JPH0933873A - Heat treatment device for glass substrate for liquid crystal - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a sufficient temperature rise and sufficient cooling characteristics and make a heat treatment device main body compact by coating the surface of a hot plate with an alumina ceramic material. SOLUTION: On the internal reverse surface of a cavity part 4, two hot plates 5 and 6 for a temperature raising part 7, six hot plates 5 for a soaking part 8, three hot plates 5 for a cooling part 9, and one cold plate 19 are provided in order. The hot plates 5 are made of aluminum and their surfaces are coated with alumina ceramic materials. Consequently, the hot plates 5 are larger in surface radiation rate than a different aluminum plate and the radiation heat conduction quantity from the hot plates 5 to a glass substrate becomes large; and an alumite treatment is performed for a reflecting plate 6, so the surface radiation rate of the reflection plate 6 is high and the radiation heat conduction quantity from the reflecting plate 6 to the glass substrate becomes large. Consequently, the sufficient temperature rise and cooling characteristics can be obtained and the heat treatment device main body 1 can be shortened.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat treatment apparatus for a glass substrate for liquid crystal after applying a polyimide film, a top coat film, a sealant and the like.

[0002]

2. Description of the Related Art In a heat treatment apparatus for a glass substrate for liquid crystal after applying a polyimide film, a top coat film, a sealing agent, etc., there is a difference in setting temperature and processing time. It is as described below.

That is, referring to FIGS. 3 and 4, an inlet portion 2 is provided on one side of the heat treatment apparatus main body 1, an outlet portion 3 is provided on the side facing the inlet portion 2, and a tunnel-shaped cavity 4 is formed. Has been formed. A plurality of hot plates 5 for the temperature raising part 7, a plurality of hot plates 5 for the soaking part 8, and a plurality of hot parts for the cooling part 9 are provided on the lower surface inside the cavity 4 from the inlet part 2 toward the outlet part 3. The plates 5 are sequentially arranged in one row, and a plurality of reflecting plates 6 are installed on the upper surface facing the hot plate 5. The hot plate 5 and the reflector 6
Aluminum is mainly used as the material.

The transport mechanism drives the transport drive unit 11 in the vertical and horizontal directions by the drive motor 10, and the transport drive unit 11 is driven.
The carrier beam 1 by means of a beam support 15 connected to
2, the glass substrates 16 are transported one by one while being supported by the four support fittings 14 installed on the transport beam 12, and placed on the pins 13 provided on the upper part of the hot plate 5 for a certain period of time. A single-wafer type is provided that can be sequentially transferred and transferred after a lapse of a certain time.

Further, a temperature sensor (not shown) and a heater (not shown) are incorporated in the hot plate 5 for the temperature raising section 7 and the hot plate 5 for the soaking section 8, respectively, to reach the set temperature. The heater is ON-OFF controlled as described above. The hot plate 5 for the cooling unit 9 includes a temperature sensor (not shown), a heater (not shown), and a cooling pipe (not shown).
Is installed and the heater is turned on so that the set temperature is reached.
In addition to N-OFF control, a control valve (not shown) of a cooling pipe (not shown) is opened and closed. Room temperature water is always passed through the cold plate 18 for the cooling unit 9.

[0006]

In recent years, liquid crystal displays have been applied to various fields such as information, OA, home appliances, AV, and measuring devices, and accordingly, low cost and large screen liquid crystal displays are required. It has become to. Furthermore, as a heat treatment apparatus for glass substrates for liquid crystals, there is a demand for uniform temperature distribution and compactness.

However, in the conventional heat treatment apparatus for glass substrates for liquid crystals as shown in FIGS. 3 and 4, the material of the hot plate 5 and the reflection plate 6 is aluminum, and no special surface treatment is performed. The emissivity on the surface of the hot plate 5 and the surface of the reflection plate 6 is low, and the glass substrate 16
The amount of radiant heat transferred to is small. As a result, there is a problem that sufficient temperature rising and cooling characteristics cannot be obtained and the heat treatment apparatus main body 1 becomes long and cannot be made compact.

In view of the above problems, it is an object of the present invention to provide a heat treatment device for a glass substrate for liquid crystal which is excellent in temperature rising and cooling characteristics, is compact, and has a uniform temperature distribution.

[0009]

The present invention provides a glass substrate 1
6 is provided with a cavity portion 4 having an inlet portion 2 and an outlet portion 3, and a plurality of hot plates 5 for the temperature raising portion 7 are provided on the inner lower surface of the cavity portion 4 from the inlet portion 2 toward the outlet portion 3; Soaking part 8
Hot plate 5, a plurality of hot plates 5 for cooling section 9, and a cold plate 18 are provided in this order, and a plurality of reflectors 6 are installed on the inner upper surface of the cavity facing each hot plate, and A heat treatment apparatus having a single-wafer-type transfer mechanism for supporting one glass substrate 16 by a plurality of supporting metal fittings 14 movable in the front-rear and left-right directions, and sequentially transferring the glass substrates 16 to the hot plates and cold plates 18 for transfer. The feature is that the surface of each hot plate is coated with alumina ceramics.

[0010]

BEST MODE FOR CARRYING OUT THE INVENTION The structure of the present invention will be described with reference to FIGS. 1 and 2 corresponding thereto. The glass substrate 16 has a tunnel-shaped cavity 4 provided with an inlet 2 and an outlet 3. A plurality of hot plates 5 for the temperature raising part 7, a plurality of hot plates 5 for the soaking part 8, and a plurality of hot plates for the cooling part 9 are provided on the lower surface inside the cavity 4 from the inlet part 2 to the outlet part 3. 5
Are sequentially provided, and a plurality of reflectors 6 are installed on the upper surface of the cavity 4 facing the hot plate 5, respectively. The material of the hot plate 5 used here is aluminum, and the surface thereof is coated with alumina ceramics.
The material of the reflection plate 6 is also aluminum, and the surface thereof is anodized.

The transport mechanism is installed on the transport beam 12 by driving the transport drive unit 11 up, down, front, rear, left and right by the drive motor 10, and transmitting the movement to the transport beam 12 by the beam support 15 connected to the transport drive unit 11. Four support brackets 1 each
4, the glass substrates 16 are transported one by one while being supported, and the pins 13 provided on the upper surface of the hot plate 5 for a certain time.
It is provided with a single-wafer-type transfer mechanism that can be transferred and transferred after a certain period of time.

Further, as described in the prior art, the hot plate 5 for the temperature raising section 7 and the hot plate 5 for the soaking section 8 each have a temperature sensor and a heater incorporated therein, and are controlled so as to maintain the set temperature. Has been done. Further, a temperature sensor and a heater are also incorporated in the hot plate 5 for the cooling unit 9, and a cooling pipe is also incorporated for temperature control. Basically, it is possible to control the temperature if the hot plate 5 for the cooling unit 9 also has a heater, but there is a possibility that the temperature will be higher than the set temperature due to the heat from the adjacent higher temperature plate. A cooling pipe is provided to prevent this.

[0013]

According to the present invention, since the surface of each hot plate 5 is coated with alumina ceramics, the surface emissivity of the hot plate 5 is higher than that of a simple aluminum plate, and radiant heat transfer from the hot plate 5 to the glass substrate 16 is achieved. In addition to the increase in the amount, the surface emissivity of the reflection plate 6 is high and the amount of radiant heat transferred from the reflection plate 6 to the glass substrate 16 is also large because the reflection plate 6 is anodized. As a result, sufficient temperature rising and cooling characteristics can be obtained, the heat treatment apparatus main body 1 can be shortened, and the size can be reduced. Therefore, according to the present invention, as described above, it is possible to make the heat treatment apparatus for the glass substrate for liquid crystal compact and make the temperature distribution uniform by improving the temperature rising and cooling characteristics.

[0014]

Next, embodiments of the present invention will be described. 1 of the present invention
An embodiment will be described with reference to FIGS. 1 and 2. As described above, two hot plates 5 for the temperature raising part 7 and six hot plates 5 and 3 for the soaking part 8 are provided on the lower surface inside the cavity 4. Hot plate 5 for cooling unit 9 and cold plate 18
Are sequentially provided. The material of the hot plate 5 is aluminum, and the surface thereof is coated with alumina ceramics. The material of the reflection plate 6 is aluminum, and the surface thereof is anodized.

Hot plate 5 for temperature raising section 7 and soaking section 8
Each hot plate 5 has a temperature sensor (not shown) and a heater (not shown) incorporated therein to control the temperature to a preset temperature. In addition to the temperature sensor and the heater, a cooling pipe (not shown) is incorporated in the hot plate 5 for the cooling unit 9, and control is performed by opening and closing the control valve of the cooling pipe. Room temperature water is always passed through the cold plate 18.

The set temperature of each hot plate 5 is set so that the temperature rises in order from the inlet section 2 in the temperature raising section 7, and the same temperature is set in all six sheets in the soaking section 8.
In the cooling unit 9, the temperature is set to decrease in order from the inlet 2.

The transport mechanism is of the single-wafer type described above, and the drive motor 10 drives the transport drive section 11 vertically and horizontally and
The beam support 15 connected to the transport driving unit 11 conveys the movement to the transport beam 12, and each of the four support fittings 14 installed on the transport beam 12 makes one glass substrate 16 at a time.
Is being transported while supporting.

As a result of heat-treating the glass substrate for liquid crystal with the takt time of 30 seconds, the temperature distribution can be made uniform, and the polyimide film coated on the surface of the glass substrate 16, the top coat film, and the sealing agent have uneven burning. I didn't.

In terms of emissivity, the infrared absorptivity is measured using a Fourier transform infrared spectrophotometer (called FT-IR) according to Kirchhoff's law that emissivity is equal to absorptivity. By doing so, the emissivity can be obtained. The emissivity measurement value of the hot plate of the aluminum material which has been conventionally used without any special treatment on the surface is 0.15, and the emissivity of the surface of the hot plate 5 of the present invention whose surface is coated with alumina ceramics is It was 0.80. Then, the measured emissivity of the surface of the reflection plate 6 whose surface was anodized was 0.78. The numerical value mentioned here indicates the ratio when the emissivity of a black body is 1.

[0020]

According to the present invention, since the surface of the hot plate is coated with alumina ceramics, the amount of radiant heat transferred from the hot plate to the glass substrate can be increased, and at the same time, the surface of the reflection plate is anodized. As a result, the amount of radiant heat transferred from the reflector to the glass substrate can be increased. As a result, sufficient temperature rising and cooling characteristics can be obtained, and the number of hot plates in the temperature raising section and the cooling section can be reduced, so that the heat treatment apparatus main body can be made compact.

[Brief description of drawings]

FIG. 1 is a cross-sectional view of essential parts of a heat treatment apparatus for a glass substrate for liquid crystal according to an embodiment of the present invention.

FIG. 2 is a sectional view taken along line AA shown in FIG.

FIG. 3 is a cross-sectional view of essential parts of a heat treatment apparatus for a glass substrate for liquid crystal according to a conventional example.

FIG. 4 is a sectional view taken along the line AA shown in FIG. 3;

[Explanation of Codes] Heat treatment equipment body 2. Entrance 3. Exit
4. Cavity 5. Hot plate 6. reflector
7. Temperature raising unit 8. Soaking part 9. Cooling unit 10. Drive motor 11. Transport drive unit 12. Carrier beam
13. Pin 14. Support bracket 15. Beam support 16. Glass substrate 17. Coro conveyor 18. Cold plate

Front page continuation (72) Inventor Makoto Saito 3-1-1 Kanda Surugadai, Chiyoda-ku, Tokyo 2 Inside Hitachi Chemical Techno Plant Co., Ltd. (72) Inventor Masao Fukudome 3-1-2 Kanda Surugadai, Chiyoda-ku, Tokyo Hitachi Chemical Inside Techno Plant Co., Ltd.

Claims (2)

[Claims] 1. A cavity portion having an inlet portion and an outlet portion of a glass substrate is provided, and a plurality of hot plates for a temperature raising portion facing from the inlet portion to the outlet portion and a plurality of uniform portions are provided on an inner lower surface of the cavity portion. A hot plate for the heating part, a plurality of hot plates for the cooling part, and a cold plate are provided in this order, and a plurality of reflectors are installed on the inner upper surface of the cavity facing each hot plate, and the top, bottom, front, back, left, and right What is claimed is: 1. A heat treatment apparatus having a single-wafer-type transfer mechanism for supporting one glass substrate by a plurality of movable support fittings and sequentially transferring and transporting the glass plate on each of the hot plate and cold plate. A heat treatment device for a glass substrate for liquid crystal, which is provided with an alumina ceramics coating. 2. The heat treatment apparatus for a glass substrate for liquid crystal according to claim 1, wherein the surface of the reflector is anodized.