JP2007008788A - Method for forming pattern of low melting point glass and pattern forming apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To suppress the infiltration of a developing liquid during processing and to form a more fine pattern in the development of a photosensitive photoresist and a photosensitive compound after exposing. <P>SOLUTION: The infiltration of the developing liquid is suppressed and the unexposed photosensitive photoresist and photosensitive compound are removed even from the inner side of a fine pattern by the developing liquid by introducing a high pressure developing liquid and high pressure air into a nozzle and blowing a mixed fluid comprising the high pressure air and the developing liquid, wherein the developing liquid is made into fine particles by the high pressure air, from the nozzle. Thereby, it becomes possible to form a fine pattern. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

The present invention relates to a pattern forming method and a pattern forming apparatus for recyclable low-melting glass used as a partition forming material for flat panel displays such as a plasma display, and an electrode forming material used for flat panel displays and ceramic substrates. The present invention relates to a low melting point glass paste material.

Conventional low-melting-point glass pattern forming methods used as partition-forming materials for flat-panel displays such as plasma displays and electrode-forming materials used for flat-panel displays and ceramic substrates include low-melting glass by screen printing. As shown in FIG. 2, the low melting point glass paste 6 is applied and dried on the glass substrate 1 in advance as shown in FIG. 2, and a pattern is formed on the dried low melting point glass paste 7 with a photosensitive dry film. A pattern of the low melting point glass 12 was formed by cutting the low melting point glass other than the pattern by blowing high pressure air and the abrasive 18.

JP-A-3-294180

In the conventional low-melting-point glass pattern formation method by screen printing, the screen printing itself is a method of printing while stretching the screen plate, so the screen plate stretches when printing a large substrate, and an accurate pattern cannot be printed There was a point.

Further, in the pattern formation method by screen printing, since the film thickness is required for forming the discharge space of the flat panel display, it is necessary to print it repeatedly about 10 to 20 times, and it takes a long time to print and it is difficult to achieve accuracy. There was a point.

Also, in the pattern formation method by sandblasting, pattern formation is performed using a photosensitive dry film, so accuracy is easy to obtain.However, the low melting point glass paste is applied to the front surface and dried, and then the low melting point glass is shaved by sandblasting. The crushed abrasive was collected by a dust collector and discarded.

In the pattern forming method by sandblasting, there is a problem that it is difficult to separate and recycle the discarded abrasive and the low-melting-point glass, and the recycling cost is high.

As a means for solving the above problems, after forming a pattern with a resist on a low-melting-point glass dry film obtained by applying and drying the low-melting-point glass paste using a water-soluble binder as a low-melting-point glass paste binder After introducing high-pressure air and water into the nozzle, a mixed liquid of high-pressure air and water is sprayed from the nozzle to remove the low-melting glass other than the resist, thereby forming a low-melting glass pattern.

By using a low-melting glass binder, instead of using a conventional sandblasting device to blow abrasives with high-pressure air and shaving low-melting glass, water is blown with high-pressure air instead of abrasives. By scraping the melting point glass, the shaved low melting point glass can be used again as a raw material for the low melting point glass paste by drying the water, and the low melting point glass paste can be recycled and water is used instead of the abrasive. Therefore, the cost of consumables can be reduced, and a low melting point glass pattern can be formed at low cost.

The pattern formation of the low melting point glass of the present invention will be described below with reference to the drawings.

In FIG. 1, first, in step A, a low-melting glass paste 6 is applied on the substrate 1 by using a coater such as a slit coater or roll coater 30 or screen printing, and dried.

As the binder of the low-melting glass paste used here, a water-soluble cellulose-based resin that is soluble in water or warm water and decomposes at a temperature lower than the firing temperature of the low-melting glass, polyvinyl alcohol, or polyvinylpyrrolidone is used.

In particular, polyvinyl alcohol resin is completely decomposed at about 300 ° C., and the melting temperature can be adjusted by the degree of saponification. The development and peeling processes using a photosensitive dry film are performed at a low temperature, and the low melting glass is cut. The process can be performed at a high temperature.

The photosensitive dry film 2 is laminated on the low-melting glass paste 7 dried in the process B, the pattern mask 11 is placed thereon, exposed, and then developed using the developer 5 in the process C. The photosensitive dry film. 2 to form a pattern.

Instead of using a photosensitive resist such as a photosensitive dry film, a mask pattern may be formed by printing a water-resistant resist by screen printing or the like.

As shown in FIG. 4, pressurized water or hot water and high-pressure air are separately supplied into the high-pressure injection nozzle 9, and the water or hot water is distributed and supplied from the water blowing portion into the nozzle. The low-melting glass is cut by supplying it into the nozzle so as to have a uniform pressure distribution from end to end, and spraying a mixed fluid of high-pressure air and water or hot water from the outlet at the tip of the high-pressure injection nozzle.

In order to efficiently cut a low-melting glass with a fine pattern, the concentration of high-pressure air and water or hot water blown out from the high-pressure jet nozzle is 3% or less of water or hot water with respect to the high-pressure air, preferably 1% or less. Concentration.

The resist film on the low-melting glass patterned in the process E and the process F is peeled off, and then baked to form partition walls, electrodes, and the like of a flat panel display using the low-melting glass.

FIG. 3 is an overall view of the pattern forming apparatus of the present invention. Water 5 is placed in a water tank 24 whose temperature can be adjusted by a heater, the tank pressurizing valve 11 is closed, and then the water pressurizing tank 24 is filled with high-pressure air. By pressurizing the water, water set to a certain temperature is introduced into the high-pressure injection nozzle through the water conduit (water hose) 27.

Instead of using high pressure air and pressurizing the water tank to introduce water, a pump may be used to pressurize the water and introduce water into the high pressure injection nozzle.

High-pressure air is separately introduced into the high-pressure injection nozzle 9 from a high-pressure air conduit (high-pressure air hose) 28 and a mixed fluid of high-pressure air and water is injected from the high-pressure injection nozzle 9 through the outlet 14 at the tip of the high-pressure injection nozzle. As a result, water is atomized and sprayed onto the processed substrate 1.

The high-pressure spray nozzle 9 is swung to the left and right by the nozzle drive unit 20, and water or a mixed fluid of hot water and high-pressure air is sprayed uniformly on the processing substrate 1 on which the pattern of the low melting point glass installed under the high-pressure spray nozzle 9 is formed. Be

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The processed substrate 1 is conveyed back and forth by driving the conveyor driving unit 21.

Water or hot water sprayed from the high-pressure spray nozzle 9 and the cut low melting point glass enter the cyclone 23 from the main body hopper 22 through the cyclone conduit 29 by the negative pressure of the blower 26, and are collected by the cyclone 23 and collected. to go into.

The water and low melting point glass collected in the collection tank 19 can be used again as a raw material for the low melting point glass paste by removing the water.

Examples of the developing method of the present invention described above will be specifically described below.

ASF-SWF025 manufactured by Asahi Glass Co., Ltd. containing 60% lead oxide is used as the powder for low melting point glass paste.

As a water-soluble binder, polyvinyl alcohol JP-18 manufactured by Nippon Vinegar Poval Co., Ltd. was dissolved in warm water, and the low-melting glass paste was dispersed to prepare a low-melting glass paste.

The low melting glass paste was applied and dried on a 150 mm × 150 mm glass substrate to form a dry low melting glass paste film having a thickness of 180 microns.

A striped mask pattern having a line width of 70 microns and a pitch of 200 microns was formed on a low-melting glass paste using BF704 manufactured by Tokyo Ohka Kogyo Co., Ltd. as a photosensitive dry film.

20 liters of water is placed in the water pressure tank and the temperature is set to 90 ° C.

The laminate-exposed processed substrate is transported to the bottom of the high-pressure spray nozzle 1, and high-pressure air is introduced into the water pressure tank and the high-pressure spray nozzle while swinging the nozzle to the left and right at a nozzle speed of 1 m / min. Low-melting glass was cut by spraying a mixed fluid of high-pressure air and warm water from the nozzle.

The high pressure air pressure to the water pressure tank was set to 0.1 MPa, the high pressure air pressure to the high pressure injection nozzle was set to 0.2 MPa, and the distance from the high pressure injection nozzle to the substrate was set to 30 mm.

The jetting time of high-pressure air and hot water was 3 minutes, and about 1.5 liters of developer were jetted in 3 minutes.

A substrate processed into a monoethanolamine 3% solution was put, and the photosensitive dry film on the low-melting glass with the pattern formed was peeled off at a temperature of 25 ° C.

The processed substrate was heated at 550 ° C. to form a partition wall having a width of 68 microns and a pitch of 200 microns and a height of 150 microns made of low-melting glass.

The water sprayed from the nozzle collected in the collection tank from the cyclone and the cut low melting glass were taken out and filtered and dried to separate the low melting glass powder.

When the photosensitive dry film was peeled off after sandblasting and the hole processing size of the processed substrate was measured, it was processed with a hole diameter of 35 microns and a depth of 6 microns.

As industrial applicability of the present invention, it is possible to recycle cut low-melting glass in the formation of barrier ribs and electrodes using low-melting glass used for flat displays such as plasma displays, and so on. By providing a method for forming a low melting point glass pattern that uses only water and air and is low in production cost, a flat panel display such as a plasma display may be possible.

It is process drawing which showed the processing process of this invention. It is process drawing which showed the conventional sandblasting process. It is the front view which showed the outline | summary of the apparatus used by this invention. It is an isometric view of a high-pressure injection nozzle used in the present invention.

Explanation of symbols

1 Glass substrate 2 Photosensitive dry film (photosensitive resist)
3 Patterned photosensitive dry film 4 High pressure air + Hot water 5 Developer 6 Low melting glass paste 7 Low melting glass paste dry film 8 Address electrode 9 Discharge space 10 Laminating roll 11 Pattern mask 12 Patterned low melting glass Dry film 13 Developer blowing part 14 Blowing outlet 15 High pressure spray nozzle 16 Sand blast nozzle 17 Low melting point glass collection tank 18 High pressure air + Abrasive material 19 Developer primary tank 20 Nozzle driving part 21 Conveyor driving part 22 Main body hopper 23 Cyclone 24 Water pressurization tank 25 Tank pressurization valve 26 Blower 27 Developer conduit (developer hose)
28 High-pressure air conduit (high-pressure air hose)
29 Cyclone conduit 30 Coater 31 Nozzle drive motor 32 Conveyor drive motor 33 Filter tank

Claims (7)

A water-soluble binder is used as a binder for the low-melting glass paste, and after forming a pattern with a resist on the low-melting glass dry film obtained by applying and drying the low-melting glass paste, high-pressure air and high-pressure water are placed in the nozzle. A low-melting glass pattern forming method comprising forming a low-melting glass pattern by spraying a mixed fluid of high-pressure air and water from an introduced nozzle to remove low-melting glass other than resist. The low melting point glass paste material according to claim 1, wherein a polyvinyl alcohol resin is used as a water-soluble binder. The method for forming a low melting point glass pattern according to claim 1, wherein a polyvinyl alcohol resin is used as a water-soluble binder, and the fact that the melting temperature varies depending on the degree of saponification of the polyvinyl alcohol resin, A low-melting glass pattern is formed by spraying a mixed fluid of high-pressure water and high-pressure air heated above the melting temperature from the nozzle to remove the low-melting glass other than the resist, and developing the resist below the melting temperature of polyvinyl alcohol. And forming a pattern of a low-melting-point glass, characterized by performing peeling. 4. The low melting point glass pattern forming method according to claim 1 and claim 3, wherein the amount of high pressure water is 3% or less of the amount of high pressure air, preferably 1% or less of the mixed fluid is sprayed from the nozzle. A method for forming a low-melting glass pattern. 4. The low melting point glass pattern forming method according to claim 1 and claim 3, wherein the inside of the nozzle is pressurized with high pressure air, and high pressure water pressurized with high pressure air is introduced into the pressurized nozzle. A pattern forming apparatus for low melting point glass, wherein a mixed fluid of high pressure air and high pressure water is sprayed from a nozzle. In the pattern forming method of the low melting point glass according to claim 1 and claim 3, the inside of the nozzle is pressurized with high pressure air, high pressure water pressurized by a pump is introduced into the pressurized nozzle, A low-melting-point glass pattern forming apparatus, wherein a mixed fluid of high-pressure air and high-pressure water is sprayed from a nozzle. The pattern forming apparatus used in the pattern forming method of the low melting point glass according to claim 1 and claim 3, wherein the inside of the developing device is made negative by the negative pressure of the blower, and a cyclone is installed between the blower and the developer main body. A low-melting-point glass pattern forming apparatus that collects the low-melting-point glass and water removed by high-pressure water sprayed from a nozzle by a cyclone.