JPH09155747A - Flattening grinding wheel - Google Patents
Flattening grinding wheelInfo
- Publication number
- JPH09155747A JPH09155747A JP34542995A JP34542995A JPH09155747A JP H09155747 A JPH09155747 A JP H09155747A JP 34542995 A JP34542995 A JP 34542995A JP 34542995 A JP34542995 A JP 34542995A JP H09155747 A JPH09155747 A JP H09155747A
- Authority
- JP
- Japan
- Prior art keywords
- grinding
- chuck table
- grinding wheel
- polishing
- flattening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 abstract description 16
- 239000007788 liquid Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ロータリー研削盤
で平面出しができるようにした研削ホイールに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a grinding wheel capable of flattening with a rotary grinding machine.
【0002】[0002]
【従来の技術】図2に示すように表面にポーラス部材2
を備えたチャックテーブル1は、半導体ウェーハを賽の
目状に切削するダイシング装置、ウェーハ面を研磨する
研磨装置等に被加工物を保持するテーブルとして組み込
まれる。このような装置によって半導体ウェーハ等には
高精度な切削又は研磨がなされるため、チャックテーブ
ルの表面(被加工物保持面)は高精度に平坦になってい
なければならない。そのために、従来は図10に示すよ
うな研削ホイールKを備えたロータリー研削盤を用いて
チャックテーブル1の表面の平坦仕上げを行っている。2. Description of the Related Art As shown in FIG. 2, a porous member 2 is provided on the surface.
The chuck table 1 provided with is installed as a table for holding a workpiece in a dicing device for cutting a semiconductor wafer in a dice pattern, a polishing device for polishing a wafer surface, and the like. Since a semiconductor wafer or the like is highly accurately cut or polished by such an apparatus, the surface of the chuck table (workpiece holding surface) must be highly accurately flat. Therefore, conventionally, the surface of the chuck table 1 is flattened using a rotary grinder equipped with a grinding wheel K as shown in FIG.
【0003】[0003]
【発明が解決しようとする課題】しかし、前記研削ホイ
ールKによると、チャックテーブルの表面の中心部に荒
れが生じるという問題があり、解決しなければならない
課題となっていた。かかる問題は、研削部(砥石)Mの
研磨面Nがチャックテーブルの中心と常に接触している
こと、及び研磨屑が中心部分に集まり易いこと等である
と考え、図11(イ) のように研削部Mの回転中心Qを偏
心させて研磨面Nがチャックテーブルの中心Oと常に接
触しないように試みたり、図11(ロ) のように研削部M
を3分割(3枚歯)して研磨面Nが断続的に接触するよ
うに試みたりしたが、今度は中心以外の部分に荒れが生
じるという問題が生じた。又、荒れを防止するために平
面研削盤を用いてチャックテーブルの表面平坦仕上げを
行う場合もあるが、作業に多くの時間が掛かり且つ技術
的にもかなりの熟練が要求される。本発明は、このよう
な従来の問題を解決するためになされたもので、ロータ
リー研削盤を用いて中心部に荒れが生じることなくチャ
ックテーブルの平坦仕上げができるようにした、平面出
し研削ホイールを提供することを課題とする。However, according to the grinding wheel K, there is a problem that the central portion of the surface of the chuck table is roughened, which has been a problem to be solved. It is considered that such a problem is that the polishing surface N of the grinding portion (grinding stone) M is constantly in contact with the center of the chuck table, and that polishing debris is likely to collect in the center portion, and as shown in FIG. The rotation center Q of the grinding part M is eccentric to the polishing surface N so that the polishing surface N does not always come in contact with the center O of the chuck table, or as shown in FIG.
Although it was tried to divide it into three parts (three teeth) so that the polishing surface N contacted intermittently, this time there was a problem that the portion other than the center was roughened. In some cases, the surface of the chuck table is flattened by using a surface grinder in order to prevent roughness, but it takes a lot of time for the work and requires considerable skill in terms of technology. The present invention has been made in order to solve such a conventional problem, and provides a flat surface grinding wheel capable of performing a flat finish of a chuck table using a rotary grinding machine without causing roughness in a central portion. The challenge is to provide.
【0004】[0004]
【課題を解決するための手段】前記課題を技術的に解決
するための手段として、本発明は、ポーラスチャックテ
ーブルの表面等を研削して平面を出す研削ホイールにお
いて、この研削ホイールは、基台の端面に円環状の研削
部が形成されていると共に、その外側に耳状に突出した
研削部が形成されている平面出し研削ホイールを要旨と
する。As a means for technically solving the above-mentioned problems, the present invention relates to a grinding wheel that grinds a surface or the like of a porous chuck table to form a flat surface. The grinding wheel is a base. The gist of the present invention is a flat-face grinding wheel in which an annular grinding portion is formed on the end surface of and the grinding portion protruding in an ear shape is formed on the outside thereof.
【0005】[0005]
【発明の実施の形態】以下、本発明の実施の形態を添付
図面に基づいて詳説する。図1において、3は研削ホイ
ールであり、基台3aの端面に円環状の研削部3bが形
成されると共に、その外側に耳状に突出した研削部3c
が対設されている。前記耳状研削部3cは前記基台3a
の側面に柱状に形成された支持部3dにより、容易に欠
損しないように支持されている。Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. In FIG. 1, reference numeral 3 denotes a grinding wheel, which has an annular grinding portion 3b formed on an end surface of a base 3a, and a grinding portion 3c protruding outwardly from the grinding portion 3c.
Are opposed to each other. The ear-shaped grinding portion 3c is the base 3a.
It is supported by a supporting portion 3d formed in a columnar shape on the side surface thereof so as not to be easily damaged.
【0006】このように形成された研削ホイール3は、
図3のようにロータリー研削盤4の回転軸4aの端部に
取り付けられ、前記チャックテーブル1の表面の平坦仕
上げに使用される。この際、図4に示すように前記耳状
研削部3cがチャックテーブル1のポーラス部材2の中
心部を通るように研削ホイール3を位置決めし、例えば
チャックテーブル1を30〜50rpmで、ロータリー
研削盤4の回転軸4aを1000〜1500rpmでそ
れぞれ回転させると共に、切削水を90リットル/分供
給しながら研磨したところ、中心部分に荒れが生じるこ
となくチャックテーブル1の表面を平坦仕上げすること
ができた。The grinding wheel 3 thus formed is
As shown in FIG. 3, it is attached to the end of the rotary shaft 4a of the rotary grinder 4 and is used to finish the surface of the chuck table 1 flat. At this time, as shown in FIG. 4, the grinding wheel 3 is positioned so that the ear-shaped grinding portion 3c passes through the central portion of the porous member 2 of the chuck table 1. For example, the chuck table 1 is rotated at 30 to 50 rpm by a rotary grinder. When the rotary shaft 4a of No. 4 was rotated at 1000 to 1500 rpm and polishing was performed while supplying cutting water at 90 liters / minute, the surface of the chuck table 1 could be finished flat without roughening at the central portion. .
【0007】図5は半導体ウェーハ等の表面を研磨する
研磨装置5であり、被加工物Wを保持するテーブルとし
てチャックテーブル1が組み込まれている。このチャッ
クテーブル1の表面も平坦仕上げしなければならない
が、この場合はロータリー研削盤を用いなくても自らの
研削機能によって前記研削ホイール3を使用してチャッ
クテーブル1の表面を平坦仕上げすることができる。即
ち、研磨手段5aの下端部に取り付けられた研磨用砥石
5bを外して前記研削ホイール3を装着し、前記耳状研
削部3cがチャックテーブル1の中央部を通るように設
定して表面の平坦仕上げをすれば良い。FIG. 5 shows a polishing apparatus 5 for polishing the surface of a semiconductor wafer or the like, and a chuck table 1 is incorporated as a table for holding a workpiece W. The surface of the chuck table 1 must be flat-finished. In this case, the surface of the chuck table 1 can be flat-finished by using the grinding wheel 3 by its own grinding function without using a rotary grinder. it can. That is, the grinding wheel 5b attached to the lower end of the polishing means 5a is removed, the grinding wheel 3 is mounted, the ear-shaped grinding portion 3c is set so as to pass through the central portion of the chuck table 1, and the surface is flat. Just finish it.
【0008】この場合、研磨手段5aは図6に示すよう
にZ軸駆動機構5cにより上下方向に移動して切削深さ
が制御され、チャックテーブル1はサーボドライバー5
dを介して回転速度の制御がなされる。In this case, the polishing means 5a is moved in the vertical direction by the Z-axis drive mechanism 5c to control the cutting depth as shown in FIG.
The rotation speed is controlled via d.
【0009】図7は半導体ウェーハ等を切削するダイシ
ング装置6であり、表面にポーラス部材を備えたチャッ
クテーブル1が組み込まれており、このチャックテーブ
ル1の表面を平坦仕上げする場合にも前記研削ホイール
3を用いてロータリー研削盤4にて遂行することができ
る。FIG. 7 shows a dicing device 6 for cutting a semiconductor wafer or the like, which incorporates a chuck table 1 having a porous member on its surface. Even when the surface of the chuck table 1 is finished to be flat, the grinding wheel is used. 3 can be carried out on a rotary grinder 4.
【0010】チャックテーブルは前記構成のものに限ら
ず、例えば図8、図9に示すようにポーラス部材12は
中央部が円形で、その回りに円環形のものが複数個同心
円状に配設された構成のチャックテーブル11もある
が、この場合にも前記研削ホイール3を用いてロータリ
ー研削盤4により前記と同じ要領で表面を平坦仕上げす
ることが可能である。尚、本発明において耳状研削部3
cを2箇所に形成したが、チャックテーブルの種類、硬
度等により3箇所、4箇所に適宜形成することができ
る。The chuck table is not limited to the one having the above-mentioned structure. For example, as shown in FIGS. 8 and 9, the central portion of the porous member 12 is circular, and a plurality of annular members are concentrically arranged around the central portion. There is also a chuck table 11 having the above structure, but in this case as well, the surface can be finished flat by the rotary grinding machine 4 using the grinding wheel 3 in the same manner as described above. Incidentally, in the present invention, the ear-shaped grinding portion 3
Although c is formed in two places, it can be formed in three places and four places depending on the type and hardness of the chuck table.
【0011】[0011]
【発明の効果】以上説明したように、本発明によれば、
ロータリー研削盤を用いて中心部に荒れが生じることな
くチャックテーブルの平坦仕上げができ、しかも短時間
で作業が完了する等の優れた効果を奏する。As described above, according to the present invention,
Using the rotary grinder, the chuck table can be flat-finished without causing the center portion to be rough, and the work can be completed in a short time.
【図1】 本発明に係る研削ホイールの斜視図である。FIG. 1 is a perspective view of a grinding wheel according to the present invention.
【図2】 チャックテーブルの上部斜視図である。FIG. 2 is an upper perspective view of a chuck table.
【図3】 ロータリー研削盤で平坦仕上げをする状態を
示す説明図である。FIG. 3 is an explanatory diagram showing a state in which flat finishing is performed by a rotary grinder.
【図4】 研削ホイールとチャックテーブルとの位置関
係を示す説明図である。FIG. 4 is an explanatory diagram showing a positional relationship between a grinding wheel and a chuck table.
【図5】 研磨装置の要部の斜視図である。FIG. 5 is a perspective view of a main part of the polishing apparatus.
【図6】 同、要部の立面図である。FIG. 6 is an elevation view of the main part of the same.
【図7】 ダイシング装置の斜視図である。FIG. 7 is a perspective view of a dicing device.
【図8】 チャックテーブルの他の形態例を示す一部破
断斜視図である。FIG. 8 is a partially cutaway perspective view showing another example of the chuck table.
【図9】 同、要部の分解斜視図である。FIG. 9 is an exploded perspective view of the main part of the same.
【図10】従来の研削ホイールを示す斜視図である。FIG. 10 is a perspective view showing a conventional grinding wheel.
【図11】(イ) 、(ロ) は従来の研削ホイールとチャック
テーブルとの位置関係をそれぞれ示す説明図である。11 (a) and 11 (b) are explanatory views showing a positional relationship between a conventional grinding wheel and a chuck table, respectively.
1…チャックテーブル 2…ポーラス部材 3…研削ホイール 3a…基台 3b…研削部 3c…耳状研削部 4…ロータリー研削盤 4a…回転軸 5…研磨装置 5a…研磨手段 5b…研磨用砥石 5c…Z軸駆
動機構 5d…サーボドライバー 6…ダイシング装置DESCRIPTION OF SYMBOLS 1 ... Chuck table 2 ... Porous member 3 ... Grinding wheel 3a ... Base 3b ... Grinding part 3c ... Ear grinding part 4 ... Rotary grinder 4a ... Rotating shaft 5 ... Polishing device 5a ... Polishing means 5b ... Grinding stone 5c ... Z-axis drive mechanism 5d ... Servo driver 6 ... Dicing device
Claims (1)
削して平面を出す研削ホイールにおいて、この研削ホイ
ールは、基台の端面に円環状の研削部が形成されている
と共に、その外側に耳状に突出した研削部が形成されて
いる平面出し研削ホイール。1. A grinding wheel for grinding a surface of a porous chuck table or the like to form a flat surface, wherein the grinding wheel has an annular grinding portion formed on an end surface of a base and has an ear-like shape on the outer side thereof. A flat surface grinding wheel with a protruding grinding part.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34542995A JPH09155747A (en) | 1995-12-11 | 1995-12-11 | Flattening grinding wheel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34542995A JPH09155747A (en) | 1995-12-11 | 1995-12-11 | Flattening grinding wheel |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09155747A true JPH09155747A (en) | 1997-06-17 |
Family
ID=18376537
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34542995A Pending JPH09155747A (en) | 1995-12-11 | 1995-12-11 | Flattening grinding wheel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09155747A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005034931A (en) * | 2003-07-18 | 2005-02-10 | Allied Material Corp | Cup type superabrasive wheel and method of surface grinding for wafer |
JP2005340592A (en) * | 2004-05-28 | 2005-12-08 | Disco Abrasive Syst Ltd | Wafer processing device |
JP2005340324A (en) * | 2004-05-25 | 2005-12-08 | Disco Abrasive Syst Ltd | Method of processing chuck table in processing apparatus |
US7112889B1 (en) * | 1999-11-11 | 2006-09-26 | Fujitsu Limited | Semiconductor device having an alignment mark formed by the same material with a metal post |
-
1995
- 1995-12-11 JP JP34542995A patent/JPH09155747A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7112889B1 (en) * | 1999-11-11 | 2006-09-26 | Fujitsu Limited | Semiconductor device having an alignment mark formed by the same material with a metal post |
US8404496B2 (en) | 1999-11-11 | 2013-03-26 | Fujitsu Semiconductor Limited | Method of testing a semiconductor device and suctioning a semiconductor device in the wafer state |
US8759119B2 (en) | 1999-11-11 | 2014-06-24 | Fujitsu Semiconductor Limited | Method of testing a semiconductor device and suctioning a semiconductor device in the wafer state |
JP2005034931A (en) * | 2003-07-18 | 2005-02-10 | Allied Material Corp | Cup type superabrasive wheel and method of surface grinding for wafer |
JP2005340324A (en) * | 2004-05-25 | 2005-12-08 | Disco Abrasive Syst Ltd | Method of processing chuck table in processing apparatus |
JP2005340592A (en) * | 2004-05-28 | 2005-12-08 | Disco Abrasive Syst Ltd | Wafer processing device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20040406 |