JPH08340081A - Semiconductor device and its manufacture - Google Patents

Semiconductor device and its manufacture

Info

Publication number
JPH08340081A
JPH08340081A JP7146672A JP14667295A JPH08340081A JP H08340081 A JPH08340081 A JP H08340081A JP 7146672 A JP7146672 A JP 7146672A JP 14667295 A JP14667295 A JP 14667295A JP H08340081 A JPH08340081 A JP H08340081A
Authority
JP
Japan
Prior art keywords
semiconductor chip
semiconductor
semiconductor device
lead frame
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7146672A
Other languages
Japanese (ja)
Other versions
JP3602888B2 (en
Inventor
Koji Nose
幸之 野世
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP14667295A priority Critical patent/JP3602888B2/en
Publication of JPH08340081A publication Critical patent/JPH08340081A/en
Application granted granted Critical
Publication of JP3602888B2 publication Critical patent/JP3602888B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48145Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/0132Binary Alloys
    • H01L2924/01322Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE: To provide an inexpensive, highly reliable, and high-added-value semiconductor device having a composite function by combining single-function semiconductor chips in a small-sized package. CONSTITUTION: After semiconductor chips 2 and 3 are stacked upon another with an organic insulating film 12 in between and the chips 2 and 3 are fixed to the die pad 9 of a lead frame, electrode terminals 5 on the main surfaces of the chips 2 and 3 are connected to the inner leads 7 of the lead frame and to each other through metallic thin wires 8 and the chips 2 and 3, lead frame, and leads 7 are encapsulated with a sealing resin into the external size of a package 4. Then outer leads 11 are plated and molded.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、複数個の半導体チップ
を積み重ねて複合機能を保有させた半導体装置とその製
造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device in which a plurality of semiconductor chips are stacked to have a composite function and a manufacturing method thereof.

【0002】[0002]

【従来の技術】半導体装置に複合機能を持たせる設計手
法として、1チップ化設計手法と、マルチチップ化設計
手法とが知られている。
2. Description of the Related Art A one-chip design method and a multi-chip design method are known as design methods for giving a semiconductor device a composite function.

【0003】1チップ化設計手法によれば、例えばPR
OM搭載マイコンやBiCMOS型半導体装置におい
て、1枚のシリコン基板の主面上に、発振、分周、昇降
圧、分圧、平滑、整形、制御、演算、記憶等からなる種
々の電子回路ブロックを組み合わせて配置することで、
目的とする複合機能が得られる。ただし、このようにし
て得られた単一半導体チップの面積は次第に大きくなっ
ている。
According to the one-chip design method, for example, PR
In an OM-mounted microcomputer or a BiCMOS type semiconductor device, various electronic circuit blocks including oscillation, frequency division, step-up / down, voltage division, smoothing, shaping, control, calculation, storage, etc. are provided on the main surface of one silicon substrate. By arranging in combination,
The desired composite function is obtained. However, the area of the single semiconductor chip thus obtained is gradually increasing.

【0004】1チップ化設計手法に基づく半導体装置の
製造方法の概要を説明すると、ウェハーからダイシング
により切り出した半導体チップを銀ペーストでリードフ
レームのダイパッドへ接合し、金属細線により半導体チ
ップの主面上の電極端子とリードフレームのインナーリ
ードとを接続し、そして封止樹脂による成形を施して樹
脂封止型の半導体装置が完成する。
An outline of a method of manufacturing a semiconductor device based on a one-chip design method will be described. A semiconductor chip cut out from a wafer by dicing is bonded to a die pad of a lead frame with a silver paste, and a metal thin wire is used on the main surface of the semiconductor chip. The electrode terminal and the inner lead of the lead frame are connected to each other, and the resin is molded with a sealing resin to complete a resin-sealed semiconductor device.

【0005】マルチチップ化設計手法によれば、各々単
独機能を備えた複数個の半導体チップを組み合わせるこ
とで、目的とする複合機能が得られる。
According to the multi-chip design method, a desired composite function can be obtained by combining a plurality of semiconductor chips each having a single function.

【0006】図11(a)は複数個の半導体チップを備
えた従来の半導体装置の構成を示す分解斜視図、図11
(b)はその断面図である。図11(a)及び(b)の
半導体装置は、各々主面上に電極端子5を有する2個の
半導体チップ1と、主面上に電極端子5を有する配線基
板6と、インナーリード7、アウターリード11及びダ
イパッド9を有するリードフレームと、金属細線8と、
それらを封止込んで所定のパッケージ4の外形に成形す
るための封止樹脂10とを備えている。2個の半導体チ
ップ1の各々の主面上には、電極端子5に加えて、単独
機能を実現するための回路、電源回路及び入出力回路が
配置されており、各半導体チップ1は小面積で特定の単
独機能を有するものである。配線基板6の主面上には絶
縁膜で覆われた配線が施されており、該絶縁膜上の所定
の位置に2個の半導体チップ1が二次元的に配置されか
つ接着剤で接合されている。そして、2個の半導体チッ
プ1の電極端子5の間、各半導体チップ1の電極端子5
と配線基板6の電極端子5との間、各半導体チップ1の
電極端子5とリードフレームのインナーリード7の先端
近傍の上面との間は、それぞれ金属細線8で接続されて
いる。
FIG. 11A is an exploded perspective view showing the structure of a conventional semiconductor device having a plurality of semiconductor chips.
(B) is the sectional view. 11A and 11B, two semiconductor chips 1 each having an electrode terminal 5 on the main surface, a wiring board 6 having the electrode terminal 5 on the main surface, an inner lead 7, A lead frame having an outer lead 11 and a die pad 9, a thin metal wire 8,
A sealing resin 10 for encapsulating them and molding them into a predetermined package 4 is provided. On the main surface of each of the two semiconductor chips 1, in addition to the electrode terminals 5, a circuit for realizing a single function, a power supply circuit, and an input / output circuit are arranged, and each semiconductor chip 1 has a small area. It has a specific independent function. Wiring covered with an insulating film is provided on the main surface of the wiring board 6, and two semiconductor chips 1 are two-dimensionally arranged at a predetermined position on the insulating film and bonded with an adhesive. ing. And between the electrode terminals 5 of the two semiconductor chips 1, the electrode terminals 5 of each semiconductor chip 1
And the electrode terminal 5 of the wiring board 6, and the electrode terminal 5 of each semiconductor chip 1 and the upper surface near the tip of the inner lead 7 of the lead frame are connected by metal thin wires 8.

【0007】図11(a)及び(b)の半導体装置の製
造方法を詳細に説明すると、まず、絶縁膜で覆われた配
線と電極端子5とを備えたガラスエポキシやポリイミド
からなる配線基板6の上の回路パターンの電気的特性の
良否を予め回路機能テスターで試験して回路機能の良否
を分別した後、打ち抜きや切断によって配線基板6のサ
イズにする。次に、半導体チップ1が形成されたウェハ
ーの電気的特性の良否を予め回路機能テスターで試験
し、ウェハー上で回路機能の良否を分別した後、ウェハ
ーをダイシング加工によって半導体チップ1のサイズに
分離する。そして、熱硬化性のエポキシ、ポリイミド等
の樹脂をベースにした銀ペーストや熱可塑性の接着剤等
で、銅合金や鉄ニッケル合金からなるリードフレームの
ダイパッド9上の所定の位置に配線基板6を貼合わせ、
100〜400℃の温度で30秒〜60分加熱して接合
する。各半導体チップ1も同様にして配線基板6の所定
の位置に接合される。2個の半導体チップ1、配線基板
6及びリードフレームのインナーリード7の間の前記の
電気的接続は、200〜280℃の温度で、超音波熱圧
着ワイヤーボンディング法によって実施される。更に、
封止樹脂10により所定の外形の樹脂封止型パッケージ
4に成形したうえ、パッケージ4の外部に突き出してい
るアウターリード11にハンダメッキを施し、該アウタ
ーリード11を所要の形状に折り曲げて、樹脂封止型の
半導体装置が完成する。
The method of manufacturing the semiconductor device shown in FIGS. 11A and 11B will be described in detail. First, the wiring board 6 made of glass epoxy or polyimide having the wiring covered with the insulating film and the electrode terminals 5. The quality of the electrical characteristics of the circuit pattern above is tested in advance by a circuit function tester to classify the circuit function, and then the size of the wiring board 6 is obtained by punching or cutting. Next, the quality of the electrical characteristics of the wafer on which the semiconductor chip 1 is formed is tested in advance by a circuit function tester, the quality of the circuit function is sorted on the wafer, and then the wafer is separated into the size of the semiconductor chip 1 by dicing. To do. Then, the wiring board 6 is placed at a predetermined position on the die pad 9 of the lead frame made of a copper alloy or an iron-nickel alloy with a silver paste or a thermoplastic adhesive based on a resin such as thermosetting epoxy or polyimide. Pasting,
Bonding is performed by heating at a temperature of 100 to 400 ° C. for 30 seconds to 60 minutes. Each semiconductor chip 1 is similarly bonded to a predetermined position on the wiring board 6. The electrical connection between the two semiconductor chips 1, the wiring board 6 and the inner leads 7 of the lead frame is performed at a temperature of 200 to 280 ° C. by the ultrasonic thermocompression wire bonding method. Furthermore,
After molding the resin-sealed package 4 having a predetermined outer shape with the sealing resin 10, the outer leads 11 protruding to the outside of the package 4 are solder-plated, and the outer leads 11 are bent into a desired shape to form a resin. The sealed semiconductor device is completed.

【0008】[0008]

【発明が解決しようとする課題】上記1チップ化設計手
法は、半導体チップの大面積化や回路パターン加工工程
の増加、煩雑化によって、歩留りの低下や製造条件余裕
度の縮小等の無視できない問題があった。それらの問題
を克服する手段として、回路パターンの微細化技術を開
発するために高価な設備投資を行なってきた。一方、半
導体装置の性能面からは、半導体チップ主面の全域に配
置された電源ラインの配線幅や信号ライン間の間隔が狭
くなることによって生じるインピーダンスの増加や、異
種ノードの信号ライン間での信号の干渉が生じて、半導
体チップの動作速度、動作電圧余裕度、耐静電破壊強度
等の十分な性能を引き出すための阻害要因となってい
た。
The above-described one-chip design method is a problem that cannot be ignored, such as a reduction in yield and a reduction in manufacturing condition margin due to an increase in the area of a semiconductor chip, an increase in circuit pattern processing steps, and complexity. was there. As a means for overcoming these problems, expensive capital investment has been made in order to develop circuit pattern miniaturization technology. On the other hand, from the viewpoint of the performance of the semiconductor device, an increase in impedance caused by the narrow wiring width of the power supply lines and the interval between the signal lines arranged over the entire main surface of the semiconductor chip, and the increase in impedance between the signal lines of different nodes are considered. Signal interference occurs, which has been an impeding factor for obtaining sufficient performance such as operating speed, operating voltage margin, and electrostatic breakdown strength of the semiconductor chip.

【0009】また、上記マルチチップ化設計手法を採用
した従来の半導体装置では、半導体チップの二次元配置
をとっていたために、1パッケージの半導体装置として
の実装密度は計画通りの高密度化が達成できていなかっ
た。
Further, in the conventional semiconductor device adopting the above-mentioned multi-chip designing method, since the semiconductor chips are arranged two-dimensionally, the packaging density as the semiconductor device of one package can be increased as planned. It wasn't done.

【0010】本発明の目的は、小型パッケージ内での単
独機能半導体チップの三次元配置を採用することによ
り、廉価で高信頼性の高付加価値複合機能半導体装置を
提供し、かつその製造方法を提供することにある。
An object of the present invention is to provide a low-cost, highly reliable, high-value-added multi-function semiconductor device by adopting a three-dimensional arrangement of single-function semiconductor chips in a small package, and a manufacturing method thereof. To provide.

【0011】[0011]

【課題を解決するための手段】上記目的を達成するため
に、請求項1の発明に係る半導体装置は、複数個の半導
体チップが2層以上積み重なって構成され、下層半導体
チップの主面と上層半導体チップの裏面との間に絶縁膜
を有し、前記上層半導体チップと下層半導体チップとは
前記絶縁膜を介して接合された構成を採用したものであ
る。
In order to achieve the above-mentioned object, a semiconductor device according to the invention of claim 1 is constituted by stacking a plurality of semiconductor chips in two or more layers, the main surface of the lower semiconductor chip and the upper layer. An insulating film is provided between the semiconductor chip and the back surface of the semiconductor chip, and the upper layer semiconductor chip and the lower layer semiconductor chip are joined together via the insulating film.

【0012】また、請求項2の発明に係る半導体装置
は、複数個の半導体チップが2層以上積み重なって構成
され、下層半導体チップの主面と上層半導体チップの裏
面との間に絶縁層を有し、該絶縁層は表面及び裏面のう
ちの少なくとも一方に導電性材料からなる配線を有し、
前記上層半導体チップと下層半導体チップとは前記配線
を有する絶縁層を介して接合された構成を採用したもの
である。
According to a second aspect of the present invention, a semiconductor device is formed by stacking a plurality of semiconductor chips in two or more layers, and has an insulating layer between the main surface of the lower semiconductor chip and the back surface of the upper semiconductor chip. The insulating layer has a wiring made of a conductive material on at least one of the front surface and the back surface,
The upper-layer semiconductor chip and the lower-layer semiconductor chip adopt a configuration in which they are joined via an insulating layer having the wiring.

【0013】請求項3の発明に係る半導体装置は、請求
項1又は2の発明に係る半導体装置の積み重ねられた複
数個の半導体チップのうちの最下層半導体チップの裏面
がリードフレームのダイパッド表面に固着された構成を
採用したものである。
According to a third aspect of the present invention, in the semiconductor device according to the first or second aspect, the back surface of the lowermost semiconductor chip among the stacked semiconductor chips is the front surface of the die pad of the lead frame. It uses a fixed structure.

【0014】請求項4の発明に係る半導体装置は、請求
項1又は2の発明に係る半導体装置の積み重ねられた複
数個の半導体チップのうちの最下層半導体チップの裏面
が絶縁膜を介してリードフレームのインナーリード表面
に固着された構成を採用したものである。
According to a fourth aspect of the present invention, in the semiconductor device according to the first or second aspect of the present invention, the back surface of the lowermost semiconductor chip among the plurality of semiconductor chips stacked is the lead through the insulating film. The structure is fixed to the inner lead surface of the frame.

【0015】請求項5の発明に係る半導体装置は、請求
項1又は2の発明に係る半導体装置の積み重ねられた複
数個の半導体チップのうちの最下層半導体チップの裏面
が中空型パッケージのダイアタッチ部に固着された構成
を採用したものである。
According to a fifth aspect of the present invention, there is provided a semiconductor device according to the first or second aspect of the present invention, in which the back surface of the lowermost semiconductor chip among a plurality of stacked semiconductor chips is a hollow die-attach package. The structure is fixed to the part.

【0016】請求項6の発明に係る半導体装置は、請求
項1又は2の発明に係る半導体装置の積み重ねられた複
数個の半導体チップのうちの最下層半導体チップの裏面
がプリント配線基板のダイアタッチ部に固着された構成
を採用したものである。
According to a sixth aspect of the present invention, there is provided a semiconductor device according to the first or second aspect of the present invention, in which a back surface of a lowermost semiconductor chip among a plurality of semiconductor chips stacked is a die attach of a printed wiring board. The structure is fixed to the part.

【0017】また、請求項7の発明に係る半導体装置
は、複数個の半導体チップが2層以上積み重なって構成
され、下層半導体チップの主面と上層半導体チップの裏
面との間に半硬化型の有機層を有し、前記上層半導体チ
ップと下層半導体チップとは前記有機層を加熱すること
によって接合された構成を採用したものである。
According to a seventh aspect of the present invention, there is provided a semiconductor device in which a plurality of semiconductor chips are stacked in two or more layers, and a semi-curing type is provided between the main surface of the lower layer semiconductor chip and the back surface of the upper layer semiconductor chip. An upper layer semiconductor chip and a lower layer semiconductor chip have an organic layer, and a structure in which the organic layer is joined by heating is adopted.

【0018】請求項8の発明に係る半導体装置は、請求
項7の発明に係る半導体装置の積み重ねられた複数個の
半導体チップのうちの最下層半導体チップの裏面がリー
ドフレームのダイパッド表面に固着された構成を採用し
たものである。
According to an eighth aspect of the present invention, in the semiconductor device according to the seventh aspect, the back surface of the lowermost semiconductor chip among the plurality of stacked semiconductor chips is fixed to the die pad surface of the lead frame. It adopts a different configuration.

【0019】請求項9の発明に係る半導体装置は、請求
項7の発明に係る半導体装置の積み重ねられた複数個の
半導体チップのうちの最下層半導体チップの裏面が絶縁
膜を介してリードフレームのインナーリード表面に固着
された構成を採用したものである。
According to a ninth aspect of the present invention, in the semiconductor device according to the seventh aspect of the present invention, the back surface of the lowermost semiconductor chip among the plurality of semiconductor chips stacked is a lead frame via an insulating film. This is a structure that is fixed to the surface of the inner lead.

【0020】請求項10の発明に係る半導体装置は、請
求項7の発明に係る半導体装置の積み重ねられた複数個
の半導体チップのうちの最下層半導体チップの裏面が中
空型パッケージのダイアタッチ部に固着された構成を採
用したものである。
According to a tenth aspect of the present invention, in the semiconductor device according to the seventh aspect, the back surface of the lowermost semiconductor chip of the plurality of semiconductor chips stacked is the die attach portion of the hollow package. It uses a fixed structure.

【0021】請求項11の発明に係る半導体装置は、請
求項7の発明に係る半導体装置の積み重ねられた複数個
の半導体チップのうちの最下層半導体チップの裏面がプ
リント配線基板のダイアタッチ部に固着された構成を採
用したものである。
A semiconductor device according to an eleventh aspect of the present invention is the semiconductor device according to the seventh aspect, wherein the back surface of the lowermost semiconductor chip among the stacked semiconductor chips is the die attach portion of the printed wiring board. It uses a fixed structure.

【0022】また、請求項12の発明に係る半導体装置
は、複数個の半導体チップが2層以上積み重なって構成
され、下層半導体チップの主面と上層半導体チップの裏
面との間にリードフレームの一部(ダイパッド又はイン
ナーリード)を有し、前記上層半導体チップと下層半導
体チップとは各々絶縁膜を介して前記リードフレームの
一部に接合された構成を採用したものである。
According to a twelfth aspect of the present invention, a semiconductor device is formed by stacking a plurality of semiconductor chips in two or more layers, and a lead frame is formed between the main surface of the lower layer semiconductor chip and the back surface of the upper layer semiconductor chip. The upper layer semiconductor chip and the lower layer semiconductor chip each have a portion (die pad or inner lead) and are joined to a part of the lead frame through an insulating film.

【0023】請求項13の発明は、請求項1〜12のい
ずれか1項に係る半導体装置を製造するための方法であ
って、絶縁膜上に貼り合わせた金属箔にパターンを施し
たプリント配線を熱圧着で前記複数個の半導体チップの
電極端子に接続することにより前記半導体装置の電気的
接続を実現することとしたものである。
A thirteenth aspect of the present invention is a method for manufacturing the semiconductor device according to any one of the first to twelfth aspects, wherein a printed wiring having a pattern formed on a metal foil laminated on an insulating film. Is connected to the electrode terminals of the plurality of semiconductor chips by thermocompression bonding to realize the electrical connection of the semiconductor device.

【0024】また、請求項14の発明は、請求項1〜1
2のいずれか1項に係る半導体装置を製造するための方
法であって、少なくとも前記複数個の半導体チップを樹
脂封止することとしたものである。
Further, the invention of claim 14 relates to claims 1 to 1.
A method for manufacturing a semiconductor device according to any one of 2 above, wherein at least the plurality of semiconductor chips are resin-sealed.

【0025】[0025]

【作用】本発明によれば、複数個の単独機能半導体チッ
プを2層以上に積み重ねた三次元構造の採用により、こ
れらの半導体チップを混成してなる小型で廉価しかも信
頼性の高い複合機能半導体装置を実現できる。また、各
半導体チップは、従来の1チップ化設計手法の場合とは
違って微細化する必要がなく、配線間隔が広く確保でき
て、電気特性の改善につながる。
According to the present invention, by adopting a three-dimensional structure in which a plurality of single-function semiconductor chips are stacked in two or more layers, a small-sized, inexpensive and highly-reliable compound-function semiconductor composed of these semiconductor chips is mixed. The device can be realized. Further, unlike the conventional one-chip design method, each semiconductor chip does not need to be miniaturized, a wide wiring interval can be secured, and electrical characteristics can be improved.

【0026】[0026]

【実施例】以下、複数個の半導体チップを2層に積み重
ねた構造を有する本発明の実施例に係る半導体装置につ
いて、添付図面に基づいて説明する。ただし、複数個の
半導体チップを3層以上に積み重ねてもよい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS A semiconductor device according to an embodiment of the present invention having a structure in which a plurality of semiconductor chips are stacked in two layers will be described below with reference to the accompanying drawings. However, a plurality of semiconductor chips may be stacked in three layers or more.

【0027】(実施例1)図1(a)は本発明の第1の
実施例に係る半導体装置の構成を示す分解斜視図、図1
(b)はその断面図である。図1(a)及び(b)の半
導体装置は、各々主面上に電極端子5を有する2個の上
層半導体チップ2と、有機絶縁膜12と、主面上に電極
端子5を有する下層半導体チップ3と、インナーリード
7、アウターリード11及びダイパッド9を有するリー
ドフレームと、金属細線8と、それらを封止込んで所定
のパッケージ4の外形に成形するための封止樹脂10と
を備えている。
(Embodiment 1) FIG. 1A is an exploded perspective view showing a structure of a semiconductor device according to a first embodiment of the present invention.
(B) is the sectional view. The semiconductor device shown in FIGS. 1A and 1B has two upper layer semiconductor chips 2 each having an electrode terminal 5 on the main surface, an organic insulating film 12, and a lower layer semiconductor having an electrode terminal 5 on the main surface. A chip 3, a lead frame having an inner lead 7, an outer lead 11 and a die pad 9, a thin metal wire 8 and a sealing resin 10 for encapsulating the thin wire 8 and forming the outer shape of a predetermined package 4. There is.

【0028】図1(a)及び(b)の半導体装置の製造
方法を詳細に説明すると、まず、上層半導体チップ2が
形成されたウェハーの電気的特性の良否を予め回路機能
テスターで試験し、ウェハー上で回路機能の良否を分別
した後、ウェハーをダイシング加工によって上層半導体
チップ2の単位に分離する。同様に、下層半導体チップ
3が形成されたウェハーの電気特性が検査され、ウェハ
ー内の半導体チップ3が合格と不合格とに分別され、合
格品半導体チップ3の主面上の電極端子5を除く領域
に、20〜150μmの厚さのガラスエポキシ、ポリイ
ミド、ポリエステル等からなる有機絶縁膜12を、15
0〜400℃の高温雰囲気中で、ポリイミドやエポキシ
樹脂等からなる熱硬化性又は熱可塑性の接着剤(導電性
又は非導電性)によって貼合わせる。有機絶縁膜12は
フォトリソグラフィー工程で加工してもよい。このよう
な処理を経たウェハーをダイシング加工によって下層半
導体チップ3の単位に分離する。
The method for manufacturing the semiconductor device shown in FIGS. 1A and 1B will be described in detail. First, the quality of the electrical characteristics of the wafer on which the upper semiconductor chip 2 is formed is tested in advance by a circuit function tester, After the quality of the circuit function is classified on the wafer, the wafer is separated into units of the upper semiconductor chip 2 by dicing. Similarly, the electrical characteristics of the wafer on which the lower semiconductor chip 3 is formed are inspected, the semiconductor chips 3 in the wafer are classified into pass and fail, and the electrode terminals 5 on the main surface of the acceptable semiconductor chip 3 are excluded. An organic insulating film 12 made of glass epoxy, polyimide, polyester or the like having a thickness of 20 to 150 μm is formed in the region 15
In a high temperature atmosphere of 0 to 400 ° C., they are laminated with a thermosetting or thermoplastic adhesive (conductive or non-conductive) made of polyimide, epoxy resin or the like. The organic insulating film 12 may be processed by a photolithography process. The wafer that has undergone such processing is separated into units of lower layer semiconductor chips 3 by dicing.

【0029】リードフレームは、銅合金や鉄ニッケル合
金からなり、インナーリード7、アウターリード11及
びダイパッド9の各部を有するものである。インナーリ
ード7の先端近傍やダイパッド9の表面には、1〜5μ
mの厚さの銀或は金若しくは銅のメッキが施されてい
る。分離された下層半導体チップ3は、リードフレーム
のダイパッド9の上に、150〜400℃の高温雰囲気
中で、ポリイミドやエポキシ樹脂等からなる熱硬化性又
は熱可塑性の接着剤(導電性又は非導電性)で固着され
る。更に、下層半導体チップ3の上に貼合わされた有機
絶縁膜12の上に、分離された2個の上層半導体チップ
2を、ポリイミドやエポキシ樹脂等からなる熱硬化性又
は熱可塑性の接着剤(導電性又は非導電性)で高温雰囲
気中で固着する。
The lead frame is made of copper alloy or iron-nickel alloy and has inner lead 7, outer lead 11 and die pad 9. 1 to 5 μm near the tips of the inner leads 7 and on the surface of the die pad 9.
It is plated with silver, gold or copper with a thickness of m. The separated lower semiconductor chip 3 is a thermosetting or thermoplastic adhesive (conductive or non-conductive) made of polyimide, epoxy resin or the like on the die pad 9 of the lead frame in a high temperature atmosphere of 150 to 400 ° C. Fixed). Further, two separated upper layer semiconductor chips 2 are formed on the organic insulating film 12 attached on the lower layer semiconductor chip 3 by using a thermosetting or thermoplastic adhesive (conductive layer) made of polyimide, epoxy resin or the like. It is electrically conductive or non-conductive) and sticks in a high temperature atmosphere.

【0030】更に、3個の半導体チップ2,3の電極端
子5の間、上層半導体チップ2の電極端子5とインナー
リード7の先端との間、下層半導体チップ3の電極端子
5とインナーリード7の先端との間をそれぞれ金や銅か
らなる金属細線8でワイヤーボンダーによって接続し、
上層半導体チップ2、下層半導体チップ3、有機絶縁膜
12及び金属細線8を熱硬化型封止樹脂10で所望のパ
ッケージ4の外形に成形する。そして、パッケージ4の
樹脂部から突き出たアウターリード11の表面に錫鉛共
晶ハンダ、パラジウム等でメッキを施し、アウターリー
ド11を成形する。
Furthermore, between the electrode terminals 5 of the three semiconductor chips 2 and 3, between the electrode terminals 5 of the upper layer semiconductor chip 2 and the tips of the inner leads 7, and between the electrode terminals 5 of the lower layer semiconductor chip 3 and the inner leads 7. Connect the tip of each with a metal wire 8 made of gold or copper with a wire bonder,
The upper-layer semiconductor chip 2, the lower-layer semiconductor chip 3, the organic insulating film 12, and the thin metal wires 8 are molded with the thermosetting encapsulating resin 10 into the desired outer shape of the package 4. Then, the surface of the outer lead 11 protruding from the resin portion of the package 4 is plated with tin-lead eutectic solder, palladium or the like to form the outer lead 11.

【0031】第1の実施例によれば、有機絶縁膜12を
挟んで2段に積み重ねて貼付けられた複数個の単独機能
半導体チップ2,3をリードフレームのダイパッド9に
接合してなる構造を採用したので、これらの半導体チッ
プ2,3を混成してなる小型で廉価しかも信頼性の高い
樹脂封止型複合機能半導体装置を実現できる。また、各
半導体チップ2,3は、従来の1チップ化設計手法の場
合とは違って微細化する必要がなく、配線間隔が広く確
保できて、電気特性の改善につながる。
According to the first embodiment, a structure in which a plurality of single function semiconductor chips 2 and 3 which are stacked and attached in two steps with the organic insulating film 12 sandwiched therebetween are bonded to the die pad 9 of the lead frame is used. Since it is adopted, it is possible to realize a small-sized, low-priced and highly reliable resin-encapsulated compound function semiconductor device which is a hybrid of these semiconductor chips 2 and 3. Further, unlike the conventional one-chip design method, the semiconductor chips 2 and 3 do not need to be miniaturized, a wide wiring interval can be secured, and the electrical characteristics are improved.

【0032】(実施例2)図2(a)は本発明の第2の
実施例に係る半導体装置の構成を示す分解斜視図、図2
(b)はその断面図である。図2(a)及び(b)の半
導体装置は、各々主面上に電極端子5を有する2個の上
層半導体チップ2と、表面又は裏面若しくは両面に配線
及び電極端子5を有する有機絶縁性の配線基板6と、主
面上に電極端子5を有する下層半導体チップ3と、イン
ナーリード7、アウターリード11及びダイパッド9を
有するリードフレームと、金属細線8と、それらを封止
込んで所定のパッケージ4の外形に成形するための封止
樹脂10とを備えている。
(Embodiment 2) FIG. 2A is an exploded perspective view showing a structure of a semiconductor device according to a second embodiment of the present invention.
(B) is the sectional view. The semiconductor device of FIGS. 2A and 2B has two upper layer semiconductor chips 2 each having an electrode terminal 5 on the main surface and an organic insulating material having wirings and electrode terminals 5 on the front surface or the back surface or both surfaces. A wiring board 6, a lower layer semiconductor chip 3 having electrode terminals 5 on its main surface, a lead frame having inner leads 7, outer leads 11 and die pads 9, metal wires 8, and a predetermined package in which they are sealed. 4, and a sealing resin 10 for molding into the outer shape of No. 4.

【0033】第2の実施例は第1の実施例における有機
絶縁膜12を配線基板6に置き換えたものであって、リ
ードフレームのダイパッド9の上に下層半導体チップ
3、配線基板6及び上層半導体チップ2が、これらの順
に接合されている。製造方法の詳細説明は省略する。な
お、金属細線8による接続は、第1の実施例の場合に加
えて、上層半導体チップ2の電極端子5と配線基板6の
電極端子5との間、配線基板6の電極端子5と下層半導
体チップ3の電極端子5との間、配線基板6の電極端子
5とインナーリード7の先端との間でそれぞれ行なわれ
る。
In the second embodiment, the organic insulating film 12 in the first embodiment is replaced with the wiring board 6, and the lower layer semiconductor chip 3, the wiring board 6 and the upper layer semiconductor are placed on the die pad 9 of the lead frame. The chip 2 is joined in this order. Detailed description of the manufacturing method is omitted. In addition to the case of the first embodiment, the connection by the thin metal wire 8 is performed between the electrode terminal 5 of the upper layer semiconductor chip 2 and the electrode terminal 5 of the wiring board 6, and between the electrode terminal 5 of the wiring board 6 and the lower layer semiconductor. It is performed between the electrode terminal 5 of the chip 3 and between the electrode terminal 5 of the wiring board 6 and the tip of the inner lead 7.

【0034】第2の実施例によれば、配線基板6を挟ん
で2段に積み重ねて貼付けられた複数個の単独機能半導
体チップ2,3をリードフレームのダイパッド9に接合
してなる構造を採用したので、これらの半導体チップ
2,3を混成してなる小型で廉価しかも信頼性の高い樹
脂封止型複合機能半導体装置を実現できる。しかも、配
線基板6が有する配線は、複数個の半導体チップ2,3
の間の配線を一部負担することができる。また、各半導
体チップ2,3は、従来の1チップ化設計手法の場合と
は違って微細化する必要がなく、配線間隔が広く確保で
きて、電気特性の改善につながる。
According to the second embodiment, a structure is employed in which a plurality of single-function semiconductor chips 2 and 3 stacked and attached in two steps with the wiring board 6 sandwiched therebetween are bonded to the die pad 9 of the lead frame. Therefore, it is possible to realize a small-sized, low-priced and highly reliable resin-encapsulated composite function semiconductor device which is a hybrid of these semiconductor chips 2 and 3. Moreover, the wiring of the wiring board 6 is composed of a plurality of semiconductor chips 2, 3
It is possible to partially bear the wiring between them. Further, unlike the conventional one-chip design method, the semiconductor chips 2 and 3 do not need to be miniaturized, a wide wiring interval can be secured, and the electrical characteristics are improved.

【0035】(実施例3)図3(a)は本発明の第3の
実施例に係る半導体装置の構成を示す分解斜視図、図3
(b)はその断面図である。図3(a)及び(b)の半
導体装置は、各々主面上に電極端子5を有する2個の上
層半導体チップ2と、第1の有機絶縁膜12と、主面上
に電極端子5を有する下層半導体チップ3と、第2の有
機絶縁膜22と、インナーリード7及びアウターリード
11を有するリードフレームと、金属細線8と、それら
を封止込んで所定のパッケージ4の外形に成形するため
の封止樹脂10とを備えている。
(Embodiment 3) FIG. 3A is an exploded perspective view showing the structure of a semiconductor device according to a third embodiment of the present invention.
(B) is the sectional view. The semiconductor device shown in FIGS. 3A and 3B has two upper layer semiconductor chips 2 each having an electrode terminal 5 on the main surface, a first organic insulating film 12, and an electrode terminal 5 on the main surface. In order to form the lower layer semiconductor chip 3 having the second organic insulating film 22, the lead frame having the inner leads 7 and the outer leads 11, the fine metal wires 8 and the external shape of the predetermined package 4 by encapsulating them. And the sealing resin 10.

【0036】図3(a)及び(b)によれば、下層半導
体チップ3は、ダイパッドを有しないリードフレームの
インナーリード7の上に、枠状の有機絶縁膜22を介し
て固着される。その他の点は第1の実施例と同様であ
る。
According to FIGS. 3A and 3B, the lower semiconductor chip 3 is fixed onto the inner lead 7 of the lead frame having no die pad via the frame-shaped organic insulating film 22. The other points are similar to those of the first embodiment.

【0037】第3の実施例によれば、有機絶縁膜12を
挟んで2段に積み重ねて貼付けられた複数個の単独機能
半導体チップ2,3をリードフレームのインナーリード
7に枠状の有機絶縁膜22を挟んで接合してなる構造を
採用したので、これらの半導体チップ2,3を混成して
なる小型で廉価しかも信頼性の高い樹脂封止型複合機能
半導体装置を実現できる。特にダイパッドを有しないリ
ードフレームを採用したので、小型化が顕著である。ま
た、各半導体チップ2,3は、従来の1チップ化設計手
法の場合とは違って微細化する必要がなく、配線間隔が
広く確保できて、電気特性の改善につながる。
According to the third embodiment, a plurality of single-function semiconductor chips 2 and 3 stacked and attached in two steps with the organic insulating film 12 sandwiched therebetween are attached to the inner lead 7 of the lead frame to form a frame-shaped organic insulating film. Since the structure in which the film 22 is sandwiched is used for bonding, it is possible to realize a small-sized, low-priced and highly reliable resin-encapsulated multifunctional semiconductor device in which these semiconductor chips 2 and 3 are mixed. In particular, since a lead frame having no die pad is adopted, miniaturization is remarkable. Further, unlike the conventional one-chip design method, the semiconductor chips 2 and 3 do not need to be miniaturized, a wide wiring interval can be secured, and the electrical characteristics are improved.

【0038】なお、第3の実施例における第1の有機絶
縁膜12は、第2の実施例と同様の配線基板6への置き
換えが可能である。
The first organic insulating film 12 in the third embodiment can be replaced with the same wiring board 6 as in the second embodiment.

【0039】(実施例4)図4(a)は本発明の第4の
実施例に係る半導体装置の構成を示す分解斜視図、図4
(b)はその断面図である。図4(a)及び(b)の半
導体装置は、各々主面上に電極端子5を有する2個の上
層半導体チップ2と、有機絶縁膜12と、主面上に電極
端子5を有する下層半導体チップ3と、金属細線8と、
アウターリード11及びダイアタッチ部13を有する中
空型のパッケージ14aとを備えている。
(Embodiment 4) FIG. 4A is an exploded perspective view showing the structure of a semiconductor device according to a fourth embodiment of the present invention.
(B) is the sectional view. The semiconductor device shown in FIGS. 4A and 4B has two upper layer semiconductor chips 2 each having an electrode terminal 5 on the main surface, an organic insulating film 12, and a lower layer semiconductor having the electrode terminal 5 on the main surface. Chip 3, thin metal wire 8,
A hollow package 14a having an outer lead 11 and a die attach portion 13 is provided.

【0040】中空型パッケージ14aは、所望の外形を
有するプリモールド型樹脂パッケージである。第4の実
施例では、第1の実施例の有機絶縁膜12を挟んで2段
に積み重ねて貼付けられた半導体チップ2,3が、リー
ドフレームのダイパッド9に代わって中空型パッケージ
14aのダイアタッチ部13に固着される。金属細線8
を用いたワイヤーボンディングの後に、パッケージ14
aと同材質の液状樹脂又はトランスファー成形樹脂で該
パッケージ14aを封じる。そして、中空型パッケージ
14aから突き出しているアウターリード11の表面に
メッキを施し、該アウターリード11を成形すること
で、複合機能を有する小面積の樹脂封止型半導体装置が
完成する。
The hollow package 14a is a pre-mold type resin package having a desired outer shape. In the fourth embodiment, the semiconductor chips 2 and 3 stacked and attached in two steps with the organic insulating film 12 of the first embodiment sandwiched therebetween are replaced by the die pad 9 of the lead frame and die-attached to the hollow package 14a. It is fixed to the portion 13. Fine metal wire 8
After wire bonding using
The package 14a is sealed with a liquid resin or transfer molding resin of the same material as a. Then, the surface of the outer lead 11 protruding from the hollow package 14a is plated and the outer lead 11 is molded, whereby a small area resin-sealed semiconductor device having a composite function is completed.

【0041】第4の実施例によれば、有機絶縁膜12を
挟んで2段に積み重ねて貼付けられた複数個の単独機能
半導体チップ2,3を中空型パッケージ14aのダイア
タッチ部13に固着してなる構造を採用したので、これ
らの半導体チップ2,3を混成してなる小型で廉価しか
も信頼性の高い樹脂封止型複合機能半導体装置を実現で
きる。また、各半導体チップ2,3は、従来の1チップ
化設計手法の場合とは違って微細化する必要がなく、配
線間隔が広く確保できて、電気特性の改善につながる。
According to the fourth embodiment, a plurality of single-function semiconductor chips 2 and 3 stacked and attached in two steps with the organic insulating film 12 sandwiched therebetween are fixed to the die attach portion 13 of the hollow package 14a. Since such a structure is adopted, it is possible to realize a small-sized, low-priced and highly reliable resin-encapsulated multi-function semiconductor device in which these semiconductor chips 2 and 3 are mixed. Further, unlike the conventional one-chip design method, the semiconductor chips 2 and 3 do not need to be miniaturized, a wide wiring interval can be secured, and the electrical characteristics are improved.

【0042】なお、第4の実施例における有機絶縁膜1
2は、第2の実施例と同様の配線基板6への置き換えが
可能である。ダイアタッチ部13を有する中空型パッケ
ージ14aは、酸化アルミニウム、窒化アルミニウム等
の絶縁物焼結体(セラミック)からなるパッケージであ
ってもよい。
The organic insulating film 1 in the fourth embodiment
2 can be replaced with the same wiring board 6 as in the second embodiment. The hollow package 14a having the die attach portion 13 may be a package made of an insulator sintered body (ceramic) such as aluminum oxide or aluminum nitride.

【0043】(実施例5)図5(a)は本発明の第5の
実施例に係る半導体装置の構成を示す分解斜視図、図5
(b)はその断面図である。図5(a)及び(b)の半
導体装置は、各々主面上に電極端子5を有する2個の上
層半導体チップ2と、有機絶縁膜12と、主面上に電極
端子5を有する下層半導体チップ3と、金属細線8と、
それらを封止込んで所定のモジュール外形に成形するた
めの封止樹脂10と、電極端子5及びダイアタッチ部1
3を有するプリント配線基板14bとを備えている。
(Embodiment 5) FIG. 5A is an exploded perspective view showing the structure of a semiconductor device according to a fifth embodiment of the present invention.
(B) is the sectional view. The semiconductor device shown in FIGS. 5A and 5B has two upper layer semiconductor chips 2 each having an electrode terminal 5 on the main surface, an organic insulating film 12, and a lower layer semiconductor having the electrode terminal 5 on the main surface. Chip 3, thin metal wire 8,
Sealing resin 10 for encapsulating them to form a predetermined module outer shape, electrode terminal 5, and die attach portion 1
And a printed wiring board 14b having the number 3 of FIG.

【0044】プリント配線基板14bは、ガラスエポキ
シやポリイミド等の樹脂製である。第5の実施例では、
第1の実施例の有機絶縁膜12を挟んで2段に積み重ね
て貼付けられた半導体チップ2,3が、リードフレーム
のダイパッド9に代わってプリント配線基板14bのダ
イアタッチ部13に固着される。金属細線8を用いたワ
イヤーボンディングの後に成形樹脂10で所望のモジュ
ール外形に成形することで、複合機能を有する小面積の
樹脂封止型半導体装置が完成する。
The printed wiring board 14b is made of resin such as glass epoxy or polyimide. In the fifth embodiment,
The semiconductor chips 2 and 3 stacked and attached in two steps with the organic insulating film 12 of the first embodiment sandwiched therebetween are fixed to the die attach portion 13 of the printed wiring board 14b instead of the die pad 9 of the lead frame. After the wire bonding using the fine metal wires 8, the resin is molded into a desired module outer shape with the molding resin 10 to complete a small area resin-sealed semiconductor device having a composite function.

【0045】第5の実施例によれば、有機絶縁膜12を
挟んで2段に積み重ねて貼付けられた複数個の単独機能
半導体チップ2,3をプリント配線基板14bのダイア
タッチ部13に固着してなる構造を採用したので、これ
らの半導体チップ2,3を混成してなる小型で廉価しか
も信頼性の高い樹脂封止型複合機能半導体装置を実現で
きる。また、各半導体チップ2,3は、従来の1チップ
化設計手法の場合とは違って微細化する必要がなく、配
線間隔が広く確保できて、電気特性の改善につながる。
According to the fifth embodiment, a plurality of single-function semiconductor chips 2 and 3 stacked and attached in two steps with the organic insulating film 12 sandwiched therebetween are fixed to the die attach portion 13 of the printed wiring board 14b. Since such a structure is adopted, it is possible to realize a small-sized, low-priced and highly reliable resin-encapsulated multi-function semiconductor device in which these semiconductor chips 2 and 3 are mixed. Further, unlike the conventional one-chip design method, the semiconductor chips 2 and 3 do not need to be miniaturized, a wide wiring interval can be secured, and the electrical characteristics are improved.

【0046】なお、第4の実施例における有機絶縁膜1
2は、第2の実施例と同様の配線基板6への置き換えが
可能である。ダイアタッチ部13を有するプリント配線
基板14bは、酸化アルミニウム、窒化アルミニウム等
の絶縁物焼結体(セラミック)からなる基板であっても
よい。
The organic insulating film 1 in the fourth embodiment
2 can be replaced with the same wiring board 6 as in the second embodiment. The printed wiring board 14b having the die attach portion 13 may be a board made of an insulator sintered body (ceramic) such as aluminum oxide or aluminum nitride.

【0047】(実施例6)図6(a)は本発明の第6の
実施例に係る半導体装置の構成を示す分解斜視図、図6
(b)はその断面図である。第6の実施例は、第1の実
施例における上層半導体チップ2と下層半導体チップ3
との接合方法を変更したものである。
(Sixth Embodiment) FIG. 6A is an exploded perspective view showing the structure of a semiconductor device according to a sixth embodiment of the present invention.
(B) is the sectional view. The sixth embodiment is an upper layer semiconductor chip 2 and a lower layer semiconductor chip 3 in the first embodiment.
The joining method with is changed.

【0048】図6(a)及び(b)によれば、下層半導
体チップ3の表面が絶縁性の無機ガラス膜で覆われた主
面上の電極端子5を除いた領域に、予め所定の大きさに
切断した半硬化型の樹脂からなる接着剤(導電性又は非
導電性)を有機層15として載せる。この有機層15の
大きさは、上に積み重ねる上層半導体チップ2と同じ若
しくは0.5mm小さくする。そして、有機層15の上
に上層半導体チップ2を載せて150℃〜400℃の高
温雰囲気中で有機層15を硬化させることにより、上層
半導体チップ2と下層半導体チップ3とを固着する。そ
の他の点は第1の実施例と同様である。
According to FIGS. 6A and 6B, the surface of the lower semiconductor chip 3 is covered with an insulating inorganic glass film on the main surface except for the electrode terminals 5, and a predetermined size is set in advance. An adhesive (conductive or non-conductive) made of semi-cured resin cut into pieces is placed as the organic layer 15. The size of the organic layer 15 is the same as or smaller by 0.5 mm than the upper layer semiconductor chips 2 stacked on top. Then, the upper layer semiconductor chip 2 is placed on the organic layer 15 and the organic layer 15 is cured in a high temperature atmosphere of 150 ° C. to 400 ° C., so that the upper layer semiconductor chip 2 and the lower layer semiconductor chip 3 are fixed to each other. The other points are similar to those of the first embodiment.

【0049】第6の実施例によれば、半硬化型接着剤で
ある有機層15を挟んで2段に積み重ねて貼付けられた
複数個の単独機能半導体チップ2,3をリードフレーム
のダイパッド9に接合してなる構造を採用したので、こ
れらの半導体チップ2,3を混成してなる小型で廉価し
かも信頼性の高い樹脂封止型複合機能半導体装置を実現
できる。また、各半導体チップ2,3は、従来の1チッ
プ化設計手法の場合とは違って微細化する必要がなく、
配線間隔が広く確保できて、電気特性の改善につなが
る。
According to the sixth embodiment, a plurality of single function semiconductor chips 2 and 3 which are stacked and attached in two steps with the organic layer 15 which is a semi-curing adhesive agent sandwiched therebetween are attached to the die pad 9 of the lead frame. Since the structure formed by joining is adopted, it is possible to realize a small-sized, inexpensive and highly reliable resin-encapsulated multi-function semiconductor device in which these semiconductor chips 2 and 3 are mixed. Further, each semiconductor chip 2 and 3 does not need to be miniaturized unlike the conventional one-chip design method,
A wide wiring interval can be secured, which leads to improvement in electrical characteristics.

【0050】なお、下層半導体チップ3とリードフレー
ムのダイパッド9との接合にも、所要の大きさの半硬化
型樹脂(有機層)からなる接着剤を用いることができ
る。
An adhesive made of a semi-curable resin (organic layer) of a required size can also be used to bond the lower semiconductor chip 3 and the die pad 9 of the lead frame.

【0051】(実施例7)図7(a)は本発明の第7の
実施例に係る半導体装置の構成を示す分解斜視図、図7
(b)はその断面図である。第7の実施例は、第3の実
施例における上層半導体チップ2と下層半導体チップ3
との接合方法を変更したものである。有機層15を用い
た接合方法は、第6の実施例と同様である。
(Embodiment 7) FIG. 7A is an exploded perspective view showing the structure of a semiconductor device according to a seventh embodiment of the present invention.
(B) is the sectional view. The seventh embodiment is the same as the upper semiconductor chip 2 and the lower semiconductor chip 3 in the third embodiment.
The joining method with is changed. The joining method using the organic layer 15 is the same as in the sixth embodiment.

【0052】第7の実施例によれば、半硬化型接着剤で
ある有機層15を挟んで2段に積み重ねて貼付けられた
複数個の単独機能半導体チップ2,3をリードフレーム
のインナーリード7に枠状の有機絶縁膜22を挟んで接
合してなる構造を採用したので、これらの半導体チップ
2,3を混成してなる小型で廉価しかも信頼性の高い樹
脂封止型複合機能半導体装置を実現できる。特にダイパ
ッドを有しないリードフレームを採用したので、小型化
が顕著である。また、各半導体チップ2,3は、従来の
1チップ化設計手法の場合とは違って微細化する必要が
なく、配線間隔が広く確保できて、電気特性の改善につ
ながる。
According to the seventh embodiment, a plurality of single-function semiconductor chips 2 and 3 which are stacked and attached in two steps with the organic layer 15 which is a semi-curing adhesive agent sandwiched therebetween are attached to the inner lead 7 of the lead frame. Since the structure in which the frame-shaped organic insulating film 22 is sandwiched between the semiconductor chips 2 and 3 is adopted, a compact, inexpensive and highly reliable resin-encapsulated multi-function semiconductor device formed by mixing these semiconductor chips 2 and 3 is provided. realizable. In particular, since a lead frame having no die pad is adopted, miniaturization is remarkable. Further, unlike the conventional one-chip design method, the semiconductor chips 2 and 3 do not need to be miniaturized, a wide wiring interval can be secured, and the electrical characteristics are improved.

【0053】(実施例8)図8(a)は本発明の第8の
実施例に係る半導体装置の構成を示す分解斜視図、図8
(b)はその断面図である。第8の実施例は、第4の実
施例における上層半導体チップ2と下層半導体チップ3
との接合方法を変更したものである。有機層15を用い
た接合方法は、第6の実施例と同様である。
(Embodiment 8) FIG. 8A is an exploded perspective view showing the structure of a semiconductor device according to an eighth embodiment of the present invention.
(B) is the sectional view. The eighth embodiment is the same as the upper semiconductor chip 2 and the lower semiconductor chip 3 in the fourth embodiment.
The joining method with is changed. The joining method using the organic layer 15 is the same as in the sixth embodiment.

【0054】第8の実施例によれば、半硬化型接着剤で
ある有機層15を挟んで2段に積み重ねて貼付けられた
複数個の単独機能半導体チップ2,3を中空型パッケー
ジ14aのダイアタッチ部13に固着してなる構造を採
用したので、これらの半導体チップ2,3を混成してな
る小型で廉価しかも信頼性の高い樹脂封止型複合機能半
導体装置を実現できる。また、各半導体チップ2,3
は、従来の1チップ化設計手法の場合とは違って微細化
する必要がなく、配線間隔が広く確保できて、電気特性
の改善につながる。ダイアタッチ部13を有する中空型
パッケージ14aは、樹脂パッケージ、セラミックパッ
ケージのいずれでもよい。
According to the eighth embodiment, a plurality of single-function semiconductor chips 2 and 3 which are stacked and attached in two steps with the organic layer 15 which is a semi-curing adhesive agent sandwiched therebetween are attached to the die of the hollow package 14a. Since the structure fixed to the touch portion 13 is adopted, it is possible to realize a small-sized, low-priced and highly reliable resin-encapsulated multi-function semiconductor device in which these semiconductor chips 2 and 3 are mixed. In addition, each semiconductor chip 2, 3
Unlike the conventional one-chip design method, there is no need for miniaturization, a wide wiring interval can be secured, and electrical characteristics are improved. The hollow package 14a having the die attach portion 13 may be either a resin package or a ceramic package.

【0055】(実施例9)図9(a)は本発明の第9の
実施例に係る半導体装置の構成を示す分解斜視図、図9
(b)はその断面図である。第9の実施例は、第5の実
施例における上層半導体チップ2と下層半導体チップ3
との接合方法を変更したものである。有機層15を用い
た接合方法は、第6の実施例と同様である。
(Embodiment 9) FIG. 9A is an exploded perspective view showing the structure of a semiconductor device according to a ninth embodiment of the present invention.
(B) is the sectional view. The ninth embodiment is the same as the upper semiconductor chip 2 and the lower semiconductor chip 3 in the fifth embodiment.
The joining method with is changed. The joining method using the organic layer 15 is the same as in the sixth embodiment.

【0056】第9の実施例によれば、半硬化型接着剤で
ある有機層15を挟んで2段に積み重ねて貼付けられた
複数個の単独機能半導体チップ2,3をプリント配線基
板14bのダイアタッチ部13に固着してなる構造を採
用したので、これらの半導体チップ2,3を混成してな
る小型で廉価しかも信頼性の高い樹脂封止型複合機能半
導体装置を実現できる。また、各半導体チップ2,3
は、従来の1チップ化設計手法の場合とは違って微細化
する必要がなく、配線間隔が広く確保できて、電気特性
の改善につながる。ダイアタッチ部13を有するプリン
ト配線基板14bは、樹脂基板、セラミック基板のいず
れでもよい。
According to the ninth embodiment, a plurality of single-function semiconductor chips 2 and 3 which are stacked and attached in two steps with the organic layer 15 which is a semi-curable adhesive sandwiched therebetween are attached to the diamond of the printed wiring board 14b. Since the structure fixed to the touch portion 13 is adopted, it is possible to realize a small-sized, low-priced and highly reliable resin-encapsulated multi-function semiconductor device in which these semiconductor chips 2 and 3 are mixed. In addition, each semiconductor chip 2, 3
Unlike the conventional one-chip design method, there is no need for miniaturization, a wide wiring interval can be secured, and electrical characteristics are improved. The printed wiring board 14b having the die attach portion 13 may be either a resin board or a ceramic board.

【0057】(実施例10)図10(a)は本発明の第
10の実施例に係る半導体装置の構成を示す分解斜視
図、図10(b)はその断面図である。図10(a)及
び(b)の半導体装置は、各々主面上に電極端子5を有
する2個の上層半導体チップ2と、第1の有機絶縁膜1
2と、インナーリード7、アウターリード11及びダイ
パッド9を有するリードフレームと、第2の有機絶縁膜
22と、主面上に電極端子5を有する下層半導体チップ
3と、金属細線8と、それらを封止込んで所定のパッケ
ージ4の外形に成形するための封止樹脂10とを備えて
いる。リードフレームのダイパッド9は、半導体チップ
2,3への電源供給のための2本のバスバー16として
用いられるように、長辺方向に対して平行に2つに分割
されている。半導体チップ2,3の電極端子5のうちの
電源端子は、金属細線8によってバスバー16に接続さ
れる。上層半導体チップ2の裏面は2分割されたダイパ
ッド9の表面に第1の有機絶縁膜12を介して、下層半
導体チップ3の主面は2分割されたダイパッド9の裏面
に第2の有機絶縁膜22を介してそれぞれ固着されてい
る。その固着方法やその他の点は第1の実施例と同様で
ある。
(Embodiment 10) FIG. 10A is an exploded perspective view showing the structure of a semiconductor device according to a tenth embodiment of the present invention, and FIG. 10B is a sectional view thereof. The semiconductor device shown in FIGS. 10A and 10B has two upper layer semiconductor chips 2 each having an electrode terminal 5 on the main surface, and a first organic insulating film 1.
2, a lead frame having an inner lead 7, an outer lead 11 and a die pad 9, a second organic insulating film 22, a lower layer semiconductor chip 3 having an electrode terminal 5 on a main surface thereof, a thin metal wire 8, and A sealing resin 10 for encapsulating and molding the outer shape of a predetermined package 4 is provided. The die pad 9 of the lead frame is divided into two parallel to the long side direction so as to be used as two bus bars 16 for supplying power to the semiconductor chips 2 and 3. The power supply terminal of the electrode terminals 5 of the semiconductor chips 2 and 3 is connected to the bus bar 16 by the thin metal wire 8. The back surface of the upper layer semiconductor chip 2 is on the front surface of the die pad 9 divided into two via the first organic insulating film 12, and the main surface of the lower layer semiconductor chip 3 is on the back surface of the die pad 9 divided into the second organic insulating film. They are fixed via 22 respectively. The fixing method and other points are the same as those in the first embodiment.

【0058】第10の実施例によれば、2分割されたダ
イパッド9と2枚の有機絶縁膜12,22とを挟んで2
段に積み重ねて貼付けられた複数個の単独機能半導体チ
ップ2,3を備えた構造を採用したので、これらの半導
体チップ2,3を混成してなる小型で廉価しかも信頼性
の高い樹脂封止型複合機能半導体装置を実現できる。特
に2分割されたダイパッド9をバスバー16として用い
る構成を採用したので、小型化が顕著である。また、各
半導体チップ2,3は、従来の1チップ化設計手法の場
合とは違って微細化する必要がなく、配線間隔が広く確
保できて、電気特性の改善につながる。
According to the tenth embodiment, the die pad 9 divided into two and the two organic insulating films 12 and 22 are sandwiched between the two.
Since a structure having a plurality of single-function semiconductor chips 2 and 3 which are stacked and attached in stages is adopted, a compact, inexpensive and highly reliable resin-sealed type which is a mixture of these semiconductor chips 2 and 3 A multi-function semiconductor device can be realized. Especially, since the die pad 9 divided into two is used as the bus bar 16, the miniaturization is remarkable. Further, unlike the conventional one-chip design method, the semiconductor chips 2 and 3 do not need to be miniaturized, a wide wiring interval can be secured, and the electrical characteristics are improved.

【0059】なお、第3の実施例にならってダイパッド
を有しないリードフレームを採用し、有機絶縁膜12,
22で絶縁を維持しながらリードフレームのインナーリ
ード7を上層半導体チップ2と下層半導体チップ3とで
挟んだ構造を採用することも可能である。
A lead frame having no die pad is adopted according to the third embodiment, and the organic insulating film 12,
It is also possible to adopt a structure in which the inner lead 7 of the lead frame is sandwiched between the upper layer semiconductor chip 2 and the lower layer semiconductor chip 3 while maintaining insulation at 22.

【0060】なお、上記第1〜第10の実施例では各部
間の電気的接続を金属細線8で実現していたが、そのう
ちの一部又は全部を箔状配線に置き換えることができ
る。この箔状配線は、フィルムキャリアで見られるよう
に、絶縁膜上に金属箔を貼り合わせて配線をパターンニ
ングしたものである。このような箔状配線の端子部が各
部の電極端子5に熱圧着で接続される。
In the first to tenth embodiments described above, the electrical connection between the respective parts is realized by the thin metal wires 8, but some or all of them can be replaced with foil-like wiring. This foil-like wiring is obtained by bonding a metal foil on an insulating film and patterning the wiring as seen in a film carrier. The terminal portion of such a foil-like wiring is connected to the electrode terminal 5 of each portion by thermocompression bonding.

【0061】また、各実施例における樹脂封止には、加
熱金型への液状樹脂の注型成形、半硬化型樹脂による注
型成形、液状樹脂の滴下によるポッティング成形、ペレ
ット状の固形樹脂の加熱溶融成形等の方法を採用するこ
とができる。
Further, in the resin sealing in each of the embodiments, the liquid resin is cast-molded in the heating die, the semi-curable resin is cast-molded, the liquid resin is dropped into the potting mold, and the pelletized solid resin is used. A method such as heat melt molding can be adopted.

【0062】[0062]

【発明の効果】以上のように、本発明によれば、種類の
異なる複数の単独機能半導体チップを組み合わせて複合
機能半導体装置にすることで実装面積の小さい樹脂封止
型半導体パッケージが実現でき、回路設計が単純化され
て開発期間が短縮される。そして電気的性能も改善さ
れ、しかも単独機能半導体チップを用いることで半導体
チップの工程標準化が実現できて原価低減が図れる。加
えて、単独機能半導体チップの組合せにより色々な機能
の半導体装置が実現できる等の効果がある。
As described above, according to the present invention, a resin-encapsulated semiconductor package having a small mounting area can be realized by combining a plurality of single-function semiconductor chips of different types into a multi-function semiconductor device. The circuit design is simplified and the development period is shortened. The electrical performance is improved, and by using the single-function semiconductor chip, the process standardization of the semiconductor chip can be realized and the cost can be reduced. In addition, there is an effect that semiconductor devices having various functions can be realized by combining single-function semiconductor chips.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
1A and 1B are diagrams showing a configuration of a semiconductor device according to a first exemplary embodiment of the present invention, in which FIG. 1A is an exploded perspective view and FIG.

【図2】本発明の第2の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
2A and 2B are diagrams showing a configuration of a semiconductor device according to a second exemplary embodiment of the present invention, in which FIG. 2A is an exploded perspective view and FIG.

【図3】本発明の第3の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
FIG. 3 is a diagram showing a configuration of a semiconductor device according to a third embodiment of the present invention, (a) is an exploded perspective view and (b) is a sectional view.

【図4】本発明の第4の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
FIG. 4 is a diagram showing a configuration of a semiconductor device according to a fourth exemplary embodiment of the present invention, in which (a) is an exploded perspective view and (b) is a sectional view.

【図5】本発明の第5の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
5A and 5B are diagrams showing a configuration of a semiconductor device according to a fifth exemplary embodiment of the present invention, in which FIG. 5A is an exploded perspective view and FIG.

【図6】本発明の第6の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
6A and 6B are diagrams showing a configuration of a semiconductor device according to a sixth embodiment of the present invention, wherein FIG. 6A is an exploded perspective view and FIG. 6B is a sectional view.

【図7】本発明の第7の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
7A and 7B are diagrams showing a configuration of a semiconductor device according to a seventh embodiment of the present invention, wherein FIG. 7A is an exploded perspective view and FIG. 7B is a sectional view.

【図8】本発明の第8の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
8A and 8B are diagrams showing a configuration of a semiconductor device according to an eighth embodiment of the present invention, wherein FIG. 8A is an exploded perspective view and FIG. 8B is a sectional view.

【図9】本発明の第9の実施例に係る半導体装置の構成
を示す図であって、(a)は分解斜視図、(b)は断面
図である。
9A and 9B are diagrams showing a configuration of a semiconductor device according to a ninth embodiment of the present invention, in which FIG. 9A is an exploded perspective view and FIG. 9B is a sectional view.

【図10】本発明の第10の実施例に係る半導体装置の
構成を示す図であって、(a)は分解斜視図、(b)は
断面図である。
10A and 10B are diagrams showing a configuration of a semiconductor device according to a tenth embodiment of the present invention, wherein FIG. 10A is an exploded perspective view and FIG.

【図11】複数個の半導体チップを備えた従来の半導体
装置の構成を示す図であって、(a)は分解斜視図、
(b)は断面図である。
FIG. 11 is a diagram showing a configuration of a conventional semiconductor device including a plurality of semiconductor chips, in which (a) is an exploded perspective view;
(B) is a sectional view.

【符号の説明】[Explanation of symbols]

1,2,3 半導体チップ 4 パッケージ 5 電極端子 6 配線基板 7 インナーリード 8 金属細線 9 ダイパッド 10 封止樹脂 11 アウターリード 12,22 有機絶縁膜 13 ダイアタッチ部 14a 中空型パッケージ 14b プリント配線基板 15 有機層(半硬化型接着剤) 16 バスバー 1,2,3 Semiconductor chip 4 Package 5 Electrode terminal 6 Wiring board 7 Inner lead 8 Metal fine wire 9 Die pad 10 Sealing resin 11 Outer lead 12,22 Organic insulating film 13 Die attach part 14a Hollow type package 14b Printed wiring board 15 Organic Layer (semi-curable adhesive) 16 Bus bar

Claims (14)

【特許請求の範囲】[Claims] 【請求項1】 複数個の半導体チップが2層以上積み重
なって構成され、下層半導体チップの主面と上層半導体
チップの裏面との間に絶縁膜を有し、前記上層半導体チ
ップと下層半導体チップとは前記絶縁膜を介して接合さ
れたことを特徴とする半導体装置。
1. A plurality of semiconductor chips are stacked to form two or more layers, and an insulating film is provided between a main surface of the lower layer semiconductor chip and a back surface of the upper layer semiconductor chip, and the upper layer semiconductor chip and the lower layer semiconductor chip. Is bonded via the insulating film.
【請求項2】 複数個の半導体チップが2層以上積み重
なって構成され、下層半導体チップの主面と上層半導体
チップの裏面との間に絶縁層を有し、該絶縁層は表面及
び裏面のうちの少なくとも一方に導電性材料からなる配
線を有し、前記上層半導体チップと下層半導体チップと
は前記配線を有する絶縁層を介して接合されたことを特
徴とする半導体装置。
2. A plurality of semiconductor chips are stacked to form two or more layers, and an insulating layer is provided between the main surface of the lower semiconductor chip and the back surface of the upper semiconductor chip. In at least one of the above, there is provided a wiring made of a conductive material, and the upper layer semiconductor chip and the lower layer semiconductor chip are joined via an insulating layer having the wiring.
【請求項3】 請求項1又は2に記載の半導体装置にお
いて、 最下層半導体チップの裏面はリードフレームのダイパッ
ド表面に固着されたことを特徴とする半導体装置。
3. The semiconductor device according to claim 1, wherein the back surface of the lowermost semiconductor chip is fixed to the die pad surface of the lead frame.
【請求項4】 請求項1又は2に記載の半導体装置にお
いて、 最下層半導体チップの裏面は絶縁膜を介してリードフレ
ームのインナーリード表面に固着されたことを特徴とす
る半導体装置。
4. The semiconductor device according to claim 1, wherein the back surface of the lowermost semiconductor chip is fixed to the inner lead surface of the lead frame via an insulating film.
【請求項5】 請求項1又は2に記載の半導体装置にお
いて、 最下層半導体チップの裏面は中空型パッケージのダイア
タッチ部に固着されたことを特徴とする半導体装置。
5. The semiconductor device according to claim 1, wherein the back surface of the lowermost semiconductor chip is fixed to the die attach portion of the hollow package.
【請求項6】 請求項1又は2に記載の半導体装置にお
いて、 最下層半導体チップの裏面はプリント配線基板のダイア
タッチ部に固着されたことを特徴とする半導体装置。
6. The semiconductor device according to claim 1, wherein the bottom surface of the lowermost semiconductor chip is fixed to a die attach portion of a printed wiring board.
【請求項7】 複数個の半導体チップが2層以上積み重
なって構成され、下層半導体チップの主面と上層半導体
チップの裏面との間に半硬化型の有機層を有し、前記上
層半導体チップと下層半導体チップとは前記有機層を加
熱することによって接合されたことを特徴とする半導体
装置。
7. A plurality of semiconductor chips are stacked to form two or more layers, and a semi-curable organic layer is provided between the main surface of the lower semiconductor chip and the back surface of the upper semiconductor chip. A semiconductor device characterized by being bonded to a lower semiconductor chip by heating the organic layer.
【請求項8】 請求項7記載の半導体装置において、 最下層半導体チップの裏面はリードフレームのダイパッ
ド表面に固着されたことを特徴とする半導体装置。
8. The semiconductor device according to claim 7, wherein the bottom surface of the lowermost semiconductor chip is fixed to the front surface of the die pad of the lead frame.
【請求項9】 請求項7記載の半導体装置において、 最下層半導体チップの裏面は絶縁膜を介してリードフレ
ームのインナーリード表面に固着されたことを特徴とす
る半導体装置。
9. The semiconductor device according to claim 7, wherein the back surface of the lowermost semiconductor chip is fixed to the inner lead surface of the lead frame via an insulating film.
【請求項10】 請求項7記載の半導体装置において、 最下層半導体チップの裏面は中空型パッケージのダイア
タッチ部に固着されたことを特徴とする半導体装置。
10. The semiconductor device according to claim 7, wherein the bottom surface of the lowermost semiconductor chip is fixed to the die attach portion of the hollow package.
【請求項11】 請求項7記載の半導体装置において、 最下層半導体チップの裏面はプリント配線基板のダイア
タッチ部に固着されたことを特徴とする半導体装置。
11. The semiconductor device according to claim 7, wherein the back surface of the lowermost semiconductor chip is fixed to the die attach portion of the printed wiring board.
【請求項12】 複数個の半導体チップが2層以上積み
重なって構成され、下層半導体チップの主面と上層半導
体チップの裏面との間にリードフレームの一部を有し、
前記上層半導体チップと下層半導体チップとは各々絶縁
膜を介して前記リードフレームの一部に接合されたこと
を特徴とする半導体装置。
12. A plurality of semiconductor chips are stacked to form two or more layers, and a part of a lead frame is provided between the main surface of the lower semiconductor chip and the back surface of the upper semiconductor chip.
The semiconductor device according to claim 1, wherein the upper layer semiconductor chip and the lower layer semiconductor chip are respectively joined to a part of the lead frame via an insulating film.
【請求項13】 請求項1〜12のいずれか1項に記載
の半導体装置を製造するための方法であって、 絶縁膜上に貼り合わせた金属箔にパターンを施したプリ
ント配線を熱圧着で前記複数個の半導体チップの電極端
子に接続することにより前記半導体装置の電気的接続を
実現することを特徴とする半導体装置の製造方法。
13. A method for manufacturing the semiconductor device according to claim 1, wherein a printed wiring having a pattern formed on a metal foil laminated on an insulating film is formed by thermocompression bonding. A method of manufacturing a semiconductor device, comprising electrically connecting the semiconductor device by connecting to electrode terminals of the plurality of semiconductor chips.
【請求項14】 請求項1〜12のいずれか1項に記載
の半導体装置を製造するための方法であって、 少なくとも前記複数個の半導体チップを樹脂封止するこ
とを特徴とする半導体装置の製造方法。
14. A method for manufacturing the semiconductor device according to claim 1, wherein at least the plurality of semiconductor chips are resin-sealed. Production method.
JP14667295A 1995-06-14 1995-06-14 Semiconductor device Expired - Fee Related JP3602888B2 (en)

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Publication Number Publication Date
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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100223125B1 (en) * 1996-12-31 1999-10-15 윤종용 Stacked chip package having chip on chip structure
JP2002217357A (en) * 2001-01-19 2002-08-02 Kyocera Corp Semiconductor device
JP2002217355A (en) * 2001-01-18 2002-08-02 Kyocera Corp Semiconductor device
JP2002217360A (en) * 2001-01-18 2002-08-02 Kyocera Corp Semiconductor device
KR100390466B1 (en) * 1999-12-30 2003-07-04 앰코 테크놀로지 코리아 주식회사 multi chip module semiconductor package
KR100393101B1 (en) * 2000-12-29 2003-07-31 앰코 테크놀로지 코리아 주식회사 Semiconductor package and its manufacturing method
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KR100537893B1 (en) * 1998-11-04 2006-02-28 삼성전자주식회사 Leadframe and multichip package using the same
JP2006186053A (en) * 2004-12-27 2006-07-13 Shinko Electric Ind Co Ltd Laminated semiconductor device
JP2007258751A (en) * 2007-06-25 2007-10-04 Renesas Technology Corp Semiconductor device
JP2009260373A (en) * 2009-07-27 2009-11-05 Fujitsu Microelectronics Ltd Semiconductor device, its method for manufacturing, and semiconductor substrate
JP2009540606A (en) * 2006-06-15 2009-11-19 マーベル ワールド トレード リミテッド Stack die package
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Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100223125B1 (en) * 1996-12-31 1999-10-15 윤종용 Stacked chip package having chip on chip structure
KR100537893B1 (en) * 1998-11-04 2006-02-28 삼성전자주식회사 Leadframe and multichip package using the same
KR100390466B1 (en) * 1999-12-30 2003-07-04 앰코 테크놀로지 코리아 주식회사 multi chip module semiconductor package
KR100393101B1 (en) * 2000-12-29 2003-07-31 앰코 테크놀로지 코리아 주식회사 Semiconductor package and its manufacturing method
KR100399724B1 (en) * 2000-12-29 2003-09-29 앰코 테크놀로지 코리아 주식회사 Semiconductor package
JP2002217360A (en) * 2001-01-18 2002-08-02 Kyocera Corp Semiconductor device
JP2002217355A (en) * 2001-01-18 2002-08-02 Kyocera Corp Semiconductor device
JP2002217357A (en) * 2001-01-19 2002-08-02 Kyocera Corp Semiconductor device
JP2006186053A (en) * 2004-12-27 2006-07-13 Shinko Electric Ind Co Ltd Laminated semiconductor device
JP2009540606A (en) * 2006-06-15 2009-11-19 マーベル ワールド トレード リミテッド Stack die package
JP2010535404A (en) * 2007-05-16 2010-11-18 クゥアルコム・インコーポレイテッド Die stacking system and method
US9159694B2 (en) 2007-05-16 2015-10-13 Qualcomm Incorporated Die stacking system and method
JP2017079332A (en) * 2007-05-16 2017-04-27 クゥアルコム・インコーポレイテッドQualcomm Incorporated Die stacking system and method
JP2007258751A (en) * 2007-06-25 2007-10-04 Renesas Technology Corp Semiconductor device
JP2009260373A (en) * 2009-07-27 2009-11-05 Fujitsu Microelectronics Ltd Semiconductor device, its method for manufacturing, and semiconductor substrate

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