JPH09191015A - Heat treatment device - Google Patents
Heat treatment deviceInfo
- Publication number
- JPH09191015A JPH09191015A JP1923796A JP1923796A JPH09191015A JP H09191015 A JPH09191015 A JP H09191015A JP 1923796 A JP1923796 A JP 1923796A JP 1923796 A JP1923796 A JP 1923796A JP H09191015 A JPH09191015 A JP H09191015A
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- workpiece
- treatment plate
- plate
- mounting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、加工物を水平に載
置し、加工物の下方に位置する加熱板あるいは冷却板に
より、加工物の熱処理を行う熱処理装置に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat treatment apparatus for placing a work piece horizontally and heat-treating the work piece with a heating plate or a cooling plate located below the work piece.
【0002】[0002]
【従来の技術】従来この種の熱処理装置は、特公平3−
127820号公報や特公平3−135011号公報に
示される様に、加工物を熱処理板上に近接状態で載置し
て熱処理を行う様に構成されている。加工物は、処理前
に載置機構上に置かれ、載置機構の動作により熱処理板
上に載置される。載置された加工物は、熱処理板上に、
接触するか又は3点以上の支持点により近接状態で保持
される。そして、あらかじめ定められた時間の熱処理が
終了した後、加工物は載置機構によって熱処理板より離
され、次工程への払い出し待ちとなる。2. Description of the Related Art Conventionally, a heat treatment apparatus of this type is disclosed in Japanese Patent Publication No.
As disclosed in Japanese Patent No. 127820 and Japanese Patent Publication No. 3-135011, it is configured such that a workpiece is placed on a heat treatment plate in a close state and heat treatment is performed. The workpiece is placed on the placing mechanism before the treatment and is placed on the heat treatment plate by the operation of the placing mechanism. The placed workpiece is placed on the heat treatment plate.
Contacted or held in close proximity by three or more support points. Then, after the heat treatment for a predetermined time is completed, the work piece is separated from the heat treatment plate by the mounting mechanism and waits for delivery to the next process.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上記従
来例では、処理効率の向上のため、実際の熱処理時間の
前後における載置機構の動作速度を上げると、下記の不
具合が生じる。However, in the above-mentioned conventional example, if the operating speed of the mounting mechanism before and after the actual heat treatment time is increased in order to improve the processing efficiency, the following problems occur.
【0004】(1)加工物が薄い板上の場合、エアクッ
ションにより熱処理板上を移動し、処理後の取出しにお
いて位置が不適となる。(1) When the work piece is on a thin plate, it is moved on the heat treatment plate by an air cushion, and the position becomes unsuitable for taking out after processing.
【0005】(2)加工物が薄い板上でかつ剛性が高い
材質の場合、載置機構の動作始点および終点で、加工物
が衝撃により移動し、処理後の取出しにおいて位置が不
適となる。(2) When the work piece is a thin plate and has a high rigidity, the work piece moves due to an impact at the operation start point and the end point of the mounting mechanism, and the position becomes unsuitable for taking out after processing.
【0006】(3)加工物がその加工の過程において高
度な清浄度を要求される場合、エアクッションによるパ
ーティクルの巻き上げおよび衝撃によるパーティクルの
発生が想定される。(3) When the processed product requires a high degree of cleanliness in the process of processing, it is assumed that particles are rolled up by the air cushion and generated by impact.
【0007】そこで本発明は、加工物を熱処理板に載置
する際のエアクッションによる加工物の移動を防止し、
また、載置機構の動作による加工物への衝撃を緩和する
ことを目的とする。Therefore, the present invention prevents movement of the work piece due to the air cushion when the work piece is placed on the heat treatment plate,
Another object is to reduce the impact on the workpiece due to the operation of the mounting mechanism.
【0008】[0008]
【課題を解決するための手段】この目的を達成するため
第1の発明は、加工物が近接した状態もしくは接触した
状態で載置される熱処理板と、加工物を熱処理板上に載
置する手段とを有する熱処理装置において、熱処理板は
その上面に多数の細溝を有することを特徴とする。In order to achieve this object, a first invention is to place a heat treatment plate on which a workpiece is placed in the state of being close to or in contact with it, and placing the workpiece on the heat treating plate. In the heat treatment apparatus having the means, the heat treatment plate has a large number of fine grooves on its upper surface.
【0009】これによれば、加工物を熱処理板上に載置
する際に、加工物が熱処理板に高速で接近したとして
も、熱処理板と加工物との間の空気は、細溝に沿って流
出するため、加工物のエアクッション効果による移動が
防止される。According to this, when the work piece is placed on the heat treatment plate, even if the work piece approaches the heat treatment plate at a high speed, the air between the heat treatment plate and the work piece is guided along the narrow groove. Therefore, the work is prevented from moving due to the air cushion effect.
【0010】また、第2の発明は、加工物が近接した状
態もしくは接触した状態で載置される熱処理板と、加工
物を熱処理板上に載置する手段とを有する熱処理装置に
おいて、載置手段は、加工物を水平な状態で上下動させ
ることにより熱処理板上への載置および取上げを行うも
のであり、かつその上下動の始点および終点において上
下動速度を曲線的に加減速するものであることを特徴と
する。A second aspect of the present invention is a heat treatment apparatus having a heat treatment plate on which a workpiece is placed in a state of being close to or in contact with the workpiece, and a means for placing the workpiece on the heat treatment plate. The means is for placing and picking up the workpiece on a heat treatment plate by moving it vertically in a horizontal state, and for accelerating and decelerating the vertical movement speed at the start and end points of the vertical movement. Is characterized in that.
【0011】これによれば加工物を載置しおよび取上げ
る際の上下動の始点および終点における加工物への衝撃
が防止される。According to this, it is possible to prevent the impact on the workpiece at the start and end points of the vertical movement when the workpiece is placed and picked up.
【0012】載置手段は、加工物を支持し、熱処理板の
貫通孔を通して上下動することができる支持ピンを有す
る支持部材と、この支持部材を上下動させるS字状カム
とを有するものとして構成することができる。The placing means has a supporting member for supporting the workpiece and having a supporting pin capable of moving up and down through the through hole of the heat treatment plate, and an S-shaped cam for moving the supporting member up and down. Can be configured.
【0013】さらに、かかる第1発明および第2発明に
より、従来例に比べ、載置動作が迅速になり、熱処理時
間以外の無駄な時間が短縮され、単位時間当たりの加工
物の処理枚数が向上する。Further, according to the first invention and the second invention, as compared with the conventional example, the mounting operation is quicker, the wasted time other than the heat treatment time is shortened, and the number of processed products per unit time is improved. To do.
【0014】[0014]
【発明の実施の形態】図1は本発明の一実施形態に係る
熱処理装置を示す。図中、1は加工物、4は加工物1に
熱処理を施すための熱板、2は加工物1を支持し、熱板
4の貫通孔を通って上下動する載置機構ピン、3は熱板
4上に載置される加工物1を熱板4上の近接距離におい
て支持する近接距離決めピン、6はS字カム、5は載置
機構ピン2を支持し、S字カム6によって上下動する従
動部、7はS字カム6を駆動するカム動作源である。図
2は熱板4の斜視図であり、図中の8は熱板4の表面に
平行に加工された多数の細溝である。1 shows a heat treatment apparatus according to an embodiment of the present invention. In the figure, 1 is a work piece, 4 is a hot plate for heat-treating the work piece 1, 2 is a mounting mechanism pin that supports the work piece 1 and moves up and down through a through hole of the hot plate 4, and 3 is A proximity distance determining pin that supports the workpiece 1 placed on the hot plate 4 at a close distance on the hot plate 4, 6 is an S-shaped cam, 5 is a mounting mechanism pin 2, and the S-shaped cam 6 A driven unit that moves up and down, and 7 is a cam operation source that drives the S-shaped cam 6. FIG. 2 is a perspective view of the hot plate 4, and 8 in the figure is a large number of fine grooves machined parallel to the surface of the hot plate 4.
【0015】この構成において、加工物1は、カム動作
源7によりS字カム6を移動させて従動部5を、したが
って載置機構ピン2を上下動させることにより、熱板4
上の近接距離決めピン3の上に保持され、あるいはそこ
から取上げられる。この加工物1の上下動時に加工物1
を支持する載置機構ピン2は、S字カム6の作用により
微速で加工物1に接し、なめらかに増減速した後、停止
する。また、熱板4上に加工物1が接近する際には、熱
板4上に加工された細溝8を介して、加工物1と熱板4
間の空気が流出する。In this structure, the workpiece 1 moves the S-shaped cam 6 by the cam operation source 7 to move the driven portion 5 and thus the mounting mechanism pin 2 up and down to move the hot plate 4
It is held on or picked up from the proximity pin 3 above. When the workpiece 1 moves up and down, the workpiece 1
The mounting mechanism pin 2 for supporting the workpiece comes into contact with the workpiece 1 at a very low speed by the action of the S-shaped cam 6, and after smoothly accelerating and decelerating, stops. Further, when the workpiece 1 approaches the hot plate 4, the workpiece 1 and the hot plate 4 are passed through the narrow groove 8 formed on the hot plate 4.
The air between them flows out.
【0016】図3は、熱板4の別の加工例を示す。この
場合、細溝8は、熱板4を中心とする放射状に設けられ
ている。FIG. 3 shows another example of processing the hot plate 4. In this case, the narrow grooves 8 are provided radially around the heating plate 4.
【0017】[0017]
【発明の効果】以上説明したように、本発明によれば、
加工物を熱処理板に載置する際のエアクッションによる
加工物の移動を防止し、また載置手段の動作による加工
物への衝撃を緩和する。As described above, according to the present invention,
The movement of the work piece due to the air cushion when the work piece is placed on the heat treatment plate is prevented, and the impact on the work piece due to the operation of the placing means is mitigated.
【0018】これにより、特に半導体製造に使用される
シリコンウェーハ等の熱処理工程においては、処理時間
外となるウェーハの受け渡しのための準備動作時間を従
来よりも短縮することが可能となり、処理効率が向上す
る。また、空気の巻き返しによるパーティクルの浮上を
減少させることができる。さらに、ウェーハ載置時の衝
撃緩和は同様にパーティクルの発生を抑え、処理工程の
特性を向上させる。As a result, especially in the heat treatment process of silicon wafers used for semiconductor manufacturing, the preparatory operation time for delivering the wafers, which is outside the processing time, can be shortened as compared with the conventional case, and the processing efficiency is improved. improves. Further, it is possible to reduce the floating of particles due to the rewinding of air. Further, the impact mitigation at the time of placing the wafer also suppresses the generation of particles and improves the characteristics of the processing step.
【図1】 本発明の一実施形態による熱処理装置を示す
図である。FIG. 1 is a diagram showing a heat treatment apparatus according to an embodiment of the present invention.
【図2】 図1の装置の熱板の加工状態を示す図であ
る。FIG. 2 is a diagram showing a processed state of a hot plate of the apparatus shown in FIG.
【図3】 図1の装置の熱板の別の加工例を示す図であ
る。FIG. 3 is a diagram showing another example of processing the hot plate of the apparatus of FIG.
1:加工物、2:載置機構ピン、3:近接距離決めピ
ン、4:熱板、5:載置動作機構、6:S字カム、7:
カム動作源、8:細溝。1: Work piece, 2: Mounting mechanism pin, 3: Proximity distance determining pin, 4: Hot plate, 5: Mounting operation mechanism, 6: S-shaped cam, 7:
Cam operating source, 8: narrow groove.
Claims (3)
状態で載置される熱処理板と、加工物を熱処理板上に載
置する手段とを有する熱処理装置において、熱処理板は
その上面に多数の細溝を有することを特徴とする熱処理
装置。1. A heat treatment apparatus comprising: a heat treatment plate on which workpieces are placed in a state of being close to or in contact with each other; and a means for placing the workpiece on the heat treatment plate. A heat treatment apparatus having a narrow groove.
状態で載置される熱処理板と、加工物を熱処理板上に載
置する手段とを有する熱処理装置において、載置手段
は、加工物を水平な状態で上下動させることにより熱処
理板上への載置および取上げを行うものであり、かつそ
の上下動の始点および終点において上下動速度を曲線的
に加減速するものであることを特徴とする熱処理装置。2. A heat treatment apparatus, comprising: a heat treatment plate to be placed in a state where workpieces are in close proximity to or in contact with each other; and a means for placing the workpiece on the heat treatment plate, wherein the placing means places the workpiece in place. It is designed to be placed and picked up on a heat treatment plate by moving it up and down in a horizontal state, and to vertically accelerate and decelerate the vertical motion speed at the start and end points of the vertical motion. Heat treatment equipment.
の貫通孔を通して上下動することができる支持ピンを有
する支持部材と、この支持部材を上下動させるS字状カ
ムとを有することを特徴とする請求項2記載の熱処理装
置。3. The mounting means includes a support member having a support pin that supports a workpiece and can be moved up and down through a through hole of a heat treatment plate, and an S-shaped cam that moves the support member up and down. The heat treatment apparatus according to claim 2, wherein:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1923796A JPH09191015A (en) | 1996-01-11 | 1996-01-11 | Heat treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1923796A JPH09191015A (en) | 1996-01-11 | 1996-01-11 | Heat treatment device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09191015A true JPH09191015A (en) | 1997-07-22 |
Family
ID=11993794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1923796A Pending JPH09191015A (en) | 1996-01-11 | 1996-01-11 | Heat treatment device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09191015A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11297789A (en) * | 1998-04-09 | 1999-10-29 | Tokyo Electron Ltd | Treating device |
JP2002164423A (en) * | 2000-11-28 | 2002-06-07 | Tokyo Seimitsu Co Ltd | Wafer holding apparatus with wafer lift |
JP2002231792A (en) * | 2001-01-31 | 2002-08-16 | Tokyo Electron Ltd | Substrate processing device |
JP2003168712A (en) * | 2001-11-30 | 2003-06-13 | Japan Steel Works Ltd:The | Method and device for transporting substrate in load- lock device |
JP2006066850A (en) * | 2004-07-29 | 2006-03-09 | Kyocera Corp | Pin elevator and plate chucking equipment using the pin elevator |
JP2007201292A (en) * | 2006-01-27 | 2007-08-09 | Kyocera Corp | Sample positioning device |
JP2010040788A (en) * | 2008-08-05 | 2010-02-18 | Olympus Corp | Lift device and substrate inspection device |
JP2018526822A (en) * | 2015-08-14 | 2018-09-13 | エム キューブド テクノロジーズ, インコーポレイテッド | Wafer chuck characterized by a support surface with reduced friction |
-
1996
- 1996-01-11 JP JP1923796A patent/JPH09191015A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11297789A (en) * | 1998-04-09 | 1999-10-29 | Tokyo Electron Ltd | Treating device |
JP2002164423A (en) * | 2000-11-28 | 2002-06-07 | Tokyo Seimitsu Co Ltd | Wafer holding apparatus with wafer lift |
JP2002231792A (en) * | 2001-01-31 | 2002-08-16 | Tokyo Electron Ltd | Substrate processing device |
JP2003168712A (en) * | 2001-11-30 | 2003-06-13 | Japan Steel Works Ltd:The | Method and device for transporting substrate in load- lock device |
JP2006066850A (en) * | 2004-07-29 | 2006-03-09 | Kyocera Corp | Pin elevator and plate chucking equipment using the pin elevator |
JP4594020B2 (en) * | 2004-07-29 | 2010-12-08 | 京セラ株式会社 | Pin elevator and plate chuck device using the same |
JP2007201292A (en) * | 2006-01-27 | 2007-08-09 | Kyocera Corp | Sample positioning device |
JP4637756B2 (en) * | 2006-01-27 | 2011-02-23 | 京セラ株式会社 | Sample positioning device |
JP2010040788A (en) * | 2008-08-05 | 2010-02-18 | Olympus Corp | Lift device and substrate inspection device |
JP2018526822A (en) * | 2015-08-14 | 2018-09-13 | エム キューブド テクノロジーズ, インコーポレイテッド | Wafer chuck characterized by a support surface with reduced friction |
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