JPH09115992A - Sample stand - Google Patents
Sample standInfo
- Publication number
- JPH09115992A JPH09115992A JP27451995A JP27451995A JPH09115992A JP H09115992 A JPH09115992 A JP H09115992A JP 27451995 A JP27451995 A JP 27451995A JP 27451995 A JP27451995 A JP 27451995A JP H09115992 A JPH09115992 A JP H09115992A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- coordinate system
- mount plate
- mounting plate
- drive mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Testing Of Optical Devices Or Fibers (AREA)
- Liquid Crystal (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- A Measuring Device Byusing Mechanical Method (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、外形を基準面とす
る試料の試料台に関し、製造、検査、測定などに用いる
装置に好適なものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sample table for a sample having an outer shape as a reference surface, and is suitable for an apparatus used for manufacturing, inspection, measurement and the like.
【０００２】[0002]
【従来の技術】試料台は、例えば半導体素子や液晶表示
デバイスの製造、検査、測定に用いる装置の試料載置面
に固定して使用する。前記装置は試料の加工位置や観察
位置を変更するために試料を移動する移動機構を有し、
その移動方向で決まる特有の基準軸を有する。これを装
置座標系（Ｘ−Ｙ座標系）と言う。前記装置の多くが備
えるＸＹステージの十字動移動方向はその一例である。
前記装置と組み合わされた試料台にも装置座標系が適用
される。一方、かかる装置の試料台に載置される試料
は、試料特有の基準軸を有する。これをワーク座標系
（ｘ−ｙ座標系）と言う。試料を試料台上に載置する場
合、２つの座標系（装置座標系及びワーク座標系）が平
行になるように試料を設置することは困難であり、ずれ
ているのが普通である。2. Description of the Related Art A sample table is used by being fixed to a sample mounting surface of an apparatus used for manufacturing, inspecting and measuring semiconductor elements and liquid crystal display devices, for example. The device has a moving mechanism for moving the sample in order to change the processing position and the observation position of the sample,
It has a unique reference axis determined by its moving direction. This is called a device coordinate system (XY coordinate system). An example is the cross movement direction of the XY stage included in many of the above devices.
The device coordinate system also applies to the sample stage combined with the device. On the other hand, the sample placed on the sample table of such an apparatus has a reference axis peculiar to the sample. This is called a work coordinate system (xy coordinate system). When the sample is placed on the sample table, it is difficult to place the sample so that the two coordinate systems (apparatus coordinate system and work coordinate system) are parallel to each other, and it is common that they are misaligned.
【０００３】しかし、ワーク座標系によって表されてい
る試料の各部寸法を、これと異なる装置座標系を有する
前記装置で取り扱うためには、両座標系が平行になるよ
うにしなければならない。そこで、試料の姿勢を調整す
るアライメント機構が試料台に設けられている。最近
は、両座標系のずれをコンピュータを用いて補正するこ
とも行われている。装置座標系とワーク座標系との傾き
を検出して、その傾きをコンピュータに入力する。そし
て、前記傾きに基づいて両座標系の間の座標変換演算を
コンピュータで行うのである。但し、装置による作業の
内容によってはコンピュータによる補正では不都合な場
合もあり、その場合は試料の姿勢を調整するアライメン
ト作業が必須であった。However, in order to handle the dimensions of each part of the sample represented by the work coordinate system by the above-mentioned device having a different device coordinate system, it is necessary to make both coordinate systems parallel to each other. Therefore, an alignment mechanism for adjusting the posture of the sample is provided on the sample table. Recently, a computer has been used to correct the deviation between both coordinate systems. The tilt between the device coordinate system and the work coordinate system is detected, and the tilt is input to the computer. Then, the computer performs a coordinate conversion calculation between both coordinate systems based on the inclination. However, depending on the contents of the work performed by the apparatus, correction by the computer may be inconvenient, and in that case, alignment work for adjusting the posture of the sample was essential.
【０００４】[0004]
【発明が解決しようとする課題】このように従来技術で
は、装置座標系とワーク座標系とが平行になるように試
料を設置することが困難であるため、装置に試料の姿勢
を調整する複雑な機構を設けたり、コンピュータに必要
なデータを入力して補正計算をするという、本来必要で
ない作業を余儀なくされ、作業時間を長引かせていた。As described above, according to the prior art, it is difficult to install the sample so that the apparatus coordinate system and the workpiece coordinate system are parallel to each other, so that it is complicated to adjust the posture of the sample in the apparatus. It was forced to perform an unnecessary work such as providing various mechanisms and inputting necessary data to the computer to perform correction calculation, prolonging the working time.
【０００５】本発明は、ワーク座標系が装置座標系と平
行になるように、試料を容易に設置できる試料台を提案
するものである。The present invention proposes a sample table on which a sample can be easily placed so that the workpiece coordinate system is parallel to the apparatus coordinate system.
【０００６】[0006]
【課題を解決するための手段】試料は外周の一部にに基
準面を有し、ワーク座標系がこれに一致している場合が
多い。そうでなくとも、外形の基準面に平行であるか、
概略平行である場合が多い。そこで、傾斜自在に保持さ
れた試料載置板、該試料載置板の傾斜の下側に設けられ
た試料の基準面が当接する位置決め部材、前記試料載置
板を傾斜させる駆動機構、及び駆動機構を駆動する駆動
部で試料台を構成した（請求項１）。In many cases, a sample has a reference surface on a part of its outer circumference, and the work coordinate system is in agreement with this. If not, whether it is parallel to the reference plane of the outline,
It is often almost parallel. Therefore, a sample mounting plate held so as to be tiltable, a positioning member provided on the lower side of the tilt of the sample mounting plate for contacting a reference surface of the sample, a drive mechanism for inclining the sample mounting plate, and a drive The sample stage is configured with a drive unit that drives the mechanism (claim 1).
【０００７】請求項１の試料台に、試料と前記試料載置
板との摩擦を軽減する摩擦軽減手段を設けることが好ま
しい（請求項２）。It is preferable that the sample stand of claim 1 is provided with a friction reducing means for reducing the friction between the sample and the sample mounting plate (claim 2).
【０００８】[0008]
【発明の実施の形態】図１は本発明の実施形態を示す斜
視図であり、図２は同図の主要部を示すＡ−Ａ矢視断面
図である。試料載置板２に試料の基準面が当接する位置
決め部材８が固設されている。位置決め部材８の試料当
接面８ａは連続した一平面、又は前記一平面を分割した
少なくとも２つの平面部分で構成される。試料載置板２
は位置決め部材８が設けられた側に設けた軸４を中心と
して回動し、傾斜自在に基台１に取り付けられている。
試料載置板２は複数の窓穴２ａを有し、その窓穴２ａ内
に、試料当接面と平行な軸の周りに軽く回転可能なロー
ラー３が、ローラー３の頂部を試料載置板２から僅かに
突き出して設置されている。駆動機構６はラック６ａ、
これに噛み合うピニオン６ｂ、及びピニオン６ｂが回転
軸に固設されたモーター６ｃで構成される。ラック６ａ
はピニオン６ｂの回転によって図示しない案内に沿って
上下方向に移動する。ラック６ａの上端部に設けられた
軸９が、試料載置板２の下面の突起部に試料載置板２の
上面と平行に設けられた長穴２ｂに、回動及び長穴２ｂ
の軸方向への移動が可能に取り付けられている。制御部
５は指令入力等によって、あらかじめ定められたプログ
ラムに従ってモーター６ｃの駆動を制御する。制御部５
の指令によってモーター６ｃを所定の方向へ回転する
と、ピニオン６ｂが回転し、ラック６ａが上方に送ら
れ、試料載置板２の傾斜角が徐々に大きくなる。モータ
ー６ｃを逆転すると試料載置板２の傾斜角が減少する。1 is a perspective view showing an embodiment of the present invention, and FIG. 2 is a sectional view taken along the line AA showing the main part of the same. A positioning member 8 with which the reference surface of the sample abuts is fixed to the sample mounting plate 2. The sample contact surface 8a of the positioning member 8 is composed of a continuous flat surface or at least two flat surface portions obtained by dividing the flat surface. Sample plate 2
Is rotated about a shaft 4 provided on the side where the positioning member 8 is provided, and is tiltably attached to the base 1.
The sample mounting plate 2 has a plurality of window holes 2a, and within the window holes 2a, a roller 3 which can be lightly rotated around an axis parallel to the sample contact surface is provided. It is installed slightly protruding from 2. The drive mechanism 6 is a rack 6a,
The pinion 6b that meshes with the pinion 6b and the pinion 6b are composed of a motor 6c fixed to the rotating shaft. Rack 6a
Moves up and down along a guide (not shown) by the rotation of the pinion 6b. A shaft 9 provided on the upper end of the rack 6a is provided with a long hole 2b provided on a protrusion on the lower surface of the sample mounting plate 2 in parallel with the upper surface of the sample mounting plate 2 for rotation and the elongated hole 2b.
It is attached so that it can be moved in the axial direction. The control unit 5 controls driving of the motor 6c according to a predetermined program by inputting a command or the like. Control unit 5
When the motor 6c is rotated in a predetermined direction by the command, the pinion 6b is rotated, the rack 6a is fed upward, and the inclination angle of the sample mounting plate 2 gradually increases. When the motor 6c is rotated in the reverse direction, the tilt angle of the sample mounting plate 2 is reduced.
【０００９】基台１には、試料載置板２の下面に当接し
て試料載置板２を水平に位置決めする支持部材１ａを試
料載置板２の回転軸４に対向して設けると共に、試料載
置板２が水平であることを検知して制御部５に信号を出
力する水平検知部（不図示）を設ける。このように構成
された試料台を半導体素子や液晶表示デバイスの製造、
検査、測定に用いる装置の試料載置面に、位置決め部材
８の試料当接面８ａが装置座標系の一方の軸と平行にな
るように設置する。The base 1 is provided with a support member 1a which abuts the lower surface of the sample mounting plate 2 and horizontally positions the sample mounting plate 2 so as to face the rotary shaft 4 of the sample mounting plate 2. A horizontal detector (not shown) that detects that the sample mounting plate 2 is horizontal and outputs a signal to the controller 5 is provided. The sample stage configured in this way is used to manufacture semiconductor devices and liquid crystal display devices.
The sample contact surface 8a of the positioning member 8 is installed on the sample mounting surface of the device used for inspection and measurement so as to be parallel to one axis of the device coordinate system.
【００１０】斯かる試料台に、試料として図３に示した
半導体ウェハー７（以下、ウェハー７と言う）を載置す
る場合を考える。ウェハー７は円形の一部を直線状に切
り欠いてなる、オリエンテーションフラット（以下、オ
リフラ７ａと言う）を有し、前記直線部７ａがワーク座
標系と一致している。当初、試料載置板２は水平である
とする。ウェハー７のオリフラ７ａを位置決め部材８側
にして試料載置板２上に載置する。この時、ウェハー７
を厳密に位置決めして置くわけではないので、通常、オ
リフラ７ａは位置決め部材８に対して傾いて載置され
る。制御部５から指令を与えてモーター６ｃを所定方向
に回転すると、ラック６ａが上昇し、試料載置板２が傾
斜する。すると、ウェハー７は自重によってローラー３
上を滑り傾斜に沿って移動する。そして、オリフラ７ａ
が位置決め部材８に当接して止まる。その結果、オリフ
ラ７ａの方向は装置座標系の方向を向く。これによっ
て、ウェハー７のワーク座標系は装置座標系と平行にな
る。ローラー３の存在がウェハー７の移動、回転を容易
にしている。制御部５の指令によって、モーター６ｃを
逆方向に回転すると、ラック６ａが降下し、試料載置板
２が支持部材１ａに当接して水平に戻る。すると、不図
示の検知器が載物板２が水平になったことを検知し、制
御部５に信号を送出する。制御部５はモーター６ｃを停
止する。かくして、ウェハー７のワーク座標系が装置座
標系と平行になるようにウェハー７を試料載置台１０に
載置する作業は完了する。Consider a case where the semiconductor wafer 7 (hereinafter referred to as the wafer 7) shown in FIG. 3 is mounted as a sample on such a sample table. The wafer 7 has an orientation flat (hereinafter referred to as an orientation flat 7a) in which a part of a circle is cut linearly, and the linear portion 7a coincides with the work coordinate system. Initially, the sample mounting plate 2 is assumed to be horizontal. The orientation flat 7 a of the wafer 7 is placed on the sample placing plate 2 with the positioning member 8 side. At this time, wafer 7
Since it is not strictly positioned, the orientation flat 7a is normally mounted with an inclination with respect to the positioning member 8. When a command is given from the control unit 5 and the motor 6c is rotated in a predetermined direction, the rack 6a rises and the sample mounting plate 2 tilts. Then, the wafer 7 is moved to the roller 3 by its own weight.
Slide up and move along the slope. And the orientation flat 7a
Comes into contact with the positioning member 8 and stops. As a result, the orientation flat 7a is oriented in the device coordinate system. As a result, the workpiece coordinate system of the wafer 7 becomes parallel to the device coordinate system. The presence of the roller 3 facilitates the movement and rotation of the wafer 7. When the motor 6c is rotated in the reverse direction according to a command from the control unit 5, the rack 6a descends, the sample mounting plate 2 contacts the support member 1a, and returns horizontally. Then, a detector (not shown) detects that the stage plate 2 is horizontal and sends a signal to the control unit 5. The control unit 5 stops the motor 6c. Thus, the work of mounting the wafer 7 on the sample mounting table 10 so that the workpiece coordinate system of the wafer 7 is parallel to the apparatus coordinate system is completed.
【００１１】以上の実施形態ではオリフラを基準面とす
るウェハー７を試料の例としたが、四辺形など、他の形
状の試料でも同様に用いることができることは言うまで
もない。又、外形の基準面を仮のワーク座標系として、
仮のワーク座標系に対して所定角だけ傾いたワーク座標
系をもつ試料（図４参照）の場合も、位置決め部材８が
装置座標系に対して前記所定角だけ反対方向に傾くよう
に試料台を装置に設置することで、本発明の装置を適用
することができる。In the above embodiment, the wafer 7 having the orientation flat as the reference surface is used as an example of the sample, but it goes without saying that a sample having another shape such as a quadrangle can be used in the same manner. In addition, with the reference surface of the outer shape as a temporary work coordinate system,
Also in the case of a sample having a work coordinate system tilted by a predetermined angle with respect to the temporary work coordinate system (see FIG. 4), the positioning member 8 is tilted in the opposite direction by the predetermined angle with respect to the apparatus coordinate system. The device of the present invention can be applied by installing the device in the device.
【００１２】また、前記実施形態におけるローラー３
は、ローラーに限らず自在キャスターやボールキャスタ
ーなどに変える、或いは試料載置板の表面に低摩擦係数
の膜を設けるなど、試料移動時の摺動抵抗を軽減する各
種の手段が使用可能である。更に、試料載置板２を傾動
させる駆動機構は回転クランク方式、送りねじ方式な
ど、種々の方式に置き換えることができる。Further, the roller 3 in the above embodiment
Is not limited to rollers, various types of means can be used to reduce sliding resistance during sample movement, such as changing to free casters or ball casters, or providing a film with a low friction coefficient on the surface of the sample mounting plate. . Further, the drive mechanism for tilting the sample mounting plate 2 can be replaced with various systems such as a rotary crank system and a feed screw system.
【００１３】[0013]
【発明の効果】本発明によれば、アライメント作業が不
要となり、試料の設置が容易となる。その結果、試料の
設置に要する時間が大幅に短縮される。又、試料台の構
造が簡単になる。According to the present invention, the alignment work is unnecessary and the sample can be set easily. As a result, the time required to install the sample is greatly reduced. Moreover, the structure of the sample table is simplified.
【図１】本発明の一実施形態を示す斜視図。FIG. 1 is a perspective view showing an embodiment of the present invention.
【図２】図１の主要部のＡ−Ａ矢視断面図。FIG. 2 is a sectional view of the main part of FIG.
【図３】試料の外形の基準面が、ワーク座標系に一致す
る試料の例を、半導体ウェハーで説明する説明図。FIG. 3 is an explanatory view illustrating an example of a sample in which a reference surface of an outer shape of the sample matches a work coordinate system with a semiconductor wafer.
【図４】試料の外形の基準面が、ワーク座標系と所定の
角度をなす試料を説明する説明図。FIG. 4 is an explanatory diagram illustrating a sample in which a reference plane of the sample outer shape makes a predetermined angle with a work coordinate system.
１……基台 ２……試料載置板 ３……ローラー ４……軸 ５……駆動部 ６……駆動機構 ６ａ……ラック ６ｂ……ピニオン ６ｃ……モーター ７……半導体ウェハー ８……位置決め部材 ９……軸 １０……試料台 1 ... Base 2 ... Sample mounting plate 3 ... Roller 4 ... Shaft 5 ... Drive unit 6 ... Drive mechanism 6a ... Rack 6b ... Pinion 6c ... Motor 7 ... Semiconductor wafer 8 ... Positioning member 9 ... Axis 10 ... Sample stand
Claims (2)
る試料台において、傾斜自在に設けられた試料載置板、
該試料載置板の傾斜の下側に設けられた試料の基準面が
当接する位置決め部材、前記試料載置板を傾斜させる駆
動機構、及び該駆動機構を駆動する駆動部を有すること
を特徴とする試料台。1. A sample mounting plate, which is tiltably provided in a sample table on which a sample having a part of its outer periphery as a reference surface is mounted,
A positioning member that is provided on the lower side of the tilt of the sample mounting plate and is in contact with a reference surface of the sample; a drive mechanism that tilts the sample mounting plate; and a drive unit that drives the driving mechanism. A sample table to use.
の摩擦抵抗を軽減する摩擦軽減手段を設けた、請求項１
に記載の試料台。2. The sample mounting plate is provided with friction reducing means for reducing the frictional resistance between the sample and the sample mounting plate.
The sample table described in.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27451995A JPH09115992A (en) | 1995-10-23 | 1995-10-23 | Sample stand |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27451995A JPH09115992A (en) | 1995-10-23 | 1995-10-23 | Sample stand |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09115992A true JPH09115992A (en) | 1997-05-02 |
Family
ID=17542838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27451995A Pending JPH09115992A (en) | 1995-10-23 | 1995-10-23 | Sample stand |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09115992A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11183863A (en) * | 1997-12-22 | 1999-07-09 | Micronics Japan Co Ltd | Inspection device for substrate to be measured |
| JP2000241112A (en) * | 1999-02-19 | 2000-09-08 | Sokkia Co Ltd | Work setting device of two-dimensional measuring machine |
| JP2013058546A (en) * | 2011-09-07 | 2013-03-28 | Nippon Electric Glass Co Ltd | Plate glass positioning device and its positioning method |
-
1995
- 1995-10-23 JP JP27451995A patent/JPH09115992A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11183863A (en) * | 1997-12-22 | 1999-07-09 | Micronics Japan Co Ltd | Inspection device for substrate to be measured |
| JP2000241112A (en) * | 1999-02-19 | 2000-09-08 | Sokkia Co Ltd | Work setting device of two-dimensional measuring machine |
| JP2013058546A (en) * | 2011-09-07 | 2013-03-28 | Nippon Electric Glass Co Ltd | Plate glass positioning device and its positioning method |
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