JPH0562877A - Optical system for lsi manufacturing contraction projection aligner by light - Google Patents
Optical system for lsi manufacturing contraction projection aligner by lightInfo
- Publication number
- JPH0562877A JPH0562877A JP3327947A JP32794791A JPH0562877A JP H0562877 A JPH0562877 A JP H0562877A JP 3327947 A JP3327947 A JP 3327947A JP 32794791 A JP32794791 A JP 32794791A JP H0562877 A JPH0562877 A JP H0562877A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- light
- image
- reticle
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Abstract
Description
〔0001〕〔産業上の利用分野〕本発明は、ミラータ
イプの光によるLSI製造縮小投影露光装置(ステツ
パ)の光学系に関する。 〔0002〕〔従来の技術〕従来ミラータイプの等倍一
括投影露光装置、レンズタイプのステツパがある。 〔0003〕〔発明が解決しようとする課題〕従来のミ
ラータイプの等倍一括投影露光装置の光学系では、等倍
率の線状の像しか得られていないので、マスク像の精密
位置合わせが難しく、塵埃による影響が大きく、全欠陥
を修正することが困難である等の問題があった。 〔0004〕従来のレンズタイプのステツパでは、短波
長紫外線でレンズに使用可能な透明物質の少なさ、透明
度の低さ、又レンズの耐久性の問題があった。 〔0005〕本発明は、短波長紫外線を使用することの
できるミラータイプの光学系を有し高解像度、広い露光
面積で深い焦点深度を有するステツパを提供することを
目的としている。 〔0006〕〔課題を解決するための手段〕上記目的を
達成するために、本発明ステツパの光学系においては、
比較的広い波長域の高コヒーレント光を光源とし、集光
凹面鏡にてレチクルの前方の一点に集中さし 〔0007〕その光の集中す一点に平面鏡の有する小孔
を一致して平面鏡を設置し、 〔0008〕その平面鏡の鏡面の対面に凹面鏡を設置
し、その凹面鏡の焦点と平面鏡の小孔とが一致する様に
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical system of an LSI manufacturing reduction projection exposure apparatus (stepper) using mirror type light. [0002] [Prior Art] Conventionally, there is a mirror type equal-magnification collective projection exposure apparatus and a lens type stepper. [0003] [Problems to be solved by the invention] In the optical system of the conventional mirror type unit-magnification batch projection exposure apparatus, only a linear image of equal magnification is obtained, so that precise alignment of the mask image is difficult. However, there is a problem in that the influence of dust is great and it is difficult to correct all defects. [0004] In the conventional lens type stepper, there are problems that there are few transparent substances that can be used for a lens with short wavelength ultraviolet rays, low transparency, and durability of the lens. [0005] It is an object of the present invention to provide a stepper having a mirror type optical system capable of using short wavelength ultraviolet rays, having a high resolution, a wide exposure area and a deep depth of focus. [0006] [Means for Solving the Problems] In order to achieve the above object, in the optical system of the stepper of the present invention,
A high-coherent light of a relatively wide wavelength range is used as a light source, and a concentrating concave mirror is used to concentrate the light at one point in front of the reticle. [0007] A small hole on the plane mirror is installed at the one point where the light is concentrated. [0008] A concave mirror is installed on the opposite surface of the plane mirror so that the focal point of the concave mirror and the small hole of the plane mirror coincide with each other.
〔0009〕光源からの光がレチクルを照射し、平面鏡
の小孔を通過し凹面鏡でほぼ平行光線となり、同じ平面
鏡で反射して進行する平行光線に垂直な極めて薄い透明
窓板を設置し、 〔0010〕その透明窓板に極めて近接して、ウエハを
設置しそのウエハ上にレチクル像を縮小結像する。 〔0011〕そしてレチクルは、像面彎曲を補正する曲
面に作製している。 〔0012〕光学系の間の空間を透明な液体で満たし、
その透明な液体を循環さすことが後記する理由により効
果的である。 〔0013〕〔作用〕レチクルを透過した光も高コヒー
レントであり、波長λ,集光凹面鏡の口径D,焦点距離
をfとすると、γ=1.22λf/Dの半径内に全光量
の84.6%がレチクルの前方にある平面鏡の小孔に集
中する。その周囲はレチクルの回折像を呈する。 〔0014〕本発明ではレチクル、透明窓板は合成石英
で出来ているので、表面を滑らかに研磨でき、高コヒー
レント光使用による表面の影響が小さい。 〔0015〕本発明では、透明窓でもって外界と隔絶さ
れているので、空気の対流が少なく又塵埃の侵入を防い
でいる。本発明全体を真空に近づけると、空気の対流や
塵埃の影響が小さくなる。 〔0016〕反対にミラー光学系の間の空間を透明な液
体で満たし、その透明な液体を循環さすことにより、レ
チクル,透明窓板の表面の影響は小さくなり、又塵埃の
影響が小さくなる。そして透明な液体に光が吸収される
ための温度上昇による光の屈折率を変化を防いでいる。 〔0017〕透明窓は極めて薄く、凹面鏡と平面鏡とで
反射された光と垂直に設置されているので、色収差は生
じない。 〔0018〕本発明では、平板鏡とレチクルとの間に平
板鏡の小孔の周囲に電気集塵装置を設置しているので、
ステツパ内の塵埃を取り除き、平板鏡の小孔を通じての
ミラー光学系への塵埃の侵入を防いでいる。 〔0019〕本発明では、レチクル上の像パターンは透
明な部分が多い程良いので、像形成にあたって考慮する
必要がある。像パターンによっては、ホトレジストの像
の反転を施行した方が良い場合もありうる。 〔0020〕本発明ステツパで製造したLSIは、中心
部に平板鏡の小孔に対応する欠損部が存在するが、小孔
は直径1mm程度であるので、LSI集積度に対する影
響はない。もちろん光源の光量を大きく出来れば、小孔
の直径はもっと小さく設定できうる。 〔0021〕〔実施例〕実施例について図面を参照して
説明すると、図1においてキセノン灯1,フイルタ2,
スリツト3,回転楕円凹面鏡4,レチクル5,平面鏡7
の小孔8,放物面鏡10,平面鏡7,透明窓板11,ウ
エハ12,とこの順序でキセノン灯1からの光の光学的
通路に設置し、回転楕円凹面鏡の一方の焦点にスリツト
3,もう一方の焦点に平面鏡7の小孔8を設置する。又
小孔8は同時に放物面鏡10の焦点ともなっている。こ
の時平面鏡7の鏡面9は放物面鏡10と向かいあって設
置され、小孔8の周囲には電気集塵装置6が取り付けら
れている。 〔0022〕キセノン灯1の代りにAγF,KγF等の
数種類のガスを混合し、発振波長を動揺さすエキシマレ
ーザーを光源とした実施例がある。 〔0023〕透明窓板11の代りに収差補正用レンズを
使用した実施例がある。 〔0024〕放物面鏡10の代りに球面鏡,双曲面鏡等
他の凹面鏡を使用した実施例がある。 〔0025〕図2に示される実施例では、光学系の間の
空間を透明な液体で満たし、その透明な液体を循環さし
ている。レチクル5は透明な液体を満たす槽13に浸さ
れている。 〔0026〕〔考案の効果〕本発明は、以上説明したよ
うに構成されているので、以下に記載されるような効果
を奏する。 〔0027〕レチクル照射光源は、高コヒーレント光を
使用し、回転楕円凹面鏡にてレチクルの前方の一点に集
中さしているので、波長λ,回転楕円凹面鏡の口径D,
焦点距離をfとすると,γ=1.22f/Dの半径内に
全光量の84.6%がレチクルの前方にある平面鏡の小
孔に集中する。小孔の周囲はレチクルの回折像となる
が、小孔の中心部は小孔の光の波長の幅の周辺リング状
のフチ部と比較して極めて高い光量となるので、小孔の
フチ部を光が通過して回折が生じるその割合は極めて小
さくなっている。従って光が小孔を通過することによる
解像力の低下は極めて小さい。この効果は小孔がγ=
1.22λf/Dの半径に近づくにつれて大きくなる。 〔0028〕ウエハの表面上の像の各点に到達する光の
大部分は、放物面鏡の対応する極めて小さい範囲で反射
されたものであるので、焦点深度も深く像面彎曲や像面
歪曲以外の収差は極めて小さくなっている。 〔0029〕又ウエハの表面上の像の各点に到達する光
の大部分は、放物面鏡の対応する極めて小さい範囲で反
射されたものであるので、放物面鏡の計算上な開口数よ
り実効開口数は大きくなる。 〔0030〕照射光源に高コヒーレント光を使用する
と、レチクル像の回折現像でスペツクル雑音等が出現す
るが、レチクル像の10分の1程度に縮小するタイプで
あるため、レチクル像パターンを大きくとる事ができる
ことと、色収差がないので波長域幅を広くとることによ
り、高コヒーレント光を光源に使用しても像の劣化はな
い。 〔0031〕本発明ステツパで、露光面積φ30mm程
度、計算上の開口数0.35程度、(実効開口数はもっ
と大)が得られる。 〔0032〕本発明は、ミラータイプの光学系を使用し
ているので、レンズタイプの光学系使用ステツパより短
波長紫外線を使用できる。 〔0033〕光学系の間の空間を透明な液体で満たすこ
とにより、光の波長をλ,透明な液体の屈折率をηとす
ると,λ/ηの光を使用したと同じ効果がある。[0009] The light from the light source irradiates the reticle, passes through the small hole of the plane mirror, becomes a substantially parallel light beam by the concave mirror, and installs an extremely thin transparent window plate that is perpendicular to the parallel light rays traveling by being reflected by the same plane mirror. A wafer is placed in close proximity to the transparent window plate, and a reticle image is reduced and formed on the wafer. [0011] Then, the reticle is formed into a curved surface for correcting the curvature of field. [0012] Fill the space between the optical systems with a transparent liquid,
Circulating the transparent liquid is effective for the reasons described below. [Operation] The light transmitted through the reticle is also highly coherent. Assuming that the wavelength λ, the diameter D of the condenser concave mirror, and the focal length are f, the total light amount is 84. within the radius of γ = 1.22λf / D. 6% are concentrated in the small hole in the plane mirror in front of the reticle. The surrounding area shows the diffraction image of the reticle. [0014] In the present invention, since the reticle and the transparent window plate are made of synthetic quartz, the surface can be polished smoothly, and the influence of the surface due to the use of high coherent light is small. [0015] In the present invention, since it is isolated from the outside world by the transparent window, the convection of air is small and the invasion of dust is prevented. When the entire invention is brought closer to a vacuum, the influence of air convection and dust is reduced. [0016] Conversely, by filling the space between the mirror optical systems with a transparent liquid and circulating the transparent liquid, the influence of the surfaces of the reticle and the transparent window plate is reduced, and the influence of dust is reduced. The change in the refractive index of light due to the temperature rise due to the absorption of light by the transparent liquid is prevented. [0017] Since the transparent window is extremely thin and is installed perpendicularly to the light reflected by the concave mirror and the plane mirror, no chromatic aberration occurs. [0018] In the present invention, since the electrostatic precipitator is installed around the small hole of the flat mirror between the flat mirror and the reticle,
The dust inside the stepper is removed to prevent the dust from entering the mirror optical system through the small hole of the flat mirror. In the present invention, the more transparent the image pattern on the reticle is, the better. Therefore, it is necessary to consider it when forming an image. Depending on the image pattern, it may be better to perform an inversion of the photoresist image. The LSI manufactured by the stepper of the present invention has a defective portion corresponding to the small hole of the flat plate mirror at the center portion, but since the small hole has a diameter of about 1 mm, there is no influence on the LSI integration degree. Of course, if the light quantity of the light source can be increased, the diameter of the small hole can be set smaller. [Embodiment] An embodiment will be described with reference to the drawings. In FIG. 1, a xenon lamp 1, a filter 2,
Slit 3, spheroidal concave mirror 4, reticle 5, plane mirror 7
The small hole 8, the parabolic mirror 10, the plane mirror 7, the transparent window plate 11, and the wafer 12 are installed in this order in the optical path of the light from the xenon lamp 1, and the slit 3 is placed at one focus of the spheroidal concave mirror. , The small hole 8 of the plane mirror 7 is installed at the other focal point. The small hole 8 also serves as the focal point of the parabolic mirror 10. At this time, the mirror surface 9 of the plane mirror 7 is installed to face the parabolic mirror 10, and the electrostatic precipitator 6 is mounted around the small hole 8. There is an example in which the xenon lamp 1 is replaced by several kinds of gases such as AγF and KγF, and an excimer laser that fluctuates the oscillation wavelength is used as a light source. There is an example in which an aberration correction lens is used instead of the transparent window plate 11. [0024] There is an embodiment in which the parabolic mirror 10 is replaced with another concave mirror such as a spherical mirror or a hyperbolic mirror. In the embodiment shown in FIG. 2, the space between the optical systems is filled with a transparent liquid, and the transparent liquid is circulated. The reticle 5 is immersed in a tank 13 filled with a transparent liquid. [0026] [Effect of the Invention] Since the present invention is configured as described above, it has the following effects. [0027] Since the reticle irradiation light source uses high coherent light and is focused on one point in front of the reticle by the spheroidal concave mirror, the wavelength λ, the diameter D of the spheroidal concave mirror,
Assuming that the focal length is f, 84.6% of the total amount of light is concentrated in the small hole of the plane mirror in front of the reticle within the radius of γ = 1.22f / D. The area around the small hole is a diffraction image of the reticle, but the central part of the small hole has an extremely high amount of light compared to the peripheral ring-shaped edge part of the light wavelength width of the small hole. The rate at which light passes through and diffracts is extremely small. Therefore, the decrease in resolution due to the passage of light through the small holes is extremely small. The effect is that small holes are γ =
It increases as the radius approaches 1.22 λf / D. [0028] Since most of the light that reaches each point of the image on the surface of the wafer is reflected by a very small range corresponding to the parabolic mirror, the depth of focus is deep and the image plane curve or image plane is deep. Aberrations other than distortion are extremely small. [0029] Also, most of the light that reaches each point of the image on the surface of the wafer is reflected in a correspondingly small area of the parabolic mirror, so that the computational aperture of the parabolic mirror. The effective numerical aperture is larger than the numerical aperture. [0030] When high coherent light is used as the irradiation light source, speckle noise or the like appears in the diffraction development of the reticle image, but since it is a type that is reduced to about 1/10 of the reticle image, a large reticle image pattern should be used. In addition, since there is no chromatic aberration and the wavelength band is wide because of no chromatic aberration, there is no deterioration of the image even when high coherent light is used as the light source. [0031] With the stepper of the present invention, an exposure area of about 30 mm, a numerical aperture of about 0.35 (the effective numerical aperture is larger) can be obtained. [0032] Since the present invention uses the mirror type optical system, shorter wavelength ultraviolet rays can be used than the lens type optical system stepper. [0033] If the wavelength of light is λ and the refractive index of the transparent liquid is η by filling the space between the optical systems with a transparent liquid, the same effect as using light of λ / η is obtained.
〔図1〕本発明ステツパの1実施例の構成ブロツク図で
ある。 〔図2〕本発明ステツパの光学系間を透明な液体で満た
した実施例のレチクル周辺部の構成図である。 〔符号の説明〕 1 キセノン灯 2 フイルタ 3 スリツト 4 回転楕円凹面鏡 5 レチクル 6 電気集塵装置 7 平面鏡 8 小孔 9 平面鏡の鏡面 10 放物面鏡 11 透明窓板 12 ウエハ 13 透明な液体を満たす槽 14 光学系を満たす透明な液体の流れFIG. 1 is a block diagram showing the construction of an embodiment of a stepper according to the present invention. FIG. 2 is a configuration diagram of a reticle peripheral portion of an embodiment in which a transparent liquid is filled between the optical systems of the stepper of the present invention. [Explanation of symbols] 1 xenon lamp 2 filter 3 slit 4 spheroidal concave mirror 5 reticle 6 electrostatic precipitator 7 plane mirror 8 small hole 9 plane mirror surface 10 parabolic mirror 11 transparent window plate 12 wafer 13 tank for filling transparent liquid 14 Transparent liquid flow that fills the optical system
Claims (2)
構を有し、その光の集中する一点に平面鏡の有する小孔
を一致して平面鏡を設置し、その平面鏡の鏡面の対面に
凹面鏡を設置したことを特徴とするLSI製造縮小投影
露光装置の光学系。[Claim 1] An irradiation mechanism for concentrating light at a point in front of the reticle is provided, a small hole of the plane mirror is aligned with the point at which the light is concentrated, and a plane mirror is installed opposite to the mirror surface of the plane mirror. An optical system of an LSI manufacturing reduction projection exposure apparatus characterized by the above.
し、その透明な液体を循環さしている構造の請求項1記
載のLSI製造縮小投影露光装置。[Claim 2] An LSI manufacturing reduced projection exposure apparatus according to claim 1, wherein the space between the optical systems is filled with a transparent liquid, and the transparent liquid is circulated.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3327947A JPH0562877A (en) | 1991-09-02 | 1991-09-02 | Optical system for lsi manufacturing contraction projection aligner by light |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3327947A JPH0562877A (en) | 1991-09-02 | 1991-09-02 | Optical system for lsi manufacturing contraction projection aligner by light |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0562877A true JPH0562877A (en) | 1993-03-12 |
Family
ID=18204794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3327947A Pending JPH0562877A (en) | 1991-09-02 | 1991-09-02 | Optical system for lsi manufacturing contraction projection aligner by light |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0562877A (en) |
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