JPH09227281A - Device for pulling up single crystal - Google Patents

Device for pulling up single crystal

Info

Publication number
JPH09227281A
JPH09227281A JP6920296A JP6920296A JPH09227281A JP H09227281 A JPH09227281 A JP H09227281A JP 6920296 A JP6920296 A JP 6920296A JP 6920296 A JP6920296 A JP 6920296A JP H09227281 A JPH09227281 A JP H09227281A
Authority
JP
Japan
Prior art keywords
single crystal
pulling
crystal
silicon
pulled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6920296A
Other languages
Japanese (ja)
Inventor
Akihiro Mizuta
昭浩 水田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Sumitomo Sitix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Sitix Corp filed Critical Sumitomo Sitix Corp
Priority to JP6920296A priority Critical patent/JPH09227281A/en
Publication of JPH09227281A publication Critical patent/JPH09227281A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PROBLEM TO BE SOLVED: To surely prevent the fall of a single crystal with a device for pulling up the single crystal from a melt by a CZ method by providing the subject device with a second means for pulling up the single crystal which pulls up the single crystal by surface-to-surface supporting the single crystal at plural points in the circumference direction of its outer peripheral surface. SOLUTION: This device for pulling up the single crystal has a pulling-up device body 20 which holes the silicon single crystal 10 by the seed crystal 40 and pulls up the silicon single crystal from the silicon melt and the second means for pulling up the single crystal 30 which is disposed within a pull chamber 21 of the pulling up device body 20 and holds and pulls up the straight cylindrical part 12 of the single crystal 10. The single crystal 10 is pulled up from the raw material melt by the CZ method while the single crystal is rotated. The second means 30 for pulling up the single crystal consisting of an annular lifting base 32 suspended and supported by means of plural pieces of wire ropes 31, four piece of holding arms 33 extending downward from the fore positions in the circumferential direction of the lifting base 32, a holding plate 34, a block 35 for operation, etc., is actuated at the point of the time the single crystal 10 is pulled into the chamber 21 according to progression of the growth of the single crystal 10, by which the single crystal 10 is surface-to-surface supported and is pulled up.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明はCZ法による単結晶
の育成に使用される単結晶引上げ装置に関する。
TECHNICAL FIELD The present invention relates to a single crystal pulling apparatus used for growing a single crystal by the CZ method.

【0002】[0002]

【従来の技術】半導体ディバイスの製造に使用されるシ
リコンウェーハの素材としては、CZ法により育成され
たシリコン単結晶が多用されている。CZ法によるシリ
コン単結晶の育成では、周知の通り、引上げ軸の下端に
種結晶を装着し、石英坩堝内に生成されたシリコン融液
にこの種結晶を浸け、この状態から種結晶を回転させな
がら引上げることにより、種結晶の下方にシリコン単結
晶を育成する。
2. Description of the Related Art As a material for a silicon wafer used for manufacturing a semiconductor device, a silicon single crystal grown by the CZ method is often used. In the growth of a silicon single crystal by the CZ method, as is well known, a seed crystal is attached to the lower end of a pulling shaft, the seed crystal is dipped in a silicon melt generated in a quartz crucible, and the seed crystal is rotated from this state. While pulling up, a silicon single crystal is grown below the seed crystal.

【0003】ここで種結晶は、直径が10数mm程度の
シリコン単結晶からなる細かい棒体であり、上端部がシ
ードチャックに連結され、下端部がシリコン融液に浸漬
される。種結晶をシリコン融液に浸漬すると、熱衝撃に
より転位が導入されるため、種結晶をシリコン融液に浸
漬した後に種結晶の直径を絞り、しばらくの間この状態
を維持して結晶の無転位化を図るいわゆる種絞りが実施
される。種絞り部の直径は無転位化の観点から5mm以
下が必要とされ、3mm以下が望ましいとされている。
Here, the seed crystal is a fine rod made of a silicon single crystal having a diameter of about ten and several millimeters. The upper end is connected to the seed chuck and the lower end is immersed in the silicon melt. When a seed crystal is immersed in a silicon melt, dislocations are introduced by thermal shock.Therefore, after the seed crystal is immersed in the silicon melt, the diameter of the seed crystal is reduced, and this state is maintained for a while to maintain the dislocation-free crystal. A so-called seed reduction is carried out. The diameter of the seed narrowing portion is required to be 5 mm or less from the viewpoint of dislocation-free, and is preferably 3 mm or less.

【0004】ところで、CZ法により育成されるシリコ
ン単結晶は、これまでは直径が8インチで重量が100
kg前後のものが主流であった。しかし、最近になって
更なる大径化が求められ、直径が12インチ以上のシリ
コン単結晶の育成も企画されている。単結晶の直径が大
きくなると、当然その重量も増え、直径が12インチの
場合で重量は200kgに達する。
By the way, the silicon single crystal grown by the CZ method has a diameter of 8 inches and a weight of 100.
The thing of about kg was the mainstream. However, recently, a further increase in diameter has been demanded, and the growth of silicon single crystals with a diameter of 12 inches or more has been planned. As the diameter of the single crystal increases, the weight naturally increases, and the weight reaches 200 kg when the diameter is 12 inches.

【0005】育成中の単結晶の重量は種結晶の特に種絞
り部に集中し、結晶重量が増大すると種絞り部にかかる
荷重も増大するが、シリコンの破壊強度は20kg/m
2程度であり、200kgのシリコン単結晶を確実に
保持するためには、少なく見積もっても5mmを超える
直径が種絞り部に必要となる。ところが、5mmを超え
る直径では種結晶を無転位化することが不可能である。
従って、現状の技術では200kgに達する単結晶の育
成は不可能である。
The weight of the single crystal being grown is concentrated on the seed crystal, particularly on the seed crystal. When the weight of the crystal increases, the load on the seed crystal increases, but the breaking strength of silicon is 20 kg / m.
The diameter is about m 2 , and in order to reliably hold 200 kg of the silicon single crystal, the seed drawing portion needs to have a diameter of more than 5 mm, at least. However, if the diameter exceeds 5 mm, it is impossible to dislocation-free the seed crystal.
Therefore, it is impossible to grow a single crystal of up to 200 kg with the current technology.

【0006】このような問題を解決するために、特公平
5−65477号公報等には単結晶のトップ部にクビレ
を形成し、そのクビレ部を複数の爪により周囲からクラ
ンプして、単結晶を引き上げる種結晶に依存しない引上
げ技術が示されている。
In order to solve such a problem, Japanese Patent Publication No. 5-65477 discloses that a single crystal is provided with a constriction at its top, and the constriction is clamped from the surroundings by a plurality of claws. A pulling technique that does not depend on a seed crystal for pulling is shown.

【0007】[0007]

【発明が解決しようとする課題】単結晶に形成したクビ
レ部を直接クランプする技術は、クランプ爪が不用意に
開かない限り、200kgを超える単結晶も確実に引上
げ、その落下を防止することができる。しかし、現状の
育成技術では、結晶引上げ軸に対して対称的なクビレ部
を形成することが困難である。そのため、クビレ部をク
ランプして単結晶の育成を行った場合には、単結晶が芯
円性を損ない、有転位化や直径制御精度の低下という問
題が生じる。また単結晶が引上げ軸方向においてくねっ
た形状になり、後工程の外周部切削による切削代の増大
も大きな問題となる。更にはクビレ部自体がロスとな
り、これによる歩留りの低下も無視できない問題であ
る。
The technique for directly clamping the cracked portion formed on a single crystal can reliably pull up a single crystal of more than 200 kg and prevent its fall unless the clamp claws are opened carelessly. it can. However, with the current growth technique, it is difficult to form a dented portion symmetrical with respect to the crystal pulling axis. Therefore, when the single crystal is grown by clamping the constricted portion, the single crystal impairs the concentricity, and there arises a problem that dislocations occur and the diameter control accuracy decreases. In addition, the single crystal has a meandering shape in the pulling axial direction, and an increase in the cutting allowance due to the outer peripheral cutting in the subsequent step becomes a big problem. Furthermore, the scratched portion itself becomes a loss, and the reduction in yield due to this is also a problem that cannot be ignored.

【0008】本発明の目的は、200kgを超える単結
晶についてもその落下を確実に防止し、且つその防止に
伴う引上げへの悪影響および歩留り低下を可及的に回避
することができる単結晶引上げ装置を提供することにあ
る。
An object of the present invention is to reliably prevent even a single crystal of more than 200 kg from falling, and to prevent the adverse effect on the pulling and the decrease in yield due to the prevention as much as possible. To provide.

【0009】[0009]

【課題を解決するための手段】本発明の単結晶引上げ装
置は、CZ法により原料融液から単結晶を回転させなが
ら引上げる引上げ装置本体と、前記単結晶を、その外周
面を周方向複数箇所において面支持して引上げる第2の
単結晶引上げ手段とを具備する。
A single crystal pulling apparatus according to the present invention comprises a pulling apparatus main body for pulling a single crystal from a raw material melt by a CZ method while rotating the single crystal, and a plurality of the outer peripheral surfaces of the single crystal in the circumferential direction. And a second single crystal pulling means for supporting the surface and pulling it at a position.

【0010】従来の単結晶を直接クランプする技術で
は、単結晶に形成したクビレ部の外周面にクランプ爪が
点接触し、クランプ爪にクビレ部が単に引っ掛かった状
態で単結晶が引上げられるため、クビレ部が非対称形状
の場合はその影響を受けて単結晶が傾く。これに対して
本発明では、単結晶の外周面が周方向複数箇所において
面支持されるため、単結晶に形成したクビレ部が非対称
であっても単結晶が直立に保持される。また、クビレ部
の形成を省略した場合でも単結晶が保持されるので、ク
ビレ部の省略が可能となる。
In the conventional technique for directly clamping a single crystal, the clamp claw makes a point contact with the outer peripheral surface of the constriction portion formed in the single crystal, and the single crystal is pulled up with the constriction portion simply caught by the clamp claw. The single crystal is tilted under the influence of the asymmetrical shape in the cut portion. On the other hand, in the present invention, since the outer peripheral surface of the single crystal is surface-supported at a plurality of positions in the circumferential direction, the single crystal is held upright even if the cut portion formed in the single crystal is asymmetric. Further, since the single crystal is retained even when the formation of the cut portion is omitted, the cut portion can be omitted.

【0011】[0011]

【発明の実施の形態】以下に本発明の実施の形態を図示
例に基づいて説明する。図1は本発明を実施した単結晶
引上げ装置の1例についてその主要部の構成を示す立面
図、図2は図1のA−A線矢視図、図3は単結晶の保持
状態を示す立面図である。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is an elevation view showing the configuration of the main part of an example of a single crystal pulling apparatus embodying the present invention, FIG. 2 is a view taken along the line AA of FIG. 1, and FIG. FIG.

【0012】本引上げ装置は、シリコンの融液からシリ
コンの単結晶10を種結晶40により保持して引上げる
引上げ装置本体20と、引上げ装置本体20のプルチャ
ンバー21内に設けられて単結晶10の直胴部を保持し
て引上げる第2の単結晶引上げ手段30とを具備する。
This pulling apparatus is provided in a pulling apparatus main body 20 for pulling a silicon single crystal 10 held by a seed crystal 40 from a melt of silicon and a pull chamber 21 of the pulling apparatus main body 20. And a second single crystal pulling means 30 for holding and pulling the straight body part of the.

【0013】引上げ装置本体20は、従来の引上げ装置
と基本的に同じであって、プルチャンバー21内を通っ
てメインチャンバー内に垂下するワイヤ22の下端にシ
ードチャック23を取付け、これに装着した種結晶40
を融液に浸漬した状態からワイヤ22を回転させながら
引上げることにより、種結晶40の下方に単結晶10を
育成しプルチャンバー21内に引込む。
The pulling device main body 20 is basically the same as the conventional pulling device, and a seed chuck 23 is attached to the lower end of the wire 22 passing through the pull chamber 21 and hanging in the main chamber. Seed crystal 40
The single crystal 10 is grown below the seed crystal 40 and pulled into the pull chamber 21 by pulling while rotating the wire 22 from the state of being immersed in the melt.

【0014】引上げ装置本体20のプルチャンバー21
内に設けられた第2の単結晶引上げ手段30は、引上げ
軸であるワイヤ22が中心部を挿通するように複数本の
ワイヤ31によって懸吊支持されたリング状の昇降ベー
ス32と、昇降ベース32の周方向4位置から下方の延
出した4本の保持アーム33と、各保持アーム33の下
端に取付けられた保持プレート34と、4本の保持アー
ム33を同期して内側へ閉じるためにワイヤ22の下端
に設けられた操作用ブロック35とを具備する。
Pull chamber 21 of pulling device body 20
The second single crystal pulling means 30 provided therein includes a ring-shaped lifting base 32 suspended and supported by a plurality of wires 31 so that the wire 22 as a pulling shaft is inserted through the central portion, and a lifting base. In order to synchronously close the four holding arms 33 extending downward from the four circumferential positions of 32, the holding plates 34 attached to the lower ends of the holding arms 33, and the four holding arms 33 inwardly. The operation block 35 provided at the lower end of the wire 22.

【0015】各保持アーム33は、下方に向かって外側
へ傾斜した傾斜部33aと、傾斜部33aの上端から内
側へ延出した第1延出部33bと、傾斜部33aの下端
から内側へ延出した第2延出部33cとからなる。そし
て、第1延出部33bの中間部が、昇降ベース32の半
径方向に直角な水平ピン36によって昇降ベース32に
回転自在に連結されている。
Each holding arm 33 extends downward from the inclined portion 33a to the outside, a first extending portion 33b extending from the upper end of the inclined portion 33a to the inside, and extends from the lower end of the inclined portion 33a to the inside. The second extending portion 33c is formed. The middle portion of the first extending portion 33b is rotatably connected to the elevating base 32 by a horizontal pin 36 that is perpendicular to the radial direction of the elevating base 32.

【0016】これにより、4本の保持アーム33は水平
ピン36を支点として開閉動作を行い、通常は複数本の
ワイヤ31により外側へ開放した状態に維持される。
As a result, the four holding arms 33 open and close with the horizontal pin 36 as a fulcrum, and are normally kept open to the outside by the plurality of wires 31.

【0017】保持プレート34は、それぞれ引上げられ
る単結晶10の外周面に対応する円弧に曲成された湾曲
板であって、保持アーム33の第2延出部33cの先端
に、引上げ軸に対して同心円状に固着されている。保持
プレート34の材質は、単結晶10の汚染を防ぐために
タングステン・モリブデン等を用いる必要がある。
The holding plate 34 is a curved plate bent into an arc corresponding to the outer peripheral surface of the single crystal 10 to be pulled up, and is attached to the tip of the second extending portion 33c of the holding arm 33 with respect to the pulling axis. Are fixed concentrically. As a material of the holding plate 34, it is necessary to use tungsten, molybdenum or the like in order to prevent the single crystal 10 from being contaminated.

【0018】操作用ブロック35は、シードチャック2
3の上方に位置してワイヤ22の下端部に装着された円
錐部材である。円錐部材の最大直径は、4本の保持アー
ム33の各上端部に設けられた第1延出部33bの先端
が形成する円の直径より大きく設定されている。
The operation block 35 is the seed chuck 2
3 is a conical member located above 3 and attached to the lower end of the wire 22. The maximum diameter of the conical member is set to be larger than the diameter of the circle formed by the tips of the first extending portions 33b provided at the upper ends of the four holding arms 33.

【0019】従って、ワイヤ22の上昇に伴って4つの
第1延出部33bの内側に下方から操作用ブロック35
が挿入されると、4本の傾斜アーム33は同期して内側
へ閉じ、これによって単結晶10の直胴部の最上部外周
面を4つの保持プレート34により面支持するようにな
っている。
Therefore, as the wire 22 is lifted up, the operation block 35 is moved from below to the inside of the four first extending portions 33b.
Is inserted, the four inclined arms 33 are synchronously closed inward, whereby the uppermost outer peripheral surface of the straight body portion of the single crystal 10 is surface-supported by the four holding plates 34.

【0020】次に、本引上げ装置を用いた単結晶10の
育成方法について詳細に説明する。
Next, a method of growing the single crystal 10 using this pulling apparatus will be described in detail.

【0021】引上げ装置本体20のシードチャック23
に装着された種結晶40をメインチャンバー内に設置さ
れた坩堝内の融液に漬け、ワイヤ22を回転させながら
引上げることにより、種絞り、ショルダー部11の形
成、直胴部12の形成を順に行う。このとき、ショルダ
ー部11と直胴部12との境界部分に直胴部12より直
径が大きい大径部13を形成する。また、第2の単結晶
引上げ手段30の操作用ブロック35を除く部分は、保
持アーム33を外側に開いた状態でプルチャンバー21
の下部内に待機している。
Seed chuck 23 of pulling device body 20
The seed crystal 40 attached to the above is soaked in the melt in the crucible installed in the main chamber, and the wire 22 is pulled up while rotating to form the seed diaphragm, the formation of the shoulder portion 11, and the formation of the straight body portion 12. Do in order. At this time, a large diameter portion 13 having a diameter larger than that of the straight body portion 12 is formed at the boundary portion between the shoulder portion 11 and the straight body portion 12. Further, the portion of the second single crystal pulling means 30 excluding the operation block 35 has the pull chamber 21 with the holding arm 33 opened to the outside.
Waiting inside the bottom of

【0022】単結晶10の育成が進み、その単結晶10
がプルチャンバー21内に引込まれると、図1に示され
るように、単結晶10の育成の進行に伴って操作用ブロ
ック35が昇降ベース32に下方から接近する。4本の
保持アーム33の第1延出部33bの内側に操作用ブロ
ック35が挿入されると、図3に示されるように、4本
の保持アーム33は同期して内側へ閉じる。そして、こ
の時点で4つの保持プレート34の内側に単結晶10の
大径部13の真下部分が位置するように単結晶10の育
成を行うことにより、直胴部12の最上部外周面が4つ
の保持プレート34により面支持される。
As the growth of the single crystal 10 progresses, the single crystal 10 grows.
When is pulled into the pull chamber 21, the operation block 35 approaches the elevating base 32 from below as the single crystal 10 grows, as shown in FIG. When the operation block 35 is inserted inside the first extending portion 33b of the four holding arms 33, the four holding arms 33 are synchronously closed inward as shown in FIG. Then, at this point, by growing the single crystal 10 so that the portion directly below the large diameter portion 13 of the single crystal 10 is located inside the four holding plates 34, the uppermost outer peripheral surface of the straight body portion 12 becomes 4 It is surface-supported by one holding plate 34.

【0023】直胴部12の最上部が4つの保持プレート
34により面支持されると、第2の単結晶引上げ手段3
0の昇降ベース32がワイヤ31によりこれまでと同じ
条件で回転しながら引上げられる。その結果、単結晶1
0の引上げはこれ以後、第2の単結晶引上げ手段30に
より直胴部12が引上げられるものとなる。
When the uppermost portion of the straight body portion 12 is surface-supported by the four holding plates 34, the second single crystal pulling means 3
The lifting base 32 of 0 is pulled up by the wire 31 while rotating under the same conditions as before. As a result, single crystal 1
The pulling of 0 means that the straight body portion 12 is pulled up by the second single crystal pulling means 30 thereafter.

【0024】このとき、単結晶10の大径部13が4つ
の保持プレート34に引っ掛かった状態となる。このた
め、単結晶10の重量が重い場合もその落下が確実に防
止される。また、図3に示すように、大径部13が対称
的でない場合にも単結晶10は4つの保持プレート34
により外周面が面支持されているので傾斜することがな
く、引上げ軸に対する同芯性が維持される。そして、こ
の面支持によれば、引っ掛け部である大径部13が存在
しない場合にも、単結晶10は引上げ軸に対する同芯性
を維持しつつ確実に引上げることが可能である。このよ
うな効果は、単結晶10の外周面に喰い込む突起を保持
プレート34の内面に設けて、単結晶10のスリップを
防止することより一層確実となる。
At this time, the large diameter portion 13 of the single crystal 10 is hooked on the four holding plates 34. Therefore, even if the weight of the single crystal 10 is heavy, it is reliably prevented from falling. Further, as shown in FIG. 3, the single crystal 10 has four holding plates 34 even when the large diameter portion 13 is not symmetrical.
Since the outer peripheral surface is surface-supported by this, there is no inclination and concentricity with respect to the pulling shaft is maintained. Further, according to this surface support, the single crystal 10 can be reliably pulled up while maintaining the concentricity with respect to the pulling axis even when the large diameter portion 13 which is the hooking portion does not exist. Such an effect is further assured by providing a protrusion that digs into the outer peripheral surface of the single crystal 10 on the inner surface of the holding plate 34 to prevent the single crystal 10 from slipping.

【0025】保持プレート34の大きさは、高さについ
ては30mm〜100mmが望ましく、周方向の長さに
ついては単結晶10の周長の0.1〜0.2倍が望ましい。
保持プレート34が小さすぎると単結晶10の傾きを阻
止する効果が小さいが、必要以上に大きくしてもその効
果は増大しない。
The size of the holding plate 34 is preferably 30 mm to 100 mm in height and 0.1 to 0.2 times the circumferential length of the single crystal 10 in the circumferential direction.
If the holding plate 34 is too small, the effect of preventing the tilt of the single crystal 10 is small, but even if it is larger than necessary, the effect does not increase.

【0026】保持プレート34の個数、すなわち面支持
箇所数については、2以上あればよく、面支持箇所が多
くなるにつれて個々の支持面積を小さくすることができ
る。
The number of holding plates 34, that is, the number of surface supporting points, may be two or more, and the individual supporting area can be reduced as the number of surface supporting points increases.

【0027】8インチのシリコン単結晶を育成する場合
に、図1〜図3に示す引上げ装置を用いた。比較のため
に落下防止対策のない一般の引上げ装置と、単結晶のト
ップ部に形成したクビレ部を4つの爪により点支持する
従来装置とを用いた。それぞれの場合の有転位化率およ
び結晶直径の最大誤差を表1に示す。有転位化率とは全
引上げ回数に対する有転位化発生引上げ回数の比であ
る。
When growing an 8-inch silicon single crystal, the pulling apparatus shown in FIGS. 1 to 3 was used. For comparison, a general pulling device without a fall prevention measure and a conventional device for supporting the scratched portion formed on the top portion of the single crystal with four claws were used. Table 1 shows the maximum error of the dislocation ratio and the crystal diameter in each case. The dislocation generation rate is the ratio of the number of times of occurrence of dislocation generation to the total number of times of pulling.

【0028】[0028]

【表1】 [Table 1]

【0029】表1から分かるように、本引上げ装置を使
用しても有転位化率および最大誤差は対策なしの場合と
実質的に同じである。これに対しクビレ部をクランプす
る従来装置の場合は、これらが大幅に増大する。本引上
げ装置が単結晶落下防止に伴う悪影響を実質的に生じな
いことが明らかである。
As can be seen from Table 1, even when this pulling apparatus is used, the dislocation ratio and the maximum error are substantially the same as those without any countermeasure. On the other hand, in the case of the conventional device that clamps the cut portion, these are significantly increased. It is clear that the pulling device does not substantially cause the adverse effect of preventing the single crystal from falling.

【0030】なお、上記した例は単結晶10の直胴部1
2の最上部付近を保持するものであるが、単結晶10の
トップ部に別途形成した小径の直胴部を保持するように
してもよい。
In the above example, the straight body portion 1 of the single crystal 10 is used.
Although the vicinity of the uppermost part of 2 is held, a small-diameter straight body part separately formed on the top part of the single crystal 10 may be held.

【0031】[0031]

【発明の効果】以上に説明した通り、本発明の単結晶引
上げ装置は、種結晶に依存せずに単結晶を直接保持する
ので、200kgを超えると単結晶についてもその落下
を確実に防止することができる。また、その保持に際し
て単結晶の外周面を面支持するので、単結晶に形成した
クビレ部が引上げ軸に対して非対称であっても単結晶の
芯円性を維持することができ、これにより単結晶の落下
防止に伴う引上げへの悪影響を可及的に回避することが
できる。更にはクビレ部に依存しない保持も可能である
ので、クビレ部を小さくすることができ、最終的にはこ
れを省略することができる。従って、クビレ部の形成に
伴う歩留り低下も低減することができる。
As described above, since the single crystal pulling apparatus of the present invention directly holds the single crystal without depending on the seed crystal, even if the single crystal exceeds 200 kg, the single crystal can be surely prevented from falling. be able to. In addition, since the outer peripheral surface of the single crystal is surface-supported when holding the single crystal, the concentricity of the single crystal can be maintained even if the constricted portion formed on the single crystal is asymmetric with respect to the pulling axis. It is possible to avoid as much as possible the adverse effect on pulling due to the prevention of crystal falling. Further, since it is also possible to hold the slit portion independently of the slit portion, the slit portion can be made small, and finally it can be omitted. Therefore, it is possible to reduce a decrease in yield due to the formation of the cut portion.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明を実施した単結晶引上げ装置の1例につ
いてその主要部の構成を示す立面図である。
FIG. 1 is an elevational view showing the configuration of the main part of an example of a single crystal pulling apparatus embodying the present invention.

【図2】図1のA−A線矢視図である。FIG. 2 is a view taken along the line AA of FIG. 1;

【図3】単結晶の保持状態を示す立面図である。FIG. 3 is an elevational view showing a holding state of a single crystal.

【符号の説明】[Explanation of symbols]

10 単結晶 20 引上げ装置本体 22 ワイヤ 23 シードチャック 30 単結晶引上げ手段 31 ワイヤ 32 昇降ベース 33 保持アーム 34 保持プレート 35 操作用ブロック 40 種結晶 10 Single Crystal 20 Pulling Device Main Body 22 Wire 23 Seed Chuck 30 Single Crystal Pulling Means 31 Wire 32 Elevating Base 33 Holding Arm 34 Holding Plate 35 Operation Block 40 Seed Crystal

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 CZ法により原料融液から単結晶を回転
させながら引上げる引上げ装置本体と、前記単結晶をそ
の外周面の周方向複数箇所を面支持して引上げる第2の
単結晶引上げ手段とを具備することを特徴とする単結晶
引上げ装置。
1. A pulling apparatus main body for pulling a single crystal from a raw material melt by a CZ method while rotating it, and a second single crystal pulling for pulling the single crystal while supporting a plurality of circumferential positions of its outer peripheral surface. And a means for pulling a single crystal.
JP6920296A 1996-02-28 1996-02-28 Device for pulling up single crystal Pending JPH09227281A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6920296A JPH09227281A (en) 1996-02-28 1996-02-28 Device for pulling up single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6920296A JPH09227281A (en) 1996-02-28 1996-02-28 Device for pulling up single crystal

Publications (1)

Publication Number Publication Date
JPH09227281A true JPH09227281A (en) 1997-09-02

Family

ID=13395915

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6920296A Pending JPH09227281A (en) 1996-02-28 1996-02-28 Device for pulling up single crystal

Country Status (1)

Country Link
JP (1) JPH09227281A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100452234B1 (en) * 2000-10-23 2004-10-12 닛뽄덴끼 가부시끼가이샤 Semiconductor single crystal pulling apparatus
CN103215634A (en) * 2012-01-19 2013-07-24 宁夏日晶新能源装备股份有限公司 Mono-crystalline furnace multifunctional crystal bar taking machine

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100452234B1 (en) * 2000-10-23 2004-10-12 닛뽄덴끼 가부시끼가이샤 Semiconductor single crystal pulling apparatus
CN103215634A (en) * 2012-01-19 2013-07-24 宁夏日晶新能源装备股份有限公司 Mono-crystalline furnace multifunctional crystal bar taking machine

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