JPH09232103A - Manufacturing method of chip thermistor - Google Patents

Manufacturing method of chip thermistor

Info

Publication number
JPH09232103A
JPH09232103A JP3919696A JP3919696A JPH09232103A JP H09232103 A JPH09232103 A JP H09232103A JP 3919696 A JP3919696 A JP 3919696A JP 3919696 A JP3919696 A JP 3919696A JP H09232103 A JPH09232103 A JP H09232103A
Authority
JP
Japan
Prior art keywords
resistance value
thin plate
large number
value adjusting
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3919696A
Other languages
Japanese (ja)
Other versions
JP3226014B2 (en
Inventor
Masami Koshimura
正己 越村
Yoshihiro Higuchi
由浩 樋口
Koji Yotsumoto
孝二 四元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP03919696A priority Critical patent/JP3226014B2/en
Publication of JPH09232103A publication Critical patent/JPH09232103A/en
Application granted granted Critical
Publication of JP3226014B2 publication Critical patent/JP3226014B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

(57)【要約】 【課題】マイクロクラック等の発生を防止することによ
り十分な機械的強度を得ることができ、安価にかつ大量
に生産でき、更に抵抗値のばらつきを抑えることにより
サーミスタ本来の機能精度を向上できる。 【解決手段】セラミック焼結体よりなる薄板材16の表
面に平行に多数の抵抗値調整用電極15を形成した後、
この薄板材に上記電極の長手方向に直交する方向に延び
る多数の長孔17を形成し、これらの長孔間に多数の角
柱部18を形成する。多数の角柱部の全側面に絶縁性無
機物層13を形成した後、この角柱部を各抵抗値調整用
電極の幅方向の中央に沿ってそれぞれ切断し、両端に抵
抗値調整用電極がそれぞれ露出するサーミスタ素体12
を形成する。更にサーミスタ素体の両端面及び一対の抵
抗値調整用電極の一端面を含むサーミスタ素体の両端部
に焼付け電極層及びめっき層からなる端子電極14,1
4を形成する。
(57) 【Abstract】 PROBLEM TO BE SOLVED: It is possible to obtain sufficient mechanical strength by preventing the occurrence of microcracks and the like, and it is possible to mass-produce at low cost. Furthermore, by suppressing variations in resistance value, the thermistor's original Functional accuracy can be improved. SOLUTION: After a large number of resistance value adjusting electrodes 15 are formed parallel to the surface of a thin plate material 16 made of a ceramic sintered body,
A large number of elongated holes 17 extending in a direction orthogonal to the longitudinal direction of the electrode are formed in this thin plate material, and a large number of prismatic portions 18 are formed between these elongated holes. After forming the insulating inorganic material layer 13 on all side surfaces of a large number of prismatic portions, the prismatic portions are cut along the center of each resistance value adjusting electrode in the width direction, and the resistance value adjusting electrodes are exposed at both ends. Thermistor body 12
To form Further, terminal electrodes 14, 1 made of a baked electrode layer and a plated layer are formed on both ends of the thermistor body including both end faces of the thermistor body and one end faces of a pair of resistance value adjusting electrodes.
4 is formed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、各種の電子機器の
温度補償用サーミスタや表面温度測定用センサに適する
チップ型サーミスタの製造方法に関する。更に詳しくは
プリント回路基板等に表面実装されるチップ型サーミス
タの製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a chip type thermistor suitable for temperature compensating thermistors and surface temperature measuring sensors for various electronic devices. More specifically, it relates to a method for manufacturing a chip type thermistor surface-mounted on a printed circuit board or the like.

【0002】[0002]

【従来の技術】この種のチップ型サーミスタの製造方法
として、本出願人は、セラミック焼結体よりなる薄板材
の表面に導電性ペーストを帯状に印刷して抵抗値調整用
電極を形成し、上記薄板材を抵抗値調整用電極の長手方
向に直交する方向に切断して短冊状物を作製し、この短
冊状物を抵抗値調整用電極の幅方向の中心線に沿って切
断することにより両端に上記抵抗値調整用電極の一端が
それぞれ位置するチップ状のサーミスタ素体を作製し、
更にこのサーミスタ素体の両端面に抵抗値調整用電極と
電気的に接続される端子電極を形成するチップ型サーミ
スタの製造方法を特許出願した(特開平4−12740
1)。
2. Description of the Related Art As a method of manufacturing a chip type thermistor of this type, the present applicant has formed a resistance value adjusting electrode by printing a conductive paste in a strip shape on the surface of a thin plate material made of a ceramic sintered body, By cutting the thin plate material in a direction orthogonal to the longitudinal direction of the resistance value adjusting electrode to produce a strip, by cutting the strip along the center line in the width direction of the resistance adjusting electrode. A chip-shaped thermistor element body in which one end of the resistance value adjusting electrode is located at each end is prepared,
Further, a patent application was filed for a method of manufacturing a chip type thermistor in which terminal electrodes electrically connected to the resistance value adjusting electrodes are formed on both end surfaces of the thermistor body (Japanese Patent Laid-Open No. 12740/1992).
1).

【0003】このチップ型サーミスタは具体的には次の
方法により製造される。先ずセラミック焼結体よりなる
薄板材の両面又は片面に導電性ペーストを帯状に間隔を
あけて、スクリーン印刷法やロール転写印刷法等にて印
刷した後乾燥することにより、多数列の抵抗値調整用電
極を形成する。次いでこの薄板材の両面にガラス等の絶
縁性無機物を含んだペーストを印刷、吹付け又は浸漬し
た後焼成することにより、絶縁性無機物層を形成する。
この両面が絶縁性無機物層により被覆された薄板材を上
記抵抗値調整用電極の長手方向と直交する方向に短冊状
に切出した後、短冊状物の切断面に絶縁性無機物を含ん
だペーストを印刷、吹付け又は浸漬して焼成することに
より、上記切断面に絶縁性無機物層を形成する。次にこ
の短冊状物をその長手方向に直交する方向に切断するこ
とにより、チップ状のサーミスタ素体を作製し、このサ
ーミスタ素体の切断面である両端面を含む両端部に導電
性ペーストを塗布し焼成することにより、焼付け電極層
を形成する。更にこの焼付け電極層の表面にめっき層を
形成することにより、両端部に焼付け電極層とめっき層
からなる端子電極を有するチップ型サーミスタを得る。
This chip type thermistor is specifically manufactured by the following method. First, a conductive paste is formed in a strip shape on both sides or one side of a thin plate material made of a ceramic sintered body, printed with a screen printing method or a roll transfer printing method, and then dried to adjust resistance values in a large number of rows. Forming electrodes. Next, an insulating inorganic material layer is formed by printing, spraying or immersing a paste containing an insulating inorganic material such as glass on both sides of this thin plate material and then firing it.
After cutting a thin plate material whose both surfaces are coated with an insulating inorganic material layer in a strip shape in a direction orthogonal to the longitudinal direction of the resistance value adjusting electrode, a paste containing an insulating inorganic material on a cut surface of the strip material is formed. The insulating inorganic material layer is formed on the cut surface by printing, spraying or dipping and firing. Next, by cutting this strip in the direction orthogonal to its longitudinal direction, a chip-like thermistor element is produced, and a conductive paste is applied to both ends including both end surfaces that are cut surfaces of the thermistor element. A baked electrode layer is formed by applying and baking. Further, by forming a plating layer on the surface of this baked electrode layer, a chip type thermistor having terminal electrodes composed of the baked electrode layer and the plated layer at both ends is obtained.

【0004】このように構成されたチップ型サーミスタ
の製造方法では、スクリーン印刷法やロール転写印刷法
等により薄板材の表面に抵抗値調整用電極を形成したの
で、抵抗値調整用電極を電極ペースト中にサーミスタ素
体を浸漬して行う方法より、その寸法精度は高い。この
結果、高精度の抵抗値調整用電極を形成できるので、抵
抗値調整用電極間の間隔も高寸法精度で形成できる。ま
た上記抵抗値調整用電極はセラミック焼結体、即ち、既
に焼結された薄板材に形成されるため、薄板材の焼成収
縮による寸法精度のばらつきの発生を防止できるように
なっている。
In the method of manufacturing the chip type thermistor configured as described above, the resistance value adjusting electrode is formed on the surface of the thin plate material by the screen printing method, the roll transfer printing method or the like. The dimensional accuracy is higher than the method in which the thermistor element body is dipped therein. As a result, the resistance value adjusting electrodes can be formed with high accuracy, so that the interval between the resistance value adjusting electrodes can be formed with high dimensional accuracy. Further, since the resistance value adjusting electrode is formed on a ceramic sintered body, that is, on a thin plate material that has already been sintered, it is possible to prevent variation in dimensional accuracy due to firing shrinkage of the thin plate material.

【0005】[0005]

【発明が解決しようとする課題】しかし、上記従来のチ
ップ型サーミスタの製造方法では、薄板材の表面にガラ
ス等の絶縁性無機物層を形成した状態で薄板材を短冊状
に切出すため、薄板材及び絶縁性無機物層の熱膨張係数
の違いに起因する熱応力(この熱応力は内部に残留す
る。)により、上記切出し時に薄板材又は絶縁性無機物
層にマイクロクラック等が発生し、チップ型サーミスタ
の機械的強度を十分に得られない不具合があった。この
結果、耐基板曲げ性試験や温度サイクル試験等のチップ
型サーミスタの強度に関する信頼性試験についても十分
な性能が得られない問題点もあった。また、上記従来の
チップ型サーミスタの製造方法では、ガラス層の形成工
程において、このガラス層をシート状態及び短冊状態の
2回に分けて形成する必要があり、またセラミック焼結
シートを短冊状に切出した後この切断面にガラス層を効
率的に形成するためには、多数の短冊状のものをその切
断面が同一方向に向くように整列させる必要があり、製
造コストを押上げる問題もあった。更に、上記従来のチ
ップ型サーミスタの製造方法では、短冊状物を切断して
チップ状のサーミスタ素体を作製するときに、製造上多
数個の短冊状物を並べかつ抵抗値調整用電極の位置を合
わせて切断する必要があるが、作製されるサーミスタ素
体の寸法が小さいと上記位置合わせが難しく、完成した
チップ型サーミスタの抵抗値にばらつきが発生するおそ
れがあった。
However, in the above-mentioned conventional method for manufacturing a chip type thermistor, since the thin plate material is cut into strips in a state where an insulating inorganic material layer such as glass is formed on the surface of the thin plate material, Due to the thermal stress caused by the difference in thermal expansion coefficient between the plate material and the insulating inorganic material layer (this thermal stress remains inside), micro cracks or the like occur in the thin plate material or the insulating inorganic material layer during the cutting, and the chip type There was a problem that the mechanical strength of the thermistor could not be obtained sufficiently. As a result, there has been a problem that sufficient performance cannot be obtained even in reliability tests regarding the strength of the chip type thermistor such as a substrate bending resistance test and a temperature cycle test. Further, in the above-described conventional method for manufacturing a chip type thermistor, in the glass layer forming step, it is necessary to form the glass layer in two steps, a sheet state and a strip state, and the ceramic sintered sheet is formed into a strip shape. In order to efficiently form a glass layer on this cut surface after cutting, it is necessary to align a large number of strips so that the cut surfaces face in the same direction, which also raises the manufacturing cost. It was Further, in the above-described conventional method for manufacturing a chip-type thermistor, when a strip-shaped product is cut to produce a chip-shaped thermistor element, a large number of strip-shaped products are arranged in the manufacturing process and the position of the resistance adjusting electrode However, if the size of the thermistor element body to be manufactured is small, the above-mentioned alignment is difficult and the resistance value of the completed chip-type thermistor may vary.

【0006】本発明の目的は、マイクロクラック等の発
生を防止することにより十分な機械的強度を得ることが
でき、安価にかつ大量に生産でき、更に抵抗値のばらつ
きを抑えることによりサーミスタ本来の機能精度を向上
できるチップ型サーミスタの製造方法を提供することに
ある。
The object of the present invention is to obtain sufficient mechanical strength by preventing the occurrence of microcracks and the like, to be able to mass-produce inexpensively and in large quantities, and to suppress the variation in resistance value, which is the essential characteristic of the thermistor. An object of the present invention is to provide a method for manufacturing a chip type thermistor capable of improving the functional accuracy.

【0007】[0007]

【課題を解決するための手段】請求項1に係る発明は、
図1及び図7に示すように、セラミック焼結体よりなる
薄板材16の表面に所定の間隔をあけて互いに平行に多
数の抵抗値調整用電極15を形成する工程と、薄板材1
6に抵抗値調整用電極15の長手方向に所定の間隔をあ
けかつ抵抗値調整用電極15の長手方向に直交する方向
に延びる多数の長孔17又は深溝を形成することにより
長孔17間又は深溝間に多数の角柱部18を形成する工
程と、薄板材16のうち少なくとも多数の角柱部18の
全側面に絶縁性無機物層13を形成する工程と、絶縁性
無機物層13が形成された角柱部18を各抵抗値調整用
電極15の幅方向の中央に沿ってそれぞれ切断すること
により両端に抵抗値調整用電極15がそれぞれ露出する
サーミスタ素体12を形成する工程と、サーミスタ素体
12の両端面及び一対の抵抗値調整用電極15,15の
一端面を含むサーミスタ素体15の両端部に焼付け電極
層19,19を形成する工程と、焼付け電極層19,1
9の表面にめっき層20,20を形成して焼付け電極層
19,19とめっき層20,20からなる端子電極1
4,14を形成する工程とを含むチップ型サーミスタの
製造方法である。このチップ型サーミスタの製造方法で
は、絶縁性無機物層13の形成後の角柱部18の切断は
サーミスタ素体12の端面を形成する切断のみであるた
め、サーミスタ素体12又は絶縁性無機物層13にマイ
クロクラック等が発生することはない。また多数の角柱
部18をそれぞれ整列するという作業を要さずに、上記
角柱部18への絶縁性無機物層13の形成が1回の工程
で済むので、サーミスタ11を安価で大量に生産でき
る。更に角柱部18をチップ状に切断するときに、既に
多数の角柱部18及びこれらの表面に形成された抵抗値
調整用電極15が整列した状態にあるので、角柱部18
を切断して得られたチップ状のサーミスタ素体12は寸
法が均一になるとともに、各サーミスタ素体12の表面
の抵抗値調整用電極15,15の位置精度も均一にな
る。
The invention according to claim 1 is
As shown in FIGS. 1 and 7, the step of forming a large number of resistance value adjusting electrodes 15 in parallel with each other at a predetermined interval on the surface of a thin plate member 16 made of a ceramic sintered body, and the thin plate member 1
6 are provided with a predetermined interval in the longitudinal direction of the resistance value adjusting electrode 15 and a plurality of elongated holes 17 or deep grooves extending in a direction orthogonal to the longitudinal direction of the resistance value adjusting electrode 15 are formed between the elongated holes 17 or A step of forming a large number of prismatic portions 18 between the deep grooves, a step of forming an insulating inorganic material layer 13 on all side surfaces of at least a large number of the prismatic portions 18 of the thin plate material 16, and a prism having the insulating inorganic material layer 13 formed thereon. A step of forming the thermistor element body 12 in which the resistance value adjusting electrodes 15 are exposed at both ends by cutting the part 18 along the center of the resistance value adjusting electrodes 15 in the width direction, and A step of forming baking electrode layers 19, 19 on both ends of the thermistor element body 15 including both end surfaces and one end surface of the pair of resistance value adjusting electrodes 15, 15, and the baking electrode layers 19, 1.
A terminal electrode 1 formed by forming plating layers 20, 20 on the surface of 9 and baking electrode layers 19, 19 and plating layers 20, 20
4, 14 is a method of manufacturing a chip type thermistor. In the method of manufacturing the chip type thermistor, the cutting of the prismatic portion 18 after the formation of the insulating inorganic material layer 13 is performed only to form the end face of the thermistor element body 12, and thus the thermistor element body 12 or the insulating inorganic material layer 13 is not cut. No microcracks or the like will occur. Further, since the insulating inorganic material layer 13 can be formed on the prismatic portion 18 in one step without the work of aligning a large number of prismatic portions 18, the thermistor 11 can be inexpensively mass-produced. Further, when the prismatic portion 18 is cut into chips, a large number of prismatic portions 18 and the resistance value adjusting electrodes 15 formed on the surfaces thereof are already aligned.
The chip-shaped thermistor element body 12 obtained by cutting is uniform in size and the positional accuracy of the resistance value adjusting electrodes 15, 15 on the surface of each thermistor element body 12 is also uniform.

【0008】請求項2に係る発明は、図1、図2及び図
7に示すように、セラミック焼結体よりなる薄板材16
の表面に所定の間隔をあけて互いに平行に多数の抵抗値
調整用電極15を形成する工程と、薄板材16に抵抗値
調整用電極15の長手方向に所定の間隔をあけかつ抵抗
値調整用電極15の長手方向に直交する方向に延びる多
数の長孔17又は深溝を形成することにより長孔17間
又は深溝間に多数の角柱部18を形成する工程と、多数
の角柱部18のコーナ部18aを丸み付けする工程と、
薄板材16のうち少なくとも多数の角柱部18の全側面
に絶縁性無機物層13を形成する工程と、絶縁性無機物
層13が形成された角柱部18を各抵抗値調整用電極1
5の幅方向の中央に沿ってそれぞれ切断することにより
両端に抵抗値調整用電極15がそれぞれ露出するサーミ
スタ素体12を形成する工程と、サーミスタ素体12の
両端面及び一対の抵抗値調整用電極15,15の一端面
を含むサーミスタ素体15の両端部に焼付け電極層1
9,19を形成する工程と、焼付け電極層19,19の
表面にめっき層20,20を形成して焼付け電極層1
9,19とめっき層20,20からなる端子電極14,
14を形成する工程とを含むチップ型サーミスタの製造
方法である。このチップ型サーミスタの製造方法では、
薄板材16の角柱部18のコーナ部18aが丸み付けさ
れているため、角柱部18の全側面に形成された絶縁性
無機物層13のうち上記コーナ部18aを被覆する部分
に応力集中が発生せず、サーミスタ11の機械的強度を
更に向上できる。
The invention according to claim 2 is, as shown in FIGS. 1, 2 and 7, a thin plate member 16 made of a ceramic sintered body.
A step of forming a large number of resistance value adjusting electrodes 15 in parallel with each other at a predetermined interval on the surface of the sheet, and a thin plate member 16 having a predetermined interval in the longitudinal direction of the resistance value adjusting electrodes 15 and for adjusting the resistance value. A step of forming a large number of prismatic portions 18 between the long holes 17 or the deep grooves by forming a large number of elongated holes 17 or deep grooves extending in a direction orthogonal to the longitudinal direction of the electrode 15, and a corner portion of the large number of prismatic portions 18 Rounding 18a,
A step of forming the insulating inorganic material layer 13 on all side surfaces of at least a large number of prismatic portions 18 of the thin plate member 16, and the prismatic portions 18 on which the insulating inorganic material layer 13 is formed,
5. A step of forming the thermistor element body 12 in which the resistance value adjusting electrodes 15 are exposed at both ends by cutting along the center of the width direction of 5, and for both end surfaces of the thermistor element body 12 and a pair of resistance value adjusting elements. Baking electrode layer 1 on both ends of the thermistor element body 15 including one end surfaces of the electrodes 15, 15.
9 and 19, and the baking electrode layer 1 by forming the plating layers 20 and 20 on the surface of the baking electrode layers 19 and 19.
Terminal electrodes 14 composed of 9, 19 and plated layers 20, 20;
14 is a method of manufacturing a chip type thermistor. In this chip type thermistor manufacturing method,
Since the corner portion 18a of the prismatic portion 18 of the thin plate member 16 is rounded, stress concentration does not occur in the portion of the insulating inorganic material layer 13 formed on all side surfaces of the prismatic portion 18 that covers the corner portion 18a. Therefore, the mechanical strength of the thermistor 11 can be further improved.

【0009】請求項3に係る発明は、請求項1又は2に
係る発明であって、図9に示すように、絶縁性無機物粉
末を含む懸濁液62に薄板材56を陽極とし対向電極6
3,63を陰極として浸漬し、薄板材56と対向電極6
3,63とに所定の電圧を印加して薄板材56の少なく
とも多数の角柱部58の全側面に絶縁性無機物粉末を付
着させて焼付け、少なくとも多数の角柱部58の全側面
に絶縁性無機物層を形成すことを特徴とする。このチッ
プ型サーミスタの製造方法では、薄板材56の多数の角
柱部58に均一にかつ同時に絶縁性無機物層を形成でき
る。
The invention according to claim 3 is the invention according to claim 1 or 2, wherein, as shown in FIG. 9, the thin plate material 56 is used as the anode in the suspension 62 containing the insulating inorganic powder, and the counter electrode 6 is used.
3 and 63 are immersed as the cathode, and the thin plate material 56 and the counter electrode 6
3, 63 is applied with a predetermined voltage to attach insulating inorganic material powder to all side surfaces of at least a large number of prismatic portions 58 of the thin plate material 56 and baked, and an insulating inorganic material layer is formed on all side surfaces of at least a large number of prismatic portions 58. Is formed. In the method of manufacturing the chip type thermistor, the insulating inorganic material layer can be uniformly and simultaneously formed on the large number of prismatic portions 58 of the thin plate member 56.

【0010】[0010]

【発明の実施の形態】次に本発明の第1の実施の形態を
図面に基づいて詳しく説明する。図1〜図7に示す本発
明のチップ型サーミスタ11は次の方法により製造され
る。 (ア) セラミック焼結体からなる薄板材16の作製 先ずMn,Fe,Co,Ni,Cu,Al等の金属の酸
化物粉末を1種又は2種以上、金属原子比が所定の割合
になるようにそれぞれ秤量し、ボールミル等により5〜
10時間混合して、脱水し乾燥する。次いでこの混合物
を大気圧下500〜1000℃で5〜10時間仮焼き
し、再びボールミル等で粉砕して、脱水し乾燥する。次
にこの粉砕物に有機系結合材等を加え、スプレードライ
ヤ等を用いて上記粉砕物の粒径が30〜200μm程度
になるように造粒し、油圧プレス等により直方体に圧縮
成形する。更にこの成型物を大気圧下1000〜130
0℃で5〜10時間焼成して、所定の寸法のセラミック
焼結ブロックを作製し、このブロックをバンドソー等を
用いて所定の厚さに切断することにより、薄板材16を
作製する(図1(a))。
Next, a first embodiment of the present invention will be described in detail with reference to the drawings. The chip type thermistor 11 of the present invention shown in FIGS. 1 to 7 is manufactured by the following method. (A) Preparation of thin plate material 16 composed of ceramic sintered body First, one or more kinds of oxide powders of metals such as Mn, Fe, Co, Ni, Cu and Al are provided, and the metal atomic ratio becomes a predetermined ratio. As weigh each and
Mix for 10 hours, dehydrate and dry. Then, the mixture is calcined under atmospheric pressure at 500 to 1000 ° C. for 5 to 10 hours, pulverized again with a ball mill or the like, dehydrated and dried. Next, an organic binder or the like is added to this crushed product, and the crushed product is granulated to have a particle size of about 30 to 200 μm using a spray dryer or the like, and compression-molded into a rectangular parallelepiped by a hydraulic press or the like. Furthermore, this molded product is 1000-130 under atmospheric pressure.
By firing at 0 ° C. for 5 to 10 hours to prepare a ceramic sintered block having a predetermined size, and cutting this block into a predetermined thickness using a band saw or the like, the thin plate material 16 is manufactured (FIG. 1). (A)).

【0011】(イ) 薄板材16の表面への抵抗値調整用電
極15の形成 上記薄板材16の両面に幅0.1〜2.5mmの帯状の
導電性ペーストを幅方向に0.1〜3mmの間隔をあけ
て印刷し乾燥する。。このとき薄板材16の両面の導電
性ペーストが薄板材16を挟んで互いに対向するように
印刷する。この薄板材16を大気圧下700〜850℃
で保持し、厚さ5〜20μmの多数列の抵抗値調整用電
極15を薄板材16の両面に形成する(図1(a))。
なお、導電性ペーストとしてはAgペーストやAg−P
dペースト等が用いられ、この導電性ペーストは薄板材
の両面ではなく片面に印刷してもよい。またAu等のレ
ジネートペーストを用いて0.1〜1μmの薄膜電極を
形成してもよい。 (ウ) 薄板材16への長孔17の形成 上記薄板材16に抵抗値調整用電極15の長手方向に所
定の間隔をあけかつ抵抗値調整用電極15の長手方向に
直交する方向に延びる多数の長孔17をダイシングマシ
ン等を用いて形成することにより、上記多数の長孔17
間に多数の角柱部18を形成する(図1(b)及び図2
(a))。長孔17の幅及び角柱部18の幅はそれぞれ
0.05〜0.5mm及び0.4〜1.6mmに形成さ
れることが好ましい。また角柱部18のコーナ部18a
には微粒のアルミナ粉等を吹き付けるブラスト処理を行
った後、上記コーナ部18aを研磨することにより、コ
ーナ部18aに曲率半径が0.01〜0.1mmの丸み
付けが施される(図2(b))。
(A) Formation of the resistance adjusting electrode 15 on the surface of the thin plate member 16 A strip-shaped conductive paste having a width of 0.1 to 2.5 mm is formed on both surfaces of the thin plate member 16 in the width direction of 0.1 to 2.5 mm. Print at intervals of 3 mm and dry. . At this time, printing is performed so that the conductive pastes on both sides of the thin plate member 16 face each other with the thin plate member 16 interposed therebetween. This thin plate material 16 is heated to 700 to 850 ° C. under atmospheric pressure.
Then, a large number of rows of resistance adjusting electrodes 15 having a thickness of 5 to 20 μm are formed on both surfaces of the thin plate member 16 (FIG. 1A).
The conductive paste is Ag paste or Ag-P.
A d-paste or the like is used, and the conductive paste may be printed on one side of the thin plate material instead of both sides. Further, a thin film electrode of 0.1 to 1 μm may be formed by using a resinate paste such as Au. (C) Forming long holes 17 in the thin plate member 16 A large number of the thin plate members 16 are provided at predetermined intervals in the longitudinal direction of the resistance value adjusting electrode 15 and extend in a direction orthogonal to the longitudinal direction of the resistance value adjusting electrode 15. The large number of long holes 17 are formed by using a dicing machine or the like.
A large number of prismatic portions 18 are formed between them (Fig. 1 (b) and Fig. 2).
(A)). The width of the long hole 17 and the width of the prismatic portion 18 are preferably formed to be 0.05 to 0.5 mm and 0.4 to 1.6 mm, respectively. Further, the corner portion 18a of the prismatic portion 18
Is subjected to a blasting process in which fine alumina powder or the like is sprayed, and then the corner portion 18a is polished so that the corner portion 18a is rounded with a radius of curvature of 0.01 to 0.1 mm (FIG. 2). (B)).

【0012】(エ) 角柱部18の全側面への絶縁性無機物
層13の形成 上記薄板材16の角柱部18の全側面に、ガラス粉末等
の絶縁性無機物粉末を含み所定の粘度を有するペースト
を吹付けた後に乾燥する。この薄板材16を大気圧下5
00〜1000℃に1〜20分間保持し、角柱部18の
全側面に厚さ2〜50μmの絶縁性無機物層13を形成
する(図1(c)、図3及び図4)。なお、上記ペース
トの吹付けは角柱部のみではなく、薄板材全体に吹付け
てもよい。 (オ) 絶縁性無機物層13を形成した薄板材16の切断 全側面に絶縁性無機物層13が形成された多数の角柱部
18を、各抵抗値調整用電極15の幅方向の中央に沿っ
て角柱部18の長手方向に直交する方向、即ち図4の実
線矢印の方向に、ダイシングマシン等を用いてチップ状
に切断する(図1(d)及び図5)。この切断により、
全側面が絶縁性無機物層13にて被覆されかつ両端に抵
抗値調整用電極15がそれぞれ露出するサーミスタ素体
12が得られる。このサーミスタ素体12の長さは0.
5〜5mmの範囲に形成されることが好ましい。
(D) Formation of Insulating Inorganic Material Layer 13 on All Sides of Square Pillar 18 A paste containing insulating inorganic powder such as glass powder and having a predetermined viscosity on all sides of the prism 18 of the thin plate member 16 described above. After spraying, dry. This thin plate material 16 is
The temperature is maintained at 00 to 1000 ° C. for 1 to 20 minutes, and the insulating inorganic material layer 13 having a thickness of 2 to 50 μm is formed on all side surfaces of the prismatic portion 18 (FIG. 1C, FIG. 3 and FIG. 4). The paste may be sprayed not only on the prismatic portion but also on the entire thin plate material. (E) Cutting of the thin plate material 16 on which the insulating inorganic material layer 13 is formed. A large number of prismatic portions 18 having the insulating inorganic material layer 13 formed on all side surfaces are provided along the center in the width direction of each resistance value adjusting electrode 15. Chips are cut using a dicing machine or the like in a direction orthogonal to the longitudinal direction of the prismatic portion 18, that is, in the direction of the solid line arrow in FIG. This disconnection
The thermistor element body 12 is obtained in which all side surfaces are covered with the insulating inorganic layer 13 and the resistance value adjusting electrodes 15 are exposed at both ends. The length of the thermistor element body 12 is 0.
It is preferably formed in a range of 5 to 5 mm.

【0013】(カ) サーミスタ素体12の両端部への端子
電極14,14の形成 先ず上記チップ状のサーミスタ素体12の両端面及び一
対の抵抗値調整用電極15,15の一端面を含むサーミ
スタ素体12の両端部に貴金属粉末と無機結合材を含む
導電性ペーストを塗布して焼成することにより、焼付け
電極層19,19を形成する。次に焼付け電極層19,
19を下地電極層としてこの表面にめっき層20,20
を形成して、焼付け電極層19,19とめっき層20,
20からなる端子電極14,14を有するチップ型サー
ミスタ11を得る(図1(e)、図6及び図7)。
(F) Formation of terminal electrodes 14, 14 on both ends of the thermistor element body 12. First, both end surfaces of the chip-like thermistor element body 12 and one end surfaces of a pair of resistance value adjusting electrodes 15, 15 are included. The baked electrode layers 19 and 19 are formed by applying a conductive paste containing a noble metal powder and an inorganic binder to both ends of the thermistor body 12 and baking the applied paste. Next, the baking electrode layer 19,
19 is used as a base electrode layer, and plating layers 20, 20 are formed on this surface.
To form the baking electrode layers 19 and 19 and the plating layer 20,
A chip type thermistor 11 having terminal electrodes 14 and 14 composed of 20 is obtained (FIG. 1E, FIG. 6 and FIG. 7).

【0014】図8及び図9は本発明の第2の実施の形態
を示す。この実施の形態では、薄板材56に抵抗値調整
用電極55の長手方向に所定の間隔をあけかつ抵抗値調
整用電極55の長手方向に直交する方向に延びる多数の
深溝57を形成することにより、多数の深溝57間に多
数の角柱部58を形成し、多数の角柱部58の全側面に
絶縁性無機物層を電着装置61を用いて形成する。電着
装置61は図9に詳しく示すように、ガラス粉末等の絶
縁性無機物粉末を所定の割合で含む懸濁液62が貯留さ
れた容器と、この懸濁液62に浸漬された薄板材56と
所定の間隔をあけて浸漬される対向電極63,63と、
薄板材56を陽極とし対向電極63,63を陰極として
両者に所定の電圧を印加する電源64とを有する。上記
電着装置61を用いて全側面に絶縁性無機物粉末が電着
された薄板材56を大気圧下500〜1000℃に1〜
20分間保つことにより、厚さ2〜50μmの絶縁性無
機物層を形成する。上記以外の製造方法は第1の実施の
形態のチップ型サーミスタの製造方法と略同様であるの
で、繰返しの説明を省略する。
8 and 9 show a second embodiment of the present invention. In this embodiment, a large number of deep grooves 57 are formed in the thin plate material 56 at predetermined intervals in the longitudinal direction of the resistance value adjusting electrode 55 and extend in a direction orthogonal to the longitudinal direction of the resistance value adjusting electrode 55. A large number of prismatic portions 58 are formed between a large number of deep grooves 57, and an insulating inorganic material layer is formed on all side surfaces of the large number of prismatic portions 58 using an electrodeposition device 61. As shown in detail in FIG. 9, the electrodeposition device 61 is a container in which a suspension 62 containing insulating inorganic powder such as glass powder in a predetermined ratio is stored, and a thin plate member 56 immersed in the suspension 62. And counter electrodes 63, 63 which are immersed at a predetermined interval,
The thin plate member 56 is used as an anode, the counter electrodes 63, 63 are used as cathodes, and a power source 64 for applying a predetermined voltage to both is provided. Using the above electrodeposition apparatus 61, the thin plate material 56 on which the insulating inorganic powder is electrodeposited on all the side surfaces is heated to 500 to 1000 ° C. under atmospheric pressure.
By keeping it for 20 minutes, an insulating inorganic layer having a thickness of 2 to 50 μm is formed. Since the manufacturing method other than the above is substantially the same as the manufacturing method of the chip type thermistor of the first embodiment, the repeated description will be omitted.

【0015】[0015]

【実施例】次に本発明の実施例を比較例とともに詳しく
説明する。 <実施例1>図1〜図7に示すように、次の方法で製造
されたチップ型サーミスタを実施例1とした。先ず炭酸
マンガン、炭酸ニッケル、炭酸コバルトを出発原料と
し、これらを金属原子比が所定の割合になるようにそれ
ぞれ秤量し、ボールミルで16時間均一に混合して、脱
水し乾燥した。この混合物を大気圧下900℃で2時間
仮焼きし、再びボールミルで粉砕して、脱水し乾燥し
た。この粉砕物に有機系結合材を加え、スプレードライ
ヤにより粉砕物の粒径が60μm程度になるように造粒
し、油圧プレスにより直方体に圧縮成形した。この成型
物を大気圧下1200℃で4時間焼成し、縦、横及び厚
さがそれぞれ35mm,50mm及び10mmのセラミ
ック焼結ブロックを作製し、このブロックをバンドソー
で切断し、縦、横及び厚さが35mm,50mm及び
0.65mmの薄板材16を作製した(図1(a))。
Next, examples of the present invention will be described in detail together with comparative examples. <Embodiment 1> As shown in FIGS. 1 to 7, a chip type thermistor manufactured by the following method was used as Embodiment 1. First, manganese carbonate, nickel carbonate, and cobalt carbonate were used as starting materials, and these were weighed so that the metal atomic ratio was a predetermined ratio, uniformly mixed in a ball mill for 16 hours, dehydrated and dried. This mixture was calcined at 900 ° C. under atmospheric pressure for 2 hours, ground again with a ball mill, dehydrated and dried. An organic binder was added to this pulverized product, and the pulverized product was granulated by a spray dryer so that the particle size was about 60 μm, and compression molded into a rectangular parallelepiped by a hydraulic press. This molded product is fired at 1200 ° C. under atmospheric pressure for 4 hours to produce ceramic sintered blocks having lengths, widths, and thicknesses of 35 mm, 50 mm, and 10 mm, respectively, and the blocks are cut with a band saw to obtain length, width, and thickness. Thin plate materials 16 having a thickness of 35 mm, 50 mm, and 0.65 mm were manufactured (FIG. 1A).

【0016】次いでこの薄板材16の両面に幅0.6m
mの帯状のAgペーストを幅方向に0.9mmの間隔を
あけて印刷し乾燥した。このとき薄板材16の両面のA
g性ペーストが薄板材16を挟んで互いに対向するよう
に印刷した。この薄板材16を大気圧下820℃で保持
し、厚さ約10μmの多数列の抵抗値調整用電極15を
薄板材16の両面に形成した(図1(a))。上記薄板
材16に抵抗値調整用電極15の長手方向に直交する方
向に延びる幅0.1mmの多数の長孔17を幅0.65
mmの間隔をあけてダイシングマシンにより形成するこ
とにより、上記多数の長孔17間に幅0.65mmの多
数の角柱部18を形成した(図1(b)及び図2
(a))。この角柱部18のコーナ部18aに微粒のア
ルミナ粉を吹付けるブラスト処理を行った後、上記角柱
部18のコーナ部18aを研磨し、コーナ部18aに曲
率半径0.05mmの丸み付けを施した(図2
(b))。
Next, a width of 0.6 m is provided on both sides of the thin plate member 16.
m strip-shaped Ag paste was printed at intervals of 0.9 mm in the width direction and dried. At this time, A on both sides of the thin plate material 16
The g-type paste was printed so as to face each other with the thin plate member 16 interposed therebetween. The thin plate member 16 was held at 820 ° C. under atmospheric pressure, and a plurality of rows of resistance value adjusting electrodes 15 having a thickness of about 10 μm were formed on both surfaces of the thin plate member 16 (FIG. 1A). A large number of elongated holes 17 having a width of 0.1 mm and extending in a direction orthogonal to the longitudinal direction of the resistance value adjusting electrode 15 are formed in the thin plate member 16 with a width of 0.65.
A large number of prismatic portions 18 having a width of 0.65 mm were formed between the large number of long holes 17 by forming them with a dicing machine at intervals of mm (FIGS. 1B and 2).
(A)). After performing a blasting process in which fine alumina powder is sprayed on the corner portion 18a of the prismatic portion 18, the corner portion 18a of the prismatic portion 18 is polished, and the corner portion 18a is rounded with a radius of curvature of 0.05 mm. (Fig. 2
(B)).

【0017】次に上記薄板材16の角柱部18の全側面
に、ガラス粉末を含み所定の粘度を有するペーストを吹
付けた後に乾燥した。この薄板材16を大気圧下850
℃で約10分間保持することにより、角柱部18の全側
面に厚さ約20μmのガラス層13を形成した(図1
(c)、図3及び図4)。このガラス層13が形成され
た角柱部18を、各抵抗値調整用電極15の幅方向の中
央に沿って角柱部18の長手方向に直交する方向に、ダ
イシングマシンを用いてチップ状に切断し、長さ1.5
mmのチップ状のサーミスタ素体を作製した(図1
(d)及び図5)。このサーミスタ素体の両端には抵抗
値調整用電極15,15の一端面がそれぞれ露出した。
Next, a paste containing glass powder and having a predetermined viscosity was sprayed on all side surfaces of the prismatic portion 18 of the thin plate member 16 and then dried. This thin plate material 16 is heated to 850
The glass layer 13 having a thickness of about 20 μm was formed on all side surfaces of the prismatic portion 18 by holding the glass layer 13 at about 10 ° C. for about 10 minutes (FIG. 1).
(C), FIGS. 3 and 4). The prismatic portion 18 on which the glass layer 13 is formed is cut into chips using a dicing machine in the direction perpendicular to the longitudinal direction of the prismatic portion 18 along the center of the resistance value adjusting electrodes 15 in the width direction. , Length 1.5
mm chip-shaped thermistor body was prepared (Fig. 1
(D) and FIG. 5). One end faces of the resistance value adjusting electrodes 15 and 15 are exposed at both ends of the thermistor body.

【0018】更にサーミスタ素体12の両端面及び一対
の抵抗値調整用電極15,15の一端面を含むサーミス
タ素体12の両端部にAgペーストをディッピング法に
より塗布した後、大気圧下820℃に10分間保持する
ことにより、サーミスタ素体12の両端部に焼付け電極
層19,19を形成した。上記焼付け電極層19,19
の表面にめっき層20,20を形成した(図6及び図
7)。めっき層20,20は上記焼付け電極層19,1
9の表面に電解バレル法により形成された厚さ2〜5μ
mのNiめっき層20a,20aと、Niめっき層20
a,20aの表面に形成された厚さ3〜7μmのはんだ
めっき層20b,20bとを有する。このようにして図
1(e)、図6及び図7に示すチップ型サーミスタ11
を得た。
Further, Ag paste is applied to both ends of the thermistor body 12 including both end faces of the thermistor body 12 and one end faces of the pair of resistance value adjusting electrodes 15, 15 by a dipping method, and then at 820 ° C. under atmospheric pressure. Then, the baked electrode layers 19 and 19 were formed on both ends of the thermistor element body 12 by holding for 10 minutes. The baked electrode layers 19, 19
Plating layers 20 and 20 were formed on the surface of (FIGS. 6 and 7). The plating layers 20, 20 are the above-mentioned baked electrode layers 19, 1
2-5μ formed on the surface of 9 by the electrolytic barrel method
m Ni plating layers 20a, 20a and Ni plating layer 20
a, 20a and solder-plated layers 20b, 20b having a thickness of 3 to 7 [mu] m. In this way, the chip type thermistor 11 shown in FIG. 1 (e), FIG. 6 and FIG.
I got

【0019】<実施例2>図8及び図9に示すように、
次の方法で製造されたチップ型サーミスタを実施例2と
した。実施例1と同様にして薄板材56を作製し、この
薄板材56にダイシングマシンにより幅0.1mmの深
溝57を幅0.65mmの間隔をあけて多数形成するこ
とにより、上記多数の深溝57間に幅0.65mmの多
数の角柱部58を形成した(図8)。この薄板材56の
うち深溝57が形成されていない部分を金属板65,6
5で挟み、角柱部58を懸濁液62に浸漬した(図
9)。この懸濁液62はイソプロピルアルコールに水を
5体積%転化した混合溶液を溶媒とし、この溶媒1リッ
トルに対して0.5gのガラス粉末(日本電気硝子
(株)製のGA44)を添加して調整した。また上記懸
濁液62には薄板材56の両面からそれぞれ所定の間隔
をあけて薄板材56を挟むように一対の対向電極63,
63を浸漬した。薄板材56を陽極とし、一対の対向電
極63,63を陰極として、両者間に直流600Vを1
0分間印加して薄板材56の角柱部58の全側面にガラ
ス粉末を電着した。このガラス粉末が電着された薄板材
56を大気圧下850℃に約10分間保持して、角柱部
58の全側面に厚さ約30μmのガラス層を形成した。
上記以外は第1の実施の形態と同一の方法で製造してチ
ップ型サーミスタを得た。
<Embodiment 2> As shown in FIGS. 8 and 9,
A chip type thermistor manufactured by the following method was used as Example 2. A thin plate material 56 was produced in the same manner as in Example 1, and a large number of deep grooves 57 having a width of 0.1 mm were formed in the thin plate material 56 by a dicing machine at intervals of a width of 0.65 mm. A large number of prismatic portions 58 having a width of 0.65 mm were formed between them (FIG. 8). A portion of the thin plate member 56 where the deep groove 57 is not formed is formed by the metal plates 65, 6
5 and the prismatic portion 58 was immersed in the suspension 62 (FIG. 9). This suspension 62 uses a mixed solution obtained by converting 5% by volume of water in isopropyl alcohol as a solvent, and 0.5 g of glass powder (GA44 manufactured by Nippon Electric Glass Co., Ltd.) is added to 1 liter of this solvent. It was adjusted. Further, the suspension 62 has a pair of opposed electrodes 63, which sandwich the thin plate material 56 from both sides of the thin plate material 56 at predetermined intervals.
63 was immersed. The thin plate material 56 serves as an anode, the pair of opposing electrodes 63, 63 serves as a cathode, and a direct current of 600 V is applied between them.
By applying for 0 minutes, glass powder was electrodeposited on all side surfaces of the prismatic portion 58 of the thin plate member 56. The thin plate material 56 on which the glass powder was electrodeposited was kept at 850 ° C. under atmospheric pressure for about 10 minutes to form a glass layer having a thickness of about 30 μm on all side surfaces of the prismatic portion 58.
A chip type thermistor was manufactured by the same method as in the first embodiment except the above.

【0020】<比較例1>図示しないが次の方法により
製造したチップ型サーミスタを比較例1とした。先ず厚
さ0.65mmのセラミック焼結体よりなる薄板材の両
面に上記実施例1と同様にして抵抗値調整用電極を形成
し、この薄板材の両面にガラスを含んだペーストを印刷
した後焼成することにより、ガラス層を形成した。この
両面がガラス層により被覆された薄板材を上記抵抗値調
整用電極の長手方向と直交する方向に幅0.65mmの
短冊状に切出した後、この短冊状物の切断面にガラスを
含んだペーストを印刷して焼成することにより、上記切
断面にガラス層を形成した。次にこの短冊状物をその長
手方向に直交する方向に切断することにより、長さ1.
5mmのチップ状のサーミスタ素体を作製した。更にこ
のサーミスタ素体の両端部に上記実施例1と同様にして
端子電極を形成することにより、チップ型サーミスタを
得た。
<Comparative Example 1> Although not shown, a chip type thermistor manufactured by the following method was used as Comparative Example 1. First, electrodes for resistance value adjustment were formed on both surfaces of a thin plate material made of a ceramic sintered body having a thickness of 0.65 mm in the same manner as in Example 1, and a paste containing glass was printed on both surfaces of this thin plate material. A glass layer was formed by firing. This thin plate material, both surfaces of which were covered with glass layers, was cut into a strip shape having a width of 0.65 mm in a direction orthogonal to the longitudinal direction of the resistance value adjusting electrode, and then the cut surface of the strip material contained glass. A glass layer was formed on the cut surface by printing the paste and firing it. Next, the strip-shaped material is cut in a direction orthogonal to the longitudinal direction to obtain a length of 1.
A 5 mm chip-shaped thermistor body was produced. Further, terminal electrodes were formed on both ends of the thermistor element body in the same manner as in Example 1 to obtain a chip type thermistor.

【0021】<比較試験及び評価>上記実施例1及び比
較例1のチップ型サーミスタについて、抗折強度試験及
び耐基板曲げ性試験を行った。その結果を表1に示す。
<Comparative Test and Evaluation> With respect to the chip type thermistors of Example 1 and Comparative Example 1, a bending strength test and a substrate bending resistance test were conducted. Table 1 shows the results.

【0022】[0022]

【表1】 [Table 1]

【0023】表1から明らかなように、本発明に係る方
法により製造されたチップ型サーミスタは、従来の方法
により製造されたチップ型サーミスタより、抗折強度及
び耐基板曲げ性が向上していることが判った。
As is clear from Table 1, the chip thermistor manufactured by the method according to the present invention has improved bending strength and substrate bending resistance over the chip thermistor manufactured by the conventional method. I knew that.

【0024】[0024]

【発明の効果】以上述べたように、本発明によれば、表
面に多数の抵抗値調整用電極が形成された薄板材に上記
電極に直交する方向に多数の長孔又は深溝を形成し、長
孔間又は深溝間に形成された多数の角柱部の全側面に絶
縁性無機物層を形成し、この角柱部を各抵抗値調整用電
極の幅方向の中央に沿ってそれぞれ切断することにより
両端に抵抗値調整用電極がそれぞれ露出するサーミスタ
素体を形成し、更にサーミスタ素体の両端面及び一対の
抵抗値調整用電極の一端面を含むサーミスタ素体の両端
部に焼付け電極層及びめっき層を形成したので、絶縁性
無機物層の形成後の角柱部の切断はサーミスタ素体の端
面を形成する切断のみであるため、サーミスタ素体又は
絶縁性無機物層にマイクロクラック等が発生することは
ない。またガラス層を2回に分けて形成し、かつ多数の
短冊状物をその切断面が同一方向に向くように整列させ
る必要がある従来のチップ型サーミスタの製造方法と比
較して、本発明のチップ型サーミスタの製造方法では、
多数の角柱部をそれぞれ整列するという作業を要さず
に、上記角柱部への絶縁性無機物層の形成が1回で済む
ので、サーミスタを安価で大量に生産できる。
As described above, according to the present invention, a large number of long holes or deep grooves are formed in a thin plate material having a large number of resistance value adjusting electrodes formed on its surface in a direction orthogonal to the electrodes, An insulating inorganic material layer is formed on all side surfaces of a large number of prisms formed between long holes or deep grooves, and both ends are formed by cutting the prisms along the center of each resistance value adjusting electrode in the width direction. Forming a thermistor element body in which the resistance value adjusting electrodes are exposed respectively, and further, a baking electrode layer and a plating layer are formed on both end portions of the thermistor element body including both end surfaces of the thermistor element body and one end surfaces of the pair of resistance value adjusting electrodes. Since, since the cutting of the prismatic portion after forming the insulating inorganic layer is only the cutting that forms the end face of the thermistor body, micro cracks or the like do not occur in the thermistor body or the insulating inorganic layer. . Further, in comparison with the conventional method for manufacturing a chip type thermistor in which the glass layer is formed in two steps and a large number of strips need to be aligned so that their cut surfaces face in the same direction, In the manufacturing method of chip type thermistor,
Since it is only necessary to form the insulating inorganic material layer on the prisms once without the work of aligning a large number of prisms, it is possible to mass-produce the thermistors at low cost.

【0025】また、多数の短冊状物を並べて切断すると
きに、切断されて得られるサーミスタ素体の寸法が小さ
いと、各抵抗値調整用電極の位置合わせ作業が難しく、
完成したサーミスタの抵抗値にばらつきが発生する従来
のチップ型サーミスタの製造方法と比較して、本発明の
チップ型サーミスタの製造方法では、角柱部をチップ状
に切断するときに、既に多数の角柱部及びこれらの表面
に形成された抵抗値調整用電極が整列した状態にあるの
で、角柱部を切断して得られたチップ状のサーミスタ素
体は寸法が均一になるとともに、各サーミスタ素体の表
面の抵抗値調整用電極の位置精度も均一になる。また上
記製造方法のうち、薄板材に多数の長孔又は深溝を形成
することにより長孔間又は深溝間に多数の角柱部を形成
する工程と、これらの角柱部の全側面に絶縁性無機物層
を形成する工程との間に、多数の角柱部のコーナ部を丸
み付けする工程を加えれば、角柱部の全側面に形成され
た絶縁性無機物層のうち上記コーナ部を被覆する部分に
応力集中が発生せず、サーミスタの機械的強度を更に向
上できる。更に、絶縁性無機物粉末を含む懸濁液に薄板
材を陽極とし対向電極を陰極として浸漬し、薄板材と対
向電極とに所定の電圧を印加して薄板材の少なくとも多
数の角柱部の全側面に絶縁性無機物粉末を付着させて焼
付け、少なくとも多数の角柱部の全側面に絶縁性無機物
層を形成すれば、薄板材の多数の角柱部に均一にかつ同
時に絶縁性無機物層を形成できる。この結果、サーミス
タの製造コストを低減できる。
Further, when a large number of strip-shaped objects are arranged and cut, if the size of the thermistor body obtained by cutting is small, it is difficult to align the resistance value adjusting electrodes.
Compared with the conventional chip-type thermistor manufacturing method in which the resistance value of the completed thermistor varies, in the chip-type thermistor manufacturing method of the present invention, when the prismatic portion is cut into chips, a large number of prisms are already formed. Since the electrodes and the resistance value adjusting electrodes formed on these surfaces are aligned, the chip-shaped thermistor element body obtained by cutting the prismatic section has uniform dimensions, and the thermistor element bodies The positional accuracy of the resistance adjusting electrode on the surface is also uniform. Further, in the above manufacturing method, a step of forming a large number of prismatic portions between long holes or deep grooves by forming a large number of long holes or deep grooves in a thin plate material, and an insulating inorganic material layer on all side surfaces of these prismatic portions. If a step of rounding the corners of a large number of prisms is added between the step of forming and the step of forming a stress, stress concentration will occur on the part of the insulating inorganic layer formed on all sides of the prism that covers the corners. Does not occur, and the mechanical strength of the thermistor can be further improved. Further, the thin plate material is immersed in a suspension containing insulating inorganic powder as an anode and the counter electrode as a cathode, and a predetermined voltage is applied to the thin plate material and the counter electrode so that at least a large number of prismatic portions of all sides of the thin plate material are covered. If the insulating inorganic substance powder is adhered to and baked, and the insulating inorganic substance layer is formed on all side surfaces of at least a large number of prismatic portions, the insulating inorganic substance layer can be uniformly and simultaneously formed on a large number of prismatic portions of the thin plate material. As a result, the manufacturing cost of the thermistor can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施形態のチップ型サーミスタの
製造工程を説明する図。
FIG. 1 is a diagram illustrating a manufacturing process of a chip type thermistor according to a first embodiment of the present invention.

【図2】角柱部のコーナ部を丸み付けする前の状態と後
の状態を示す図1(b)のA−A線断面図。
FIG. 2 is a sectional view taken along the line AA of FIG. 1 (b) showing a state before and a state after rounding the corner portion of the prismatic portion.

【図3】図1(c)のB−B線断面図。FIG. 3 is a sectional view taken along line BB of FIG.

【図4】図1(c)のC−C線断面図。FIG. 4 is a sectional view taken along the line CC of FIG.

【図5】図1(d)のD−D線断面図。FIG. 5 is a sectional view taken along line DD of FIG.

【図6】そのサーミスタの要部判断斜視図。FIG. 6 is a perspective view showing a judgment of a main part of the thermistor.

【図7】図6のE−E線断面図。7 is a sectional view taken along line EE of FIG.

【図8】本発明の第2実施形態の多数の深溝を有する薄
板材の斜視図。
FIG. 8 is a perspective view of a thin plate member having a large number of deep grooves according to a second embodiment of the present invention.

【図9】その薄板材を懸濁液に浸漬して電圧を印加した
状態を示す構成図。
FIG. 9 is a configuration diagram showing a state in which the thin plate material is immersed in a suspension and a voltage is applied.

【符号の説明】[Explanation of symbols]

11 チップ型サーミスタ 12 サーミスタ素体 13 ガラス層(絶縁性無機物層) 14 端子電極 15,55 抵抗値調整用電極 16,56 薄板材 17 長孔 18,58 角柱部 18a コーナ部 19 焼付け電極 20 めっき層 57 深溝 62 懸濁液 63 対向電極 11 Chip Thermistor 12 Thermistor Element 13 Glass Layer (Insulating Inorganic Material Layer) 14 Terminal Electrode 15,55 Resistance Adjustment Electrode 16,56 Thin Plate Material 17 Long Hole 18,58 Square Column 18a Corner 19 Baking Electrode 20 Plating Layer 57 Deep groove 62 Suspension 63 Counter electrode

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 セラミック焼結体よりなる薄板材(16,5
6)の表面に所定の間隔をあけて互いに平行に多数の抵抗
値調整用電極(15,55)を形成する工程と、 前記薄板材(16,56)に前記抵抗値調整用電極(15,55)の長
手方向に所定の間隔をあけかつ前記抵抗値調整用電極(1
5,55)の長手方向に直交する方向に延びる多数の長孔(1
7)又は深溝(57)を形成することにより前記長孔(17)間又
は前記深溝(57)間に多数の角柱部(18,58)を形成する工
程と、 前記薄板材(16,56)のうち少なくとも前記多数の角柱部
(18,58)の全側面に絶縁性無機物層(13)を形成する工程
と、 前記絶縁性無機物層(13)が形成された角柱部(18,58)を
前記各抵抗値調整用電極(15,55)の幅方向の中央に沿っ
てそれぞれ切断することにより両端に前記抵抗値調整用
電極(15,55)がそれぞれ露出するサーミスタ素体(12)を
形成する工程と、 前記サーミスタ素体(12)の両端面及び前記一対の抵抗値
調整用電極(15,55)の一端面を含む前記サーミスタ素体
(12)の両端部に焼付け電極層(19,19)を形成する工程
と、 前記焼付け電極層(19,19)の表面にめっき層(20,20)を形
成して前記焼付け電極層(19,19)と前記めっき層(20,20)
からなる端子電極(14,14)を形成する工程とを含むチッ
プ型サーミスタの製造方法。
1. A thin plate material (16, 5) made of a ceramic sintered body.
A step of forming a large number of resistance value adjusting electrodes (15, 55) parallel to each other at a predetermined interval on the surface of 6), and the resistance value adjusting electrodes (15, 55) on the thin plate material (16, 56). 55) with a predetermined interval in the longitudinal direction of the resistance adjustment electrode (1
5,55) with a large number of long holes (1
7) or a step of forming a large number of prismatic portions (18, 58) between the elongated holes (17) or between the deep grooves (57) by forming deep grooves (57), and the thin plate material (16, 56) At least the plurality of prismatic portions
(18, 58) a step of forming an insulating inorganic material layer (13) on all side surfaces, the prismatic portion (18, 58) on which the insulating inorganic material layer (13) is formed on each of the resistance value adjusting electrodes ( 15, 55) forming a thermistor element body (12) in which the resistance value adjusting electrodes (15, 55) are exposed at both ends by cutting along the center of the thermistor element body. The thermistor element body including both end faces of (12) and one end faces of the pair of resistance value adjusting electrodes (15, 55)
(12) a step of forming a baking electrode layer (19, 19) on both ends, and a plating layer (20, 20) is formed on the surface of the baking electrode layer (19, 19) to form the baking electrode layer (19 , 19) and the plating layer (20, 20)
And a step of forming terminal electrodes (14, 14) made of
【請求項2】 セラミック焼結体よりなる薄板材(16,5
6)の表面に所定の間隔をあけて互いに平行に多数の抵抗
値調整用電極(15,55)を形成する工程と、 前記薄板材(16,56)に前記抵抗値調整用電極(15,55)の長
手方向に所定の間隔をあけかつ前記抵抗値調整用電極(1
5,55)の長手方向に直交する方向に延びる多数の長孔(1
7)又は深溝(57)を形成することにより前記長孔(17)間又
は前記深溝(57)間に多数の角柱部(18,58)を形成する工
程と、 前記多数の角柱部(18,58)のコーナ部(18a)を丸み付けす
る工程と、 前記薄板材(16,56)のうち少なくとも前記多数の角柱部
(18,58)の全側面に絶縁性無機物層(13)を形成する工程
と、 前記絶縁性無機物層(13)が形成された角柱部(18,58)を
前記各抵抗値調整用電極(15,55)の幅方向の中央に沿っ
てそれぞれ切断することにより両端に前記抵抗値調整用
電極(15,55)がそれぞれ露出するサーミスタ素体(12)を
形成する工程と、 前記サーミスタ素体(12)の両端面及び前記一対の抵抗値
調整用電極(15,55)の一端面を含む前記サーミスタ素体
(12)の両端部に焼付け電極層(19,19)を形成する工程
と、 前記焼付け電極層(19,19)の表面にめっき層(20,20)を形
成して前記焼付け電極層(19,19)と前記めっき層(20,20)
からなる端子電極(14,14)を形成する工程とを含むチッ
プ型サーミスタの製造方法。
2. A thin plate material (16, 5) made of a ceramic sintered body.
A step of forming a large number of resistance value adjusting electrodes (15, 55) parallel to each other at a predetermined interval on the surface of 6), and the resistance value adjusting electrodes (15, 55) on the thin plate material (16, 56). 55) with a predetermined interval in the longitudinal direction of the resistance adjustment electrode (1
5,55) with a large number of long holes (1
7) or a step of forming a large number of prismatic portions (18, 58) between the elongated holes (17) or between the deep grooves (57) by forming deep grooves (57), and a large number of the prismatic portions (18, 58). 58) rounding the corner portion (18a), and at least the plurality of prismatic portions of the thin plate materials (16, 56)
(18, 58) a step of forming an insulating inorganic material layer (13) on all side surfaces, the prismatic portion (18, 58) on which the insulating inorganic material layer (13) is formed on each of the resistance value adjusting electrodes ( 15, 55) forming a thermistor element body (12) in which the resistance value adjusting electrodes (15, 55) are exposed at both ends by cutting along the center of the thermistor element body. The thermistor element body including both end faces of (12) and one end faces of the pair of resistance value adjusting electrodes (15, 55)
(12) a step of forming a baking electrode layer (19, 19) on both ends, and a plating layer (20, 20) is formed on the surface of the baking electrode layer (19, 19) to form the baking electrode layer (19 , 19) and the plating layer (20, 20)
And a step of forming terminal electrodes (14, 14) made of
【請求項3】 絶縁性無機物粉末を含む懸濁液(62)に薄
板材(16,56)を陽極とし対向電極(63,63)を陰極として浸
漬し、前記薄板材(16,56)と前記対向電極(63,63)とに所
定の電圧を印加して前記薄板材(16,56)の少なくとも多
数の角柱部(18,58)の全側面に前記絶縁性無機物粉末を
付着させて焼付け、少なくとも前記多数の角柱部(18,5
8)の全側面に絶縁性無機物層(13)を形成する請求項1又
は2記載のチップ型サーミスタの製造方法。
3. A thin plate material (16,56) is immersed in a suspension (62) containing an insulating inorganic powder as an anode and a counter electrode (63,63) as a cathode to form the thin plate material (16,56). Applying a predetermined voltage to the counter electrodes (63, 63) and attaching the insulating inorganic powder to all side surfaces of at least a large number of prismatic portions (18, 58) of the thin plate material (16, 56) and baking. , At least the large number of prisms (18,5
The method for manufacturing a chip type thermistor according to claim 1 or 2, wherein the insulating inorganic material layer (13) is formed on all side surfaces of (8).
JP03919696A 1996-02-27 1996-02-27 Manufacturing method of chip type thermistor Expired - Lifetime JP3226014B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03919696A JP3226014B2 (en) 1996-02-27 1996-02-27 Manufacturing method of chip type thermistor

Publications (2)

Publication Number Publication Date
JPH09232103A true JPH09232103A (en) 1997-09-05
JP3226014B2 JP3226014B2 (en) 2001-11-05

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ID=12546377

Family Applications (1)

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Country Status (1)

Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7887713B2 (en) 2003-01-24 2011-02-15 Epcos Ag Method for producing an electronic component

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7887713B2 (en) 2003-01-24 2011-02-15 Epcos Ag Method for producing an electronic component

Also Published As

Publication number Publication date
JP3226014B2 (en) 2001-11-05

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