JPH09153513A - Manufacturing device of semiconductor device, method of manufacture the same, and device for mounting semiconductor device - Google Patents

Manufacturing device of semiconductor device, method of manufacture the same, and device for mounting semiconductor device

Info

Publication number
JPH09153513A
JPH09153513A JP7312112A JP31211295A JPH09153513A JP H09153513 A JPH09153513 A JP H09153513A JP 7312112 A JP7312112 A JP 7312112A JP 31211295 A JP31211295 A JP 31211295A JP H09153513 A JPH09153513 A JP H09153513A
Authority
JP
Japan
Prior art keywords
electrodes
substrate
semiconductor device
electrode
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7312112A
Other languages
Japanese (ja)
Inventor
Hideaki Honda
英昭 本田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP7312112A priority Critical patent/JPH09153513A/en
Publication of JPH09153513A publication Critical patent/JPH09153513A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/0401Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/014Solder alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3478Applying solder preforms; Transferring prefabricated solder patterns

Abstract

PROBLEM TO BE SOLVED: To obtain an excellent flatness between electrodes by absorbing the variation of the diameters of solder ball electrodes and the variation between the electrodes caused by the warping of a board. SOLUTION: The flatness of solder ball electrodes 3 is equalized by heating the solder ball electrodes 3, that are formed to be a ball grid array(BGA) product 21, at an adequate temperature lower than the melting temperature of them by a heater 6 and pressing the solder ball electrodes 3 to the base 5 with adequate pressure by a pressing jig 4. Therefore, the flatness of the electrodes of the BGA product 21 that is required at the assembling of it into a set is improved and simple and reliable mounting is realized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、例えばボールグ
リッドアレイ型のパッケージに係わり、電極として半田
ボール又は半田ペーストを使用した、特にその電極を改
良した半導体装置の製造装置とその製造方法及び半導体
装置のマウント装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to, for example, a ball grid array type package, which uses a solder ball or a solder paste as an electrode, and more particularly, a semiconductor device manufacturing apparatus and method in which the electrode is improved, and a semiconductor device. Mounting device.

【0002】[0002]

【従来の技術】図2は、従来のボールグリッドアレイ形
のパッケージ(以下、BGA製品と称す)を示してい
る。このようなBGA製品を作る場合、平坦性が保たれ
たセラミックまたはエポキシまたは他の材料をベースと
した基板2が使用される。この基板2の一方面には例え
ばモールドやメタルキャップが設けられ、他方面には厳
選された半田ボールまたは供給量の制御された半田ペー
スト等で球状の電極7が設けられる。
2. Description of the Related Art FIG. 2 shows a conventional ball grid array type package (hereinafter referred to as BGA product). In making such a BGA product, a substrate 2 based on flat ceramic or epoxy or other material is used. For example, a mold or a metal cap is provided on one surface of the substrate 2, and a spherical electrode 7 is provided on the other surface with a carefully selected solder ball or a solder paste whose supply amount is controlled.

【0003】[0003]

【発明が解決しようとする課題】BGA製品において、
各電極の先端部の高さは所定のごく狭い条件内に揃えら
れ、電極相互が平坦性を有することが要求される。すな
わち図2に示したように電極の大きさにばらつきがある
ことは好ましくない。このため、それぞれの部品・材料
を厳選していた。しかし、BGA製品の電極相互の平坦
性を保つことは、以下のような困難を伴うものであっ
た。
DISCLOSURE OF THE INVENTION In BGA products,
It is required that the heights of the tip portions of the electrodes be uniform within a predetermined narrow condition and that the electrodes have flatness. That is, it is not preferable that the electrodes have different sizes as shown in FIG. For this reason, each part / material was carefully selected. However, maintaining the flatness of the electrodes of the BGA product has been accompanied by the following difficulties.

【0004】まず、セラミックまたはエポキシまたは他
の材料をベースとした基板は、その平坦性を確保するた
め、厳しく選別されなければならない。しかも、こうし
た選別を行っても、加工時に反り、ねじれ等が発生し、
基板の平坦性を損なうことがあった。
First, substrates based on ceramics or epoxies or other materials must be severely screened to ensure their flatness. Moreover, even if such sorting is performed, warping, twisting, etc. occur during processing,
The flatness of the substrate was sometimes impaired.

【0005】さらに、半田ボールを使用するときは、そ
の真球性と寸法精度の高いものが要求され、厳しく選別
されなければならない。しかし、そうすると歩留まりが
低下し、価格が上昇する原因となる。
Furthermore, when solder balls are used, those having high sphericity and high dimensional accuracy are required, and they must be strictly selected. However, doing so causes a decrease in yield and a rise in prices.

【0006】また、半田ボールを基板に装着するために
下地として使うフラックスまたは半田ペーストは印刷等
で供給されるが、均一で正確な量の制御は困難であっ
た。さらに、BGA製品組立工程におけるハンドリング
や熱ストレスにより半田ボール電極の変形等が発生し、
平坦性を悪化させることがある。また、テストやバーン
インにおいてソケットの使用や熱ストレスにより半田ボ
ール電極にストレスが加わり、変形や傷が発生し電極相
互の平坦性を悪化させる場合もあった。
Further, the flux or the solder paste used as a base for mounting the solder balls on the substrate is supplied by printing or the like, but it is difficult to control the uniform and accurate amount. Furthermore, the solder ball electrodes may be deformed due to handling and heat stress in the BGA product assembly process,
The flatness may be deteriorated. Further, in the test or burn-in, the solder ball electrode may be stressed due to the use of the socket or thermal stress, which may cause deformation or damage, which may deteriorate the flatness of the electrodes.

【0007】この種のBGA製品は通常フェースダウン
実装されるため、実装後電極の半田付け状態を外観から
検査することは困難であり、電極の平坦性劣化は実装時
の不良発生の原因となり大きな問題であった。
Since this type of BGA product is usually face-down mounted, it is difficult to visually inspect the soldered state of the electrodes after mounting, and the deterioration of the flatness of the electrodes causes defects during mounting, which is a major problem. It was a problem.

【0008】この発明は上記課題を解決するものであ
り、その目的とするところは、電極を矯正することによ
り、BGA製品の電極の平坦性を向上させ、容易で確実
な実装を可能にする。
The present invention is intended to solve the above problems, and an object thereof is to correct the electrodes to improve the flatness of the electrodes of a BGA product and enable easy and reliable mounting.

【0009】[0009]

【課題を解決するための手段】BGA製品に形成された
半田ボール電極を、加熱手段により溶融させない適度な
温度まで加熱し、加圧手段により適度な圧力を加えるこ
とで平坦性の悪い半田ボール電極を均一化させる。これ
によりBGA製品を構成するセラミックまたはエポキシ
または他の材料からなる基板、及び電極を形成する半田
ボール等の初期的なばらつきや組立工程で発生した反り
やねじれ等による平坦性悪化が矯正され、電極相互の先
端面の高さが均一化される。
SOLUTION TO THE PROBLEM A solder ball electrode having poor flatness by heating a solder ball electrode formed on a BGA product to an appropriate temperature which does not melt by a heating means and applying an appropriate pressure by a pressurizing means. Homogenize. This corrects the initial variations in the substrate made of ceramic or epoxy or other material that constitutes the BGA product, and the solder balls that form the electrodes, and the deterioration of the flatness due to warpage or twisting that occurs in the assembly process. The heights of the respective tip surfaces are made uniform.

【0010】この発明は、BGA製品の最終工程に近い
工程で実行し、平坦性の優れた製品を出荷することのみ
ならず、BGA製品をセットへ組み込む時にこの矯正を
実施して実装することも可能である。
According to the present invention, not only the product having excellent flatness is carried out in a process close to the final process of the BGA product, but also the BGA product is mounted by performing this correction when incorporating the product into a set. It is possible.

【0011】[0011]

【発明の実施の形態】以下、本発明の実施例について図
面を参照して説明を行う。図1において、BGA製品2
1において基板2の一方面には例えばモールドまたはメ
タルキャップ1が設けられ、他方面には例えば半田ボー
ルからなる複数の電極3が設けられている。このBGA
製品21は前記メタルキャップ1が加圧治具4に保持さ
れる。この加圧治具4には例えばアルミニウム等の材料
で形成された基台5の平坦性の優れた表面が対向されて
いる。この基台5の内部には基台5を加熱する加熱ヒー
タ6が設けられている。この加熱ヒータ6には電極9及
びスイッチ10が接続されている。前記加圧治具4には
駆動装置11が設けられ、加圧治具4はこの駆動装置1
1により基台5に接近する方向及び基台5から離間する
方向に移動可能とされている。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, BGA product 2
In FIG. 1, the substrate 2 is provided with, for example, a mold or a metal cap 1 on one surface, and a plurality of electrodes 3 made of, for example, solder balls is provided on the other surface. This BGA
In the product 21, the metal cap 1 is held by the pressing jig 4. The surface of the base 5, which is made of a material such as aluminum, having excellent flatness faces the pressure jig 4. A heater 6 for heating the base 5 is provided inside the base 5. An electrode 9 and a switch 10 are connected to the heater 6. The pressure jig 4 is provided with a driving device 11, and the pressure jig 4 is driven by the driving device 1.
1 allows movement in a direction toward the base 5 and a direction away from the base 5.

【0012】上記構成において動作について説明する。
前記基台5は、BGA製品を構成する部品・材料に悪影
響を及ぼさない範囲にありかつ半田ボール電極3が溶融
しない範囲の高い温度(例、共晶半田の場合183℃以
下、Pb:Sn=9:1の高温半田の場合299℃以
下)に加熱用ヒーター6により昇温される。この状態
で、加圧治具4が基台5に接近する方向に移動され、電
極3が基台5に押圧される。例えば、基台5に図示せぬ
圧力センサー等を設けておき、この圧力センサーで全半
田ボールの圧力をモニターし、圧力を制御してもよい。
また、BGA製品個々のコプラナリティデータと連動さ
せて、前記の加圧力の制御を行う方法も含まれる。すな
わち、例えば予め各電極の凹凸量を検出し、この凹凸量
に応じて圧力を制御してもよい。
The operation of the above configuration will be described.
The base 5 has a high temperature within a range that does not adversely affect the parts and materials constituting the BGA product and does not melt the solder ball electrode 3 (eg, 183 ° C. or lower in the case of eutectic solder, Pb: Sn = In the case of 9: 1 high-temperature solder, the temperature is raised to 299 ° C. or lower by the heater 6 for heating. In this state, the pressing jig 4 is moved in a direction approaching the base 5, and the electrode 3 is pressed against the base 5. For example, a pressure sensor (not shown) or the like may be provided on the base 5, and the pressure of all solder balls may be monitored by this pressure sensor to control the pressure.
Further, a method of controlling the above-mentioned pressing force in cooperation with the coplanarity data of each BGA product is also included. That is, for example, the unevenness amount of each electrode may be detected in advance, and the pressure may be controlled according to the unevenness amount.

【0013】最も単純な矯正方法としては、ボールの先
端が平坦な基台5に接してから任意の押し込み(例えば
ボール径の精度が700μm±20μmのときは、20
μm押し込む)を行い、コプラナリティの矯正を行うも
のがある。
The simplest straightening method is as follows. The tip of the ball is brought into contact with the flat base 5 and then pushed in arbitrarily (for example, when the accuracy of the ball diameter is 700 μm ± 20 μm, 20).
There is a method to correct the coplanarity by pressing (μm).

【0014】上記実施例によれば、電極相互の平坦性を
向上させることができ、BGA製品をセットへ確実に半
田付けできる。しかも、上記加熱と加圧により基板の反
りも特に基板がエポキシである場合に矯正できる利点を
有している。
According to the above embodiment, the flatness of the electrodes can be improved and the BGA product can be reliably soldered to the set. Moreover, there is an advantage that the warp of the substrate due to the above heating and pressing can be corrected especially when the substrate is epoxy.

【0015】本発明は、BGA製品の組立において、テ
ストやバーンイン等が実施された後、できる限り出荷に
近いところで実施してもよい。あるいは、BGA製品の
製造側にて実施せずにセットに実装する側で実装機等に
この装置を採用することも可能である。この場合、BG
A製品を搬送する際に発生した平坦性の悪化も矯正さ
れ、良好な実装が可能となる。
In the BGA product assembly, the present invention may be carried out as close to shipping as possible after being tested, burned in, and the like. Alternatively, it is also possible to employ this device as a mounting machine or the like on the side of mounting on a set without performing it on the manufacturing side of BGA products. In this case, BG
Deterioration of flatness that occurs when the product A is conveyed is corrected, and good mounting becomes possible.

【0016】[0016]

【発明の効果】以上詳述したように、この発明によれば
半田ボール電極の径の不均一や基板の反り等により生じ
る電極相互のばらつきを吸収することができ、電極相互
の優れた平坦性を得ることができる。したがって、BG
A製品をセットに組み込む時、確実に半田付けができる
ため、信頼性を向上できるとともにフェイスダウン実装
における困難な外観検査を省略できる。さらに、BGA
製品を構成する部品・材料の規格を必要以上に厳しくす
る必要もなくなり、規格の緩和によって収率の向上と価
格の低減がなされる。
As described above in detail, according to the present invention, it is possible to absorb variations in electrodes caused by nonuniform diameter of solder ball electrodes, warpage of the substrate, etc. Can be obtained. Therefore, BG
When the product A is incorporated into the set, it can be reliably soldered, so that the reliability can be improved and the difficult visual inspection in the face-down mounting can be omitted. Furthermore, BGA
It is no longer necessary to make the standards for parts and materials that make up a product stricter than necessary, and easing the standards will improve yields and reduce prices.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の平坦性の矯正方法を示す構成図。FIG. 1 is a configuration diagram showing a flatness correction method of the present invention.

【図2】平坦性に劣る従来のBGA製品を示す構成図。FIG. 2 is a configuration diagram showing a conventional BGA product having poor flatness.

【符号の説明】[Explanation of symbols]

1…BGA製品の上部(モールド、メタルキャップ
等)、 2…BGA製品の下部(セラミック、エポキシその
他)、 3…熱と加圧により矯正された半田電極、 4…平坦性矯正用治具(加圧治具)、 5…平坦性矯正用治具(下部加熱機構付き治具)、 6…加熱用ヒータ、 7…半田による電極(半田ボール、半田ペーストのリフ
ローによる形成等)、 8…水平の基準ライン、 9…加熱用ヒータの電源、 10…加熱用ヒータのスイッチ、 11…加圧治具の駆動装置、 21…BGA製品。
1 ... Upper part of BGA product (mold, metal cap, etc.), 2 ... Lower part of BGA product (ceramic, epoxy, etc.), 3 ... Solder electrode corrected by heat and pressure, 4 ... Jig for flatness correction (addition) Pressing jig), 5 ... Flatness correcting jig (jig with lower heating mechanism), 6 ... Heating heater, 7 ... Solder electrode (solder ball, formation by reflow of solder paste, etc.), 8 ... Horizontal Reference line, 9 ... Heating heater power source, 10 ... Heating heater switch, 11 ... Pressurizing jig drive device, 21 ... BGA product.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 セラミックまたはエポキシを基板とし、
この基板にボール状の複数の電極が設けられる半導体製
品のボール状電極を加工する半導体装置であって、前記
電極の溶融温度以下で電極を加熱するとともに、この電
極を平坦な基台表面に押圧することにより、電極の先端
面の高さを揃えることを特徴とする半導体装置の製造方
法。
1. A substrate made of ceramic or epoxy,
A semiconductor device for processing a ball-shaped electrode of a semiconductor product in which a plurality of ball-shaped electrodes are provided on this substrate, wherein the electrode is heated below the melting temperature of the electrode and the electrode is pressed against a flat base surface. By so doing, the heights of the tip surfaces of the electrodes are made uniform.
【請求項2】 前記電極の加熱と加圧は、上記半導体製
品をセットへ組み込むときに行うことを特徴とする請求
項1記載の半導体装置の製造方法。
2. The method of manufacturing a semiconductor device according to claim 1, wherein heating and pressurizing the electrodes are performed when the semiconductor product is incorporated into a set.
【請求項3】 前記加熱と加圧によって、電極が配置さ
れる前記基板の反りも矯正することを特徴とする請求項
1記載の半導体装置の製造方法。
3. The method of manufacturing a semiconductor device according to claim 1, wherein the warp of the substrate on which the electrodes are arranged is also corrected by the heating and pressing.
【請求項4】 セラミックまたはエポキシを基板とし、
この基板にボール状の複数の電極が設けられる半導体装
置の前記電極が当接される平坦な表面を有する基台と、 この基台を前記電極の溶融温度以下で電極を加熱する加
温装置と、 前記基板を介して前記電極を基台に押圧する加圧装置と
を具備することを特徴とする半導体装置の製造装置。
4. A substrate made of ceramic or epoxy,
A base having a flat surface on which the electrodes of a semiconductor device, in which a plurality of ball-shaped electrodes are provided on the substrate, are abutted; and a heating device for heating the base at a temperature below the melting temperature of the electrodes A semiconductor device manufacturing apparatus, comprising: a pressing device that presses the electrode against a base via the substrate.
【請求項5】 BGA半導体をセットへ組み込む半導体
装置のマウント装置であって、 セラミックまたはエポキシを基板とし、この基板にボー
ル状の複数の電極が設けられる半導体装置の前記電極が
当接される平坦な表面を有する基台と、 この基台を前記電極の溶融温度以下で電極を加熱する加
温装置と、 前記基板を介して前記電極を基台に押圧する加圧装置と
を具備することを特徴とする半導体装置のマウント装
置。
5. A mounting device for a semiconductor device in which a BGA semiconductor is incorporated into a set, wherein a ceramic or epoxy substrate is used, and a plurality of ball-shaped electrodes are provided on the substrate. A base having a transparent surface, a heating device that heats the base to a temperature below the melting temperature of the electrode, and a pressure device that presses the electrode against the base via the substrate. A mounting device for a characteristic semiconductor device.
JP7312112A 1995-11-30 1995-11-30 Manufacturing device of semiconductor device, method of manufacture the same, and device for mounting semiconductor device Pending JPH09153513A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7312112A JPH09153513A (en) 1995-11-30 1995-11-30 Manufacturing device of semiconductor device, method of manufacture the same, and device for mounting semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7312112A JPH09153513A (en) 1995-11-30 1995-11-30 Manufacturing device of semiconductor device, method of manufacture the same, and device for mounting semiconductor device

Publications (1)

Publication Number Publication Date
JPH09153513A true JPH09153513A (en) 1997-06-10

Family

ID=18025393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7312112A Pending JPH09153513A (en) 1995-11-30 1995-11-30 Manufacturing device of semiconductor device, method of manufacture the same, and device for mounting semiconductor device

Country Status (1)

Country Link
JP (1) JPH09153513A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998020532A1 (en) * 1996-11-08 1998-05-14 W.L. Gore & Associates, Inc. Method and apparatus for coining solder balls on an electrical circuit package
KR100551515B1 (en) * 1999-04-26 2006-02-13 소니 케미카루 가부시키가이샤 Packaging method
KR100750048B1 (en) * 2000-12-29 2007-08-16 앰코 테크놀로지 코리아 주식회사 Solder Ball Bumping method for manufacturing semiconductor package

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998020532A1 (en) * 1996-11-08 1998-05-14 W.L. Gore & Associates, Inc. Method and apparatus for coining solder balls on an electrical circuit package
US5853517A (en) * 1996-11-08 1998-12-29 W. L. Gore & Associates, Inc. Method for coining solder balls on an electrical circuit package
KR100551515B1 (en) * 1999-04-26 2006-02-13 소니 케미카루 가부시키가이샤 Packaging method
KR100750048B1 (en) * 2000-12-29 2007-08-16 앰코 테크놀로지 코리아 주식회사 Solder Ball Bumping method for manufacturing semiconductor package

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