JPH0963804A - Resistor and its manufacture - Google Patents

Resistor and its manufacture

Info

Publication number
JPH0963804A
JPH0963804A JP7211966A JP21196695A JPH0963804A JP H0963804 A JPH0963804 A JP H0963804A JP 7211966 A JP7211966 A JP 7211966A JP 21196695 A JP21196695 A JP 21196695A JP H0963804 A JPH0963804 A JP H0963804A
Authority
JP
Japan
Prior art keywords
metal oxide
oxide film
film
insulating substrate
resistor according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7211966A
Other languages
Japanese (ja)
Inventor
Kozo Igarashi
幸造 五十嵐
Hidenori Nishiwaki
英謙 西脇
Katsuharu Sakamoto
克治 阪本
Yasuhiro Shindo
▲泰▼宏 進藤
Yasuhiko Yokota
康彦 横田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7211966A priority Critical patent/JPH0963804A/en
Publication of JPH0963804A publication Critical patent/JPH0963804A/en
Pending legal-status Critical Current

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  • Non-Adjustable Resistors (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a resistor which is hardly affected by external factors and excellent in productivity, and a manufacturing method of the resistor. SOLUTION: A first, a second, and a third metal oxide covering films 2, 3, 4 are formed, in this order, on the surface of an insulating substrate 1. Resistivity of the second metal oxide covering film 3 is smaller than that of the first metal oxide covering film 2. Resistivity of the first metal oxide covering film 2 is equal to that of the third metal oxide covering film 4, or resistivity of the third metal oxide covering film 4 is larger than that of the first metal oxide covering film 2. Thereby, a resistor which is hardly affected by external factors and excellent in productivity, and a manufacturing method of the resistor are obtained.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、3層の酸化金属皮膜を
有する抵抗器およびその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resistor having a three-layer metal oxide film and a method for manufacturing the same.

【0002】[0002]

【従来の技術】以下、従来の技術について説明する。2. Description of the Related Art A conventional technique will be described below.

【0003】従来の技術として、特開平2−23860
2号に、「酸化金属皮膜が、絶縁基体表面に直接接する
第1の酸化金属皮膜と、該第1の酸化金属皮膜の上に被
覆された、第1の酸化金属皮膜より比抵抗の大きい第2
の酸化金属皮膜と、さらに該第2の酸化金属皮膜の上に
被覆された、第2の酸化金属皮膜より比抵抗の小さい第
3の酸化金属皮膜とからなる構成の酸化金属皮膜」が開
示されている。
As a prior art, Japanese Patent Laid-Open No. 23860/1990
No. 2, “A metal oxide film has a first metal oxide film in direct contact with the surface of an insulating substrate, and a first metal oxide film coated on the first metal oxide film and having a specific resistance larger than that of the first metal oxide film. Two
And a third metal oxide film having a smaller specific resistance than the second metal oxide film, which is further coated on the second metal oxide film. ing.

【0004】また、特開平2−253601号に、「酸
化金属皮膜が、絶縁基体表面に直接接する第1の酸化金
属皮膜と、該第1の酸化金属皮膜の上に被覆された、第
1の酸化金属皮膜より比抵抗の小さい第2の酸化金属皮
膜と、さらに該第2の酸化金属皮膜の上に被覆された、
第1の酸化金属皮膜より比抵抗が小さく第2の酸化金属
皮膜とは異なる比抵抗を有する第3の酸化金属皮膜とか
らなる3層構成の酸化金属皮膜」が開示されている。
Further, in Japanese Patent Laid-Open No. 2-253601, "A metal oxide film is a first metal oxide film which is in direct contact with the surface of an insulating substrate, and a first metal oxide film is coated on the first metal oxide film. A second metal oxide film having a specific resistance smaller than that of the metal oxide film, and further coated on the second metal oxide film,
A three-layer metal oxide film comprising a third metal oxide film having a smaller specific resistance than the first metal oxide film and a specific resistance different from that of the second metal oxide film is disclosed.

【0005】[0005]

【発明が解決しようとする課題】上述した特開平2−2
38602号では、第3の酸化金属皮膜は第2の酸化金
属皮膜より比抵抗が小さいので、主たる抵抗特性を示す
第3の酸化金属皮膜は水分等の外的要因を受けやすいと
いう課題を有していた。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
In No. 38602, since the third metal oxide film has a smaller specific resistance than the second metal oxide film, there is a problem that the third metal oxide film exhibiting the main resistance characteristic is susceptible to external factors such as moisture. Was there.

【0006】また、上述した特開平2−253601号
では、第2・第3の酸化金属皮膜は第1の酸化金属皮膜
より比抵抗が小さいので、主たる抵抗特性を示す第2・
第3の酸化金属皮膜は水分等の外的要因を受けやすいと
いう課題を有していた。
Further, in the above-mentioned Japanese Patent Application Laid-Open No. 2-253601, the second and third metal oxide films have a smaller specific resistance than the first metal oxide film, and therefore the second and third metal oxide films exhibiting a main resistance characteristic.
The third metal oxide film has a problem that it is susceptible to external factors such as moisture.

【0007】さらに、上述した従来の両者の製造方法で
は、絶縁基体に直接抵抗液を吹き付けるので、絶縁基材
を加熱している装置全体に液が着膜され、抵抗液のロス
が大きいという課題を有していた。
Further, in both of the conventional manufacturing methods described above, the resistance liquid is sprayed directly onto the insulating substrate, so that the liquid is deposited on the entire device heating the insulating base material, resulting in a large loss of the resistance liquid. Had.

【0008】本発明は、上記従来の課題を解決するもの
で、外的要因からの影響が少ないとともに、量産性に優
れた抵抗器およびその製造方法を提供するものである。
The present invention solves the above-mentioned conventional problems, and provides a resistor which is less affected by external factors and is excellent in mass productivity, and a method of manufacturing the same.

【0009】[0009]

【課題を解決するための手段】上記従来の課題を解決す
るために、本発明の構成は、絶縁基体と、この絶縁基体
の表面に設けた第1の酸化金属皮膜と、この第1の酸化
金属皮膜の表面に前記第1の酸化金属皮膜より比抵抗値
が小さい第2の酸化金属皮膜と、この第2の酸化金属皮
膜の表面に前記第1の酸化金属皮膜と比抵抗値が等しい
第3の酸化金属皮膜を設けてなるものである。
In order to solve the above conventional problems, the structure of the present invention has an insulating base, a first metal oxide film provided on the surface of the insulating base, and a first oxide. A second metal oxide film having a specific resistance value smaller than that of the first metal oxide film on the surface of the metal film, and a second metal oxide film having a specific resistance value equal to that of the first metal oxide film on the surface of the second metal oxide film. The metal oxide film of No. 3 is provided.

【0010】また、本発明の構成は、絶縁基体と、この
絶縁基体の表面に設けた第1の酸化金属皮膜と、この第
1の酸化金属皮膜の表面に前記第1の酸化金属皮膜より
比抵抗値が小さい第2の酸化金属皮膜と、この第2の酸
化金属皮膜の表面に前記第1の酸化金属皮膜より比抵抗
値が大きい第3の酸化金属皮膜を設けてなるものであ
る。
Further, the structure of the present invention is such that an insulating substrate, a first metal oxide film provided on the surface of the insulating substrate, and a surface of the first metal oxide film which is higher than that of the first metal oxide film. A second metal oxide film having a small resistance value and a third metal oxide film having a larger specific resistance value than the first metal oxide film are provided on the surface of the second metal oxide film.

【0011】さらに、本発明の製造方法は、加熱した絶
縁基体を煙状の第1の抵抗皮膜気体中を通過させて前記
絶縁基体の表面に第1の酸化金属皮膜を形成し、この第
1の酸化金属皮膜を形成した前記絶縁基体を加熱して第
2の抵抗皮膜気体中を通過させて第2の酸化金属皮膜を
形成し、この第2の酸化金属皮膜を形成した前記絶縁基
体を加熱して第3の抵抗皮膜気体中を通過させて第3の
酸化金属皮膜を形成してなる工程を有するものである。
Further, according to the manufacturing method of the present invention, the heated insulating substrate is passed through a smoke-like first resistance film gas to form a first metal oxide film on the surface of the insulating substrate. And heating the insulating substrate having the metal oxide film formed thereon to pass through a second resistance film gas to form a second metal oxide film, and heating the insulating substrate having the second metal oxide film formed thereon. Then, a step of forming a third metal oxide film by passing through the gas of the third resistance film is provided.

【0012】[0012]

【作用】上記構成により、外的要因からの影響が受けづ
らくなるものである。
With the above structure, the influence of external factors is less likely to occur.

【0013】また、上記製造方法により量産性に優れる
ものである。
Further, the above manufacturing method is excellent in mass productivity.

【0014】[0014]

【実施例】【Example】

(実施例1)以下、本発明の一実施例の抵抗器につい
て、図面を参照しながら説明する。
(Embodiment 1) Hereinafter, a resistor according to an embodiment of the present invention will be described with reference to the drawings.

【0015】図1は本発明の一実施例における抵抗器の
断面図である。図において、1は、柱状の絶縁基体で、
アルミナを主成分とする磁器基体である。2は絶縁基体
1の表面に設けた酸化錫を主成分とする第1の酸化金属
皮膜で、絶縁基体1から生ずるアルカリ分等から後述す
る他の酸化金属皮膜の特性劣化を防ぐように設けたもの
である。3は第1の酸化金属皮膜2の表面に設け第1の
酸化金属皮膜2より比抵抗が小さいとともに主たる抵抗
特性を示す第2の酸化金属皮膜で、酸化錫を主成分と
し、少なくともアンチモン・鉄・バナジウム・クロム・
ニッケル・モリブデン・マンガン・銅・亜鉛・ビスマス
・コバルト・インジウムのうち、少なくとも一種を含有
し、好ましくはアンチモンを含有してなるものである。
4は第2の酸化金属皮膜3の表面の設けられた、第1の
酸化金属皮膜2と比抵抗が等しいとともに第2の酸化金
属皮膜3の特性劣化を防ぐように設けられた第3の酸化
金属皮膜で、酸化錫を主成分とするものである。5は第
1・第2・第3の酸化金属皮膜2・3・4を設けた絶縁
基体1の両端のそれぞれに設けた金属キャップである。
6は金属キャップ5と電気的に接続するように設けられ
たリード線である。7は少なくとも金属キャップ5と第
3の酸化金属皮膜4とを覆うように設けた保護膜であ
る。
FIG. 1 is a sectional view of a resistor according to an embodiment of the present invention. In the figure, 1 is a columnar insulating substrate,
It is a porcelain substrate whose main component is alumina. Reference numeral 2 is a first metal oxide film containing tin oxide as a main component provided on the surface of the insulating substrate 1, and is provided so as to prevent deterioration of characteristics of other metal oxide films described later due to an alkali component generated from the insulating substrate 1. It is a thing. The second metal oxide film 3 is provided on the surface of the first metal oxide film 2 and has a smaller specific resistance than the first metal oxide film 2 and exhibits main resistance characteristics. The second metal oxide film 3 contains tin oxide as a main component and contains at least antimony / iron.・ Vanadium ・ Chrome ・
It contains at least one of nickel, molybdenum, manganese, copper, zinc, bismuth, cobalt, and indium, and preferably contains antimony.
Reference numeral 4 denotes a third oxide provided on the surface of the second metal oxide film 3, which has the same specific resistance as that of the first metal oxide film 2 and is provided so as to prevent characteristic deterioration of the second metal oxide film 3. A metal film containing tin oxide as a main component. Reference numeral 5 is a metal cap provided on each end of the insulating substrate 1 provided with the first, second and third metal oxide films 2, 3 and 4.
Reference numeral 6 is a lead wire provided so as to be electrically connected to the metal cap 5. Reference numeral 7 is a protective film provided so as to cover at least the metal cap 5 and the third metal oxide film 4.

【0016】以上のように構成された抵抗器について、
以下その製造方法について説明する。
Regarding the resistor configured as described above,
The manufacturing method will be described below.

【0017】まず、電気炉にて絶縁基体1を約700℃
に加熱する。次に、塩化錫・メタノールおよび塩酸を主
成分とする抵抗液を気化させながら高温の空気を送り込
んでなる第1の酸化金属皮膜気体中に絶縁基体1を通過
させて、この絶縁基体1の表面に第1の酸化金属皮膜2
を形成し、室温にて冷却する。
First, the insulating substrate 1 is heated to about 700 ° C. in an electric furnace.
Heat to. Next, the insulating substrate 1 is passed through the first metal oxide film gas in which high temperature air is sent while vaporizing the resistance liquid containing tin chloride / methanol and hydrochloric acid as main components, and the surface of the insulating substrate 1 is passed. First metal oxide film 2
Formed and cooled at room temperature.

【0018】次に、表面に第1の酸化金属皮膜2を形成
した絶縁基体1を約700℃に加熱し、塩化錫・メタノ
ールおよび塩酸からなる溶液にアンチモン・鉄・バナジ
ウム・クロム・ニッケル・モリブデン・マンガン・銅・
亜鉛・ビスマス・コバルト・インジウムの少なくとも一
種を含有してなる抵抗液を気化させながら高温の空気を
送り込んでなる第2の酸金気体中に絶縁基体1を通過さ
せて、この第1の酸化金属皮膜2の表面に第2の酸化金
属皮膜3を形成し、室温にて冷却する。この際、第2の
酸化金属皮膜3を形成する第2の抵抗皮膜気体は濃度・
組成・温度のいずれかが相違するものである。
Next, the insulating substrate 1 having the first metal oxide film 2 formed on its surface is heated to about 700 ° C., and a solution of tin chloride, methanol and hydrochloric acid is added to antimony, iron, vanadium, chromium, nickel, molybdenum.・ Manganese ・ Copper ・
This first metal oxide is passed through the insulating substrate 1 into a second acid-gold gas formed by sending in high temperature air while vaporizing a resistance liquid containing at least one of zinc, bismuth, cobalt and indium. A second metal oxide film 3 is formed on the surface of the film 2 and cooled at room temperature. At this time, the second resistance film gas forming the second metal oxide film 3 has a concentration
Either the composition or the temperature is different.

【0019】次に、表面に第1・第2の酸化金属皮膜2
・3を形成した絶縁基体1を約700℃に加熱し、塩化
錫・メタノールおよび塩酸を主成分とする抵抗液を気化
させながら高温の空気を送り込んでなる第3の抵抗皮膜
気体中に絶縁基体1を通過させて、第2の酸化金属皮膜
3の表面に第3の酸化金属皮膜4を形成し、室温にて冷
却する。この際、第3の酸化金属皮膜4を形成する第3
の抵抗皮膜気体は、第1の抵抗皮膜気体の濃度・組成・
温度のいずれかが同一であり、かつ、第2の抵抗気体と
いずれかが相違するものである。
Next, the first and second metal oxide films 2 are formed on the surface.
Insulating substrate into the third resistance film gas in which high-temperature air is sent while heating insulating substrate 1 on which 3 is formed to about 700 ° C. and vaporizing the resistance liquid containing tin chloride / methanol and hydrochloric acid as main components 1 is passed to form a third metal oxide film 4 on the surface of the second metal oxide film 3 and cooled at room temperature. At this time, a third metal oxide film 4 forming a third
The resistance film gas of is the concentration / composition of the first resistance film gas.
One of the temperatures is the same, and one of them is different from the second resistance gas.

【0020】次に、表面に第1・第2・第3の酸化金属
皮膜2・3・4を形成した絶縁基体1の両端のそれぞれ
に金属キャップ5を圧入した後、この金属キャップ5の
それぞれに電気的に接続するようにリード線6を溶接す
る。
Next, after the metal caps 5 are press-fitted into both ends of the insulating substrate 1 having the first, second, and third metal oxide films 2, 3, and 4 formed on their surfaces, each of the metal caps 5 is pressed. The lead wire 6 is welded so as to be electrically connected to.

【0021】最後に、少なくとも第3の酸化金属皮膜4
を覆うように塗装にて保護膜7を形成し、抵抗器を製造
するものである。
Finally, at least the third metal oxide film 4
The protective film 7 is formed by coating so that the resistor is manufactured.

【0022】(実施例2)以下、本発明の他の実施例に
おける抵抗器について説明する。実施例1と同一のもの
は同一番号を付し、詳細な説明は省略する。
(Second Embodiment) A resistor according to another embodiment of the present invention will be described below. The same parts as those in the first embodiment are designated by the same reference numerals, and detailed description will be omitted.

【0023】実施例1の構成とは、第2の酸化金属皮膜
3の表面に第1の酸化金属皮膜2より比抵抗が大きくな
る第3の酸化金属皮膜4を設けてなる点が相違するもの
である。
The structure differs from that of the first embodiment in that a third metal oxide film 4 having a larger specific resistance than that of the first metal oxide film 2 is provided on the surface of the second metal oxide film 3. Is.

【0024】また、実施例1の製造方法とは、第2の酸
化金属皮膜3の表面に第1の酸化金属皮膜2より比抵抗
が大きい抵抗液を用いて、第3の酸化金属皮膜4を形成
する点が相違するものである。
The manufacturing method of the first embodiment is different from that of the first metal oxide film 3 in that the third metal oxide film 4 is formed on the surface of the second metal oxide film 3 by using a resistance liquid having a larger specific resistance than that of the first metal oxide film 2. The difference is in the point of formation.

【0025】(比較例)以下、従来例と本発明の実施例
とを比較した比較例について説明する。
(Comparative Example) A comparative example in which the conventional example and the embodiment of the present invention are compared will be described below.

【0026】実験方法としては、従来または本発明で説
明した抵抗器から保護膜を除去し、一定時間定電圧を印
加しながら霧状の水滴を吹きかけた後、10分間放置
し、抵抗値変化率を測定した。
As an experimental method, the protective film was removed from the resistor described in the prior art or the present invention, and a mist-like water droplet was sprayed while applying a constant voltage for a certain period of time and then left for 10 minutes. Was measured.

【0027】図2は、従来例と本発明の実施例と比較し
た時間と抵抗値変化率の関係を示す図である。図2から
明らかなように、本発明の抵抗器は従来の抵抗器と比べ
て水滴噴霧時間が長くても抵抗値変化率は低いので、外
的要因に強く安定しかつ長寿命の抵抗器を提供するもの
である。
FIG. 2 is a diagram showing the relationship between time and resistance change rate in comparison with the conventional example and the embodiment of the present invention. As is clear from FIG. 2, the resistor of the present invention has a low rate of change in resistance value even if the water droplet spraying time is longer than that of the conventional resistor. Therefore, a resistor that is stable against external factors and has a long life is required. It is provided.

【0028】なお、本実施例では抵抗値修正を行わない
抵抗器について説明したが、必要に応じて第3の酸化金
属皮膜をレーザー等で抵抗値を修正しても同様の効果が
得られる。
In this embodiment, the resistor which does not have the resistance value modified has been described, but the same effect can be obtained by modifying the resistance value of the third metal oxide film with a laser as necessary.

【0029】[0029]

【発明の効果】以上のように本発明は抵抗器の特性変化
等に影響を与える水滴等の外的要因からの影響を受けづ
らい抵抗器を提供できるものである。
As described above, the present invention can provide a resistor which is hardly affected by external factors such as water droplets which affect the characteristic change of the resistor.

【0030】また、煙化法を用いることにより量産性に
優れ、安価な抵抗器の製造方法を提供できるものであ
る。
Further, by using the smoke method, it is possible to provide a method for manufacturing a resistor which is excellent in mass productivity and inexpensive.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例における抵抗器の断面図FIG. 1 is a sectional view of a resistor according to an embodiment of the present invention.

【図2】従来例と本発明の実施例と比較した時間と抵抗
値変化率の関係を示す図
FIG. 2 is a diagram showing a relationship between time and a resistance change rate in comparison with a conventional example and an example of the present invention.

【符号の説明】[Explanation of symbols]

1 絶縁基体 2 第1の酸化金属皮膜 3 第2の酸化金属皮膜 4 第3の酸化金属皮膜 1 Insulating Substrate 2 First Metal Oxide Film 3 Second Metal Oxide Film 4 Third Metal Oxide Film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 進藤 ▲泰▼宏 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 横田 康彦 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shindo ▲ Yasu ▼ Hiro 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Yasuhiko Yokota 1006 Kadoma, Kadoma City, Osaka Matsushita Electric Industrial Co., Ltd. In the company

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 絶縁基体と、この絶縁基体の表面に設け
た第1の酸化金属皮膜と、この第1の酸化金属皮膜の表
面に前記第1の酸化金属皮膜より比抵抗値が小さい第2
の酸化金属皮膜と、この第2の酸化金属皮膜の表面に前
記第1の酸化金属皮膜と比抵抗値が等しい第3の酸化金
属皮膜を設けてなる抵抗器。
1. An insulating substrate, a first metal oxide film provided on the surface of the insulating substrate, and a second metal oxide film having a specific resistance value smaller than that of the first metal oxide film on the surface of the first metal oxide film.
And a third metal oxide film having a specific resistance value equal to that of the first metal oxide film on the surface of the second metal oxide film.
【請求項2】 絶縁基体と、この絶縁基体の表面に設け
た第1の酸化金属皮膜と、この第1の酸化金属皮膜の表
面に前記第1の酸化金属皮膜より比抵抗値が小さい第2
の酸化金属皮膜と、この第2の酸化金属皮膜の表面に前
記第1の酸化金属皮膜より比抵抗値が大きい第3の酸化
金属皮膜を設けてなる抵抗器。
2. An insulating substrate, a first metal oxide film provided on the surface of the insulating substrate, and a second metal oxide film having a specific resistance value smaller than that of the first metal oxide film on the surface of the first metal oxide film.
And a third metal oxide film having a specific resistance value larger than that of the first metal oxide film on the surface of the second metal oxide film.
【請求項3】 第2の酸化金属皮膜は、主たる抵抗特性
となるように設けてなる請求項1または2記載の抵抗
器。
3. The resistor according to claim 1, wherein the second metal oxide film is provided so as to have a main resistance characteristic.
【請求項4】 第1・第3の酸化金属皮膜は、第2の酸
化金属皮膜の特性劣化を防ぐように設けてなる請求項1
または2記載の抵抗器。
4. The first and third metal oxide films are provided so as to prevent characteristic deterioration of the second metal oxide film.
Or the resistor according to 2.
【請求項5】 第2の酸化金属皮膜は、酸化錫を主成分
とし、少なくともアンチモン・鉄・バナジウム・クロム
・ニッケル・モリブデン・マンガン・銅・亜鉛・ビスマ
ス・コバルト・インジウムのうち一種を含有してなる請
求項1または2記載の抵抗器。
5. The second metal oxide film is mainly composed of tin oxide and contains at least one of antimony, iron, vanadium, chromium, nickel, molybdenum, manganese, copper, zinc, bismuth, cobalt and indium. The resistor according to claim 1 or 2, comprising:
【請求項6】 第1と第3の酸化金属皮膜は、酸化錫を
主成分とする請求項1または2記載の抵抗器。
6. The resistor according to claim 1, wherein the first and third metal oxide films mainly contain tin oxide.
【請求項7】 加熱した絶縁基体を煙状の第1の抵抗皮
膜気体中を通過させて前記絶縁基体の表面に第1の酸化
金属皮膜を形成し、この第1の酸化金属皮膜を形成した
前記絶縁基体を加熱して第2の抵抗皮膜気体中を通過さ
せて第2の酸化金属皮膜を形成し、この第2の酸化金属
皮膜を形成した前記絶縁基体を加熱して第3の抵抗皮膜
気体中を通過させて第3の酸化金属皮膜を形成してなる
抵抗器の製造方法。
7. A first insulating metal film is formed on the surface of the insulating substrate by passing the heated insulating substrate through a smoke-like first resistance film gas. The insulating base is heated to pass through a second resistance film gas to form a second metal oxide film, and the insulating base having the second metal oxide film formed thereon is heated to generate a third resistance film. A method of manufacturing a resistor, which comprises passing a gas to form a third metal oxide film.
【請求項8】 比抵抗値は、第1の酸化金属皮膜より第
2の酸化金属皮膜が小さいとともに前記第1の酸化金属
皮膜と第3の酸化金属皮膜は等しい請求項7記載の抵抗
器の製造方法。
8. The resistor according to claim 7, wherein a specific resistance value of the second metal oxide film is smaller than that of the first metal oxide film, and the first metal oxide film and the third metal oxide film are equal to each other. Production method.
【請求項9】 比抵抗値は、第1の酸化金属皮膜より第
2の酸化金属皮膜が小さいとともに、前記第1の酸化金
属皮膜より第3の酸化金属皮膜が大きい請求項7記載の
抵抗器の製造方法。
9. The resistor according to claim 7, wherein the specific resistance value of the second metal oxide film is smaller than that of the first metal oxide film and that of the third metal oxide film is larger than that of the first metal oxide film. Manufacturing method.
【請求項10】 第1の酸化金属皮膜と第3の酸化金属
皮膜を形成する抵抗皮膜気体は、濃度、組成、温度のい
ずれかが同一である請求項7記載の抵抗器の製造方法。
10. The method of manufacturing a resistor according to claim 7, wherein the resistance coating gas forming the first metal oxide coating and the third metal oxide coating have the same concentration, composition or temperature.
【請求項11】 第1と第3の酸化金属皮膜を形成する
抵抗皮膜気体は、第1と第3の酸金の主成分が酸化錫と
なるよう設けてなる請求項7記載の抵抗器の製造方法。
11. The resistor according to claim 7, wherein the resistance coating gas forming the first and third metal oxide coatings is provided such that the main component of the first and third acid gold is tin oxide. Production method.
JP7211966A 1995-08-21 1995-08-21 Resistor and its manufacture Pending JPH0963804A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7211966A JPH0963804A (en) 1995-08-21 1995-08-21 Resistor and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7211966A JPH0963804A (en) 1995-08-21 1995-08-21 Resistor and its manufacture

Publications (1)

Publication Number Publication Date
JPH0963804A true JPH0963804A (en) 1997-03-07

Family

ID=16614664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7211966A Pending JPH0963804A (en) 1995-08-21 1995-08-21 Resistor and its manufacture

Country Status (1)

Country Link
JP (1) JPH0963804A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002367805A (en) * 2001-06-04 2002-12-20 Koa Corp Resistor and its manufacturing method
KR100398019B1 (en) * 2001-08-30 2003-09-19 정영찬 Method for manufacturing the film of a high capacity and high property metal oxide film resistor which insulation substrate is substituted with low content alumina

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002367805A (en) * 2001-06-04 2002-12-20 Koa Corp Resistor and its manufacturing method
KR100398019B1 (en) * 2001-08-30 2003-09-19 정영찬 Method for manufacturing the film of a high capacity and high property metal oxide film resistor which insulation substrate is substituted with low content alumina

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