JP4696359B2 - Liquid sealing epoxy resin composition and electronic component device - Google Patents

Liquid sealing epoxy resin composition and electronic component device Download PDF

Info

Publication number
JP4696359B2
JP4696359B2 JP2000398598A JP2000398598A JP4696359B2 JP 4696359 B2 JP4696359 B2 JP 4696359B2 JP 2000398598 A JP2000398598 A JP 2000398598A JP 2000398598 A JP2000398598 A JP 2000398598A JP 4696359 B2 JP4696359 B2 JP 4696359B2
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
liquid sealing
liquid
cured product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000398598A
Other languages
Japanese (ja)
Other versions
JP2002194066A (en
Inventor
寿登 高橋
孝三 広川
寿 塚原
泰章 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2000398598A priority Critical patent/JP4696359B2/en
Publication of JP2002194066A publication Critical patent/JP2002194066A/en
Application granted granted Critical
Publication of JP4696359B2 publication Critical patent/JP4696359B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Description

【0001】
【発明の属する技術分野】
本発明は、電子部品装置の封止用に好適な液状封止用エポキシ樹脂組成物及びこれにより封止された素子を備えた電子部品装置に関する。
【0002】
【従来の技術】
従来から、トランジスタ、IC等の電子部品装置の素子封止の分野では生産性、コスト等の面から樹脂封止が主流となり、エポキシ樹脂組成物が広く用いられている。この理由としては、エポキシ樹脂が作業性、成形性、電気特性、耐湿性、耐熱性、機械特性、インサート品との接着性等の諸特性にバランスがとれているためである。COB(Chip on Board)、COG(Chip on Glass)等のベアチップ実装した半導体装置やTCP(Tape Carrier Package)においては、液状封止用エポキシ樹脂組成物が封止材として多く用いられている。
【0003】
液状封止用エポキシ樹脂組成物の硬化には、高温で長時間の加熱が必要であり、近年、生産性の向上を目的とした速硬化性の液状封止用エポキシ樹脂組成物の需要が高まっている。
また、最近では、液状封止用エポキシ樹脂組成物の硬化後の評価に光学的自動検査機を用いることが多いため、硬化後の表面は非鏡面が要求されている。これは、光学的自動検査機においてハレーションをおこさないためである。液状封止用エポキシ樹脂組成物に、硬化剤として固形フェノールノボラック樹脂を用いると、封止品の耐湿信頼性が良くなるという長所がある反面、硬化後の外観が鏡面になりやすいという短所がある。
【0004】
【発明が解決しようとする課題】
本発明はかかる状況に鑑みなされたもので、硬化物の表面が非鏡面になる液状封止用エポキシ樹脂組成物及びこれにより封止された素子を備えた電子部品装置を提供するものである。
【0005】
【課題を解決するための手段】
本発明者らは上記の課題を解決するため鋭意検討を重ねた結果、硬化剤としてアリル基含有フェノール樹脂を用い、かつ硬化物の表面の反射率が10%以下になるような液状封止用エポキシ樹脂組成物により上記の目的を達成しうることを見い出し、本発明を完成するに至った。
【0006】
すなわち、本発明は
(1)(A)エポキシ樹脂及び(B)硬化剤を必須成分とし、(B)硬化剤がアリル基含有フェノール樹脂を含有し、かつ硬化物の表面の反射率が10%以下である液状封止用エポキシ樹脂組成物、
(2)アリル基含有フェノール樹脂がアリル基含有フェノールノボラック樹脂である上記(1)記載の液状封止用エポキシ樹脂組成物、
(3)(C)充填剤をさらに含有する上記(1)又は(2)記載の液状封止用エポキシ樹脂組成物、
(4)(D)溶剤をさらに含有する上記(1)〜(3)のいずれかに記載の液状封止用エポキシ樹脂組成物、
(5)上記(1)〜(4)のいずれかに記載の液状封止用エポキシ樹脂組成物を用いたTCP用封止材、
(6)上記(1)〜(4)のいずれかに記載の液状封止用エポキシ樹脂組成物を用いて封止された素子を備えた電子部品装置及び
(7)上記(1)〜(4)のいずれかに記載の液状封止用エポキシ樹脂組成物を用いて封止された素子を備えたTCP
に関する。
【0007】
【発明の実施の形態】
本発明において用いられる(A)エポキシ樹脂は、硬化可能な1分子中に2個以上のエポキシ基を有するエポキシ樹脂であれば特に制限はなく、液状封止用エポキシ樹脂組成物に一般に使用されているエポキシ樹脂を用いることができ、組成物が液状であれば固形、液状のどちらか一方を用いても両者を併用しても良い。たとえば、ビスフェノールA、ビスフェノールF、ビスフェノールAD、ビスフェノールS、ナフタレンジオール、水添ビスフェノールA等とエピクロルヒドリンの反応により得られるグリシジルエーテル型エポキシ樹脂、オルソクレゾールノボラック型エポキシ樹脂をはじめとするフェノール類とアルデヒド類とを縮合又は共縮合させて得られるノボラック樹脂をエポキシ化したノボラック型エポキシ樹脂、フタル酸、ダイマー酸等の多塩基酸とエピクロルヒドリンの反応により得られるグリシジルエステル型エポキシ樹脂、ジアミノジフェニルメタン、イソシアヌル酸等のポリアミンとエピクロルヒドリンの反応により得られるグリシジルアミン型エポキシ樹脂、オレフィン結合を過酢酸等の過酸で酸化して得られる線状脂肪族エポキシ樹脂、脂環族エポキシ樹脂などが挙げられ、これらを単独で用いても2種以上を組み合わせて用いてもよい。なかでも、低粘度化の観点からは液状エポキシ樹脂が好ましく、フェノール樹脂との反応性の観点からはビスフェノール型液状エポキシ樹脂がより好ましい。
また、これらのエポキシ樹脂は、十分に精製されたもので、イオン性不純物が少ないものが好ましい。例えば、遊離Naイオン及び遊離Clイオンは500ppm以下であることが好ましい。
【0008】
本発明において用いられる(B)硬化剤としては、アリル基含有フェノール樹脂を含有していれば特に制限はなく、エポキシ樹脂の硬化剤として一般に使用されているものを用いることができる。たとえば、フェノール樹脂、メラミン樹脂、アクリル樹脂、ユリア樹脂、イソシアネート、脂肪族ポリアミン、ポリアミド樹脂、芳香族ジアミン等のアミン化合物、酸無水物、ルイス酸錯化合物などが挙げられ、これらを単独で用いても2種以上を組み合わせて用いてもよい。なかでも、保存安定性の観点からはフェノール樹脂が好ましく、接着性の観点からは芳香族アミンが好ましい。また、組成物が液状であれば固形硬化剤及び液状硬化剤のどちらか一方を用いても両者を併用してもよいが、低粘度化の観点からは液状硬化剤が好ましい。
【0009】
本発明において硬化剤として用いられるアリル基含有フェノール樹脂としては、アリル基を有するものであれば特に制限はないが、たとえば、下記一般式(I)〜(V)で示される化合物等が挙げられ、これらの1種を単独で用いても2種以上を組合わせて用いてもよい。
【化1】

Figure 0004696359
(ここで、式(I)〜(V)中のRは水素原子、置換又は非置換の炭素数1〜10のアルキル基、置換又は非置換の炭素数1〜10のアルコキシ基、置換又は非置換の炭素数1〜10のアルキル基、置換又は非置換の炭素数1〜10のアリル基及び置換又は非置換の炭素数1〜12のアリール基から選ばれ、m、nはそれぞれ独立に1以上の整数を示す。)
【0010】
なかでも、硬化物の表面が非鏡面になる観点及び入手容易性の観点からは上記一般式(I)又は(IV)で示されるフェノール樹脂が好ましく、硬化物表面の非鏡面性と速硬化性の両立の観点からは上記一般式(I)で示されるフェノール樹脂等のアリル基含有フェノールノボラック樹脂がより好ましい。
上記一般式(I)で示されるフェノール樹脂としては、低粘度化の観点から、Rが水素原子でnが平均2〜3であるものがより好ましい。また、同様に観点から、上記一般式(I)で示されるフェノール樹脂の重量平均分子量は600以下が好ましく、500未満がより好ましく、450以下がさらに好ましく、粘度は、25℃における粘度が5〜80Pa・sであることが好ましく、10〜50Pa・sであることがより好ましく、15〜40Pa・sであることがさらに好ましく、水酸基当量は、100〜200が好ましく、120〜170がより好ましく、130〜160がさらに好ましい。
上記一般式(IV)で示されるフェノール樹脂としては、m個の繰り返し単位及びn個の繰り返し単位のランダム共重合体でもブロック共重合体でも交互共重合体でもかまわないが、硬化物の表面が非鏡面になる観点及び低粘度化の観点から、Rが水素原子でm、nがそれぞれ平均1〜2であるものがより好ましい。また、同様に観点から、上記一般式(IV)で示されるフェノール樹脂の重量平均分子量は200〜1200が好ましく、300〜1000がより好ましく、400〜600がさらに好ましく、粘度は、60℃における粘度が0.5〜20Pa・sであることが好ましく、1〜10Pa・sであることがより好ましく、3〜6Pa・sであることがさらに好ましく、水酸基当量は、50〜500が好ましく、100〜350がより好ましく、150〜250がさらに好ましい。
ここで、重量平均分子量とは、GPC測定によるポリスチレン換算の重量平均分子量のことをいう。
【0011】
アリル基含有フェノール樹脂の配合量は、その性能を発揮するために(B)硬化剤全量に対して30重量%以上が好ましく、40重量%以上がより好ましく、60重量%以上がさらに好ましい。
【0012】
(A)エポキシ樹脂と(B)硬化剤との当量比は特に制限はないが、それぞれの未反応分を少なく抑えるために、エポキシ樹脂に対して硬化剤を0.6〜1.6当量の範囲に設定することが好ましく、0.7〜1.4当量がより好ましく、0.8〜1.2当量がさらに好ましい。0.6.〜1.6当量の範囲からはずれた場合、硬化反応が不充分となり信頼性が低下する傾向がある。
ここで、当量とは反応当量であり、たとえば、フェノール樹脂の当量はエポキシ基1個に対しフェノール性水酸基1個が反応するものとして計算され、芳香族アミンの当量はエポキシ基1個に対しアミノ基の活性水素1個が反応するものとして計算され、酸無水物の当量はエポキシ基1個に対し酸無水物基1個が反応するものとして計算される。
【0013】
本発明の液状封止用エポキシ樹脂組成物には、必要に応じて硬化促進剤を用いることができる。硬化促進剤としては液状封止用エポキシ樹脂組成物に一般に使用されるもので特に制限はないが、たとえば、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7、1,5−ジアザ−ビシクロ(4,3,0)ノネン、5、6−ジブチルアミノ−1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等のシクロアミジン化合物及びこれらの誘導体、これらのフェノール樹脂塩等の塩、又はこれらの化合物に無水マレイン酸、1,4−ベンゾキノン、2,5−トルキノン、1,4−ナフトキノン、2,3−ジメチルベンゾキノン、2,6−ジメチルベンゾキノン、2,3−ジメトキシ−5−メチル−1,4−ベンゾキノン、2,3−ジメトキシ−1,4−ベンゾキノン、フェニル−1,4−ベンゾキノン等のキノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物を付加してなる分子内分極を有する化合物、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノール等の三級アミン化合物、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−フェニル−4−メチルイミダゾール、2−ヘプタデシルイミダゾール等のイミダゾール化合物、トリブチルホスフィン、メチルジフェニルホスフィン、トリフェニルホスフィン、ジフェニルホスフィン、フェニルホスフィン等の有機ホスフィン化合物及びこれらの誘導体、又はこれらの化合物に上記キノン化合物、ジアゾフェニルメタン、フェノール樹脂等のπ結合をもつ化合物を付加してなる分子内分極を有する化合物等の有機リン化合物、トリフェニルホスフィントリフェニルボロン、テトラフェニルホスホニウムテトラフェニルボレート、2−エチル−4−メチルイミダゾールテトラフェニルボレート、N−メチルモルホリンテトラフェニルボレート等のフェニルボロン塩等及びこれらの誘導体などが挙げられ、これらの1種を単独で用いても2種以上を組合わせて用いてもよい。
硬化促進剤の配合量は、硬化促進効果が達成される量であれば特に制限されるものではないが、(A)エポキシ樹脂に対して0.1〜20重量%が好ましく、より好ましくは1〜15重量%である。0.1重量%未満では短時間での硬化性に劣る傾向があり、20重量%を超えると硬化速度が速すぎて制御が困難になったりポットライフ、シェルライフ等の保存安定性が劣ったりする傾向がある。
【0014】
本発明の液状封止用エポキシ樹脂組成物には、必要に応じて(C)充填剤を配合することができる。(C)充填剤としては、液状封止用エポキシ樹脂組成物に一般に使用されるもので特に制限はないが、吸湿性、線膨張係数低減、熱伝導性向上及び強度向上の観点から無機充填剤が好ましい。たとえば、溶融シリカ、結晶シリカ等のシリカ、炭酸カルシウム、タルク、クレー、酸化アルミナ等のアルミナ、窒化珪素、炭化珪素、窒化ホウ素、珪酸カルシウム、チタン酸カリウム、窒化アルミ、ベリリア、ジルコニア、ジルコン、フォステライト、ステアタイト、スピネル、ムライト、チタニア等の粉体、又はこれらを球形化したビーズ、ガラス繊維などが挙げられる。さらに、難燃効果のある無機充填剤としては水酸化アルミニウム、水酸化マグネシウム、硼酸亜鉛、モリブデン酸亜鉛等が挙げられる。これらの充填剤は単独で用いても2種以上を組み合わせて用いてもよい。なかでも、粘度上昇の抑制及び硬化物物性の観点からはシリカが好ましく、溶融シリカがより好ましい。
【0015】
充填剤の形状は、流動性等の成形性の観点から球形に近いことが好ましく、最密充填するように粒度分布を広げた球形溶融シリカがより好ましい。
(C)充填剤の平均粒径は、特に球形シリカの場合、1〜20μmの範囲が好ましく、2〜10μmの範囲がより好ましい。平均粒径が1μm未満では液状樹脂への分散性に劣る傾向や液状封止用エポキシ樹脂組成物にチキソトロピック性が付与されて流動特性に劣る傾向があり、20μmを超えるとフィラ沈降を起こしやすくなる傾向や、液状封止用エポキシ樹脂組成物の微細間隙への浸透性・流動性が低下してボイド・未充填を招きやすくなる傾向がある。
また、これらの充填剤は、必要に応じて表面をカップリング処理したものを用いてもよい。
(C)充填剤の配合量は、液状封止用エポキシ樹脂組成物の20〜90重量%が好ましく、30〜85重量%がより好ましく、50〜80重量%さらに好ましい。配合量が20重量%未満では熱膨張係数の低減効果が低くなり耐熱衝撃性に劣る傾向があり、90重量%を超えると液状封止用エポキシ樹脂組成物の粘度が上昇し、流動性、浸透性及びディスペンス性の低下を招く傾向がある。
【0016】
本発明の液状封止用エポキシ樹脂組成物には、低粘度化のために必要に応じて(D)溶剤を配合することができる。特に、固体のエポキシ樹脂及び硬化剤を用いる場合には、液状の組成物を得るために、溶剤を配合することが必要である。
(D)溶剤としては、特に制限はないが、たとえば、メチルアルコール、エチルアルコール、プロピルアルコール、ブチルアルコール等のアルコール系溶剤、アセトン、メチルエチルケトン等のケトン系溶剤、エチレングリコールエチルエーテル、エチレングリコールメチルエーテル、エチレングリコールブチルエーテル、プロピレングリコールメチルエーテル、ジプロピレングリコールメチルエーテル、プロピレングリコールエチルエーテル、プロピレングリコールメチルエーテルアセテート等のグリコールエーテル系溶剤、ブチロラクトン、バレロラクトン、カプロラクトン等のラクトン系溶剤、ジメチルアセトアミド、ジメチルホルムアミド等のアミド系溶剤、トルエン、キシレンなど有機溶剤が挙げられ、これらの1種を単独で用いても2種以上を組合わせて用いてもよい。なかでも、速硬化性、成膜性等の成形性の観点からはグリコールエーテル系溶剤及びラクトン系溶剤が好ましい。また、加熱硬化時の急激な揮発による気泡形成を避ける観点からは沸点が100℃以上の溶剤が好ましい。
(D)溶剤の配合は、本発明の効果が得られる量であれば特に制限はないが、液状封止用エポキシ樹脂組成物に対して、速硬化性の観点から5〜30重量%とすることが好ましく、10〜20重量%がより好ましい。
【0017】
本発明の液状封止用エポキシ樹脂組成物には、その他の添加剤として、赤燐、リン酸エステル、メラミン、メラミン誘導体、トリアジン環を有する化合物、シアヌル酸誘導体、イソシアヌル酸誘導体等の窒素含有化合物、シクロホスファゼン等の燐窒素含有化合物、酸化亜鉛、酸化鉄、酸化モリブデン、フェロセン等の金属化合物、三酸化アンチモン、四酸化アンチモン、五酸化アンチモン等の酸化アンチモン、ブロム化エポキシ樹脂などの難燃剤、ハイドロタルサイト類、マグネシウム、アルミニウム、チタン、ジルコニウム、ビスマス等の元素の含水酸化物などのイオントラップ剤、高級脂肪酸、高級脂肪酸金属塩、エステル系ワックス、ポリオレフィン系ワックス、ポリエチレン、酸化ポリエチレン等の離型剤、シリコーンオイルやシリコーンゴム粉末等の応力緩和剤、染料、カーボンブラック等の着色剤、希釈剤、レベリング剤、消泡剤などを必要に応じて配合することができる。
【0018】
本発明の液状封止用エポキシ樹脂組成物は、成形後の硬化物の表面を非鏡面とする観点から、硬化物の表面の反射率が10%以下であることが必要である。ここで、硬化物の表面の反射率とは、硬化物に入射角45°〜75°で光照射した場合の光の反射率をいい、入射角が45°〜60°での反射率が5%以下であることが好ましく、3%以下であることが好ましく、2%以下であることがさらに好ましい。硬化物の表面の反射率の測定方法としては特に制限はないが、たとえば、図1にその概略を示すように、デジタル変角光沢計を用いて、本発明の液状封止用エポキシ樹脂組成物の硬化物1に光源4から45〜75°の入射角6で白色光を照射し、入射光2の光量に対する反射光3の光量を測定し、白色板での測定値で校正して反射率を求める等の一般的な手法が挙げられる。図1において、5は測定器を示す。本発明においては、液状封止用エポキシ樹脂組成物に配合する各種成分の組み合わせ及び配合量を調整することによって、硬化物の表面の反射率が10%以下である液状封止用エポキシ樹脂組成物を得ることができる。(B)硬化剤の選定とその配合量が特に重要である。
【0019】
本発明の液状封止用エポキシ樹脂組成物は、上記各種成分を均一に分散混合できるのであれば、いかなる手法を用いても調製できるが、一般的な手法として、所定の配合量の成分を秤量し、らいかい機、ミキシングロール、プラネタリミキサ等を用いて混合、混練し、必要に応じて脱泡することによって得ることができる。
【0020】
本発明で得られる液状封止用エポキシ樹脂組成物により素子を封止して得られる電子部品装置としては、リードフレーム、配線済みのテープキャリア、配線板、ガラス、シリコンウエハ等の支持部材に、半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子、コンデンサ、抵抗体、抵抗アレイ、コイル、スイッチ等の受動素子などの素子を搭載し、必要な部分を本発明の液状封止用エポキシ樹脂組成物で封止して得られる電子部品装置などが挙げられる。このような電子部品装置としては、例えば、リードフレーム上に半導体素子を固定し、ボンディングパッド等の素子の端子部とリード部をワイヤボンディングやバンプで接続した後、本発明の液状封止用エポキシ樹脂組成物を用いてディスペンス方式等により封止してなる、PLCC(Plastic Leaded Chip Carrier)、QFP(Quad Flat Package)、SOP(Small Outline Package)、SOJ(Small Outline J-leaded package)、TSOP(Thin Small Outline Package)、TQFP(Thin Quad Flat Package)等の一般的な樹脂封止型IC、テープキャリアにリードポンディングした半導体チップを、本発明の液状封止用エポキシ樹脂組成物で封止したTCP(Tape Carrier Package)、配線板やガラス上に形成した配線に、ワイヤーボンディング、フリップチップボンディング、はんだ等で接続した半導体チップを、本発明の液状封止用エポキシ樹脂組成物で封止したCOB(Chip On Board)、COG(Chip On Glass)等のベアチップ実装した半導体装置、配線板やガラス上に形成した配線に、ワイヤーボンディング、フリップチップボンディング、はんだ等で接続した半導体チップ、トランジスタ、ダイオード、サイリスタ等の能動素子及び/又はコンデンサ、抵抗体、コイル等の受動素子を、本発明の液状封止用エポキシ樹脂組成物で封止したハイブリッドIC、マルチチップモジュール、マザーボード接続用の端子を形成したインターポーザ基板に半導体チップを搭載し、バンプまたはワイヤボンディングにより半導体チップとインターポーザ基板に形成された配線を接続した後、本発明の液状封止用エポキシ樹脂組成物で半導体チップ搭載側を封止したBGA(Ball Grid Array)、CSP(Chip Size Package)、MCP(Multi Chip Package)などが挙げられる。また、プリント回路板にも本発明の液状封止用エポキシ樹脂組成物は使用できる。
なかでも、本発明の液状封止用エポキシ樹脂組成物を使用したTCPやCOB、COG等のベアチップ実装した半導体装置で優れた特性を得ることができる。TCPは薄型、軽量で耐折り曲げ実装性に優れ、ノート型パソコン等の液晶ドライバ、積層メモリモジュール等に用いられる。
【0021】
本発明の液状封止用エポキシ樹脂組成物を用いて素子を封止する方法としては、ディスペンス方式、注型方式、印刷方式等が挙げられる。
【0022】
【実施例】
次に実施例により本発明を説明するが、本発明の範囲はこれらの実施例に限定されるものではない。
【0023】
実施例1及び比較例1
エポキシ樹脂としてエポキシ当量160のビスフェノールF型液状エポキシ樹脂(東都化成株式会社製商品名YDF−8170C)、ビスフェノールAD型液状エポキシ樹脂(三井化学株式会社製商品名R−710)、o−クレゾールノボラック型エポキシ樹脂(東都化成株式会社製商品名ESCN−195−6)、硬化剤として重量平均分子量が426、水酸基当量が141、25℃における粘度が25Pa・sで下記式(VI)で示されるアリル基含有フェノール樹脂1、重量平均分子量が710、水酸基当量が210、60℃における粘度が4.4Pa・sで、下記式(VII)で示されモル比m/nが1/1のランダム共重合体であるアリル基含有フェノール樹脂2、重量平均分子量が750、水酸基当量が105、軟化点が83℃のフェノールノボラック樹脂(明和化成株式会社製商品名H−100)、硬化促進剤として1,8−ジアザビシクロ(5,4,0)ウンデセン−7のフェノールノボラック樹脂塩(サンアプロ株式会社製商品名SA−841)、充填剤として比表面積1m/g、平均粒径4μmの球状溶融シリカ、溶剤としてプロピレングリコールモノメチルエーテルアセテートとγ−ブチロラクトンとの重量比1/1の混合溶剤を、それぞれ表1に示す重量部で配合し、三本ロールにて混練分散した後、真空脱泡して、実施例1、2及び比較例1の液状封止用エポキシ樹脂組成物を作製した。組成物の25℃における粘度はいずれも3Pa・sであった。
【0024】
【化2】
Figure 0004696359
(ここで、m及びnは上記の重量平均分子量を示す1以上の整数である。)
【0025】
【表1】
Figure 0004696359
【0026】
作製した実施例及び比較例の液状封止用エポキシ樹脂組成物を用いて次の各試験を行なった。
(1)反射率
硬化物の表面の反射率を測定し、非鏡面か否かを評価した。
TCP(チップサイズ15.6×1.9×0.65mm、デバイス孔16.1×2.1mm、リードピッチ:65〜195μm、ポリイミド製テープキャリア)を、実施例1、2及び比較例1の液状封止用エポキシ樹脂組成物を用いてディスペンス方式により140℃/15分の加熱条件で成形して作製し、液状封止用エポキシ樹脂組成物(硬化物)の表面の反射率を、デジタル変角光沢計(スガ試験器株式会社製)を用いて、図2に概略図で示すように測定した。白色光源4を用いて、光源入射角6を45°、60°又は75°として測定した値を、表面コーティングされたセラミック白色板で校正した。結果を表2に示す。
(2)速硬化性
実施例1及び比較例1の液状封止用エポキシ樹脂組成物をディスペンス方式により130℃又は140℃で所定時間加熱して300μm厚のシート状に成形した硬化物を、長さ70mm、幅10mmの短冊状に切り取り試験片とし、引張試験機(株式会社島津製作所製)を用いて、JIS−K−6911に準拠した3点支持型の曲げ試験を行い、スパン距離24mm、曲げ速度2mm/minの条件で曲げ強度(σ、単位:MPa)及び曲げ弾性率(E、単位:GPa)を求め、140℃/60分の加熱条件で成形した硬化物の値に対する百分率を算出して速硬化性を評価した。結果を表3に示す。
【0027】
【表2】
Figure 0004696359
【0028】
【表3】
Figure 0004696359
【0029】
次に、光学的自動検査機を用いて液状封止用エポキシ樹脂組成物の硬化後の評価を行なったところ、いずれの入射角でも硬化物表面の反射率が10%以下である実施例1及び2では、硬化物の表面が非鏡面であり、ハレーションを起こさず容易に評価できたのに対して、反射率が40%以上の比較例1では、硬化物の表面が鏡面で、ハレーションを起こして評価が困難であった。
また、速硬化性の評価では、曲げ強度及び曲げ弾性率は、ともに140℃/60分で成形した硬化物に対する百分率が、成形温度130℃、140℃のいずれの場合でも、実施例1は比較例1よりも高い。特に140℃/10分の値を比較すると、実施例1では曲げ強度、曲げ弾性率ともに100%であるのに対して、比較例1ではそれぞれ90.7%、97.2%で著しく劣る。これらの結果から実施例1の液状封止用エポキシ樹脂組成物が速硬化性であることが確認される。
【0030】
【発明の効果】
本発明になる液状封止用エポキシ樹脂組成物は、実施例で示したように、表面が非鏡面の硬化物が得られるので光学的自動検査機においてハレーションをおこさず評価が容易で、この液状封止用エポキシ樹脂組成物を用いて素子を封止すれば半導体装置等の電子部品装置の製造工程での管理等も簡便になり、その工業的価値は大である。特に液状封止材が多く用いられるCOB、COG等のベアチップ実装した半導体装置やTCPに有用である。
【図面の簡単な説明】
【図1】硬化物表面の反射率の測定方法を示す概略図
【図2】TCPにおいて液状封止用エポキシ樹脂組成物の硬化物表面の反射率の測定方法を示す概略図
【符号の説明】
1:液状封止用エポキシ樹脂組成物の硬化物
2:入射光
3:反射光
4:光源
5:測定器
6:入射角
7:ソルダーレジスト
8:テープキャリア
9:Cuリード
10:Auバンプ
11:半導体チップ[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a liquid sealing epoxy resin composition suitable for sealing an electronic component device and an electronic component device including an element sealed thereby.
[0002]
[Prior art]
Conventionally, in the field of element sealing of electronic component devices such as transistors and ICs, resin sealing has been the mainstream in terms of productivity and cost, and epoxy resin compositions have been widely used. This is because the epoxy resin is balanced in various properties such as workability, moldability, electrical properties, moisture resistance, heat resistance, mechanical properties, and adhesiveness with inserts. In semiconductor devices mounted on bare chips such as COB (Chip on Board) and COG (Chip on Glass), and TCP (Tape Carrier Package), an epoxy resin composition for liquid sealing is often used as a sealing material.
[0003]
Curing of the epoxy resin composition for liquid sealing requires heating at a high temperature for a long time, and in recent years, the demand for a fast-curing epoxy resin composition for liquid sealing intended to improve productivity has increased. ing.
Also, recently, an optical automatic inspection machine is often used for evaluation after curing of the epoxy resin composition for liquid sealing, so that the surface after curing is required to have a non-mirror surface. This is because halation is not performed in the optical automatic inspection machine. When a solid phenol novolac resin is used as a curing agent in the liquid sealing epoxy resin composition, there is an advantage in that the moisture resistance reliability of the sealed product is improved, but the appearance after curing tends to be a mirror surface. .
[0004]
[Problems to be solved by the invention]
The present invention has been made in view of such circumstances, and provides an epoxy resin composition for liquid sealing in which the surface of a cured product has a non-mirror surface, and an electronic component device including an element sealed thereby.
[0005]
[Means for Solving the Problems]
As a result of intensive studies in order to solve the above problems, the present inventors have used an allyl group-containing phenol resin as a curing agent, and for liquid sealing such that the surface reflectance of the cured product is 10% or less. It has been found that the above object can be achieved by the epoxy resin composition, and the present invention has been completed.
[0006]
That is, the present invention
(1) A liquid seal containing (A) an epoxy resin and (B) a curing agent as essential components, (B) the curing agent containing an allyl group-containing phenol resin, and the surface reflectance of the cured product is 10% or less. Epoxy resin composition for stopping,
(2) The epoxy resin composition for liquid sealing according to the above (1), wherein the allyl group-containing phenol resin is an allyl group-containing phenol novolac resin,
(3) The epoxy resin composition for liquid sealing according to the above (1) or (2), further comprising (C) a filler,
(4) (D) The epoxy resin composition for liquid sealing according to any one of (1) to (3), further containing a solvent,
(5) TCP sealing material using the liquid sealing epoxy resin composition according to any one of (1) to (4) above,
(6) An electronic component device including an element sealed using the liquid sealing epoxy resin composition according to any one of (1) to (4), and
(7) TCP provided with an element sealed using the liquid sealing epoxy resin composition according to any one of (1) to (4) above
About.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
The (A) epoxy resin used in the present invention is not particularly limited as long as it is an epoxy resin having two or more epoxy groups in one curable molecule, and is generally used in an epoxy resin composition for liquid sealing. Any epoxy resin can be used, and if the composition is liquid, either solid or liquid may be used, or both may be used in combination. For example, phenols and aldehydes such as glycidyl ether type epoxy resin, orthocresol novolac type epoxy resin obtained by reaction of bisphenol A, bisphenol F, bisphenol AD, bisphenol S, naphthalene diol, hydrogenated bisphenol A and the like with epichlorohydrin Novolak type epoxy resin obtained by epoxidizing novolak resin obtained by condensation or co-condensation with glycidyl ester type epoxy resin obtained by reaction of polybasic acid such as phthalic acid and dimer acid and epichlorohydrin, diaminodiphenylmethane, isocyanuric acid, etc. Glycidylamine-type epoxy resin obtained by reaction of polyamines with epichlorohydrin, linear aliphatic epoxy obtained by oxidizing olefinic bonds with peracids such as peracetic acid Butter, and the like alicyclic epoxy resins may be used in combination of two or more even with these alone. Among these, a liquid epoxy resin is preferable from the viewpoint of reducing the viscosity, and a bisphenol liquid epoxy resin is more preferable from the viewpoint of reactivity with the phenol resin.
In addition, these epoxy resins are preferably sufficiently purified and have few ionic impurities. For example, free Na ions and free Cl ions are preferably 500 ppm or less.
[0008]
The (B) curing agent used in the present invention is not particularly limited as long as it contains an allyl group-containing phenol resin, and those generally used as a curing agent for epoxy resins can be used. Examples include phenolic resins, melamine resins, acrylic resins, urea resins, isocyanates, aliphatic polyamines, polyamide resins, amine compounds such as aromatic diamines, acid anhydrides, Lewis acid complex compounds, and the like. May also be used in combination of two or more. Among these, a phenol resin is preferable from the viewpoint of storage stability, and an aromatic amine is preferable from the viewpoint of adhesiveness. Moreover, if a composition is liquid, either a solid hardening agent and a liquid hardening agent may be used, or both may be used together, but a liquid hardening agent is preferable from a viewpoint of viscosity reduction.
[0009]
The allyl group-containing phenol resin used as a curing agent in the present invention is not particularly limited as long as it has an allyl group, and examples thereof include compounds represented by the following general formulas (I) to (V). These 1 type may be used independently or may be used in combination of 2 or more type.
[Chemical 1]
Figure 0004696359
(Wherein R in the formulas (I) to (V) is a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, substituted or non-substituted, It is selected from a substituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted allyl group having 1 to 10 carbon atoms and a substituted or unsubstituted aryl group having 1 to 12 carbon atoms, and m and n are each independently 1 Indicates the integer above.)
[0010]
Of these, the phenolic resin represented by the above general formula (I) or (IV) is preferable from the viewpoint of making the surface of the cured product non-specular and easy to obtain, and the non-specularity and fast curability of the surface of the cured product are preferred. From the viewpoint of coexistence, the allyl group-containing phenol novolac resin such as the phenol resin represented by the general formula (I) is more preferable.
As a phenol resin shown by the said general formula (I), what is R is a hydrogen atom and n is an average 2-3 is more preferable from a viewpoint of viscosity reduction. Similarly, from the viewpoint, the weight average molecular weight of the phenol resin represented by the general formula (I) is preferably 600 or less, more preferably less than 500, further preferably 450 or less, and the viscosity at 25 ° C. is 5 to 5 It is preferably 80 Pa · s, more preferably 10 to 50 Pa · s, still more preferably 15 to 40 Pa · s, and the hydroxyl equivalent is preferably 100 to 200, more preferably 120 to 170, 130-160 is more preferable.
The phenol resin represented by the general formula (IV) may be a random copolymer, a block copolymer or an alternating copolymer of m repeating units and n repeating units. From the viewpoint of becoming a non-mirror surface and from the viewpoint of reducing the viscosity, it is more preferable that R is a hydrogen atom and m and n are 1 to 2 on average. Similarly, from the viewpoint, the weight average molecular weight of the phenol resin represented by the general formula (IV) is preferably 200 to 1200, more preferably 300 to 1000, still more preferably 400 to 600, and the viscosity is a viscosity at 60 ° C. Is preferably 0.5 to 20 Pa · s, more preferably 1 to 10 Pa · s, still more preferably 3 to 6 Pa · s, and the hydroxyl equivalent is preferably 50 to 500, and preferably 100 to 100 350 is more preferable, and 150 to 250 is more preferable.
Here, the weight average molecular weight means a weight average molecular weight in terms of polystyrene as measured by GPC.
[0011]
The blending amount of the allyl group-containing phenol resin is preferably 30% by weight or more, more preferably 40% by weight or more, and still more preferably 60% by weight or more based on the total amount of the curing agent (B) in order to exhibit its performance.
[0012]
The equivalent ratio of (A) epoxy resin and (B) curing agent is not particularly limited, but in order to suppress each unreacted component to a small amount, the curing agent is 0.6 to 1.6 equivalents of epoxy resin. It is preferable to set to the range, 0.7 to 1.4 equivalents are more preferable, and 0.8 to 1.2 equivalents are more preferable. 0.6. When deviating from the range of ˜1.6 equivalents, the curing reaction becomes insufficient and the reliability tends to decrease.
Here, the equivalent is the reaction equivalent. For example, the equivalent of phenol resin is calculated as one phenolic hydroxyl group reacts with one epoxy group, and the equivalent of aromatic amine is amino with respect to one epoxy group. One active hydrogen of the group is calculated as reacting, and the equivalent of acid anhydride is calculated as one acid anhydride group reacts per one epoxy group.
[0013]
A curing accelerator can be used in the liquid sealing epoxy resin composition of the present invention as necessary. The curing accelerator is generally used in the epoxy resin composition for liquid sealing and is not particularly limited. For example, 1,8-diaza-bicyclo (5,4,0) undecene-7, 1,5- Cycloamidine compounds such as diaza-bicyclo (4,3,0) nonene, 5,6-dibutylamino-1,8-diaza-bicyclo (5,4,0) undecene-7, derivatives thereof, and phenol resins thereof Salts such as salts, or these compounds to maleic anhydride, 1,4-benzoquinone, 2,5-toluquinone, 1,4-naphthoquinone, 2,3-dimethylbenzoquinone, 2,6-dimethylbenzoquinone, 2,3- Quinone compounds such as dimethoxy-5-methyl-1,4-benzoquinone, 2,3-dimethoxy-1,4-benzoquinone, phenyl-1,4-benzoquinone, diazopheny Compounds with intramolecular polarization formed by adding π-bonded compounds such as methane and phenol resin, tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol Compounds, imidazole compounds such as 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 2-heptadecylimidazole, tributylphosphine, methyldiphenylphosphine, triphenylphosphine , Organic phosphine compounds such as diphenylphosphine and phenylphosphine and derivatives thereof, or those compounds having a π bond such as the above quinone compounds, diazophenylmethane, phenol resin, etc. Organic phosphorus compounds such as compounds having intramolecular polarization formed by adding a product, triphenylphosphine triphenylboron, tetraphenylphosphonium tetraphenylborate, 2-ethyl-4-methylimidazoletetraphenylborate, N-methylmorpholine tetraphenyl Examples thereof include phenylboron salts such as borates and the like and derivatives thereof. One of these may be used alone, or two or more thereof may be used in combination.
The blending amount of the curing accelerator is not particularly limited as long as the curing acceleration effect is achieved, but is preferably 0.1 to 20% by weight, more preferably 1 with respect to (A) the epoxy resin. ~ 15% by weight. If it is less than 0.1% by weight, it tends to be inferior in curability in a short time, and if it exceeds 20% by weight, the curing rate is too fast and it becomes difficult to control, and the storage stability such as pot life and shell life is inferior. Tend to.
[0014]
(C) Filler can be mix | blended with the epoxy resin composition for liquid sealing of this invention as needed. (C) The filler is generally used in the epoxy resin composition for liquid sealing and is not particularly limited, but it is an inorganic filler from the viewpoint of hygroscopicity, reduction of linear expansion coefficient, improvement of thermal conductivity and improvement of strength. Is preferred. For example, silica such as fused silica and crystalline silica, alumina such as calcium carbonate, talc, clay, and alumina oxide, silicon nitride, silicon carbide, boron nitride, calcium silicate, potassium titanate, aluminum nitride, beryllia, zirconia, zircon, phosphor Examples thereof include powders such as stellite, steatite, spinel, mullite, and titania, beads formed by spheroidizing these, and glass fibers. Furthermore, examples of the inorganic filler having a flame retardant effect include aluminum hydroxide, magnesium hydroxide, zinc borate, and zinc molybdate. These fillers may be used alone or in combination of two or more. Among these, silica is preferable and fused silica is more preferable from the viewpoint of suppression of increase in viscosity and physical properties of the cured product.
[0015]
The shape of the filler is preferably close to a sphere from the viewpoint of moldability such as fluidity, and more preferably a spherical fused silica having a wide particle size distribution so as to perform close packing.
(C) In the case of spherical silica, the average particle diameter of the filler is preferably in the range of 1 to 20 μm, and more preferably in the range of 2 to 10 μm. If the average particle size is less than 1 μm, dispersibility in the liquid resin tends to be inferior, and thixotropic properties are imparted to the liquid epoxy resin composition for sealing, and the flow properties tend to be inferior. There is a tendency that the penetrating / fluidity of the epoxy resin composition for liquid sealing into the fine gap is lowered and voids / unfilled are easily caused.
Moreover, you may use what carried out the coupling process of the surface as needed for these fillers.
(C) 20 to 90 weight% of the epoxy resin composition for liquid sealing is preferable, as for the compounding quantity of a filler, 30 to 85 weight% is more preferable, and 50 to 80 weight% is further more preferable. If the blending amount is less than 20% by weight, the thermal expansion coefficient reducing effect tends to be low and the thermal shock resistance tends to be inferior. If the blending amount exceeds 90% by weight, the viscosity of the liquid epoxy resin composition increases, and the fluidity and penetration There is a tendency to cause deterioration in performance and dispensing properties.
[0016]
(D) A solvent can be mix | blended with the epoxy resin composition for liquid sealing of this invention as needed for viscosity reduction. In particular, when a solid epoxy resin and a curing agent are used, it is necessary to add a solvent in order to obtain a liquid composition.
(D) Although there is no restriction | limiting in particular as a solvent, For example, alcohol solvents, such as methyl alcohol, ethyl alcohol, propyl alcohol, and butyl alcohol, ketone solvents, such as acetone and methyl ethyl ketone, ethylene glycol ethyl ether, ethylene glycol methyl ether , Glycol ether solvents such as ethylene glycol butyl ether, propylene glycol methyl ether, dipropylene glycol methyl ether, propylene glycol ethyl ether, propylene glycol methyl ether acetate, lactone solvents such as butyrolactone, valerolactone, caprolactone, dimethylacetamide, dimethylformamide Amide solvents such as toluene, organic solvents such as toluene and xylene, etc. It may be used also in combination of two or more thereof. Of these, glycol ether solvents and lactone solvents are preferred from the viewpoint of moldability such as fast curability and film formability. In addition, a solvent having a boiling point of 100 ° C. or higher is preferable from the viewpoint of avoiding bubble formation due to rapid volatilization during heat curing.
(D) Although there will be no restriction | limiting in particular if the mixing | blending of a solvent is the quantity by which the effect of this invention is acquired, It shall be 5-30 weight% from a quick-hardening viewpoint with respect to the epoxy resin composition for liquid sealing. 10 to 20% by weight is more preferable.
[0017]
The liquid sealing epoxy resin composition of the present invention includes, as other additives, nitrogen-containing compounds such as red phosphorus, phosphate esters, melamine, melamine derivatives, compounds having a triazine ring, cyanuric acid derivatives, and isocyanuric acid derivatives. Phosphorus nitrogen-containing compounds such as cyclophosphazene, metal compounds such as zinc oxide, iron oxide, molybdenum oxide and ferrocene, antimony oxides such as antimony trioxide, antimony tetraoxide and antimony pentoxide, flame retardants such as brominated epoxy resins, Ion trapping agents such as hydrotalcites, hydrous oxides of elements such as magnesium, aluminum, titanium, zirconium and bismuth, higher fatty acids, higher fatty acid metal salts, ester waxes, polyolefin waxes, polyethylene, polyethylene oxide, etc. Mold, silicone oil and Stress relieving agent such as Kongomu powder, dyes, coloring agents such as carbon black, diluents, leveling agents, may be blended as required antifoaming agent.
[0018]
From the viewpoint of making the surface of the cured product after molding a non-mirror surface, the liquid sealing epoxy resin composition of the present invention needs to have a reflectance of 10% or less on the surface of the cured product. Here, the reflectance of the surface of the cured product is an incident angle of 45 on the cured product. ° ~ 75 ° Is the reflectance of light when irradiated with light, and the incident angle is 45 ° ~ 60 ° The reflectance at 5 is preferably 5% or less, more preferably 3% or less, and even more preferably 2% or less. Although there is no restriction | limiting in particular as a measuring method of the reflectance of the surface of hardened | cured material, For example, as shown in the outline in FIG. 1, the epoxy resin composition for liquid sealing of this invention is used using a digital variable angle gloss meter. The cured product 1 is irradiated with white light from the light source 4 at an incident angle 6 of 45 to 75 °, the amount of reflected light 3 with respect to the amount of incident light 2 is measured, and calibrated with the measured value on the white plate to reflect the reflectance. General methods such as obtaining In FIG. 1, 5 indicates a measuring instrument. In the present invention, the liquid sealing epoxy resin composition having a reflectance of 10% or less of the surface of the cured product by adjusting the combination and the amount of various components to be blended in the liquid sealing epoxy resin composition. Can be obtained. (B) Selection of a hardening | curing agent and its compounding quantity are especially important.
[0019]
The liquid sealing epoxy resin composition of the present invention can be prepared by any method as long as the above-described various components can be uniformly dispersed and mixed, but as a general method, a predetermined amount of components are weighed. However, it can be obtained by mixing and kneading using a rough machine, a mixing roll, a planetary mixer or the like, and defoaming as necessary.
[0020]
As an electronic component device obtained by sealing an element with the liquid sealing epoxy resin composition obtained in the present invention, a lead frame, a wired tape carrier, a wiring board, glass, a support member such as a silicon wafer, An element such as a semiconductor chip, an active element such as a transistor, a diode or a thyristor, or a passive element such as a capacitor, a resistor, a resistor array, a coil or a switch is mounted. And an electronic component device obtained by sealing with. As such an electronic component device, for example, a semiconductor element is fixed on a lead frame, and a terminal portion and a lead portion of an element such as a bonding pad are connected by wire bonding or bump, and then the liquid sealing epoxy of the present invention is used. Sealed by a dispensing method using a resin composition, PLCC (Plastic Leaded Chip Carrier), QFP (Quad Flat Package), SOP (Small Outline Package), SOJ (Small Outline J-leaded package), TSOP (TSOP) General resin-sealed ICs such as Thin Small Outline Package (TQFP) and semiconductor chips lead-bonded to tape carriers were sealed with the epoxy resin composition for liquid sealing of the present invention. Connect to TCP (Tape Carrier Package), wiring formed on wiring boards and glass with wire bonding, flip chip bonding, solder, etc. The continued semiconductor chip was formed on a semiconductor device, a wiring board or glass mounted with bare chips such as COB (Chip On Board) and COG (Chip On Glass) encapsulated with the epoxy resin composition for liquid encapsulation of the present invention. An active element such as a semiconductor chip, a transistor, a diode, or a thyristor and / or a passive element such as a capacitor, resistor, or coil that is connected to the wiring by wire bonding, flip chip bonding, solder, or the like, and the liquid sealing epoxy of the present invention After mounting a semiconductor chip on an interposer substrate on which a hybrid IC, a multichip module sealed with a resin composition, and a terminal for connecting a mother board are formed, and connecting the wiring formed on the semiconductor chip and the interposer substrate by bump or wire bonding A semiconductor chip with the liquid sealing epoxy resin composition of the present invention BGA sealing the flop mounting side (Ball Grid Array), CSP (Chip Size Package), and the like MCP (Multi Chip Package). Moreover, the epoxy resin composition for liquid sealing of this invention can be used also for a printed circuit board.
Especially, the outstanding characteristic can be acquired with the semiconductor device which carried out bare chip mounting, such as TCP, COB, COG using the epoxy resin composition for liquid sealing of this invention. TCP is thin, lightweight, and has excellent bending resistance and is used for liquid crystal drivers such as notebook personal computers, laminated memory modules, and the like.
[0021]
Examples of the method for sealing an element using the liquid sealing epoxy resin composition of the present invention include a dispensing method, a casting method, and a printing method.
[0022]
【Example】
EXAMPLES Next, although an Example demonstrates this invention, the scope of the present invention is not limited to these Examples.
[0023]
Example 1 and Comparative Example 1
As epoxy resin, epoxy equivalent 160 bisphenol F type liquid epoxy resin (trade name YDF-8170C, manufactured by Toto Kasei Co., Ltd.), bisphenol AD type liquid epoxy resin (trade name R-710, manufactured by Mitsui Chemicals), o-cresol novolac type Epoxy resin (trade name ESCN-195-6, manufactured by Tohto Kasei Co., Ltd.), weight average molecular weight of 426 as a curing agent, hydroxyl group equivalent of 141, and an allyl group represented by the following formula (VI) at a viscosity of 25 Pa · s at 25 ° C. Random copolymer having a phenol resin 1 containing, a weight average molecular weight of 710, a hydroxyl group equivalent of 210, a viscosity at 60 ° C. of 4.4 Pa · s, represented by the following formula (VII) and a molar ratio m / n of 1/1 An allyl group-containing phenolic resin 2 having a weight average molecular weight of 750, a hydroxyl group equivalent of 105, and a softening point of 83 ° C. Lunovolac resin (trade name H-100 manufactured by Meiwa Kasei Co., Ltd.), phenol novolak resin salt of 1,8-diazabicyclo (5,4,0) undecene-7 as a curing accelerator (trade name SA-841 manufactured by San Apro Co., Ltd.) Specific surface area of 1m as filler 2 / G, spherical fused silica having an average particle size of 4 μm, and a solvent mixture of propylene glycol monomethyl ether acetate and γ-butyrolactone in a weight ratio of 1/1 as a solvent, respectively, in parts by weight shown in Table 1, respectively, After kneading and dispersing, vacuum degassing was performed to prepare the liquid sealing epoxy resin compositions of Examples 1 and 2 and Comparative Example 1. The viscosities at 25 ° C. of the compositions were all 3 Pa · s.
[0024]
[Chemical 2]
Figure 0004696359
(Here, m and n are integers of 1 or more indicating the above weight average molecular weight.)
[0025]
[Table 1]
Figure 0004696359
[0026]
The following each test was done using the produced epoxy resin composition for liquid sealing of an Example and a comparative example.
(1) Reflectance
The reflectance of the surface of the cured product was measured to evaluate whether or not it was non-mirror surface.
TCP (chip size 15.6 × 1.9 × 0.65 mm, device hole 16.1 × 2.1 mm, lead pitch: 65 to 195 μm, polyimide tape carrier) is used in Examples 1 and 2 and Comparative Example 1. The liquid sealing epoxy resin composition is molded by a dispensing method under heating conditions of 140 ° C./15 minutes, and the surface reflectance of the liquid sealing epoxy resin composition (cured product) is digitally changed. Using an angular gloss meter (manufactured by Suga Test Instruments Co., Ltd.), the measurement was performed as schematically shown in FIG. Using the white light source 4, the value measured at a light source incident angle 6 of 45 °, 60 ° or 75 ° was calibrated with a ceramic white plate with a surface coating. The results are shown in Table 2.
(2) Fast curing
A cured product obtained by heating the epoxy resin composition for liquid sealing of Example 1 and Comparative Example 1 at 130 ° C. or 140 ° C. for a predetermined time by a dispensing method to form a 300 μm thick sheet, having a length of 70 mm and a width of 10 mm. Using a tensile tester (manufactured by Shimadzu Corporation) as a strip-shaped test piece, a 3-point support type bending test in accordance with JIS-K-6911 is performed, and a span distance is 24 mm and a bending speed is 2 mm / min. The bending strength (σ, unit: MPa) and the flexural modulus (E, unit: GPa) are obtained under the conditions, and the percentage of the cured product formed under the heating condition of 140 ° C./60 minutes is calculated to obtain the fast curability. evaluated. The results are shown in Table 3.
[0027]
[Table 2]
Figure 0004696359
[0028]
[Table 3]
Figure 0004696359
[0029]
Next, when evaluation after hardening of the epoxy resin composition for liquid sealing was performed using an optical automatic inspection machine, the reflectance of the cured product surface was 10% or less at any incident angle and In No. 2, the surface of the cured product was non-specular and could be easily evaluated without causing halation, whereas in Comparative Example 1 having a reflectance of 40% or more, the surface of the cured product was specular and caused halation. Evaluation was difficult.
In the evaluation of fast curability, both the bending strength and the flexural modulus were compared in Example 1 regardless of whether the percentage of the cured product molded at 140 ° C./60 minutes was the molding temperature of 130 ° C. or 140 ° C. Higher than Example 1. In particular, when the values of 140 ° C./10 minutes are compared, in Example 1, both the bending strength and the flexural modulus are 100%, whereas in Comparative Example 1, they are remarkably inferior at 90.7% and 97.2%, respectively. From these results, it is confirmed that the epoxy resin composition for liquid sealing of Example 1 is fast-curing.
[0030]
【The invention's effect】
As shown in the examples, the liquid sealing epoxy resin composition according to the present invention provides a cured product having a non-specular surface, so that it is easy to evaluate without causing halation in an optical automatic inspection machine. If an element is sealed using an epoxy resin composition for sealing, management in the manufacturing process of an electronic component device such as a semiconductor device is simplified, and its industrial value is great. In particular, it is useful for a semiconductor device or a TCP mounted with bare chips such as COB and COG in which a large amount of liquid sealing material is used.
[Brief description of the drawings]
FIG. 1 is a schematic diagram showing a method for measuring the reflectance of a cured product surface
FIG. 2 is a schematic diagram showing a method for measuring the reflectance of a cured product surface of a liquid sealing epoxy resin composition in TCP.
[Explanation of symbols]
1: Cured product of epoxy resin composition for liquid sealing
2: Incident light
3: Reflected light
4: Light source
5: Measuring instrument
6: Incident angle
7: Solder resist
8: Tape carrier
9: Cu lead
10: Au bump
11: Semiconductor chip

Claims (6)

(A)エポキシ樹脂、(B)硬化剤、および(D)溶剤を必須成分とし、(B)硬化剤が、硬化剤全量に対して60重量%以上のアリル基含有フェノール樹脂を含有し、かつ入射角45°〜75°で光照射したときの硬化物の表面の反射率が10%以下である液状封止用エポキシ樹脂組成物。(A) an epoxy resin, (B) a curing agent, and (D) a solvent as essential components, (B) the curing agent contains 60% by weight or more of an allyl group-containing phenol resin with respect to the total amount of the curing agent , and An epoxy resin composition for liquid sealing, wherein the reflectance of the surface of the cured product when irradiated with light at an incident angle of 45 ° to 75 ° is 10% or less. アリル基含有フェノール樹脂がアリル基含有フェノールノボラック樹脂である請求項1記載の液状封止用エポキシ樹脂組成物。  The epoxy resin composition for liquid sealing according to claim 1, wherein the allyl group-containing phenol resin is an allyl group-containing phenol novolac resin. (C)充填剤をさらに含有する請求項1又は請求項2記載の液状封止用エポキシ樹脂組成物。  The epoxy resin composition for liquid sealing according to claim 1 or 2, further comprising (C) a filler. 請求項1〜3のいずれかに記載の液状封止用エポキシ樹脂組成物を用いたTCP用封止材。  The sealing material for TCP using the epoxy resin composition for liquid sealing in any one of Claims 1-3. 請求項1〜3のいずれかに記載の液状封止用エポキシ樹脂組成物を用いて封止された素子を備えた電子部品装置。  The electronic component apparatus provided with the element sealed using the epoxy resin composition for liquid sealing in any one of Claims 1-3. 請求項1〜3のいずれかに記載の液状封止用エポキシ樹脂組成物を用いて封止された素子を備えたTCP。  TCP provided with the element sealed using the epoxy resin composition for liquid sealing in any one of Claims 1-3.
JP2000398598A 2000-12-27 2000-12-27 Liquid sealing epoxy resin composition and electronic component device Expired - Lifetime JP4696359B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000398598A JP4696359B2 (en) 2000-12-27 2000-12-27 Liquid sealing epoxy resin composition and electronic component device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000398598A JP4696359B2 (en) 2000-12-27 2000-12-27 Liquid sealing epoxy resin composition and electronic component device

Publications (2)

Publication Number Publication Date
JP2002194066A JP2002194066A (en) 2002-07-10
JP4696359B2 true JP4696359B2 (en) 2011-06-08

Family

ID=18863528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000398598A Expired - Lifetime JP4696359B2 (en) 2000-12-27 2000-12-27 Liquid sealing epoxy resin composition and electronic component device

Country Status (1)

Country Link
JP (1) JP4696359B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4265174B2 (en) * 2002-08-27 2009-05-20 パナソニック電工株式会社 Liquid sealing material and semiconductor device
KR101047701B1 (en) 2005-11-25 2011-07-08 히다치 가세고교 가부시끼가이샤 Liquid resin composition and electronic component device for electronic components
WO2015126172A1 (en) * 2014-02-18 2015-08-27 주식회사 엘지화학 Encapsulation film and organo-electronic device including same
KR20150097359A (en) * 2014-02-18 2015-08-26 주식회사 엘지화학 Encapsulation film and organic electronic device comprising the same
WO2015147600A1 (en) * 2014-03-27 2015-10-01 주식회사 엘지화학 Sealing film and organic electronic device including same
KR101687479B1 (en) 2014-03-27 2016-12-16 주식회사 엘지화학 Encapsulation Film and Organic Electronic Device Comprising the Same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0931167A (en) * 1995-07-19 1997-02-04 Mitsui Toatsu Chem Inc Liquid epoxy resin composition for sealing and cured material thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07173236A (en) * 1993-12-17 1995-07-11 Dai Ichi Kogyo Seiyaku Co Ltd Allylnaphthol cocondensate and epoxy resin composition
JPH0812745A (en) * 1994-06-29 1996-01-16 Matsushita Electric Works Ltd Liquid epoxy resin composition
JPH0885719A (en) * 1994-07-19 1996-04-02 Matsushita Electric Works Ltd Liquid epoxy resin composition and its production
JPH0867805A (en) * 1994-08-29 1996-03-12 Matsushita Electric Works Ltd Liquid epoxy resin composition
JPH10251377A (en) * 1997-03-12 1998-09-22 Hitachi Chem Co Ltd Molding material for sealing and electronic part
JP2000169537A (en) * 1998-12-04 2000-06-20 Meiwa Kasei Kk Liquid phenol novolac resin and curing agent,for semiconductor sealing
JP2001031740A (en) * 1999-07-19 2001-02-06 Sumitomo Bakelite Co Ltd Liquid sealing resin composition, production of semiconductor device, and semiconductor device
JP2001298146A (en) * 2000-04-13 2001-10-26 Mitsubishi Electric Corp Multilayer wiring base and method for manufacturing the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0931167A (en) * 1995-07-19 1997-02-04 Mitsui Toatsu Chem Inc Liquid epoxy resin composition for sealing and cured material thereof

Also Published As

Publication number Publication date
JP2002194066A (en) 2002-07-10

Similar Documents

Publication Publication Date Title
US6632881B1 (en) Encapsulant of epoxy resin and liquid aromatic amine curing agent
KR101152040B1 (en) Epoxy resin composition and semiconductor device
EP1558678A1 (en) Toughened epoxy / polyanhydride no- flow underfill encapsulant composition
JP2004210901A (en) Liquid epoxy resin composition and electronic component device
KR100893022B1 (en) Curing accelerator, curable resin composition, and electronic part/device
JP2023105016A (en) Encapsulating epoxy resin composition for ball grid array package, cured epoxy resin object, and electronic component/device
JP2003321594A (en) Epoxy resin molding material for sealing and electronic part device
JP2023030182A (en) Epoxy resin composition and electronic component device
KR20000062775A (en) Encapsulant composition and an electronic device
JP3659116B2 (en) Epoxy resin molding material for sealing and electronic component device
JP4696359B2 (en) Liquid sealing epoxy resin composition and electronic component device
JP2001207021A (en) Liquid epoxy resin composition and electronic part device
JP4661108B2 (en) Liquid epoxy resin composition for sealing and electronic component device
JP2002363251A (en) Epoxy resin composition for sealing and electronic part device
JP4784238B2 (en) Liquid sealing material fluidity evaluation method and liquid sealing material selection method
JP2011179008A (en) Epoxy resin composition and electronic part device
JP2004307647A (en) Epoxy resin molding material for sealing use and semiconductor device
JP2003034747A (en) Liquid epoxy resin composition and electronic part device
JP4631165B2 (en) Liquid sealing epoxy resin composition and electronic component device
JP2014129485A (en) Epoxy resin composition and electronic component device
JPH1121427A (en) Epoxy resin molding material for sealing electronic part and electronic part
KR102127589B1 (en) Epoxy resin composition and electronic component device
JP3659150B2 (en) Epoxy resin molding material for sealing and electronic component device
JP2012107209A (en) Epoxy resin composition for sealing and electronic part device
JP2000129094A (en) Epoxy resin molding material for sealing and electronic component device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071128

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100623

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100701

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100825

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20100825

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20101019

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101216

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20110201

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20110214

R151 Written notification of patent or utility model registration

Ref document number: 4696359

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140311

Year of fee payment: 3

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term