JPH09166300A - Nitrogen gas supply system - Google Patents
Nitrogen gas supply systemInfo
- Publication number
- JPH09166300A JPH09166300A JP32767295A JP32767295A JPH09166300A JP H09166300 A JPH09166300 A JP H09166300A JP 32767295 A JP32767295 A JP 32767295A JP 32767295 A JP32767295 A JP 32767295A JP H09166300 A JPH09166300 A JP H09166300A
- Authority
- JP
- Japan
- Prior art keywords
- air
- nitrogen gas
- nitrogen
- rectification
- backup
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 145
- 229910001873 dinitrogen Inorganic materials 0.000 title claims abstract description 57
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 44
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000001301 oxygen Substances 0.000 claims abstract description 7
- 238000001704 evaporation Methods 0.000 claims description 3
- 230000000593 degrading effect Effects 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 18
- 239000012535 impurity Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- 229910002056 binary alloy Inorganic materials 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- DOTMOQHOJINYBL-UHFFFAOYSA-N molecular nitrogen;molecular oxygen Chemical compound N#N.O=O DOTMOQHOJINYBL-UHFFFAOYSA-N 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 2
- 238000005194 fractionation Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/044—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air using a single pressure main column system only
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/02—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream
- F25J3/04—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by rectification, i.e. by continuous interchange of heat and material between a vapour stream and a liquid stream for air
- F25J3/04763—Start-up or control of the process; Details of the apparatus used
- F25J3/04769—Operation, control and regulation of the process; Instrumentation within the process
- F25J3/04812—Different modes, i.e. "runs" of operation
- F25J3/04824—Stopping of the process, e.g. defrosting or deriming; Back-up procedures
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/90—Details relating to column internals, e.g. structured packing, gas or liquid distribution
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2210/00—Processes characterised by the type or other details of the feed stream
- F25J2210/42—Nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2250/00—Details related to the use of reboiler-condensers
- F25J2250/30—External or auxiliary boiler-condenser in general, e.g. without a specified fluid or one fluid is not a primary air component or an intermediate fluid
- F25J2250/42—One fluid being nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2290/00—Other details not covered by groups F25J2200/00 - F25J2280/00
- F25J2290/10—Mathematical formulae, modeling, plot or curves; Design methods
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2290/00—Other details not covered by groups F25J2200/00 - F25J2280/00
- F25J2290/62—Details of storing a fluid in a tank
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Pipeline Systems (AREA)
- Separation By Low-Temperature Treatments (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は高純度の窒素ガスを
必要とする半導体・液晶製造用の窒素ガスの供給システ
ムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nitrogen gas supply system for manufacturing semiconductors and liquid crystals requiring high-purity nitrogen gas.
【０００２】[0002]
【従来の技術】従来の窒素ガスの供給方法は図７に示す
ように、前処理装置５１、空気圧縮機５２、空気冷却機
５３、不純物除去装置５４、精留塔５５よりなる空気精
留分離機と液化窒素タンク５６、液化窒素蒸発器５７を
備えている。通常の状態では、空気精留分離機により発
生した窒素ガスを送ガスするが、停電、空気精留分離機
のトラブル等により空気精留分離機よりの送ガスが不能
となった場合には緊急作動弁５８により窒素ガスの流路
を切り替え、液化窒素タンク５６内の液化窒素を液化窒
素蒸発器５７により蒸発発生させたバックアップ窒素ガ
スを送ガスする。2. Description of the Related Art As shown in FIG. 7, a conventional method for supplying nitrogen gas is an air rectifying and separating apparatus comprising a pretreatment device 51, an air compressor 52, an air cooler 53, an impurity removing device 54, and a rectifying tower 55. And a liquefied nitrogen tank 56 and a liquefied nitrogen evaporator 57. Under normal conditions, the nitrogen gas generated by the air rectification separator is sent, but in the event that the gas supply from the air rectification separator becomes impossible due to a power outage, trouble in the air rectification separator, etc., it is an emergency. The flow path of the nitrogen gas is switched by the operation valve 58, and the backup nitrogen gas in which the liquefied nitrogen in the liquefied nitrogen tank 56 is vaporized and generated by the liquefied nitrogen evaporator 57 is sent.
【０００３】[0003]
【発明が解決しようとする課題】空気分離機発生窒素ガ
スの送ガス不能時に流れるバックアップ窒素ガスは液化
窒素蒸発の窒素ガスである。この液化窒素は消費地外の
大型空気精留分離機により製造された液化窒素であり、
鉄鋼、食品、冷却用等、様々な分野に利用されているも
のである。これらの産業に利用する液化窒素では高純度
な窒素ガスを必要とせず、不純物濃度は１００〜１，０
００ＰＰＢ程度のレベルのものである。The backup nitrogen gas flowing when the supply of nitrogen gas generated by the air separator is not possible is the nitrogen gas from liquefied nitrogen evaporation. This liquefied nitrogen is liquefied nitrogen produced by a large air rectification separator outside the consumption area,
It is used in various fields such as steel, food, and cooling. Liquid nitrogen used in these industries does not require high-purity nitrogen gas and has an impurity concentration of 100 to 1,0.
The level is about 00PPB.
【０００４】一方、半導体・液晶の製造に用いられる窒
素は高純度のものが必要とされ、これに対応するべく専
用の前処理装置、不純物除去装置、精留塔を備えた空気
精留分離機を半導体・液晶窒素消費地内に設置、これに
より高純度の窒素ガスを発生、送ガスしている。不純物
濃度は数ＰＰＢ〜１００ＰＰＢ程度のものである。On the other hand, nitrogen used in the production of semiconductors and liquid crystals needs to be of high purity, and in order to meet this, an air rectification separator equipped with a dedicated pretreatment device, impurity removal device, and rectification tower. Is installed in a semiconductor / liquid crystal nitrogen consuming area, which generates and sends high-purity nitrogen gas. The impurity concentration is about several PPB to about 100 PPB.
【０００５】しかしながら、この消費地内に設置した空
気精留分離機よりの窒素ガスの供給が不能となった場合
にはバックアップガスとして他産業も利用する大型空気
精留分離機により発生した液化窒素を利用せざるを得
ず、その場合、窒素ガスの純度が低下するという問題点
があった。従来では、上記問題を解決すべく、図８に示
すように窒素ガス精製装置６１をガスの供給系に設置
し、上記純度の平準化をはかっていた。具体的には、図
８（ａ）に示すように純度の劣るバックアップ窒素のみ
を精製装置にて精製高純度化を図る場合と、図８（ｂ）
に示すように窒素ガス全てを精製する場合と、図８
（ｃ）に示すように窒素ガス消費ポイントで必要な部分
のガスのみ精製装置にて精製する場合とがある。かかる
場合、窒素ガスは半導体・液晶製造に大量に使用するこ
とから、精製装置は大型化し、コスト・設置スペースの
点で負担は大きく、かつ精製装置自身からの不純物発生
の可能性もあるという問題点もある。[0005] However, if the supply of nitrogen gas from the air rectifier installed in the consuming area becomes impossible, liquefied nitrogen generated by a large air rectifier used by other industries is used as a backup gas. In this case, there is a problem that the purity of nitrogen gas is reduced. Conventionally, in order to solve the above problem, as shown in FIG. 8, a nitrogen gas purifying device 61 is installed in a gas supply system to level the purity. Specifically, as shown in FIG. 8 (a), only the backup nitrogen having a low purity is purified by a purifier to achieve high purity, and FIG. 8 (b)
FIG. 8 shows the case where all the nitrogen gas is purified as shown in FIG.
As shown in (c), only a necessary portion of the gas at the nitrogen gas consumption point may be purified by the purifier. In such a case, since nitrogen gas is used in large quantities in the manufacture of semiconductors and liquid crystals, the purification apparatus becomes large, the burden is large in terms of cost and installation space, and there is a possibility that impurities may be generated from the purification apparatus itself. There are points.
【０００６】本発明の課題は、上記問題点を解消し、窒
素ガスの純度を低下させることなく、バックアップ窒素
ガスを供給する方法を提供することである。An object of the present invention is to solve the above problems and to provide a method for supplying a backup nitrogen gas without lowering the purity of the nitrogen gas.
【０００７】[0007]
【課題を解決するための手段】本発明によれば、通常緊
急作動弁を介して窒素分と酸素分からなる高純度の空気
を供給する小型の空気精留分離機と、該空気精留分離機
が空気供給不能の場合に、液化窒素を蒸発気化し、バッ
クアップ窒素ガスとして供給する液化窒素タンク及び液
化窒素蒸発機とから構成される窒素ガス供給システムに
おいて、前記空気精留分離機からの空気が供給不能の場
合に、前記バックアップ窒素ガスをバックアップ用緊急
作動弁を介して精留塔の塔底部に導いて精留することを
特徴とする窒素ガス供給システムが得られる。According to the present invention, a small-sized air rectification separator for supplying high-purity air consisting of nitrogen content and oxygen content, usually via an emergency operation valve, and the air rectification separation machine. In the case where the air cannot be supplied, the nitrogen gas supply system comprising a liquefied nitrogen tank and a liquefied nitrogen evaporator that evaporate and liquefy the liquefied nitrogen and supply it as backup nitrogen gas, and the air from the air rectification separator is A nitrogen gas supply system is provided in which, when the supply is impossible, the backup nitrogen gas is guided to the bottom of the rectification column for rectification through a backup emergency operation valve.
【０００８】又、本発明によれば、通常緊急作動弁を介
して窒素分と酸素分からなる高純度の空気を供給する小
型の空気精留分離機と、該空気精留分離機が空気供給不
能の場合に液化窒素を蒸発気化し、バックアップ窒素ガ
スとして供給する液化窒素タンクとから構成される窒素
ガス供給システムにおいて、前記空気精留分離機からの
空気が供給不能の場合に、前記バックアップ窒素ガスを
液化の状態でバックアップ用緊急作動弁を介して精留塔
の精留棚に導いて精留することを特徴とする窒素ガス供
給システムが得られる。Further, according to the present invention, a small-sized air rectification separator for supplying high-purity air consisting of nitrogen and oxygen through an emergency operation valve, and the air rectification separator cannot supply air. In the case of, a nitrogen gas supply system comprising a liquefied nitrogen tank which evaporates liquefied nitrogen and supplies it as a backup nitrogen gas, in the case where the air from the air rectification separator cannot be supplied, the backup nitrogen gas A nitrogen gas supply system is obtained which is characterized in that it is liquefied and guided to a rectification shelf of a rectification tower through a backup emergency operation valve for rectification.
【０００９】さらに、本発明によれば、前記通常緊急作
動弁及び前記バックアップ用緊急作動弁には制御装置が
電気的に接続され、該制御装置は、通常は前記空気精留
分離機側からの高純度の空気を選択し、前記通常緊急作
動弁を動作させて前記空気を前記精留塔に導入し、前記
空気精留分離機からの空気が供給不能と判断した場合に
は、前記バックアップ窒素ガスを選択して、前記バック
アップ用緊急作動弁を動作させ前記バックアップ窒素ガ
スを前記精留塔に導入することを特徴とする窒素ガス供
給システムが得られる。Further, according to the present invention, a control device is electrically connected to the normal emergency operation valve and the backup emergency operation valve, and the control device is normally connected from the air rectification separator side. When high-purity air is selected, the normal emergency operation valve is operated to introduce the air into the rectification column, and when it is judged that the air from the air rectification separator cannot be supplied, the backup nitrogen A nitrogen gas supply system is obtained in which a gas is selected, the backup emergency operation valve is operated, and the backup nitrogen gas is introduced into the rectification column.
【００１０】[0010]
【発明の実施の形態】次に本発明の実施の形態について
図面を参照して説明する。図１は本発明の第１の実施の
形態を示した図である。空気精留分離機は前処理装置１
１、空気圧縮機１２、空気冷却機１３、不純物除去装置
１４、精留塔１５により構成される。前処理装置１１で
は空気中の塵埃を除去すると共に精留分離に困難なＣ
Ｏ、Ｈ2を触媒酸化しＣＯ2 、Ｈ2 Ｏと変化させる。次
に空気圧縮機１２にて送ガス圧プラス機器内圧力損失分
圧力に昇圧、空気冷却機１３にて圧縮により高温となっ
た空気を冷却する。不純物除去装置１４では原料空気中
のＣＯ2 、Ｈ2 Ｏ、炭化水素等不純物が除去され、窒素
分、酸素分のみとなった空気（以下、送ガスと呼ぶ。）
が熱交換の後、精留塔１５に導入される。精留塔１５は
図２に示す構造となっており、送ガスは塔底部２１より
導入、精留棚２２毎に順に精留が行われ窒素純度が高ま
り、塔頂部１３では数〜１００ＰＰＢ程度の不順物濃度
の高純度な窒素が得られる。Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is a diagram showing a first embodiment of the present invention. Air rectification separator is pretreatment device 1
1, an air compressor 12, an air cooler 13, an impurity removing device 14, and a rectification column 15. The pre-treatment device 11 removes dust in the air and removes C
O and H 2 are catalytically oxidized and changed into CO 2 and H 2 O. Next, the air compressor 12 raises the pressure to the gas sending pressure plus the pressure loss in the device, and the air cooler 13 cools the air that has become hot due to compression. The impurity removing device 14 removes impurities such as CO 2 , H 2 O, and hydrocarbons from the raw material air, leaving air containing only nitrogen and oxygen (hereinafter referred to as “gas feed”).
Is introduced into the rectification column 15 after heat exchange. The rectification tower 15 has the structure shown in FIG. 2, and the gas sent is introduced from the tower bottom 21 and rectification is performed in each rectification shelf 22 to increase the nitrogen purity. High-purity nitrogen with an irregular concentration is obtained.
【００１１】この状況において、図３に示される窒素−
酸素二元系状態図によれば、気体の状態で塔底部２１
に導入された送ガスは気体・液体混合状態を経て液化さ
れる（参照）。精留棚２２の液化空気表面からは窒素
濃度の上昇した液化空気が蒸発気化する（参照）。こ
の繰り返しにより塔頂部２３からは高純度の窒素が得ら
れる。In this situation, the nitrogen-
According to the oxygen binary system diagram, the bottom 21
The gas introduced into the chamber is liquefied through a gas / liquid mixed state (see). The liquefied air having the increased nitrogen concentration evaporates and vaporizes from the liquefied air surface of the rectification shelf 22 (see). By this repetition, high-purity nitrogen is obtained from the top 23.
【００１２】一方、空気精留分離機が送ガス供給不能な
際に備え、液化窒素タンク１６と液化窒素蒸発器１７が
バックアップ機器として設置されている。液化窒素は外
部の大型空気精留分離機により製造された一般的な純度
のものである。液化窒素蒸発の窒素ガス配管は精留塔１
５の塔底部２１に導かれる空気配管に接続される。空気
配管、窒素ガス配管にはそれぞれ通常緊急作動弁１８、
バックアップ用緊急作動弁１８′が設けられている。通
常緊急作動弁１８とバックアップ用緊急作動弁１８′は
空気精留分離機全体の状態を監視する制御装置１９に電
気的に接続されている。制御装置１９からの信号により
精留塔１５に導入するガスが選択され、それに対応して
通常緊急作動弁１８又はバックアップ用緊急作動弁１
８′を動作させる。On the other hand, a liquefied nitrogen tank 16 and a liquefied nitrogen evaporator 17 are provided as backup equipment in case the air rectifying and separating apparatus cannot supply gas. Liquefied nitrogen is of general purity produced by an external large air rectifier. Nitrogen gas piping for liquefied nitrogen evaporation is rectification tower 1
5 is connected to an air pipe led to the bottom 21 of the tower. Air piping and nitrogen gas piping are usually equipped with emergency operation valves 18,
A backup emergency operation valve 18 'is provided. The normal emergency operation valve 18 and the backup emergency operation valve 18 'are electrically connected to a control device 19 for monitoring the state of the entire air rectifying and separating apparatus. The gas to be introduced into the rectification tower 15 is selected by a signal from the control device 19, and the normal emergency operation valve 18 or the backup emergency operation valve 1 is correspondingly selected.
Operate 8 '.
【００１３】停電もしくは機器のトラブルにより空気精
留分離機からの送ガスの供給が不能と判断された場合に
は制御装置１９によりバックアップ用緊急作動弁１８′
が動作し、空気の精留塔１５への導入を遮断、バックア
ップ用窒素ガスが精留塔１５に導かれる。精留塔１５に
入ったバックアップ窒素ガスは図３中ｘ点から精留が開
始され、塔頂部２３に至る間、空気精留分離機からの送
ガスの場合と同様に純化される。純化されたバックアッ
プ窒素ガスは空気精留分離機から発生する送ガスが精留
塔１５を通って純化された窒素ガスと同純度のものとな
る。When it is determined that the supply of gas from the air rectifying separator is impossible due to a power failure or equipment trouble, the controller 19 controls the backup emergency operating valve 18 '.
Operates to shut off the introduction of air into the rectification tower 15, and the backup nitrogen gas is guided to the rectification tower 15. The rectification of the backup nitrogen gas that has entered the rectification tower 15 starts at the point x in FIG. 3 and is purified while reaching the tower top 23 as in the case of the gas sent from the air rectification separator. The purified backup nitrogen gas has the same purity as that of the purified nitrogen gas when the gas sent from the air rectification separator passes through the rectification column 15.
【００１４】空気精留分離機からの送ガスの供給不能
は、機器の不調・故障、停電によるが、精留塔は他の構
成機器と異なり、機械的駆動部分を持たず、電力も必要
としないため、信頼性は非常に高く、トラブルフリーと
いってよい。従って、精留塔の利用はいかなる場合でも
可能である。The inability to supply gas from the air rectification separator is due to equipment malfunction, failure, or power failure. However, unlike other components, the rectification tower does not have a mechanically driven part and requires power. Therefore, the reliability is very high and it can be said that it is trouble-free. Therefore, the rectification column can be used in any case.
【００１５】図４は本発明の第２の実施の形態を示した
図であり、図５は図４の精留塔３５の構造を示した図で
ある。又、図６は図４における窒素−酸素二元系状態図
である。本実施の形態ではバックアップ窒素ガスをバッ
クアップ用緊急作動弁３８´を介して真空断熱配管を用
いて液体の状態で精留塔３５に導入している。その他の
点においては、上記した第１の実施の形態と同じである
ので説明を省略する。尚、バックアップ窒素ガスの精留
開始点はｋ点（図５、図６参照）である。又、液体の状
態で導入することのメリットは液化窒素蒸発器を不要に
できる点である。FIG. 4 is a view showing a second embodiment of the present invention, and FIG. 5 is a view showing the structure of the rectification column 35 of FIG. FIG. 6 is a nitrogen-oxygen binary system diagram in FIG. In the present embodiment, the backup nitrogen gas is introduced into the rectification tower 35 in a liquid state using a vacuum insulated pipe via the backup emergency operation valve 38 '. Since the other points are the same as those in the above-described first embodiment, description thereof will be omitted. The rectification start point of the backup nitrogen gas is point k (see FIGS. 5 and 6). The advantage of introducing the liquid state is that the liquefied nitrogen evaporator can be dispensed with.
【００１６】[0016]
【発明の効果】以上説明したように本発明によれば、空
気精留分離機からの送ガス供給不能時に供給するバック
アップ窒素ガスを、汚染危険や大幅なコストアップをす
ることなしに空気精留分離機から発生する送ガスが精留
塔１５を通って純化された窒素ガスと同じ純度として供
給することが可能である。As described above, according to the present invention, the backup nitrogen gas supplied when the supply of gas from the air rectifying separator is not possible can be rectified by the air rectifying method without the risk of contamination and the cost increase. The gas sent from the separator can be supplied through the rectification column 15 with the same purity as the purified nitrogen gas.
【図１】本発明の第１の実施の形態を示した図である。FIG. 1 is a diagram showing a first embodiment of the present invention.
【図２】図１の精留塔の縦断面図である。FIG. 2 is a longitudinal sectional view of the rectification column of FIG.
【図３】図１における窒素−酸素二元系状態図である。FIG. 3 is a phase diagram of the nitrogen-oxygen binary system in FIG.
【図４】本発明の第２の実施の形態を示した図である。FIG. 4 is a diagram showing a second embodiment of the present invention.
【図５】図４の精留塔の縦断面図である。FIG. 5 is a vertical sectional view of the rectification column of FIG.
【図６】図４における窒素−酸素二元系状態図である。FIG. 6 is a nitrogen-oxygen binary system phase diagram in FIG. 4;
【図７】従来の窒素ガスの供給方法を示す図である。FIG. 7 is a view showing a conventional nitrogen gas supply method.
【図８】窒素ガス精製装置の設置状況を示す図である。FIG. 8 is a diagram showing an installation state of a nitrogen gas purification device.
１１ 前処理装置 １２ 空気圧縮機 １３ 空気冷却機 １４ 不純物除去装置 １５，３５ 精留塔 １６ 液化窒素タンク １７ 液化窒素蒸発器 １８，３８ 通常緊急作動弁 １８′，３８′ バックアップ用緊急作動弁 １９ 制御装置 ２１，４１ 塔底部 ２２，４２ 精留棚 ２３，４３ 塔頂部 11 Pretreatment device 12 Air compressor 13 Air cooler 14 Impurity remover 15,35 Fractionation tower 16 Liquefied nitrogen tank 17 Liquefied nitrogen evaporator 18,38 Normal emergency operation valve 18 ', 38' Backup emergency operation valve 19 Control Equipment 21,41 Tower bottom 22,42 Fractionation shelf 23,43 Tower top
Claims (3)
からなる高純度の空気を供給する小型の空気精留分離機
と、該空気精留分離機が空気供給不能の場合に、液化窒
素を蒸発気化し、バックアップ窒素ガスとして供給する
液化窒素タンク及び液化窒素蒸発機とから構成される窒
素ガス供給システムにおいて、前記空気精留分離機から
の空気が供給不能の場合に、前記バックアップ窒素ガス
をバックアップ用緊急作動弁を介して精留塔の塔底部に
導いて精留することを特徴とする窒素ガス供給システ
ム。1. A small air rectification separator for supplying high-purity air consisting of nitrogen and oxygen through a normal emergency operation valve, and liquefied nitrogen when the air rectification separator cannot supply air. In a nitrogen gas supply system consisting of a liquefied nitrogen tank for evaporating and liquefying as a backup nitrogen gas and a liquefied nitrogen evaporator, the backup nitrogen gas is supplied when the air from the air rectification separator cannot be supplied. Is introduced into the bottom of the rectification column through a backup emergency operation valve for rectification.
からなる高純度の空気を供給する小型の空気精留分離機
と、該空気精留分離機が空気供給不能の場合に液化窒素
を蒸発気化し、バックアップ窒素ガスとして供給する液
化窒素タンクとから構成される窒素ガス供給システムに
おいて、前記空気精留分離機からの空気が供給不能の場
合に、前記バックアップ窒素ガスを液化の状態でバック
アップ用緊急作動弁を介して精留塔の精留棚に導いて精
留することを特徴とする窒素ガス供給システム。2. A small air rectification separator for supplying high-purity air composed of nitrogen and oxygen through a normal emergency operation valve, and liquefied nitrogen when the air rectification separator cannot supply air. In a nitrogen gas supply system comprising a liquefied nitrogen tank which is vaporized and supplied as backup nitrogen gas, when the air from the air rectification separator cannot be supplied, the backup nitrogen gas is backed up in a liquefied state. Nitrogen gas supply system characterized by guiding to a rectification shelf of a rectification tower through an emergency operation valve for rectification.
プ用緊急作動弁には制御装置が電気的に接続され、該制
御装置は、通常は前記空気精留分離機側からの高純度の
空気を選択し、前記通常緊急作動弁を動作させて前記空
気を前記精留塔に導入し、前記空気精留分離機からの空
気が供給不能と判断した場合には、前記バックアップ窒
素ガスを選択して、前記バックアップ用緊急作動弁を動
作させ前記バックアップ窒素ガスを前記精留塔に導入す
ることを特徴とする請求項１又は２記載の窒素ガス供給
システム。3. A control device is electrically connected to the normal emergency operation valve and the backup emergency operation valve, and the control device normally selects high-purity air from the air rectification separator side. Then, by operating the normal emergency operation valve to introduce the air into the rectification column, when it is determined that the air from the air rectification separator cannot be supplied, select the backup nitrogen gas, The nitrogen gas supply system according to claim 1 or 2, wherein the backup emergency operation valve is operated to introduce the backup nitrogen gas into the rectification column.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7327672A JP2836674B2 (en) | 1995-12-15 | 1995-12-15 | Nitrogen gas supply system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7327672A JP2836674B2 (en) | 1995-12-15 | 1995-12-15 | Nitrogen gas supply system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09166300A true JPH09166300A (en) | 1997-06-24 |
| JP2836674B2 JP2836674B2 (en) | 1998-12-14 |
Family
ID=18201692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7327672A Expired - Fee Related JP2836674B2 (en) | 1995-12-15 | 1995-12-15 | Nitrogen gas supply system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2836674B2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60142184A (en) * | 1983-12-28 | 1985-07-27 | 日本酸素株式会社 | Method of liquefying and separating air |
| JPH0771698A (en) * | 1993-07-08 | 1995-03-17 | L'air Liquide | High-pressure gas supply equipment |
-
1995
- 1995-12-15 JP JP7327672A patent/JP2836674B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60142184A (en) * | 1983-12-28 | 1985-07-27 | 日本酸素株式会社 | Method of liquefying and separating air |
| JPH0771698A (en) * | 1993-07-08 | 1995-03-17 | L'air Liquide | High-pressure gas supply equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2836674B2 (en) | 1998-12-14 |
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