JPH084974Y2 - Compound electropolishing equipment - Google Patents
Compound electropolishing equipmentInfo
- Publication number
- JPH084974Y2 JPH084974Y2 JP1992056358U JP5635892U JPH084974Y2 JP H084974 Y2 JPH084974 Y2 JP H084974Y2 JP 1992056358 U JP1992056358 U JP 1992056358U JP 5635892 U JP5635892 U JP 5635892U JP H084974 Y2 JPH084974 Y2 JP H084974Y2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- pad
- hole
- recess
- wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本考案は電解液を送入しながら電
解研磨を行うと共に機械研磨を行う複合電解研磨装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a composite electropolishing apparatus for performing electropolishing and mechanical polishing while feeding an electrolytic solution.
【０００２】[0002]
【従来の技術】バフ研磨に代表される機械研磨は粗研磨
に、まためっきの前処理に適した電解研磨は微細な研磨
に用いられており、これらの長所を兼ね備えた複合電解
研磨装置が実用化されている。図１は従来の複合電解研
磨装置におけるワーク部（回転部）を示す模式的断面図
である。図中１はステンレス鋼製の回転軸であり、先端
部は雄ネジになっており他方は図示しないモータに接続
されている。この回転軸１に銅製の電極２，スポンジか
らなるパッド３が取り付けられワーク部を形成してい
る。2. Description of the Related Art Mechanical polishing typified by buffing is used for rough polishing, and electrolytic polishing suitable for pretreatment of plating is used for fine polishing. A composite electrolytic polishing apparatus having these advantages is practically used. Has been converted. FIG. 1 is a schematic sectional view showing a work part (rotating part) in a conventional composite electrolytic polishing apparatus. In the figure, 1 is a rotating shaft made of stainless steel, the tip end is a male screw, and the other end is connected to a motor (not shown). A copper electrode 2 and a pad 3 made of sponge are attached to the rotary shaft 1 to form a work part.
【０００３】電極２は中空の円板状であり、断面形状は
略台形をなしている。この電極２の上面中央部は前記回
転軸１より大きな開口部2aを有している。また下面中央
部は断面が台形状の凹部を有し、さらにその中心部は雌
ネジになっており、回転軸１に螺合されている。この電
極２のリング状の底部、即ち下面の凹部以外の部分には
周方向に複数の孔2bが開設してある。図２に電極２の下
面図を示す。またこの電極２は回転軸１を介して図示し
ない電源に接続されている。The electrode 2 has a hollow disk shape, and its cross section is substantially trapezoidal. The central portion of the upper surface of the electrode 2 has an opening 2a larger than the rotating shaft 1. Further, the central portion of the lower surface has a concave portion having a trapezoidal cross section, and the central portion thereof has a female screw, which is screwed onto the rotary shaft 1. A plurality of holes 2b are formed in the circumferential direction in the ring-shaped bottom portion of the electrode 2, that is, in the portion other than the concave portion of the lower surface. FIG. 2 shows a bottom view of the electrode 2. Further, the electrode 2 is connected to a power source (not shown) via the rotating shaft 1.
【０００４】この電極２の下側に、電極２の下面形状に
対応する形状を有し、中央に回転軸１が嵌合する孔が開
設された円形のパッド３を嵌合し、その下側からステン
レス鋼製のナット４でパッド３を固定している。この固
定部は前記凹部に収まっており、被研磨材を傷つけない
ようになしてある。A circular pad 3 having a shape corresponding to the shape of the lower surface of the electrode 2 and having a hole for fitting the rotating shaft 1 in the center is fitted to the lower side of the electrode 2, and the lower side thereof is fitted thereto. The pad 3 is fixed with a nut 4 made of stainless steel. The fixing portion is housed in the concave portion so as not to damage the material to be polished.
【０００５】また電解液を電極２内へ送入するためのウ
レタン製のパイプ５が前記開口部2aへ臨ませて配設され
ている。そして図示しないモータにより回転軸１を駆動
させ、電解液の送入を行う。電解液は電極２底部の孔2b
を通ってパッド３へ供給され、電流が流れることにより
機械研磨と電解研磨が同時的に行われる。A urethane pipe 5 for feeding the electrolytic solution into the electrode 2 is provided so as to face the opening 2a. Then, the rotating shaft 1 is driven by a motor (not shown) to feed the electrolytic solution. The electrolyte is the hole 2b at the bottom of the electrode 2.
Is supplied to the pad 3 through the electric current and a current flows, so that mechanical polishing and electrolytic polishing are simultaneously performed.
【０００６】[0006]
【考案が解決しようとする課題】ところが上述の如き従
来装置はパッド３の中央部では研磨を行い得ず、作業面
積が小さく、電流の流量も少なかった。このため、長い
研磨時間を必要とし、生産能率が低かった。ここでパッ
ド３の中央部を被研磨材に接触させることとして作業面
積を増大させることが考えられるが、従来装置において
このような工夫をするだけでは問題は解決されなかっ
た。すなわち電解液がパッド３の周辺部にしか供給され
ないため、ワーク部が回転すると遠心力により電解液は
外側へ押しやられパッド３の中央部には電解液が十分に
供給されない。この場合は電流分布が不均一となるた
め、生産能率が上がらないばかりか製品品質も低下す
る。本考案は斯かる事情に鑑みてなされたものであり、
パッドの作業面積を拡大し電解液の供給経路を多岐にす
ることにより、生産能率及び製品品質の向上を可能とす
る複合電解研磨装置を提供することを目的とする。However, in the conventional device as described above, the central portion of the pad 3 cannot be polished, the working area is small, and the current flow rate is small. Therefore, a long polishing time is required, and the production efficiency is low. Here, it is conceivable that the work area is increased by bringing the central portion of the pad 3 into contact with the material to be polished, but the problem cannot be solved only by making such a device in the conventional device. That is, since the electrolytic solution is supplied only to the peripheral part of the pad 3, the electrolytic solution is pushed outward by the centrifugal force when the work part rotates, and the electrolytic solution is not sufficiently supplied to the central part of the pad 3. In this case, the current distribution becomes non-uniform, so that not only the production efficiency does not increase, but also the product quality deteriorates. The present invention has been made in view of such circumstances,
An object of the present invention is to provide a composite electropolishing apparatus capable of improving production efficiency and product quality by enlarging the work area of the pad and diversifying the electrolyte supply path.
【０００７】[0007]
【課題を解決するための手段】本考案に係る複合電解研
磨装置は、回転軸と、内部が中空であって、底部壁の中
央部に内側に凹む凹み部を備え、周縁部に電解液を流す
複数の孔を備え、前記凹み部を形成した部分の底部の壁
を貫通して前記回転軸の先端部が固定された第１の電極
と、該第１の電極の底部壁の外面に固定された機械研磨
用のパッドとからなるワーク部を回転させ、前記底部壁
周縁部の孔を介して前記パッドへ電解液を供給しながら
電解研磨を行う複合電解研磨装置において、前記機械研
磨用のパッドはスポンジ製であって、前記第１の電極の
底部壁外面に前記孔及び凹み部を覆うよう固定され、ま
た前記回転軸は電解液を通流すべく中空に形成され、そ
の先端部を前記底部壁を貫通して凹み部内に臨ませ、前
記凹み部内に位置させて前記回転軸の先端に第２の電極
を設けると共に、前記回転軸の周壁又は先端には、前記
パッドに電解液を供給すべく、前記第１の電極の底部壁
の孔及び凹み部内夫々に連通する電解液供給用の孔を設
けたことを特徴とする。SUMMARY OF THE INVENTION A composite electropolishing apparatus according to the present invention has a rotating shaft and a hollow interior, which is located in the bottom wall.
Equipped with a recess that is recessed inward at the center, and the electrolyte flows to the periphery.
A wall at the bottom of the portion having a plurality of holes and in which the recess is formed
A first electrode tip of the rotary shaft is fixed through, rotating the workpiece portions comprising a bottom pad for mechanical polishing which is fixed to the outer surface of the wall of the first electrode, said bottom wall
In a composite electropolishing apparatus that performs electropolishing while supplying an electrolytic solution to the pad through a hole in a peripheral portion, the pad for mechanical polishing is made of sponge, and the pad for external surface of the bottom wall of the first electrode is fixed so as to cover the hole and recess and said rotary shaft is formed to be hollow to flow through the electrolyte, its
The front end of the through the bottom wall to face the recess,
A second electrode is provided at the tip of the rotary shaft so as to be positioned in the recess.
Is provided on the peripheral wall or the tip of the rotary shaft,
Bottom wall of the first electrode for supplying electrolyte to the pad
And a hole for supplying an electrolytic solution, which communicates with each of the hole and the recessed portion .
【０００８】[0008]
【作用】本考案にあっては平坦なパッドを用い、電解液
の供給経路を多岐にし、第２の電極を備えることによ
り、電解液をパッド全体に十分に供給することができ、
また電流分布を均一にすることができる。In the present invention, a flat pad is used, the supply path of the electrolytic solution is diversified, and the second electrode is provided, so that the electrolytic solution can be sufficiently supplied to the entire pad.
Also, the current distribution can be made uniform.
【０００９】[0009]
【実施例】以下本考案をその実施例を示す図面に基づい
て説明する。図３は本考案に係る複合電解研磨装置のワ
ーク部（回転部）を示す模式的断面図である。図中11は
銅製、中空の回転軸であり、この回転軸11の下部は小径
部を備える。この段部のすぐ上の側面に複数の孔11a を
有し、小径部の適宜部分の側面に複数の孔11b を有す
る。また先端部は雄ネジになっている。さらに回転軸11
の他方側は図示しない本体に接続されており、本体はエ
アー駆動装置及びコネクタを備える。このエアー駆動装
置により回転軸11は回転し、またコネクタを介して回転
軸11内へ電解液が送入されるようになっている。また回
転軸11は図示しない電極に接続されている。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings showing its embodiments. FIG. 3 is a schematic cross-sectional view showing a work part (rotating part) of the composite electrolytic polishing apparatus according to the present invention. In the figure, 11 is a hollow rotating shaft made of copper, and the lower part of this rotating shaft 11 has a small diameter portion. A plurality of holes 11a are provided on the side surface immediately above this step portion, and a plurality of holes 11b are provided on the side surface of an appropriate portion of the small diameter portion. The tip is a male screw. Further rotating shaft 11
The other side of is connected to a main body (not shown), and the main body includes an air driving device and a connector. The rotating shaft 11 is rotated by this air drive device, and the electrolytic solution is fed into the rotating shaft 11 through the connector. The rotating shaft 11 is connected to an electrode (not shown).
【００１０】このような回転軸11の段部に銅製の電極12
が嵌合されている。電極12は従来装置における電極２と
同形である。即ち中空の円板状であり、断面は略台形を
なしている。この電極12の上面中央部は前記回転軸11よ
り大きな開口部を有している。また下面中央部は前記小
径部の長さ分だけ断面が台形状に凹んでおり、さらにそ
の中心部に孔が開設してあり、前記段部に嵌合されてい
る。この電極12のリング状の底部、即ち下面の凹部以外
の部分には図４に示す如く周方向に複数の孔12a が開設
してある。An electrode 12 made of copper is provided on the stepped portion of the rotary shaft 11 as described above.
Are fitted. The electrode 12 has the same shape as the electrode 2 in the conventional device. That is, it has a hollow disk shape, and its cross section is substantially trapezoidal. The central portion of the upper surface of the electrode 12 has an opening larger than the rotating shaft 11. The central portion of the lower surface has a trapezoidal cross section for the length of the small-diameter portion, and a hole is formed in the central portion to fit the stepped portion. A plurality of holes 12a are formed in the circumferential direction in the ring-shaped bottom portion of the electrode 12, that is, in the portion other than the concave portion of the lower surface, as shown in FIG.
【００１１】電極13は電極12の下面の凹部より小さく回
転軸11の先端部より大きい銅製の円板であり、電極13の
中央部は上半分が雌ネジになっており、回転軸11と螺合
している。また下半分は雌ネジより細い透孔13a が開設
してある。そして電極12の上面及び側面を覆う態様で伸
縮性があるウレタンからなるカバー15が取り付けられて
いる。電極12,13 の下側にスポンジからなりカバー15よ
り大きい円板状のパッド14が取り付けられており、カバ
ー15の底面とパッド14の周縁部は接着させてある。この
伸縮性があるカバー15を用いることでパッド14と電極1
2,13 とが適度に密着する。The electrode 13 is a disk made of copper that is smaller than the recessed portion of the lower surface of the electrode 12 and larger than the tip of the rotating shaft 11, and the upper half of the central portion of the electrode 13 is a female screw. I am fit. The lower half has a through hole 13a which is thinner than the female screw. A cover 15 made of urethane having elasticity is attached so as to cover the upper surface and the side surface of the electrode 12. A disc-shaped pad 14 made of sponge and larger than the cover 15 is attached to the lower side of the electrodes 12 and 13, and the bottom surface of the cover 15 and the peripheral edge of the pad 14 are bonded. By using this elastic cover 15, the pad 14 and the electrode 1
2 and 13 are in close contact with each other.
【００１２】回転軸11の中空部へ送入された電解液は回
転軸11の孔11a から漏出し電極12内部を流れ底部の孔12
a を通ってカバー15との接着部より内側のパッド14の周
縁部へ供給される (経路Ｒ1 ）。また電解液は回転軸11
の孔11b からも漏出し電極12と電極13との間を通って前
記周縁部より内側部のパッド14へ供給される（経路
Ｒ2 ）。さらに電解液は回転軸11の内部から鉛直方向下
向きにも漏出し、電極13の孔13a を通ってパッド14の中
心部へ供給される（経路Ｒ3 ）。The electrolytic solution fed into the hollow portion of the rotary shaft 11 leaks from the hole 11a of the rotary shaft 11 through the inside of the electrode 12 and the hole 12 at the bottom.
It is supplied to the peripheral portion of the pad 14 inside the portion bonded to the cover 15 through a (route R 1 ). Also, the electrolyte is the rotating shaft 11
It is also supplied from the hole 11b through the leak electrode 12 and the electrode 13 to the pad 14 on the inner side of the peripheral portion (route R 2 ). Further electrolyte also leaked vertically downward from the interior of the rotary shaft 11, is fed through a hole 13a of the electrode 13 to the center of the pad 14 (route R 3).
【００１３】以上の如き構成の複合電解研磨装置を用い
て機械研磨と電解研磨とを同時的に行うと、電解液をパ
ッドの中心部、その周辺部及び周縁部へ供給できるの
で、電解液はパッド全体へ十分に行き渡り電流量が増大
し電流分布も均一であるので、短い研磨時間で高性能な
研磨を行うことができる。なお、回転軸11、電極12,13
には銅, 真鍮等の導電率効果が高い金属で、かつ電解液
に溶解しない金属を使用することができる。When mechanical polishing and electrolytic polishing are simultaneously performed using the composite electrolytic polishing apparatus having the above-mentioned structure, the electrolytic solution can be supplied to the central portion, the peripheral portion and the peripheral portion of the pad. Since the current amount is sufficiently spread over the entire pad and the current distribution is uniform, high-performance polishing can be performed in a short polishing time. In addition, the rotating shaft 11, the electrodes 12, 13
As the metal, it is possible to use a metal having a high conductivity effect, such as copper or brass, and a metal that does not dissolve in the electrolytic solution.
【００１４】[0014]
【発明の効果】以上の如く本考案に係る複合電解研磨装
置ではスポンジ製のパッドを使用し、これを第１の電極
の底部壁の孔及び凹み部を覆うよう設け、また回転軸は
中空とし、その周壁又は先端には電解液の供給用の孔を
設け、電解液を第１の電極の底部壁の孔又は凹み部から
パッドの中心部及び周縁部へ供給することとしたので、
パッド全体へ十分に電解液を供給することができる。ま
た第２の電極を回転軸の先端に設けたことと併せて電流
の流れ及び電流分布が良好となり、作業面積が広がり、
研磨時間の短縮及び製品品質の向上が可能となる外、第
１の電極自体の構成が簡略化されてコスト低減を図れる
等本考案は優れた効果を奏する。A composite electrolytic polishing apparatus according to the present invention as described above, according to the present invention uses a pad made of sponge, which is provided so as to cover the hole and the recessed portion of the bottom wall of the first electrode, also rotating shaft
It is hollow and has a hole for electrolyte supply on its peripheral wall or tip.
Since the electrolyte is supplied from the hole or the recess of the bottom wall of the first electrode to the central portion and the peripheral portion of the pad,
The electrolytic solution can be sufficiently supplied to the entire pad. In addition, the second electrode is provided at the tip of the rotary shaft, so that the current flow and current distribution are improved, and the work area is expanded.
The present invention has excellent effects such that the polishing time can be shortened and the product quality can be improved, and the structure of the first electrode itself can be simplified to reduce the cost.
【図１】従来の複合電解研磨装置のワーク部を示す模式
的断面図である。FIG. 1 is a schematic cross-sectional view showing a work part of a conventional composite electrolytic polishing apparatus.
【図２】従来装置における電極の下面図である。FIG. 2 is a bottom view of an electrode in a conventional device.
【図３】本考案に係る複合電解研磨装置のワーク部を示
す模式的断面図である。FIG. 3 is a schematic cross-sectional view showing a work part of the composite electrolytic polishing apparatus according to the present invention.
【図４】本考案装置における電極の下面図である。FIG. 4 is a bottom view of electrodes in the device of the present invention.
11 回転軸 12,13 電極 14 パッド 15 カバー Ｒ1 ，Ｒ2 ，Ｒ3 経路11 Rotating shaft 12,13 Electrode 14 Pad 15 Cover R 1 , R 2 , R 3 Path
Claims (1)
の中央部に内側に凹む凹み部を備え、周縁部に電解液を
流す複数の孔を備え、前記凹み部を形成した部分の底部
の壁を貫通して前記回転軸の先端部が固定された第１の
電極と、該第１の電極の底部壁の外面に固定された機械
研磨用のパッドとからなるワーク部を回転させ、前記底
部壁周縁部の孔を介して前記パッドへ電解液を供給しな
がら電解研磨を行う複合電解研磨装置において、 前記機械研磨用のパッドはスポンジ製であって、前記第
１の電極の底部壁外面に前記孔及び凹み部を覆うよう固
定され、また前記回転軸は電解液を通流すべく中空に形
成され、その先端部を前記底部壁を貫通して凹み部内に
臨ませ、前記凹み部内に位置させて前記回転軸の先端に
第２の電極を設けると共に、前記回転軸の周壁又は先端
には、前記パッドに電解液を供給すべく、前記第１の電
極の底部壁の孔及び凹み部内夫々に連通する電解液供給
用の孔を設けたことを特徴とする複合電解研磨装置。1. A rotary shaft and a bottom wall having a hollow interior.
Equipped with a concave part that is recessed inward at the center of the
The bottom of the portion where the recess is formed, which has a plurality of holes for flowing
A first electrode tip of the rotary shaft through the walls is fixed, by rotating the workpiece portions comprising a bottom pad for mechanical polishing which is fixed to the outer surface of the wall of the first electrode, The bottom
A composite electropolishing apparatus for performing electropolishing while supplying an electrolytic solution to the pad through a hole in a peripheral edge of the wall , wherein the pad for mechanical polishing is made of sponge, and an outer surface of a bottom wall of the first electrode is formed. It said hole and is fixed so as to cover the recessed portion, also hollow form to the axis of rotation passing through the electrolyte
The bottom part of the bottom wall is penetrated into the recess.
Face it, position it in the recess and attach it to the tip of the rotary shaft.
A second electrode is provided, and the peripheral wall or tip of the rotating shaft is provided.
The first electrode to supply an electrolyte solution to the pad.
Electrolyte supply that communicates with the hole and recess in the bottom wall of the pole
A composite electropolishing device, which is provided with holes for use .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1992056358U JPH084974Y2 (en) | 1992-07-16 | 1992-07-16 | Compound electropolishing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1992056358U JPH084974Y2 (en) | 1992-07-16 | 1992-07-16 | Compound electropolishing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0611924U JPH0611924U (en) | 1994-02-15 |
| JPH084974Y2 true JPH084974Y2 (en) | 1996-02-14 |
Family
ID=13025027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1992056358U Expired - Lifetime JPH084974Y2 (en) | 1992-07-16 | 1992-07-16 | Compound electropolishing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH084974Y2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6232726U (en) * | 1985-08-09 | 1987-02-26 | ||
| JP3079226U (en) * | 2000-12-08 | 2001-08-10 | 株式会社シフト・コミュニケーションズ | Heated food transportation system |
-
1992
- 1992-07-16 JP JP1992056358U patent/JPH084974Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0611924U (en) | 1994-02-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN205363430U (en) | Electrochemistry magnetic grinding machine suitable for processing of compo pipe polishing | |
| JPH0343144A (en) | Method and device for grinding lens | |
| JPH084974Y2 (en) | Compound electropolishing equipment | |
| CN109986414A (en) | A kind of device being electrolysed rotary ultrasonic magnetic force composite polishing plane | |
| JP2565176Y2 (en) | Composite electrolytic polishing equipment | |
| JPH06315829A (en) | Beveling method for cut-resistant material | |
| JP2537614Y2 (en) | Electrolytic composite polishing tool | |
| WO2005000512A1 (en) | Rotation surface-reducing head, electrolytic surface-reducing device, and electrolytic surface-reducing method | |
| JP2000202719A (en) | Elecrolytic grinding device for worm wheel | |
| JPS6284929A (en) | Electrode for electric discharge machining | |
| JPH0354819Y2 (en) | ||
| JPS62124869A (en) | Method for truing and dressing of metal bonded grinding stone | |
| JP2843156B2 (en) | Electrolytic buff compound polishing machine | |
| JPS5914111Y2 (en) | Electrolytic buffing compound polishing device | |
| CN217281130U (en) | Ultrasonic kneading and flattening device | |
| CN213615904U (en) | Stable small electric grinder | |
| CN220825840U (en) | Polishing device | |
| KR20120105316A (en) | Head of electro polishing apparatus | |
| JP2950064B2 (en) | Electrolytic dressing type grinding machine | |
| JP3304163B2 (en) | Electrolytic in-process dressing grinding machine | |
| JPS61219527A (en) | Method and device for electrolytic and abrasive grain composite polishing | |
| JPH07223152A (en) | Surface grinder | |
| JP3845209B2 (en) | Lens polishing method and apparatus | |
| JPH0627020U (en) | Compound electropolishing equipment | |
| JP2537615Y2 (en) | Electrolytic compound polishing machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |