JPH08294921A - Cleaning method for vulcanizing mold - Google Patents

Cleaning method for vulcanizing mold

Info

Publication number
JPH08294921A
JPH08294921A JP7103481A JP10348195A JPH08294921A JP H08294921 A JPH08294921 A JP H08294921A JP 7103481 A JP7103481 A JP 7103481A JP 10348195 A JP10348195 A JP 10348195A JP H08294921 A JPH08294921 A JP H08294921A
Authority
JP
Japan
Prior art keywords
mold
electrode
cleaning method
vulcanization
central axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7103481A
Other languages
Japanese (ja)
Other versions
JP3277093B2 (en
Inventor
Yukihiro Kusano
行弘 草野
Masahito Yoshikawa
雅人 吉川
Toshio Naito
壽夫 内藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Priority to JP10348195A priority Critical patent/JP3277093B2/en
Publication of JPH08294921A publication Critical patent/JPH08294921A/en
Application granted granted Critical
Publication of JP3277093B2 publication Critical patent/JP3277093B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/70Maintenance
    • B29C33/72Cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2030/00Pneumatic or solid tyres or parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)

Abstract

PURPOSE: To provide a method for cleaning a vulcanizing mold in which uniform residue ashing is realized in a short time by operating a local high-density plasma at the entire periphery of the inner surface of the mold stuck with vulcanizing residue. CONSTITUTION: A method for cleaning a vulcanizing mold comprises the steps of disposing an annular vulcanizing mold 7 as the other electrode at the periphery of one electrode 7 protruding into a treating tank, disposing the one electrode surface at the position deviated to the vicinity position of the inner surface of the mold, generating a local high-density plasma between both the electrode surfaces approaching to each other, rotatably holding at least the electrode of one side at the deviated position, and operating the plasma at the entire periphery of the inner surface of the mold upon rotating.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、ゴムタイヤ、防振ゴ
ムなどのゴム製品及びその他のエラストマとしてのプラ
スチック製品の加硫成形に際し、繰返し用いる金型内側
の成形表面、分割金型の場合は合せ面も含めた表面及び
凹部や穴に不可避的に形成されるエラストマ残滓を有利
に除去するための加硫金型の清浄方法に関し、特に加硫
金型に対する不利な劣化、損傷を伴うことなく、またプ
ラズマ分布の不均一領域形成にわずらわされることな
く、短時間での均一な残滓処理が可能な加硫金型の清浄
方法に関する。
BACKGROUND OF THE INVENTION The present invention relates to a molding surface on the inside of a mold repeatedly used for vulcanization molding of rubber products such as rubber tires and vibration-proof rubber and other plastic products as elastomers, and in the case of split molds A method for cleaning a vulcanization mold for advantageously removing elastomer residues that are unavoidably formed on the surface including the surface and in the recesses and holes, particularly without accompanying disadvantageous deterioration and damage to the vulcanization mold, Further, the present invention relates to a method for cleaning a vulcanization mold, which enables uniform residue treatment in a short time without being involved in forming a non-uniform region of plasma distribution.

【0002】[0002]

【従来の技術】既に本出願人による特開平6−2858
68号公報にて詳述したように、エラストマ製品、とり
わけゴムタイヤ製品(以降単にタイヤと記す)や防振ゴ
ム製品などは要求性能を満たすため、天然ゴム、合成ゴ
ム又はこれらのブレンドゴムに架橋剤としての硫黄と補
強材としてのカーボンブラックとを配合するほか、加硫
促進剤や各種耐久性保持のための各種薬品を配合する必
要がある。
2. Description of the Related Art JP-A-6-2858 already filed by the present applicant.
As described in detail in Japanese Patent Publication No. 68, elastomer products, particularly rubber tire products (hereinafter simply referred to as tires), anti-vibration rubber products, and the like satisfy the required performance, and therefore natural rubber, synthetic rubber or blended rubbers thereof are cross-linked. In addition to blending sulfur as a component and carbon black as a reinforcing material, it is necessary to blend a vulcanization accelerator and various chemicals for maintaining various durability.

【0003】このようにして調合した未加硫ゴム組成物
を加硫成形する際、一般的に200℃に近い高温度で架
橋反応などの化学反応を生じさせるので、ゴム組成物は
流動性を増すばかりでなく一部はガス化し、その結果加
硫金型の成形表面はもとより、金型の合せ面の極く狭い
隙間や空気抜きのいわゆるベントホールなどの穴などに
もゴム組成物及びその化学反応生成物が加硫成形の都
度、微量ながら残滓物として強固に付着するのは不可避
である。この加硫成形を多数回にわたり繰返すことによ
り残滓物は看過し得ないほどの厚さで堆積する。このこ
とはゴム組成物に限らず他のエラストマについても大同
小異で同様に生じる。
When the unvulcanized rubber composition thus prepared is vulcanized and molded, a chemical reaction such as a crosslinking reaction generally occurs at a high temperature close to 200 ° C., so that the rubber composition has fluidity. Not only does it increase, but it also partially gasifies, and as a result, not only the molding surface of the vulcanizing mold, but also the extremely narrow gaps in the mating surface of the mold and holes such as so-called vent holes for venting the rubber composition and its chemical composition. It is unavoidable that the reaction product adheres strongly as a residue, although it is a small amount, each time it is vulcanized and molded. By repeating this vulcanization molding a number of times, the residue is deposited in a thickness that cannot be overlooked. This applies not only to the rubber composition but also to other elastomers in the same manner and in different sizes.

【0004】加硫金型に強固に付着堆積した厚い加硫残
滓はタイヤの外観を損ねるのみに止まらず、タイヤ全体
の優れた品質保持に対し悪影響を及ぼす。よって加硫成
形を所定回数だけ実施した加硫金型を新品同様に清浄す
る作業が必要であり、この作業法としてプラスチックビ
ーズやグラスビーズなどの粒体を高圧ガスにより吹き当
てるショットブラスト清浄法、又は酸、アルカリ、アミ
ン系などの溶液中に浸す液体清浄法が主流を占めていた
ところ、これらの清浄法による各種の不利な点を大幅に
改善するため、本出願人は上記特開平6−285868
号公報に記載したプラズマによる加硫金型清浄方法を提
案し、顕著に優れた成果を得ている。
The thick vulcanization residue firmly adhered and deposited on the vulcanization mold not only impairs the appearance of the tire, but also adversely affects the excellent quality maintenance of the entire tire. Therefore, it is necessary to clean the vulcanization mold that has been vulcanized and molded a predetermined number of times as if it was a new product.As this work method, a shot blast cleaning method in which granules such as plastic beads and glass beads are sprayed with high pressure gas, Alternatively, a liquid cleaning method of immersing in a solution of acid, alkali, amine or the like has predominantly been used. Since the various disadvantages of these cleaning methods are remarkably improved, the applicant of the present invention has described the above-mentioned JP-A-6- 285868
The method for cleaning a vulcanization mold by plasma described in Japanese Patent Publication has been proposed, and a remarkably excellent result has been obtained.

【0005】[0005]

【発明が解決しようとする課題】しかしこの成果を突き
詰めてみると、下記する諸点につきさらに改善を施す余
地があることを見出した。すなわちその第一点は、加硫
金型の清浄面に対しプラズマ領域が過大であり、その結
果大電力と余分な量の反応ガスを必要とし、処理コスト
が高価につくことである。
However, upon examining this result, it was found that there is room for further improvement in the following points. That is, the first point is that the plasma region is excessively large with respect to the clean surface of the vulcanization mold, and as a result, a large amount of electric power and an excessive amount of reaction gas are required, resulting in high processing cost.

【0006】その第二点は、清浄を必要とする加硫金型
の型形成面に、特殊なタイヤ種は別としても一般にはタ
イヤに対する要求特性の十分な発揮に必要不可欠な太
溝、細溝、スリットなどをトレッド部に形成するための
多数個のリブやサイプ(細条片)などの突起物を設けて
いて、プラズマがこれらの突起物に遮られて清浄面対象
全領域にわたる加硫残滓の均一なアッシング(灰化)が
損なわれ勝ちであることである。
The second point is that, on the mold forming surface of the vulcanizing mold that needs to be cleaned, apart from special tire types, generally, the large grooves and fine grooves that are indispensable for sufficiently exhibiting the required characteristics of the tire are required. A large number of ribs and protrusions such as sipes (strips) for forming grooves and slits on the tread portion are provided, and the plasma is blocked by these protrusions and vulcanized over the entire area of the clean surface. This is because the uniform ashing (ashing) of the residue is impaired and tends to occur.

【0007】その第三点は、上記第二点に関連して多く
の処理時間を要するため清浄能率が低下すること、第四
点は、清浄対象外の表面までプラズマにさらす結果とな
るため、この表面部分に劣化を生じさせ、また損傷を与
えるうれいがあること、そして第五点はプラズマ密度分
布を清浄処理対象の全領域にわたり均一にするため、ア
ッシング処理にとって不利な処理条件、例えば反応ガス
の一層の低圧化やハロゲン化物ガス(特にCF4 ガス)
の量の減少などの条件の採用が余儀なくされることであ
る。
The third point is that the cleaning efficiency is lowered because a lot of processing time is required in relation to the second point, and the fourth point is that the surface not to be cleaned is exposed to plasma. This surface part is apt to cause deterioration and damage, and the fifth point is that the plasma density distribution is made uniform over the entire region to be cleaned, so that processing conditions that are unfavorable to the ashing process such as reaction Further reduction of gas pressure and halide gas (especially CF 4 gas)
That is, the adoption of conditions such as a decrease in the amount of

【0008】従ってこの発明の目的は上述した不利な諸
点全ての改善を目指し、加硫金型の型形成面に制約を加
えることなく低コストで、かつ短い処理時間での均一な
アッシングを有利に実現することが可能な加硫金型の清
浄方法を提供することにある。
Therefore, an object of the present invention is to improve all of the above-mentioned disadvantages, and it is advantageous to provide uniform ashing at a low cost and a short processing time without restricting the mold forming surface of the vulcanization mold. An object of the present invention is to provide a method of cleaning a vulcanization mold that can be realized.

【0009】[0009]

【課題を解決するための手段】上記目的を達成するた
め、この発明の加硫金型の清浄方法は、真空処理槽内の
希薄反応ガスに生起させたプラズマを加硫金型に作用さ
せ、エラストマの繰返し加硫成形により金型内側表面に
形成されたエラストマ残滓をアッシングして除去するに
あたり、一方の電極を処理槽内に突出させ、突出した電
極の周囲に環状加硫金型を他方の電極として位置させる
と共に、上記一方の電極表面を金型内側表面の近傍位置
に偏らせて配置して、両電極に対する電力印加により互
いに近接する両電極表面相互間で局所に高密度プラズマ
を発生させ、併せて両電極のうち少なくとも片方側の電
極は上記偏りを保持して回転可能とし、この回転動作に
伴い局所の高密度プラズマを金型内側表面の全周にわた
り作用させることを特徴とする。
In order to achieve the above object, a method for cleaning a vulcanizing mold of the present invention is to apply a plasma generated in a dilute reaction gas in a vacuum treatment tank to the vulcanizing mold, When removing the elastomer residue formed on the inner surface of the mold by repeated vulcanization molding of the elastomer by ashing, one electrode is projected into the processing tank, and the annular vulcanization mold is surrounded by the protruding electrode. In addition to being positioned as an electrode, the surface of one of the electrodes is biased near the inner surface of the mold to generate high-density plasma locally between the electrode surfaces that are close to each other by applying power to both electrodes. At the same time, at least one of the two electrodes should be able to rotate while maintaining the above bias, and the local high-density plasma should be made to act over the entire circumference of the inner surface of the mold along with this rotating operation. And butterflies.

【0010】この発明を実施するにあたり、上記一方の
電極をアーム状部材の先端部に配置し、該部材の先端部
と反対側端部を金型内側表面の中心軸線が通ること、上
記一方の電極が、金型内側表面の内周面と同じ向きに湾
曲する表面をもつ板状部材からなること、上記一方の電
極が円筒状板部材からなり、該部材の中心軸線は金型内
側表面の中心軸線から偏って位置すること、上記一方の
電極が多数個の穴を備えること、上記一方の電極が、金
型に向く表面に多数個のフィンを備えること、加硫金型
がその内側表面の中心軸線周りに回転可能であること、
そして上記一方の電極が、金型内側表面と所定距離を保
持して回転可能であることが望ましい。
In practicing the present invention, the one electrode is arranged at the tip of the arm-shaped member, and the center axis of the inner surface of the mold passes through the end opposite to the tip of the member. The electrode is composed of a plate-shaped member having a surface curved in the same direction as the inner peripheral surface of the inner surface of the mold, the one electrode is composed of a cylindrical plate member, and the central axis of the member is the inner surface of the mold. Being deviated from the central axis, the one electrode is provided with a large number of holes, the one electrode is provided with a plurality of fins on the surface facing the mold, the vulcanizing mold has its inner surface Be rotatable about the central axis of
It is desirable that the one electrode can rotate while maintaining a predetermined distance from the inner surface of the mold.

【0011】なお反応ガスとして酸素ガス(O2
3 )とハロゲン化物ガスとの混合ガスが好ましく、ま
たハロゲン化物ガスとしてはF(フッ素)、Cl(塩
素)、Br(臭素)、I(ヨウ素)などを含有するあら
ゆるガスを使用することができる。また真空処理槽にガ
スとして供給されさえすればよいため標準状態(25
℃、1atm)で必ずしもガスである必要ななく、例え
ば液体状態であってもよい。特にフロンやNF3 、SF
6 が好適に用いられ、なかでもCF4 (四フッ化炭素)
が効果的である。
As a reaction gas, oxygen gas (O 2 ,
A mixed gas of O 3 ) and a halide gas is preferable, and as the halide gas, any gas containing F (fluorine), Cl (chlorine), Br (bromine), I (iodine), etc. can be used. it can. Moreover, since it only needs to be supplied as a gas to the vacuum processing tank, the standard condition (25
It is not necessarily a gas at 1 ° C. and 1 ° C., and may be in a liquid state, for example. Especially Freon, NF 3 , SF
6 is preferably used, among which CF 4 (carbon tetrafluoride)
Is effective.

【0012】[0012]

【作用】まず、一方の電極を処理槽内に突出させると共
に、この電極の周囲に環状加硫金型を他方の電極として
前者電極から所定距離隔てて位置させることにより、清
浄を必要とする加硫金型の面と電極面との間の領域にの
みプラズマを生起させればよく、その結果プラズマ領域
を必要最小限度で最適化することができ、よって余分な
電力及び余分な反応ガス使用量を低減させ、処理コスト
を引き下げることが可能となる。
Operation: First, one electrode is projected into the processing tank, and an annular vulcanizing die is positioned around this electrode as the other electrode at a predetermined distance from the former electrode, so that cleaning is required. It is only necessary to generate the plasma in the area between the surface of the metal mold and the electrode surface, and as a result, the plasma area can be optimized to the minimum required, and therefore, the extra power and the extra reaction gas consumption are required. And the processing cost can be reduced.

【0013】次に、処理槽内に突出させた一方の電極表
面を金型内側表面の近傍位置に偏らせて配置することに
より、両電極に電力を印加したとき互いに近接する両電
極表面相互間で局所的に高密度なプラズマを発生させる
ことが可能となる。このことは、金型内側表面の全周領
域に対しいわば意図的に不均一なプラズマ領域を形成さ
せることに他ならない。このありさまをこの発明による
一実施例の要部平面をあらわす図2に示す。
Next, by disposing one electrode surface protruding into the processing tank in a position near the inner surface of the mold so as to be biased between the two electrode surfaces which are close to each other when electric power is applied to both electrodes. Thus, it becomes possible to locally generate high-density plasma. This is nothing but the intentional formation of a non-uniform plasma region over the entire peripheral region of the inner surface of the mold. This state is shown in FIG. 2 which shows a plane of a main part of an embodiment according to the present invention.

【0014】図2おいて符号1は処理槽内に突出する一
方の電極であり、符号7は他方の電極としての加硫金型
であり、電極1はアーム状部材5の先端部に固着し、ア
ーム状部材5を経て電極1に電力を供給する。両電極に
所定電力を印加すると、近接する両電極1、7表面相互
間で図の格子模様を施した局所部分にのみプラズマ領域
が形成される。勿論両電極1、7相互間で最も近接した
距離D箇所近くで最も高密度なプラズマが形成され、相
互間距離が離れるほどプラズマ密度は減少する。
In FIG. 2, reference numeral 1 is one electrode protruding into the processing tank, reference numeral 7 is a vulcanization mold as the other electrode, and the electrode 1 is fixed to the tip of the arm-shaped member 5. Power is supplied to the electrode 1 via the arm-shaped member 5. When a predetermined electric power is applied to both electrodes, a plasma region is formed only between the adjacent surfaces of the electrodes 1 and 7 in a local portion having a lattice pattern shown in the figure. Of course, the highest density plasma is formed in the vicinity of the distance D where the electrodes 1 and 7 are closest to each other, and the plasma density decreases as the distance between them increases.

【0015】しかも両電極1、7のうち少なくとも片方
側の電極が偏り距離Dを保持して回転可能であり、例え
ば電極1を静止させ電極7(加硫金型)を回転させるこ
とができるため、局所的な高密度なプラズマ領域はこの
回転に伴い金型内側表面の全周にわたり作用するこにな
る。よって反応ガスの低圧化やハロゲン化物ガスの流入
量の低減化は不要となり、低コストで処理時間の短縮を
可能とする外、清浄対象外の加硫金型7表面に対し劣
化、損傷をもたらす不具合が回避できる利点を有する。
また相当に複雑で多様な形態をもつタイヤトレッド模様
形成面に対し最適化したプラズマ領域は均一なアッシン
グ効果をもたらす。
Moreover, since at least one of the electrodes 1 and 7 can rotate while maintaining the deviation distance D, for example, the electrode 1 can be stationary and the electrode 7 (vulcanization mold) can be rotated. The local high-density plasma region acts on the entire inner surface of the mold along with this rotation. Therefore, it is not necessary to reduce the pressure of the reaction gas and the inflow amount of the halide gas, and it is possible to reduce the processing time at low cost, and also to cause deterioration and damage to the surface of the vulcanization mold 7 that is not the cleaning target. It has the advantage that problems can be avoided.
Further, the plasma region optimized for the tire tread pattern forming surface having a considerably complicated and various shape provides a uniform ashing effect.

【0016】さらに従来、印加電力量とアッシング進展
度合いとは比例しないことに由来して、電力制御でアッ
シング進展度合いを最適化することが困難であったのに
対し、局所的プラズマの生起は、狭い領域であるからプ
ラズマ密度制御を容易とし、かつプラズマ密度はアッシ
ング進展度合いと比例するのでこの度合いの制御を容易
とする効果をもたらす。この効果は以下に述べる各実施
例に共通する。
Further, conventionally, it has been difficult to optimize the ashing progress degree by power control because the applied power amount and the ashing progress degree are not proportional to each other, whereas the occurrence of local plasma is Since the plasma density is in a narrow region, it is easy to control the plasma density, and since the plasma density is proportional to the ashing progress degree, the control of this degree is facilitated. This effect is common to each embodiment described below.

【0017】別の実施例では図3(a)、(b)に示す
ように、上記一方の電極2を金型7の内側表面の内周面
と同じ向きに湾曲する表面をもつ板状部材として形成
し、この例では高密度プラズマ領域の分布制御に有利で
あり、アッシング処理時間の一層の短縮に寄与する。
In another embodiment, as shown in FIGS. 3 (a) and 3 (b), a plate member having a surface in which the one electrode 2 is curved in the same direction as the inner peripheral surface of the inner surface of the mold 7. In this example, it is advantageous in controlling the distribution of the high-density plasma region and contributes to further shortening of the ashing processing time.

【0018】他の実施例では図4(a)、(b)に示す
ように、上記一方の電極3を円筒状板部材として形成す
ると共に該部材の中心軸線Z3 を金型7の内側表面の中
心軸線Zから距離δだけ偏らせて位置させることでプラ
ズマ分布領域を容易に制御することができる。
In another embodiment, as shown in FIGS. 4 (a) and 4 (b), the one electrode 3 is formed as a cylindrical plate member, and the central axis Z 3 of the member is formed on the inner surface of the mold 7. It is possible to easily control the plasma distribution region by locating the position so as to deviate from the central axis line Z by a distance δ.

【0019】また図3(a)、(b)に示す例のよう
に、電極2の板状部が多数個の穴2hを備えれば、いわ
ゆるホローカソード効果により、同一電力でより一層高
密度のプラズマを生起させることができ、アッシング処
理時間の一層の短縮とコスト低減とにに寄与する。穴の
サイズは、ホローカソード効果が好適におきるものであ
ればよい。圧力1Torr付近では、直径5mm程度、
深さ10mm以上が好ましい。
Further, if the plate-like portion of the electrode 2 is provided with a large number of holes 2h as shown in FIGS. 3 (a) and 3 (b), the so-called hollow cathode effect makes it possible to achieve higher density with the same power. Plasma can be generated, which contributes to further shortening of the ashing processing time and cost reduction. The size of the hole may be any size as long as the hollow cathode effect is suitable. At a pressure of around 1 Torr, a diameter of about 5 mm,
A depth of 10 mm or more is preferable.

【0020】さらに図4(a)、(b)に示す例及び図
3の変形例である図5(a)、(b)に示す例のよう
に、電極3の外周面及び電極4が金型7に近接する表面
に金型7の内側表面の中心軸線Z方向に延びる多数個の
フィン3f、4fを備えれば、互いに隣接するフィン3
f、4fが形成する谷部分のプラズマがより一層高密度
となるので、やはり上記同様、アッシング処理時間の一
層の短縮とコスト低減とにに寄与する。
Further, as in the example shown in FIGS. 4A and 4B and the modified examples of FIGS. 5A and 5B, the outer peripheral surface of the electrode 3 and the electrode 4 are made of gold. If a large number of fins 3f, 4f extending in the central axis Z direction of the inner surface of the die 7 are provided on the surface close to the die 7, the fins 3 adjacent to each other can be provided.
Since the plasma of the troughs formed by f and 4f becomes even higher in density, it also contributes to further shortening of the ashing process time and cost reduction, as in the above.

【0021】また加硫金型7がその内側表面の中心軸線
Z周りに回転可能であれば、金型7を接地側として、電
圧印加側の一方の電極1、2、3、4に対する送電を容
易とすることに役立つ。
If the vulcanization mold 7 is rotatable about the central axis Z of the inner surface of the vulcanization mold 7, power is transmitted to the electrodes 1, 2, 3, 4 on the voltage application side with the mold 7 as the ground side. Helps to be easy.

【0022】[0022]

【実施例】以下、この発明を実施例1〜4に基づきさら
に詳細に説明する。 [実施例1]図1は、加硫金型7の清浄に使用する真空
処理槽10側面の要部断面を、簡略図解した加硫金型7
の断面と合せ示す説明図であり、図2は図1に示す加硫
金型7及び電極1とそれに関わる部分のみを取り出した
平面図である。なお図1に示す加電極1及び硫金型7は
図2のII−II線に沿う断面図である。
The present invention will be described in more detail below with reference to Examples 1 to 4. [Embodiment 1] FIG. 1 is a simplified vulcanization mold 7 showing a cross section of a main part of a side surface of a vacuum processing tank 10 used for cleaning the vulcanization mold 7.
2 is an explanatory view also showing the cross section of FIG. 2, and FIG. 2 is a plan view showing only the vulcanization mold 7 and the electrode 1 shown in FIG. The additional electrode 1 and the sulphate mold 7 shown in FIG. 1 are sectional views taken along the line II-II in FIG.

【0023】図1において、真空処理槽10は下方位置
にて相互に上下に分離可能でかつシール可能な容器上部
11−1と容器下部11−2とを有する容器11を備
え、容器上部11−1側を容器下部11−2に対し上方
に向け着脱自在とし、容器下部11−2に図示しない真
空ポンプに接続させる吸引部12を具備する。加硫金型
7の清浄作業を開始するに先立ちこの真空ポンプを稼働
させて容器11内部の圧力を、例えば10-1〜10-5
orrのいわゆる中真空〜高真空とする。なお図示例の
真空処理槽10は容器下部11−2側を、例えば複数本
の支柱13(図では1本のみを示す)により床面Fsな
どに固定する。
In FIG. 1, the vacuum processing tank 10 comprises a container 11 having a container upper part 11-1 and a container lower part 11-2 which are vertically separable from each other and can be sealed at a lower position. One side is detachably attached to the lower part 11-2 of the container so as to be attachable and detachable, and the lower part 11-2 of the container is provided with a suction part 12 connected to a vacuum pump (not shown). Before starting the cleaning operation of the vulcanization mold 7, the vacuum pump is operated to adjust the pressure inside the container 11 to, for example, 10 −1 to 10 −5 T.
The so-called medium vacuum to high vacuum of orr is used. In the illustrated vacuum processing tank 10, the container lower part 11-2 side is fixed to the floor surface Fs or the like by, for example, a plurality of columns 13 (only one is shown in the figure).

【0024】一方側の電極1を図1に示すように上方か
ら吊下げ状態で容器11内に突出させて配置する。図
1、2が示すように、加硫金型7の内側表面に近い側の
アーム状部材5の先端部に電極1を配置し、アーム状部
材5はこの先端部とは反対側の端部を、電極1の吊り下
げと送電用導電体(図示省略)の収容とを兼ねるパイプ
6に固着する。パイプ6の中心軸線Z1 は加硫金型7内
側表面の中心軸線Zと一致させる。なお図示例では電極
1を電圧印加側、容器11及び加硫金型7を接地側とし
た。
As shown in FIG. 1, the electrode 1 on one side is arranged so as to project from the upper side into the container 11 in a suspended state. As shown in FIGS. 1 and 2, the electrode 1 is arranged at the tip of the arm-like member 5 on the side closer to the inner surface of the vulcanization mold 7, and the arm-like member 5 has an end opposite to the tip. Is fixed to a pipe 6 that suspends the electrode 1 and accommodates a power transmission conductor (not shown). The central axis Z 1 of the pipe 6 is aligned with the central axis Z of the inner surface of the vulcanization mold 7. In the illustrated example, the electrode 1 is on the voltage application side, and the container 11 and the vulcanization mold 7 are on the ground side.

【0025】電力供給用電源は図示を省略したがこの例
では周波数13.56MHzのラジオ波と呼ばれる高周
波電力を両電極1、7に送電する。なお、プラズマは直
流電源、交流電源いずれによっても生成可能であるが、
交流電源がより好ましい。交流における電源周波数は、
数Hz〜数百MHzの高周波が好適に用いられるが、そ
れ以上の周波数(マイクロ波)での放電も可能である。
Although the power supply power supply is not shown in the figure, in this example, high frequency power called radio wave having a frequency of 13.56 MHz is transmitted to both electrodes 1 and 7. Plasma can be generated by either a DC power supply or an AC power supply,
An AC power source is more preferable. The power supply frequency in alternating current is
A high frequency of several Hz to several hundreds of MHz is preferably used, but discharge at a higher frequency (microwave) is also possible.

【0026】電極1の配置位置は図1の上下方向に移動
可能とするか、又は容器上部11−1側で固定するか何
れでも可とし、さらに回転可能とすることができる。図
1が示す例は、電極1を回転させ、加硫金型7を静止さ
せる場合の真空処理槽10であり、これと逆に加硫金型
7を回転させる場合は、図示を省略したが、金型7を据
え置く定盤14及び定盤14を支持するホイールコンベ
ヤ15とを金型7の中心軸線周りに回転させる。
The position of the electrode 1 may be vertically movable in FIG. 1 or may be fixed on the upper side 11-1 of the container, and may be further rotatable. The example shown in FIG. 1 is a vacuum processing tank 10 when the electrode 1 is rotated and the vulcanization mold 7 is stationary. Conversely, when the vulcanization mold 7 is rotated, illustration is omitted. , The platen 14 on which the mold 7 is placed and the wheel conveyor 15 supporting the platen 14 are rotated around the central axis of the mold 7.

【0027】加硫金型7は一体として図示しているが、
この例ではいわゆる割りモールドのうち外周側を分割形
成する多数個、例えば3〜20個のセグメントを、金属
製、例えばスチール製の電気伝導を兼ねる支持搬送用定
盤14上面に、実際の使用時と同じ状態に仮組みしたと
ころを示している。
Although the vulcanization mold 7 is shown as one body,
In this example, a large number, for example, 3 to 20, of the so-called split mold, which is formed on the outer peripheral side, are formed on the upper surface of the supporting and transporting platen 14 which is also made of metal, for example, steel and which also serves as an electric conductor when actually used. The figure shows a temporary assembly in the same state as.

【0028】またタイヤのトレッド部に踏面及び各種溝
やスリットを形成する部分には一般にアルミニウム合金
を適用し、実際に使用する際はこの合金部分をスチール
製保持部材に取付けて上述のセグメントとするものであ
り、この発明では上記合金部分のみの場合とセグメント
の場合との両方を含めて加硫金型と呼ぶ。
Further, an aluminum alloy is generally applied to the tread portion of the tire where treads and various grooves and slits are formed. When actually used, this alloy portion is attached to a steel holding member to form the above-mentioned segment. In the present invention, both the case of only the alloy portion and the case of the segment are referred to as a vulcanization mold.

【0029】加硫金型7が割りモールドである場合は図
示のセグメントモールドの上下に一対のサイドモールド
を組み合わせてモールド本体とする。このモールド本体
を加硫金型7としてプラズマ清浄を施すこともでき、さ
らに円周上に分割面を有する、いわゆる2つ割りモール
ドにもこの発明を適用することができる。
When the vulcanization mold 7 is a split mold, a pair of side molds are combined above and below the illustrated segment mold to form a mold body. This mold body can be used as a vulcanization mold 7 for plasma cleaning, and the present invention can also be applied to a so-called two-piece mold having a divided surface on the circumference.

【0030】図示を省略したが定盤14は、多数個のセ
グメントを仮組みする際又は割りモールド本体や2つ割
りモールドを据え置く際、セグメントの集合体又はこれ
らモールドを所定位置に据えるための機構を備え、さら
に定盤14は、集合体としての加硫金型7又はこれらモ
ールドとしての加硫金型7をパイプ6に対し心出しをす
る機構を備える。後者の機構は加硫金型7及び定盤14
を支持するホイールコンベヤ15に設けた心出し装置と
心出し係合する。
Although not shown in the drawings, the surface plate 14 is a mechanism for setting a group of segments or a set of these molds at a predetermined position when temporarily assembling a large number of segments or when placing a split mold body or a split mold. Furthermore, the surface plate 14 is provided with a mechanism for centering the vulcanization mold 7 as an assembly or the vulcanization mold 7 as these molds with respect to the pipe 6. The latter mechanism is a vulcanization mold 7 and a platen 14.
Centering engagement with a centering device provided on the wheel conveyor 15 supporting the.

【0031】加硫金型7の処理槽10内への導入は、容
器上部11−1や電極1を上方に移動させた状態で、予
め処理槽10の外部で定盤14上に仮組み乃至据え置い
た加硫金型7を定盤14と共に、図示を省略した別の同
様ホイールコンベヤ上で図示位置まで搬送し、同時に心
出しをする。この心出し精度は心ずれ量で望ましくは3
cm以下、より望ましくは5mm以下である。
The vulcanization mold 7 is introduced into the processing tank 10 by preliminarily assembling it on the surface plate 14 outside the processing tank 10 with the container upper part 11-1 and the electrode 1 being moved upward. The stationary vulcanization mold 7 is conveyed together with the surface plate 14 on another similar wheel conveyor (not shown) to the position shown, and at the same time, centering is performed. This centering accuracy is the amount of misalignment, and is preferably 3
cm or less, more preferably 5 mm or less.

【0032】定盤14を所定位置まで搬送した後、ホイ
ールコンベヤ15に設けた固定手段(図示省略)により
定盤14を一時固定する。固定した後に昇降手段18に
連結したロッド17の上端に設けた電気接点16を上昇
させて定盤14と接触させる。ロッド17を介し電気接
点16を電力供給用電源の接地側に接続する。すなわち
この例では加硫金型7を接地側とするも、別の例では電
圧印加側とすることができる。
After the surface plate 14 is conveyed to a predetermined position, the surface plate 14 is temporarily fixed by a fixing means (not shown) provided on the wheel conveyor 15. After fixing, the electrical contact 16 provided on the upper end of the rod 17 connected to the elevating means 18 is raised to make contact with the surface plate 14. The electrical contact 16 is connected to the ground side of the power supply for power supply via the rod 17. That is, in this example, the vulcanization mold 7 is on the ground side, but in another example, it can be on the voltage application side.

【0033】その後容器上部11−1や電極1を下降さ
せて容器下部11−2と接触係合させ、両容器11−
1、11−2を密封状態で固定し、それから図示しない
真空ポンプを稼働させて吸引部12を介し容器11内部
を先に述べた所定の中〜高真空状態とする。次いで反応
ガスを図示しない手段により容器11上方から導き、両
電極1、7間に流入させる。なお空気排出及び反応ガス
の流入と流出の均衡を円滑ならしめるため、好適には吸
引部12の吸引口位置に対応する定盤14位置に複数個
の貫通穴を設ける。なお反応ガスの圧力測定位置は吸引
部12の吸引口及びその近傍を除く位置なら何れの箇所
でもよい。
After that, the container upper part 11-1 and the electrode 1 are lowered and brought into contact with and engage with the container lower part 11-2.
1 and 11-2 are fixed in a hermetically sealed state, and then a vacuum pump (not shown) is operated to bring the inside of the container 11 into the predetermined medium to high vacuum state through the suction unit 12. Then, the reaction gas is guided from above the container 11 by means not shown in the figure and allowed to flow between the electrodes 1 and 7. In order to smooth the balance between the air discharge and the inflow and outflow of the reaction gas, a plurality of through holes are preferably provided at the position of the surface plate 14 corresponding to the position of the suction port of the suction portion 12. The position for measuring the pressure of the reaction gas may be any position except the suction port of the suction unit 12 and its vicinity.

【0034】図1に従う実施例1Aと、電極1を静止さ
せ加硫金型7を回転させる実施例1B例の2例につき、
加硫残滓が多量に付着した加硫7に対し、プラズマによ
るアッシング処理を下記により実施した。加硫金型7の
セグメント数は8個で最大内径が550mmである。電
極1と金型7との最小距離Dは10mmに設定した。反
応ガスはO2 ガス及びCF4 ガスの混合ガスを用い、こ
れらガスの流入量の比をO2 :CF4 =2:1とした。
詳細にはO2 が500SCCM、CF4 が250SCC
Mである。反応ガスの圧力は1.5Torrに保持し、
周波数13.56MHzの高周波電力を8kWで供給
し、処理時間は60分とした。実施例1A、1B共に回
転数は毎分1回転とした。
Two examples, Example 1A according to FIG. 1 and Example 1B in which the electrode 1 is stationary and the vulcanization mold 7 is rotated,
Vulcanization 7 having a large amount of vulcanization residue adhered thereto was subjected to plasma ashing treatment as follows. The vulcanization mold 7 has eight segments and a maximum inner diameter of 550 mm. The minimum distance D between the electrode 1 and the mold 7 was set to 10 mm. A mixed gas of O 2 gas and CF 4 gas was used as the reaction gas, and the ratio of the inflow amounts of these gases was set to O 2 : CF 4 = 2: 1.
Specifically, O 2 is 500 SCCM and CF 4 is 250 SCC.
It is M. The pressure of the reaction gas is kept at 1.5 Torr,
High-frequency power having a frequency of 13.56 MHz was supplied at 8 kW, and the processing time was 60 minutes. In each of Examples 1A and 1B, the rotation speed was 1 rotation per minute.

【0035】これら実施例の効果を確かめるため、実施
例に最も近い方法として、電極は外径が480mm、高
さが220mmの円筒形をなし、円筒の中心軸線を金型
7の中心軸線に揃え、電極及び金型7の両者を共に静止
させた比較例にもプラズマによるアッシング処理を施し
た。反応ガス、供給電力及び処理時間の諸条件は全て実
施例に合せた。
In order to confirm the effects of these embodiments, as a method closest to the embodiments, the electrode has a cylindrical shape with an outer diameter of 480 mm and a height of 220 mm, and the center axis of the cylinder is aligned with the center axis of the mold 7. The plasma ashing process was also applied to the comparative example in which both the electrode and the mold 7 were stationary. The conditions of the reaction gas, the power supply, and the processing time were all adjusted to the examples.

【0036】処理後の加硫金型7の内周面を観察した結
果、実施例1A、1B共に白色の外観を呈していたのに
対し、比較例は灰色を呈していた。そこで実施例1A、
1Bを水洗したところ白色物質は簡単に流れ落ち、新品
同様な金型の金属地肌があらわれた。念のため白色物質
を分析したところ金属に対し粘着性をもたない無機金属
塩のZn SO4 、Zn 2 とわかった。これに対し比較
例は加硫残滓のうちの有機物が相当量残留しているため
灰色を呈していることが確かめられた。
As a result of observing the inner peripheral surface of the vulcanization mold 7 after the treatment, both Examples 1A and 1B had a white appearance, while the Comparative Example had a gray color. Therefore, Example 1A,
When 1B was washed with water, the white substance easily flowed off, and the metallic surface of the mold like a new one appeared. As a precaution, when the white substance was analyzed, it was found to be inorganic metal salts Z n SO 4 and Z n F 2 which were not adhesive to metals. On the other hand, in the comparative example, it was confirmed that the organic matter in the vulcanization residue remained in a considerable amount and thus was gray.

【0037】さらに処理直後の加硫金型の温度分布を測
定したところ、実施例1A、1Bは130〜135℃の
好適範囲内に収まっていたのに対し、比較例は70〜2
10℃の範囲内にあり、特に高温度(200℃以上)は
加硫金型に著しい悪影響を及ぼすことがわかった。
Further, when the temperature distribution of the vulcanizing mold immediately after the treatment was measured, it was found that Examples 1A and 1B were within a suitable range of 130 to 135 ° C., whereas Comparative Examples were 70 to 2
It was found to be in the range of 10 ° C., and particularly high temperature (200 ° C. or higher) has a significant adverse effect on the vulcanization mold.

【0038】[実施例2]実施例1の真空処理槽10を
適用し、電極2及び加硫金型7は、その平面図を図3
(a)に、図3(a)のIII −III 線に沿う断面図を図
3(b)にそれぞれ示すものを用いた。電極2は金型7
の内側表面の内周面と同じ向きに湾曲する表面をもつ板
状部材からなり、パイプ6の先端に取付けた連結部材5
aの先端に電極2を固着する。電極2の板状部材は多数
個の貫通穴2hを備え、これら穴2hは縦方向(線Z2
方向)で多数列の縦並び配置とし、湾曲する横方向には
千鳥配置とするのが好適である。
[Embodiment 2] The vacuum processing tank 10 of Embodiment 1 is applied, and the electrode 2 and the vulcanization mold 7 are shown in plan view in FIG.
In FIG. 3A, a cross-sectional view taken along line III-III of FIG. 3A is shown in FIG. Electrode 2 is mold 7
The connecting member 5 is a plate-shaped member having a curved surface in the same direction as the inner peripheral surface of the inner surface of the pipe, and is attached to the tip of the pipe 6.
The electrode 2 is fixed to the tip of a. The plate-shaped member of the electrode 2 has a large number of through holes 2h, and these holes 2h are arranged in the vertical direction (line Z 2
It is preferable to arrange a large number of columns in a vertical direction and to arrange in a zigzag pattern in the curved horizontal direction.

【0039】金型7の内周面と電極2との間の最短距離
Dは図のIII −III 線を含む板状部材の湾曲面の縦一線
上にあっても、また湾曲面に沿って一様であってもよ
い。パイプ6の中心軸線Z2 は金型7の中心軸線Zと一
致させる。この実施例でも電極2を静止させ、金型7を
回転させること、これとは逆に金型7を静止させ、電極
2を回転させることの何れも可能である。また両電極
2、7を互いに反対方向に回転させることもできる。
The shortest distance D between the inner peripheral surface of the mold 7 and the electrode 2 is on the vertical line of the curved surface of the plate-shaped member including the line III-III in the figure, or along the curved surface. It may be uniform. The central axis Z 2 of the pipe 6 is aligned with the central axis Z of the mold 7. Also in this embodiment, it is possible to make the electrode 2 stand still and rotate the mold 7, and conversely, make the mold 7 stand still and rotate the electrode 2. It is also possible to rotate both electrodes 2, 7 in opposite directions.

【0040】実施例1A、1Bと同じ処理条件にて、金
型7静止、電極2回転の実施例2A及び電極2静止、金
型7回転の実施例2Bにつきアッシング処理を施した。
比較例は実施例1の場合と同じ方法とした。結果は実施
例1A、1Bとほぼ同様な効果が得られた。
Under the same treatment conditions as in Examples 1A and 1B, the ashing treatment was carried out for Example 2A in which the mold 7 was stationary and the electrode was rotated twice and Example 2B in which the electrode 2 was stationary and the mold was rotated 7 times.
The same method as in Example 1 was used for the comparative example. As a result, almost the same effect as in Examples 1A and 1B was obtained.

【0041】[実施例3]実施例1の真空処理槽10を
適用し、電極3及び加硫金型7は、その平面図を図4
(a)に、図4(a)のIV−IV線に沿う断面図を図4
(b)にそれぞれ示すものを用いた。電極3は外周面に
多数個のフィン3fを配置した円筒状部材からなり、パ
イプ6aの先端に取付けた連結部材5bの先端に電極2
を固着する。電極3の多数個のフィン3fはパイプ6a
の中心軸線Z3 方向に延び、円筒状部材の外周に沿って
ほぼ等間隔に配置するのが好適である。
[Embodiment 3] The vacuum treatment tank 10 of Embodiment 1 is applied, and the electrode 3 and the vulcanization mold 7 are shown in plan view in FIG.
FIG. 4A is a sectional view taken along line IV-IV in FIG.
Those shown in (b) were used. The electrode 3 is composed of a cylindrical member having a large number of fins 3f arranged on its outer peripheral surface, and the electrode 2 is attached to the tip of a connecting member 5b attached to the tip of a pipe 6a.
To fix. The multiple fins 3f of the electrode 3 are pipes 6a
It is preferable to extend in the direction of the central axis Z 3 and be arranged at substantially equal intervals along the outer circumference of the cylindrical member.

【0042】パイプ6aの中心軸線Z3 は金型7の中心
軸線Zから距離δだけ偏らせて位置させる。金型7の内
周面と電極3との間の最短距離Dは、両中心軸線Z、Z
3 を含む平面上乃至その近傍のフィン3f先端にて定め
る。この実施例でも電極3を静止させ、金型7を回転さ
せること、これとは逆に金型7を静止させ、電極3を回
転させることの何れも可能である。また両電極3、7を
互いに反対方向に回転させることもできる。なお電極3
を静止させる場合、フィン3fは図4(a)で見て左半
部分を取り除くこともできる。
The center axis Z 3 of the pipe 6a is positioned so as to be offset from the center axis Z of the mold 7 by a distance δ. The shortest distance D between the inner peripheral surface of the mold 7 and the electrode 3 is determined by the two central axis lines Z, Z.
It is determined by the tip of the fin 3f on or near a plane including 3 . Also in this embodiment, it is possible to make the electrode 3 stand still and rotate the mold 7, and conversely, make the mold 7 stand still and rotate the electrode 3. It is also possible to rotate both electrodes 3, 7 in opposite directions. Note that electrode 3
4A, the left half part of the fin 3f can be removed as seen in FIG. 4A.

【0043】実施例1A、1Bと同じ処理条件にて、金
型7静止、電極3回転の実施例3A及び電極3静止、金
型7回転の実施例3Bにつきアッシング処理を施した。
比較例は実施例1の場合と同じ方法とした。結果はやは
り実施例1A、1Bとほぼ同様な効果が得られた。
Under the same treatment conditions as in Examples 1A and 1B, the ashing treatment was carried out for Example 3A in which the mold 7 was stationary and the electrode was rotated 3 times and Example 3B in which the electrode 3 was stationary and the mold was rotated 7 times.
The same method as in Example 1 was used for the comparative example. As a result, an effect similar to that of Examples 1A and 1B was obtained.

【0044】[実施例4]実施例1の真空処理槽10を
適用し、電極4及び加硫金型7は、その平面図を図5
(a)に、図5(a)のV −V 線に沿う断面図を図5
(b)にそれぞれ示すものを用いた。実施例4は実施例
2の変形例であり、湾曲する板状部材の電極に多数個の
貫通穴を配置するのに代え、板状部材外周面に実施例3
と同様なフィン4fを配置したものを電極4とする。も
ちろんパイプ6の中心軸線Z4 は軸線Zと一致する。
[Embodiment 4] The vacuum treatment tank 10 of Embodiment 1 is applied, and the electrode 4 and the vulcanization mold 7 are shown in plan view in FIG.
FIG. 5A is a sectional view taken along line V-V of FIG.
Those shown in (b) were used. The fourth embodiment is a modification of the second embodiment, and instead of arranging a large number of through holes in the electrode of the curved plate-shaped member, the third embodiment is provided on the outer peripheral surface of the plate-shaped member.
The electrode 4 is formed by arranging the fins 4f similar to the above. Of course, the central axis Z 4 of the pipe 6 coincides with the axis Z.

【0045】実施例1A、1Bと同じ処理条件にて、金
型7静止、電極4回転の実施例4A及び電極4静止、金
型7回転の実施例4Bにつきアッシング処理を施した。
比較例は実施例1の場合と同じ方法とした。結果はやは
り実施例1A、1Bとほぼ同様な効果が得られた。
Under the same processing conditions as in Examples 1A and 1B, the ashing treatment was performed for Example 4A in which the mold 7 was stationary and the electrode was rotated 4 times and Example 4B in which the electrode 4 was stationary and the mold was rotated 7 times.
The same method as in Example 1 was used for the comparative example. As a result, an effect similar to that of Examples 1A and 1B was obtained.

【0046】[0046]

【発明の効果】この発明によれば、エラストマの繰返し
加硫成形により金型表面に形成されたエラストマ残滓
を、加硫金型に損傷を与えるなどの不利を伴うことな
く、また加硫金型の型形成面に制約を加えることなく、
低コストで、かつ短い処理時間で均一に有効にアッシン
グすることが可能な加硫金型の清浄方法を提供すること
ができる。
According to the present invention, the elastomer residue formed on the surface of the mold by the repeated vulcanization molding of the elastomer is not accompanied by a disadvantage such as damage to the vulcanization mold and the vulcanization mold. Without any restrictions on the mold forming surface of
It is possible to provide a method for cleaning a vulcanization mold that can ash uniformly and effectively at low cost in a short processing time.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明による一実施例の真空処理槽側面と清
浄に供する加硫金型側面との断面図である。
FIG. 1 is a cross-sectional view of a side surface of a vacuum processing tank and a side surface of a vulcanizing mold used for cleaning according to an embodiment of the present invention.

【図2】図1に示す電極とその保持部材及び加硫金型の
平面図である。
FIG. 2 is a plan view of the electrode shown in FIG. 1, a holding member thereof, and a vulcanization mold.

【図3】この発明による他の実施例の電極とその保持部
材及び加硫金型の平面図と断面図である。
3A and 3B are a plan view and a sectional view of an electrode, a holding member thereof, and a vulcanization mold of another embodiment according to the present invention.

【図4】この発明による別の実施例の電極とその保持部
材及び加硫金型の平面図と断面図である。
FIG. 4 is a plan view and a cross-sectional view of an electrode, a holding member thereof and a vulcanization mold according to another embodiment of the present invention.

【図5】この発明によるさらに別の実施例の電極とその
保持部材及び加硫金型の平面図と断面図である。
5A and 5B are a plan view and a sectional view of an electrode, a holding member therefor, and a vulcanization mold according to still another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1、2、3、4 一方の電極 2h 穴 3f、4f フィン 5 アーム状部材 5a、5b 連結部材 6 パイプ 7 加硫金型 10 真空処理槽 11 容器 12 吸引部 13 支柱 14 定盤 15 ホイールコンベヤ 16 電気接点 17 ロッド 18 昇降手段 1, 2, 3, 4 One electrode 2h Hole 3f, 4f Fin 5 Arm-shaped member 5a, 5b Connection member 6 Pipe 7 Vulcanization mold 10 Vacuum treatment tank 11 Container 12 Suction part 13 Strut 14 Surface plate 15 Wheel conveyor 16 Electrical contact 17 Rod 18 Lifting means

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 真空処理槽内の希薄反応ガスに生起させ
たプラズマを加硫金型に作用させ、エラストマの繰返し
加硫成形により金型内側表面に形成されたエラストマ残
滓をアッシングして除去するにあたり、 一方の電極を処理槽内に突出させ、突出した電極の周囲
に環状加硫金型を他方の電極として位置させると共に、
上記一方の電極表面を金型内側表面の近傍位置に偏らせ
て配置して、両電極に対する電力印加により互いに近接
する両電極表面相互間で局所に高密度プラズマを発生さ
せ、併せて両電極のうち少なくとも片方側の電極は上記
偏りを保持して回転可能とし、この回転動作に伴い局所
の高密度プラズマを金型内側表面の全周にわたり作用さ
せることを特徴とする加硫金型の清浄方法。
1. A vulcanization mold is acted on by plasma generated in a dilute reaction gas in a vacuum processing tank, and the elastomer residue formed on the inner surface of the mold by vulcanization molding of the elastomer is removed by ashing. In doing so, one of the electrodes is projected into the treatment tank, and the annular vulcanizing mold is positioned as the other electrode around the projected electrode,
The above-mentioned one electrode surface is arranged so as to be biased to a position near the inner surface of the mold, and a high-density plasma is locally generated between both electrode surfaces that are close to each other by applying electric power to both electrodes. A method for cleaning a vulcanization mold, characterized in that at least one of the electrodes is rotatable while maintaining the above-mentioned deviation, and a local high-density plasma is caused to act over the entire circumference of the inner surface of the mold in accordance with this rotation operation. .
【請求項2】 上記一方の電極をアーム状部材の先端部
に配置し、該部材の先端部と反対側端部を金型内側表面
の中心軸線が通る請求項1に記載した清浄方法。
2. The cleaning method according to claim 1, wherein the one electrode is arranged at the tip of the arm member, and the central axis of the inner surface of the mold passes through the end opposite to the tip of the member.
【請求項3】 上記一方の電極が、金型内側表面の内周
面と同じ向きに湾曲する表面をもつ板状部材からなる請
求項2に記載した清浄方法。
3. The cleaning method according to claim 2, wherein the one electrode is a plate-shaped member having a surface that curves in the same direction as the inner peripheral surface of the inner surface of the mold.
【請求項4】 上記一方の電極が円筒状板部材からな
り、該部材の中心軸線は金型内側表面の中心軸線から偏
って位置する請求項1に記載した清浄方法。
4. The cleaning method according to claim 1, wherein the one electrode is made of a cylindrical plate member, and the central axis of the member is located deviated from the central axis of the inner surface of the mold.
【請求項5】 上記一方の電極が多数個の穴を備える請
求項3又は4に記載した清浄方法。
5. The cleaning method according to claim 3, wherein the one electrode has a plurality of holes.
【請求項6】 上記一方の電極が、金型に向く表面に多
数個のフィンを備える請求項2〜4に記載した清浄方
法。
6. The cleaning method according to claim 2, wherein the one electrode has a large number of fins on the surface facing the mold.
【請求項7】 加硫金型がその内側表面の中心軸線周り
に回転可能である請求項1〜6に記載した清浄方法。
7. The cleaning method according to claim 1, wherein the vulcanizing mold is rotatable about the central axis of the inner surface thereof.
【請求項8】 上記一方の電極が、金型内側表面と所定
距離を保持して回転可能である請求項1〜6に記載した
清浄方法。
8. The cleaning method according to claim 1, wherein the one electrode is rotatable while maintaining a predetermined distance from the inner surface of the mold.
JP10348195A 1995-04-27 1995-04-27 Cleaning method for vulcanizing mold Expired - Fee Related JP3277093B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10348195A JP3277093B2 (en) 1995-04-27 1995-04-27 Cleaning method for vulcanizing mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10348195A JP3277093B2 (en) 1995-04-27 1995-04-27 Cleaning method for vulcanizing mold

Publications (2)

Publication Number Publication Date
JPH08294921A true JPH08294921A (en) 1996-11-12
JP3277093B2 JP3277093B2 (en) 2002-04-22

Family

ID=14355208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10348195A Expired - Fee Related JP3277093B2 (en) 1995-04-27 1995-04-27 Cleaning method for vulcanizing mold

Country Status (1)

Country Link
JP (1) JP3277093B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112728707A (en) * 2020-12-17 2021-04-30 杭州视亨光电有限公司 Miniature plasma dynamic air purifier

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63211549A (en) * 1987-02-25 1988-09-02 Hitachi Ltd Electric discharge cleaning device
JPH06220669A (en) * 1993-01-28 1994-08-09 Daido Steel Co Ltd Plasma washing device
JPH06285868A (en) * 1993-03-30 1994-10-11 Bridgestone Corp Cleaning method of vulcanizing mold

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63211549A (en) * 1987-02-25 1988-09-02 Hitachi Ltd Electric discharge cleaning device
JPH06220669A (en) * 1993-01-28 1994-08-09 Daido Steel Co Ltd Plasma washing device
JPH06285868A (en) * 1993-03-30 1994-10-11 Bridgestone Corp Cleaning method of vulcanizing mold

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112728707A (en) * 2020-12-17 2021-04-30 杭州视亨光电有限公司 Miniature plasma dynamic air purifier

Also Published As

Publication number Publication date
JP3277093B2 (en) 2002-04-22

Similar Documents

Publication Publication Date Title
USRE39969E1 (en) Processing system
US5529636A (en) Method of cleaning a curing mold by oxidation reaction under plasma conditions
JPH11317397A (en) Processing device
EP0740989B1 (en) Method of cleaning vulcanizing mold
CN101232984A (en) Method and equipment for cleaning tire vulcanization die
JPH08294921A (en) Cleaning method for vulcanizing mold
KR20070066934A (en) Plasma etching chamber
US20020066727A1 (en) Chuck plate of ashing equipment for fabricating semiconductor devices and chuck assembly comprising the same
US20080128088A1 (en) Etching apparatus for edges of substrate
US5855728A (en) Method for cleaning vulcanization mold
JP3623590B2 (en) Vulcanizing mold cleaning equipment
JPH08244041A (en) Washing of vulcanizing mold
JPH1119945A (en) Method for cleaning vulcanization mold
JPH08216164A (en) Cleaning of vulcanizing mold
JP3277094B2 (en) Cleaning method for vulcanizing mold
JP3574256B2 (en) Cleaning method for vulcanizing mold
JP3277095B2 (en) Cleaning method for vulcanizing mold
EP0925896B1 (en) Vulcanization die cleaning method and apparatus
JPH08207056A (en) Plasma forming apparatus for washing vulcanizing mold and electrode thereof
JP3727705B2 (en) Microwave plasma generator
JPH11188741A (en) Method and apparatus for cleaning vulcanizing mold
JPH06283484A (en) Cleaning method of plasma device
JPH09169034A (en) Method and apparatus for cleaning vulcanizing mold
JP2024014204A (en) Cleaning method for tire vulcanization mold
JPS625818A (en) Regenerated tire vulcanizing device

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees