JPH082933A - Chamfering of glass substrate - Google Patents

Chamfering of glass substrate

Info

Publication number
JPH082933A
JPH082933A JP15948694A JP15948694A JPH082933A JP H082933 A JPH082933 A JP H082933A JP 15948694 A JP15948694 A JP 15948694A JP 15948694 A JP15948694 A JP 15948694A JP H082933 A JPH082933 A JP H082933A
Authority
JP
Japan
Prior art keywords
glass substrate
glass
substrate
chamfering
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15948694A
Other languages
Japanese (ja)
Inventor
Kazufumi Nakano
和史 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Techno Glass Co Ltd
Original Assignee
Toshiba Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Glass Co Ltd filed Critical Toshiba Glass Co Ltd
Priority to JP15948694A priority Critical patent/JPH082933A/en
Publication of JPH082933A publication Critical patent/JPH082933A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B29/00Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
    • C03B29/02Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a discontinuous way
    • C03B29/025Glass sheets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Abstract

PURPOSE:To enable the chamfering of a number of small-sized glass substrates over the whole circumference of each substrate at the same time by placing glass substrates between upper and lower boards and heating for a prescribed period at a temperature lower than the melting point of the glass. CONSTITUTION:Glass substrates 1 are placed on a flat lower board 2 interposing a definite space between the substrates. An upper board 3 having a flat contacting face is placed on the glass substrates 1 to sandwich the substrates between the boards. The upper and lower boards 2, 3 are preferably made of graphite. As necessary, a spacer having a thickness equal to that of the glass substrate is placed to avoid the application of excessive load on the glass substrate 1 by the upper board 3. The upper and lower boards 2, 3 holding the glass substrates 1 are put into an electric furnace and maintained at a temperature between the yield point and the softening point of the glass in a neutral or reducing atmosphere for a prescribed period (e.g. 60min) to effect the chamfering of the substrate by softening and deforming the edge of the glass substrate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ガラス基板の端面部を
加熱により軟化させて滑らかな丸みをもった面取部を形
成するガラス基板の面取方法に関し、特に電子光学部品
用フィルタ等の無塵・高精度を要求される製品に適した
ガラス基板の面取方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for chamfering a glass substrate, in which an end face portion of the glass substrate is softened by heating to form a chamfered portion having a smooth roundness. The present invention relates to a glass substrate chamfering method suitable for products requiring dust-free and high accuracy.

【0002】[0002]

【従来の技術】一般にガラスは切断面が非常にシャープ
な形状を示す。普通、電子光学部品に使用されるガラス
製品は、ディスプレー関係では板ガラスから、小型のフ
ィルタなどではガラス塊からスライスまたはスクライビ
ングされて所定の大きさに形成されるため、切断後の端
面部は鋭角なエッジをもっている。しかし、そのままの
状態では、取扱い上危険であり、端面部の傷からクラッ
クを生じたり欠けたガラス破片により表面に新たな傷を
付けたりして製品を不良化してしまう問題がある。この
ため従来は、芯取機によって端面部(四角いガラス基板
の場合、四隅および八稜部)の面取を行っていた。芯取
機における問題点は、一度に一個ずつしか加工ができな
いため、時間あたりの処理能力が低く、小型の電子光学
部品では極めて非能率的であること、また芯取機はダイ
ヤモンドホイール等の研削砥石によって機械的に研削を
行うため、研削屑が発生し基板の洗浄工程が必要になる
こと、さらには研削砥石では除去しきれない微細なクラ
ックが残存したり研削抵抗により新たなクラックが形成
されたりして後工程や搬送途中での欠けの発生、そこか
ら生じた二次的なガラス粉による基板表面への付着や傷
付きを起こすこと、といった問題が除去しきれない点で
あった。特に最近の電子光学用ガラス部品ではμmオー
ダーの欠陥が問題とされるため、機械的加工では限界が
あった。
2. Description of the Related Art Generally, glass has a very sharp cut surface. Normally, glass products used for electro-optical parts are sliced or scribed from flat glass for displays and small pieces of glass such as small filters to have a predetermined size, so that the end face after cutting has an acute angle. Has an edge. However, in the state as it is, it is dangerous in handling, and there is a problem that a crack is generated from a scratch on the end face portion or a new scratch is given to the surface due to a broken glass fragment and the product is deteriorated. For this reason, conventionally, a centering machine has chamfered the end face portions (four corners and eight ridges in the case of a square glass substrate). The problem with the centering machine is that it can process only one piece at a time, so the processing capacity per hour is low, and it is extremely inefficient for small electro-optical parts. Since grinding is performed mechanically with a grindstone, grinding chips are generated and a substrate cleaning process is required.Furthermore, fine cracks that cannot be completely removed with a grinding grindstone or new cracks are formed due to grinding resistance. However, problems such as the occurrence of chipping during the post-process and the middle of transportation, and the adhesion and scratching of the substrate surface due to secondary glass powder generated from it are not completely eliminated. In particular, in recent glass components for electron optics, defects of the order of μm are a problem, so there is a limit in mechanical processing.

【0003】機械的加工手段を用いないガラス基板の面
取方法としては、特開昭54-25 号公報、特開昭57-34049
号公報に記載されたエッチングによる方法、特公昭56-1
3659号公報、特開平2-48423 号公報に開示のようなガラ
スの加熱による軟化を利用する方法が知られている。
As a method for chamfering a glass substrate without using mechanical processing means, Japanese Patent Laid-Open Nos. 54-25 and 57-34049 are known.
Etching method described in Japanese Patent Publication No. 56-1
There is known a method utilizing softening by heating glass as disclosed in Japanese Patent No. 3659 and Japanese Patent Laid-Open No. 2-48423.

【0004】[0004]

【発明が解決しようとする課題】上記特開昭54-25 号公
報、特開昭57-34049号公報に記載されたエッチングによ
る面取方法では、面取による研削屑や二次的なクラック
の発生はなくなるものの、エッチング液の洗浄・乾燥工
程が必要であり、効率的とはいい難い面がある。またエ
ッチング液の濃度管理が難しく、一定品質の製品を安定
的に提供しにくい欠点がある。
In the chamfering method by etching described in the above-mentioned JP-A-54-25 and JP-A-57-34049, the grinding scraps and secondary cracks caused by the chamfering are not generated. Although it does not occur, it is difficult to say that it is efficient because it requires cleaning and drying steps of the etching solution. Further, it is difficult to control the concentration of the etching solution, and it is difficult to stably provide products of constant quality.

【0005】上記特公昭56-13659号公報に開示されたガ
ラス板の端面処理方法は、ガラス板端面の両側端に電極
を当接して通電し、端面の温度を流動温度域まで高める
ことによって端面を円弧状に形成し、同時にガラス板全
面を加熱して部分的な温度差による破壊を防止するもの
である。この方法によれば、端面のみを局所的に加熱軟
化させる必要から電極間の短絡を考えると、特公昭56-1
3659号公報の実施例のごとく1辺ごとの処理とならざる
を得ないと考えられ、4辺すべての面取を行うには同じ
操作を4回繰り返さなければならない欠点があり、また
円形の基板には適用できない。
The method for treating an end surface of a glass plate disclosed in Japanese Patent Publication No. 56-13659 mentioned above is such that electrodes are brought into contact with both ends of the end surface of the glass plate to energize them to increase the temperature of the end surface to a flow temperature range. Is formed in an arc shape, and at the same time, the entire surface of the glass plate is heated to prevent destruction due to a partial temperature difference. According to this method, it is necessary to locally heat and soften only the end face.
It is considered that the processing must be performed for each side as in the embodiment of Japanese Patent No. 3659, and the same operation must be repeated four times to chamfer all four sides, and a circular substrate Not applicable to.

【0006】電子光学用ガラス部品、たとえば、CCD
エリアセンサ用カバーガラス等では、CCD素子にガラ
スが近接配置されるため、μmオーダーの傷、塵、汚れ
が欠陥とされ、光学的な歪みも許されないことから、面
取加工後に光学機能面の精密研磨を行っている。研磨の
際にガラス基板の欠けを生じさせないためには、全端面
の面取を行っておく必要がある。またCCDエリアセン
サ用カバーガラスは大きさが30mm角以下、多くは1
0mm角以下であるので、1個ずつに電極を当接させる
上記方法ではコスト面、能率面において問題が多い。さ
らに、特公昭56-13659号公報の開示内容では、ガラス板
は架台上に載置されているが上面側は大気に接してお
り、加熱後の徐冷速度の差によりガラス板に反りを生ず
る懸念がある。
Glass parts for electron optics, for example CCD
In the area sensor cover glass and the like, the glass is placed close to the CCD element, so that flaws, dust, and dirt of the order of μm are defects, and optical distortion is not allowed. Performs precision polishing. In order to prevent chipping of the glass substrate during polishing, it is necessary to chamfer all the end faces. The cover glass for the CCD area sensor is 30 mm square or less, and most of them are 1
Since the size is 0 mm square or less, there are many problems in terms of cost and efficiency in the above method of contacting the electrodes one by one. Further, in the disclosure of Japanese Patent Publication No. 56-13659, the glass plate is placed on a frame, but the upper surface is in contact with the atmosphere, and the glass plate is warped due to the difference in the slow cooling rate after heating. I have a concern.

【0007】次に、上記特開平2-48423 号公報に開示の
面取り方法は、ガラス板の稜線部を含む付近にレーザ光
を照射し、稜線部を局部的に加熱・溶融させ、自然冷却
によりR形状に固化させるものである。また稜線部付近
にレーザ光を吸収する特性を持った物質を塗布して加熱
軟化を容易にすることについても開示されている。この
方法は、局部加熱後自然冷却させているため、ガラスに
歪みが残り後工程で割れる虞がある。またガラスによっ
てはレーザ光をほとんど透過または反射してしまうもの
もあるため、レーザ光を吸収する特性を持った物質を塗
布しなければならず、工程増加をまねく。特開平2-4842
3 号公報の記載からは、稜線部のみの面取を意図してい
るものと考えられ、ガラス板端面の中央部に未加工部分
が残存する可能性がある。端面の未加工部分にバンドソ
ーなどの切断跡が残っていた場合、その凹凸に研磨時の
研磨屑あるいは研磨材が入り込み、搬送またはハンドリ
ング時の衝撃などによってこれら研磨屑などが研磨面に
付着すると、上述のように電子光学用ガラス部品では使
用できなくなるものもあるので好ましくない。
Next, according to the chamfering method disclosed in the above-mentioned Japanese Patent Laid-Open No. 2-48423, laser light is irradiated to the vicinity of the glass plate including the ridge line portion, the ridge line portion is locally heated and melted, and naturally cooled. It solidifies into an R shape. It is also disclosed that a material having a property of absorbing laser light is applied to the vicinity of the ridge to facilitate heating and softening. In this method, since the glass is naturally heated and then naturally cooled, there is a risk that the glass will be distorted and broken in the subsequent step. In addition, since some glass transmits or reflects most of the laser light, it is necessary to apply a substance having a property of absorbing the laser light, which leads to an increase in the number of steps. JP 2-4842
From the description in Publication No. 3, it is considered that only the ridge is intended to be chamfered, and there is a possibility that an unprocessed part remains in the center of the glass plate end face. If a cutting mark such as a band saw is left on the unprocessed part of the end surface, polishing scraps or abrasives during polishing enter the unevenness, and if these polishing scraps adhere to the polishing surface due to impact during transportation or handling, As described above, some glass components for electron optics cannot be used, which is not preferable.

【0008】本発明はこのような事情を考慮してなされ
たもので、比較的小型のガラス基板を多数同時にしかも
それぞれの全周にわたって面取可能とする方法を提供す
ることを目的とする。また基板端面に切断跡を残さず端
面全体を平滑化できる方法を提供する。さらにガラス基
板に欠け、傷、そりを生ずることなく、外径公差を損な
わないで面取を行える方法を提供することを目的とす
る。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a method capable of chamfering a plurality of relatively small glass substrates simultaneously and over the entire circumference thereof. Also provided is a method capable of smoothing the entire end face without leaving a cutting mark on the end face of the substrate. It is another object of the present invention to provide a method for chamfering a glass substrate without chipping, scratching, or warping, without impairing the outer diameter tolerance.

【0009】[0009]

【課題を解決するための手段】本発明は上記目的を達成
するために、ガラスの加熱による軟化を利用し、所定条
件下でガラス基板を加熱してその端面部のみを軟化さ
せ、これによって面取を行うものである。
In order to achieve the above object, the present invention utilizes softening of glass by heating and heats a glass substrate under a predetermined condition to soften only the end face portion of the glass substrate. It is what you take.

【0010】すなわち本発明は、ガラス基板との当接面
が平坦な上下の定盤間にガラス基板を挟み、ガラスの軟
化点以下の温度に加熱し一定時間保持することによって
ガラス基板の端面部を軟化変形させる方法である。この
際の加熱温度はガラスの屈伏点以上軟化点以下とするこ
とが好ましい。
That is, according to the present invention, the glass substrate is sandwiched between the upper and lower surface plates having flat contact surfaces with the glass substrate, and the glass substrate is heated to a temperature equal to or lower than the softening point of the glass and held for a certain period of time, whereby the end surface portion of the glass substrate is Is a method of softening and deforming. It is preferable that the heating temperature at this time is not less than the yield point of the glass and not more than the softening point of the glass.

【0011】より具体的には、平坦な下定盤上にガラス
基板を載置し、その上に上定盤を載せて加熱保持する。
上下の定盤は同一の材質であることが好ましく、材質と
してはグラファイトを用いることが望ましい。
More specifically, a glass substrate is placed on a flat lower platen, and an upper platen is placed on the glass substrate and heated and held.
The upper and lower surface plates are preferably made of the same material, and graphite is preferably used as the material.

【0012】さらに本発明は、上下の定盤間にガラス基
板と等しい厚さのスペーサを配設して加熱保持すること
を特徴とする。
Further, the present invention is characterized in that a spacer having a thickness equal to that of the glass substrate is arranged between the upper and lower surface plates and is heated and held.

【0013】[0013]

【作用】上記構成のように、ガラス基板を軟化点以下の
温度に一定時間保持することによって、ガラス基板の端
面部は徐々に軟化し、表面張力によりその表面が滑らか
なR形状となる。このとき、ガラス基板をガラス基板と
の当接面が平坦な上下の定盤間に挟んでおくことによ
り、基板の板面は定盤に保護されるとともに定盤に接し
ていない端面部が熱を受けやすくなり、かつ軟化による
端面部の変形を妨げない。ガラス基板を軟化変形させる
ためには、屈伏点以上の温度が必要であり、加熱温度は
ガラスの屈伏点以上軟化点以下とする。なお、軟化点
は、ガラスの粘度が107.6 ポイズになるときの温度で
あり、この温度以上でガラスは容易に軟化する。したが
って加熱温度を軟化点より高い温度とすれば、端面部の
面取も短時間で行うことができるが、その反面、急激な
軟化は基板の変形をまねきやすいため、加熱処理後の外
径ばらつきが大きくなり好ましくない。したがって、多
少処理時間が長くなるとしても、本発明では一度に多数
の基板を処理できること、および良品率が高まることを
考慮すれば、総合的な効率は高められるので、加熱温度
はガラスの屈伏点以上軟化点以下とすることが好まし
い。
By holding the glass substrate at a temperature equal to or lower than the softening point for a certain period of time as in the above structure, the end face portion of the glass substrate is gradually softened, and the surface becomes a smooth R shape due to surface tension. At this time, by sandwiching the glass substrate between the upper and lower surface plates having flat contact surfaces with the glass substrate, the plate surface of the substrate is protected by the surface plate and the end surface portion not in contact with the surface plate is heated. It does not easily interfere with the deformation of the end surface due to softening. In order to soften and deform the glass substrate, a temperature above the sag point is required, and the heating temperature is set above the sag point and below the softening point of the glass. The softening point is the temperature when the viscosity of the glass reaches 10 7.6 poise, and the glass is easily softened at this temperature or higher. Therefore, if the heating temperature is higher than the softening point, the chamfering of the end face can be performed in a short time, but on the other hand, rapid softening easily causes the deformation of the substrate, so that the outer diameter variation after the heat treatment is large. Undesirably increases. Therefore, even if the processing time is somewhat longer, the overall efficiency can be increased in consideration of the fact that a large number of substrates can be processed at one time in the present invention and the yield rate is increased. The softening point is preferably not higher than the softening point.

【0014】具体的方法としては、上記のように平坦な
下定盤上にガラス基板を載置し、その上に上定盤を載せ
て電気炉等の加熱炉内に収容して加熱する方法が簡単で
ある。言うまでもなく、定盤は水平を保って行うことが
好ましい。ガラス基板は2枚の定盤に挟まれているの
で、必ずしも水平状態でなければならないことはない
が、軟化変形時の重力の影響を均等にし、ガラス基板の
滑動を防止できる点で水平が好ましい。
As a specific method, there is a method in which the glass substrate is placed on the flat lower surface plate as described above, the upper surface plate is placed on the glass substrate, and the glass substrate is housed in a heating furnace such as an electric furnace and heated. It's easy. Needless to say, it is preferable to keep the surface plate horizontal. Since the glass substrate is sandwiched between two surface plates, it does not necessarily have to be in a horizontal state, but it is preferably horizontal because the influence of gravity at the time of softening deformation can be made uniform and the glass substrate can be prevented from sliding. .

【0015】定盤は、ガラス基板を固定するものではな
く、適度な加重により基板のそりを防ぐ役割をする。こ
のため定盤は、上下で熱伝導率を等しくする必要があ
り、上下とも同じ材質の物を用いることが望ましい。こ
れにより、加熱処理後の徐冷時にガラス基板上下面の温
度変化(冷却速度)が等しくなり、そりが発生しない。
The surface plate does not fix the glass substrate, but plays a role of preventing warpage of the substrate by appropriate weighting. For this reason, it is necessary for the surface plate to have the same thermal conductivity at the top and bottom, and it is desirable to use the same material for the top and bottom. As a result, the temperature changes (cooling rate) on the upper and lower surfaces of the glass substrate become equal during gradual cooling after the heat treatment, and warpage does not occur.

【0016】また多数のガラス基板を一対の定盤間に置
いて加熱する場合、加熱炉内の温度分布や定盤上の基板
位置による差が出にくいように定盤は熱伝導率の良い材
料が適する。このほかに、十分な平坦度が確保でき、軟
化したガラス基板と溶着しにくいといった点で定盤の材
質としてグラファイトが好ましい。
When a large number of glass substrates are placed between a pair of platens for heating, the platen is made of a material having a high thermal conductivity so that a difference due to the temperature distribution in the heating furnace and the substrate position on the platen is less likely to occur. Is suitable. In addition, graphite is preferable as the material of the surface plate because it can ensure sufficient flatness and is less likely to be welded to the softened glass substrate.

【0017】ガラス基板の上に上定盤をのせる場合、ガ
ラスの単位面積当たりにかかる荷重が大きすぎると、軟
化したガラス基板が押し潰されるように不要な変形を起
こすので、余り大きな荷重がかからないよう上定盤の大
きさ、または荷重が分散するようにガラス基板の数や配
置を調整する。また、上定盤による荷重の影響を減少さ
せ、加熱処理による外径公差を損なわずに面取を行う手
段として、上下の定盤間にガラス基板と等しい厚さのス
ペーサを配設することが考えられる。スペーサは耐熱性
で熱による寸法変化が少ないものを使用する。これによ
ってスペーサが定盤の荷重を受け、必要以上の荷重がガ
ラス基板にかかることを防ぎ、かつガラス基板と等しい
厚さとすることで上記した定盤の初期の役割を果たす。
When the upper surface plate is placed on the glass substrate, if the load applied per unit area of the glass is too large, unnecessary deformation occurs such that the softened glass substrate is crushed. Adjust the number and arrangement of glass substrates so that the size of the upper surface plate or the load is distributed so that it will not be applied. Further, as a means for reducing the influence of the load by the upper surface plate and chamfering without impairing the outer diameter tolerance due to the heat treatment, it is possible to dispose a spacer having the same thickness as the glass substrate between the upper and lower surface plates. Conceivable. Use a spacer that is heat-resistant and has little dimensional change due to heat. As a result, the spacer receives the load of the surface plate, prevents an excessive load from being applied to the glass substrate, and has the same thickness as the glass substrate, thereby playing the initial role of the surface plate.

【0018】[0018]

【実施例】以下、本発明の実施例について図1および図
2を参照して説明する。ガラス材質としては、一般的な
光学ガラスであるBK−7を用いた。BK−7の屈伏点
は680℃、軟化点は719℃である。あらかじめガラ
スを18.5×18.5×1.2mmの大きさにスライ
ス・ラッピング加工し、試料用ガラス基板1とした。こ
のガラス基板1を図1に示すように、表面にうねりや凹
凸のない200mm角の下定盤2上に各ガラス基板間に
一定の間隔を開けて4×4列、計16個載置する。この
上に下定盤2と同様、少なくともガラス基板1と接する
面にうねりや凹凸のない同サイズの上定盤3を載せる。
このとき上定盤3の重量は、ガラス基板1の不要な変形
を避けるため、ガラス基板1cm2 当たりにかかる荷重
が10g以下となるように調整する。なお、上下の定盤
2,3はいずれもグラファイト製の板を使用した。
Embodiments of the present invention will be described below with reference to FIGS. 1 and 2. As the glass material, BK-7 which is a general optical glass was used. The yield point of BK-7 is 680 ° C and the softening point is 719 ° C. Glass was previously sliced and lapped into a size of 18.5 × 18.5 × 1.2 mm to obtain a glass substrate 1 for a sample. As shown in FIG. 1, a total of 16 glass substrates 1 are mounted on a lower surface plate 2 of 200 mm square having no undulations or irregularities on the surface of the glass substrate 1 at a constant interval between each glass substrate in 4 × 4 rows. Similar to the lower surface plate 2, an upper surface plate 3 of the same size with no undulations or irregularities is placed on at least the surface in contact with the glass substrate 1.
At this time, the weight of the upper surface plate 3 is adjusted so that the load applied to 1 cm 2 of the glass substrate is 10 g or less in order to avoid unnecessary deformation of the glass substrate 1. The upper and lower surface plates 2 and 3 were both graphite plates.

【0019】以上のようにして上下の定盤2,3に挟ま
れたガラス基板1をこのままの状態で電気炉中に収容
し、680℃の温度で60分間保持した。この間、電気
炉内は、中性またはグラファイトの酸化を防ぐために還
元性雰囲気に保った。熱処理を終えたガラス基板1は、
図2にその断面を示すように端面が滑らかなR形状とな
っていた。
The glass substrate 1 sandwiched between the upper and lower surface plates 2 and 3 as described above was placed in the electric furnace as it was, and held at a temperature of 680 ° C. for 60 minutes. During this period, the inside of the electric furnace was kept in a reducing atmosphere in order to prevent oxidation of the neutral or graphite. After the heat treatment, the glass substrate 1 is
As shown in the cross section of FIG. 2, the end face had a smooth R shape.

【0020】以上の操作を繰り返して100個のガラス
基板を面取した。放冷後、上定盤2を取り除き、各ガラ
ス基板1の外径寸法を測定し、加熱処理する前に測定し
ておいた値と対比した。その結果を表1に示す。また、
他の条件を全く同じにして加熱保持を軟化点を越える7
30℃で30分間とした比較例100個についても同様
に加熱処理前後の外径寸法を測定、対比した。この結果
も合わせて表1および表2に示す。
The above operation was repeated to chamfer 100 glass substrates. After allowing to cool, the upper surface plate 2 was removed, and the outer diameter dimension of each glass substrate 1 was measured and compared with the value measured before the heat treatment. Table 1 shows the results. Also,
Except for the softening point, the heating and holding were performed under the same conditions other than the above 7
The outer diameter dimensions before and after the heat treatment were similarly measured and compared for 100 comparative examples which were kept at 30 ° C. for 30 minutes. The results are also shown in Tables 1 and 2.

【0021】[0021]

【表1】 [Table 1]

【0022】[0022]

【表2】 [Table 2]

【0023】表1および表2の結果から、軟化点を越え
る温度で加熱処理した比較例は、ガラス基板の端面部の
急激な軟化と定盤の荷重により、外辺形状がやや押し潰
されたような印象となり、加熱処理後の外径のばらつき
が拡大側に寄っている。これに対し、実施例ではほぼ加
熱処理前のばらつきを保っており、外径の変動もごくわ
ずかであった。
From the results shown in Tables 1 and 2, in the comparative example heat-treated at a temperature exceeding the softening point, the outer peripheral shape was slightly crushed due to the rapid softening of the end face of the glass substrate and the load of the surface plate. The impression is as follows, and the variation of the outer diameter after the heat treatment is closer to the enlargement side. On the other hand, in the example, the variation before the heat treatment was maintained, and the variation of the outer diameter was also very small.

【0024】この後、実施例により面取したガラス基板
100個と、研削砥石を用いた芯取機で面取した同質、
同サイズのガラス基板100個について、それぞれ平板
面を精密研磨し、洗浄・乾燥したものを検査した。芯取
機で面取したものは、研磨中に欠けが発生したものが3
個、研磨面に傷が確認されたもの10個であったが、実
施例のガラス基板では、欠けたものはなく、傷の発生も
1個であり、このような後加工を行う際にも本発明の方
法が有効であることが確認された。
Thereafter, 100 glass substrates chamfered according to the example and the same quality chamfered by a centering machine using a grinding wheel,
About 100 glass substrates of the same size, the flat plate surface was precision ground, washed, and dried, and then inspected. When chamfered by a centering machine, there are 3 chips that were chipped during polishing.
There were 10 scratches on the polished surface, but no scratches were found on the glass substrate of the example, and only 1 scratch was generated. Even when such post-processing was performed. It was confirmed that the method of the present invention is effective.

【0025】さらに、精密研磨したものから不良品を除
いて、実施例により面取したガラス基板と芯取機で面取
したガラス基板100枚ずつを、図6に示すガラス基板
1同士が触れないように各基板ごとに仕切りが設けられ
た輸送用パッケージ5にそれぞれ別に入れ、ガラス基板
の上辺が動かないように塩化ビニール製の蓋6をかぶせ
て真空パックした。この輸送用パッケージ5に60分間
振動を加えた後、開封してガラス基板を観察した。この
結果、芯取機で面取したガラス基板では基板端面と蓋2
1との摩擦によって発生したと思われる微細なダストま
たは面取部から発生したと考えられる2〜20μm程度
のガラス屑が、ガラス基板の平板面に付着しているもの
が12枚発見されたが、実施例のガラス基板では皆無で
あった。本実施例によるガラス基板は、加熱軟化により
面取されているので、その表面が平滑でパッケージとの
間の摩擦によるダストが発生しにくく、また機械的な研
削のように表面に微細な凹凸や傷が残らないので、輸送
中の振動によってもガラス屑等が発生しないことが確認
された。
Further, the defective substrates are removed from the precision-polished ones, and 100 glass substrates chamfered by the embodiment and 100 glass substrates chamfered by the centering machine are not touched by the glass substrates 1 shown in FIG. As described above, the substrates were separately placed in the transport packages 5 provided with partitions for each substrate, covered with a vinyl chloride lid 6 so as not to move the upper side of the glass substrate, and vacuum packed. The transportation package 5 was vibrated for 60 minutes and then opened to observe the glass substrate. As a result, in the glass substrate chamfered by the centering machine, the substrate end face and the lid 2
Although 12 pieces of glass dust of about 2 to 20 μm, which is thought to be generated from the fine dust or chamfered portion that seems to be generated by the friction with 1, are attached to the flat surface of the glass substrate, However, none of the glass substrates of the examples. Since the glass substrate according to the present embodiment is chamfered by heating and softening, its surface is smooth and dust due to friction with the package is unlikely to be generated, and fine irregularities on the surface such as mechanical grinding and Since no scratches were left, it was confirmed that glass scraps and the like would not be generated by vibration during transportation.

【0026】次にスペーサ4を用いた例について図3な
いし図5を参照して説明する。上記実施例と同様、平坦
なグラファイト製の下定盤2上に各ガラス基板間に一定
の間隔を開けてガラス基板1を載置する。このとき、ガ
ラス基板1間の隙間にガラス基板1と同じ肉厚のセラミ
ック製スペーサ4を配設する。スペーサ4は、図3のよ
うに棒状の物を定盤2の対辺に沿ってガラス基板1を挟
んで配置してもよいし、図5のように点状のスペーサ4
を下定盤2上に上定盤3の荷重が均等に支えられるよう
に分散配置してもよい。ただし、ガラス基板1が加熱に
より軟化するため、ガラス基板1とスペーサ4との溶着
を防止するために両者が接触しないように配置する。ま
た棒状のスペーサ4は、定盤間の空気流を妨げる可能性
があるので、ガラス基板1の昇温ムラを招来しないよう
長さや配置に配慮が必要であり、この点では点状のスペ
ーサ4を分散配置するほうが好ましい。この上に少なく
ともガラス基板1と接する面が平坦な下定盤2と同サイ
ズの上定盤3を載せて上記実施例と同様、電気炉中に収
容し、715℃の温度で40分間保持した。なお、ガラ
ス基板、その配置、定盤は上記実施例と全く同条件で行
った。
Next, an example using the spacer 4 will be described with reference to FIGS. Similar to the above-mentioned embodiment, the glass substrate 1 is placed on the flat lower plate 2 made of graphite with a certain space between the glass substrates. At this time, a ceramic spacer 4 having the same thickness as the glass substrate 1 is arranged in the gap between the glass substrates 1. As the spacer 4, a rod-shaped object may be arranged so as to sandwich the glass substrate 1 along opposite sides of the surface plate 2 as shown in FIG. 3, or as shown in FIG.
May be dispersedly arranged on the lower surface plate 2 so that the load of the upper surface plate 3 is evenly supported. However, since the glass substrate 1 is softened by heating, the glass substrate 1 and the spacer 4 are arranged so as not to come into contact with each other in order to prevent welding of the spacers. Further, since the rod-shaped spacers 4 may interfere with the air flow between the surface plates, it is necessary to consider the length and arrangement so as not to cause uneven temperature rise of the glass substrate 1. In this respect, the dot-shaped spacers 4 It is preferable to disperse. An upper platen 3 having the same size as the lower platen 2 having a flat surface in contact with at least the glass substrate 1 was placed thereon, and the platen was housed in an electric furnace and held at a temperature of 715 ° C. for 40 minutes in the same manner as in the above example. The glass substrate, its arrangement, and the platen were subjected to the same conditions as in the above-mentioned examples.

【0027】上記実施例よりも加熱温度を高めたことに
より、ガラスの軟化が早く起こり、加熱保持時間は上記
実施例よりも短時間でガラス基板の端面11を面取する
ことができる。また、比較例として、同じ条件でスペー
サ4を置かないで加熱処理を行い、それぞれについて加
熱処理前後の外径寸法を測定、対比した。この結果を表
3および表4に示す。
By raising the heating temperature as compared with the above-mentioned embodiment, the softening of the glass occurs earlier, and the heating and holding time can be chamfered on the end face 11 of the glass substrate in a shorter time than in the above-mentioned embodiment. Further, as a comparative example, heat treatment was performed under the same conditions without placing the spacers 4, and the outer diameter dimension before and after the heat treatment was measured and compared for each. The results are shown in Tables 3 and 4.

【0028】[0028]

【表3】 [Table 3]

【0029】[0029]

【表4】 [Table 4]

【0030】熱処理を終えたガラス基板1は、スペーサ
4の有無にかかわらず、上記実施例と同様端面が滑らか
なR形状となった。ただし、表2の結果からわかるよう
に、加熱温度、保持時間が同じであるにもかかわらず、
スペーサを用いて加熱処理したもののほうが外径変動が
小さく、精度的に優れたものが得られた。
After the heat treatment, the glass substrate 1 has an R shape with smooth end faces, regardless of the presence or absence of the spacer 4, as in the above embodiment. However, as can be seen from the results in Table 2, although the heating temperature and the holding time are the same,
The one that was heat-treated using the spacer had a smaller variation in outer diameter, and was excellent in accuracy.

【0031】なお、この実施例ではスペーサとしてセラ
ミック製の物を使用したが、加熱温度における十分な耐
熱性を有するものであれば、グラファイト、ガラス、金
属、石材等でもよく、できれば面取されるガラス基板と
の熱膨脹係数が大きく違わないものを用いると理想的で
ある。
In this embodiment, a ceramic material is used as the spacer, but graphite, glass, metal, stone material or the like may be used as long as it has sufficient heat resistance at the heating temperature, and is preferably chamfered. It is ideal to use a glass substrate whose coefficient of thermal expansion does not differ greatly from that of the glass substrate.

【0032】以上の実施例では、いずれも四角い板状の
定盤を用いたが、定盤のサイズを大きくしたり一度に処
理するガラス基板の数を増やしたりすると、熱伝導率に
優れた材料を定盤に使用しても、定盤の中央部に載置さ
れるガラス基板と外周側のガラス基板とでは加熱炉に入
れたときに外周側の方が早く昇温するため、処理条件が
変わってしまい、外径公差等に影響する虞のある場合が
ある。このような場合には、ガラス基板との当接面にあ
たらない定盤の中央側に通気孔を設ける方法、ガラス基
板1〜2列を載置またはカバーできる短冊状の板を定盤
とする方法、あるいはこれらの短冊状の板を組み合わ
せ、各板の間に隙間を開けて連結したものを1枚の定盤
として用いる方法等により、定盤の中央部と外周側との
温度差を解消することができる。ただし、いずれの方法
であっても定盤の平坦度が保たれ、組み合わされる上下
の定盤面が平行であるように使用されなければならな
い。
In each of the above examples, a square plate-shaped surface plate was used. However, if the size of the surface plate is increased or the number of glass substrates processed at one time is increased, a material excellent in thermal conductivity is obtained. Even when used as a surface plate, the glass substrate placed on the center part of the surface plate and the glass substrate on the outer peripheral side heat up faster on the outer peripheral side when placed in a heating furnace. It may be changed, which may affect the outer diameter tolerance and the like. In such a case, a method in which a ventilation hole is provided in the center side of the surface plate that does not correspond to the contact surface with the glass substrate, or a strip-shaped plate on which one or two rows of glass substrates can be placed or covered is used as the surface plate. The temperature difference between the central part and the outer peripheral side of the surface plate is eliminated by a method, or by combining these strip-shaped plates and connecting them with a gap between them to use as one surface plate. You can However, whichever method is used, the flatness of the surface plate must be maintained, and the upper and lower surface plate surfaces to be combined must be parallel to each other.

【0033】定盤の材質としては、グラファイトの他に
SiCやBN等のセラミックスでも使用できる。セラミ
ックスを使用する場合には軟化したガラスと溶着するこ
とがあるので、あらかじめガラス基板との当接面に離型
剤を塗布しておくとよい。
As the material of the surface plate, ceramics such as SiC and BN can be used in addition to graphite. When ceramics is used, it may be welded to softened glass, so it is advisable to apply a release agent to the contact surface with the glass substrate in advance.

【0034】また、上記のとおり、定盤の中央部に載置
されるガラス基板と外周側のガラス基板とでは加熱炉に
入れたときに外周側の方が早く昇温するため、一部のガ
ラス基板がごくわずか早く軟化すると、そこに上定盤の
荷重がかかり外径公差が損なわれることが考えられる。
したがって、このような際にスペーサを分散配置してお
くことにより、定盤荷重の偏重を防止でき、定盤上の位
置に関係なく均質な加工ができる。図3ないし図5に示
した配置に限らず、特に昇温が早いような箇所に優先的
にスペーサを配置すると効果的である。これによって加
工品質を損なうことなく、軟化点に近い温度で熱処理を
行い処理速度を向上させることも可能となる。また、ガ
ラス基板にかかる上定盤の荷重を適正な値に調整するた
めに、処理するガラス基板の数や基板ガラスの特性に応
じてスペーサの数や面積を調整して対応することができ
る。
Further, as described above, when the glass substrate placed on the center of the surface plate and the glass substrate on the outer peripheral side are heated in the outer peripheral side faster when they are put into the heating furnace, some of them are heated. It is conceivable that if the glass substrate softens very quickly, the load of the upper platen will be applied there and the outer diameter tolerance will be impaired.
Therefore, in such a case, by disposing the spacers in a distributed manner, it is possible to prevent the load of the surface plate from being unbalanced, and it is possible to perform uniform processing regardless of the position on the surface plate. Not only the arrangements shown in FIGS. 3 to 5, it is effective to arrange the spacers preferentially at a place where the temperature rises quickly. This makes it possible to improve the processing speed by performing heat treatment at a temperature close to the softening point without deteriorating the processing quality. Further, in order to adjust the load of the upper surface plate applied to the glass substrate to an appropriate value, the number and area of the spacers can be adjusted according to the number of glass substrates to be processed and the characteristics of the substrate glass.

【0035】上記実施例では方形状のガラス基板につい
て説明したが、本発明の方法は加熱炉内でガラス基板を
外方から均等に加熱軟化させるので、円形状あるいはそ
れ以外の形状の基板であっても一回の処理で全周にわた
って端面を面取することができる。
Although the glass substrate having a rectangular shape has been described in the above embodiments, the method of the present invention uniformly heats and softens the glass substrate from the outside in the heating furnace, so that the glass substrate has a circular shape or other shapes. However, the end face can be chamfered over the entire circumference by a single treatment.

【0036】さらに、加熱処理は電気炉に限らず、炉内
を所定の温度に加熱保持できるものであればよく、また
加熱炉は、バッチ処理でもコンベヤ炉のような連続炉で
もさしつかえない。
Further, the heat treatment is not limited to the electric furnace and may be any one capable of heating and maintaining the inside of the furnace at a predetermined temperature. The heating furnace may be a batch furnace or a continuous furnace such as a conveyor furnace.

【0037】[0037]

【発明の効果】以上のように本発明によれば、定盤間に
ガラス基板を挟んで軟化点以下の温度に加熱保持すると
いう簡単な方法により、不要な変形や反りを起こすこと
なく、基板の平板面を保護した状態で、多数のガラス基
板を同時にかつ各基板の全周を面取することができる。
本発明に必要な装置構成としては、所定温度に加熱保持
できる加熱炉と、平坦な面を有する一対の定盤とがあれ
ばよく、極めて簡単かつ低コストで実現できる。
As described above, according to the present invention, a simple method in which a glass substrate is sandwiched between surface plates and heated and held at a temperature below the softening point is used to prevent the substrate from being deformed or warped unnecessarily. With the flat plate surface protected, a large number of glass substrates can be chamfered simultaneously and over the entire circumference of each substrate.
The apparatus configuration required for the present invention is only required to have a heating furnace capable of heating and holding at a predetermined temperature and a pair of surface plates having a flat surface, which can be realized extremely easily and at low cost.

【0038】また上下の定盤間に加工するガラス基板の
厚さと等しい高さを有するスペーサを配設して加熱処理
を行うことにより、定盤の荷重を均等にし、加工精度を
高めることができる。
By disposing a spacer having a height equal to the thickness of the glass substrate to be processed between the upper and lower surface plates and performing the heat treatment, the load on the surface plate can be made uniform and the processing accuracy can be improved. .

【0039】上下の定盤を同一材質として、加工される
ガラス基板の表裏面の温度変化を均等にし、加熱後の冷
却過程で基板に反りを生ずることが防止される。また定
盤をグラファイト製とすることにより、定盤の中央部と
外周部との温度差を少なくしてガラス基板の配置による
加工差を解消し、ガラスとの溶着を起こさないことから
操作を円滑に行うことができる。
The upper and lower surface plates are made of the same material, and the temperature changes on the front and back surfaces of the glass substrate to be processed are made uniform, so that the substrate is prevented from warping during the cooling process after heating. In addition, by making the surface plate made of graphite, the temperature difference between the central part and the outer peripheral part of the surface plate is reduced, the processing difference due to the arrangement of the glass substrate is eliminated, and welding with glass does not occur, so the operation is smooth. Can be done.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の定盤とガラス基板との配置
関係を示す斜視図である。
FIG. 1 is a perspective view showing an arrangement relationship between a surface plate and a glass substrate according to an embodiment of the present invention.

【図2】図1における加熱処理後のガラス基板の状態を
示す部分拡大断面図である。
FIG. 2 is a partially enlarged cross-sectional view showing a state of the glass substrate after the heat treatment in FIG.

【図3】本発明の棒状スペーサを使用した実施例を示す
上定盤のない状態の平面図である。
FIG. 3 is a plan view showing an embodiment using the rod-shaped spacer of the present invention without an upper surface plate.

【図4】図3に上定盤を載せた状態の正面図である。FIG. 4 is a front view of a state in which an upper surface plate is placed on FIG.

【図5】本発明の点状スペーサを使用した実施例を示す
上定盤のない状態の平面図である。
FIG. 5 is a plan view showing an embodiment using the dot spacers of the present invention without an upper surface plate.

【図6】輸送用パッケージにガラス基板を収容した状態
を示す断面図である。
FIG. 6 is a cross-sectional view showing a state where a glass substrate is housed in a transportation package.

【符号の説明】[Explanation of symbols]

1 ガラス基板 2 上定盤 3 下定盤 4 スペーサ 5 輸送用パッケージ 6 蓋 1 glass substrate 2 upper surface plate 3 lower surface plate 4 spacer 5 transportation package 6 lid

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 ガラス基板との当接面が平坦な上下の定
盤間にガラス基板を挟み、ガラスの軟化点以下の温度に
加熱し一定時間保持することによってガラス基板の端面
部を軟化変形させることを特徴とするガラス基板の面取
方法。
1. An end face portion of a glass substrate is softened and deformed by sandwiching the glass substrate between upper and lower surface plates having flat contact surfaces with the glass substrate, heating the glass substrate to a temperature below the softening point of the glass and holding the glass substrate for a certain period of time. A method for chamfering a glass substrate, which comprises:
【請求項2】 ガラスの屈伏点以上軟化点以下の温度に
加熱保持することを特徴とする請求項1記載のガラス基
板の面取方法。
2. The method for chamfering a glass substrate according to claim 1, wherein the glass substrate is heated and held at a temperature not lower than the yield point and not higher than the softening point of the glass.
【請求項3】 平坦な下定盤上にガラス基板を載置し、
その上に上定盤を載せて加熱保持することを特徴とする
請求項1または2に記載のガラス基板の面取方法。
3. A glass substrate is placed on a flat lower surface plate,
The chamfering method of the glass substrate according to claim 1 or 2, wherein an upper platen is placed thereon and heated and held.
【請求項4】 上下の定盤間にガラス基板と等しい厚さ
のスペーサを配設することを特徴とする請求項1ないし
3のいずれかに記載のガラス基板の面取方法。
4. The method for chamfering a glass substrate according to claim 1, wherein spacers having the same thickness as the glass substrate are provided between the upper and lower surface plates.
【請求項5】 上下の定盤が同一の材質からなることを
特徴とする請求項1ないし4のいずれかに記載のガラス
基板の面取方法。
5. The method for chamfering a glass substrate according to claim 1, wherein the upper and lower surface plates are made of the same material.
【請求項6】 定盤の材質がグラファイトであることを
特徴とする請求項1ないし5のいずれかに記載のガラス
基板の面取方法。
6. The method for chamfering a glass substrate according to claim 1, wherein the surface plate is made of graphite.
JP15948694A 1994-06-17 1994-06-17 Chamfering of glass substrate Pending JPH082933A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15948694A JPH082933A (en) 1994-06-17 1994-06-17 Chamfering of glass substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15948694A JPH082933A (en) 1994-06-17 1994-06-17 Chamfering of glass substrate

Publications (1)

Publication Number Publication Date
JPH082933A true JPH082933A (en) 1996-01-09

Family

ID=15694827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15948694A Pending JPH082933A (en) 1994-06-17 1994-06-17 Chamfering of glass substrate

Country Status (1)

Country Link
JP (1) JPH082933A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2349362A (en) * 1999-04-01 2000-11-01 Timothy John Murphy Decorative glass tile with slumped edges and painted rear face

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2349362A (en) * 1999-04-01 2000-11-01 Timothy John Murphy Decorative glass tile with slumped edges and painted rear face
GB2349362B (en) * 1999-04-01 2001-11-14 Timothy John Murphy Decorative tiles

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