JPH0931167A - Liquid epoxy resin composition for sealing and cured material thereof - Google Patents

Liquid epoxy resin composition for sealing and cured material thereof

Info

Publication number
JPH0931167A
JPH0931167A JP7182503A JP18250395A JPH0931167A JP H0931167 A JPH0931167 A JP H0931167A JP 7182503 A JP7182503 A JP 7182503A JP 18250395 A JP18250395 A JP 18250395A JP H0931167 A JPH0931167 A JP H0931167A
Authority
JP
Japan
Prior art keywords
epoxy resin
allylated
resin
resin composition
liquid epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7182503A
Other languages
Japanese (ja)
Other versions
JP3633674B2 (en
Inventor
Tomoyuki Kawabata
朋之 川畑
Yuzo Ono
有三 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP18250395A priority Critical patent/JP3633674B2/en
Publication of JPH0931167A publication Critical patent/JPH0931167A/en
Application granted granted Critical
Publication of JP3633674B2 publication Critical patent/JP3633674B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a sealing epoxy resin composition having low viscosity and excellent in heat and moisture resistances by using an epoxy resin, a specified allylated phenol resin and a cure accelerator as the constituents. SOLUTION: This composition is obtained by blending an epoxy resin with an allylated phenol resin comprising an allylated novolak phenol resin which contains at most 10 area% allylated phenol aralkyl resin and/or binuclear components, in which trinuclear components account for at least 50 area% of the remaining part excluding the binuclear components and in which the total of the trinuclear component content and the tetranuclear component content is at least 75 area% in an amount sufficient to provide a stoichiometric ratio of the hydroxy groups to the epoxy groups of the epoxy resin of (0.2 to 2):1 and at least one cure accelerator selected from the group consisting of organophosphine compounds and nitrogen-containing cyclic compounds in an amount of 0.01-10 pts.wt. based on 100 pts.wt. epoxy resin.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は封止用液状エポキシ
樹脂組成物に関する。詳しくは本発明は、電気・電子部
品の表面を保護する低粘度、耐熱性および耐湿性に優れ
た封止用液状エポキシ樹脂組成物に関するものである。
より具体的には、回路基板上のIC、LSI等の電気・
電子部品の素子を封止することを目的とする封止用液状
エポキシ樹脂組成物に関するものである。
TECHNICAL FIELD The present invention relates to a liquid epoxy resin composition for encapsulation. More specifically, the present invention relates to a liquid epoxy resin composition for encapsulation that protects the surface of electric / electronic parts and has excellent low viscosity, heat resistance and moisture resistance.
More specifically, it can be used for electrical equipment such as IC and LSI on a circuit board.
The present invention relates to a liquid epoxy resin composition for sealing, which is intended to seal an element of an electronic component.

【0002】[0002]

【従来の技術】従来、IC、LSI等はエポキシ樹脂、
セラミックス等で封止され、それらを基板上に装着して
使用されてきた。しかしながら近年、電気・電子機器製
品のの多種多様化、軽薄短小化が求められるため、実装
面積あるいは体積を小さくする手段として、ICやLS
I等を基板に直接接続する表面実装技術を用いて実装す
ることが主流となりつつある。基板上に直接接続された
半導体素子は、通常液状エポキシ樹脂で封止される。こ
の封止材には、トランスファー成形材料よりもさらに粘
度が低いことが要求され、硬化物に関しては高信頼性、
特に耐熱性、耐湿性が要求されている。
2. Description of the Related Art Conventionally, ICs, LSIs, etc. are epoxy resins,
It has been used by mounting it on a substrate, which is sealed with ceramics or the like. However, in recent years, a variety of electric and electronic equipment products are required, and lighter, thinner, shorter, and smaller products are required.
It is becoming mainstream to mount using a surface mounting technique for directly connecting I etc. to a substrate. The semiconductor element directly connected to the substrate is usually sealed with liquid epoxy resin. This encapsulant is required to have a lower viscosity than the transfer molding material, and has high reliability for cured products.
Particularly, heat resistance and moisture resistance are required.

【0003】これらの要求を満たすために、アリル基含
有樹脂を含む液状エポキシ樹脂組成物が提案されてい
る。例えば、特開平4−249526号にはアリル化ノ
ボラックを含む液状エポキシ樹脂成形材料が開示されて
いる。ただし、アリル化ノボラックの製造方法は開示さ
れておらず、商品名の記載もない。また、特開平4−3
25544号にはエポキシ樹脂に2−アリルフェノール
を部分的に反応させてなるアリル基含有エポキシ樹脂を
含む液状エポキシ樹脂組成物が開示されている。しかし
ながら、これらの液状エポキシ樹脂組成物は硬化剤成分
として、酸無水物あるいはアミン類を併用しているた
め、硬化物は加水分解しやすく、耐湿性に問題があるほ
かに、半導体装置内のリードフレームが腐食するという
問題も挙げられる。
In order to meet these requirements, a liquid epoxy resin composition containing an allyl group-containing resin has been proposed. For example, JP-A-4-249526 discloses a liquid epoxy resin molding material containing an allylated novolak. However, the method for producing the allylated novolac is not disclosed, and the trade name is not described. In addition, JP-A-4-3
No. 25544 discloses a liquid epoxy resin composition containing an allyl group-containing epoxy resin obtained by partially reacting an epoxy resin with 2-allylphenol. However, since these liquid epoxy resin compositions use an acid anhydride or amines together as a curing agent component, the cured product is easily hydrolyzed and has a problem in moisture resistance. Another problem is that the frame corrodes.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的は、低粘
度で耐熱性、耐湿性に優れた封止用液状エポキシ樹脂組
成物を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a liquid epoxy resin composition for encapsulation which has a low viscosity and is excellent in heat resistance and moisture resistance.

【0005】[0005]

【課題を解決するための手段】本発明者らは上記課題を
解決するために鋭意検討した結果、上記問題を解決する
に至り、本発明を完成した。
The inventors of the present invention have made extensive studies to solve the above problems, and as a result, have solved the above problems and completed the present invention.

【0006】すなわち、本発明は、 (A)脂環式エポキシ樹脂 (B)アリル化フェノール樹脂 (C)硬化促進剤 を含んで成ることを特徴とする封止用液状エポキシ樹脂
組成物、および、
That is, the present invention provides a liquid epoxy resin composition for sealing, which comprises (A) an alicyclic epoxy resin, (B) an allylated phenolic resin (C) a curing accelerator, and

【0007】アリル化フェノール樹脂が、アリル化フェ
ノールアラルキル型樹脂および2核体含有率が10面積
%以下であって、2核体を除いた残りの部分の3核体含
有率が50面積%以上、かつ、3核体含有率と4核体含
有率の和が75面積%以上のアリル化ノボラック型フェ
ノール系樹脂からなる群から選ばれた少なくとも1種で
あることを特徴とする封止用液状エポキシ樹脂組成物、
および、
The allylated phenolic resin has an allylated phenol aralkyl type resin and a binuclear content of 10 area% or less, and the remaining trinuclear body content excluding the binuclear body is 50 area% or more. And a sealing liquid characterized by being at least one selected from the group consisting of allylated novolac-type phenolic resins having a sum of trinuclear body content and tetranuclear body content of 75 area% or more. Epoxy resin composition,
and,

【0008】アリル化フェノール樹脂が、アリル化フェ
ノールアラルキル型樹脂であることを特徴とする封止用
液状エポキシ樹脂組成物、および、
A liquid epoxy resin composition for sealing, wherein the allylated phenol resin is an allylated phenol aralkyl type resin, and

【0009】アリル化フェノール樹脂が、2核体含有率
が10面積%以下であって、2核体を除いた残りの部分
の3核体含有率が50面積%以上、かつ、3核体含有率
と4核体含有率の和が75面積%以上のアリル化ノボラ
ック型フェノール系樹脂であることを特徴とする請求項
1記載の封止用液状エポキシ樹脂組成物、および、
The allylated phenolic resin has a binuclear content of 10 area% or less, a trinuclear content of the remaining portion excluding the binuclear is 50 area% or more, and a trinuclear content Ratio and tetranuclear content is 75% by area or more of allylated novolac type phenolic resin, Liquid epoxy resin composition for encapsulation according to claim 1,

【0010】脂環式エポキシ樹脂が(3’,4’−エポ
キシシクロヘキシルメチル)−3,4−エポキシシクロ
ヘキサンカルボキシレートであることを特徴とする封止
用液状エポキシ樹脂組成物、および、
A liquid epoxy resin composition for sealing, wherein the alicyclic epoxy resin is (3 ', 4'-epoxycyclohexylmethyl) -3,4-epoxycyclohexanecarboxylate, and

【0011】エポキシ樹脂とアリル化フェノール樹脂の
配合において、エポキシ樹脂のエポキシ基に対してアリ
ル化フェノール樹脂の水酸基が化学量論で0.2〜2と
なるように配合することを特徴とする封止用液状エポキ
シ樹脂組成物、および、
In the blending of the epoxy resin and the allylated phenolic resin, the hydroxyl group of the allylated phenolic resin is stoichiometrically 0.2 to 2 with respect to the epoxy groups of the epoxy resin. Liquid epoxy resin composition for stopping, and

【0012】硬化促進剤が有機ホスフィン化合物および
含窒素環状化合物からなる群から選ばれた少なくとも1
種であることを特徴とする封止用液状エポキシ樹脂組成
物、および、
The curing accelerator is at least one selected from the group consisting of organic phosphine compounds and nitrogen-containing cyclic compounds.
Liquid epoxy resin composition for sealing, characterized by being a seed, and

【0013】硬化促進剤の量が脂環式エポキシ樹脂10
0重量部に対して0.01〜10重量部であることを特
徴とする封止用液状エポキシ樹脂組成物、および、
The amount of the curing accelerator is a cycloaliphatic epoxy resin 10
0.01 to 10 parts by weight relative to 0 parts by weight, a liquid epoxy resin composition for sealing, and

【0014】上記封止用液状エポキシ樹脂組成物の硬化
物に関する。
The present invention relates to a cured product of the liquid epoxy resin composition for sealing.

【0015】[0015]

【発明の実施の形態】以下、本発明を詳細に説明する。
本発明に用いる(A)成分であるエポキシ樹脂とは、1
分子中に2個以上のエポキシ基を有する硬化可能なエポ
キシ樹脂であればいかなるものでもよい。例えば、ビス
フェノールA型エポキシ樹脂、ビスフェノールF型エポ
キシ樹脂等のフェノール誘導体エポキシ樹脂、(3’,
4’−エポキシシクロヘキシルメチル)−3,4−エポ
キシシクロヘキサンカルボキシレート、(3’,4’−
エポキシ−6’−メチルシクロヘキシルメチル)−3,
4−エポキシ−6−メチルシクロヘキサンカルボキシレ
ート等の脂環族エポキシ樹脂、ジシクロペンタジエン−
フェノール樹脂グリシジルエーテル等の環状テルペン−
フェノール共重合体グリシジルエーテル等が挙げられ
る。これらのエポキシ樹脂は単独で使用してもよく、2
種類以上を併用してもよい。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below.
The epoxy resin which is the component (A) used in the present invention is 1
Any curable epoxy resin having two or more epoxy groups in the molecule may be used. For example, phenol derivative epoxy resin such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, (3 ′,
4'-epoxycyclohexylmethyl) -3,4-epoxycyclohexanecarboxylate, (3 ', 4'-
Epoxy-6'-methylcyclohexylmethyl) -3,
Alicyclic epoxy resin such as 4-epoxy-6-methylcyclohexanecarboxylate, dicyclopentadiene-
Cyclic terpenes such as phenolic resin glycidyl ether
Examples thereof include phenol copolymer glycidyl ether. These epoxy resins may be used alone or 2
More than one type may be used in combination.

【0016】これらのうち好ましくは、(3’,4’−
エポキシシクロヘキシルメチル)−3,4−エポキシシ
クロヘキサンカルボキシレートである。
Of these, preferably (3 ', 4'-
Epoxycyclohexylmethyl) -3,4-epoxycyclohexanecarboxylate.

【0017】本発明の(B)成分であるアリル化フェノ
ール樹脂は、フェノール樹脂類をアリルエーテル化し、
得られたアリルエーテル化フェノール樹脂を加熱しクラ
イゼン転位させる周知の方法で得ることができる。
The allylated phenolic resin which is the component (B) of the present invention is obtained by allyl etherifying phenolic resins,
It can be obtained by a known method in which the obtained allyl etherified phenol resin is heated to undergo Claisen rearrangement.

【0018】具体的には、例えば、ベースレジンとなる
フェノール樹脂を有機溶媒に溶解したのち、アルカリを
添加してフェノラートとし、これに塩化アリル、臭化ア
リル、ヨウ化アリル等のアリルハライドを加えて室温〜
100℃で1〜5時間反応させてフェノール性水酸基を
アリルエーテル化する。
Specifically, for example, a phenol resin as a base resin is dissolved in an organic solvent, and then an alkali is added to obtain a phenolate. To this, an allyl halide such as allyl chloride, allyl bromide or allyl iodide is added. Room temperature ~
The reaction is carried out at 100 ° C. for 1 to 5 hours to allyl etherify the phenolic hydroxyl group.

【0019】ここで使用する有機溶媒としてはn−プロ
パノール、n−ブタノール等のアルコール類、アセト
ン、メチルエチルケトン等のケトン類、N,N−ジメチ
ルホルムアミド、ジメチルスルホキシド等の非プロトン
性極性溶媒が挙げられる。使用する溶媒によってエーテ
ル化反応生成物の収率が変化するが、上記の有機溶媒を
使用すれば通常95%以上の反応率でエーテル化反応は
進行する。得ようとする樹脂の使用目的によって溶媒を
変えれば良いので、フェノール樹脂とアリルエーテル化
物が可溶の溶媒であれば使用できる。また、アルカリは
水酸化カリウム、水酸化ナトリウム等のアルカリ金属の
水酸化物が挙げられる。その使用量はアリルエーテル化
したいフェノール性水酸基に対して当量のアルカリを使
用する。加えるアリルハライドの量は、アルカリに対し
て当量以上である。
Examples of the organic solvent used here include alcohols such as n-propanol and n-butanol, ketones such as acetone and methyl ethyl ketone, and aprotic polar solvents such as N, N-dimethylformamide and dimethyl sulfoxide. . The yield of the etherification reaction product changes depending on the solvent used, but when the above organic solvent is used, the etherification reaction usually proceeds at a reaction rate of 95% or more. Since the solvent may be changed depending on the purpose of use of the resin to be obtained, any solvent in which the phenol resin and the allyl ether compound are soluble can be used. Examples of the alkali include hydroxides of alkali metals such as potassium hydroxide and sodium hydroxide. The amount used is an alkali equivalent to the phenolic hydroxyl group to be allyl etherified. The amount of allyl halide added is equal to or greater than the amount of alkali.

【0020】アリル化フェノール樹脂は、得られたアリ
ルエーテル化フェノール樹脂を160〜250℃程度ま
で加熱することにより、エーテル結合していたアリル基
が転位して本発明のアリル化フェノール樹脂を得ること
ができる。このアリル基は通常フェノール性水酸基に対
してオルソ位に転位するが、パラ位に転位する場合もあ
る。
The allylated phenolic resin is obtained by heating the obtained allyl etherified phenolic resin to about 160 to 250 ° C. so that the allyl group which had been ether-bonded is rearranged to obtain the allylated phenolic resin of the present invention. You can This allyl group is usually rearranged to the ortho position with respect to the phenolic hydroxyl group, but it may be rearranged to the para position.

【0021】以下、アリル化フェノール樹脂について、
さらに具体的に説明する。本発明のアリル化フェノール
アラルキル型樹脂を得るには、フェノールアラルキル型
樹脂をベースレジンとして上記の方法によって得ること
ができる。
Hereinafter, regarding the allylated phenol resin,
This will be described more specifically. In order to obtain the allylated phenol aralkyl type resin of the present invention, the phenol aralkyl type resin can be used as a base resin by the above method.

【0022】フェノールアラルキル型樹脂は以下のよう
にして得られる。アラルキル化合物1モルに対して、フ
ェノール性化合物を通常1.0〜4.0モルの範囲で、
好ましくは1.5〜3.0モルの範囲で加え、酸触媒の
存在下あるいは無触媒でそのまま昇温して後述の温度で
反応させる。反応終了後、未反応のフェノールをを真空
下で留去させて得られた樹脂が上記のフェノールアラル
キル型樹脂である。
The phenol aralkyl type resin is obtained as follows. With respect to 1 mol of the aralkyl compound, the phenolic compound is usually in the range of 1.0 to 4.0 mol,
Preferably, it is added in the range of 1.5 to 3.0 mol, and the temperature is raised as it is in the presence of an acid catalyst or without a catalyst, and the reaction is carried out at the temperature described below. After completion of the reaction, the resin obtained by distilling off unreacted phenol under vacuum is the above-mentioned phenol aralkyl type resin.

【0023】この反応に使用されるフェノール性化合物
としては、フェノール性水酸基を有する化合物であれば
いかなる化合物でもよく、例えば、フェノール、o−ク
レゾール、p−クレゾール、m−クレゾール、2,6−
キシレノール、p−tert−ブチルフェノール等のア
ルキル置換フェノール類、p−フェニルフェノール等の
芳香族置換フェノール類、α−ナフトール、β−ナフト
ール等のナフトール類が挙げられる。
The phenolic compound used in this reaction may be any compound having a phenolic hydroxyl group, for example, phenol, o-cresol, p-cresol, m-cresol, 2,6-.
Examples include alkyl-substituted phenols such as xylenol and p-tert-butylphenol, aromatic-substituted phenols such as p-phenylphenol, and naphthols such as α-naphthol and β-naphthol.

【0024】また、この反応に使用されるアラルキル化
合物としては、縮合付加が可能である2価のハロメチル
基、ヒドロキシメチル基、アルコキシメチル基等を有す
る芳香環化合物が使用される。例えば、α,α’−ジク
ロロ−p−キシレン、α,α’−ジクロロ−m−キシレ
ン、α,α’−ジクロロ−o−キシレン等のジハロメチ
ル芳香環化合物、p−キシリレングリコール等のジヒド
ロキシメチル芳香環化合物、α,α’−ジメトキシ−p
−キシレン、α,α’−ジメトキシ−m−キシレン、
α,α’−ジメトキシ−o−キシレン等のジアルコキシ
メチル芳香環化合物が挙げられる。
As the aralkyl compound used in this reaction, an aromatic ring compound having a divalent halomethyl group, a hydroxymethyl group, an alkoxymethyl group or the like which can be condensed and added is used. For example, dihalomethyl aromatic ring compounds such as α, α′-dichloro-p-xylene, α, α′-dichloro-m-xylene, α, α′-dichloro-o-xylene, and dihydroxymethyl such as p-xylylene glycol. Aromatic ring compound, α, α'-dimethoxy-p
-Xylene, α, α'-dimethoxy-m-xylene,
Examples include dialkoxymethyl aromatic ring compounds such as α, α′-dimethoxy-o-xylene.

【0025】触媒としては、塩化第二錫、塩化亜鉛、塩
化第二鉄、塩化第二銅、硫酸第二銅、硫酸第一水銀、硫
酸第二水銀、塩化第一水銀、塩化第二水銀、硫酸銀、塩
化銀、硫酸水素ナトリウム、等の無機化合物、あるい
は、硫酸、モノエチル硫酸、ジエチル硫酸、ジメチル硫
酸等の硫酸化合物、p−トルエンスルホン酸、p−フェ
ノールスルホン酸、メタンスルホン酸等の有機スルホン
酸類が使用される。これら触媒は単独で使用するかまた
は併用してもよい。触媒の使用量は、フェノール性化合
物とアラルキル化合物の全重量の0.01〜5重量%で
ある。
As the catalyst, stannic chloride, zinc chloride, ferric chloride, cupric chloride, cupric sulfate, mercuric sulfate, mercuric sulfate, mercuric chloride, mercuric chloride, Inorganic compounds such as silver sulfate, silver chloride and sodium hydrogen sulfate, sulfuric acid compounds such as sulfuric acid, monoethyl sulfuric acid, diethyl sulfuric acid and dimethyl sulfuric acid, organic compounds such as p-toluenesulfonic acid, p-phenolsulfonic acid and methanesulfonic acid Sulfonic acids are used. These catalysts may be used alone or in combination. The amount of the catalyst used is 0.01 to 5% by weight based on the total weight of the phenolic compound and the aralkyl compound.

【0026】アラルキル化合物にジハロメチル芳香環化
合物を用いた場合は、触媒を使用しなくても反応は進行
する。
When a dihalomethyl aromatic ring compound is used as the aralkyl compound, the reaction proceeds without using a catalyst.

【0027】反応温度は通常110℃以上である。11
0℃より低い場合、反応は極端に遅くなる。また、反応
時間を短縮するためには約130〜240℃の温度範囲
が望ましい。反応時間は通常1〜20時間である。
The reaction temperature is usually 110 ° C. or higher. 11
When it is lower than 0 ° C, the reaction becomes extremely slow. Further, in order to shorten the reaction time, a temperature range of about 130 to 240 ° C. is desirable. The reaction time is usually 1 to 20 hours.

【0028】さらに、必要に応じて、比較的高沸点の有
機溶剤を用いることができる。例えば、メタノール、エ
タノール、n−プロパノール,イソプロパノール、n−
ブタノール、tert−ブタノール等のアルコール、ト
ルエン、キシレン、メシチレン等の芳香族化合物が挙げ
られる。
Furthermore, if necessary, an organic solvent having a relatively high boiling point can be used. For example, methanol, ethanol, n-propanol, isopropanol, n-
Examples thereof include alcohols such as butanol and tert-butanol, and aromatic compounds such as toluene, xylene and mesitylene.

【0029】次に、本発明の2核体含有率が10面積%
以下であって、2核体を除いた残りの部分の3核体含有
率が50面積%以上、かつ、3核体含有率と4核体含有
率の和が75面積%以上のアリル化ノボラック型フェノ
ール系樹脂について詳細な説明をする。アリル化ノボラ
ック型フェノール系樹脂は、以下に示す核体分布を制御
したノボラック型フェノール系樹脂を原料とすることで
得られる。
Next, the binuclear content of the present invention is 10 area%.
The following is an allylated novolak in which the trinuclear body content of the remaining portion excluding the binuclear body is 50 area% or more, and the sum of the trinuclear body content rate and the tetranuclear body content rate is 75 area% or more. The type phenolic resin will be described in detail. The allylated novolak type phenolic resin is obtained by using the following novolak type phenolic resin with controlled distribution of the nucleus.

【0030】すなわち、2核体含有率が10面積%以下
であって、2核体を除いた残りの部分の3核体含有率が
50面積%以上、かつ、3核体含有率と4核体含有率の
和が75面積%以上のノボラック型フェノール系樹脂を
ベースレジンとして上記のアリル化の手法によりアリル
化ノボラック型フェノール系樹脂を得ることができる。
That is, the content of the binuclear body is 10 area% or less, the content of the trinuclear body in the remaining portion excluding the binuclear body is 50 area% or more, and the content of the trinuclear body is equal to 4 cores. An allylated novolak type phenolic resin can be obtained by the above allylation method using a novolak type phenolic resin having a total body content of 75 area% or more as a base resin.

【0031】本発明のアリル化ノボラック型フェノール
系樹脂のベースレジンとなるノボラック型フェノール系
樹脂の製造の一例を示す。
An example of the production of the novolak type phenolic resin which is the base resin of the allylated novolak type phenolic resin of the present invention will be shown.

【0032】まず最初にフェノール類をホルムアルデヒ
ドに対して4〜30モル倍(以下P/F=4〜30と
略)の割合で混合し、酸性触媒を添加して60〜100
℃で2〜5時間縮合反応を行って初期縮合物を製造す
る。次いで、得られた初期縮合物を大気圧下に150〜
160℃程度まで加熱して水および少量のフェノール類
を取り除き、さらに減圧下に160〜180℃程度まで
加熱して未反応のフェノール類を取り除く。次にマクマ
ホンパッキング等の充填物を付した装置により1〜5m
mHgの減圧下、さらに220〜250℃まで温度を上
げて蒸留を行い、缶出物として2核体含有率が低く3核
体含有率が高いノボラック型フェノール系樹脂を得るこ
とができる。
First, phenols are mixed with formaldehyde at a ratio of 4 to 30 times by mole (hereinafter, P / F = 4 to 30) and an acidic catalyst is added to 60 to 100.
The condensation reaction is performed at 2 ° C. for 2 to 5 hours to produce an initial condensation product. Then, the obtained initial condensate is heated under atmospheric pressure to 150-
Water and a small amount of phenols are removed by heating to about 160 ° C., and unreacted phenols are removed by heating under reduced pressure to about 160 to 180 ° C. Next, 1 to 5 m with a device equipped with packing such as McMahon packing
The temperature is further raised to 220 to 250 ° C. under reduced pressure of mHg to carry out distillation to obtain a novolac-type phenolic resin having a low content of dinuclear bodies and a high content of trinuclear bodies as a bottom product.

【0033】このノボラック型フェノール系樹脂の原料
であるフェノール類としてはフェノールの他に、例え
ば、クレゾール、オルソまたはパラ、メタ置換アルキル
フェノール類を例示できる。
Examples of the phenols as the raw material of the novolac type phenolic resin include cresol, ortho or para, and meta-substituted alkylphenols in addition to phenol.

【0034】使用するホルムアルデヒド等価体としては
ホルマリン、パラホルムアルデヒド、ヘキサメチレンテ
トラミン、トリオキサンおよび環状ホルマール等を例示
できる。ホルムアルデヒド等価体とフェノール類の反応
に用いる酸性触媒としては、塩酸、硫酸、パラトルエン
スルホン酸、シュウ酸等の有機酸および無機酸が挙げら
れる。
Examples of formaldehyde equivalents used include formalin, paraformaldehyde, hexamethylenetetramine, trioxane and cyclic formal. Examples of the acidic catalyst used for the reaction between the formaldehyde equivalent and the phenols include organic acids such as hydrochloric acid, sulfuric acid, paratoluenesulfonic acid and oxalic acid, and inorganic acids.

【0035】このノボラック型フェノール系樹脂を得る
ための反応モル比はP/F=4以上であり、好ましくは
8以上である。3核体以上の成分の含有率の割合はこの
反応モル比によって大体コントロールでき、反応モル比
が大きい程3核体含有率の高い樹脂が得られる。
The reaction molar ratio for obtaining this novolac type phenolic resin is P / F = 4 or more, preferably 8 or more. The content ratio of the trinuclear or higher component can be roughly controlled by this reaction molar ratio, and the higher the reaction molar ratio, the higher the resin having the trinuclear content.

【0036】2核体含有率は蒸留時の温度、圧力によっ
てコントロールできる。2核体除去はこのように減圧蒸
留によってもよいが、その他抽出、水蒸気蒸留によって
も良い。抽出方法としては例えば、フェノール系樹脂に
対して貧溶媒であるトルエン、キシレン等で繰り返し洗
うという方法で2核体を除去できる。水蒸気蒸留として
は例えば不活性ガスや水蒸気を吹き込みながら減圧下に
蒸留を行うという方法で2核体を除去することができ
る。
The binuclear content can be controlled by the temperature and pressure during distillation. The removal of the binuclear body may be carried out by vacuum distillation as described above, but it may also be carried out by extraction or steam distillation. As an extraction method, for example, the binuclear body can be removed by repeatedly washing with a poor solvent such as toluene or xylene against the phenolic resin. As the steam distillation, for example, the dinuclear body can be removed by a method of performing distillation under reduced pressure while blowing an inert gas or steam.

【0037】この蒸留の缶出物として得られる、2核体
含有率が低く3核体含有率の高い樹脂をアリル化ノボラ
ック型フェノール系樹脂のベースレジンとして用いるこ
とができる。
A resin having a low binuclear content and a high trinuclear content, which is obtained as a bottom product of this distillation, can be used as a base resin for an allylated novolac type phenolic resin.

【0038】また、留出した2核体は有用なビスフェノ
ールF類として利用できる。
Further, the distilled binuclear body can be utilized as useful bisphenol Fs.

【0039】本発明の(C)成分である硬化促進剤とし
ては、一般のエポキシ樹脂の硬化に用いられる硬化促進
剤が使用可能である。好ましくは、有機ホスフィン化合
物、含窒素環状化合物が挙げられる。これらは単独で使
用してもよく、2種以上を併用しても良い。
As the curing accelerator which is the component (C) of the present invention, a curing accelerator used for curing general epoxy resins can be used. Preferred are organic phosphine compounds and nitrogen-containing cyclic compounds. These may be used alone or in combination of two or more.

【0040】有機ホスフィン化合物としては、例えばト
リフェニルホスフィン、トリトリルホスフィン等のホス
フィン化合物、トリフェニルホスフィンオキサイド等の
ホスフィンオキサイド化合物、トリフェニルホスフィン
・トリフェニルボラン等のホスフィン−ボラン錯体等が
挙げられるが、これらに限定するものではない。また、
これらを単独で使用してもよく、2種以上を併用しても
よい。
Examples of the organic phosphine compound include phosphine compounds such as triphenylphosphine and tritolylphosphine, phosphine oxide compounds such as triphenylphosphine oxide, and phosphine-borane complexes such as triphenylphosphine / triphenylborane. However, the present invention is not limited to these. Also,
These may be used alone or in combination of two or more.

【0041】含窒素環状化合物としては、例えば2−エ
チル−4−メチルイミダゾール、2−フェニル−4−メ
チル−5−ヒドロキシルメチルイミダゾール、2−フェ
ニル−4,5−ジヒドロキシルメチルイミダゾール等の
イミダゾール化合物、1,8−ジアザビシクロ(5,
4,0)ウンデカ−7−エン等の複素環含窒素化合物が
挙げられるが、これらに限定するものではない。また、
これらを単独で使用してもよく、2種以上を併用しても
よい。
Examples of the nitrogen-containing cyclic compound include imidazole compounds such as 2-ethyl-4-methylimidazole, 2-phenyl-4-methyl-5-hydroxylmethylimidazole and 2-phenyl-4,5-dihydroxylmethylimidazole. , 1,8-diazabicyclo (5,
Examples thereof include heterocyclic nitrogen-containing compounds such as 4,0) undec-7-ene, but are not limited thereto. Also,
These may be used alone or in combination of two or more.

【0042】有機ホスフィン化合物および/または含窒
素環状化合物等の硬化促進剤の添加量は、脂環式エポキ
シ樹脂100重量部に対して0.01重量部〜10重量
部が好ましい。特に好ましい添加量は0.05重量部〜
5重量部である。
The addition amount of the curing accelerator such as the organic phosphine compound and / or the nitrogen-containing cyclic compound is preferably 0.01 to 10 parts by weight with respect to 100 parts by weight of the alicyclic epoxy resin. A particularly preferred amount of addition is from 0.05 parts by weight.
5 parts by weight.

【0043】エポキシ樹脂とフェノールアラルキル樹脂
との配合比は、エポキシ樹脂中のエポキシ基数1に対し
フェノールアラルキル樹脂中の水酸基数が化学量論的に
0.2〜2.0となるように配合するのが好ましい。
The mixing ratio of the epoxy resin and the phenol aralkyl resin is such that the number of hydroxyl groups in the phenol aralkyl resin is stoichiometrically 0.2 to 2.0 with respect to 1 epoxy group in the epoxy resin. Is preferred.

【0044】本発明の組成物の溶融粘度は10ポアズ
(100℃)以下であることが好ましい。10ポアズを
越えると流動性、成形加工性の低下という問題が生じ
る。
The melt viscosity of the composition of the present invention is preferably 10 poise (100 ° C.) or less. When it exceeds 10 poise, there arises a problem that the fluidity and the molding processability are deteriorated.

【0045】この他、必要に応じて種々の成分、例えば
シリカ、アルミナ、タルク、クレー等の充填剤、三酸化
アンチモン等の難燃剤、カーボンブラック等の着色剤、
アクリロニトリル−ブタジエンゴムやシリコーンオイル
等の可撓剤を添加することができる。
In addition to the above, various components such as silica, alumina, talc, clay, and the like, flame retardants such as antimony trioxide, and colorants such as carbon black, etc., if necessary.
A flexible agent such as acrylonitrile-butadiene rubber or silicone oil can be added.

【0046】[0046]

【実施例】以下実施例および比較例により本発明をさら
に詳しく説明する。なお、実施例における各種特性値の
評価または測定は下記(1)〜(2)の方法により実施
した。 (1)各核体含有率および重量平均分子量 明細書中、重量平均分子量およびで面積%表した各核体
含有率はゲルパーミエーションクロマトグラフィー(カ
ラム:(東ソー社製)G4000HXL+G2500H
XL+G2000HXL×2本、溶離液:テトラヒドロ
フラン、検出器:示差屈折計)により測定した。 (2)フェノール樹脂類の水酸基当量 樹脂中の水酸基をピリジン存在下、無水酢酸でアセチル
化した。過剰の無水酢酸を加水分解し、生成した酢酸を
水酸化カリウム−エタノールで滴定した。水酸基当量は
以下の式によって算出した。 OH価(KOHmg/g)=28.05×(B−A)×
F÷S OH当量(g/eq)=56.11×1000÷OH価 ここに A:終点までの滴定に消費した0.5N水酸化カリウム
−エタノール溶液の量(ml) B:ブランク試験におけるAに相当する量 F:0.5N水酸化カリウム−エタノール溶液のファク
ター S:試料の質量 (3)溶融粘度 溶融粘度はICIコーン&プレート型粘度計(リサーチ
・エクイップメント社製:ロンドン)を用いて、100
℃で測定した。 (4)ガラス転移温度(Tg)および貯蔵弾性率
(E’) 動的粘弾性は、レオバイブロンDDV−2−EP
((株)東洋ボールドウィン製)を用いて測定した。T
gはtanδのピーク温度とした。E’は250℃での
値を読み取った。なお、昇温速度は2.0℃/min、
測定温度範囲は50〜350℃とした。測定周波数は1
10Hzである。 (5)吸水率 硬化物の吸水率は煮沸吸水率であり、100℃/2時間
で各サンプルの煮沸を行い、その重量増加率(F)で示
す。その計算式を以下に示す。 A=水吸収後の硬化物の重量 B=水吸収前の硬化物
の重量 F=〔(A−B)/B〕×100 (%)
The present invention will be described in more detail with reference to the following Examples and Comparative Examples. The evaluation or measurement of various characteristic values in the examples was carried out by the following methods (1) and (2). (1) Content of Each Nucleus and Weight Average Molecular Weight In the specification, the content of each nucleolar expressed in area% by weight average molecular weight and gel permeation chromatography (column: (manufactured by Tosoh Corporation) G4000HXL + G2500H)
XL + G2000HXL × 2, eluent: tetrahydrofuran, detector: differential refractometer). (2) Hydroxyl equivalent of phenol resin The hydroxyl group in the resin was acetylated with acetic anhydride in the presence of pyridine. Excess acetic anhydride was hydrolyzed, and the acetic acid produced was titrated with potassium hydroxide-ethanol. The hydroxyl equivalent was calculated by the following formula. OH value (KOHmg / g) = 28.05 x (BA) x
F / S OH equivalent (g / eq) = 56.11 × 1000 / OH number where A: amount of 0.5N potassium hydroxide-ethanol solution consumed for titration until the end point (ml) B: A in blank test Equivalent amount F: Factor of 0.5N potassium hydroxide-ethanol solution S: Mass of sample (3) Melt viscosity Melt viscosity was measured using an ICI cone & plate viscometer (Research Equipment Co., Ltd .: London). , 100
Measured in ° C. (4) Glass transition temperature (Tg) and storage elastic modulus (E ') Dynamic viscoelasticity is rheovibron DDV-2-EP.
(Manufactured by Toyo Baldwin Co., Ltd.). T
g is the peak temperature of tan δ. As for E ′, the value at 250 ° C. was read. The heating rate is 2.0 ° C./min,
The measurement temperature range was 50 to 350 ° C. Measurement frequency is 1
10 Hz. (5) Water absorption rate The water absorption rate of the cured product is the boiling water absorption rate, and each sample is boiled at 100 ° C / 2 hours, and the weight increase rate (F) is shown. The calculation formula is shown below. A = weight of cured product after water absorption B = weight of cured product before water absorption F = [(A−B) / B] × 100 (%)

【0047】製造例1(フェノールアラルキル樹脂の製
造) 714.4g(7.60モル)のフェノールと31.8
gのメタノール及び0.853gのジエチル硫酸を70
℃の冷却水を通した凝縮器を備えた反応機に装入し、攪
拌しながらオイルバスで昇温した。液温が140℃に達
したところでα,α’−ジメトキシ−p−キシレンの装
入を開始した。800g(4.81モル)のα,α’−
ジメトキシ−p−キシレンを4時間かけて連続的に装入
した後、さらに液温140℃で90分間熟成反応を行っ
た。次いで液温を160℃に昇温し、減圧下で未反応の
フェノールを除去して、1025gの樹脂を得た。
Production Example 1 (Production of Phenol Aralkyl Resin) 714.4 g (7.60 mol) of phenol and 31.8
70 g of methanol and 0.853 g of diethylsulfate
The mixture was charged into a reactor equipped with a condenser through which cooling water at ℃ was passed, and the temperature was raised in an oil bath while stirring. When the liquid temperature reached 140 ° C, charging of α, α'-dimethoxy-p-xylene was started. 800 g (4.81 mol) of α, α'-
After dimethoxy-p-xylene was continuously charged for 4 hours, an aging reaction was further performed at a liquid temperature of 140 ° C. for 90 minutes. Next, the liquid temperature was raised to 160 ° C. and unreacted phenol was removed under reduced pressure to obtain 1025 g of resin.

【0048】製造例2(核体分布を制御したノボラック
型フェノール系樹脂の製造) フェノール2000gと37%ホルマリン水溶液86.
3gとを混合(P/F=20)する以外は製造例1の場
合と同じ条件で縮合反応を行い、水およびフェノールを
取り除き、同様の装置を用いて、蒸留を圧力3mmHg
で最終温度240℃まで行い、缶出物として目的のノボ
ラック型フェノール樹脂を得た。この得られた樹脂を樹
脂Bとする。この得られたノボラック型フェノール樹脂
(樹脂B)の各核体含有率を前出の方法により求めたと
ころ、2核体含有率は5.4面積%で、2核体を除いた
残りの部分において、3核体含有率は83.7面積%、
3核体含有率と4核体含有率の和は97.3面積%であ
った。
Production Example 2 (Production of novolak type phenolic resin with controlled distribution of nuclide) 2000 g of phenol and 37% formalin aqueous solution 86.
Condensation reaction was carried out under the same conditions as in Production Example 1 except that 3 g was mixed (P / F = 20), water and phenol were removed, and distillation was performed at a pressure of 3 mmHg using the same apparatus.
At a final temperature of 240 ° C. to obtain the desired novolac type phenol resin as a bottom product. The resin thus obtained is referred to as Resin B. The content of each nucleus in the obtained novolac type phenolic resin (resin B) was determined by the above-mentioned method, and the content of the binuclear body was 5.4 area%. In, the trinuclear content is 83.7 area%,
The sum of the trinuclear body content rate and the tetranuclear body content rate was 97.3 area%.

【0049】製造例3(アリル化フェノールアラルキル
樹脂の製造) 撹拌装置、温度計、冷却器、滴下ロートを付設した10
00ml四口セパラブルフラスコに、反応溶媒にイソプ
ロパノール360gを用い、製造例1で得たフェノール
アラルキル樹脂103gを溶解し、水酸化カリウム4
5.6gを加え均一になるまで撹拌した。これに塩化ア
リル56.7gを10分間で滴下した後反応溶液を40
℃で1時間撹拌し、さらに70℃で5時間加熱撹拌して
アリルエーテル化反応を完結させた。次いで反応液を濾
別して副生した塩化カリウムを除去した後、イソプロパ
ノールを留去して回収した。残留物を酢酸エチルに溶解
し、水で洗浄後、酢酸エチルを留去し、アリルエーテル
化フェノールアラルキル樹脂を得た。得られたアリルエ
ーテル化フェノールアラルキル樹脂120gを300m
lセパラブルフラスコにとり、195℃に加熱して5時
間撹拌して熱転位を行わせ、アリル化フェノールアラル
キル樹脂を得た(収率98%、重量平均分子量207
0、水酸基当量248(g/eq))。
Production Example 3 (Production of Allylated Phenol Aralkyl Resin) 10 equipped with a stirrer, a thermometer, a cooler, and a dropping funnel.
In a 00 ml four-necked separable flask, 360 g of isopropanol was used as a reaction solvent, 103 g of the phenol aralkyl resin obtained in Production Example 1 was dissolved, and potassium hydroxide
5.6 g was added and stirred until uniform. To this, 56.7 g of allyl chloride was added dropwise over 10 minutes, and then the reaction solution was added to 40
The mixture was stirred at 0 ° C for 1 hour and further heated and stirred at 70 ° C for 5 hours to complete the allyl etherification reaction. Then, the reaction solution was filtered to remove by-produced potassium chloride, and then isopropanol was distilled off and recovered. The residue was dissolved in ethyl acetate and washed with water, and then ethyl acetate was distilled off to obtain an allyl etherified phenol aralkyl resin. 120 g of the obtained allyl etherified phenol aralkyl resin is 300 m
The mixture was placed in a 1-separable flask and heated to 195 ° C. and stirred for 5 hours to cause thermal rearrangement to obtain an allylated phenol aralkyl resin (yield 98%, weight average molecular weight 207).
0, hydroxyl group equivalent 248 (g / eq)).

【0050】製造例4(アリル化ノボラック型フェノー
ル系樹脂の製造) 製造例3と同様の撹拌装置、温度計、冷却器、滴下ロー
トを付設した1000ml四口セパラブルフラスコに、
イソプロパノール320g、製造例3で得られたノボラ
ック型フェノール樹脂を106g溶解し、製造例3と同
様の条件下でアリルエーテル化反応を行い、アリルエー
テル化ノボラック型フェノール樹脂を得た。次いで得ら
れたアリルエーテル化ノボラック型フェノール樹脂13
0gとり、300mlセパラブルフラスコに移し、製造
例3と同様にしてアリル化フェノール樹脂を得た(収率
96%、重量平均分子量400、水酸基当量149(g
/eq))。
Production Example 4 (Production of allylated novolac type phenolic resin) In a 1000 ml four-neck separable flask equipped with the same stirring device, thermometer, condenser and dropping funnel as in Production Example 3,
320 g of isopropanol and 106 g of the novolac type phenol resin obtained in Production Example 3 were dissolved, and an allyl etherification reaction was carried out under the same conditions as in Production Example 3 to obtain an allyl etherified novolac type phenol resin. Next, obtained allyl etherified novolak type phenol resin 13
0 g was transferred to a 300 ml separable flask to obtain an allylated phenol resin in the same manner as in Production Example 3 (yield 96%, weight average molecular weight 400, hydroxyl equivalent 149 (g
/ Eq)).

【0051】実施例1〜5 〔表1〕に示した配合比に基づき、製造例3で得たアリ
ル化フェノールアラルキル樹脂、製造例4で得たアリル
化ノボラック型フェノール系樹脂および脂環式エポキシ
樹脂(チバ・ガイギー製、アラルダイトCY−179
〔エポキシ当量126g/eq〕)とイミダゾール化合
物(四国化成(株)製、2E4MZ)を室温で溶解混合
して、液状エポキシ樹脂組成物を調製した。
Examples 1 to 5 Based on the compounding ratios shown in [Table 1], the allylated phenol aralkyl resin obtained in Production Example 3, the allylated novolac type phenolic resin obtained in Production Example 4, and an alicyclic epoxy resin. Resin (made by Ciba Geigy, Araldite CY-179
[Epoxy equivalent 126 g / eq]) and an imidazole compound (2E4MZ manufactured by Shikoku Kasei Co., Ltd.) were dissolved and mixed at room temperature to prepare a liquid epoxy resin composition.

【0052】比較例 〔表1〕に示した配合比に基づき、フェノールノボラッ
ク樹脂(三井東圧化学(株)製、#2000〔水酸基当
量103g/eq〕)、脂環式エポキシ樹脂(チバ・ガ
イギー製、アラルダイトCY−179〔エポキシ当量1
26g/eq〕)とイミダゾール化合物(四国化成
(株)製、2E4MZ)を室温で溶解混合して、液状エ
ポキシ樹脂組成物を調製した。
Comparative Example Based on the compounding ratio shown in [Table 1], phenol novolac resin (manufactured by Mitsui Toatsu Chemicals, Inc., # 2000 [hydroxyl group equivalent 103 g / eq]), alicyclic epoxy resin (Ciba Geigy) Manufactured by Araldite CY-179 [epoxy equivalent 1
26 g / eq]) and an imidazole compound (2E4MZ manufactured by Shikoku Kasei Co., Ltd.) were dissolved and mixed at room temperature to prepare a liquid epoxy resin composition.

【0053】硬化物の作成 実施例1〜5および比較例で得られた樹脂組成物より、
直径約50mm×約3mm厚の硬化物の注型板を作成し
吸水率の評価に供した。また、同組成物より、長さ20
mm×幅2mm×0.1mm厚の硬化物のフィルムを作
成し動的粘弾性の評価に供した。
Preparation of Cured Product From the resin compositions obtained in Examples 1 to 5 and Comparative Example,
A cast plate of a cured product having a diameter of about 50 mm and a thickness of about 3 mm was prepared and used for evaluation of water absorption. In addition, the composition has a length of 20
A film of a cured product having a thickness of mm × width of 2 mm × 0.1 mm was prepared and used for evaluation of dynamic viscoelasticity.

【0054】[0054]

【表1】 組成物の配合比の単位は重量部である。エポキシ樹脂と
フェノール樹脂は、エポキシ基と水酸基が化学量論的等
量となるように配合した。
[Table 1] The unit of the composition ratio of the composition is parts by weight. The epoxy resin and the phenol resin were blended so that the epoxy groups and the hydroxyl groups were stoichiometrically equivalent.

【0055】[0055]

【発明の効果】本発明の封止用液状エポキシ樹脂組成物
は、〔表1〕より判るように、粘度が低下しており、成
形加工性に優れていると考えられる。また、この組成物
の硬化物については、ガラス転移点および250℃での
貯蔵弾性率ともに高く、耐熱性に優れているだけでな
く、吸水率も低く、耐湿性が良好である。従って、本発
明の液状エポキシ樹脂組成物は半導体装置の封止用途に
有効に利用することができる。
EFFECTS OF THE INVENTION The liquid epoxy resin composition for encapsulation of the present invention has a reduced viscosity and is considered to have excellent moldability, as can be seen from Table 1. In addition, the cured product of this composition has a high glass transition point and a high storage elastic modulus at 250 ° C., is excellent in heat resistance, and also has a low water absorption rate and good moisture resistance. Therefore, the liquid epoxy resin composition of the present invention can be effectively used for sealing applications of semiconductor devices.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】(A)エポキシ樹脂 (B)アリル化フェノール樹脂 (C)硬化促進剤 を含んで成ることを特徴とする封止用液状エポキシ樹脂
組成物。
1. A liquid epoxy resin composition for encapsulation, comprising (A) an epoxy resin, (B) an allylated phenolic resin, and (C) a curing accelerator.
【請求項2】アリル化フェノール樹脂が、アリル化フェ
ノールアラルキル型樹脂および2核体含有率が10面積
%以下であって、2核体を除いた残りの部分の3核体含
有率が50面積%以上、かつ、3核体含有率と4核体含
有率の和が75面積%以上のアリル化ノボラック型フェ
ノール系樹脂からなる群から選ばれた少なくとも1種で
あることを特徴とする請求項1記載の封止用液状エポキ
シ樹脂組成物。
2. The allylated phenol resin has an allyl phenol aralkyl type resin and a binuclear content of 10 area% or less, and the remaining trinuclear body content excluding the binuclear body is 50 area. % Or more and at least one selected from the group consisting of allylated novolac type phenolic resins having a sum of trinuclear body content and tetranuclear body content of 75 area% or more. The liquid epoxy resin composition for sealing according to 1.
【請求項3】アリル化フェノール樹脂が、アリル化フェ
ノールアラルキル型樹脂であることを特徴とする請求項
1記載の封止用液状エポキシ樹脂組成物。
3. The liquid epoxy resin composition for encapsulation according to claim 1, wherein the allylated phenol resin is an allylated phenol aralkyl type resin.
【請求項4】アリル化フェノール樹脂が、2核体含有率
が10面積%以下であって、2核体を除いた残りの部分
の3核体含有率が50面積%以上、かつ、3核体含有率
と4核体含有率の和が75面積%以上のアリル化ノボラ
ック型フェノール系樹脂であることを特徴とする請求項
1記載の封止用液状エポキシ樹脂組成物。
4. The allylated phenolic resin has a binuclear content of 10 area% or less, a trinuclear content of the remaining portion excluding the binuclear is 50 area% or more, and trinuclear. The liquid epoxy resin composition for encapsulation according to claim 1, which is an allylated novolac-type phenolic resin having a total content of the nucleoside and the content of the tetranuclear body of 75 area% or more.
【請求項5】エポキシ樹脂が、脂環式エポキシ樹脂の
(3’,4’−エポキシシクロヘキシルメチル)−3,
4−エポキシシクロヘキサンカルボキシレートであるこ
とを特徴とする請求項1〜4記載の封止用液状エポキシ
樹脂組成物。
5. The epoxy resin is an alicyclic epoxy resin (3 ′, 4′-epoxycyclohexylmethyl) -3,
A liquid epoxy resin composition for encapsulation according to claims 1 to 4, which is 4-epoxycyclohexanecarboxylate.
【請求項6】エポキシ樹脂とアリル化フェノール樹脂の
配合において、エポキシ樹脂のエポキシ基に対してアリ
ル化フェノール樹脂の水酸基が化学量論で0.2〜2と
なるように配合することを特徴とする請求項1〜5記載
の封止用液状エポキシ樹脂組成物。
6. The compounding of an epoxy resin and an allylated phenolic resin, characterized in that the hydroxyl groups of the allylated phenolic resin are stoichiometrically 0.2 to 2 with respect to the epoxy groups of the epoxy resin. The liquid epoxy resin composition for encapsulation according to claim 1.
【請求項7】硬化促進剤が有機ホスフィン化合物および
含窒素環状化合物からなる群から選ばれた少なくとも1
種であることを特徴とする請求項1〜6記載の封止用液
状エポキシ樹脂組成物。
7. The curing accelerator is at least one selected from the group consisting of organic phosphine compounds and nitrogen-containing cyclic compounds.
The liquid epoxy resin composition for encapsulation according to claim 1, which is a seed.
【請求項8】硬化促進剤の量がエポキシ樹脂100重量
部に対して0.01〜10重量部であることを特徴とす
る請求項1〜7記載の封止用液状エポキシ樹脂組成物。
8. The encapsulating liquid epoxy resin composition according to claim 1, wherein the amount of the curing accelerator is 0.01 to 10 parts by weight with respect to 100 parts by weight of the epoxy resin.
【請求項9】請求項1〜8記載の封止用液状エポキシ樹
脂組成物からなることを特徴とする硬化物。
9. A cured product comprising the liquid epoxy resin composition for sealing according to any one of claims 1 to 8.
JP18250395A 1995-07-19 1995-07-19 Liquid epoxy resin composition for sealing and cured product thereof Expired - Fee Related JP3633674B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18250395A JP3633674B2 (en) 1995-07-19 1995-07-19 Liquid epoxy resin composition for sealing and cured product thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18250395A JP3633674B2 (en) 1995-07-19 1995-07-19 Liquid epoxy resin composition for sealing and cured product thereof

Publications (2)

Publication Number Publication Date
JPH0931167A true JPH0931167A (en) 1997-02-04
JP3633674B2 JP3633674B2 (en) 2005-03-30

Family

ID=16119439

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18250395A Expired - Fee Related JP3633674B2 (en) 1995-07-19 1995-07-19 Liquid epoxy resin composition for sealing and cured product thereof

Country Status (1)

Country Link
JP (1) JP3633674B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1117075A (en) * 1997-04-28 1999-01-22 Nitto Denko Corp Semiconductor device
JP2000319360A (en) * 1999-05-06 2000-11-21 Toshiba Chem Corp Resin composition for sealing and semiconductor sealing apparatus
JP2002194065A (en) * 2000-12-27 2002-07-10 Hitachi Chem Co Ltd Liquid epoxy-resin composition for encapsulating and electronic parts device
JP2002194066A (en) * 2000-12-27 2002-07-10 Hitachi Chem Co Ltd Liquid epoxy-resin composition for encapsulating and electronic parts device
EP2404946A1 (en) 2010-07-08 2012-01-11 Nitto Denko Corporation Method for manufacturing cured product of thermosetting resin composition and cured product obtained thereby
US20120010366A1 (en) * 2010-07-08 2012-01-12 Nitto Denko Corporation Method for manufacturing cured product of thermosetting resin composition and cured product obtained thereby
US20130012619A1 (en) * 2011-07-05 2013-01-10 Nitto Denko Corporation Epoxy resin composition for electronic component encapsulation and electronic component device using the same
JP2020097753A (en) * 2020-02-19 2020-06-25 日立化成株式会社 Sealing epoxy resin composition, and semiconductor device and method for manufacturing the same

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4872293A (en) * 1971-10-01 1973-09-29
JPS61287952A (en) * 1985-06-15 1986-12-18 Matsushita Electric Works Ltd Sealing epoxy resin composition
JPS62246920A (en) * 1986-04-21 1987-10-28 Nippon Zeon Co Ltd Epoxy resin composition for semiconductor sealing
JPS6383035A (en) * 1986-09-29 1988-04-13 Mitsui Petrochem Ind Ltd Production of trinuclear substituted phenol and composition containing glycidyl ether derivative of trinuclear substituted phenol
JPH03166221A (en) * 1989-11-25 1991-07-18 Shikoku Chem Corp Epoxy resin composition
JPH04225012A (en) * 1990-12-27 1992-08-14 Nippon Kayaku Co Ltd Tetra-nuclear phenolic novolak and its production
JPH05287053A (en) * 1992-04-09 1993-11-02 Nippon Kayaku Co Ltd Epoxy resin, resin composition and cured product
JPH05320317A (en) * 1992-05-21 1993-12-03 Fujitsu Ltd Epoxy resin composition
JPH06145304A (en) * 1992-11-06 1994-05-24 Hitachi Ltd Thermosetting resin composition
JPH06192361A (en) * 1992-10-30 1994-07-12 Mitsui Toatsu Chem Inc Phenolic resin and epoxy resin composition and maleimide resin composition comprising the same
JPH07118367A (en) * 1993-10-26 1995-05-09 Matsushita Electric Works Ltd Solid epoxy resin composition for semiconductor sealing
JPH07206997A (en) * 1994-01-25 1995-08-08 Matsushita Electric Works Ltd Liquid epoxy resin composition and its production

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4872293A (en) * 1971-10-01 1973-09-29
JPS61287952A (en) * 1985-06-15 1986-12-18 Matsushita Electric Works Ltd Sealing epoxy resin composition
JPS62246920A (en) * 1986-04-21 1987-10-28 Nippon Zeon Co Ltd Epoxy resin composition for semiconductor sealing
JPS6383035A (en) * 1986-09-29 1988-04-13 Mitsui Petrochem Ind Ltd Production of trinuclear substituted phenol and composition containing glycidyl ether derivative of trinuclear substituted phenol
JPH03166221A (en) * 1989-11-25 1991-07-18 Shikoku Chem Corp Epoxy resin composition
JPH04225012A (en) * 1990-12-27 1992-08-14 Nippon Kayaku Co Ltd Tetra-nuclear phenolic novolak and its production
JPH05287053A (en) * 1992-04-09 1993-11-02 Nippon Kayaku Co Ltd Epoxy resin, resin composition and cured product
JPH05320317A (en) * 1992-05-21 1993-12-03 Fujitsu Ltd Epoxy resin composition
JPH06192361A (en) * 1992-10-30 1994-07-12 Mitsui Toatsu Chem Inc Phenolic resin and epoxy resin composition and maleimide resin composition comprising the same
JPH06145304A (en) * 1992-11-06 1994-05-24 Hitachi Ltd Thermosetting resin composition
JPH07118367A (en) * 1993-10-26 1995-05-09 Matsushita Electric Works Ltd Solid epoxy resin composition for semiconductor sealing
JPH07206997A (en) * 1994-01-25 1995-08-08 Matsushita Electric Works Ltd Liquid epoxy resin composition and its production

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1117075A (en) * 1997-04-28 1999-01-22 Nitto Denko Corp Semiconductor device
JP2000319360A (en) * 1999-05-06 2000-11-21 Toshiba Chem Corp Resin composition for sealing and semiconductor sealing apparatus
JP2002194065A (en) * 2000-12-27 2002-07-10 Hitachi Chem Co Ltd Liquid epoxy-resin composition for encapsulating and electronic parts device
JP2002194066A (en) * 2000-12-27 2002-07-10 Hitachi Chem Co Ltd Liquid epoxy-resin composition for encapsulating and electronic parts device
JP4631165B2 (en) * 2000-12-27 2011-02-16 日立化成工業株式会社 Liquid sealing epoxy resin composition and electronic component device
JP4696359B2 (en) * 2000-12-27 2011-06-08 日立化成工業株式会社 Liquid sealing epoxy resin composition and electronic component device
EP2404946A1 (en) 2010-07-08 2012-01-11 Nitto Denko Corporation Method for manufacturing cured product of thermosetting resin composition and cured product obtained thereby
US20120010366A1 (en) * 2010-07-08 2012-01-12 Nitto Denko Corporation Method for manufacturing cured product of thermosetting resin composition and cured product obtained thereby
US20130012619A1 (en) * 2011-07-05 2013-01-10 Nitto Denko Corporation Epoxy resin composition for electronic component encapsulation and electronic component device using the same
JP2020097753A (en) * 2020-02-19 2020-06-25 日立化成株式会社 Sealing epoxy resin composition, and semiconductor device and method for manufacturing the same

Also Published As

Publication number Publication date
JP3633674B2 (en) 2005-03-30

Similar Documents

Publication Publication Date Title
JP3633674B2 (en) Liquid epoxy resin composition for sealing and cured product thereof
JP3973773B2 (en) Epoxy resin composition for semiconductor encapsulation
JP3933763B2 (en) Epoxy resin composition and electronic component
JP2009242719A (en) Phenolic novolac resin, epoxy resin composition and cured product therefrom, and semiconductor device
JP4184109B2 (en) Curing agent for epoxy resin and epoxy resin composition
JPH10292032A (en) Epoxy resin composition and cured product thereof
JPH06192361A (en) Phenolic resin and epoxy resin composition and maleimide resin composition comprising the same
JPH06145309A (en) Hydroxynaphthalene copolymer, epoxidized product thereof, and production and use thereof
JP4667753B2 (en) Epoxy resin production method, epoxy resin composition and cured product
JP3143721B2 (en) Epoxy resin composition for sealing
JPH07173235A (en) Allylnapththol cocondensate and epoxy resin composition
JP2887214B2 (en) Naphthol compound, its production method, epoxy compound, composition and cured product
JPH08157572A (en) Modified phenol-aralkyl resin and its production
JP2000290351A (en) Epoxy resin curing agent
JPH07173234A (en) Allylnaphthol cocondensate and epoxy resin composition
JPH0867746A (en) Phenol aralkyl resin, its production and epoxy resin composition
JPH10279669A (en) Epoxy resin hardener
JPH07207125A (en) Phenolic resin composition
JP3325694B2 (en) Epoxy resin and epoxy resin composition
JPH07165852A (en) Allylnaphthol/alpha-naphthol cocondensate and epoxy resin composition
JP3541253B2 (en) Curing agent for epoxy resin containing monoallyl naphthol compound and epoxy resin composition
JP2012097229A (en) Method for producing curing agent composition for epoxy resin, and method for producing thermosetting molding material
JPH07278260A (en) Liquid epoxy resin composition for sealing
JPH07173238A (en) Allylnaphthol cocondensate and epoxy resin composition
JPH07173236A (en) Allylnaphthol cocondensate and epoxy resin composition

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20040618

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20040629

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040803

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20041221

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20041221

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090107

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100107

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110107

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120107

Year of fee payment: 7

LAPS Cancellation because of no payment of annual fees