JPH09100183A - Thick film grazed substrate and its production - Google Patents
Thick film grazed substrate and its productionInfo
- Publication number
- JPH09100183A JPH09100183A JP25962795A JP25962795A JPH09100183A JP H09100183 A JPH09100183 A JP H09100183A JP 25962795 A JP25962795 A JP 25962795A JP 25962795 A JP25962795 A JP 25962795A JP H09100183 A JPH09100183 A JP H09100183A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- glass
- substrate
- thick film
- glaze
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
- C04B41/526—Multiple coating or impregnation with materials having the same composition but different characteristics
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Electronic Switches (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は熱転写式プリンタの
サーマルヘッドに適する厚膜グレーズド基板に関する。
更に詳しくは結晶化ガラスと非晶質ガラスとにより構成
された厚膜グレーズド基板及びその製造方法に関するも
のである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thick film glazed substrate suitable for a thermal head of a thermal transfer printer.
More specifically, the present invention relates to a thick film glazed substrate made of crystallized glass and amorphous glass and a method for manufacturing the same.
【０００２】[0002]
【従来の技術】この種の厚膜グレーズド基板は、例えば
高速印刷、高印字質等の高精度化に対応したサーマルプ
リンタヘッド用の基板として用いられ、基板のグレーズ
層には一定の曲率を有する凸部が形成される。従来、図
３に示すように、厚膜グレーズド基板５は、セラミック
基板１の表面に非晶質ガラスを主成分とするガラスペー
ストを塗布し熱処理してグレーズ層２を形成し（図３
（ａ））、その後化学エッチング等により部分的にグレ
ーズ層２をカット又は除去して所定の形状の凸部３を形
成し（図３（ｂ））、再度熱処理を行ってグレーズ層２
を軟化させてその角部４を丸くする（図３（ｃ））こと
により、作られる。2. Description of the Related Art This type of thick film glaze substrate is used as a substrate for a thermal printer head which is compatible with high precision such as high speed printing and high print quality, and the glaze layer of the substrate has a certain curvature. A convex portion is formed. Conventionally, as shown in FIG. 3, in the thick film glaze substrate 5, a glass paste containing amorphous glass as a main component is applied to the surface of the ceramic substrate 1 and heat-treated to form a glaze layer 2 (see FIG. 3).
(A)) After that, the glaze layer 2 is partially cut or removed by chemical etching or the like to form the convex portion 3 having a predetermined shape (FIG. 3B), and heat treatment is performed again to form the glaze layer 2
Is softened to make its corners 4 round (FIG. 3 (c)).
【０００３】[0003]
【発明が解決しようとする課題】しかし、上記従来の方
法では、グレーズ層が全て非晶質ガラスから作られるた
め、次に挙げる数々の欠点があった。 ガラスを溶かして凸部を形成するときに、グレーズ
層の薄い部分が結晶化し、再度の熱処理でその部分の表
面粗さが小さくなり、グレーズ層全体でみた場合に表面
粗さにバラツキが発生する。 ガラスペーストの弛れに起因して、グレーズ層の高
さを高精度にできないばかりか、図４に示すようにグレ
ーズ層２の端部に湾曲部６が発生し、端部の直線性に劣
る。 グレーズ層の表面粗さを小さくするために、再度熱
処理が必要である。 グレーズ層のセラミック基板に対する接合力が高く
ない。 平坦なグレーズ層から凸部を作り出すために、凸部
形成に時間が多くかかる。 この点を解消するために、凸部をガラスペーストの
印刷により形成しようとしても、ペーストが弛れること
により１回の印刷で所望の形状にできない。 本発明の目的は、グレーズガラスの軟化による弛れを防
止し、容易にグレーズ層の形状を制御することができ、
グレーズ層全体でみた場合に表面粗さにバラツキがな
く、グレーズ層の高さが高精度でしかもグレーズ層の端
部の直線性に優れた厚膜グレーズド基板及びその製造方
法を提供することにある。本発明の別の目的は、グレー
ズ層のセラミック基板に対する接合力が高い厚膜グレー
ズド基板及びその製造方法を提供することにある。本発
明の更に別の目的は、凸部を僅かな熱エネルギで短時間
にかつ高精度に形成できる厚膜グレーズド基板の製造方
法を提供することにある。However, in the above-mentioned conventional method, since the glaze layer is entirely made of amorphous glass, there are the following drawbacks. When the glass is melted to form the convex portion, the thin portion of the glaze layer is crystallized, and the surface roughness of the portion is reduced by the heat treatment again, and the surface roughness varies when viewed in the entire glaze layer. . Due to the slack of the glass paste, the height of the glaze layer cannot be made highly accurate, and as shown in FIG. 4, the curved portion 6 is generated at the end of the glaze layer 2 and the linearity of the end is poor. . Heat treatment is required again in order to reduce the surface roughness of the glaze layer. The joint strength of the glaze layer to the ceramic substrate is not high. It takes a lot of time to form the protrusion because the protrusion is created from the flat glaze layer. Even if an attempt is made to form the convex portion by printing the glass paste in order to solve this point, the paste cannot be formed into a desired shape by printing once because the paste is loosened. An object of the present invention is to prevent loosening due to softening of the glaze glass, and to easily control the shape of the glaze layer,
To provide a thick film glazed substrate which has no variation in surface roughness when viewed as a whole of the glaze layer, has high accuracy in the height of the glaze layer, and has excellent linearity at the end of the glaze layer, and a method for manufacturing the same. . Another object of the present invention is to provide a thick film glaze substrate having a high bonding strength of the glaze layer to the ceramic substrate and a method for manufacturing the same. Still another object of the present invention is to provide a method for manufacturing a thick film glaze substrate which can form a convex portion with a small amount of heat energy in a short time and with high accuracy.
【０００４】[0004]
【課題を解決するための手段】図１（ｃ）及び図１
（ｄ）に示すように、本願請求項１に係る発明は、セラ
ミック基板１１上に結晶化ガラスを主成分とする層１２
と非晶質ガラスを主成分とする層１３とがこの順に積層
されてグレーズ層１５が形成された厚膜グレーズド基板
１０である。下層を結晶化ガラスを主成分とする層で構
成することにより、従来の非晶質ガラスのグレーズ層と
比べて、基板との接合力が高まり、グレーズ層端部の直
線性が損なわれず、かつ熱伝導率が良好になる。また下
層を結晶化ガラスを主成分で構成し、上層を非晶質ガラ
スを主成分で構成することにより、グレーズ層中に占め
る非晶質ガラスの割合が小さく済む。この結果、ガラス
ペーストの弛れやグレーズ層の表面うねりが少なくな
り、焼成時、再度熱処理時に変形しにくくなり、かつグ
レーズ層の高さを高精度にすることができる。Means for Solving the Problems FIG. 1 (c) and FIG.
As shown in (d), the invention according to claim 1 of the present application is such that a layer 12 mainly composed of crystallized glass is formed on a ceramic substrate 11.
And the layer 13 containing amorphous glass as a main component are laminated in this order to form the thick film glaze substrate 10. By configuring the lower layer with a layer mainly composed of crystallized glass, as compared with a conventional glaze layer of amorphous glass, the bonding force with the substrate is increased, the linearity of the end of the glaze layer is not impaired, and Good thermal conductivity. Further, the lower layer is composed of crystallized glass as a main component and the upper layer is composed of amorphous glass as a main component, so that the proportion of amorphous glass in the glaze layer can be reduced. As a result, the slack of the glass paste and the surface waviness of the glaze layer are reduced, deformation is less likely to occur during firing and heat treatment again, and the height of the glaze layer can be made highly accurate.
【０００５】図２（ｄ）及び図２（ｅ）に示すように、
本願請求項２に係る発明は、請求項１に係る発明であっ
て、結晶化ガラスを主成分とする層１２と非晶質ガラス
を主成分とする層１３とが交互にそれぞれ複数積層され
てグレーズ層１５が形成された厚膜グレーズド基板２０
である。積層時に上層となる層の面積を小さくしていけ
ば、凸部１６を短時間に形成することができる。また結
晶化ガラスを主成分とする層１２を介在して積層するこ
とにより、凸部１６が高くなってもその形状を保持する
ので所望の形状を作り出すことができる。As shown in FIGS. 2 (d) and 2 (e),
The invention according to claim 2 of the present application is the invention according to claim 1, in which a plurality of layers 12 having crystallized glass as a main component and a plurality of layers 13 having amorphous glass as a main component are alternately laminated. Thick film glazed substrate 20 on which glaze layer 15 is formed
It is. If the area of the upper layer at the time of stacking is reduced, the convex portion 16 can be formed in a short time. Further, by laminating with the layer 12 containing crystallized glass as a main component, even if the height of the convex portion 16 is increased, the shape is maintained, so that a desired shape can be created.
【０００６】図１（ａ）〜図１（ｄ）に示すように、本
願請求項３に係る発明は、セラミック基板１１の片面に
結晶化ガラスを主成分とする結晶化ガラスペーストを印
刷又は塗布して第１ガラス層１２を形成する工程と、こ
の第１ガラス層１２の表面に非晶質ガラスを主成分とす
る非晶質ガラスペーストを印刷又は塗布して第２ガラス
層１３を形成する工程と、セラミック基板１１上の第１
ガラス層１２と第２ガラス層１３を焼成してグレーズ層
１５を形成する工程とを含む厚膜グレーズド基板１０の
製造方法である。As shown in FIGS. 1 (a) to 1 (d), the invention according to claim 3 of the present application prints or applies a crystallized glass paste containing crystallized glass as a main component on one surface of a ceramic substrate 11. To form the first glass layer 12, and the surface of the first glass layer 12 is printed or coated with an amorphous glass paste containing amorphous glass as a main component to form the second glass layer 13. Process and first on ceramic substrate 11
A method of manufacturing a thick film glazed substrate 10 including a step of firing a glass layer 12 and a second glass layer 13 to form a glaze layer 15.
【０００７】図２（ａ）〜図２（ｄ）に示すように、本
願請求項４に係る発明は、セラミック基板１１の片面に
第１ガラス層１２と第２ガラス層１３を交互にそれぞれ
複数積層した後、この積層体１４を焼成してグレーズ層
１５を形成する厚膜グレーズド基板２０の製造方法であ
る。凸部１６を作り出すように積層体１４を形成すれ
ば、従来のように余分なグレーズ層を取り去る必要がな
く、少ない工程で短時間に少ない熱エネルギで凸部を形
成することができる。As shown in FIGS. 2 (a) to 2 (d), the invention according to claim 4 of the present application is such that a plurality of first glass layers 12 and second glass layers 13 are alternately provided on one surface of a ceramic substrate 11. After the lamination, the laminated body 14 is fired to form the glaze layer 15, which is a method of manufacturing the thick film glaze substrate 20. By forming the laminated body 14 so as to form the convex portion 16, it is not necessary to remove an extra glaze layer as in the conventional case, and the convex portion can be formed in a short time with a small amount of heat energy in a small number of steps.
【０００８】本願請求項５に係る発明は、請求項３又は
４に係る製造方法であって、第１ガラス層１２を仮焼又
は焼成した後、第２ガラス層１３を形成する厚膜グレー
ズド基板１０又は２０の製造方法である。第１ガラス層
１２を仮焼又は焼成した後、第２ガラス１３を形成する
ことにより、ガラスペーストの弛れを最小に抑えて、パ
ターン通りにより正確にグレーズ層を形成することがで
きる。The invention according to claim 5 of the present application is the manufacturing method according to claim 3 or 4, wherein the first glass layer 12 is calcined or fired, and then the second glass layer 13 is formed. 10 or 20 of the manufacturing method. By forming the second glass 13 after calcining or firing the first glass layer 12, it is possible to minimize the slack of the glass paste and form the glaze layer more accurately according to the pattern.
【０００９】[0009]
【発明の実施の形態】本発明の結晶化ガラスはＴｉＯ3
を結晶化剤として含むＡｌ2Ｏ3−ＳｉＯ2系ガラスに結
晶化促進剤としてコランダム相のＡｌ2Ｏ3粉を３〜６重
量％添加した無機粉末であり、非晶質ガラスは８５０℃
以上の軟化点を有する非晶質のアルミノケイ酸塩ガラス
である。結晶化ガラス粉末及び非晶質ガラス粉末をそれ
ぞれ個別に溶剤とともに混合しガラスペーストを調製す
る。第１の厚膜グレーズド基板１０の製造方法は、図１
に示すように、先ずアルミナ等の絶縁性セラミック基板
１１の片面に結晶化ガラスを主成分とする結晶化ガラス
ペーストを印刷又は塗布して第１ガラス層１２を形成す
る（図１（ａ）及び図１（ｂ））。ここで第１ガラス層
１２は結晶化ガラスペーストが単に乾燥した状態の層の
みならず、結晶化ガラスペーストが乾燥した後、９００
〜１１００℃程度の温度で仮焼又は１２００〜１３００
℃の温度で焼成した状態の層をも含む。次いで第１ガラ
ス層１２の表面全体に非晶質ガラスを主成分とする非晶
質ガラスペーストを印刷又は塗布し乾燥して第２ガラス
層１３を形成する（図１（ｃ））。引き続いてセラミッ
ク基板１１上の第１ガラス層１２と第２ガラス層１３を
１２００〜１３００℃程度の温度で焼成して表面が平坦
なグレーズ層１５を形成する。BEST MODE FOR CARRYING OUT THE INVENTION The crystallized glass of the present invention is TiO 3
Is an inorganic powder obtained by adding 3 to 6% by weight of a corundum phase Al 2 O 3 powder as a crystallization accelerator to an Al 2 O 3 —SiO 2 glass containing crystallization agent. Amorphous glass is 850 ° C.
It is an amorphous aluminosilicate glass having the above softening point. The crystallized glass powder and the amorphous glass powder are individually mixed with a solvent to prepare a glass paste. A method of manufacturing the first thick film glaze substrate 10 is described with reference to FIG.
As shown in FIG. 1, first, a crystallized glass paste containing crystallized glass as a main component is printed or applied on one surface of an insulating ceramic substrate 11 such as alumina to form a first glass layer 12 (FIG. 1 (a) and FIG. 1B). Here, the first glass layer 12 is not only a layer in which the crystallized glass paste is simply dried, but 900
Calcination or 1200-1300 at a temperature of ~ 1100 ° C
It also includes a layer fired at a temperature of ° C. Next, an amorphous glass paste containing amorphous glass as a main component is printed or applied on the entire surface of the first glass layer 12 and dried to form the second glass layer 13 (FIG. 1C). Subsequently, the first glass layer 12 and the second glass layer 13 on the ceramic substrate 11 are fired at a temperature of about 1200 to 1300 ° C. to form the glaze layer 15 having a flat surface.
【００１０】第２の厚膜グレーズド基板２０の製造方法
は、図２に示すように、先ずセラミック基板１１の片面
に結晶化ガラスを主成分とする結晶化ガラスペーストを
印刷又は塗布して第１ガラス層１２を形成する（図２
（ａ））。次いで第１ガラス層１２の表面全体に非晶質
ガラスを主成分とする非晶質ガラスペーストを印刷又は
塗布して第２ガラス層１３を形成する（図２（ｂ））。
次にこの第２ガラス層１３の表面の一部に上記と同じ結
晶化ガラスペーストを印刷又は塗布して第１ガラス層１
２を形成し、更にその表面全体に第２ガラス層１３を形
成する。引き続きこの第３ガラス層１３の表面の一部に
第１ガラス層１２を形成した後、その表面全体に第２ガ
ラス層１３を形成する。ここで第１の製造方法と同様に
第１ガラス層１２及び第２ガラス層１３はガラスペース
トが単に乾燥した状態の層のみならず、ガラスペースト
が乾燥した後、９００〜１１００℃程度の温度で仮焼又
は１２００〜１３００℃の温度で焼成した状態の層をも
含む。このようにして第１ガラス層１２及び第２ガラス
層１３が交互に積層された積層体１４を一度に焼成して
グレーズ層１５を形成する。層毎にパターンを変えるこ
とにより、凸部１６を作り出すことができる。第１ガラ
ス層１２及び第２ガラス層１３の各層の厚さは厚膜グレ
ーズド基板の用途により異なるが、第１ガラス層１２の
厚さｔ1及び第２ガラス層１３の厚さｔ2はそれぞれ２０
〜１００μｍの範囲から選ばれ、その厚さの比率ｔ1／
ｔ2は必要に応じて凸部の形状及び高さによって決めら
れる。As shown in FIG. 2, the second method for manufacturing the thick film glazed substrate 20 is as follows. First, one side of the ceramic substrate 11 is printed or coated with a crystallized glass paste containing crystallized glass as a main component, and the first step is performed. The glass layer 12 is formed (FIG. 2)
(A)). Then, an amorphous glass paste containing amorphous glass as a main component is printed or applied on the entire surface of the first glass layer 12 to form the second glass layer 13 (FIG. 2B).
Next, the same crystallized glass paste as described above is printed or applied on a part of the surface of the second glass layer 13 to form the first glass layer 1
2 is formed, and the second glass layer 13 is further formed on the entire surface thereof. Subsequently, the first glass layer 12 is formed on a part of the surface of the third glass layer 13, and then the second glass layer 13 is formed on the entire surface. Here, similar to the first manufacturing method, the first glass layer 12 and the second glass layer 13 are not only layers in a state where the glass paste is simply dried, but also at a temperature of about 900 to 1100 ° C. after the glass paste is dried. It also includes a layer that has been calcined or fired at a temperature of 1200 to 1300 ° C. Thus, the laminated body 14 in which the first glass layer 12 and the second glass layer 13 are alternately laminated is fired at once to form the glaze layer 15. The convex portion 16 can be created by changing the pattern for each layer. Although the thickness of each layer of the first glass layer 12 and the second glass layer 13 varies depending on the use of thick film glazed substrate, the thickness t 2 of the thickness t 1 and the second glass layer 13 of the first glass layer 12 each 20
To 100 μm, and the thickness ratio t 1 /
If necessary, t 2 is determined by the shape and height of the convex portion.
【００１１】[0011]
【発明の効果】以上述べたように、本発明によれば、セ
ラミック基板上に結晶化ガラスを主成分とする層と非晶
質ガラスを主成分とする層とをこの順に積層してグレー
ズ層を形成することにより、従来の非晶質ガラスから作
られたグレーズ層と比較して、グレーズガラスの軟化に
よる弛れを防止でき、これにより容易にグレーズ層の形
状を制御することができ、グレーズ層全体でみた場合に
表面粗さにバラツキがなく、グレーズ層の高さが高精度
でしかもグレーズ層の端部の直線性に優れる。また、セ
ラミック基板に接する層が結晶化ガラスからなるため、
グレーズ層が基板に対して強力に接合し、かつ熱伝導性
に優れる。更にグレーズ層に凸部を形成する場合に、凸
部を僅かな熱エネルギで短時間にかつ高精度に形成する
ことができる。As described above, according to the present invention, a layer having a crystallized glass as a main component and a layer having an amorphous glass as a main component are laminated in this order on a ceramic substrate to form a glaze layer. By forming, it is possible to prevent slack due to softening of the glaze glass, as compared with a conventional glaze layer made of amorphous glass, which allows easy control of the shape of the glaze layer, When viewed as the entire layer, the surface roughness does not vary, the height of the glaze layer is highly accurate, and the linearity of the end portion of the glaze layer is excellent. Also, since the layer in contact with the ceramic substrate is made of crystallized glass,
The glaze layer strongly bonds to the substrate and has excellent thermal conductivity. Further, when the convex portion is formed on the glaze layer, the convex portion can be formed with a small amount of heat energy in a short time and with high accuracy.
【図１】本発明の厚膜グレーズド基板の製造方法を示す
断面図。FIG. 1 is a sectional view showing a method of manufacturing a thick film glaze substrate of the present invention.
【図２】本発明の厚膜グレーズド基板の別の製造方法を
示す断面図。FIG. 2 is a cross-sectional view showing another method of manufacturing the thick film glaze substrate of the present invention.
【図３】従来の厚膜グレーズド基板の製造方法を示す断
面図。FIG. 3 is a cross-sectional view showing a conventional method for manufacturing a thick film glazed substrate.
【図４】従来の厚膜グレーズド基板の斜視図。FIG. 4 is a perspective view of a conventional thick film glazed substrate.
１０，２０ 厚膜グレーズド基板 １１ セラミック基板 １２ 結晶化ガラスを主成分とする層（第１ガラス層） １３ 非晶質ガラスを主成分とする層（第２ガラス層） １４ 積層体 １５ グレーズ層 １６ 凸部 10, 20 Thick film glaze substrate 11 Ceramic substrate 12 Layer containing crystallized glass as a main component (first glass layer) 13 Layer containing amorphous glass as a main component (second glass layer) 14 Laminated body 15 Glaze layer 16 Convex
Claims (5)
主成分とする層(12)と非晶質ガラスを主成分とする層(1
3)とがこの順に積層されてグレーズ層(15)が形成された
厚膜グレーズド基板。1. A layer (12) containing mainly crystallized glass and a layer (1) containing mainly amorphous glass on a ceramic substrate (11).
A thick film glazed substrate having a glaze layer (15) formed by stacking 3) and 3) in this order.
晶質ガラスを主成分とする層(13)とが交互にそれぞれ複
数積層されてグレーズ層(15)が形成された請求項１記載
の厚膜グレーズド基板。2. A glaze layer (15) is formed by alternately laminating a plurality of layers (12) mainly composed of crystallized glass and a plurality of layers (13) mainly composed of amorphous glass. Item 1. The thick film glazed substrate according to Item 1.
スを主成分とする結晶化ガラスペーストを印刷又は塗布
して第１ガラス層(12)を形成する工程と、 前記第１ガラス層(12)の表面に非晶質ガラスを主成分と
する非晶質ガラスペーストを印刷又は塗布して第２ガラ
ス層(13)を形成する工程と、 前記セラミック基板(11)上の第１ガラス層(12)と第２ガ
ラス層(13)を焼成してグレーズ層(15)を形成する工程と
を含む厚膜グレーズド基板の製造方法。3. A step of printing or applying a crystallized glass paste containing crystallized glass as a main component on one surface of a ceramic substrate (11) to form a first glass layer (12), and the first glass layer (12). A step of printing or applying an amorphous glass paste containing amorphous glass as a main component on the surface of 12) to form a second glass layer (13); and a first glass layer on the ceramic substrate (11). A method of manufacturing a thick film glazed substrate, comprising the step of firing (12) and the second glass layer (13) to form a glaze layer (15).
層(12)と第２ガラス層(13)を交互にそれぞれ複数積層し
た後、前記積層体(14)を焼成してグレーズ層(15)を形成
する請求項３記載の厚膜グレーズド基板の製造方法。4. A plurality of first glass layers (12) and second glass layers (13) are alternately laminated on one surface of a ceramic substrate (11), and then the laminated body (14) is fired to form a glaze layer ( 15. The method for manufacturing a thick film glazed substrate according to claim 3, wherein 15) is formed.
後、第２ガラス層(13)を形成する請求項３又は４記載の
厚膜グレーズド基板の製造方法。5. The method for producing a thick film glaze substrate according to claim 3, wherein the second glass layer (13) is formed after calcining or firing the first glass layer (12).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25962795A JPH09100183A (en) | 1995-10-06 | 1995-10-06 | Thick film grazed substrate and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25962795A JPH09100183A (en) | 1995-10-06 | 1995-10-06 | Thick film grazed substrate and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH09100183A true JPH09100183A (en) | 1997-04-15 |
Family
ID=17336711
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25962795A Withdrawn JPH09100183A (en) | 1995-10-06 | 1995-10-06 | Thick film grazed substrate and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH09100183A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001044143A1 (en) * | 1999-12-16 | 2001-06-21 | Tokuyama Corporation | Joint body of glass-ceramic and aluminum nitride sintered compact and method for producing the same |
| JP2011121337A (en) * | 2009-12-14 | 2011-06-23 | Seiko Instruments Inc | Thermal head and printer |
| JP2021130212A (en) * | 2020-02-18 | 2021-09-09 | ローム株式会社 | Manufacturing method for thermal print head, thermal print head and thermal printer |
| CN115008900A (en) * | 2022-05-13 | 2022-09-06 | 华中科技大学 | Flexible display jet printing film edge straightness control method and system |
-
1995
- 1995-10-06 JP JP25962795A patent/JPH09100183A/en not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001044143A1 (en) * | 1999-12-16 | 2001-06-21 | Tokuyama Corporation | Joint body of glass-ceramic and aluminum nitride sintered compact and method for producing the same |
| US6818574B2 (en) | 1999-12-16 | 2004-11-16 | Tokuyama Corporation | Jointed body of glass-ceramic and aluminum nitride sintered compact and method for producing the same |
| JP2011121337A (en) * | 2009-12-14 | 2011-06-23 | Seiko Instruments Inc | Thermal head and printer |
| JP2021130212A (en) * | 2020-02-18 | 2021-09-09 | ローム株式会社 | Manufacturing method for thermal print head, thermal print head and thermal printer |
| CN115008900A (en) * | 2022-05-13 | 2022-09-06 | 华中科技大学 | Flexible display jet printing film edge straightness control method and system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20030107 |