JPH0878164A - Conductive paste, translucent conductive film, and dispersion type electroluminescent element using them - Google Patents

Conductive paste, translucent conductive film, and dispersion type electroluminescent element using them

Info

Publication number
JPH0878164A
JPH0878164A JP6230528A JP23052894A JPH0878164A JP H0878164 A JPH0878164 A JP H0878164A JP 6230528 A JP6230528 A JP 6230528A JP 23052894 A JP23052894 A JP 23052894A JP H0878164 A JPH0878164 A JP H0878164A
Authority
JP
Japan
Prior art keywords
powder
transparent conductive
conductive film
resin
particle size
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6230528A
Other languages
Japanese (ja)
Other versions
JP3560651B2 (en
Inventor
Masaya Yukinobu
雅也 行延
Morikazu Kojima
守一 小島
Mitsuo Usuha
三夫 薄葉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Tohoku Chemical Industries Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Tohoku Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd, Tohoku Chemical Industries Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP23052894A priority Critical patent/JP3560651B2/en
Publication of JPH0878164A publication Critical patent/JPH0878164A/en
Application granted granted Critical
Publication of JP3560651B2 publication Critical patent/JP3560651B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE: To provide a translucent conductive film which can provide a high emission luminance and an electroluminescent element using it by using a large needle indium-tin oxide particle having a long diameter of 30μm or more. CONSTITUTION: A conductive paste containing a needle indium-tin oxide powder having a long diameter of 30μm or more and an aspect ratio of 5 or more and a transparent conductive powder having a small particle size in a resin and its solvent is used to form a translucent conductive film on a base. Otherwise, a translucent conductive film consisting of the transparent conductive powder having a small particle size and the resin and a light translucent conductive film consisting of the needle indium-tin oxide powder having a long diameter of 30μm or more and the resin are alternately laminated on the base.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、エレクトロルミネッセ
ンス素子等の透光性電極の形成に用いる導電ペーストお
よび透光性導電膜と、これらを用いたエレクトロルミネ
ッセンス素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste and a transparent conductive film used for forming a transparent electrode such as an electroluminescent element, and an electroluminescent element using these.

【0002】[0002]

【従来の技術】従来のエレクトロルミネッセンス(以下
「EL」と略称する)発光素子等の透光性電極の形成に
用いる導電ペーストとしては、導電性フィラーとしてイ
ンジウムー錫酸化物(以下「ITO」と略称する)超微
粉末を、樹脂を溶解した溶剤中に分散させたものや、リ
ン片状のITO粉末を、樹脂を溶解した溶剤中に分散さ
せたものがある。
2. Description of the Related Art As a conductive paste used for forming a translucent electrode of a conventional electroluminescence (hereinafter abbreviated as "EL") light emitting element, an indium-tin oxide (hereinafter abbreviated as "ITO") is used as a conductive filler. There are those in which ultrafine powder is dispersed in a solvent in which a resin is dissolved, and those in which flaky ITO powder is dispersed in a solvent in which a resin is dissolved.

【0003】有機分散型EL素子では、基板に発光層で
ある硫化亜鉛(ZnS)層をスクリーン印刷やブレード
コートで形成し、その上に導電ペーストをスクリーン印
刷等で塗布して透光性導電膜が形成される。
In the organic dispersion type EL device, a zinc sulfide (ZnS) layer which is a light emitting layer is formed on a substrate by screen printing or blade coating, and a conductive paste is applied thereon by screen printing or the like to transmit a transparent conductive film. Is formed.

【0004】ITO超微粉を導電性フィラーとして用い
る導電ペーストでは、導電性を得るために、樹脂に対し
て多量の導電性フィラーを用いる必要がある。この透光
性導電膜は、光線透過性を得るために膜厚を2〜3μm
程度の薄さとするのが好ましいとされている。
In a conductive paste using ITO ultrafine powder as a conductive filler, it is necessary to use a large amount of conductive filler with respect to the resin in order to obtain conductivity. This transparent conductive film has a film thickness of 2 to 3 μm in order to obtain light transmittance.
It is said that it is preferable to make it thin.

【0005】発光層である硫化亜鉛層は、硫化亜鉛粒子
が数十μmの大きさであるため、印刷表面に凹凸が生
じ、導電ペーストを塗布した場合、硫化亜鉛層表面の凹
凸により導電ペーストの膜厚が不均一となり、1μm以
下の部分や5μm以上の部分が生じ、全面に2〜3μm
の導電膜を均一に形成できず、例えば薄い部分に亀裂が
生じ、抵抗が増加するという問題があった。
In the zinc sulfide layer which is the light emitting layer, since the zinc sulfide particles have a size of several tens of μm, unevenness occurs on the printed surface. When the conductive paste is applied, the unevenness of the surface of the zinc sulfide layer causes the unevenness of the conductive paste. The film thickness becomes non-uniform, and a part of 1 μm or less or a part of 5 μm or more occurs, and the entire surface is 2-3 μm.
However, there is a problem in that the conductive film cannot be formed uniformly, and cracks occur in a thin portion to increase the resistance.

【0006】リン片状のITO粉末を、樹脂を溶解した
溶剤中に分散させた導電ペーストでは、樹脂に対して少
量の導電性フィラーを用いることにより導電性が得られ
るため、5μm以上の厚さに対しても十分な光線透過性
が得られ、硫化亜鉛層表面の凹凸はさほど問題とはなら
ないが、膜の抵抗は十分とは言い得ない問題があった。
In the conductive paste in which the flaky ITO powder is dispersed in the solvent in which the resin is dissolved, the conductivity can be obtained by using a small amount of the conductive filler with respect to the resin. Also, sufficient light transmittance was obtained, and the unevenness on the surface of the zinc sulfide layer was not a serious problem, but the resistance of the film was not sufficient.

【0007】そこで、本発明者は、長径5μm以上で短
径に対する長径の比が5以上の針状ITO粉末を、樹脂
を溶解した溶剤中に分散させた導電ペーストおよびそれ
を用いた透光性導電膜を先に提案した(特願平5−12
0518)。
Therefore, the present inventor has made a conductive paste in which a needle-like ITO powder having a major axis of 5 μm or more and a major axis to minor axis ratio of 5 or more is dispersed in a solvent in which a resin is dissolved, and a light-transmitting property using the same. I first proposed a conductive film (Japanese Patent Application No. 5-12
0518).

【0008】この先願発明は、針状のITO粉末を導電
性フィラーとして用いることにより、透光性に優れた非
常に低抵抗の膜を得ることが可能となり、EL素子に用
いる場合、低消費電力、大面積化に有用であるという効
果を奏する。
This prior invention makes it possible to obtain a very low resistance film having excellent translucency by using acicular ITO powder as a conductive filler, and when using it for an EL device, it consumes less power. The effect is that it is useful for increasing the area.

【0009】[0009]

【発明が解決しようとする課題】ところが、先に提案し
た上記導電ペーストおよびそれを用いた透光性導電膜に
は、以下に記載する問題点が生じた。分散型EL素子
は、蛍光体粒子と金属電極および透光性電極で挟み込
み、両電極に交流電圧を印加し、蛍光体粒子に高電界を
かけて発光させる仕組みである。この分散型EL素子の
透光性電極に針状ITO粒子を用いた場合、透光性電極
面においては、針状ITOフィラーにより網状の導電パ
スが形成される。したがって、長径の大きい針状ITO
粒子を用いると、網目の大きな導電パスが形成され、一
方長径の小さい針状ITO粒子を用いると、網目の小さ
い導電パスが形成される。
However, the above-mentioned conductive paste and the translucent conductive film using the same have the following problems. The dispersion-type EL element has a mechanism in which it is sandwiched between phosphor particles, a metal electrode and a translucent electrode, an AC voltage is applied to both electrodes, and a high electric field is applied to the phosphor particles to emit light. When acicular ITO particles are used for the translucent electrode of this dispersion type EL element, a net-shaped conductive path is formed by the acicular ITO filler on the translucent electrode surface. Therefore, the needle-shaped ITO having a large major axis
When the particles are used, a large mesh conductive path is formed, while when the acicular ITO particles having a small major axis are used, a small mesh conductive path is formed.

【0010】一方、前記した通り、発光層の硫化亜鉛粒
子は数十μmの大きさであるため、例えば長径30μm
以上の比較的大きな針状ITO粒子からなる透光性導電
膜を用いると、導電パスの網目が大きすぎて、発光層の
硫化亜鉛粒子の一部は電界が印加されなかったり、また
は印加されても弱いため、結果的にELの発光輝度が低
くなるという問題が生ずる。
On the other hand, as described above, since the zinc sulfide particles in the light emitting layer have a size of several tens of μm, for example, the major axis is 30 μm.
When the above-mentioned translucent conductive film made of relatively large acicular ITO particles is used, the mesh of the conductive path is too large, and some of the zinc sulfide particles in the light emitting layer are not applied with an electric field or are applied with an electric field. Is also weak, resulting in a problem that the EL emission luminance is low.

【0011】そこで、蛍光体粒子の大きさに比べて長径
の小さい、例えば5〜30μmの針状ITO粒子を用い
れば、前記問題は生じないが、導電膜の抵抗を低下させ
るためには、長径の大きな針状ITO粒子を用いる方が
有利であり、また針状ITO粉末の製造においても長径
の大きなITO粉末の方が製造工程での固液分離等にお
いて取扱いも容易である。
Therefore, if needle-like ITO particles having a major axis smaller than the size of the phosphor particles, for example, 5 to 30 μm are used, the above problem does not occur, but in order to reduce the resistance of the conductive film, the major axis is required. It is more advantageous to use the needle-shaped ITO particles having a large diameter, and also in the production of the needle-shaped ITO powder, the ITO powder having a large major axis is easier to handle in solid-liquid separation in the manufacturing process.

【0012】以上の理由から、長径が30μm以上の大
きな針状ITO粒子を用いても、高い発光輝度が得られ
る透光性導電膜およびそれを用いたEL素子の開発が望
まれていた。
For the above reasons, it has been desired to develop a light-transmissive conductive film and an EL element using the same, which can obtain high emission brightness even when large acicular ITO particles having a major axis of 30 μm or more are used.

【0013】本発明は、このような現状に鑑みてなされ
たものであり、長径が30μm以上の大きな針状ITO
粒子を用いて高い発光輝度が得られる透光性導電膜およ
びそれを用いたEL素子を提供しようとするものであ
る。
The present invention has been made in view of the above circumstances, and has a large acicular ITO having a major axis of 30 μm or more.
An object of the present invention is to provide a light-transmissive conductive film which can obtain high emission brightness by using particles and an EL device using the same.

【0014】[0014]

【課題を解決するための手段】本発明は、前記課題を解
決する手段として、樹脂およびその溶剤中に、長径30
μm以上で短径に対する長径の比が5以上の針状インジ
ウムー錫酸化物粉末と粒径の小さい透明導電性粉末を含
有する導電ペーストを用い、金属電極、誘電体粒子層、
蛍光体粒子層の順に積層された基板上に、長径30μm
以上の針状インジウムー錫酸化物粉末と粒径の小さい透
明導電性粉末および樹脂とからなる透光性導電膜を形成
するか、または前記基板上に、粒径の小さい透明導電性
粉末と樹脂とからなる透光性導電膜と、長径30μm以
上の針状インジウムー錫酸化物粉末と樹脂とからなる透
光性導電膜を相互に積層して構成したことを要旨とする
ものである。
As a means for solving the above problems, the present invention provides a resin and its solvent with a long diameter 30
Using a conductive paste containing acicular indium-tin oxide powder having a ratio of major axis to minor axis of 5 or more and a diameter of μm or more and transparent conductive powder having a small particle diameter, a metal electrode, a dielectric particle layer,
The major axis is 30 μm on the substrate in which the phosphor particle layers are laminated in this order.
A transparent conductive film comprising the above needle-shaped indium-tin oxide powder, a transparent conductive powder having a small particle size and a resin is formed, or a transparent conductive powder having a small particle size and a resin are formed on the substrate. The gist of the present invention is that the translucent conductive film made of (1) and the translucent conductive film made of acicular indium-tin oxide powder having a major axis of 30 μm or more and a resin are laminated on each other.

【0015】[0015]

【作用】本発明で用いる針状ITO粉末は、例えばイン
ジウムメタルを硝酸に溶解した溶液に四塩化錫含水塩を
加え、撹拌しながら加熱濃縮し、液温130〜150℃
まで濃縮して濃厚なスラリーを生成せしめ、このスラリ
ーに多量の水を加えて濾過し、濾過にって得た針状粉末
を洗浄、乾燥し、1200℃程度で30程度仮焼して得
られる。
The needle-like ITO powder used in the present invention is obtained by adding tin tetrachloride hydrate to a solution prepared by dissolving indium metal in nitric acid, concentrating it by heating with stirring, and then at a liquid temperature of 130 to 150 ° C.
Concentrate to form a thick slurry, add a large amount of water to this slurry, filter, wash the needle-like powder obtained by filtration, dry, and calcine at about 1200 ° C for about 30 to obtain .

【0016】この針状ITO粉末は、長径5μm以上、
アスペクト比5以上で、添加する錫化合物、濃縮条件に
よりアスペクト比が30程度のものまで得られる。この
粉末を100kgf/cmの圧力を加えてペレット状
にした時の比抵抗(以下「圧粉抵抗」という)は0.0
3Ω・cm程度である。
This acicular ITO powder has a major axis of 5 μm or more,
Aspect ratios up to about 30 can be obtained depending on the tin compound added and the concentration conditions. The specific resistance (hereinafter referred to as “powder resistance”) of this powder when it is made into a pellet by applying a pressure of 100 kgf / cm 2 is 0.0
It is about 3 Ω · cm.

【0017】本発明において、針状ITO粉末のアスペ
クト比を5以上とするのは、樹脂への少量の使用で導電
性が得られるようにするためである。アスペクト比は高
い方がよく、好ましくは10以上がよい。
In the present invention, the reason why the aspect ratio of the acicular ITO powder is 5 or more is that conductivity can be obtained by using a small amount of the resin in the resin. The higher the aspect ratio, the better, and preferably 10 or more.

【0018】上記方法より得られる針状ITO粉末の大
きさは、濃縮条件等により長径5μm程度から長径20
0μm程度のものまで得られるが、長径30μm以上の
針状ITO粉末だけを導電性フィラーとして用い、導電
膜を形成すると、その膜中の導電パスは比較的大きく、
そのような導電膜を用いた分散型EL素子の断面は、例
えば図4のように示される。図中、1は金属電極、2は
誘電体層、3は蛍光体粒子、4は長径30μm以上の針
状ITO粉末である。すなわち、長径30μm以上の針
状ITO粉末だけを導電性フィラーとして用いた導電膜
の場合は、すべての蛍光体に均一に電界が印加されない
ため、ELの輝度が十分に得られない。例えば輝度が1
割程度低下する。勿論、長径の小さい(30μm以下)
針状ITO粉末を用いれば、上記欠点は補えるが、導電
膜の抵抗の面では長径の大きい方が有利である。
The size of the acicular ITO powder obtained by the above method ranges from about 5 μm in major axis to 20 in major axis depending on the concentration conditions.
Although it is possible to obtain up to about 0 μm, when only a needle-like ITO powder having a major axis of 30 μm or more is used as a conductive filler to form a conductive film, the conductive path in the film is relatively large,
A cross section of a dispersion type EL element using such a conductive film is shown, for example, in FIG. In the figure, 1 is a metal electrode, 2 is a dielectric layer, 3 is phosphor particles, and 4 is a needle-like ITO powder having a major axis of 30 μm or more. That is, in the case of the conductive film using only the acicular ITO powder having a major axis of 30 μm or more as the conductive filler, the electric field is not uniformly applied to all the phosphors, so that the EL brightness cannot be sufficiently obtained. For example, the brightness is 1
It will decrease by about 50%. Of course, the major axis is small (30 μm or less)
If acicular ITO powder is used, the above drawbacks can be compensated, but in terms of the resistance of the conductive film, it is advantageous that the major axis has a large diameter.

【0019】本発明は、長径の大きな針状ITO粉末を
用いることで導電膜の抵抗を低下し、併せて粒径の小さ
い透明導電性粉末を用いることによって、導電膜面内の
抵抗の均一化をはかったものである。したがって、本発
明では低抵抗の透光性導電膜で、かつ電界が蛍光体に均
一に印加されるため、電極抵抗の低い高輝度のEL素子
が得られる。
According to the present invention, the resistance of the conductive film is reduced by using the acicular ITO powder having a large major diameter, and the resistance in the plane of the conductive film is made uniform by using the transparent conductive powder having a small particle size. It is a measure. Therefore, in the present invention, since the light-transmitting conductive film having a low resistance and the electric field is uniformly applied to the phosphor, an EL element having a low brightness and a high brightness can be obtained.

【0020】本発明における粒径の小さい透明導電性粉
末の大きさは、前記の針状ITO粒子の数μm〜数十μ
mの網目状の導電パスの大きさから決定される。粒状の
透明導電性粉末であれば、1μm以下の粒径が好まし
い。粒状の粉末を用いる場合、粒径が1μm以上荷なる
と、それに伴って膜厚も増加するため好ましくない。そ
れに対し、針状やりん片状粉末は例えば粒径10μm程
度でも膜厚は2〜3μm以内にすることができ、この点
で粒状粉末と異なる。
In the present invention, the size of the transparent conductive powder having a small particle size is several μm to several tens μ of the above-mentioned acicular ITO particles.
It is determined from the size of the mesh-shaped conductive path of m. If it is a granular transparent conductive powder, a particle size of 1 μm or less is preferable. When using a granular powder, if the particle size is 1 μm or more, the film thickness increases accordingly, which is not preferable. In contrast, the acicular or flaky powder can have a film thickness within 2 to 3 μm even if the particle diameter is about 10 μm, which is different from the granular powder.

【0021】粒径の小さい透明導電性粉末材料として
は、ITO、錫ーアンチモン酸化物(ATO)、亜鉛ー
アルミニウム酸化物等が上げられるが、透光性と導電性
を併せもつ材質であればよく、これらに限定されるもの
ではない。
Examples of the transparent conductive powder material having a small particle size include ITO, tin-antimony oxide (ATO), zinc-aluminum oxide, etc., but any material having both translucency and conductivity may be used. However, the present invention is not limited to these.

【0022】本発明の導電ペーストに用いる樹脂は、従
来の透光性導電膜に使用されている樹脂と同様の、熱可
塑性樹脂、熱硬化性樹脂、紫外線硬化樹脂等が用いられ
る。
The resin used in the conductive paste of the present invention may be the same thermoplastic resin, thermosetting resin, ultraviolet curing resin, etc. as the resin used in the conventional translucent conductive film.

【0023】この導電ペースト中の、長径30μm以上
の針状ITO粉末と樹脂の重量比は、針状ITO粉末:
樹脂=50:50〜80:20が好ましい。その理由
は、50:50より樹脂が多いと透光性導電膜の抵抗が
高くなりすぎ、他方80:20より樹脂が少ないと透光
性導電膜の強度が低下すると同時に抵抗も高くなるため
である。
The weight ratio of the acicular ITO powder having a major axis of 30 μm or more and the resin in this conductive paste is such that the acicular ITO powder:
Resin = 50: 50 to 80:20 is preferable. The reason is that if the amount of resin is more than 50:50, the resistance of the light-transmitting conductive film becomes too high, and if the amount of resin is less than 80:20, the strength of the light-transmitting conductive film decreases and at the same time the resistance also increases. is there.

【0024】また、この導電ペーストにおいて、長径3
0μm以上の針状ITO粉末と粒径の小さい透明導電性
粉末の重量比は、95:5〜60:40が好ましい。そ
の理由は、95:5より粒径の小さい透明導電性粉末が
少ないと、膜抵抗の均一化の効果が得られず、他方6
0:40より多いと、膜抵抗が上昇するため好ましくな
い。なお、より好ましくは90:10〜70:30であ
る。
Further, in this conductive paste, the major axis 3
The weight ratio of the acicular ITO powder having a particle diameter of 0 μm or more and the transparent conductive powder having a small particle diameter is preferably 95: 5 to 60:40. The reason is that if the amount of the transparent conductive powder having a particle size smaller than 95: 5 is small, the effect of making the film resistance uniform cannot be obtained, while
When it is more than 0:40, the membrane resistance increases, which is not preferable. In addition, it is more preferably 90:10 to 70:30.

【0025】上記導電ペーストに用いる溶剤は、一般の
塗料・ペーストに用いられる有機溶剤または水を用いる
ことができる。例えば、有機溶剤としては、シクロヘキ
サノン、イソホロン、ジアセトンアルコール等のケトン
系溶剤、メチルアルコール、エチルアルコール、イソプ
ロピルアルコール、ターピネオール等のアルコール系溶
剤、酢酸エチル、酢酸ブチル等のエステル系溶剤、セロ
ソルブ、ブチルセロソルブ、ブチルカルビトール、N、
Nージメチルホルムアミド等が上げられるが、これらに
限定されるものではない。
As the solvent used for the conductive paste, an organic solvent or water used for general paints / pastes can be used. For example, as an organic solvent, cyclohexanone, isophorone, a ketone solvent such as diacetone alcohol, an alcohol solvent such as methyl alcohol, ethyl alcohol, isopropyl alcohol, terpineol, an ester solvent such as ethyl acetate or butyl acetate, cellosolve, butyl cellosolve. , Butyl carbitol, N,
Examples thereof include, but are not limited to, N-dimethylformamide and the like.

【0026】本発明の導電ペーストは、スクリーン印
刷、ブレードコーティング、ワイヤーバーコーティング
等の方法で基板に塗布した後、ペーストの種類により乾
燥硬化、熱硬化、紫外線硬化により成膜される。
The conductive paste of the present invention is applied to a substrate by a method such as screen printing, blade coating, wire bar coating, etc., and then dried and cured, heat cured, and ultraviolet cured to form a film, depending on the type of paste.

【0027】[0027]

【実施例】図1は本発明のEL素子の断面を示す模式図
であり、5は粒径の小さい透明導電性粉末、6は粒径の
小さい透明導電性粉末層である。
EXAMPLE FIG. 1 is a schematic view showing a cross section of an EL device of the present invention, in which 5 is a transparent conductive powder having a small particle size, and 6 is a transparent conductive powder layer having a small particle size.

【0028】すなわち、図1(a)は長径30μm以上
の針状ITO粉末4と粒径の小さい透明導電性粉末5を
同一膜内で用いたEL素子、(b)、(c)は長径30
μm以上の針状ITO粉末4と粒径の小さい透明導電性
粉末層6をそれぞれ別々の膜に用い、膜の低抵抗化と抵
抗の均一化を別々の膜で行うEL素子である。
That is, FIG. 1 (a) is an EL device using the acicular ITO powder 4 having a major axis of 30 μm or more and the transparent conductive powder 5 having a small particle size in the same film, and (b) and (c) are the major axis 30.
This is an EL element in which the needle-like ITO powder 4 having a size of μm or more and the transparent conductive powder layer 6 having a small particle size are used in different films, and the films have low resistance and uniform resistance.

【0029】抵抗の均一化は、長径の大きい針状ITO
粉末4が形成する数μm〜数十μmの網目状の導電パス
内で行われればよいため、用いる粒径の小さい透明導電
性粉末5の導電性はそれほど高くなくてもよい。比抵抗
では、数百Ω・cm以下、好ましくは数Ω・cm以下が
好ましい。
The uniform resistance is obtained by acicular ITO having a large major axis.
Since it may be performed in a mesh-shaped conductive path of several μm to several tens of μm formed by the powder 4, the conductivity of the transparent conductive powder 5 having a small particle size to be used may not be so high. The specific resistance is preferably several hundred Ω · cm or less, more preferably several Ω · cm or less.

【0030】また、図1(b)、(c)の場合、粒径の
小さい透明導電性粉末層6の表面抵抗としては、数百k
Ω/□程度でも十分効果があるため、層厚が例えば1μ
m以下と薄くても透光性導電膜全体の光線透過率にほと
んど影響をおよぼさない。この透明導電性粉末層6は、
導電ペーストと同様に、樹脂を溶解した溶液中に粒径の
小さい透明導電性粉末を分散させたペーストを塗布した
後、乾燥硬化、熱硬化、紫外線硬化するすることにより
得られる。
In the case of FIGS. 1B and 1C, the surface resistance of the transparent conductive powder layer 6 having a small particle size is several hundreds k.
Since even Ω / □ is sufficiently effective, the layer thickness is, for example, 1μ.
Even if it is as thin as m or less, it has almost no effect on the light transmittance of the entire transparent conductive film. This transparent conductive powder layer 6 is
Similar to the conductive paste, it is obtained by applying a paste in which a transparent conductive powder having a small particle size is dispersed in a solution in which a resin is dissolved, and then performing dry curing, heat curing, and ultraviolet curing.

【0031】実施例1 インジウムメタルを硝酸に溶解した溶液に四塩化錫含水
塩を加え、撹拌しながら加熱濃縮し、液温130〜15
0℃まで濃縮して濃厚なスラリーを生成せしめ、このス
ラリーに多量の水を加えて濾過し、濾過によって得た針
状粉末を洗浄、乾燥し、1200℃程度で30分間仮焼
して得られた、長径の平均値が42μmで、アスペクト
比が5以上、圧粉抵抗0.01Ω・cm、錫含有量2.
6重量%のITO粉末(その結晶構造を電子顕微鏡写真
で図2として示す)と、平均粒径0.04μm、圧粉抵
抗0.28Ω・cm、錫含有量4.4重量%の粒状IT
O粉末を表1のペースト1の組成に配合して混合、撹拌
した後、200メッシュステンレス金網で濾過し、得ら
れた導電ペーストを厚さ100μmのPETフィルム
(東レ株式会社製のルミラーTタイプ)上に150メッ
シュのスクリーン版で、4×5cmの大きさにスクリー
ン印刷し、120℃で20分間乾燥して透光性導電膜を
得た。得られた導電膜の表面抵抗、全光線透過率(38
0〜780mm)、ヘーズ値を表2にそれぞれ示す。表
面抵抗は、三菱油化社製のローレスタMCPーT400
(商品名)により測定した。全光線透過率、ヘーズ値
は、基板のPETフィルムと一緒にスガ試験機械社製の
直読ヘーズコンピュータHGMーZDP(商品名)によ
り測定した。
Example 1 To a solution of indium metal dissolved in nitric acid was added tin tetrachloride hydrate, and the mixture was heated and concentrated with stirring to a liquid temperature of 130 to 15
It was obtained by concentrating to 0 ° C. to form a thick slurry, adding a large amount of water to this slurry, filtering, washing the needle-shaped powder obtained by filtration, drying and calcining at 1200 ° C. for 30 minutes. In addition, the average value of the major axis is 42 μm, the aspect ratio is 5 or more, the dust resistance is 0.01 Ω · cm, and the tin content is 2.
6% by weight of ITO powder (the crystal structure of which is shown in FIG. 2 in an electron micrograph) and granular IT having an average particle size of 0.04 μm, a dust resistance of 0.28 Ω · cm, and a tin content of 4.4% by weight.
O powder was mixed with the composition of paste 1 in Table 1, mixed, stirred, and then filtered through a 200-mesh stainless steel wire net, and the obtained conductive paste was a PET film having a thickness of 100 μm (Lumirror T type manufactured by Toray Industries, Inc.) A 150 mesh screen plate was screen-printed on the top to a size of 4 × 5 cm, and dried at 120 ° C. for 20 minutes to obtain a translucent conductive film. The surface resistance and the total light transmittance of the obtained conductive film (38
0 to 780 mm) and haze values are shown in Table 2. Surface resistance is Loresta MCP-T400 manufactured by Mitsubishi Petrochemical Co., Ltd.
It was measured by (trade name). The total light transmittance and the haze value were measured together with the PET film of the substrate by a direct reading haze computer HGM-ZDP (trade name) manufactured by Suga Test Machine Co., Ltd.

【0032】本実施例で得られた導電ペーストを用い、
有機分散型ELを試作した。まず、片面にアルミニウム
を蒸着した厚さ100μm、面積4×5cm、0.95
Ω/□のポリエステルフィルムのアルミニウム蒸着面
に、絶縁層(誘電層)を形成した。絶縁層は、シアノエ
チルセルロース樹脂溶液中にチタン酸バリウム粒子を分
散させたチタン酸バリウムペーストを200メッシュス
クリーンを用いて4×5cmの大きさに印刷し乾燥して
得た。
Using the conductive paste obtained in this example,
An organic dispersion type EL was prototyped. First, aluminum was vapor-deposited on one surface to have a thickness of 100 μm, an area of 4 × 5 cm, and 0.95.
An insulating layer (dielectric layer) was formed on the aluminum deposition surface of the Ω / □ polyester film. The insulating layer was obtained by printing a barium titanate paste having barium titanate particles dispersed in a cyanoethyl cellulose resin solution in a size of 4 × 5 cm using a 200 mesh screen and drying.

【0033】この絶縁層の上に、蛍光体である硫化亜鉛
粒子をシアノエチルセルロース樹脂溶液中に分散させた
硫化亜鉛ペーストを200メッシュスクリーンを用いて
4×5cmの大きさに2回刷りして乾燥した。さらに、
その上に表1のペースト1の組成の導電ペーストを15
0メッシュスクリーンにより3×4cmの大きさに印刷
し、120℃、10分間乾燥し透光性導電膜を形成し
た。
On this insulating layer, zinc sulfide paste in which phosphorous zinc sulfide particles were dispersed in a cyanoethyl cellulose resin solution was printed twice in a size of 4 × 5 cm using a 200 mesh screen and dried. did. further,
On top of that, add a conductive paste having the composition of paste 1 in Table 1
Printing was performed with a 0 mesh screen in a size of 3 × 4 cm and dried at 120 ° C. for 10 minutes to form a translucent conductive film.

【0034】この透光性導電膜の一端に電圧印加用リー
ド線を、他端に抵抗測定用リード線をそれぞれ接続し、
ポリエステルフィルムのアルミニウム蒸着面の一端に電
圧印加用リード線を接続した。そして、これら積層体の
両面に4×5cmの捕水フィルムを重ね、さらにその両
側から前記のリード線の端部を外部に露出せしめて5×
6cmのフッ素フィルムで包み防湿ラミネート加工を施
してEL素子を作製した。
A voltage applying lead wire is connected to one end of the translucent conductive film, and a resistance measuring lead wire is connected to the other end thereof.
A voltage application lead wire was connected to one end of the aluminum deposition surface of the polyester film. Then, 4 × 5 cm water catching films were superposed on both surfaces of these laminates, and the end portions of the lead wires were exposed to the outside from both sides thereof to form 5 ×.
An EL device was prepared by wrapping with a 6 cm fluorine film and subjecting it to moisture-proof lamination.

【0035】このEL素子の透光性導電膜の両端に接続
した電圧印加用リード線と抵抗測定用リード線との間の
抵抗を測定して、透光性導電膜の表面抵抗を測定し、透
光性導電膜の一端に接続した電圧印加用リード線と、ポ
リエステルフィルムの蒸着面の一端に接続した電圧印加
用リード線との間に106V、800Hzの疑似台形波
の電圧を印加し、EL素子を発光させ、その輝度を測定
した。輝度測定は、輝度計(トプコン社製 商品名:B
Mー8)で測定した。その結果を表2に示す。
The resistance between the voltage applying lead wire and the resistance measuring lead wire connected to both ends of the transparent conductive film of this EL element was measured to measure the surface resistance of the transparent conductive film. A pseudo trapezoidal wave voltage of 106 V and 800 Hz is applied between the voltage applying lead wire connected to one end of the translucent conductive film and the voltage applying lead wire connected to one end of the vapor deposition surface of the polyester film. The device was made to emit light, and its brightness was measured. Luminance is measured by a luminance meter (product name: B manufactured by Topcon)
It was measured by M-8). The results are shown in Table 2.

【0036】実施例2 粒径の小さい透明導電性粉末として、平均粒径4μm、
圧粉抵抗26Ω・cm、錫含有量4.1重量%のりん片
状ITO粉末を用い、表1のペースト2の組成を用いた
以外は実施例1と同様にして透光性導電膜、EL素子を
得た。得られた透光性導電膜、EL素子に対し実施例1
と同様の測定を行った結果を同じく表2に示す。
Example 2 As a transparent conductive powder having a small particle size, an average particle size of 4 μm,
A translucent conductive film, EL was prepared in the same manner as in Example 1 except that the flaky ITO powder having a dust resistance of 26 Ω · cm and a tin content of 4.1% by weight was used and the composition of the paste 2 in Table 1 was used. The device was obtained. Example 1 was applied to the obtained translucent conductive film and EL device.
Table 2 also shows the result of the same measurement.

【0037】実施例3 粒径の小さい透明導電性粉末として、長径の平均値20
μm、圧粉抵抗0.05Ω・cm、錫含有量2.6重量
%の針状ITO粉末(その結晶構造を電子顕微鏡写真に
より図3として示す)を用い、表1のペースト3の組成
を用いた以外は、実施例1と同様にして透光性導電膜、
EL素子を得た。そして、実施例1と同様の測定を行っ
た結果を同じく表2に示す。
Example 3 As a transparent conductive powder having a small particle diameter, the average value of the major axis was 20.
Using a needle-shaped ITO powder having a particle size of μm, a powder resistance of 0.05 Ω · cm, and a tin content of 2.6 wt% (the crystal structure of which is shown in FIG. 3 by an electron micrograph), and the composition of paste 3 in Table 1 is used. A transparent conductive film was formed in the same manner as in Example 1 except that
An EL device was obtained. The results of the same measurements as in Example 1 are also shown in Table 2.

【0038】実施例4 実施例1で用いた粒状ITO粉末を、表1のペースト5
の組成となるように作成したペーストを厚さ100μm
のPETフィルム(東レ株式会社製のルミラーTタイ
プ)上に、200メッシュのスクリーン版で4×5cm
の大きさにスクリーン印刷し、120℃で20分間乾燥
し、膜厚0.8μm、表面抵抗113kΩ/□の導電膜
を得た。次いで、この導電膜の上に実施例1で用いた針
状ITO粉末を表1のペースト4の組成となるように作
成したペーストを150メッシュのスクリーン版で4×
5cmの大きさにスクリーン印刷し、120℃で20分
間乾燥して透光性導電膜を得るともに、実施例1と同様
にしてEL素子を得た。得られた透光性導電膜、EL素
子について実施例1と同様の測定を行った結果を同じく
表2に示す。
Example 4 The granular ITO powder used in Example 1 was used as the paste 5 in Table 1.
The paste made to have the composition of 100 μm thick
4 × 5 cm with a 200 mesh screen plate on a PET film (Lumirror T type manufactured by Toray Industries, Inc.)
Was screen-printed to a size of 100 μm and dried at 120 ° C. for 20 minutes to obtain a conductive film having a thickness of 0.8 μm and a surface resistance of 113 kΩ / □. Next, a paste prepared by making the needle-like ITO powder used in Example 1 so as to have the composition of paste 4 in Table 1 on the conductive film was 4 × with a 150 mesh screen plate.
An EL device was obtained in the same manner as in Example 1 while screen-printing to a size of 5 cm and drying at 120 ° C. for 20 minutes to obtain a translucent conductive film. Table 2 also shows the results obtained by performing the same measurement as in Example 1 on the obtained transparent conductive film and EL device.

【0039】実施例5 実施例2で用いたりん片状ITO粉末を表1のペースト
6の組成となるように作成したペーストを厚さ100μ
mのPETフィルム(東レ株式会社製のルミラーTタイ
プ)上に、200メッシュのスクリーン版で4×5cm
の大きさにスクリーン印刷し、120℃で20分間乾燥
し、膜厚0.8μm、表面抵抗135kΩ/□の導電膜
を得た。次いで、この導電膜の上に実施例1で用いた針
状ITO粉末を表1のペースト4の組成となるように作
成したペーストを150メッシュのスクリーン版で4×
5cmの大きさにスクリーン印刷し、120℃で20分
間乾燥して透光性導電膜を得るともに、実施例1と同様
にしてEL素子を得た。得られた透光性導電膜、EL素
子について実施例1と同様の測定を行った結果を同じく
表2に示す。
Example 5 A paste prepared by using the flaky ITO powder used in Example 2 so as to have the composition of paste 6 in Table 1 had a thickness of 100 μm.
4 x 5 cm with 200 mesh screen plate on m PET film (Lumirror T type manufactured by Toray Industries, Inc.)
Was screen printed and dried at 120 ° C. for 20 minutes to obtain a conductive film having a film thickness of 0.8 μm and a surface resistance of 135 kΩ / □. Next, a paste prepared by making the needle-like ITO powder used in Example 1 so as to have the composition of paste 4 in Table 1 on the conductive film was 4 × with a 150 mesh screen plate.
An EL device was obtained in the same manner as in Example 1 while screen-printing to a size of 5 cm and drying at 120 ° C. for 20 minutes to obtain a translucent conductive film. Table 2 also shows the results obtained by performing the same measurement as in Example 1 on the obtained transparent conductive film and EL device.

【0040】実施例6 実施例4において、粒状ITO粉末を含む表1のペース
ト5と、針状ITO粉末を含む表1のペースト4のPE
Tフィルム及びEL基板に対する成膜を、逆の順番に行
った以外は、実施例4と同様にして得た透光性導電膜、
EL素子の、実施例1と同様の測定結果を同じく表2に
示す。
Example 6 In Example 4, the paste 5 of Table 1 containing granular ITO powder and the PE of paste 4 of Table 1 containing acicular ITO powder.
A translucent conductive film obtained in the same manner as in Example 4 except that the film formation on the T film and the EL substrate was performed in the reverse order.
The same measurement results as in Example 1 of the EL element are also shown in Table 2.

【0041】比較例1 実施例1で用いた針状ITO粉末を表1のペースト4の
組成となるように作成した導電ペーストを用いた以外
は、実施例1と同様にして得た透光性導電膜およびEL
素子の、実施例1と同様の測定結果を同じく表2に示
す。
Comparative Example 1 Translucency obtained in the same manner as in Example 1 except that the conductive paste prepared by making the acicular ITO powder used in Example 1 to have the composition of paste 4 in Table 1 was used. Conductive film and EL
The same measurement results as in Example 1 of the device are also shown in Table 2.

【0042】比較例2 実施例3で用いた長径の平均値20μm、圧粉抵抗0.
05Ω・cm、錫含有量2.6重量%の針状ITO粉末
を用い、表1のペースト7の組成となるように作成した
導電ペーストを用いた以外は、実施例1と同様にして得
た透光性導電膜およびEL素子の、実施例1と同様の測
定結果を同じく表2に示す。
Comparative Example 2 The average value of the major axis used in Example 3 was 20 μm, and the powder resistance was 0.
Obtained in the same manner as in Example 1 except that a needle-like ITO powder having a content of 05 Ω · cm and a tin content of 2.6 wt% was used and a conductive paste prepared so as to have the composition of paste 7 in Table 1 was used. The same measurement results as in Example 1 for the transparent conductive film and the EL element are also shown in Table 2.

【0043】表2の結果より明らかなごとく、本発明の
透光性導電膜およびEL素子は、すべて従来とほぼ同等
の低抵抗を示し、かつ従来より優れた輝度が得られた。
As is clear from the results shown in Table 2, all of the transparent conductive film and EL element of the present invention showed a low resistance almost equal to that of the conventional one, and a brightness superior to that of the conventional one was obtained.

【0044】[0044]

【表1】 [Table 1]

【0045】[0045]

【表2】 [Table 2]

【0046】[0046]

【発明の効果】以上説明したごとく、本発明の透光性導
電膜およびEL素子は、長径が30μm以上の大きな針
状ITO粉末を用いているので低抵抗の導電膜が得ら
れ、併せて粒径の小さい透明導電性粉末を用いているの
で、導電膜面内の抵抗の均一化がはかられ、かつ従来よ
りも高い輝度が得られるという優れた効果を有する。
As described above, since the transparent conductive film and the EL element of the present invention use large acicular ITO powder having a major axis of 30 μm or more, a low resistance conductive film can be obtained, and at the same time, particles can be obtained. Since the transparent conductive powder having a small diameter is used, it has an excellent effect that the resistance in the plane of the conductive film can be made uniform and a higher brightness than the conventional one can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のEL素子の断面を示す模式図であり、
(a)は長径30μm以上の針状ITO粉末と粒径の小
さい透明導電性粉末を同一膜内で用いたEL素子、
(b)、(c)は長径30μm以上の針状ITO粉末と
粒径の小さい透明導電性粉末層をそれぞれ別々の膜に用
い、膜の低抵抗化と抵抗の均一化を別々の膜で行うEL
素子である。
FIG. 1 is a schematic view showing a cross section of an EL element of the present invention,
(A) is an EL element using acicular ITO powder having a major axis of 30 μm or more and transparent conductive powder having a small particle size in the same film,
In (b) and (c), needle-like ITO powder having a major axis of 30 μm or more and a transparent conductive powder layer having a small particle size are used in different films, and the films are made to have low resistance and uniform resistance. EL
It is an element.

【図2】 この発明の実施例1における針状ITO粉末
の結晶構造を示す電子顕微鏡写真である。
FIG. 2 is an electron micrograph showing a crystal structure of acicular ITO powder in Example 1 of the present invention.

【図3】 同上実施例3における針状ITO粉末の結晶
構造を示す電子顕微鏡写真である。
FIG. 3 is an electron micrograph showing the crystal structure of acicular ITO powder in Example 3 above.

【図4】長径30μm以上の針状ITO粉末だけを導電
性フィラーとして用いて形成した導電膜を使用した分散
型EL素子の断面を示す模式図である。
FIG. 4 is a schematic view showing a cross section of a dispersion-type EL device using a conductive film formed by using only acicular ITO powder having a major axis of 30 μm or more as a conductive filler.

【符号の説明】[Explanation of symbols]

1 金属電極 2 誘電体層 3 蛍光体粒子 4 長径30μm以上の針状ITO粉末 5 粒径の小さい透明導電性粉末 6 粒径の小さい透明導電性粉末層 DESCRIPTION OF SYMBOLS 1 Metal electrode 2 Dielectric layer 3 Phosphor particles 4 Needle-like ITO powder with a major axis of 30 μm or more 5 Transparent conductive powder with small particle size 6 Transparent conductive powder layer with small particle size

───────────────────────────────────────────────────── フロントページの続き (72)発明者 薄葉 三夫 東京都品川区西五反田7−9−4 東北化 工株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Mitsuo Usoba 7-9-4 Nishigotanda, Shinagawa-ku, Tokyo Tohoku Kako Co., Ltd.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 樹脂およびその溶剤中に、長径30μm
以上で短径に対する長径の比が5以上の針状インジウム
ー錫酸化物粉末と粒径の小さい透明導電性粉末を含有す
る導電ペースト。
1. A major axis of 30 μm in a resin and its solvent.
A conductive paste containing acicular indium-tin oxide powder having a ratio of major axis to minor axis of 5 or more and transparent conductive powder having a small particle diameter.
【請求項2】 長径30μm以上の針状インジウムー錫
酸化物粉末と粒径の小さい透明導電性粉末および樹脂と
からなる透光性導電膜。
2. A transparent conductive film comprising acicular indium-tin oxide powder having a major axis of 30 μm or more, transparent conductive powder having a small particle size, and resin.
【請求項3】 粒径の小さい透明導電性粉末と樹脂とか
らなる透光性導電膜と、長径30μm以上の針状インジ
ウムー錫酸化物粉末と樹脂とからなる透光性導電膜とか
らなり、前記2種の透光性導電膜が相互に積層された透
光性導電膜。
3. A transparent conductive film made of a transparent conductive powder having a small particle size and a resin, and a transparent conductive film made of acicular indium-tin oxide powder having a major axis of 30 μm or more and a resin. A transparent conductive film in which the two types of transparent conductive films are laminated on each other.
【請求項4】 金属電極、誘電体粒子層、蛍光体粒子層
の順に積層された基板上に、長径30μm以上の針状イ
ンジウムー錫酸化物粉末と粒径の小さい透明導電性粉末
および樹脂とからなる透光性導電膜が形成された分散型
エレクトロルミネッセンス素子。
4. A needle-shaped indium-tin oxide powder having a major axis of 30 μm or more, a transparent conductive powder having a small particle size, and a resin are formed on a substrate in which a metal electrode, a dielectric particle layer, and a phosphor particle layer are laminated in this order. Dispersive electroluminescent element having a transparent conductive film formed thereon.
【請求項5】 金属電極、誘電体粒子層、蛍光体粒子層
の順に積層された基板上に、粒径の小さい透明導電性粉
末と樹脂とからなる透光性導電膜と、長径30μm以上
の針状インジウムー錫酸化物粉末と樹脂とからなる透光
性導電膜が、相互に積層された分散型エレクトロルミネ
ッセンス素子。
5. A transparent conductive film composed of a transparent conductive powder and a resin having a small particle size, and a long diameter of 30 μm or more on a substrate in which a metal electrode, a dielectric particle layer and a phosphor particle layer are laminated in this order. A dispersion-type electroluminescence device in which translucent conductive films made of acicular indium-tin oxide powder and resin are laminated on each other.
【請求項6】 粒径の小さい透明導電性粉末が、長径3
0μm以下の針状インジウムー錫酸化物粉末または粒径
30μm以下のりん片状インジウムー錫酸化物粉末また
は粒径1μm以下の粒状導電性酸化物粉末のうちの少な
くとも1つである請求項1〜5記載の導電ペースト、透
光性導電膜、分散型エレクトロルミネッセンス素子。
6. A transparent conductive powder having a small particle size has a major axis of 3
6. At least one of acicular indium-tin oxide powder having a particle size of 0 μm or less, scaly indium tin oxide powder having a particle size of 30 μm or less, or granular conductive oxide powder having a particle size of 1 μm or less. Conductive paste, translucent conductive film, and dispersion type electroluminescent device.
JP23052894A 1994-08-31 1994-08-31 Conductive paste, light-transmitting conductive film, and dispersion-type electroluminescent device using them Expired - Fee Related JP3560651B2 (en)

Priority Applications (1)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23052894A JP3560651B2 (en) 1994-08-31 1994-08-31 Conductive paste, light-transmitting conductive film, and dispersion-type electroluminescent device using them

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JPH0878164A true JPH0878164A (en) 1996-03-22
JP3560651B2 JP3560651B2 (en) 2004-09-02

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