JPH09155743A - Method for removing grinding/polishing/cleaning material adhering to workpiece - Google Patents

Method for removing grinding/polishing/cleaning material adhering to workpiece

Info

Publication number
JPH09155743A
JPH09155743A JP7322019A JP32201995A JPH09155743A JP H09155743 A JPH09155743 A JP H09155743A JP 7322019 A JP7322019 A JP 7322019A JP 32201995 A JP32201995 A JP 32201995A JP H09155743 A JPH09155743 A JP H09155743A
Authority
JP
Japan
Prior art keywords
water
workpiece
polishing
cleaning material
soluble powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7322019A
Other languages
Japanese (ja)
Inventor
Keiji Mase
恵二 間瀬
Shinji Kanda
真治 神田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Manufacturing Co Ltd
Original Assignee
Fuji Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Manufacturing Co Ltd filed Critical Fuji Manufacturing Co Ltd
Priority to JP7322019A priority Critical patent/JPH09155743A/en
Publication of JPH09155743A publication Critical patent/JPH09155743A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To surely remove a grinding/polishing/cleaning material coming into the recessed part of, particularly, the worked surface of a workpiece to which blast work is applied by jetting the grinding/polishing/cleaning material. SOLUTION: Considering a workpiece to which blast work is applied by jetting a grinding/polishing/cleaning material, for instance, a low melting-point glass layer 12 having a blast property is formed in the whole surface of the one side of a PDP substrate, a resist layer 13 is formed by patterning in the surface of the low melting- point glass layer 12, and blast work is performed by jetting a grinding/polishing/ cleaning material from the resist layer 13 side whereby the low melting-point glass layer 12 other than the lower layer of the resist layer 13 is polished and removed by the grinding/polishing/cleaning material and a high-accurate rib 14 is formed. All of the grinding/polishing/cleaning materials coming into the gap of the rib 14 cannot be removed by an air blow applied to the surface of the rib 14 side but water-soluble fine particles 23 comprising a water-soluble substance are jetted from the rib 14 side to surely remove the grinding/polishing/cleaning materials 21 by the collision force of the water-soluble fine particles 23 and to replace it with the water-soluble fine particles 23. The PDP is washed, thereby dissolving in water the water-soluble fine particles 23 adhering to the PDP to surely discharge it.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、被加工物に研掃材
を噴射してブラスト加工した後、この被加工物に付着し
た研掃材を除去する方法に関し、特に、プラズマディス
プレイパネル(以下、「PDP」という)のリブをブラ
スト加工により高精細にパターン形成したときに、研掃
材がPDPの高精細リブ間の間隙や高精細リブの隅部に
入り込むというような、狭い間隙を成す凹凸形状にブラ
スト加工した被加工物の凹部内や凹部の隅部に入り込ん
で付着した研掃材を除去する方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing a cleaning / cleaning material adhering to a work after the cleaning / cleaning material is sprayed onto the work to be blasted, and more particularly to a plasma display panel (hereinafter , "PDP") is formed in a fine pattern by blasting, and a narrow gap is formed such that the polishing agent enters the gap between the fine ribs of the PDP or the corners of the fine ribs. The present invention relates to a method of removing a polishing / cleaning material adhering to a concave portion or a corner portion of a concave portion of a workpiece blasted into an uneven shape and attached.

【0002】プラズマディスプレイとは、内側にそれぞ
れ多数の縦電極と横電極をもった2枚のガラス基板でな
るPDPを約0.1mmの放電ガス空間を挟んで組み合
わせたもので、2枚のガラス基板間にネオン/キセノン
ガスでなる放電ガスを封入した構造である。電極相互間
に電圧を加えることにより、多数の縦電極と横電極の交
点がそれぞれ電気的に選択され、その点に生じた放電に
より発光し、文字や図形を表示する。より詳しく説明す
ると、例えば、前記2枚のガラス基板のうち一方はプラ
ズマディスプレイの放電部を成す前面ガラス基板であ
り、他方はプラズマディスプレイの発光部を成す背面ガ
ラス基板である。前面ガラス基板は内面に多数の縦電極
を備え、この縦電極を設けた面に誘電体層と該誘電体層
の表面に保護層を形成している。一方、背面ガラス基板
は内面に多数の横電極を備え、各横電極間にリブを突設
している。このリブはガラス基板の表面上に平行(スト
ライプ状)あるいは格子状のパターン(絵又は模様をい
う)を成している。縦電極と横電極相互間に電圧を加え
ることにより、前記放電部の誘電体層、保護層の表面で
面放電が起こり、紫外線が発生する。この紫外線により
前記発光部に蛍光体を励起し、発光させて蛍光体の塗り
分けによりカラー表示を行なうものである。
[0002] A plasma display is a combination of two PDPs each having a plurality of vertical electrodes and horizontal electrodes inside, with a discharge gas space of about 0.1 mm interposed therebetween. It has a structure in which a discharge gas of neon / xenon gas is sealed between the substrates. By applying a voltage between the electrodes, the intersections of a large number of vertical electrodes and horizontal electrodes are electrically selected, and light is emitted by the discharge generated at the points to display characters and figures. More specifically, for example, one of the two glass substrates is a front glass substrate forming a discharge part of the plasma display, and the other is a rear glass substrate forming a light emitting part of the plasma display. The front glass substrate has a large number of vertical electrodes on its inner surface, and a dielectric layer is formed on the surface on which the vertical electrodes are provided, and a protective layer is formed on the surface of the dielectric layer. On the other hand, the rear glass substrate is provided with a large number of horizontal electrodes on its inner surface, and ribs are provided so as to project between the horizontal electrodes. The ribs form a parallel (striped) or lattice-shaped pattern (referring to a picture or a pattern) on the surface of the glass substrate. By applying a voltage between the vertical electrode and the horizontal electrode, surface discharge occurs on the surfaces of the dielectric layer and the protective layer of the discharge part, and ultraviolet rays are generated. This ultraviolet ray excites the phosphor in the light emitting portion to cause the phosphor to emit light, and color display is performed by separately coating the phosphor.

【0003】現在、PDPは長寿命化、高輝度化、大型
化、高精細化の要求が高まり、この要求に対応するため
に、ブラスト加工によってガラス等の基板上に低融点ガ
ラスのリブを形成することにより、PDPのリブ幅を狭
くし且つ均一性を高め、蛍光体塗布面積を拡大するよう
開発されつつある。ちなみに、PDPは、一例としてリ
ブ幅が50μほどで、リブの高さが150〜200μ
で、リブ間の間隙が100μほどであり、全体の大きさ
が21インチのPDPが生産されており、今後40〜5
0インチほどの大きさのPDPを開発する方向にある。
Currently, PDPs are required to have long life, high brightness, large size, and high definition, and in order to meet these demands, ribs of low melting point glass are formed on a substrate such as glass by blasting. By doing so, the rib width of the PDP is narrowed, the uniformity is improved, and the phosphor coating area is being expanded. By the way, the PDP has a rib width of about 50 μ and a rib height of 150 to 200 μ, for example.
The gap between the ribs is about 100μ, and a PDP with a total size of 21 inches is produced.
There is a direction to develop a PDP with a size of about 0 inches.

【0004】これに伴って、ブラスト加工後の高精細リ
ブ間には細部に渡って研掃材がそれ自体あるいはPDP
の静電気により、あるいは高精細リブとガラス基板との
隅部に挟まれて付着しており、この研掃材は高精細リブ
間に残留するとPDPの性能に大きな悪影響を及ぼすこ
とになるので、確実に除去する必要がある。
Along with this, between the high-definition ribs after the blasting process, the polishing agent itself or the PDP is finely detailed.
Is adhered to the corners of the high-definition ribs and the glass substrate due to the static electricity of the PDP. If this polishing agent remains between the high-definition ribs, the performance of the PDP will be adversely affected. Need to be removed.

【0005】[0005]

【従来の技術】従来、ブラスト加工後の被加工物に付着
した研掃材を除去する方法としては、ブラスト加工後の
被加工物にエアーブローや超音波洗浄等を行なって被加
工物に付着した研掃材を除去していた。あるいは、エア
ーブローを行なう前に、静電気除去装置を用いてブラス
ト加工時に発生した研掃材自体や被加工物の静電気を除
去することも行われていた。
2. Description of the Related Art Conventionally, as a method of removing the abrasive cleaning material adhering to the work piece after blasting, the work piece after blasting is adhered to the work piece by performing air blow or ultrasonic cleaning. The cleaning material was removed. Alternatively, before the air blowing, the static electricity removing device is used to remove the static electricity of the polishing / cleaning material itself or the workpiece generated during the blasting.

【0006】[0006]

【発明が解決しようとする課題】ところが、被加工物の
加工面が、特にPDPの高精細リブのように凹凸の間隙
が細かい形状を成す場合、研掃材が凹部に入り込んでい
るために、このブラスト加工面にエアーブローしても凹
部の細部に至るまで確実に研掃材を除去することはでき
ないという問題点があった。
However, in the case where the processed surface of the work piece has a shape with a fine unevenness such as a high-definition rib of a PDP, the abrasive material has entered the concave portion. There is a problem in that even if air is blown onto the blasted surface, the abrasive material cannot be surely removed to the details of the recess.

【0007】また、被加工物の加工面に超音波洗浄を行
なっても、上記のエアーブローと同様に、凹部の細部に
至るまで確実に研掃材を除去することができなかった。
Further, even when ultrasonically cleaning the processed surface of the object to be processed, it is not possible to reliably remove the polishing / cleaning material down to the details of the recess, as in the case of the air blow.

【0008】このことは研掃材自体や被加工物等の静電
気を除去した後にエアーブローを行った場合も同様であ
った。
This was also the case when air blowing was performed after removing the static electricity of the polishing material itself or the workpiece.

【0009】なお、ブラスト加工した被加工物を水洗い
した場合、例えば、被加工物のブラスト加工面にノズル
からの水を噴射したとしても、単に水の噴射力では凹部
内の隅部等の狭い部分に挟まっている研掃材や、研掃材
自体や被加工物等の静電気で凹部の細部に付着している
研掃材等を除去することができなかった。
When the blasted workpiece is washed with water, for example, even if water is jetted from the nozzle onto the blasted surface of the workpiece, the jetting force of the water simply narrows the corners in the recesses. It was not possible to remove the polishing / cleaning material sandwiched between the parts, or the polishing / cleaning material attached to the details of the recess due to static electricity of the polishing / cleaning material itself or the workpiece.

【0010】本発明は叙上の問題点を解決するために開
発されたもので、その目的は、研掃材を噴射してブラス
ト加工した後、被加工物の表面に付着した研掃材を、被
加工物の加工面の細部に至るまで確実に除去する方法を
提供することにある。特に、PDPの高精細リブを形成
するためにブラスト加工した場合のように、加工面の凹
部に入り込んだ研掃材を確実に除去する方法を提供する
ことを目的とする。
The present invention was developed to solve the above problems, and its purpose is to remove the abrasive cleaning material adhering to the surface of the workpiece after the abrasive cleaning material is jetted and blasted. The object of the present invention is to provide a method for surely removing even the details of the machined surface of a workpiece. In particular, it is an object of the present invention to provide a method for surely removing a polishing / cleaning material that has entered a concave portion of a processed surface, as in the case of blast processing for forming a high-definition rib of a PDP.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するため
に、本発明の被加工物に付着した研掃材の除去方法にあ
っては、ブラスト加工した被加工物Wに水溶性粉体23
を噴射することにより、水溶性粉体23の衝突力で被加
工物に付着した研掃材21を除去し、次いで当該被加工
物を水洗いすることにより、被加工物に付着した水溶性
粉体23を水に溶解せしめて排出し除去することを特徴
とする。
In order to achieve the above object, in the method for removing the abrasive cleaning material adhering to the workpiece according to the present invention, the water-soluble powder 23 is added to the blasted workpiece W.
To remove the cleaning / cleaning material 21 adhering to the work piece by the collision force of the water-soluble powder 23, and then to wash the work piece with water, thereby removing the water-soluble powder adhering to the work piece. 23 is dissolved in water, discharged, and removed.

【0012】なお、前記被加工物は、基板上の全面に、
ブラスト性を有する低融点ガラス層12を形成し、該低
融点ガラス層12の表面にレシスト層13をパターン形
成し、前記低融点ガラス層12の表面側から研掃材21
を噴射してブラスト加工することにより、前記レジスト
層13下層の低融点ガラス層を除く低融点ガラス層12
を研削し除去してリブ14を形成したものとすることが
できる。
The work piece is formed on the entire surface of the substrate.
A low melting point glass layer 12 having a blast property is formed, a resist layer 13 is patterned on the surface of the low melting point glass layer 12, and a polishing material 21 is formed from the surface side of the low melting point glass layer 12.
By low-melting point glass layer 12 excluding the low-melting point glass layer below resist layer 13 by spraying
Can be ground and removed to form the ribs 14.

【0013】なお、前記水溶性粉体23は、硫酸ナトリ
ウム、硼酸、重曹等の水溶性の物質で成る粉体であるこ
とが好ましい。
The water-soluble powder 23 is preferably a powder made of a water-soluble substance such as sodium sulfate, boric acid and sodium bicarbonate.

【0014】また、前記水溶性粉体23は、当該水溶性
粉体23の衝突力で被加工物に付着した研掃材21を除
去可能な硬度、重量、粒径等の特性を有する粉体で成る
ものである。
Further, the water-soluble powder 23 is a powder having characteristics such as hardness, weight, and particle size that can remove the abrasive cleaning material 21 adhering to the workpiece by the collision force of the water-soluble powder 23. It consists of

【0015】さらに、上述したようにブラスト加工した
被加工物に水溶性粉体23を噴射した後、この被加工物
をエアーブローして被加工物に付着した水溶性粉体23
の大部分を除去し、次いでこの被加工物を水洗いして被
加工物に残留した水溶性粉体23を水に溶解せしめて排
出し除去することもできる。
Further, after the water-soluble powder 23 is sprayed onto the blast-processed work piece as described above, the work-piece is air blown to adhere to the work piece.
It is also possible to remove most of the above, then wash this work piece with water to dissolve the water-soluble powder 23 remaining in the work piece in water, discharge it, and remove it.

【0016】さらに、前記水溶性粉体を平均粒径10〜
35μとし、この水溶性粉体を噴射圧力1.0〜3.0
kg/cm2 で、噴射量5〜30g/minで噴射する
ことが好ましい。
Further, the water-soluble powder has an average particle size of 10 to 10.
35μ, this water-soluble powder spray pressure 1.0 ~ 3.0
It is preferable to inject at an injection amount of 5 to 30 g / min in kg / cm 2 .

【0017】[0017]

【発明の実施の形態】以下、本発明の被加工物に付着し
た研掃材の除去方法の実施の形態を説明する。被加工物
Wに研掃材21を噴射してブラスト加工すると、被加工
物には凹凸形状のブラスト加工面が形成される。このブ
ラスト加工面の凹部には研掃材21が付着し、特に、凹
部の間隙が狭い場合には研掃材21が凹部内に入り込ん
だり、凹部の隅部に挟まれた状態になる。このようなブ
ラスト加工面にエアーブローすると、大部分の研掃材2
1が凹部の外方へ除去されるが、全てを除去することが
できず凹部内に残留する。しかし、この被加工物のブラ
スト加工面に好ましくは、前記研掃材以下の粒径から成
る水溶性粉体23を噴射することにより、水溶性粉体2
3が研掃材21に衝突し、その衝突力により研掃材21
が凹部外へ確実に弾き飛ばされて除去され、研掃材21
と入れ替えに水溶性粉体23が凹部内に付着する。この
ような状態の被加工物を水洗いすることにより、水溶性
粉体23が硫酸ナトリウム、硼酸、重曹等の水溶性の物
質で成る粉体であるので、凹部の間隙が狭い場合であっ
ても凹部内や他の面に付着した水溶性粉体23は全て水
に溶解し、水と共に排出される。また、研掃材が微量に
残留していたとしても、この研掃材は上記工程の水洗い
により溶けた粉体と共に流される。
BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of a method for removing a polishing / cleaning material adhering to a workpiece according to the present invention will be described below. When the abrasive cleaning material 21 is sprayed onto the work W to be blasted, a blasted surface having an uneven shape is formed on the work. The polishing / cleaning material 21 adheres to the concave portion of the blasted surface, and particularly when the clearance of the concave portion is narrow, the polishing / cleaning material 21 enters the concave portion or is sandwiched between the corners of the concave portion. When air blow is applied to such a blasted surface, most of the abrasives 2
Although 1 is removed to the outside of the concave portion, all cannot be removed and remains in the concave portion. However, the water-soluble powder 2 is preferably sprayed onto the blasted surface of the workpiece by spraying the water-soluble powder 23 having a particle size equal to or smaller than the abrasive material.
3 collides with the abrasive cleaning material 21, and the collision force causes the abrasive cleaning material 21
Are reliably blown out of the recesses and removed.
The water-soluble powder 23 adheres to the inside of the recess instead. By washing the work piece in such a state with water, the water-soluble powder 23 is a powder made of a water-soluble substance such as sodium sulfate, boric acid, or baking soda. All of the water-soluble powder 23 attached to the inside of the recess or to the other surface is dissolved in water and discharged together with the water. Further, even if a trace amount of the polishing / cleaning material remains, this polishing / cleaning material is flowed together with the powder dissolved by the water washing in the above step.

【0018】以上のようにして、ブラスト加工により被
加工物に付着した研掃材21は容易にすべて確実に除去
される。
As described above, all of the abrasives 21 attached to the workpiece by the blasting are easily and surely removed.

【0019】なお、前記被加工物としては、PDPのリ
ブをブラスト加工により高精細にパターン形成する場合
を一例として上げることができる。このPDPは基板上
の全面に、ブラスト性を有する低融点ガラス層12を形
成し、該低融点ガラス層12の表面にレシスト層13を
パターン形成し、前記低融点ガラス層12の表面側から
研掃材21を噴射してブラスト加工することにより、前
記レジスト層13下層の低融点ガラス層を除く低融点ガ
ラス層12を研削し除去してリブ14を形成し、上記除
去処理を行い、次いで、該リブ14の低融点ガラスを焼
成して高精細リブを形成するものである。本実施の形態
としては、前記リブ14の低融点ガラスを焼成する前の
状態、つまり前記低融点ガラス層12の表面側から研掃
材21を噴射してブラスト加工してリブ14を形成した
状態のPDPを被加工物とすることができ、本発明の被
加工物に付着した研掃材の除去方法はPDPのリブ14
のような凹凸の間隙が狭い形状を成す被加工物に対して
は特に有効な方法となる。
The object to be processed may be, for example, a case in which ribs of a PDP are formed in a fine pattern by blasting. In this PDP, a low melting point glass layer 12 having a blast property is formed on the entire surface of a substrate, and a resist layer 13 is patterned on the surface of the low melting point glass layer 12, and the low melting point glass layer 12 is polished from the surface side. The low melting point glass layer 12 excluding the low melting point glass layer under the resist layer 13 is ground and removed by spraying the cleaning material 21 to blast the ribs 14 to form the ribs 14. The low melting point glass of the ribs 14 is fired to form high definition ribs. In the present embodiment, the state before the low melting point glass of the rib 14 is fired, that is, the state in which the polishing agent 21 is sprayed from the surface side of the low melting point glass layer 12 and blasted to form the rib 14 is formed. The PDP can be used as the work piece, and the method for removing the abrasive cleaning material adhering to the work piece of the present invention is the rib 14 of the PDP.
This is a particularly effective method for a work piece having a shape in which the unevenness has a narrow gap.

【0020】なお、水溶性粉体23は、研掃材21の硬
度、重量、粒径等の特性に応じて選定し、つまり当該水
溶性粉体23の衝突力で被加工物に付着した研掃材21
を除去可能な硬度、重量、粒径等の特性を有する粉体を
選定することが、被加工物に付着した研掃材21を確実
に除去するという点で好ましい。
The water-soluble powder 23 is selected according to the hardness, weight, particle size and other characteristics of the abrasive material 21, that is, the impact force of the water-soluble powder 23 adheres to the workpiece. Cleaning material 21
It is preferable to select a powder having characteristics such as hardness, weight, and particle size capable of removing the cleaning and cleaning material 21 adhering to the workpiece.

【0021】さらに、上述したように被加工物をエアー
ブローして被加工物に付着した水溶性粉体23の大部分
を除去することは、被加工物に残留する水溶性粉体23
が少なくなるので、次工程では被加工物に残留した水溶
性粉体23が速やかに水に溶解され排出される。
Further, as described above, removing the majority of the water-soluble powder 23 adhering to the workpiece by air-blowing the workpiece allows the water-soluble powder 23 remaining on the workpiece to be removed.
Therefore, in the next step, the water-soluble powder 23 remaining on the workpiece is quickly dissolved in water and discharged.

【0022】[0022]

【実施例】以下、本発明の被加工物に付着した研掃材の
除去方法の実施の形態を、ブラスト加工によりPDPの
基板上に高精細リブを形成した場合の被加工物に付着し
た研掃材の除去方法を例にとって、図面を参照して説明
する。
EXAMPLE An embodiment of a method for removing a polishing / cleaning material adhering to a work piece according to the present invention will be described below with reference to a grinding method attached to a work piece when high-definition ribs are formed on a PDP substrate by blasting. The method of removing the cleaning material will be described with reference to the drawings.

【0023】図1は、PDPの高精細リブをブラスト加
工により形成する工程を(a)〜(h)の順に示す。
FIG. 1 shows steps (a) to (h) for forming a high-definition rib of a PDP by blasting.

【0024】図1(a)では、ガラス基板11が平面で
大きさ1000×600mm、厚さ3mmを成し、ガラ
ス基板11の片面の表面には150μの間隔で平行なス
トライプ状をなす多数の電極15を印刷形成している。
このガラス基板11の電極15側の全表面に、セルロー
ス系又はアクリル系樹脂をバインダーとした低融点ガラ
スペーストをコータでコーティングし乾燥、固化して低
融点ガラス層12を形成する。
In FIG. 1A, the glass substrate 11 has a flat size of 1000 × 600 mm and a thickness of 3 mm, and one surface of the glass substrate 11 has a large number of parallel stripes at intervals of 150 μm. The electrode 15 is formed by printing.
The entire surface of the glass substrate 11 on the electrode 15 side is coated with a low-melting point glass paste using a cellulosic or acrylic resin as a binder, dried and solidified to form the low-melting point glass layer 12.

【0025】低融点ガラス層12は、基板上にスクリー
ン印刷法で低融点ガラスペーストを塗布し、乾燥後15
分放置し、脱法後に150℃出15分乾燥させ、本実施
例では、12回刷り重ねして印刷形成した。
The low-melting-point glass layer 12 is formed by applying a low-melting-point glass paste on a substrate by a screen printing method and drying it 15
It was left for a minute, and after the method was removed, it was dried at 150 ° C. for 15 minutes, and in this example, it was formed by printing 12 times.

【0026】低融点ガラス層12はセルロース系樹脂ま
たはアクリル系樹脂をバインダーとした低融点ガラスペ
ーストから形成したので、ブラスト加工による研削性
(以下、本明細書では「ブラスト性」という)が極めて
良好である。
Since the low melting point glass layer 12 is formed from a low melting point glass paste using a cellulosic resin or an acrylic resin as a binder, the grindability by blasting (hereinafter referred to as "blasting property" in this specification) is extremely good. Is.

【0027】図1(b)では、低融点ガラス層12の全
表面に、デキストリンで成る水溶性樹脂層18を厚さ3
μで塗布、乾燥する。この水溶性樹脂層18の全表面
に、アクリル系樹脂をバインダーとした耐ブラスト性低
融点ガラスペーストに感光材(フォトレジスト)を混入
した感光性を有する耐ブラスト性低融点ガラスペースト
16を厚さ27μで塗布し乾燥した後、ネガフィルム1
7を当て露光する。
In FIG. 1B, a water-soluble resin layer 18 made of dextrin having a thickness of 3 is formed on the entire surface of the low melting point glass layer 12.
Apply with μ and dry. On the entire surface of the water-soluble resin layer 18, a blast resistant low melting point glass paste 16 having photosensitivity is prepared by mixing a photosensitive material (photoresist) into a blast resistant low melting point glass paste using an acrylic resin as a binder. Negative film 1 after coating with 27μ and drying
7 is applied for exposure.

【0028】前記低融点ガラスペースト及び耐ブラスト
性低融点ガラスペーストは共に後述する工程で焼成して
も各バインダーのカーボン、タールがリブ14に残渣し
ない、完全燃焼するものを用いる。
As the low melting point glass paste and the blast resistant low melting point glass paste, those which completely burn without causing carbon and tar of each binder to remain on the ribs 14 even if they are fired in the step described later are used.

【0029】もしくは、水溶性樹脂層18を用いずに、
耐ブラスト性低融点ガラスペースト16に東京応化工業
(株)製オーデイルBF603をラミネートし、露光、
現像を行いガラスペースト上にパターンを形成した。現
像液は、炭酸ナトリウム0.2%水溶液を使用する〔図
1(c)〕。
Alternatively, without using the water-soluble resin layer 18,
Oblast BF603 manufactured by Tokyo Ohka Kogyo Co., Ltd. is laminated on the blast-resistant low-melting glass paste 16 and exposed.
Development was performed to form a pattern on the glass paste. A 0.2% aqueous solution of sodium carbonate is used as the developing solution [FIG. 1 (c)].

【0030】なお、本実施例のレジスト層13のパター
ンは幅50μで間隔100μの平行なストライプ状をな
しており、ガラス基板11の表面上の電極15がレジス
ト層13の間隔100μ間のほぼ中央に位置するように
配置している。
The pattern of the resist layer 13 of this embodiment is in the form of parallel stripes having a width of 50 μ and a gap of 100 μ, and the electrode 15 on the surface of the glass substrate 11 is almost in the center between the gaps of 100 μ of the resist layer 13. It is arranged to be located in.

【0031】図1(d)では、上記のガラス基板11の
低融点ガラス層12及びレジスト層13の表面側から、
ブラスト加工装置を用いてガラス基板11より低硬度の
研掃材21を噴射してレジスト層13の下層の低融点ガ
ラス層12以外の部分の低融点ガラス層12を研削して
除去し、リブ14を形成する。リブ14は幅50μ、高
さ200μで、各リブ14間の間隔は100μである。
ちなみに、研掃材は本実施例ではガラスビーズを使用し
ているが、炭酸カルシウムも研掃材として好ましい。
In FIG. 1D, from the surface side of the low melting point glass layer 12 and the resist layer 13 of the above glass substrate 11,
A blasting machine is used to spray a polishing agent 21 having a hardness lower than that of the glass substrate 11 to grind and remove the low melting point glass layer 12 other than the low melting point glass layer 12 below the resist layer 13, and to remove the ribs 14. To form. The ribs 14 have a width of 50 μ and a height of 200 μ, and the distance between the ribs 14 is 100 μ.
By the way, although glass beads are used as the abrasive in this embodiment, calcium carbonate is also preferable as the abrasive.

【0032】ブラスト加工後のPDPは、多数の研掃材
21がリブ14間に入り込んでいる。つまり、研掃材2
1はリブ14の壁面や、リブ14とガラス基板11との
隅部や、ガラス基板11及び電極15上に多数付着して
いる。本実施例では後述するように研掃材21の平均粒
径が20μであるのに対してリブ14間の間隔が100
μであるので、このように幅狭のリブ14間には研掃材
21が入り込みやすい状態にある。一般に、ブラスト加
工後の被加工物の表面をエアーブローすることにより、
被加工物の表面に付着した研掃材は殆ど除去されるので
あるが、上記のPDPの高精細リブのように幅狭の凹凸
に形成したブラスト加工面にあっては、エアーブローに
より凹部内に入り込んだ研掃材を完全に除去することは
難しい。
In the PDP after the blasting, a large number of abrasive cleaning materials 21 are inserted between the ribs 14. In other words, polishing agent 2
Many 1 are attached to the wall surfaces of the ribs 14, the corners between the ribs 14 and the glass substrate 11, the glass substrate 11 and the electrodes 15. In this embodiment, as will be described later, the average particle diameter of the polishing / cleaning material 21 is 20 μ, while the spacing between the ribs 14 is 100 μm.
Since it is μ, the polishing and cleaning material 21 easily enters between the narrow ribs 14 as described above. Generally, by air blowing the surface of the workpiece after blasting,
Almost all of the polishing material adhering to the surface of the work piece is removed. However, for the blasting surface formed with narrow irregularities such as the high-definition rib of the PDP, the inside of the recess is blown by air blow. It is difficult to completely remove the abrasive cleaning agent that has entered.

【0033】以下に、本実施例で使用するブラスト加工
装置40を図面を参照して説明する。
The blasting device 40 used in this embodiment will be described below with reference to the drawings.

【0034】図2において、41はブラスト加工装置の
本体で、本体41の上面に被加工物を図2の紙面上右か
ら左へ搬送する多数の搬送ローラ42を設け、下部には
図示せざるホッパを設け、該ホッパの最下端は導管51
を介して分離タンク52の上部に連通している。
In FIG. 2, reference numeral 41 designates the main body of the blasting machine, and a large number of conveying rollers 42 for conveying the workpiece from right to left on the paper surface of FIG. A hopper is provided, and the bottom end of the hopper is the conduit 51.
Through the upper part of the separation tank 52.

【0035】前記本体41上には密閉式のブラスト加工
室43を設け、このブラスト加工室43内には研掃材を
搬送ローラ42で搬送された被加工物、すなわちガラス
基板11の表面に低融点ガラス層12とレジスト層13
を形成した被加工物の低融点ガラス層12とレジスト層
13の表面側に向けて噴射し且つ被加工物の搬送方向に
直交する方向に往復移動する噴射ノズル44を6本設け
ている。各噴射ノズル44は拡散型の噴射ノズルで、研
掃材の噴射形状を通常の2.5倍に拡散するもので、被
加工物の搬送速度及び各噴射ノズル44の移動速度の組
合せによるブラスト加工速度を上げてもブラスト加工の
均一性を維持できる。
A closed blasting chamber 43 is provided on the main body 41, and in the blasting chamber 43, the cleaning and cleaning material is conveyed to the workpiece, that is, the surface of the glass substrate 11 by the conveying roller 42. Melting point glass layer 12 and resist layer 13
Six jet nozzles 44 for jetting toward the surface side of the low-melting point glass layer 12 and the resist layer 13 of the processed workpiece and reciprocating in the direction orthogonal to the conveying direction of the processed workpiece are provided. Each of the injection nozzles 44 is a diffusion-type injection nozzle that diffuses the injection shape of the polishing / cleaning material to 2.5 times the normal shape. Even if the speed is increased, the blasting uniformity can be maintained.

【0036】被加工物の搬送方向でブラスト加工室43
の前後には静電気除去装置45、45を設け、且つ被加
工物の搬送方向上流側には被加工物に付着した研掃材を
エアを吹き付けて除去する所謂アフターブローのための
エアーブロー室46を設けている。
The blasting chamber 43 is arranged in the conveying direction of the workpiece.
Before and after the static electricity removing devices 45, 45, and an air blow chamber 46 for so-called after-blowing that blows air to remove the abrasive material attached to the workpiece on the upstream side in the conveying direction of the workpiece. Is provided.

【0037】56は研掃材噴射量制御機構で、研掃材の
噴射量をデジタル化したもので、所望の研掃材噴射量を
デジタルで自在に設定できる。各噴射ノズル44に圧縮
空気を供給すると各噴射ノズル44と研掃材タンク55
に連通する管内が負圧になるため、研掃材タンク55内
の研掃材は研掃材タンク55の下端に連通する研掃材自
動供給装置57を経て異物除去装置58へ送られ、この
異物除去装置58内で50μ以上の大きさの異物が除去
され、噴射ノズル44へ供給され噴射する。なお、前記
異物除去装置58と噴射ノズル44間に研掃材量検知セ
ンサー59を設け、この研掃材量検知センサー59では
通過する研掃材の量を検知し、研掃材の噴射量が表示さ
れる。
Reference numeral 56 is a polishing / cleaning material injection amount control mechanism, which is a digitalized injection amount of the polishing / cleaning material, and a desired polishing / cleaning material injection amount can be freely set digitally. When compressed air is supplied to each jet nozzle 44, each jet nozzle 44 and the abrasive cleaning material tank 55
Since a negative pressure is generated in the pipe communicating with the polishing / cleaning material tank 55, the polishing / cleaning material in the polishing / cleaning material tank 55 is sent to the foreign matter removing device 58 via the automatic polishing / cleaning material supply device 57 communicating with the lower end of the polishing / cleaning material tank 55. A foreign matter having a size of 50 μm or more is removed in the foreign matter removing device 58, and the foreign matter is supplied to the ejection nozzle 44 and ejected. A polishing / cleaning material amount detection sensor 59 is provided between the foreign matter removing device 58 and the injection nozzle 44. The polishing / cleaning material amount detection sensor 59 detects the amount of the polishing / cleaning material passing therethrough, and Is displayed.

【0038】ガラス基板11の表面に低融点ガラス層1
2とレジスト層13を形成した被加工物を本体41上の
搬送装置の搬送ローラ42に載置し、前記被加工物を図
2の紙面上右から左へ搬送し、静電気除去装置45で被
加工物の静電気が除去され、ブラスト加工室43内へ搬
送される。このブラスト加工室43内で噴射ノズル44
から被加工物の低融点ガラス層12とレジスト層13の
表面側から研掃材を噴射することにより、レジスト層1
3の下層の低融点ガラス層12はレジスト層13で保護
されるので研掃材で研削ないし彫刻されないが、レジス
ト層13の下層の低融点ガラス層12以外の部分の低融
点ガラス層12はすべて研削され除去される。しかし、
研掃材がガラス基板11の材料より低硬度のガラスピー
ズであるので、ガラス基板11は研掃材によって研削さ
れない。したがって、結果としてレジスト層13のパタ
ーンの通り、幅50μ、高さ200μの複数のリブ14
が、各リブ14間の間隔100μで平行なストライプ状
に形成される。
The low melting point glass layer 1 is formed on the surface of the glass substrate 11.
2 and the work piece having the resist layer 13 formed thereon are placed on the carrying roller 42 of the carrying device on the main body 41, the work piece is carried from the right side to the left side on the paper surface of FIG. The static electricity of the workpiece is removed, and the workpiece is conveyed into the blast processing chamber 43. In the blasting chamber 43, the injection nozzle 44
From the low melting point glass layer 12 and the resist layer 13 of the workpiece to be sprayed with a cleaning agent from the surface side, the resist layer 1
Since the lower melting point glass layer 12 of 3 is protected by the resist layer 13, it is not ground or engraved with an abrasive, but all the low melting point glass layers 12 other than the lower melting point glass layer 12 of the resist layer 13 are not covered. Grinded and removed. But,
Since the abrasive material is glass peas having a hardness lower than that of the material of the glass substrate 11, the glass substrate 11 is not ground by the abrasive material. Therefore, as a result, according to the pattern of the resist layer 13, a plurality of ribs 14 having a width of 50 μ and a height of 200 μ are formed.
Are formed in parallel stripes with an interval of 100 μ between each rib 14.

【0039】上記のブラスト加工条件は下表のようにな
る。
The above blasting conditions are as shown in the table below.

【0040】[0040]

【表1】 [Table 1]

【0041】噴射ノズル44から被加工物へ噴射した研
掃材は下方のホッパへ落下し、ホッパの下端から導管5
1内に生じている気流に乗って分離タンク52へ運ば
れ、この分離タンク52内で研掃材の中に混入した10
0μ以上の大きさの異物が除去され、次いで連通管53
を介してサイクロン54へ送給される。なお、ブラスト
加工装置40内の気流は集塵装置62内の排風機により
空気が吸引されて生じる。すなわち、気流は順にホッ
パ、導管51、分離タンク52、連通管53、サイクロ
ン54、ダクト61、集塵装置62へ流れる。前記サイ
クロン54で再使用可能な研掃材と、破砕された研掃材
及び被加工物から研削された低融点ガラス層12の破片
でなる粉塵とを分級する。再使用可能な研掃材はサイク
ロン54の下部に滞留し、一方、前記粉塵はサイクロン
54内の中央を気流に乗って上昇し上部中央に連通する
ダクト61を介して集塵装置62へ送給され、集塵装置
62で集塵され清浄なエアが大気中へ排出される。な
お、サイクロン54の下部に滞留した研掃材はサイクロ
ン54の下端に連結する研掃材タンク55内へ落下す
る。研掃材タンク55内の研掃材は前述したように噴射
ノズル44へ再び供給され噴射される。研掃材は以上の
工程を繰り返して噴射ノズル44から被加工物へ噴射さ
れる。
The abrasive cleaning material sprayed from the spray nozzle 44 onto the workpiece drops into the lower hopper, and the conduit 5 is fed from the lower end of the hopper.
10 was carried to the separation tank 52 by the air flow generated in the No. 1 and mixed in the polishing and cleaning material in the separation tank 52.
Foreign matter having a size of 0 μ or more is removed, and then the communication pipe 53
It is delivered to the cyclone 54 via. The airflow in the blasting device 40 is generated by the suction of air by the air exhaust device in the dust collector 62. That is, the airflow sequentially flows to the hopper, the conduit 51, the separation tank 52, the communication pipe 53, the cyclone 54, the duct 61, and the dust collector 62. The reusable abrasive cleaning material is classified by the cyclone 54, and the crushed abrasive cleaning material and dust formed of fragments of the low melting point glass layer 12 ground from the workpiece are classified. The reusable abrasive cleaning material stays in the lower part of the cyclone 54, while the dust rises in the center of the cyclone 54 by the air flow and is sent to the dust collector 62 via the duct 61 communicating with the upper center. Then, dust is collected by the dust collector 62 and clean air is discharged into the atmosphere. The polishing / cleaning material accumulated in the lower portion of the cyclone 54 falls into the polishing / cleaning material tank 55 connected to the lower end of the cyclone 54. The polishing / cleaning material in the polishing / cleaning material tank 55 is again supplied to the spray nozzle 44 and sprayed as described above. The abrasive material is sprayed from the spray nozzle 44 onto the workpiece by repeating the above steps.

【0042】図1(e)では、ブラスト加工後の被加工
物の表面に水溶性粉体23を噴射ノズル47から噴射
し、研掃材21を除去する。図1(e)は、被加工物の
表面の上方に配置した2本の噴射ノズル47を横方向へ
走行させている状態を図示しており、水溶性粉体23の
衝突力によりPDPのリブ14間の研掃材21が確実に
はじき出されて除去され、その代わりに噴射された水溶
性粉体23がリブ14間に入り込んだ状態になる。つま
り、研掃材21が水溶性粉体23に入れ替わる。ちなみ
に、水溶性粉体23は本実施例では無水硫酸ナトリウム
を使用しているが、水溶性の物質で成り、被加工物の表
面に付着した研掃材21を除去できる硬度、重量、粒径
等の特性を有する粉体であればよく、硫酸ナトリウム、
硼酸、重曹等の水溶性の物質で成る粉体を水溶性粉体2
3として用いることができる。つまり、水溶性粉体23
が研掃材21に衝突した時に、研掃材21をはじき飛ば
すだけの硬さ、重量、大きさ等の特性を有する水溶性粉
体である。例えば、水溶性粉体23が研掃材21より硬
度が低いものであっても、粒径あるいは重量が大きくて
水溶性粉体23をはじき飛ばすだけの衝突力があればよ
い。したがって、水溶性粉体は研掃材の粒径、重量、硬
度等の特性に応じて選定することができる。
In FIG. 1 (e), the water-soluble powder 23 is jetted from the jet nozzle 47 onto the surface of the workpiece after the blasting, and the polishing / cleaning material 21 is removed. FIG. 1E shows a state in which two jet nozzles 47 arranged above the surface of the workpiece are running laterally, and the ribs of the PDP are caused by the collision force of the water-soluble powder 23. The abrasive cleaning material 21 between the fourteen is reliably ejected and removed, and the water-soluble powder 23 jetted in place thereof enters into the space between the ribs 14. That is, the abrasive material 21 is replaced with the water-soluble powder 23. By the way, although the water-soluble powder 23 uses anhydrous sodium sulfate in the present embodiment, it is made of a water-soluble substance and has hardness, weight, and particle size capable of removing the abrasive cleaning material 21 adhering to the surface of the workpiece. Any powder having characteristics such as sodium sulfate,
A powder made of a water-soluble substance such as boric acid or sodium bicarbonate is used as a water-soluble powder 2
3 can be used. That is, the water-soluble powder 23
Is a water-soluble powder having properties such as hardness, weight, size, and the like that repels the abrasive cleaning material 21 when it collides with the abrasive cleaning material 21. For example, even if the water-soluble powder 23 has a hardness lower than that of the polishing / cleaning material 21, the particle size or weight is large and the collision force is sufficient to repel the water-soluble powder 23. Therefore, the water-soluble powder can be selected according to the characteristics such as the particle size, weight and hardness of the abrasive.

【0043】本実施例では噴射ノズル47は前述したブ
ラスト加工装置40の噴射ノズル44より被加工物の搬
送方向の前方に設けており、噴射ノズル47の下方には
図示せざるホッパを設けている。水溶性粉体23の噴射
及び回収機構は、基本的には前述したブラスト加工装置
40と同様の機構であるが、ホッパ、導管、サイクロン
等の回収タンク、この回収タンクから水溶性粉体23を
噴射ノズル47へ送給する機構、回収タンクから粉塵を
集塵装置へ排出する機構等の基本的な機構で構成され、
前述したブラスト加工装置40より簡単な機構でよい。
In this embodiment, the injection nozzle 47 is provided in front of the injection nozzle 44 of the blast processing device 40 in the conveying direction of the workpiece, and below the injection nozzle 47, a hopper (not shown) is provided. . The injection and recovery mechanism of the water-soluble powder 23 is basically the same as that of the blasting device 40 described above, but the recovery tank for the hopper, the conduit, the cyclone, etc., and the water-soluble powder 23 are collected from the recovery tank. It is composed of a basic mechanism such as a mechanism for feeding to the injection nozzle 47, a mechanism for discharging dust from the recovery tank to the dust collector,
A simpler mechanism than the blasting device 40 described above may be used.

【0044】なお、水溶性粉体23の噴射及び回収機構
としては、前述したブラスト加工装置40を併用するこ
ともできるがPDPの生産ラインでは生産効率を上げる
ため上記のようにブラスト加工装置40とは別途設ける
ことが望ましく、また、所謂他のブラスト装置を水溶性
粉体23の噴射及び回収機構として流用して設置するこ
とができ、特に限定されるものではない。
The above-mentioned blasting device 40 may be used together as a mechanism for injecting and collecting the water-soluble powder 23, but in the PDP production line, the blasting device 40 and the blasting device 40 are used as described above in order to increase production efficiency. Is preferably provided separately, and a so-called other blasting device can be installed as a spraying and collecting mechanism for the water-soluble powder 23, and is not particularly limited.

【0045】本実施例では、水溶性粉体23の噴射条件
は下表のようになる。
In this embodiment, the conditions for spraying the water-soluble powder 23 are as shown in the table below.

【0046】[0046]

【表2】 [Table 2]

【0047】図1(f)では、被加工物はエアーブロー
室46(図2)へ送られる。本実施例ではエアーブロー
室46へ送られる途中、静電気除去装置45で被加工物
の静電気が除去される。エアーブロー室46内では被加
工物の表面に付着した水溶性粉体23を除去するために
ノズルからエアが被加工物に吹き付けられるが、実際に
はエアーブローでは図1(f)に示すようにリブ14間
に入り込んだ水溶性粉体23は残留してしまう状態であ
る。
In FIG. 1 (f), the workpiece is sent to the air blow chamber 46 (FIG. 2). In the present embodiment, the static electricity of the workpiece is removed by the static electricity removing device 45 while being sent to the air blow chamber 46. In the air blow chamber 46, air is blown from the nozzle to the work in order to remove the water-soluble powder 23 adhering to the surface of the work, but in actuality, in the air blow, as shown in FIG. 1 (f). The water-soluble powder 23 that has entered between the ribs 14 remains.

【0048】このエアーブローの工程では水溶性粉体2
3が被加工物の表面から完全に除去されないが、水溶性
粉体23が少なくなるので次工程の水洗いで水溶性粉体
23を除去するのに容易になるという点で、このエアー
ブローの工程を設けることは好ましい。
In this air blowing process, the water-soluble powder 2
3 is not completely removed from the surface of the work piece, but the amount of the water-soluble powder 23 is small, so that it is easy to remove the water-soluble powder 23 in the next step of washing with water. Is preferably provided.

【0049】図1(g)では、エアーブロー室46(図
2)を通過して搬送されたPDPは、エアーブロー室4
6より被加工物の搬送方向の前方に設けた洗浄室48
(図2)内で、PDPの表面に水をノズルから噴射して
水洗いをする。リブ14間の水溶性粉体23は全て水に
溶解し水と共に排出される。これにより、PDPに付着
した水溶性粉体23は確実に除去される。
In FIG. 1G, the PDP that has been conveyed through the air blow chamber 46 (FIG. 2) has the air blow chamber 4
Cleaning chamber 48 provided in front of the workpiece 6 in the conveying direction
In (Fig. 2), water is sprayed from the nozzle onto the surface of the PDP to wash it. The water-soluble powder 23 between the ribs 14 is completely dissolved in water and discharged together with the water. As a result, the water-soluble powder 23 attached to the PDP is surely removed.

【0050】なお、本実施例ではPDPの生産ライン上
に設けた洗浄室48内で水をノズルから噴射するように
したが、単に流水でPDPの表面上を洗浄したり、ある
いは洗浄室48内に水槽を設け、この水槽内にPDPを
水没して水洗いをするなど、他の方法で水洗することが
できる。また、水溶性粉体23を噴射して研掃材21を
除去した後のPDP〔図1(e)〕、あるいはエアーブ
ロー後のPDP〔図1(f)〕は、別途に設けたノズル
からの噴射流や流水あるいは水槽等の洗浄装置で水洗し
てPDPから水溶性粉体23を溶解し除去することもで
きる。
In this embodiment, the water is jetted from the nozzle in the cleaning chamber 48 provided on the PDP production line, but the surface of the PDP is simply washed with running water, or the inside of the cleaning chamber 48 is cleaned. A water tank may be provided in the water tank, and the PDP may be submerged in the water tank and washed with water by another method. In addition, the PDP after the water-soluble powder 23 is sprayed to remove the cleaning and cleaning material 21 [FIG. 1 (e)] or the PDP after air blowing [FIG. 1 (f)] is discharged from a nozzle provided separately. It is also possible to dissolve and remove the water-soluble powder 23 from the PDP by rinsing with a jet stream of water, running water, or a washing device such as a water tank.

【0051】図1(h)では、以上のように、ガラス基
板11の表面にリブ14を形成した被加工物は、低融点
ガラスの鉛ガラスが完全に溶融してバインダーが焼却す
る温度まで徐々に加熱することにより、リブ14を構成
する低融点ガラス層12とレジスト層13の各バインダ
ーを完全に燃焼し且つ低融点ガラスを溶解して焼成しリ
ブ14が形成される。なお、リブ14間の間隙に研掃材
が残留していると、この焼成工程の加熱により研掃材が
溶解するなどしてPDPの表面に付着し、製品の性能に
悪影響を及ぼすという事態が生じるが、本発明の除去方
法により研掃材がリブ14間に残留していないので高品
質のPDPが形成される。
In FIG. 1 (h), as described above, the work piece having the ribs 14 formed on the surface of the glass substrate 11 is gradually heated to a temperature at which the lead glass of the low melting point glass is completely melted and the binder is incinerated. By heating to a low temperature, the binders of the low-melting-point glass layer 12 and the resist layer 13 forming the ribs 14 are completely burned and the low-melting-point glass is melted and fired to form the ribs 14. Note that if the cleaning / cleaning material remains in the gaps between the ribs 14, the cleaning / melting / cleaning material is melted by the heating in the baking step and adheres to the surface of the PDP, which adversely affects the performance of the product. Although generated, the removal method of the present invention forms a high-quality PDP because the abrasive material does not remain between the ribs 14.

【0052】なお、上記の例はPDPの高精細リブをブ
ラスト加工により形成する場合を例にとって、被加工物
のブラスト加工面に付着した研掃材を確実に除去する方
法を説明したが、本発明の被加工物の付着した研掃材の
除去方法はブラスト加工した成品全般に対して広く適用
されるものである。
In the above example, the method for surely removing the abrasive cleaning material adhering to the blasted surface of the workpiece is explained by taking the case where the high-definition rib of the PDP is formed by the blasting as an example. The method of removing the abrasive cleaning material adhering to the work piece of the present invention is widely applied to all blasted products.

【0053】[0053]

【発明の効果】本発明は、以上説明したように構成され
ているので、以下に記載されるような効果を奏する。
Since the present invention is configured as described above, it has the following effects.

【0054】被加工物に研掃材を噴射してブラスト加工
し、この被加工物に水溶性粉体を噴射することにより、
水溶性粉体の衝突力で被加工物に付着した研掃材を除去
し、当該被加工物を水洗いすることにより、被加工物に
付着した水溶性粉体を水に溶解せしめて排出し除去する
ことを特徴とするので、被加工物の加工面が凹凸の間隙
が狭い形状を成す場合であっても、凹部に入り込んで付
着した研掃材を確実に除去する方法を提供できた。
By spraying a blasting material on the work piece to perform blasting, and by spraying a water-soluble powder on the work piece,
By removing the cleaning material adhering to the work piece by the collision force of the water-soluble powder and washing the work piece with water, the water-soluble powder adhering to the work piece is dissolved in water and discharged. Therefore, even when the processed surface of the workpiece has a shape with a narrow gap between the concavities and convexities, it is possible to provide a method for surely removing the abrasive cleaning material that has entered the recesses and attached.

【0055】また、ブラスト加工した被加工物に水溶性
粉体を噴射した後、この被加工物をエアーブローするこ
とにより、被加工物に付着した水溶性粉体の大部分を除
去するため、被加工物に残留した水溶性粉体が少なくな
る。したがって、この被加工物を水洗いすることによ
り、被加工物に残留した水溶性粉体を容易に水に溶解せ
しめて排出し効率よく除去することができた。
In addition, since the water-soluble powder is sprayed onto the blasted work piece and then the work piece is blown with air, most of the water-soluble powder attached to the work piece is removed. Less water-soluble powder remains on the work piece. Therefore, by washing this work piece with water, the water-soluble powder remaining on the work piece could be easily dissolved in water, discharged, and efficiently removed.

【0056】加えて、上述の様に、きわめて高品質のP
DPを形成することができる。
In addition, as described above, P of extremely high quality is used.
A DP can be formed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例のPDPの製造工程を示す説明
図である。
FIG. 1 is an explanatory diagram showing a manufacturing process of a PDP according to an embodiment of the present invention.

【図2】本発明の実施例に使用するブラスト加工装置等
を含むPDPの生産ラインを示す正面図である。
FIG. 2 is a front view showing a PDP production line including a blasting apparatus and the like used in an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

11 ガラス基板 12 低融点ガラス層 13 レジスト層 14 リブ 15 電極 16 耐ブラスト性低融点ガラスペースト(感光性を有
する) 17 ネガフィルム 18 水溶性樹脂層 21 研掃材21 23 水溶性粉体23 40 ブラスト加工装置 41 本体 42 搬送ローラ 43 ブラスト加工室 44 噴射ノズル 45 静電気除去装置 46 エアーブロー室 47 噴射ノズル47 48 洗浄室48 51 導管 52 分離タンク 53 連通管 54 サイクロン 55 研掃材タンク 56 研掃材噴射量制御機構 57 研掃材自動供給装置 58 異物除去装置 59 研掃材量検知センサー 61 ダクト 62 集塵装置
11 glass substrate 12 low melting point glass layer 13 resist layer 14 rib 15 electrode 16 blast resistance low melting point glass paste (having photosensitivity) 17 negative film 18 water soluble resin layer 21 polishing agent 21 23 water soluble powder 23 40 blast Processing device 41 Main body 42 Conveying roller 43 Blast processing chamber 44 Injection nozzle 45 Static electricity removing device 46 Air blow chamber 47 Injection nozzle 47 48 Cleaning chamber 48 51 Conduit 52 Separation tank 53 Communication pipe 54 Cyclone 55 Abrasive cleaning agent tank 56 Abrasive cleaning agent injection Quantity control mechanism 57 Abrasive cleaning material automatic supply device 58 Foreign matter removing device 59 Abrasive cleaning material amount detection sensor 61 Duct 62 Dust collector

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 ブラスト加工した被加工物に水溶性粉体
を噴射することにより、水溶性粉体の衝突力で被加工物
に付着した研掃材を除去し、次いで当該被加工物を水洗
いすることにより、被加工物に付着した水溶性粉体を水
に溶解せしめて排出し除去することを特徴とする被加工
物に付着した研掃材の除去方法。
1. A blasting-processed workpiece is sprayed with a water-soluble powder to remove the abrasive material adhering to the workpiece by the collision force of the water-soluble powder, and then the workpiece is washed with water. By doing so, the water-soluble powder adhering to the work piece is dissolved in water, discharged, and removed, thereby removing the abrasive cleaning material adhering to the work piece.
【請求項2】 前記被加工物は、基板上の全面に、ブラ
スト性を有する低融点ガラス層を形成し、該低融点ガラ
ス層の表面にレシスト層をパターン形成し、前記低融点
ガラス層の表面側から研掃材を噴射してブラスト加工す
ることにより、前記レジスト層下層の低融点ガラス層を
除く低融点ガラス層を研削し除去してリブを形成したも
のである請求項1記載の被加工物に付着した研掃材の除
去方法。
2. A low melting point glass layer having blasting property is formed on the entire surface of a substrate of the workpiece, and a resist layer is formed on the surface of the low melting point glass layer by patterning. The rib according to claim 1, wherein a low-melting-point glass layer other than the low-melting-point glass layer under the resist layer is ground and removed by jetting a polishing agent from the front surface side to perform blast processing. A method for removing abrasives attached to a work piece.
【請求項3】 前記水溶性粉体は、硫酸ナトリウム、硼
酸、重曹等の水溶性の物質で成る粉体である請求項1又
は2記載の被加工物に付着した研掃材の除去方法。
3. The method for removing a polishing / cleaning material adhering to a workpiece according to claim 1, wherein the water-soluble powder is a powder made of a water-soluble substance such as sodium sulfate, boric acid and sodium bicarbonate.
【請求項4】 前記水溶性粉体は、当該水溶性粉体の衝
突力で被加工物に付着した研掃材を除去可能な硬度、重
量、粒径等の特性を有する粉体で成る請求項1,2又は
3記載の被加工物に付着した研掃材の除去方法。
4. The water-soluble powder is a powder having characteristics such as hardness, weight, and particle size that can remove the abrasive cleaning material adhering to the workpiece by the collision force of the water-soluble powder. Item 4. A method for removing a polishing / cleaning material attached to a workpiece according to item 1, 2 or 3.
【請求項5】 ブラスト加工した被加工物に水溶性粉体
を噴射した後、この被加工物をエアーブローして被加工
物に付着した水溶性粉体の大部分を除去し、次いでこの
被加工物を水洗いした請求項1,2,3又は4記載の被
加工物に付着した研掃材の除去方法。
5. After spraying the water-soluble powder on the blasted workpiece, the workpiece is air-blown to remove most of the water-soluble powder adhering to the workpiece, and then the workpiece is removed. The method for removing a polishing / cleaning material adhering to a work piece according to claim 1, 2, 3 or 4, wherein the work piece is washed with water.
【請求項6】 前記水溶性粉体は平均粒径10〜35μ
であり、この水溶性粉体を噴射圧力1.0〜3.0kg
/cm2 で、噴射量5〜30g/minで噴射した請求
項1,2,3,4又は5記載の被加工物に付着した研掃
材の除去方法。
6. The water-soluble powder has an average particle size of 10 to 35 μm.
And the injection pressure of this water-soluble powder is 1.0 to 3.0 kg.
/ In cm 2, injection quantity 5 to 30 g / min at the jetting claims 1, 2, 3, 4 or 5 a method for removing the deposited abrasive cleaning agent to a workpiece according.
JP7322019A 1995-12-11 1995-12-11 Method for removing grinding/polishing/cleaning material adhering to workpiece Pending JPH09155743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7322019A JPH09155743A (en) 1995-12-11 1995-12-11 Method for removing grinding/polishing/cleaning material adhering to workpiece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7322019A JPH09155743A (en) 1995-12-11 1995-12-11 Method for removing grinding/polishing/cleaning material adhering to workpiece

Publications (1)

Publication Number Publication Date
JPH09155743A true JPH09155743A (en) 1997-06-17

Family

ID=18139023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7322019A Pending JPH09155743A (en) 1995-12-11 1995-12-11 Method for removing grinding/polishing/cleaning material adhering to workpiece

Country Status (1)

Country Link
JP (1) JPH09155743A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0890417A1 (en) * 1997-07-10 1999-01-13 Tokyo Ohka Kogyo Co., Ltd. Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters
WO2003074230A1 (en) * 2002-03-04 2003-09-12 Jfe Steel Corporation Surface treatment facility of metal plate and method for producing metal plate
KR100495745B1 (en) * 2000-08-04 2005-06-17 마루오 칼슘 가부시키가이샤 Abrasive and grinding method using the same
US7523631B2 (en) 2002-08-08 2009-04-28 Jfe Steel Corporation Cooling device, manufacturing method, and manufacturing line for hot rolled steel band
JP2009166207A (en) * 2008-01-18 2009-07-30 Hitachi Plant Technologies Ltd Blasting device and its operation method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0890417A1 (en) * 1997-07-10 1999-01-13 Tokyo Ohka Kogyo Co., Ltd. Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters
KR100495745B1 (en) * 2000-08-04 2005-06-17 마루오 칼슘 가부시키가이샤 Abrasive and grinding method using the same
WO2003074230A1 (en) * 2002-03-04 2003-09-12 Jfe Steel Corporation Surface treatment facility of metal plate and method for producing metal plate
US7435374B2 (en) 2002-03-04 2008-10-14 Jfe Steel Corporation Surface treatment facility of metal plate and method for producing metal plate
CN100436061C (en) * 2002-03-04 2008-11-26 杰富意钢铁株式会社 Surface treatment facility of metal plate and method for producing metal plate
US7523631B2 (en) 2002-08-08 2009-04-28 Jfe Steel Corporation Cooling device, manufacturing method, and manufacturing line for hot rolled steel band
JP2009166207A (en) * 2008-01-18 2009-07-30 Hitachi Plant Technologies Ltd Blasting device and its operation method

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