JPH0915601A - Method for reforming substance surface by irradiation of ultraviolet rays and ultraviolet irradiation device - Google Patents

Abstract

PURPOSE: To provide an ultraviolet irradiation device which is inexpensive and whose service life is long by including nearly mutually parallel light beam in plural line images which are perpendicularly projected on a plane perpendicular to a 1st direction and crossing each other. CONSTITUTION: A part of the ultraviolet rays radiated from a straight tube type high voltage mercury lamp 11 is reflected by a cold mirror 12 and irradiates an irradiation surface. The line images obtained by perpendicularly projecting the optical axis of the ultraviolet ray reflected by the cold mirror 12 on the plane perpendicular to a y-axis become nearly parallel as shown by UV1. The ultraviolet ray directly radiated downward in figure from the lamp 11 is shielded by a direct light shielding plate 13. The light radiated obliquely downward in figure from the lamp 11 and leaked from both sides of the shielding plate 13 is shielded by an aperture member 14. Thus, the ultraviolet rays which make the perpendicularly projected images on the plane perpendicular to the y-axis nearly parallel are obtained.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for modifying a surface of a material by irradiating ultraviolet light, and more particularly, to irradiating a linear region of an alignment film of a liquid crystal display panel with ultraviolet light to obtain a pretilt angle of the ultraviolet light irradiation region. The present invention relates to a technique for modifying the surface of a substance by irradiating ultraviolet light, which is suitable for a method of controlling the temperature.

[0002]

2. Description of the Related Art As a technique for improving the viewing angle characteristics of a liquid crystal display panel, a technique for forming at least two regions having different pretilt directions within one pixel is known. Conventionally, in order to form regions having different pretilt directions, a method of forming an alignment film having a different pretilt angle for each region has been used. In recent years, instead of the method of forming a plurality of alignment films, a method of controlling the pretilt angle by modifying the surface of the alignment film by irradiation with ultraviolet light has been considered.

It is known that when the alignment film surface is irradiated with ultraviolet light, the surface energy increases and the pretilt angle decreases. Therefore, by providing an ultraviolet light irradiation region and a non-irradiation region within one pixel, regions having different pretilt angles can be formed.

FIG. 9 shows a schematic view of a conventional ultraviolet light irradiation apparatus. The ultraviolet rays emitted from the high-pressure mercury lamp 100 are reflected by the parabolic cold mirror 101 and condensed. An integrator 102 is arranged at the condensing point. The ultraviolet light transmitted through the integrator 102 is reflected by the mirror 103 and collimated by the collimator 104. The collimated ultraviolet light passes through the mask 105 and the object 10 to be processed.
6 is irradiated.

The mask 105 is provided with a region that transmits ultraviolet light and a region that blocks ultraviolet light. Since the collimated ultraviolet light irradiates the processing object 106 through the mask 105, the mask 10 on the surface of the processing object 106 is masked.
Only the area corresponding to the ultraviolet light transmitting area 5 is irradiated with the ultraviolet light. In this way, the surface can be modified by irradiating only desired regions with ultraviolet light.

[0006]

The conventional ultraviolet light irradiation apparatus shown in FIG. 9 uses a point light source in order to obtain ultraviolet light with high parallelism. In order to convert the ultraviolet light emitted from the point light source into collimated light having a uniform intensity distribution on the irradiation surface, a parabolic cold mirror 101 and an integrator 10 are provided.
2. Optical components such as the collimator 104 are required. An optical component that handles short-wavelength ultraviolet light having a wavelength of 256 nm or less is more expensive than an optical component for i-, h-, and g-rays used in ordinary photolithography.

Further, since the irradiated ultraviolet light has a high degree of parallelism, when dust adheres to the mask surface, a shadow of dust is formed on the surface of the object to be treated. Since the surface modification is not performed on the shaded area, the display characteristics of the liquid crystal display panel are deteriorated.

An object of the present invention is to provide an ultraviolet light irradiation apparatus and irradiation method which are relatively inexpensive. Another object of the present invention is to provide an ultraviolet light irradiation device and an irradiation method that are not easily affected by dust attached to a mask.

[0009]

SUMMARY OF THE INVENTION According to one aspect of the invention, at least one substance of a material having a surface that is modified by ultraviolet light extends in a direction parallel to the first direction of the surface. In a linear region, which is ultraviolet light including a plurality of light rays with different directions, a plurality of line images obtained by vertically projecting the plurality of light rays onto a plane parallel to the first direction intersect with each other, and A substance including an ultraviolet irradiation step of modifying the surface by irradiating the ultraviolet light in which a plurality of line images obtained by vertically projecting a plurality of light rays on a plane perpendicular to the first direction are substantially parallel to each other. A surface modification method is provided.

According to another aspect of the present invention, before the step of irradiating with the ultraviolet light, the light-shielding region and the transmitting region are further provided with the first region.
There is provided a method for modifying the surface of a material, which comprises the step of disposing a photomask formed in a line-and-space pattern parallel to the above direction on the surface.

According to another aspect of the present invention, in the step of irradiating the ultraviolet light, the ultraviolet light is applied to a region corresponding to the transmission region in an irradiation region which is long in one direction along the first direction of the surface. In the step of irradiating and in the surface, the first
And a step of moving the irradiation region in a second direction that intersects with the direction.

According to another aspect of the present invention, on the surface of the object to be treated having a surface modified by ultraviolet light,
Including a step of disposing a photomask in which light-shielding areas and transmissive areas are formed in a line-and-space pattern, and a linear ultraviolet lamp arranged in parallel to a length direction of each line of the line-and-space pattern A method of modifying the surface of a material is provided, which comprises irradiating the surface with ultraviolet light from a light source through the photomask.

According to another aspect of the present invention, a plurality of line images which include a plurality of light rays having different directions, and which are obtained by vertically projecting the plurality of light rays onto a plane parallel to the first direction intersect with each other, A process having a light source for emitting ultraviolet light in which a plurality of line images obtained by vertically projecting light rays onto a plane perpendicular to the first direction are substantially parallel to each other, and a surface to be irradiated with the ultraviolet light emitted from the light source. A mounting table for mounting an object, so that the distance between the light source and the surface of the processing object does not change,
There is provided an ultraviolet light irradiation device having a moving unit that changes a relative position between the light source and the mounting table in a direction intersecting with the first direction.

[0014]

The plurality of line images vertically projected on the plane parallel to the first direction intersect with each other, and the plurality of line images vertically projected on the plane perpendicular to the first direction are substantially parallel to each other. Ultraviolet light including light rays can be generated from a linear ultraviolet light source. A linear ultraviolet light source is cheaper and has a longer life than a point light source. Therefore, an inexpensive and long-life ultraviolet light irradiation device can be obtained.

The ultraviolet light generated from such a linear light source has a long irradiation area in the first direction on the surface of the object to be treated. By moving the surface of the object to be processed and the light source relatively,
By moving the irradiation area in the direction intersecting the first direction, it is possible to irradiate a wide area on the surface of the processing object.

When this ultraviolet light is irradiated through a photomask having a line and space pattern parallel to the first direction, a region corresponding to the ultraviolet light transmitting region of the line and space pattern of the mask is irradiated with high positional accuracy. be able to. In a plane parallel to the first direction,
Since ultraviolet light includes various traveling directions, even if dust is attached to the mask surface, it is difficult to form a shadow on the irradiation surface. Therefore, it is possible to prevent the generation of an unirradiated area due to dust.

[0017]

1 is a perspective view schematically showing an ultraviolet light irradiation apparatus according to an embodiment of the present invention. The ultraviolet irradiation device according to the embodiment includes an ultraviolet light source 10, a substrate mounting table 20, and a moving mechanism 3.
0 is included. At the time of irradiation with ultraviolet light, the substrate 40 to be processed is placed on the placement surface of the substrate placing table 20, and the mask 50 is placed thereon.

Consider an xy coordinate having an x-axis in the horizontal direction and a y-axis in the depth direction in the mounting surface of the substrate mounting table 20. The ultraviolet light source 10 is arranged above the mounting table 20. The ultraviolet light source 10 includes a straight-tube high-pressure mercury lamp 11, a cold mirror 12 which is long in the length direction of the high-pressure mercury lamp 11 and has a parabolic cross section perpendicular to the length direction, a direct-light shielding plate 13, and an aperture 14. It is configured. The high pressure mercury lamp 11 is arranged parallel to the y-axis.

The cold mirror 12 has a reflecting surface whose cross section perpendicular to the x axis is linear and whose cross section perpendicular to the y axis is parabolic. The ultraviolet light emitted from the high-pressure mercury lamp 11 is reflected by the cold mirror 12 and is applied to the surface of the processing target substrate 40 on the mounting table 20.

The direct light shielding plate 13 is a high pressure mercury lamp 11
The direct light from is blocked so that the surface of the substrate 40 to be processed is not irradiated with the direct light. The aperture member 14 does not interfere with the optical path of the ultraviolet light reflected by the cold mirror 12,
Only the ultraviolet light leaking from both sides of the direct light shielding plate 13 is blocked.

The substrate 40 to be processed is composed of a glass substrate 41, a transparent electrode 42, and an alignment film 43.
Note that other structures may be used as long as they have a surface that is modified by irradiation with ultraviolet light. The transparent electrode 42 is formed on the surface of the glass substrate 41 and has a stripe pattern with a constant pitch. The alignment film 43 is formed so as to cover the surfaces of the transparent electrode 42 and the glass substrate 41.
The substrate 40 to be processed having the above-described structure is used as the transparent electrode 4
Place 2 in a direction in which the length direction of 2 is parallel to the y-axis.

The mask 50 is composed of a quartz glass substrate 51 that transmits ultraviolet light and a striped chromium mask pattern 52. The region where the mask pattern 52 is formed blocks ultraviolet light, and the other region transmits ultraviolet light. Each line width of the mask pattern 50 is the transparent electrode 4
2 is about half the line width, and the pitch is the same as the pitch of the stripe pattern of the transparent electrodes 42.

The mask 50 thus constructed is arranged on the substrate 40 to be processed at a predetermined interval. At this time, one light-shielding region of the mask 50 and one adjacent to it
The area formed of the transparent area of the book is aligned so as to correspond to the single transparent electrode 42 of the substrate 40 to be processed.

The moving mechanism 30 can reciprocate the mounting table 20 in the x-axis direction. When the mounting table 20 moves,
The target substrate 40 and the mask 50 move in the x-axis direction while maintaining their relative positions. The region illuminated by the ultraviolet light source 10 is a region that is long in the y-axis direction within the mounting surface of the mounting table 20. By moving the mounting table 20 back and forth in the x-axis direction by the moving mechanism 30, it is possible to irradiate the entire surface of the mounting surface with ultraviolet light. Also, by adjusting the moving speed,
It is possible to control the dose. Note that the movement is not limited to the direction parallel to the x-axis, and the movement may be made in another direction intersecting with the y-axis. In addition, the moving mechanism is provided on the light source 10 side,
The light source 10 may be moved with respect to the mounting table 20.

FIG. 2 shows a detailed structure of the ultraviolet light source 10. 2A is a front view of the ultraviolet light source 10 of FIG. 1 viewed from the −y direction and a light intensity distribution in the x-axis direction on the irradiation surface, FIG.
(B) shows a side view seen from the + x direction and a light intensity distribution in the y-axis direction on the irradiation surface.

As shown in FIG. 2 (A), a part of the ultraviolet light emitted from the straight tube type high pressure mercury lamp 11 is reflected by the cold mirror 12 and applied to the irradiation surface. A line image obtained by vertically projecting the optical axis of the ultraviolet light reflected by the cold mirror 12 onto a plane perpendicular to the y-axis becomes substantially parallel as indicated by UV1 in the figure.

The ultraviolet light emitted directly from the high-pressure mercury lamp 11 downward in the figure is blocked by the direct light shield plate 13. Light emitted from the high-pressure mercury lamp 11 obliquely downward in the drawing and leaking from both sides of the direct light shielding plate 13 is used as the aperture member 14.
It is shaded by. In this way, ultraviolet light can be obtained in which the vertical projection image on the plane perpendicular to the y-axis becomes substantially parallel.

The light intensity distribution in the x-axis direction on the irradiation surface is shown in FIG.
As shown in the lower diagram of FIG. The depression in the center corresponds to the shadow of the direct light shielding plate 13. The width of the distribution corresponds to the width of the cold mirror 12 in the x-axis direction.

As shown in FIG. 2 (B), the ultraviolet light emitted from the straight tube type high pressure mercury lamp 11 is cold mirror 1.
It is reflected by 2 and is irradiated on the irradiation surface. The ultraviolet light reaching the irradiation surface includes light having various traveling directions in a plane perpendicular to the x axis. The light intensity distribution in the y-axis direction on the irradiation surface covers a wide range corresponding to the length of the high pressure mercury lamp 11.

Next, ultraviolet light having a high parallelism in a vertical projection image on a plane and a low parallelism in a vertical projection image on a plane orthogonal thereto is passed through a mask having a circular through hole. The light intensity distribution when the light is irradiated on the irradiation surface will be described. For easy understanding, the x-axis and the y-axis are set in the irradiation plane, the vertical projection image on the plane perpendicular to the y-axis has high parallelism, and the vertical projection image on the plane perpendicular to the x-axis is low. An example of ultraviolet light having parallelism will be described.

FIG. 3 shows a schematic cross-sectional view of the mask and the irradiation surface when the irradiation surface 61 is irradiated through the mask 60 having a circular through hole with a diameter d1, and a light intensity distribution on the irradiation surface. FIG. 3 (A) is a light intensity distribution in the x-axis direction, FIG. 3 (B)
Indicates the light intensity distribution in the y-axis direction.

The light intensity distribution is x as shown in FIG.
It is concentrated in a relatively narrow range in the axial direction and dispersed in a relatively wide range in the y-axis direction as shown in FIG. The half value width of the light intensity distribution is d2, the irradiation surface 61 and the mask 6
When the distance from 0 is h, the parallelism θ of the ultraviolet light is expressed as θ = tan ⁻¹ ((d2-d1) / (2 × h)) (1). The case where θ is small is called high parallelism.

As shown in FIG. 3, the irradiation area in the x-axis direction depends on the pattern formed on the mask 60, and the irradiation area in the y-axis direction hardly depends on the pattern formed on the mask 60. Therefore, when only a linear mask pattern parallel to the y-axis is formed on the mask 60, the region corresponding to the mask pattern can be irradiated with ultraviolet light with high positional accuracy.

In FIG. 3A, the case where the light intensity distribution shows a single peak has been described, but when the light intensity distribution shows a double peak as shown in FIG. 2B, one peak is formed. Consider only ultraviolet light. That is, of the ultraviolet light emitted through both sides of the direct light shielding plate 13, the half width is obtained from the light intensity distribution of only the ultraviolet light passing through one side.

FIG. 4 illustrates the influence of dust when irradiating collimated ultraviolet light and when irradiating by using the ultraviolet light irradiation device of FIG. 4A and FIG.
2B is a cross-sectional view of the mask and the substrate to be processed when irradiating the collimated ultraviolet light and when irradiating by using the ultraviolet light irradiation device of FIG. FIG.
(B) shows a cross section perpendicular to the x-axis in FIG. 1. The transparent electrode 42 and the alignment film 43 are formed on the glass substrate 41. A mask 51 is arranged above the alignment film 43. The dust 70 is attached on the surface of the mask 51, and the dust 71 is attached on the surface of the alignment film 43.

As shown in FIG. 4A, when the collimated ultraviolet light is irradiated, dusts 70 and 71 are shadowed on the surface of the alignment film 43. Since the shaded area is not modified, it is not possible to impart desired alignment characteristics to the alignment film 43.

As shown in FIG. 4B, when the ultraviolet light irradiating device shown in FIG. 2 is used for irradiation, since the ultraviolet light propagating in various directions is included, dust 70 is left on the mask 51. Even if it exists, the shadow of the dust 70 cannot be formed on the surface of the alignment film 43. Therefore, if the size of the dust 70 is such that the shadow does not form a shadow on the alignment film 43, it is possible to prevent the generation of the unmodified region due to the dust attached to the mask 51.

If dust 71 is present on the alignment film 43, an unirradiated region remains due to the dust 71, but the size of the unirradiated region is shown in FIG. It is smaller than the case. Therefore, the influence of the dust 71 attached to the surface of the alignment film 43 can be reduced.

The high pressure mercury lamp used in the ultraviolet light irradiation apparatus shown in FIG. 1 has a length of 60 cm and an output of 160 W / cm. A medium pressure mercury lamp may be used. In general, straight tube mercury lamps are cheaper, have a longer life, and
And high output. Further, as shown in FIG. 9, since it is not necessary to use an integrator for making the in-plane intensity distribution of collimated ultraviolet light uniform, it is possible to reduce the number of optical components. Further, since the optical path length from the light source to the irradiation surface can be shortened, the absorption of ultraviolet light by the atmosphere is reduced and the energy efficiency can be improved.

Next, an example in which the ultraviolet light irradiation apparatus of FIG. 1 is applied to the modification of a polyamic acid type alignment film (SE7792 manufactured by Nissan Kagaku) will be described. FIG. 5 shows the relationship between the irradiation amount of ultraviolet light on the alignment film and the pretilt angle applied to the alignment film. The horizontal axis represents the ultraviolet light irradiation amount in the unit of mJ / cm ² , and the vertical axis represents the pretilt angle in the unit of "degree". It has a pretilt angle of about 5.5 degrees when it is not irradiated with ultraviolet light. Irradiation with ultraviolet light reduces the pretilt angle. About 10 light
Irradiation with 00 mJ / cm ² of ultraviolet light reduces the pretilt angle to about 1 degree. When the ultraviolet light having a light amount of about 2000 mJ / cm ² or more is irradiated, the pretilt angle becomes 0.4 degrees or less. The reason why the pretilt angle is decreased is that the surface energy of the alignment film is increased by the irradiation of ultraviolet light.

FIG. 6 shows a cross-sectional view of a liquid crystal display panel which is partially irradiated with ultraviolet light for orientation division. A lower substrate composed of the glass substrate 41A, the transparent electrode 42A and the alignment film 43A and an upper substrate composed of the glass substrate 41B, the transparent electrode 42B and the alignment film 43B are arranged so that the alignment film surfaces face each other, and the liquid crystal layer is interposed therebetween. 44 are formed.

The transparent electrodes 42A and 42B have stripe-like shapes that are long in the direction perpendicular to the plane of the drawing and in the lateral direction of the drawing, respectively. The intersection of one transparent electrode 42A and 42B constitutes one pixel A. FIG. 6 shows two pixels. In the area A1 on the left half of each pixel A in the figure,
The alignment film 43A is irradiated with ultraviolet light, and the right half region A2 in the figure is irradiated.
In, the alignment film 43B is irradiated with ultraviolet light.

On the side of the alignment film 43A, the pretilt angle is small in the area A1 and is large in the area A2. On the other hand, on the alignment film 43B side, the pretilt angle is large in the region A1 and is small in the region A2. The pretilt direction is such that the orientation films 43A and 43B cancel each other.

In the area A1, the pretilt on the alignment film 43B side is predominant, and in the area A2, the alignment film 4B.
The pretilt on the 3A side is dominant. Therefore, when a voltage is applied between the upper and lower transparent electrodes, the liquid crystal molecules rise in the pretilt-predominant direction in each of the regions A1 and A2. Therefore, two regions in which liquid crystal molecules stand in mutually different directions can be formed in one pixel.

In order to stabilize the rising direction of the liquid crystal in each area, the pretilt angle of the ultraviolet light irradiation area is set to 1
It is preferable that the temperature is not more than the degree. In order to reduce the pretilt angle to 1 degree or less, from FIG.
It is understood that it is preferable to set it to be / cm ² or more. In consideration of process variations, 3000 mJ /
More preferably, it is at least cm ² .

Next, the parallelism of the ultraviolet light used in this embodiment will be described with reference to FIG. FIG. 7 shows the mask 50.
The width of the linear ultraviolet light transmitting region formed on the
m shows the irradiation amount of ultraviolet light on the surface of the alignment film when the distance between the alignment film 43 and the mask 50 is 100 μm. In addition, in FIG. 1, the mounting table 20 is moved in the x-axis direction, and the irradiation amount in the region on the alignment film corresponding to the center of the ultraviolet light transmitting region is 4 times.
It was set to 000 mJ / cm ² .

When the alignment film is irradiated with ultraviolet light, the hardness of the alignment film is lowered, and the rubbing treatment causes scratches on the surface of the alignment film. When a rubbing treatment was performed by irradiating with ultraviolet light under the above conditions, the line width of the scratched region was about 164 μm. Other experiments have revealed that the surface of the alignment film is damaged when the rubbing treatment is performed by irradiating the ultraviolet light with 3000 mJ / cm ² or more. From this, 3000 mJ /
The line width of the area irradiated with a light amount of cm ² or more is about 164μ
m.

From this, the line width of the region irradiated with the light amount of 2000 mJ / cm ² or more is about 178 to 185 μm.
It can be estimated to be the degree. This corresponds to a parallelism θ of 8 to 10 degrees shown in the equation (1) described in FIG. That is, it is considered that the ultraviolet light used in the examples satisfies the condition of (d2-d1) / (2 × h) ≦ 0.14 to 0.18 (2).

In order to secure sufficient positional accuracy of the irradiation area in the x-axis direction of FIG. 1, the irradiation ultraviolet light has a condition of (d2-d1) / (2 × h) ≦ 0.2 (3). It is preferable to satisfy In order to increase the parallelism of the vertical projection image on the plane perpendicular to the y-axis, it is preferable to make the diameter of the high pressure mercury lamp 11 as small as possible.

In the above embodiment, the case of manufacturing a simple matrix type liquid crystal display panel has been described as an example.
It will be apparent to those skilled in the art that the method can be applied to the production of an FT type liquid crystal display panel. In addition, the above-described embodiment is not limited to modification of the alignment film of the liquid crystal display panel, but is generally applicable to the case where the surface is modified by irradiating only a linear region long in one direction with ultraviolet light.

Next, another embodiment of the present invention will be described with reference to FIG. FIG. 8 shows a configuration example of an ultraviolet light irradiation device according to another embodiment. The ultraviolet light emitted from the straight tube high-pressure mercury lamp 80 is reflected by the concave mirror 81 and enters the cylindrical lens 82. The cylindrical lens 82 collimates in one direction so that the vertical projection image on the plane parallel to the paper surface of the optical axis of the ultraviolet light becomes substantially parallel. The collimated ultraviolet light is applied to the surface of the processing target substrate 84 through the slit-shaped opening formed in the light shielding plate 83. The slit-shaped opening of the light shielding plate 83 can be opened and closed by a shutter mechanism.

Since the ultraviolet light transmitted through the lens 82 has a high degree of parallelism in the plane parallel to the paper surface, the irradiation area on the surface of the substrate 84 to be processed has a width almost the same as the slit of the light shielding plate 83. Therefore, by moving the processing target substrate 84 in the lateral direction of the drawing while opening and closing the slit of the light shielding plate 83, it is possible to irradiate the stripe-shaped region with ultraviolet light.

According to the embodiment shown in FIG. 8, it is possible to irradiate a desired stripe-shaped region with ultraviolet light without disposing a mask above the object to be processed. Although the present invention has been described with reference to the embodiments, the present invention is not limited thereto. For example, it will be apparent to those skilled in the art that various modifications, improvements, combinations, and the like can be made.

[0054]

As described above, according to the present invention,
Since a straight-tube type mercury lamp can be used and the number of optical components can be reduced, it is possible to provide a relatively low-cost ultraviolet light irradiation device and irradiation method.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an outline of an ultraviolet light irradiation apparatus according to an embodiment of the present invention.

FIG. 2 is a front view, a side view, and a graph showing a light intensity distribution on an irradiation surface of an ultraviolet light source of the ultraviolet light irradiation device of FIG.

FIG. 3 is a cross-sectional view of a mask and an irradiation surface, and a graph showing a light intensity distribution, for explaining the concept of parallelism.

FIG. 4 is a cross-sectional view of a mask and a substrate to be processed for explaining the influence of dust attached on the mask and the alignment film.

FIG. 5 is a graph showing the relationship between the ultraviolet light irradiation amount and the pretilt angle when the alignment film is irradiated with ultraviolet light.

FIG. 6 is a cross-sectional view of a liquid crystal display panel in which alignment division is performed.

FIG. 7 is a cross-sectional view of a mask and an alignment film, and a graph showing an irradiation amount of ultraviolet light, for explaining the parallelism of ultraviolet light used in an example.

FIG. 8 is a perspective view showing an outline of an ultraviolet light irradiation apparatus according to another embodiment of the present invention.

FIG. 9 is a perspective view showing an outline of an ultraviolet light irradiation device according to a conventional example.

[Explanation of symbols]

 10 Ultraviolet Light Source 11, 80 Straight Tube High Pressure Mercury Lamp 12 Parabolic Cold Mirror 13 Direct Light Shielding Plate 14 Aperture Member 20 Substrate Placement Table 30 Moving Mechanism 40 Processing Target Substrate 41 Glass Substrate 42 Transparent Electrode 43 Alignment Film 50 Mask 51 Glass Substrate 52 Mask pattern 60 Mask 61 Irradiated surface 70, 71 Dust 81 Concave mirror 82 Lens 83 Light-shielding plate 84 Processing target substrate

Front page continued (72) Inventor Shun Tsuki 1015 Kamiodanaka, Nakahara-ku, Kawasaki-shi, Kanagawa, within Fujitsu Limited

Claims (6)

[Claims] 1. A plurality of light rays having different directions in at least one linear region extending in a direction parallel to a first direction of the surface of a substance having a surface modified by ultraviolet light. Ultraviolet light including the plurality of light rays,
A plurality of line images vertically projected on a plane parallel to the direction of, intersect with each other, and a plurality of line images vertically projected on the plane perpendicular to the first direction are substantially parallel to each other. A method for modifying a surface of a substance, which comprises the step of irradiating the surface with the ultraviolet light to modify the surface. 2. A light shielding plate having circular transmissive areas having a diameter d1 is arranged on the irradiation surface such that the parallelism of the ultraviolet light is separated by a distance h, and the irradiation surface is covered with the light shielding plate through the light shielding plate. When the half value width of the light intensity distribution on the irradiation surface in the direction perpendicular to the first direction is d2 under the condition of irradiating with ultraviolet light, (d2-d1) / (2 × h ) ≦ 0.2, The method for modifying the surface of a substance according to claim 1. 3. A photomask having a light-shielding region and a light-transmitting region formed in a line-and-space pattern parallel to the first direction before the step of irradiating with ultraviolet light is further provided on the surface. The method for modifying a surface of a substance according to claim 1 or 2, further comprising a step of arranging. 4. The step of irradiating the ultraviolet light, the step of irradiating the area corresponding to the transmissive area in an irradiation area long in one direction along the first direction of the surface with the ultraviolet light, Inside, the step of moving the irradiation region in a second direction intersecting with the first direction.
Alternatively, the substance surface modification method according to item 2. 5. A step of disposing a photomask in which a light-shielding region and a transmissive region are formed in a line-and-space pattern on the surface of an object to be processed having a surface modified by ultraviolet light, and the line. Irradiating the surface with ultraviolet light from the light source including a linear ultraviolet lamp arranged parallel to the length direction of each line of the and-space pattern through the photomask. Method. 6. A plurality of line images, which include a plurality of light rays having different directions, and which are obtained by vertically projecting the plurality of light rays onto a plane parallel to a first direction intersect with each other, and the plurality of light rays are directed in the first direction. For placing a light source that emits ultraviolet light, in which a plurality of line images vertically projected on a plane perpendicular to, and a surface to be irradiated with the ultraviolet light emitted from the light source, are placed. The mounting table, the relative position between the light source and the mounting table is set to the first position so that the distance between the light source and the surface of the processing target does not change.
An ultraviolet light irradiating device having a moving means for changing the direction to intersect with the direction.