が生じるように構成されている。この球面収
差は、図3(b)に示すように、チルトステージ本体3
6からの反射光がZ軸(光軸)となす角度を横軸にと
り、撮像部24の撮像面上における像高ズレ量を縦軸に
とったとき、高次関数的に角度が大きくなるほど収差の
増加量が大きくなるように設定されている。
As shown in FIG. 3A, the imaging lens 22 is constructed so that an image of the subject formed by the imaging lens 22 has spherical aberration. This spherical aberration is caused by the tilt stage body 3 as shown in FIG.
When the angle formed by the reflected light from 6 and the Z axis (optical axis) is taken as the horizontal axis and the image height shift amount on the image pickup surface of the image pickup unit 24 is taken as the vertical axis, the aberration increases as the angle increases in a higher-order function. Is set to increase.

【0011】次に、本実施例の作用について説明する。
被検体2が、図4(a)に示すようなY軸方向に波打っ
た凹凸形状の被検面2aを有するものとする。本実施例
においては、この被検体2を上記チルトステージ20に
よりY軸回りに所定角度傾斜させるようになっている
が、そのときのチルトステージ本体36の傾斜角度をθ
とすると、被検面2aは図4(b)に示すようになる。
被検面2aにこのような傾斜角度を持たせることによ
り、コリメータレンズ18からの平行光はチルトステー
ジ本体36に対して入射角θで入射することとなる。
Next, the operation of this embodiment will be described.
It is assumed that the subject 2 has an uneven surface 2a to be inspected, which is corrugated in the Y-axis direction as shown in FIG. In the present embodiment, the subject 2 is tilted by the tilt stage 20 about the Y axis by a predetermined angle. The tilt angle of the tilt stage body 36 at that time is θ.
Then, the surface to be inspected 2a becomes as shown in FIG.
By allowing the surface 2a to be inspected to have such an inclination angle, the parallel light from the collimator lens 18 enters the tilt stage body 36 at an incident angle θ.

【0012】仮に、チルトステージ本体36が水平面に
対して傾斜していないとすれば、チルトステージ本体3
6からの反射光は、Z軸(光軸)方向に平行なビームと
なるため、コリメータレンズ18を経て結像レンズ22
で集束される際には、図3(a)にAで示すように近軸
光線となる。したがって、チルトステージ本体36に載
置された被検体2の被検面2aの各部位からの反射光
が、該被検面2aの波打ち凹凸形状によりZ軸(光軸)
方向に対して異なる角度を有していても、図3(b)の
Aから明らかなように、その角度変化に対する像高の変
化がほとんどないため、モニタ26上に被検面2aの波
打ち凹凸形状を映し出すことはできない。
If the tilt stage body 36 is not tilted with respect to the horizontal plane, the tilt stage body 3 is assumed.
Since the reflected light from 6 becomes a beam parallel to the Z-axis (optical axis) direction, it passes through the collimator lens 18 and the imaging lens 22.
When it is focused on, it becomes a paraxial ray as shown by A in FIG. Therefore, the reflected light from each part of the test surface 2a of the test object 2 placed on the tilt stage body 36 is Z-axis (optical axis) due to the wavy uneven shape of the test surface 2a.
Even if they have different angles with respect to the direction, as is clear from A in FIG. 3B, there is almost no change in the image height with respect to the change in the angle, and therefore the wavy unevenness of the surface 2a to be inspected on the monitor 26. The shape cannot be projected.

【0013】これに対し、本実施例においては、チルト
ステージ本体36が水平面に対して角度θ傾斜している
ので、チルトステージ本体36からの反射光は、Z軸
(光軸)に対して2θの角度をなす方向へのビームとな
る。このため、コリメータレンズ18を経て結像レンズ
22で集束される際には、図3(a)にBで示すように
周縁光線となり、したがって、チルトステージ本体36
に載置された被検体2の被検面2aの各部位からの反射
光が、該被検面2aの波打ち凹凸形状によりZ軸(光
軸)方向に対して異なる角度を有していれば、図3
(b)のBから明らかなように、その角度変化に対して
像高が大きく変化するため、撮像部24で撮像される、
被検面2aの波打ち凹凸形状をモニタ26上に鮮明に映
し出すことができる。
On the other hand, in the present embodiment, since the tilt stage body 36 is inclined at an angle θ with respect to the horizontal plane, the reflected light from the tilt stage body 36 is 2θ with respect to the Z axis (optical axis). It becomes a beam in the direction that makes an angle of. Therefore, when it is focused by the imaging lens 22 via the collimator lens 18, it becomes a marginal ray as shown by B in FIG.
If the reflected light from each part of the test surface 2a of the test object 2 placed on the surface of the test object 2 has a different angle with respect to the Z-axis (optical axis) direction due to the corrugated uneven shape of the test surface 2a. , Fig. 3
As is clear from B in (b), since the image height changes greatly with respect to the change in the angle, the image is captured by the image capturing unit 24.
The wavy uneven shape of the surface 2a to be inspected can be clearly displayed on the monitor 26.

【0014】図5は、本実施例に係る表面形状測定装置
10により得られたモニタ26上の被検面2aの像であ
って、同図(a)は、被検面2aに大きな波打ち凹凸形
状がない良品を示し、同図(b)は、被検面2aに大き
な波打ち凹凸形状がある不良品を示す図である。なお、
モニタ26上の各像からこのような良否判定がなされる
のは、以下の理由による。すなわち、本実施例における
被検体2は磁気ヘッド材料を細長ブロック状に形成した
ものであり、これを長手直交方向にスライスすることに
より磁気ヘッドが切り出されることから、たとえ被検面
2aに波打ち凹凸形状があったとしても、これが図5
(a)に示すような長周期の波であれば、切り出された
磁気ヘッドの表面に上記波打ち凹凸形状の影響が残存せ
ず、磁気ヘッドとしての性能上特に問題は生じない。一
方、図5(b)に示すような短周期の波の場合には、切
り出された磁気ヘッドの表面に上記波打ち凹凸形状の影
響が残存するため、磁気ヘッドとしての性能上問題が生
じることになる。
FIG. 5 is an image of the surface 2a to be inspected on the monitor 26 obtained by the surface shape measuring apparatus 10 according to this embodiment. FIG. 5A shows a large wavy unevenness on the surface 2a to be inspected. FIG. 2B is a diagram showing a defective product having no shape, and FIG. 6B is a diagram showing a defective product having a large corrugated uneven shape on the surface 2a to be tested. In addition,
The reason for making such a quality determination from each image on the monitor 26 is as follows. That is, the subject 2 in this embodiment is formed by forming the magnetic head material into an elongated block shape, and the magnetic head is cut out by slicing the magnetic head material in the longitudinal orthogonal direction. Even if there is a shape, this is
If the wave has a long period as shown in (a), the effect of the corrugated uneven shape does not remain on the surface of the cut magnetic head, and no particular problem occurs in the performance of the magnetic head. On the other hand, in the case of a wave having a short period as shown in FIG. 5B, the effect of the corrugated uneven shape remains on the surface of the cut magnetic head, which causes a problem in the performance of the magnetic head. Become.

【0015】以上詳述したように、本実施例において
は、チルトステージ本体36を水平面に対して角度θ傾
斜させることにより、チルトステージ本体36からの反
射光を結像レンズ22に対して周縁光線として入射させ
るようになっており、かつ、結像レンズ22として球面
収差を有するレンズが用いられているので、チルトステ
ージ本体36に載置された被検体2の被検面2aに波打
ち凹凸形状があり、このため該被検面2aの各部位から
の反射光がZ軸方向に対して異なる角度を有していれ
ば、その角度変化に対して像高が大きく変化し、これに
よりモニタ26上に被検面2aの波打ち凹凸形状を鮮明
に映し出すことができる。したがって、本実施例によれ
ば、磁気ヘッドの製造ラインにおいて、該磁気ヘッドと
なるべき細長ブロックの表面凹凸の有無判定を短時間で
容易に行うことが可能となる。
As described above in detail, in the present embodiment, the tilt stage body 36 is tilted by an angle θ with respect to the horizontal plane, so that the reflected light from the tilt stage body 36 is directed to the imaging lens 22 by the marginal ray. Since a lens having spherical aberration is used as the imaging lens 22, a wavy uneven shape is formed on the surface 2a of the subject 2 mounted on the tilt stage body 36. Therefore, if the reflected light from each part of the surface to be inspected 2a has a different angle with respect to the Z-axis direction, the image height changes greatly with respect to the change in the angle. The wavy concavo-convex shape of the surface 2a to be inspected can be clearly displayed on the screen. Therefore, according to the present embodiment, in the magnetic head manufacturing line, it is possible to easily determine the presence or absence of the surface unevenness of the elongated block to be the magnetic head in a short time.

【0016】なお、本実施例においては、光源としてレ
ーザ装置を用いているので、チルトステージ本体36か
らの反射光も指向性が強いビームとなる。このため、図
3(a)にBで示す周縁光線のみが撮像面に入射するこ
ととなり、これにより撮像面24a上に被検面2aの波
打ち凹凸形状をより一層鮮明に映し出すことができる。
In this embodiment, since the laser device is used as the light source, the reflected light from the tilt stage body 36 is also a beam having a strong directivity. Therefore, only the marginal ray shown by B in FIG. 3A is incident on the image pickup surface, which makes it possible to more clearly project the wavy uneven shape of the test surface 2a on the image pickup surface 24a.

【0017】また、本実施例においては、チルトステー
ジ20に取り付けられた遮蔽板50のスリット50aに
より被検体2の被検面2aの形状を規定するようになっ
ているので、常に同一の基準で被検面2aの波打ち凹凸
形状を映し出すことができ、その観察評価が容易とな
る。さらに、調整ネジ40によりXステージ34をX軸
方向に移動させるようにすれば、被検体2が幅広い表面
を有するような場合であっても、これを細長形状の被検
面2aに区切ってその波打ち凹凸形状を順次観察するこ
とが可能となる。なお、被検体2の被検面2aとなるべ
き表面の輪郭自体が細長い形状である場合には、上記の
ような遮蔽板50を用いることなく被検体2の表面全体
を被検面2aとして表面形状測定を行うようにしてもよ
いことはもちろんである。
Further, in the present embodiment, the shape of the test surface 2a of the subject 2 is defined by the slit 50a of the shield plate 50 attached to the tilt stage 20, so that the same standard is always used. The wavy uneven shape of the surface 2a to be inspected can be projected, and the observation and evaluation thereof can be facilitated. Further, if the X-stage 34 is moved in the X-axis direction by the adjusting screw 40, even if the subject 2 has a wide surface, it is divided into the elongated test surface 2a and the It is possible to successively observe the wavy uneven shape. If the contour itself of the surface to be the test surface 2a of the test object 2 is an elongated shape, the entire surface of the test object 2 is used as the test surface 2a without using the shielding plate 50 as described above. Of course, shape measurement may be performed.

【0018】また、上記実施例では、モニタ26上に映
出された波打ち形状から定性的に被検面2a上の凹凸状
態を判断しているが、この波打ち形状の振幅量を測定す
ることにより、上記結像レンズの球面収差量に基づき被
検面2aの凹凸量を定量的に検出することが可能であ
る。なお、本発明の表面形状測定装置としては上記実施
例のものに限られるものではなく、その他種々の態様の
変更が可能である。
Further, in the above embodiment, the uneven state on the surface to be inspected 2a is qualitatively judged from the wavy shape displayed on the monitor 26. However, by measuring the amplitude amount of this wavy shape. It is possible to quantitatively detect the amount of unevenness of the surface to be inspected 2a based on the amount of spherical aberration of the imaging lens. The surface shape measuring device of the present invention is not limited to the above embodiment, and various other modifications can be made.

【0019】[0019]

【発明の効果】本発明によれば、被検体支持手段によっ
て被検体を傾斜配置することにより、その被検面長手方
向と直交する平面内において該被検面の法線方向と所定
角度をなす方向から該被検面に平行光を入射させるよう
に構成されており、また、この平行光を照射された被検
面からの反射光を集束させる結像レンズが、平行光入射
方向に配置されるとともに該結像レンズにより形成され
る集束ビームに球面収差が生じるように構成されている
ので、細長形状の被検面を有する被検体の被検面凹凸形
状を容易に測定することができる。
According to the present invention, the subject is supported by the subject supporting means so that the subject is tilted to form a predetermined angle with the normal direction of the subject surface in a plane orthogonal to the longitudinal direction of the subject surface. Is arranged so that parallel light is incident on the surface to be inspected from the direction, and an imaging lens for focusing the reflected light from the surface to be inspected irradiated with the parallel light is arranged in the parallel light incident direction. In addition, since the focused beam formed by the imaging lens has a spherical aberration, it is possible to easily measure the uneven shape of the test surface of the test object having the elongated test surface.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る表面形状測定装置の一実施例を示
す側面図
FIG. 1 is a side view showing an embodiment of a surface profile measuring apparatus according to the present invention.

【図2】上記実施例のチルトステージを示す斜視図FIG. 2 is a perspective view showing a tilt stage of the above embodiment.

【図3】上記実施例の作用を示す説明図FIG. 3 is an explanatory view showing the operation of the above embodiment.

【図4】上記実施例の測定対象となる被検面を示す斜視
FIG. 4 is a perspective view showing a test surface to be measured in the above embodiment.

【図5】上記実施例の測定結果を示す図FIG. 5 is a diagram showing the measurement results of the above-mentioned embodiment.

【符号の説明】[Explanation of symbols]

2 被検体 2a 被検面 10 表面形状測定装置 12 レーザ装置 14 発散レンズ 16 ハーフミラー 18 コリメータレンズ 20 チルトステージ 22 結像レンズ 24 撮像部 24a 撮像面 26 モニタ 28 基準板 30 ベースプレート 32 Yステージ 34 Xステージ 36 チルトステージ本体 50 遮蔽板 50a スリット 2 subject 2a surface to be inspected 10 surface shape measuring device 12 laser device 14 diverging lens 16 half mirror 18 collimator lens 20 tilt stage 22 imaging lens 24 imaging unit 24a imaging surface 26 monitor 28 reference plate 30 base plate 32 Y stage 34 X stage 36 Tilt stage body 50 Shield plate 50a Slit

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 細長形状の被検面を有する被検体の前記
被検面の凹凸形状を測定する表面形状測定装置であっ
て、 前記被検体を支持する被検体支持手段と、前記被検面に
平行光を照射する平行光照射手段と、前記被検面を結像
する結像レンズとを備え、 前記被検体支持手段による前記被検体の支持が、前記被
検面の長手方向と直交する平面内において該被検面の法
線方向と所定角度をなす方向から該被検面に前記平行光
を入射させるように行われており、 前記結像レンズが、前記平行光入射方向に配置されると
ともに、該結像レンズにより形成される略平行光束に球
面収差が生じるように構成されていることを特徴とする
表面形状測定装置。
1. A surface shape measuring apparatus for measuring the uneven shape of the test surface of a test object having an elongated test surface, the test object supporting means for supporting the test object, and the test surface. Parallel light irradiating means for irradiating parallel light to the object, and an imaging lens for forming an image on the surface to be inspected, and the support of the object by the object supporting means is orthogonal to the longitudinal direction of the surface to be inspected. The parallel light is incident on the surface to be inspected from a direction forming a predetermined angle with the normal direction of the surface to be inspected in the plane, and the imaging lens is arranged in the parallel light incident direction. In addition, the surface shape measuring device is characterized in that a spherical aberration is generated in the substantially parallel light flux formed by the imaging lens.
【請求項2】 前記被検面となるべき前記被検体の表面
近傍に、前記被検面の細長形状と同一形状のスリットが
形成された遮蔽板が配置されていることを特徴とする請
求項1記載の表面形状測定装置。
2. A shield plate, in which a slit having the same shape as the elongated shape of the surface to be inspected is formed, is arranged near the surface of the object to be the surface to be inspected. 1. The surface shape measuring device according to 1.
【請求項3】 前記被検体支持手段による前記被検体の
支持が、該被検体を前記遮蔽板に対して前記スリットの
長手方向と直交する前記被検面に沿った方向に相対移動
させ得るように行われていることを特徴とする請求項2
記載の表面形状測定装置。
3. The support of the subject by the subject support means can move the subject relative to the shielding plate in a direction along the subject surface orthogonal to the longitudinal direction of the slit. The method according to claim 2, wherein
The surface shape measuring device described.
【請求項4】 前記平行光の光束内の所定位置に、干渉
縞形成用の基準板を配置し得るように構成されているこ
とを特徴とする請求項1〜3いずれか記載の表面形状測
定装置。
4. The surface shape measurement according to claim 1, wherein a reference plate for forming interference fringes is arranged at a predetermined position within the light flux of the parallel light. apparatus.
JP27486495A 1995-09-28 1995-09-28 Surface profile measuring device Expired - Fee Related JP3230963B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27486495A JP3230963B2 (en) 1995-09-28 1995-09-28 Surface profile measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27486495A JP3230963B2 (en) 1995-09-28 1995-09-28 Surface profile measuring device

Publications (2)

Publication Number Publication Date
JPH0996514A true JPH0996514A (en) 1997-04-08
JP3230963B2 JP3230963B2 (en) 2001-11-19

Family

ID=17547638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27486495A Expired - Fee Related JP3230963B2 (en) 1995-09-28 1995-09-28 Surface profile measuring device

Country Status (1)

Country Link
JP (1) JP3230963B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG98388A1 (en) * 2000-05-13 2003-09-19 Univ Nanyang Testing of aspheric surfaces with a magneto-optic active compensator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG98388A1 (en) * 2000-05-13 2003-09-19 Univ Nanyang Testing of aspheric surfaces with a magneto-optic active compensator

Also Published As

Publication number Publication date
JP3230963B2 (en) 2001-11-19

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