JPH0562877A - Optical system for lsi manufacturing contraction projection aligner by light - Google Patents

Optical system for lsi manufacturing contraction projection aligner by light

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Publication number
JPH0562877A
JPH0562877A JP3327947A JP32794791A JPH0562877A JP H0562877 A JPH0562877 A JP H0562877A JP 3327947 A JP3327947 A JP 3327947A JP 32794791 A JP32794791 A JP 32794791A JP H0562877 A JPH0562877 A JP H0562877A
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Japan
Prior art keywords
mirror
light
optical system
image
reticle
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Pending
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JP3327947A
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Japanese (ja)
Inventor
Yasuko Shinohara
康子 篠原
Original Assignee
Yasuko Shinohara
康子 篠原
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by Yasuko Shinohara, 康子 篠原 filed Critical Yasuko Shinohara
Priority to JP3327947A priority Critical patent/JPH0562877A/en
Publication of JPH0562877A publication Critical patent/JPH0562877A/en
Application status is Pending legal-status Critical

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70233Optical aspects of catoptric systems

Abstract

PURPOSE:To obtain a mirror type stepper in which a short wavelength ultraviolet ray is used as a light source and which has a deep focal depth, a wide exposure area and a large numerical aperture. CONSTITUTION:A light source is mounted at one focal point of a rotational elliptical concave mirror, the small hole 8 of the mirror 7 is mounted at the other focal point, and the hole 8 also becomes a focal point of a parabolic mirror 10. A high coherent light is used as a light source thereby to deepen a focal depth, to remove various aberrations and to improve an effective numerical aperture. Further, a reticle image is increased larger than an image on a wafer and the width of the wavelength of an illumination light is increased thereby to prevent deterioration of the image due to the use of the coherent light. In this case, its resolution is improved when transparent liquid is filled between optical systems.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

〔0001〕〔産業上の利用分野〕本発明は、ミラータイプの光によるLSI製造縮小投影露光装置(ステツパ)の光学系に関する。 [0001] The present invention [relates] relates to an optical system LSI manufacturing reduction projection exposure apparatus (Sutetsupa) by the mirror type of light. 〔0002〕〔従来の技術〕従来ミラータイプの等倍一括投影露光装置、レンズタイプのステツパがある。 [0002] [Prior Art] magnification batch projection exposure device of the conventional mirror type, there is a lens type Sutetsupa. 〔0003〕〔発明が解決しようとする課題〕従来のミラータイプの等倍一括投影露光装置の光学系では、等倍率の線状の像しか得られていないので、マスク像の精密位置合わせが難しく、塵埃による影響が大きく、全欠陥を修正することが困難である等の問題があった。 [0003] In the [invention Problem to be Solved] optical system magnification batch projection exposure apparatus of a conventional mirror type, because there is only obtained a linear image of the equal magnification, precise positioning is difficult mask image greatly affected by dust, there was problems such that it is difficult to modify the entire defect. 〔0004〕従来のレンズタイプのステツパでは、短波長紫外線でレンズに使用可能な透明物質の少なさ、透明度の低さ、又レンズの耐久性の問題があった。 [0004] In Sutetsupa conventional lens type, lack of transparent material that can be used in a lens with a short wavelength ultraviolet light, the transparency of the low, also had durability problems lens. 〔0005〕本発明は、短波長紫外線を使用することのできるミラータイプの光学系を有し高解像度、広い露光面積で深い焦点深度を有するステツパを提供することを目的としている。 [0005] The present invention aims at providing high-resolution an optical system of the mirror type that may be used short-wavelength ultraviolet light, the Sutetsupa with deep depth of focus in a wide exposure area. 〔0006〕〔課題を解決するための手段〕上記目的を達成するために、本発明ステツパの光学系においては、 [0006] In order to achieve the above object [Means for Solving the Problems] In the optical system of the present invention Sutetsupa is
比較的広い波長域の高コヒーレント光を光源とし、集光凹面鏡にてレチクルの前方の一点に集中さし 〔0007〕その光の集中す一点に平面鏡の有する小孔を一致して平面鏡を設置し、 〔0008〕その平面鏡の鏡面の対面に凹面鏡を設置し、その凹面鏡の焦点と平面鏡の小孔とが一致する様にする。 The highly coherent light of a relatively wide wavelength range as the light source, concentrate refers [0007] to a point in front of the reticle at the condensing concave mirror placed a flat mirror coincides pores having a plane mirror to concentrate to one point of the light , [0008] a concave mirror placed in face-to-face mirror surface of the plane mirror, to such a small hole in the focus and the plane mirror of the concave mirror coincide.

〔0009〕光源からの光がレチクルを照射し、平面鏡の小孔を通過し凹面鏡でほぼ平行光線となり、同じ平面鏡で反射して進行する平行光線に垂直な極めて薄い透明窓板を設置し、 〔0010〕その透明窓板に極めて近接して、ウエハを設置しそのウエハ上にレチクル像を縮小結像する。 [0009] irradiating light to the reticle from the light source becomes a substantially parallel light beam by passing through the pores of the flat mirror concave, installed perpendicular extremely thin transparent window plate into parallel beams traveling reflected on the same plane mirror, [ 0010] in close proximity to the transparent window plate, it established the wafer to reduction imaging a reticle image on the wafer. 〔0011〕そしてレチクルは、像面彎曲を補正する曲面に作製している。 [0011] The reticle is manufactured to a curved surface to correct the field curvature. 〔0012〕光学系の間の空間を透明な液体で満たし、 [0012] filled with a transparent liquid to a space between the optical system,
その透明な液体を循環さすことが後記する理由により効果的である。 It is effective for the reasons that will be described later refers circulating the clear liquid. 〔0013〕〔作用〕レチクルを透過した光も高コヒーレントであり、波長λ,集光凹面鏡の口径D,焦点距離をfとすると、γ=1.22λf/Dの半径内に全光量の84.6%がレチクルの前方にある平面鏡の小孔に集中する。 [0013] [Operation] a light also highly coherent transmitted through the reticle, the wavelength lambda, the diameter D of the focusing concave mirror, and the focal length to is f, of γ = 1.22λf / D total light within a radius of 84. 6% is concentrated in the pores of the flat mirror in front of the reticle. その周囲はレチクルの回折像を呈する。 Around exhibits a diffraction image of the reticle. 〔0014〕本発明ではレチクル、透明窓板は合成石英で出来ているので、表面を滑らかに研磨でき、高コヒーレント光使用による表面の影響が小さい。 [0014] The reticle in the present invention, since the transparent window plate made of synthetic quartz, the surface can be polished smooth and small influence of the surface by highly coherent light used. 〔0015〕本発明では、透明窓でもって外界と隔絶されているので、空気の対流が少なく又塵埃の侵入を防いでいる。 [0015] In the present invention, since with a transparent window is isolated from the outside world, air convection is prevented least also dust from entering. 本発明全体を真空に近づけると、空気の対流や塵埃の影響が小さくなる。 When brought close to the entire invention in a vacuum, the influence of convection and dust air decreases. 〔0016〕反対にミラー光学系の間の空間を透明な液体で満たし、その透明な液体を循環さすことにより、レチクル,透明窓板の表面の影響は小さくなり、又塵埃の影響が小さくなる。 [0016] filled with a transparent liquid to a space between the mirror optical system on the opposite, by means circulating the clear liquid, the reticle, the influence of the surface of the transparent window plate is reduced, and the influence of dust is reduced. そして透明な液体に光が吸収されるための温度上昇による光の屈折率を変化を防いでいる。 Then, the light in the transparent liquid is prevented from changing the refractive index of the light due to the temperature increase for the absorption. 〔0017〕透明窓は極めて薄く、凹面鏡と平面鏡とで反射された光と垂直に設置されているので、色収差は生じない。 [0017] transparent window is extremely thin, since they are disposed perpendicularly to the light reflected by the concave mirror and the plane mirror, the chromatic aberration does not occur. 〔0018〕本発明では、平板鏡とレチクルとの間に平板鏡の小孔の周囲に電気集塵装置を設置しているので、 [0018] In the present invention, since the installed electric dust collector around the stoma of flat mirrors between the flat mirror and the reticle,
ステツパ内の塵埃を取り除き、平板鏡の小孔を通じてのミラー光学系への塵埃の侵入を防いでいる。 Remove dust in Sutetsupa, thereby preventing dust from entering the mirror optical system through the small holes of the flat plate mirror. 〔0019〕本発明では、レチクル上の像パターンは透明な部分が多い程良いので、像形成にあたって考慮する必要がある。 [0019] In the present invention, since an image pattern on the reticle, the better the transparent portion is large, it is necessary to consider when image formation. 像パターンによっては、ホトレジストの像の反転を施行した方が良い場合もありうる。 The image pattern, it could even be good who underwent reverse the photoresist image. 〔0020〕本発明ステツパで製造したLSIは、中心部に平板鏡の小孔に対応する欠損部が存在するが、小孔は直径1mm程度であるので、LSI集積度に対する影響はない。 [0020] LSI produced by the present invention Sutetsupa is defective section corresponding to the small holes of the flat plate mirror is present in the heart, since the small hole is diameter of about 1 mm, no effect on LSI integration. もちろん光源の光量を大きく出来れば、小孔の直径はもっと小さく設定できうる。 Of course as long increase the light amount of the light source, the diameter of the small hole can be set much smaller. 〔0021〕〔実施例〕実施例について図面を参照して説明すると、図1においてキセノン灯1,フイルタ2, [0021] With reference to the drawings EXAMPLES Example, xenon lamp 1 in FIG. 1, filter 2,
スリツト3,回転楕円凹面鏡4,レチクル5,平面鏡7 Slit 3, spheroidal concave mirror 4, a reticle 5, the plane mirror 7
の小孔8,放物面鏡10,平面鏡7,透明窓板11,ウエハ12,とこの順序でキセノン灯1からの光の光学的通路に設置し、回転楕円凹面鏡の一方の焦点にスリツト3,もう一方の焦点に平面鏡7の小孔8を設置する。 Of small holes 8, the parabolic mirror 10, the plane mirror 7, the transparent window plate 11, the wafer 12, and placed in the optical path of light from a xenon lamp 1 in this order, slit 3 at one focus of the ellipsoidal concave mirror , installing a small hole 8 of the plane mirror 7 to the other focal point. 又小孔8は同時に放物面鏡10の焦点ともなっている。 The small holes 8 are simultaneously also become the focus of the parabolic mirror 10. この時平面鏡7の鏡面9は放物面鏡10と向かいあって設置され、小孔8の周囲には電気集塵装置6が取り付けられている。 Mirror 9 in this case the plane mirror 7 is disposed facing the parabolic mirror 10, and an electric precipitator 6 is attached around the stoma 8. 〔0022〕キセノン灯1の代りにAγF,KγF等の数種類のガスを混合し、発振波長を動揺さすエキシマレーザーを光源とした実施例がある。 [0022] AγF instead of the xenon lamp 1, a mixture of several kinds of gas such as KganmaF, there is the embodiment an excimer laser pointing upset the oscillation wavelength as a light source. 〔0023〕透明窓板11の代りに収差補正用レンズを使用した実施例がある。 [0023] There are examples of using an aberration correcting lens instead of the transparent window plate 11. 〔0024〕放物面鏡10の代りに球面鏡,双曲面鏡等他の凹面鏡を使用した実施例がある。 [0024] spherical mirror instead of the parabolic mirror 10, there is a example using the other concave mirror such as a hyperboloid mirror. 〔0025〕図2に示される実施例では、光学系の間の空間を透明な液体で満たし、その透明な液体を循環さしている。 [0025] In the embodiment shown in FIG. 2, filled with clear fluid the space between the optical system, and circulating the clear liquid. レチクル5は透明な液体を満たす槽13に浸されている。 The reticle 5 is immersed in a bath 13 that meets a clear liquid. 〔0026〕〔考案の効果〕本発明は、以上説明したように構成されているので、以下に記載されるような効果を奏する。 [0026] [Effect of the invention The present invention, which is configured as described above, an effect as described below. 〔0027〕レチクル照射光源は、高コヒーレント光を使用し、回転楕円凹面鏡にてレチクルの前方の一点に集中さしているので、波長λ,回転楕円凹面鏡の口径D, [0027] The reticle illumination light source, using the highly coherent light, since the concentrate at a point forward of the reticle in spheroidal concave mirror, the wavelength lambda, the diameter of the spheroidal concave mirror D,
焦点距離をfとすると,γ=1.22f/Dの半径内に全光量の84.6%がレチクルの前方にある平面鏡の小孔に集中する。 When the focal distance is f, γ = 1.22f / 84.6% radius in the total amount of D is concentrated in pores of a plane mirror in front of the reticle. 小孔の周囲はレチクルの回折像となるが、小孔の中心部は小孔の光の波長の幅の周辺リング状のフチ部と比較して極めて高い光量となるので、小孔のフチ部を光が通過して回折が生じるその割合は極めて小さくなっている。 Although around the stoma is the diffraction image of the reticle, the center of the small holes so an extremely high amount compared to the peripheral ring-shaped border part of the width of the wavelength of the light of the stoma, border portions of the small holes its proportion occurs diffraction light passes through a is extremely small. 従って光が小孔を通過することによる解像力の低下は極めて小さい。 Reduction in resolution due to the light passes through the small holes thus is extremely small. この効果は小孔がγ= This effect is small hole γ =
1.22λf/Dの半径に近づくにつれて大きくなる。 Increases as it approaches the radius of 1.22λf / D. 〔0028〕ウエハの表面上の像の各点に到達する光の大部分は、放物面鏡の対応する極めて小さい範囲で反射されたものであるので、焦点深度も深く像面彎曲や像面歪曲以外の収差は極めて小さくなっている。 [0028] most of the light reaching each point of the image on the surface of the wafer is very small because those reflected by the range, deep curvature of field or image plane depth of focus corresponding parabolic mirror aberrations other than distortion is extremely small. 〔0029〕又ウエハの表面上の像の各点に到達する光の大部分は、放物面鏡の対応する極めて小さい範囲で反射されたものであるので、放物面鏡の計算上な開口数より実効開口数は大きくなる。 Most of the light reaching each point of the image on the [0029] The surface of the wafer, since those that are reflected in a very small range in which the corresponding parabolic mirror, a computational parabolic mirror opening effective numerical aperture is larger than the number. 〔0030〕照射光源に高コヒーレント光を使用すると、レチクル像の回折現像でスペツクル雑音等が出現するが、レチクル像の10分の1程度に縮小するタイプであるため、レチクル像パターンを大きくとる事ができることと、色収差がないので波長域幅を広くとることにより、高コヒーレント光を光源に使用しても像の劣化はない。 [0030] The use of highly coherent light illumination source, but Supetsukuru noise or the like in the diffraction development reticle image appears, because of the type reduced to about one tenth of the reticle image, that a large reticle image pattern and that can, by a wider wavelength band width because there is no chromatic aberration, no image degradation even when using a high coherent light source. 〔0031〕本発明ステツパで、露光面積φ30mm程度、計算上の開口数0.35程度、(実効開口数はもっと大)が得られる。 [0031] In the present invention Sutetsupa, exposure area φ30mm order, numerical aperture 0.35 about the calculated, (effective numerical aperture is more large) is obtained. 〔0032〕本発明は、ミラータイプの光学系を使用しているので、レンズタイプの光学系使用ステツパより短波長紫外線を使用できる。 [0032] Since the present invention uses the optical system of the mirror type, the short wavelength UV can be used than the optical system used Sutetsupa of lens type. 〔0033〕光学系の間の空間を透明な液体で満たすことにより、光の波長をλ,透明な液体の屈折率をηとすると,λ/ηの光を使用したと同じ効果がある。 [0033] By satisfying a clear liquid the space between the optical system and the wavelength of light lambda, the refractive index of the transparent liquid and eta, the same effect as using the light of lambda / eta.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

〔図1〕本発明ステツパの1実施例の構成ブロツク図である。 [1] is a configuration block diagram of one embodiment of the present invention Sutetsupa. 〔図2〕本発明ステツパの光学系間を透明な液体で満たした実施例のレチクル周辺部の構成図である。 [2] is a configuration diagram of a reticle periphery of Example filled between the optical system of the present invention Sutetsupa a clear liquid. 〔符号の説明〕 1 キセノン灯 2 フイルタ 3 スリツト 4 回転楕円凹面鏡 5 レチクル 6 電気集塵装置 7 平面鏡 8 小孔 9 平面鏡の鏡面 10 放物面鏡 11 透明窓板 12 ウエハ 13 透明な液体を満たす槽 14 光学系を満たす透明な液体の流れ Bath satisfying [Reference Numerals] 1 xenon lamp 2 filter 3 slit 4 spheroidal concave mirror 5 reticle 6 electrostatic precipitator 7 plane mirror 8 mirror 10 parabolic mirror 11 transparent window plate 12 wafer 13 clear liquid of small holes 9 plane mirror 14 flow of clear fluid to meet the optical system

Claims (2)

    【特許請求の範囲】 [The claims]
  1. 〔請求項1〕 レチクルの前方の一点に集中する照射機構を有し、その光の集中する一点に平面鏡の有する小孔を一致して平面鏡を設置し、その平面鏡の鏡面の対面に凹面鏡を設置したことを特徴とするLSI製造縮小投影露光装置の光学系。 [Claim 1] has an irradiation mechanism to focus at a point forward of the reticle coincident pores having a planar mirror at one point to focus the light established the plane mirror, the installed concave mirror facing the mirror surface of the plane mirror optical system LSI manufacturing reduction projection exposure apparatus characterized by the.
  2. 〔請求項2〕 光学系の間の空間を透明な液体で満たし、その透明な液体を循環さしている構造の請求項1記載のLSI製造縮小投影露光装置。 [Claim 2] filled with a transparent liquid in the space between the optical system, LSI manufacturing reduction projection exposure apparatus according to claim 1, wherein the structure that circulates the clear liquid.
JP3327947A 1991-09-02 1991-09-02 Optical system for lsi manufacturing contraction projection aligner by light Pending JPH0562877A (en)

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JP3327947A JPH0562877A (en) 1991-09-02 1991-09-02 Optical system for lsi manufacturing contraction projection aligner by light

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