JPH0975841A - Method for water film formation with design material having ultrahigh hydrophilicity - Google Patents
Method for water film formation with design material having ultrahigh hydrophilicityInfo
- Publication number
- JPH0975841A JPH0975841A JP8136994A JP13699496A JPH0975841A JP H0975841 A JPH0975841 A JP H0975841A JP 8136994 A JP8136994 A JP 8136994A JP 13699496 A JP13699496 A JP 13699496A JP H0975841 A JPH0975841 A JP H0975841A
- Authority
- JP
- Japan
- Prior art keywords
- water film
- water
- superhydrophilic
- design material
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y02T30/34—
Landscapes
- Finishing Walls (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は建築などで使用する
意匠材に関する。TECHNICAL FIELD The present invention relates to a design material used in construction and the like.
【０００２】[0002]
【従来の技術】例えば、飲食店の店内に日本庭園をモチ
ーフとして池や小川などを配置することで、自然な雰囲
気の中で食事が楽しめるような演出や、オブジェ的な壁
体あるいは建築本体の外壁に水を流下させて涼感を演出
するといった水を使った様々なデザインがなされてい
る。このような水と接する部分には、天然石、人造石、
タイルなど様々な意匠材が使用されている。なお、ここ
でいう意匠材は、このような床材、内外壁材、屋根材な
どの仕上材だけでなく、表面を形成する建築材料あるい
は外観を形成する建築材料のことをいう。2. Description of the Related Art For example, by arranging a pond or a stream in a restaurant with a Japanese garden as a motif, you can enjoy a meal in a natural atmosphere, or create a wall or building-like object. There are various designs using water, such as allowing water to flow down the outer wall to create a cool sensation. Natural stones, artificial stones,
Various design materials such as tiles are used. The design material here means not only finishing materials such as floor materials, inner and outer wall materials, and roof materials, but also building materials that form the surface or building materials that form the appearance.
【０００３】[0003]
【発明が解決しようとする課題】しかし、いずれの意匠
材においても、少量の水では均一な水膜が作れず筋状の
流れになってしまうために、その効果を発揮するために
は大量の水を必要としている。したがって、設計及び
デザインに制約を受ける、大量の揚水を必要とするの
でランニングコストがかかる、などの不具合が生じてい
た。However, in any of the design materials, even if a small amount of water is used, a uniform water film cannot be formed, resulting in a stream-like flow. Therefore, in order to exert its effect, a large amount of water is required. I need water. Therefore, there have been problems such as being restricted in design and design, and requiring a large amount of pumping water, which requires running costs.
【０００４】本発明は、少量の水でも薄い均一な水膜を
形成することが可能な超親水性を有する意匠材による水
膜形成方法を提供することを目的とする。An object of the present invention is to provide a method for forming a water film using a superhydrophilic design material capable of forming a thin uniform water film even with a small amount of water.
【０００５】[0005]
【課題を解決するための手段】請求項１に記載の超親水
性を有する意匠材による水膜形成方法は、光触媒性半導
体材料を含む層で被覆した意匠材に、光励起による親水
性を発現させて、均一な水膜を表面に形成することを特
徴とする。A method for forming a water film using a superhydrophilic design material according to claim 1 is that a design material coated with a layer containing a photocatalytic semiconductor material is made hydrophilic by photoexcitation. In this way, a uniform water film is formed on the surface.
【０００６】請求項２に記載の超親水性を有する意匠材
による水膜形成方法は、請求項１に記載の超親水性を有
する意匠材による水膜形成方法において、前記層の表面
は光励起時に水との接触角に換算して約１０゜以下の水
濡れ性を呈する。A method of forming a water film using the superhydrophilic design material according to claim 2 is the method of forming a water film using the superhydrophilic design material according to claim 1, wherein the surface of the layer is under photoexcitation. It exhibits wettability of about 10 ° or less in terms of contact angle with water.
【０００７】請求項３に記載の超親水性を有する意匠材
による水膜形成方法は、請求項１に記載の超親水性を有
する意匠材による水膜形成方法において、前記層の表面
は光励起時に水との接触角に換算して約５°以下の水濡
れ性を呈する。A method of forming a water film using the superhydrophilic design material according to claim 3 is the method of forming a water film using the superhydrophilic design material according to claim 1, wherein the surface of the layer is under photoexcitation. It exhibits wettability of about 5 ° or less in terms of contact angle with water.
【０００８】請求項４に記載の超親水性を有する意匠材
による水膜形成方法は、請求項１ないし請求項３のいず
れか一に記載の超親水性を有する意匠材による水膜形成
方法において、前記光触媒性半導体材料に、ＴｉＯ2，
ＺｎＯ，ＳｎＯ2，ＳｒＴｉＯ3，ＷＯ3，Ｂｉ2Ｏ3，Ｆ
ｅ2Ｏ3からなる群から選ばれた１種の酸化物を含有させ
る。A method for forming a water film using the superhydrophilic design material according to claim 4 is the method for forming a water film using the superhydrophilic design material according to any one of claims 1 to 3. , The photocatalytic semiconductor material, TiO 2 ,
ZnO, SnO 2 , SrTiO 3 , WO 3 , Bi 2 O 3 , F
It contains one kind of oxide selected from the group consisting of e 2 O 3 .
【０００９】請求項５に記載の超親水性を有する意匠材
による水膜形成方法は、請求項１ないし請求項４のいず
れか一に記載の超親水性を有する意匠材による水膜形成
方法において、前記光触媒性半導体材料をアナターゼ型
チタニアとする。A method for forming a water film using the superhydrophilic design material according to claim 5 is the method for forming a water film using the superhydrophilic design material according to any one of claims 1 to 4. The photocatalytic semiconductor material is anatase type titania.
【００１０】請求項６に記載の超親水性を有する意匠材
による水膜形成方法は、請求項４または請求項５に記載
の超親水性を有する意匠材による水膜形成方法におい
て、前記層は更にＳｉＯ2又はＳｎＯ2を含有させる。The method for forming a water film using the superhydrophilic design material according to claim 6 is the method for forming a water film using the superhydrophilic design material according to claim 4 or 5, wherein the layer is Further, SiO 2 or SnO 2 is contained.
【００１１】請求項７に記載の超親水性を有する意匠材
による水膜形成方法は、請求項１ないし請求項６のいず
れか一に記載の超親水性を有する意匠材による水膜形成
方法において、前記層を光触媒性半導体材料の粒子が均
一に分散された塗膜によって形成する。A method for forming a water film using a superhydrophilic design material according to claim 7 is the method for forming a water film using a superhydrophilic design material according to any one of claims 1 to 6. The layer is formed by a coating film in which particles of the photocatalytic semiconductor material are uniformly dispersed.
【００１２】請求項８に記載の超親水性を有する意匠材
による水膜形成方法は、請求項７に記載の超親水性を有
する意匠材による水膜形成方法において、前記塗膜をシ
リコーンで形成し、その表面をシリコーン分子のケイ素
原子に結合した有機基が光励起に応じて光触媒性材料の
光触媒作用により少なくとも部分的に水酸基に置換され
たシリコーン誘導体で形成する。A method for forming a water film using a superhydrophilic design material according to claim 8 is the method for forming a water film using a superhydrophilic design material according to claim 7, wherein the coating film is formed of silicone. Then, the surface is formed of a silicone derivative in which an organic group bonded to a silicon atom of a silicone molecule is at least partially substituted with a hydroxyl group by the photocatalytic action of a photocatalytic material in response to photoexcitation.
【００１３】請求項９に記載の超親水性を有する意匠材
による水膜形成方法は、請求項１ないし請求項８のいず
れか一に記載の超親水性を有する意匠材による水膜形成
方法において、前記基材をアルカリ網目修飾イオンを含
むガラスで形成し、前記基材と前記層との間に前記イオ
ンが基材から前記層中に拡散を防止するための薄膜を介
挿する。A method for forming a water film using a superhydrophilic design material according to claim 9 is the method for forming a water film using a superhydrophilic design material according to any one of claims 1 to 8. The base material is formed of glass containing alkali network modifying ions, and a thin film is inserted between the base material and the layer to prevent diffusion of the ions from the base material into the layer.
【００１４】請求項１０に記載の超親水性を有する意匠
材による水膜形成方法は、請求項９に記載の超親水性を
有する意匠材による水膜形成方法において、前記薄膜を
シリカの薄膜とする。A method for forming a water film using the superhydrophilic design material according to claim 10 is the method for forming a water film using the superhydrophilic design material according to claim 9, wherein the thin film is a silica thin film. To do.
【００１５】請求項１１に記載の超親水性を有する意匠
材による水膜形成方法は、請求項１ないし請求項１０の
いずれか一に記載の超親水性を有する意匠材による水膜
形成方法において、前記層の厚さを約０．２μｍ以下と
する。The method for forming a water film using the superhydrophilic design material according to claim 11 is the method for forming a water film using the superhydrophilic design material according to any one of claims 1 to 10. The thickness of the layer is about 0.2 μm or less.
【００１６】[0016]
【作用】本発明者は、光触媒を光励起すると光触媒の表
面が高度に親水化されることを世界で初めて発見した。
驚ろくべきことに、光触媒性チタニアを紫外線で光励起
したところ、水との接触角が１０°以下、より詳しくは
５°以下、特に約０°になる程度に表面が高度に親水化
されることが発見された。本発明は斯る新発見に基づく
もので、意匠材の表面は光触媒半導体材料からなる耐摩
耗性の光触媒性コーティングによって被覆される。光触
媒半導体のバンドギャップエネルギより高いエネルギの
波長をもった光を充分な照度で充分な時間照射すると、
光触媒性コーティングの表面は超親水性を呈するに至
る。ここで用いる“超親水性（ｓｕｐｅｒｈｙｄｒｏｐ
ｈｉｌｉｃｉｔｙ）”又は“超親水性の（ｓｕｐｅｒｈ
ｙｄｒｏｐｈｉｌｉｃ）”の用語は、水との接触角に換
算して約１０°以下、好ましくは約５°以下の高度の親
水性（即ち水濡れ性）を意味する。同様に、“超親水化
（ｓｕｐｅｒｈｙｄｒｏｐｈｉｌｉｆｉｃａｔｉｏ
ｎ）”又は“超親水化する（ｓｕｐｅｒｈｙｄｒｏｐｈ
ｉｌｉｆｙ）”の用語は、表面を水との接触角に換算し
て約１０°以下、好ましくは約５°以下の高度の親水性
にすることを意味する。光触媒の光励起によって起こる
表面の超親水化現象は、現在のところ、必ずしも明確に
説明することはできない。光触媒による超親水化現象
は、光触媒の分野において従来知られている光触媒的酸
化還元反応による物質の光分解とは必ずしも同じではな
いように見受けられる。この点に関し、光触媒的酸化還
元反応に関する従来の定説は、光励起により電子−正孔
対が生成し、生成した電子は表面酸素を還元してスーパ
ーオキサイドイオン（Ｏ2 - ）を生成し、正孔は表面水
酸基を酸化して水酸ラジカル（・ＯＨ）を生成し、これ
らの高度に反応性の活性酸素種（Ｏ2 - や・ＯＨ）の酸
化還元反応によって物質が分解されるというものであっ
た。しかしながら、光触媒による超親水化現象は、少な
くとも２つの点において、物質の光触媒的分解に関する
従来の知見と合致しない。第１に、従来の定説では、ル
チルや酸化錫のような光触媒は、伝導体のエネルギ準位
が十分に高くないため、還元反応が進行せず、その結
果、伝導体に光励起された電子が過剰となり、光励起に
より生成した電子−正孔対が酸化還元反応に関与するこ
となく再結合すると考えられていた。これに対して、光
触媒による超親水化現象は、後述するように、ルチルや
酸化錫のような光触媒でも起こることが確認された。第
２に、従来、光触媒性酸化還元反応による物質の分解は
光触媒層の膜厚が少なくとも１００ｎｍ以上でないと起
こらないと考えられている。これに対して、光触媒性超
親水化は、光触媒性コーティングの膜厚が数ｎｍのオー
ダーでも起こることが観察された。従って、明確には結
論できないが、光触媒による超親水化現象は、光触媒的
酸化還元反応による物質の光分解とはやや異なる現象で
あると考えられる。しかしながら、後述するように、光
触媒のバンドギャップエネルギより高いエネルギの光を
照射しなければ表面の超親水化は起こらないことが確認
された。おそらくは、光触媒の光触媒作用によって光触
媒性コーティングの表面に水が水酸基（ＯＨ- ）の形で
化学吸着されることにより、表面が超親水性になると考
えられる。光励起により光触媒性コーティングの表面が
一旦高度に親水化されたならば、意匠材が暗所に保持さ
れても、表面の親水性はある程度の期間持続する。時間
の経過に伴い表面水酸基に汚染物質が吸着され、表面が
次第に超親水性を失った時には、再び光励起すれば超親
水性は回復する。光触媒性コーティングを最初に超親水
化するためには、光触媒のバンドギャップエネルギより
高いエネルギの波長をもった任意の光源を利用すること
ができる。チタニアのように光励起波長が紫外線領域に
位置する光触媒の場合には、光触媒性コーティングで被
覆された意匠材に太陽光が当たるような条件では、太陽
光に含まれる紫外線を好適に利用することができる。屋
内や夜間には、人工光源により光触媒を光励起すること
ができる。後述するように、光触媒性コーティングがシ
リカ配合チアニアからなる場合には、蛍光灯に含まれる
微弱な紫外線でも容易に親水化することができる。光触
媒性コーティングの表面が一旦超親水化された後には、
比較的微弱な光によって超親水性を維持し、或いは、回
復させることができる。例えば、チタニアの場合には、
超親水性の維持と回復は、蛍光灯のような室内照明灯に
含まれる微弱な紫外線でも充分に行うことができる。光
触媒性コーティングは非常に薄くしても超親水性を発現
し、特に金属酸化物からなる光触媒半導体材料は充分な
硬度を有するので、光触媒性コーティングは充分な耐久
性と耐摩耗性を有する。以上のことから、高度に親水化
された意匠材の表面では、水はできるだけ薄く広がろう
とするので、非常に少量の水でも均一な薄い水膜を形成
することができ、また、超親水性の発現された意匠材の
表面は、屋内においては蛍光灯などの照明によって、屋
外においては太陽光によってその効果は持続される。さ
らにその水を循環して再利用する場合には意匠材表面に
施された光触媒の作用（酸化還元作用）により水自体が
浄化されることも期待できる。The present inventor discovered for the first time in the world that the surface of a photocatalyst is highly hydrophilized when the photocatalyst is photoexcited.
Surprisingly, when photocatalytic titania was photoexcited with ultraviolet rays, the surface was highly hydrophilized so that the contact angle with water was 10 ° or less, more specifically 5 ° or less, especially about 0 °. Was discovered. The present invention is based on such a new discovery, and the surface of the design material is coated with a wear-resistant photocatalytic coating made of a photocatalytic semiconductor material. When light with a wavelength of energy higher than the band gap energy of the photocatalytic semiconductor is irradiated with sufficient illuminance for a sufficient time,
The surface of the photocatalytic coating becomes superhydrophilic. As used herein, "superhydrophilic (superhydrodrop)
"hilicity" or "superhydrophilic (superh
The term "hydrophilic" means a high degree of hydrophilicity (ie, water wettability) of about 10 ° or less, preferably about 5 ° or less in terms of contact angle with water. superhydrophilicity
n) ”or“ superhydrophobic (superhydroph
The term "ilify)" means that the surface has a high degree of hydrophilicity in terms of contact angle with water of about 10 ° or less, preferably about 5 ° or less. Superhydrophilicity of the surface caused by photoexcitation of the photocatalyst. At present, it is not always possible to clearly explain the photocatalytic phenomenon.The superhydrophilization phenomenon by a photocatalyst is not necessarily the same as the photolysis of a substance by a photocatalytic redox reaction known in the field of photocatalyst. In this regard, the conventional theory regarding the photocatalytic redox reaction is that an electron-hole pair is generated by photoexcitation, and the generated electron reduces surface oxygen to generate a superoxide ion (O 2- ). The generated holes oxidize the surface hydroxyl groups to generate hydroxyl radicals (.OH), and the highly reactive reactive oxygen species (O2-and .OH) are oxidized and reduced to form substances. However, the superhydrophilization phenomenon by the photocatalyst is inconsistent with the conventional knowledge about the photocatalytic decomposition of a substance in at least two points. In a photocatalyst such as tin oxide, the energy level of the conductor is not sufficiently high, so the reduction reaction does not proceed, and as a result, the photoexcited electrons in the conductor become excessive, and the electron-hole generated by photoexcitation. It was thought that the pair would recombine without participating in the redox reaction, whereas the superhydrophilization phenomenon by photocatalyst was confirmed to occur also in photocatalysts such as rutile and tin oxide, as described later. Secondly, conventionally, it is considered that the decomposition of the substance by the photocatalytic redox reaction does not occur unless the film thickness of the photocatalytic layer is at least 100 nm or more. It was observed that the catalytic superhydrophilization occurs even when the film thickness of the photocatalytic coating is on the order of several nm.Therefore, although it cannot be concluded clearly, the photocatalytic superhydrophilization phenomenon is caused by the photocatalytic redox reaction. However, as described later, it was confirmed that superhydrophilization of the surface does not occur unless light having an energy higher than the band gap energy of the photocatalyst is irradiated. Presumably, the surface of the photocatalytic coating becomes highly hydrophilic due to the chemisorption of water in the form of hydroxyl groups (OH −) on the surface of the photocatalytic coating due to the photocatalytic action of the photocatalyst. If the design material is made hydrophilic, the hydrophilicity of the surface will be maintained for a certain period of time even if the design material is kept in a dark place. When the contaminant is adsorbed on the surface hydroxyl groups with the passage of time and the surface gradually loses the superhydrophilic property, the superhydrophilic property is restored by photoexcitation again. Any light source having a wavelength of energy higher than the photocatalytic bandgap energy can be utilized to initially superhydrophilize the photocatalytic coating. In the case of a photocatalyst whose photoexcitation wavelength is located in the ultraviolet region like titania, under the condition that the design material coated with the photocatalytic coating is exposed to sunlight, the ultraviolet rays contained in the sunlight may be preferably used. it can. The photocatalyst can be photoexcited with an artificial light source indoors or at night. As will be described later, when the photocatalytic coating is made of silica-containing cyania, it can be easily hydrophilized even with the weak ultraviolet rays contained in the fluorescent lamp. Once the surface of the photocatalytic coating is superhydrophilized,
Super-hydrophilicity can be maintained or restored by relatively weak light. For example, in the case of Titania,
Superhydrophilicity can be sufficiently maintained and restored even with weak ultraviolet rays contained in indoor lighting such as fluorescent lamps. The photocatalytic coating exhibits superhydrophilicity even when it is very thin, and in particular, the photocatalytic semiconductor material made of a metal oxide has sufficient hardness, so that the photocatalytic coating has sufficient durability and abrasion resistance. From the above, water tends to spread as thinly as possible on the surface of a highly hydrophilic design material, so that a uniform thin water film can be formed even with a very small amount of water, and it is also superhydrophilic. The effect of the surface of the design material in which the expression is exhibited is sustained by illumination such as a fluorescent lamp indoors and by sunlight outdoors. Furthermore, when the water is circulated and reused, it can be expected that the water itself will be purified by the action (oxidation reduction action) of the photocatalyst provided on the surface of the design material.
【００１７】[0017]
【発明の実施の形態】本発明による超親水性を有する意
匠材による水膜形成方法の実施の形態について実施例に
基づいて説明する。BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of a water film forming method using a superhydrophilic design material according to the present invention will be described based on Examples.
【００１８】本発明の第１の実施例として、市民ホール
の休憩スペースに水面を形成した例について説明する。
図１に示される休憩スペース１に形成される池２は、橋
７及び飛び石８とともに、テーブル３３で休憩する人な
どのための安らぎの空間を演出するためのものである。
図２に示されるように、池２は、その底面を超親水性を
有するタイル３によって形成し、側面をごく普通のタイ
ル４によって形成している。ともに、目地５を設けて、
コンクリートスラブ９上にモルタル６を介して配置して
いる。タイル３は１５ｃｍ四角の施釉タイル（東陶機
器、ＡＢ０２Ｅ０１）で、その表面にテトラエトキシ
シラン（コルコート社、エチル２８）をスプレーコーテ
ィング法により塗布し、約２０分間約１５０℃の温度
に保持することにより、テトラエトキシシランを加水分
解と脱水縮重合に付し、無定形シリカ層を表面に形成し
た後、表面にアナターゼ型チタニアゾル（大阪の石原
産業、ＳＴＳ−１１）をスプレーコーティング法により
塗布し、８００℃の温度で１時間焼成したものであ
る。なお、その後このタイル３には、ＢＬＢ蛍光灯を用
いて０．３ｍＷ／ｃｍ2 の紫外線照度で１日間紫外線を
照射して光励起による親水性を発現させ、水との接触角
を３°未満とした。したがって、この池２に給水口１５
から少量の水を供給すると、水はすばやく全面に広が
り、薄い均一な水膜を表面に形成して池２の水面とな
る。なお、このとき図３に示されるように、目地４はタ
イル３の上面より低く形成されているので、目地４で切
れることなく一様な水面１０が形成される。また、タイ
ル３の地の色を黒とすれば水鏡のような効果が得られ
る。As a first embodiment of the present invention, an example in which a water surface is formed in a rest space of a civic hall will be described.
The pond 2 formed in the rest space 1 shown in FIG. 1, together with the bridge 7 and the stepping stone 8, is for creating a peaceful space for people who rest at the table 33.
As shown in FIG. 2, the pond 2 has a bottom surface formed by tiles 3 having superhydrophilicity and side surfaces formed by ordinary tiles 4. Both have joints 5,
It is arranged on the concrete slab 9 via the mortar 6. Tile 3 is a 15 cm square glazed tile (TO02, AB02E01), the surface of which is coated with tetraethoxysilane (Corcoat Co., Ethyl 28) by spray coating and kept at a temperature of about 150 ° C. for about 20 minutes. By subjecting tetraethoxysilane to hydrolysis and dehydration polycondensation to form an amorphous silica layer on the surface, anatase titania sol (Ishihara Sangyo of Osaka, STS-11) is applied to the surface by a spray coating method, It was baked at a temperature of 800 ° C. for 1 hour. After that, the tile 3 was irradiated with ultraviolet light for 1 day at a UV illuminance of 0.3 mW / cm 2 using a BLB fluorescent lamp to develop hydrophilicity by photoexcitation, and the contact angle with water was set to less than 3 °. . Therefore, this pond 2 has a water supply port 15
When a small amount of water is supplied from the pond, the water quickly spreads over the entire surface, forming a thin uniform water film on the surface and forming the water surface of the pond 2. At this time, as shown in FIG. 3, since the joints 4 are formed lower than the upper surface of the tile 3, a uniform water surface 10 is formed without breaking the joints 4. Also, if the background color of the tile 3 is black, an effect similar to a water mirror can be obtained.
【００１９】本発明の第２の実施例として、３階建ての
建物の壁面に水膜を形成した例について説明する。図４
に示される建物１１の外壁１３は超親水性を有するアル
ミニウム板１２で形成されている。この外壁１３に水膜
を形成して、水鏡のような外面を有する建築物としてデ
ザインしたものである。アルミニウム板１２は、表面を
アルマイト処理した後、次の〜に示す手順で超親水
性を発現させたものである。表面を平滑化するため、
日本合成ゴム（東京）の塗料用組成物“グラスカ”のＡ
液（シリカゾル）とＢ液（トリメトキシメチルシラン）
を、シリカ重量とトリメトキシメチルシランの重量の比
が３になるように混合し、この混合液を表面に塗布し、
１５０℃の温度で硬化させ、膜厚３μｍのシリコーンの
被覆を形成する。アナターゼ型チタニアゾル（日産化
学、ＴＡ−１５）と“グラスカ”のＡ液（シリカゾル）
を混合し、エタノールで希釈後、更に“グラスカ”のＢ
液を添加し、チタニア含有塗料用組成物を調整した。こ
の塗料用組成物の組成は、シリカ３重量部、トリメトキ
シメチルシラン１重量部、チタニア４重量部であった。
この塗料用組成物をアルミニウム板１２の表面に塗布
し、１５０℃の温度で硬化させ、アナターゼ型チタニア
粒子がシリコーン塗膜中に分散された表面層を形成し
た。ＢＬＢ蛍光灯を用いて０．５ｍＷ／ｃｍ2の照度
で５日間紫外線を照射して光励起による親水性を発現さ
せ、表面の水との接触角を３°未満とした。この、建物
１１の外壁１３の上部に備えられた、樋１４に水を満た
していくとやがて側方１４ａから溢れて、アルミニウム
板１２に一様に水が流れるようになっている。流れだし
た水は素早くアルミニウム板１２全面に広がり、薄い均
一な水膜が表面に形成され水鏡のような効果が得られ
る。As a second embodiment of the present invention, an example in which a water film is formed on the wall surface of a three-story building will be described. FIG.
The outer wall 13 of the building 11 shown in is formed of an aluminum plate 12 having superhydrophilicity. A water film is formed on the outer wall 13 and is designed as a building having an outer surface like a water mirror. After the surface of the aluminum plate 12 is anodized, the aluminum plate 12 is made to exhibit superhydrophilicity by the following steps (1) to (4). To smooth the surface,
Japanese synthetic rubber (Tokyo) paint composition "Glaska" A
Liquid (silica sol) and Liquid B (trimethoxymethylsilane)
Are mixed so that the ratio of the weight of silica and the weight of trimethoxymethylsilane is 3, and this mixed solution is applied to the surface,
It is cured at a temperature of 150 ° C. to form a silicone coating with a thickness of 3 μm. Anatase-type titania sol (NISSAN CHEMICAL, TA-15) and "grasca" A liquid (silica sol)
Are mixed, diluted with ethanol, and then "Blaska" B
The liquid was added to prepare a titania-containing coating composition. The composition of this coating composition was 3 parts by weight of silica, 1 part by weight of trimethoxymethylsilane, and 4 parts by weight of titania.
This coating composition was applied to the surface of the aluminum plate 12 and cured at a temperature of 150 ° C. to form a surface layer in which anatase-type titania particles were dispersed in the silicone coating film. A BLB fluorescent lamp was used to irradiate ultraviolet rays for 5 days at an illuminance of 0.5 mW / cm 2 to develop hydrophilicity by photoexcitation, and the surface contact angle with water was set to less than 3 °. When the gutter 14 provided on the upper portion of the outer wall 13 of the building 11 is filled with water, it eventually overflows from the lateral side 14a, and the water uniformly flows to the aluminum plate 12. The water that has flown out quickly spreads over the entire surface of the aluminum plate 12, and a thin uniform water film is formed on the surface, so that the effect of a water mirror is obtained.
【００２０】また、シリコーン層に光触媒性半導体材料
を含有させた場合、常温または比較的低温で効果させる
ことができるので、既存の外壁でも刷毛塗り、スプレー
コーティング、ロールコーティングなどにより塗布して
形成することができる。また、光励起による超親水化は
太陽光で容易に行うことができる。なお、外壁１３に汚
れが付着した場合でも降雨によって自然に流れて落ちて
しまうので汚れがつきにくい。When the silicone layer contains a photocatalytic semiconductor material, it can be effective at room temperature or at a relatively low temperature. Therefore, the existing outer wall is applied by brush coating, spray coating, roll coating or the like. be able to. In addition, superhydrophilization by photoexcitation can be easily performed with sunlight. Even if dirt is attached to the outer wall 13, the dirt naturally flows and falls due to rainfall, so that dirt is not easily attached.
【００２１】本発明の第３の実施例として、第２の実施
例の建物１１の外壁１３が、ガラス面を有するカーテン
ウォール（図示せず）で構成されている場合について説
明する。この場合、ガラス面には次の〜に示す手順
で超親水性を発現させたものを用いれば前述と同様の効
果が得られる。 テトラエトキシチタンＴｉ（ＯＣ2Ｈ5）4（Ｍｅｒ
ｃｋ）１重量部とエタノール９重量部との混合物に加水
分解抑制剤として３６％塩酸を０．１重量部添加してチ
タニアコーティング溶液を調整し、この溶液をガラス面
に乾燥空気中でフローコーティング法により塗布した。
塗布量はチタニアに換算して４５μｇ／cm2とした。テ
トラエトキシチタンの加水分解速度は極めて早いので、
塗布の段階でテトラエトキシチタンの一部は加水分解さ
れ、水酸化チタンＴｉ（ＯＨ）4が生成し始めた。 このガラス面を１〜１０分間約１５０℃の温度に保
持することにより、テトラエトキシチタンの加水分解を
完了させると共に、生成した水酸化チタンを脱水縮重合
に付し、無定形チタニアを生成させた。さらに、これを
５００℃の温度で焼成して、無定形チタニアをアナター
ゼ型チタニアに変換させて、ガラス面にアナターゼ型チ
タニアの表面層を形成させた。なお、ここで、焼成温度
を高くしてルチル型チタニアの表面層を形成させてもよ
い。 このようにして製作したガラス面をまず０．３Ｗ／
cm2の紫外線強度で２４時間光照射を行って光励起によ
る親水性を発現させたところ、照射後の水滴の接触角は
測定限界である約１度であった。表面層の厚さは０．２
μｍであった。As a third embodiment of the present invention, a case where the outer wall 13 of the building 11 of the second embodiment is constituted by a curtain wall (not shown) having a glass surface will be described. In this case, the same effect as described above can be obtained if the glass surface is made to exhibit superhydrophilicity by the following procedures. Tetraethoxy titanium Ti (OC 2 H 5 ) 4 (Mer
ck) 0.1 part by weight of 36% hydrochloric acid as a hydrolysis inhibitor was added to a mixture of 1 part by weight and 9 parts by weight of ethanol to prepare a titania coating solution, and the solution was flow coated on a glass surface in dry air. It was applied by the method.
The coating amount was 45 μg / cm 2 in terms of titania. Since the hydrolysis rate of tetraethoxytitanium is extremely fast,
At the coating stage, a part of tetraethoxy titanium was hydrolyzed and titanium hydroxide Ti (OH) 4 began to be generated. By holding this glass surface at a temperature of about 150 ° C. for 1 to 10 minutes, the hydrolysis of tetraethoxytitanium was completed, and the produced titanium hydroxide was subjected to dehydration polycondensation to produce amorphous titania. . Further, this was fired at a temperature of 500 ° C. to convert the amorphous titania into anatase titania and form a surface layer of anatase titania on the glass surface. Here, the firing temperature may be increased to form the surface layer of rutile type titania. The glass surface produced in this way is 0.3 W /
When exposed to light for 24 hours at an ultraviolet intensity of cm 2 to develop hydrophilicity by photoexcitation, the contact angle of water droplets after irradiation was about 1 degree, which is the measurement limit. The thickness of the surface layer is 0.2
μm.
【００２２】本発明の第４の実施例として、アミューズ
メントパークに設けられた水膜による映写スクリーンに
ついて説明する。図５に示される映写スクリーン２１
は、スクリーン本体２２の面体２３に水膜を形成して、
その水膜の面に映像を写し出すためのものである。Ｃ形
溝型鋼などの鋼材で形成されたスクリーン本体２２に
は、鋼板製の面体２３を備える。この面体２３に第２の
実施例と同様にして、アナターゼ型チタニア粒子がシリ
コーン塗膜中に分散された表面層を形成した後、光励起
による親水性を発現させた。それから、スクリーン本体
２２の上部に備えられた、樋２４に水を満たしていくと
やがて側方２４ａから溢れて、面体２３に一様に水が流
れるようになっている。流れだした水は素早く面体２３
全面に広がり、薄い均一な水膜が表面に形成されて水膜
によるスクリーンが得られる。このスクリーンに映写機
（図示せず）によって映像を写し出せば、水面に写し出
されたような映像が得られる。As a fourth embodiment of the present invention, a projection screen with a water film provided in an amusement park will be described. Projection screen 21 shown in FIG.
Forms a water film on the face piece 23 of the screen body 22,
It is for projecting an image on the surface of the water film. A screen body 22 made of a steel material such as C-shaped groove steel is provided with a face plate 23 made of a steel plate. After forming a surface layer in which the anatase-type titania particles were dispersed in the silicone coating film on this surface member 23 in the same manner as in the second embodiment, hydrophilicity was exhibited by photoexcitation. Then, when the gutter 24 provided on the upper part of the screen main body 22 is filled with water, it eventually overflows from the lateral side 24a, and the water flows evenly on the face piece 23. The water that started flowing quickly
A thin and uniform water film is formed on the entire surface, and a screen made of the water film is obtained. By projecting an image on this screen with a projector (not shown), an image as if it was projected on the water surface can be obtained.
【００２３】[0023]
【発明の効果】本発明によれば、ごく少量の水でも薄い
均一な水膜を形成することができるので、池やスクリー
ンなどをはじめ様々な水膜を利用したデザインが可能と
なる。According to the present invention, a thin and uniform water film can be formed even with a very small amount of water, so that designs using various water films such as ponds and screens are possible.
【図１】第１の実施例の休憩スペースの平面図FIG. 1 is a plan view of a rest space according to a first embodiment.
【図２】第１の実施例の池の断面図FIG. 2 is a sectional view of the pond according to the first embodiment.
【図３】第１の実施例の池の断面詳細図FIG. 3 is a detailed sectional view of the pond of the first embodiment.
【図４】第２の実施例の３階建ての建物の断面図FIG. 4 is a sectional view of a three-story building of the second embodiment.
【図５】第４の実施例の映写スクリーンの断面図FIG. 5 is a sectional view of a projection screen according to a fourth embodiment.
３ タイル １２ アルミニウム板 ２３ 鋼板性の面体 3 tiles 12 aluminum plate 23 steel sheet face
───────────────────────────────────────────────────── フロントページの続き (72)発明者 渡部 俊也 北九州市小倉北区中島２丁目１番１号 東 陶機器株式会社内 (72)発明者 早川 信 北九州市小倉北区中島２丁目１番１号 東 陶機器株式会社内 (72)発明者 北村 厚 北九州市小倉北区中島２丁目１番１号 東 陶機器株式会社内 (72)発明者 千國 真 北九州市小倉北区中島２丁目１番１号 東 陶機器株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshiya Watanabe 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu City Totoki Co., Ltd. (72) Inventor Shin Hayakawa 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu No. To Tohki Co., Ltd. (72) Inventor Atsushi Kitamura 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu City (72) Inventor Makoto Senkoku 2-1-1 Nakajima, Kokurakita-ku, Kitakyushu No. 1 in Totoki Co., Ltd.
Claims (11)
匠材に、光励起による親水性を発現させて、均一な水膜
を表面に形成することを特徴とする超親水性を有する意
匠材による水膜形成方法。1. A super-hydrophilic design material, characterized in that the design material coated with a layer containing a photocatalytic semiconductor material exhibits hydrophilicity by photoexcitation to form a uniform water film on the surface. Water film formation method.
換算して約１０°以下の水濡れ性を呈する請求項１に記
載の超親水性を有する意匠材による水膜形成方法。2. The method for forming a water film using a superhydrophilic design material according to claim 1, wherein the surface of the layer exhibits a water wettability of about 10 ° or less when converted into a contact angle with water upon photoexcitation.
換算して約５°以下の水濡れ性を呈する請求項１に記載
の超親水性を有する意匠材による水膜形成方法。3. The method for forming a water film using a superhydrophilic design material according to claim 1, wherein the surface of the layer exhibits a water wettability of about 5 ° or less when converted into a contact angle with water upon photoexcitation.
ｎＯ，ＳｎＯ2 ，ＳｒＴｉＯ2 ，ＷＯ3 ，Ｂｉ2Ｏ3 ，
Ｆｅ2Ｏ3からなる群から選ばれた１種の酸化物を含有さ
せる請求項１ないし請求項３のいずれか一に記載の超親
水性を有する意匠材による水膜形成方法。4. The photocatalytic semiconductor material contains TiO 2 , Z
nO, SnO 2 , SrTiO 2 , WO 3 , Bi 2 O 3 ,
The method for forming a water film using the superhydrophilic design material according to any one of claims 1 to 3, wherein an oxide selected from the group consisting of Fe 2 O 3 is contained.
タニアとする請求項１ないし請求項４のいずれか一に記
載の超親水性を有する意匠材による水膜形成方法。5. The method for forming a water film by using the superhydrophilic design material according to claim 1, wherein the photocatalytic semiconductor material is anatase-type titania.
せる請求項４または請求項５に記載の超親水性を有する
意匠材による水膜形成方法。6. The method for forming a water film using a superhydrophilic design material according to claim 4, wherein the layer further contains SiO 2 or SnO 2 .
に分散された塗膜によって形成する請求項１ないし請求
項６のいずれか一に記載の超親水性を有する意匠材によ
る水膜形成方法。7. A water film formation using the superhydrophilic design material according to claim 1, wherein the layer is formed by a coating film in which particles of a photocatalytic semiconductor material are uniformly dispersed. Method.
をシリコーン分子のケイ素原子に結合した有機基が光励
起に応じて光触媒性材料の光触媒作用により少なくとも
部分的に水酸基に置換されたシリコーン誘導体で形成す
る請求項７に記載の超親水性を有する意匠材による水膜
形成方法。8. A silicone derivative in which the coating film is formed of silicone, and the surface of the organic group bonded to the silicon atom of the silicone molecule is at least partially substituted with a hydroxyl group by the photocatalytic action of the photocatalytic material in response to photoexcitation. The method for forming a water film using the superhydrophilic design material according to claim 7, wherein the water film is formed.
ガラスで形成し、前記基材と前記層との間に前記イオン
が基材から前記層中に拡散を防止するための薄膜を介挿
する請求項１ないし請求項８のいずれか一に記載の超親
水性を有する意匠材による水膜形成方法。9. The substrate is formed of glass containing alkaline network modifying ions, and a thin film is interposed between the substrate and the layer to prevent the ions from diffusing from the substrate into the layer. A method for forming a water film using the superhydrophilic design material according to any one of claims 1 to 8.
に記載の超親水性を有する意匠材による水膜形成方法。10. The thin film is a thin silica film.
A method for forming a water film using the superhydrophilic design material described in 1.
請求項１ないし請求項１０のいずれか一に記載の超親水
性を有する意匠材による水膜形成方法。11. The method for forming a water film using the superhydrophilic design material according to claim 1, wherein the layer has a thickness of about 0.2 μm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13699496A JP3704806B2 (en) | 1995-07-08 | 1996-05-30 | Water film formation method using design material having super hydrophilicity |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20501995 | 1995-07-08 | ||
| JP7-205019 | 1995-12-22 | ||
| JP13699496A JP3704806B2 (en) | 1995-07-08 | 1996-05-30 | Water film formation method using design material having super hydrophilicity |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0975841A true JPH0975841A (en) | 1997-03-25 |
| JP3704806B2 JP3704806B2 (en) | 2005-10-12 |
Family
ID=26470434
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|---|---|---|---|
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| Country | Link |
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| JPH0222047A (en) * | 1988-04-21 | 1990-01-24 | Toyo Alum Kk | Hydrophilic fin material for heat exchanger |
| JPH02279733A (en) * | 1989-04-20 | 1990-11-15 | Mikado Kako Kk | Agricultural film and its production |
| JPH03107052A (en) * | 1989-09-20 | 1991-05-07 | Kubota Corp | Apparatus for forming dropping water film for decorating wall |
| JPH06278241A (en) * | 1992-09-22 | 1994-10-04 | Takenaka Komuten Co Ltd | Building material |
| WO1996023910A1 (en) * | 1995-02-01 | 1996-08-08 | Asahi Glass Company Ltd. | Synthetic resin moldings and process for producing the same |
| WO1996029375A1 (en) * | 1995-03-20 | 1996-09-26 | Toto Ltd. | Method of photocatalytically making the surface of base material ultrahydrophilic, base material having ultrahydrophilic and photocatalytic surface, and process for producing said material |
| JPH0959041A (en) * | 1995-06-14 | 1997-03-04 | Toto Ltd | Anticlouding coating composition containing photocatalyst |
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