JPH08330354A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH08330354A
JPH08330354A JP7137672A JP13767295A JPH08330354A JP H08330354 A JPH08330354 A JP H08330354A JP 7137672 A JP7137672 A JP 7137672A JP 13767295 A JP13767295 A JP 13767295A JP H08330354 A JPH08330354 A JP H08330354A
Authority
JP
Japan
Prior art keywords
tab
pad
semiconductor device
functional test
test
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7137672A
Other languages
Japanese (ja)
Other versions
JP2705642B2 (en
Inventor
Naoya Nakayama
直也 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP7137672A priority Critical patent/JP2705642B2/en
Publication of JPH08330354A publication Critical patent/JPH08330354A/en
Application granted granted Critical
Publication of JP2705642B2 publication Critical patent/JP2705642B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Wire Bonding (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Abstract

PURPOSE: To suppress the noise on a power source line generated when parasitic capacitance is charged and discharged by a method wherein the impedance of the part which is cut when the device is actually used, is increased between an LSI pad and a test pad in a TAB when a functional test is performed. CONSTITUTION: In a semiconductor device having a plurality of TAB leads 3 which are connected to a testing pad 2 from an LSI pad 1 when a functional test is conducted, the resistance value of the part of the TAB leads 3 which is cut when it is actually used is made higher than the resistance value of the remaining part. To be more precise, the width of a part of the TAB leads 3 of an output terminal is made narrower in the amount of (x) than the conventional width. As a result, the peak value of the transient current when an output signal is inverted becomes small, the noise of the power source line of the semiconductor integrated circuit to be measured becomes small, and the erroneous operation when a functional test is conducted can be prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置に関し、特に
TABリードを用いた半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a semiconductor device using a TAB lead.

【0002】[0002]

【従来の技術】近年、半導体装置のダウンサイジングが
進む中、実装密度の向上の目的で、TABリードを用い
ることが多くなってきている。
2. Description of the Related Art In recent years, as downsizing of semiconductor devices progresses, TAB leads are often used for the purpose of improving packaging density.

【0003】図3は、従来のTABリードを用いた半導
体装置の一例を示すもので、図3(A)にはその機能試
験時の状態、図3(B)に実使用時の状態を示してい
る。図3に示される半導体装置では、LSIパッドから
試験用パッドに比較的インピーダンスの小さい、全ピン
同じインピーダンスのTABリードで接続されていた。
FIG. 3 shows an example of a conventional semiconductor device using a TAB lead. FIG. 3 (A) shows the state during a functional test, and FIG. 3 (B) shows the state during actual use. ing. In the semiconductor device shown in FIG. 3, the LSI pad was connected to the test pad by a TAB lead having a relatively small impedance and the same impedance on all pins.

【0004】半導体装置の機能試験を行う時、半導体集
積回路測定機はTABリード、試験用パッドを介して電
気信号の入出力を行っていた。
When performing a functional test of a semiconductor device, a semiconductor integrated circuit measuring instrument inputs and outputs an electric signal through a TAB lead and a test pad.

【0005】TAB形態で機能試験をパスした半導体装
置は、キャリアテープから切断されリード整形を行い所
望のパッケージに接続される。その際TABリードの切
断は、一様に切断するが特にインピーダンスを考慮して
行っていない。
A semiconductor device which has passed the functional test in the TAB form is cut from the carrier tape, lead-shaped, and connected to a desired package. At that time, the TAB lead is cut uniformly, but impedance is not taken into consideration.

【0006】[0006]

【発明が解決しようとする課題】以上説明したように、
従来の半導体装置の機能試験を行う時、半導体集積回路
の測定系では、LSIパッドから半導体集積回路測定機
まで含めると半導体集積回路の実使用状態に比べ過大な
寄生容量が付加されてしまう場合が多い。この結果、半
導体集積回路の測定中に寄生容量の充放電により電源ラ
インにノイズが発生し、このノイズにより半導体集積回
路が誤動作を起こすという欠点があった。
As described above,
When performing a functional test of a conventional semiconductor device, in a semiconductor integrated circuit measurement system, if an LSI pad to a semiconductor integrated circuit measuring device are included, an excessive parasitic capacitance may be added as compared with the actual use state of the semiconductor integrated circuit. Many. As a result, there is a drawback that noise is generated in the power supply line due to charging and discharging of the parasitic capacitance during measurement of the semiconductor integrated circuit, and the noise causes the semiconductor integrated circuit to malfunction.

【0007】[0007]

【課題を解決するための手段】本発明の半導体装置は、
機能試験時の少なくとも1つのTABにおいてLSIパ
ッドとテストパッド間であって、実使用時には切断され
る部分のインピーダンスを大きくすることを特徴とす
る。
According to the present invention, there is provided a semiconductor device comprising:
It is characterized in that the impedance of a portion between the LSI pad and the test pad in at least one TAB at the time of the function test, which is cut during the actual use, is increased.

【0008】[0008]

【実施例】次に本発明について図面を参照して説明す
る。図1は本発明の一実施例を示すもので、図1(A)
にはその機能試験時の状態が、図1(B)にはその実使
用時の状態が示されている。図1において、出力端子の
TABリードの一部が従来の幅よりxだけ細くなってい
る。このとき、TABリードの厚さをD、従来の幅を
W、リードの材料の抵抗率をρとしたとき、リードの長
さLの部分のインピーダンスZは、従来Z=ρ・L/
(D・W)であったのが、Z=ρ・L/{D・(W−
x)}へと増大する。機能試験時の測定系寄生容量をC
p、被測定端子の出力インピーダンスをReとすると、
寄生容量Cpの充放電時定数Tは従来のT=Cp・{R
e+ρ・L/(D・W)}からT=Cp・[Re+ρ・
L/{D・(W−x)}]へと大きくなる。これにより
出力信号が反転するときの過渡電流のピーク値が小さく
なり被測定半導体集積回路の電源ラインのノイズが小さ
くなり、機能試験時の誤動作を防止することができる。
The present invention will be described below with reference to the drawings. FIG. 1 shows an embodiment of the present invention, and FIG.
Shows the state at the time of the functional test, and FIG. 1 (B) shows the state at the time of the actual use. In FIG. 1, a part of the TAB lead of the output terminal is narrower than the conventional width by x. At this time, when the thickness of the TAB lead is D, the conventional width is W, and the resistivity of the material of the lead is ρ, the impedance Z of the lead length L is Z = ρ · L /
(D · W) was Z = ρ · L / {D · (W-
x)}. The parasitic capacitance of the measurement system during the functional test is C
Let p be the output impedance of the measured terminal and Re be
The charging / discharging time constant T of the parasitic capacitance Cp is the conventional T = Cp · {R
From e + ρ · L / (D · W)}, T = Cp · [Re + ρ ·
L / {D · (W−x)}]. As a result, the peak value of the transient current when the output signal is inverted is reduced, the noise on the power supply line of the semiconductor integrated circuit under test is reduced, and malfunction during the functional test can be prevented.

【0009】本実施例では幅を細くするTABリード
は、機能試験に関係する一部のTABリードであった
が、すべてのTABリードの幅を細くして同一形状とし
てもいい。
In this embodiment, the TAB leads whose width is reduced are a part of the TAB leads related to the functional test, but all the TAB leads may be reduced in width to have the same shape.

【0010】図2は本発明の別の一実施例を示すもの
で、図2(A)にはその機能試験時の状態が、図2
(B)にはその実使用時の状態が示されている。このよ
うに、信号端子のTABリードの長さをLからy長くす
ることで、リード部のインピーダンスをR=ρ・L/
(D・W)からR=ρ・(L+y)/(D・W)へと大
きくでき、寄生容量Cpの充放電時定数TはT=Cp・
{Re+ρ・L/(D・W)}からT=Cp・{Re+
ρ・(L+y)/(D・W)}へと大きくなる。これに
より、第1の実施例と同じ効果が得られる。
FIG. 2 shows another embodiment of the present invention. FIG. 2 (A) shows the state at the time of the functional test.
(B) shows the state at the time of actual use. In this way, by increasing the length of the TAB lead of the signal terminal from y to L, the impedance of the lead portion becomes R = ρ · L /
(D · W) can be increased to R = ρ · (L + y) / (D · W), and the charging / discharging time constant T of the parasitic capacitance Cp is T = Cp ·
From {Re + ρ · L / (D · W)}, T = Cp · {Re +
ρ · (L + y) / (D · W)}. As a result, the same effect as that of the first embodiment can be obtained.

【0011】以上述べてきたのは、出力端子のTABリ
ードの形状を変えることによりリード部のインピーダン
スを大きくする方法であるが、これ以外に抵抗率ρを変
える、すなわち材質を変えることによりインピーダンス
を大きくしても同様の効果が得られる。具体的には、第
1の実施例における幅の細い部分の代りに、その部分の
抵抗率の高い材質で構成すればよい。
The method described above is a method of increasing the impedance of the lead portion by changing the shape of the TAB lead of the output terminal. In addition to this, the impedance can be changed by changing the resistivity ρ, that is, by changing the material. Even if it is increased, the same effect can be obtained. Specifically, instead of the narrow width portion in the first embodiment, the material having a high resistivity in that portion may be used.

【0012】[0012]

【発明の効果】以上のように、本発明によれば、半導体
装置においてLSIパッドとテストパッド間のTABリ
ードのインピーダンスを大きくすることにより、半導体
集積回路の機能試験時の測定系寄生容量の充放電による
誤動作を防止できる効果を有し、かつ実使用時の寄生容
量が小さくなったときには、前記TABリードの一部を
切断し、インピーダンスを小さくできる。
As described above, according to the present invention, by increasing the impedance of the TAB lead between the LSI pad and the test pad in the semiconductor device, the measurement system parasitic capacitance can be satisfied during the functional test of the semiconductor integrated circuit. It has the effect of preventing malfunction due to discharge, and when the parasitic capacitance during actual use becomes small, the TAB lead can be partially cut to reduce the impedance.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例のTABの形状。FIG. 1 shows the shape of a TAB according to an embodiment of the present invention.

【図2】本発明の別の一実施例のTABの形状。FIG. 2 is a TAB shape according to another embodiment of the present invention.

【図3】従来のTABの形状。FIG. 3 shows the shape of a conventional TAB.

【符号の説明】[Explanation of symbols]

1 LSIパッド 2 試験用パッド 3 TABリード 4 LSI D TABの厚さ L TABリードの長さ W TABリードの幅 ρ TABリードの材料の抵抗率 x TABリード幅の従来との差 y TABリード長の従来との差 1 LSI pad 2 Test pad 3 TAB lead 4 LSI D TAB thickness L TAB lead length W TAB lead width ρ TAB lead material resistivity x TAB lead width difference y y TAB lead length Difference from conventional

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 機能試験時にLSIパッドから試験用パ
ッドに接続された複数のTABリードを有する半導体装
置において、少なくとも1つの前記TABリードのうち
実使用時には切断される部分を実使用時残る部分の抵抗
値よりも高くしたことを特徴とする半導体装置。
1. In a semiconductor device having a plurality of TAB leads connected from an LSI pad to a test pad during a functional test, a portion of at least one of the TAB leads that is cut during actual use is a portion that remains during actual use. A semiconductor device characterized by being made higher than a resistance value.
【請求項2】 前記抵抗値の高いTABリードの部分は
他のTABリードの部分より幅が細いことを特徴とする
請求項1記載の半導体装置。
2. The semiconductor device according to claim 1, wherein a portion of the TAB lead having a high resistance value is narrower than a portion of another TAB lead.
【請求項3】 前記抵抗値の高いTABリードは、他の
TABリードよりも長さが長いことを特徴とする請求項
1記載の半導体装置。
3. The semiconductor device according to claim 1, wherein the TAB lead having a high resistance value is longer than other TAB leads.
JP7137672A 1995-06-05 1995-06-05 Semiconductor device Expired - Lifetime JP2705642B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7137672A JP2705642B2 (en) 1995-06-05 1995-06-05 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7137672A JP2705642B2 (en) 1995-06-05 1995-06-05 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH08330354A true JPH08330354A (en) 1996-12-13
JP2705642B2 JP2705642B2 (en) 1998-01-28

Family

ID=15204128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7137672A Expired - Lifetime JP2705642B2 (en) 1995-06-05 1995-06-05 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2705642B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19836753A1 (en) * 1998-08-13 2000-03-02 Siemens Ag Integrated semiconductor chip with leads to one or more external connections

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282037U (en) * 1988-12-13 1990-06-25
JPH05226408A (en) * 1992-02-17 1993-09-03 Nec Corp Tab integrated circuit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0282037U (en) * 1988-12-13 1990-06-25
JPH05226408A (en) * 1992-02-17 1993-09-03 Nec Corp Tab integrated circuit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19836753A1 (en) * 1998-08-13 2000-03-02 Siemens Ag Integrated semiconductor chip with leads to one or more external connections
EP0981160A3 (en) * 1998-08-13 2002-03-27 Infineon Technologies AG Integrated semiconductor chip with leads having a defined resistance
US6376913B1 (en) 1998-08-13 2002-04-23 Siemens Aktiengesellschaft Integrated semiconductor chip having leads to one or more external terminals
DE19836753B4 (en) * 1998-08-13 2004-04-15 Infineon Technologies Ag Integrated semiconductor chip with leads to one or more external connections

Also Published As

Publication number Publication date
JP2705642B2 (en) 1998-01-28

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Effective date: 19970909