JPH08227923A - Evaluation test method for semiconductor photoelectric element - Google Patents

Evaluation test method for semiconductor photoelectric element

Info

Publication number
JPH08227923A
JPH08227923A JP7329035A JP32903595A JPH08227923A JP H08227923 A JPH08227923 A JP H08227923A JP 7329035 A JP7329035 A JP 7329035A JP 32903595 A JP32903595 A JP 32903595A JP H08227923 A JPH08227923 A JP H08227923A
Authority
JP
Japan
Prior art keywords
semiconductor photoelectric
light
photoelectric element
light source
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7329035A
Other languages
Japanese (ja)
Inventor
Kenji Suzuki
健司 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP7329035A priority Critical patent/JPH08227923A/en
Publication of JPH08227923A publication Critical patent/JPH08227923A/en
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE: To perform the electric characteristic test of a semiconductor photoelectric element under a state close to actual using state by inserting a lens group between a light source and the semiconductor photoelectric element and irradiating the semiconductor photoelectric element with light from the light source at a narrow angle while preventing the semiconductor photoelectric element from being irradiated with scattering light. CONSTITUTION: A lens group 1 is inserted between a light source 4 and the semiconductor photoelectric element 2. The semiconductor photoelectric element 2 can be irradiated with light from the light source 4 at a narrow angle under a state close to actual using state through the lens group 1 comprising rod lenses inserted between a light source 4 and the semiconductor photoelectric element 2. Consequently, the incident angle of light is limited even for a light receiving element located at a position remote from the center of the semiconductor photoelectric element 2 and the light receiving element is not irradiated with the scattering light. With such method, electric characteristics test can be performed for the semiconductor photoelectric element 2 under a state close to actual using state.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体光電素子の評価
試験方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor photoelectric device evaluation test method.

【0002】[0002]

【従来の技術】従来は図4のように、半導体光電素子2
に対して光源4が発する光を直接照射して電気的特性試
験を行っていた。
2. Description of the Related Art Conventionally, as shown in FIG.
On the other hand, the electric characteristic test was conducted by directly irradiating the light emitted from the light source 4.

【0003】[0003]

【発明が解決しようとする課題】しかし、図4に示すと
おり、従来のように光源4の光を半導体光電素子2に直
接照射する方式の半導体光電素子2の評価試験方法で
は、光源4の光が分散して広範囲にわたって照射される
ので、特に図5のような半導体光電素子2の中央から離
れた位置に存在する受光素子3では、光の入射角度が広
くなってしまい、実使用と異なった状態で電気特性試験
を行ってしまうという欠点を有していた。
However, as shown in FIG. 4, according to the conventional method for evaluating and testing the semiconductor photoelectric element 2 in which the light from the light source 4 is directly applied to the semiconductor photoelectric element 2, the light from the light source 4 is not detected. Is dispersed and is irradiated over a wide range, so that the incident angle of light is widened particularly in the light receiving element 3 which is located away from the center of the semiconductor photoelectric element 2 as shown in FIG. It had the drawback of conducting an electrical characteristic test in the state.

【0004】本発明は、従来のこのような問題点を解決
するために、光源の光を半導体光電素子の実使用状態に
近い、狭い角度で照射することを目的としている。
In order to solve such conventional problems, the present invention aims to irradiate light from a light source at a narrow angle, which is close to the actual use state of a semiconductor photoelectric device.

【0005】[0005]

【課題を解決するための手段】上記問題点を解決するた
めに、本発明は光源と半導体光電素子との間にレンズ群
を挿入し、光源の光を半導体光電素子の実使用状態に近
い、狭い角度で照射できるようにした。
In order to solve the above-mentioned problems, the present invention inserts a lens group between a light source and a semiconductor photoelectric element so that the light of the light source is close to the actual use state of the semiconductor photoelectric element. It is possible to irradiate at a narrow angle.

【0006】[0006]

【作用】図1のように、光源4と半導体光電素子2との
間にレンズ群1を挿入したことにより、図2のような半
導体光電素子2の中央から離れた位置の存在する受光素
子3に対しても光の入射角度が狭く限定され、分散して
広がった光は照射されない。
By inserting the lens group 1 between the light source 4 and the semiconductor photoelectric element 2 as shown in FIG. 1, the light receiving element 3 existing at a position away from the center of the semiconductor photoelectric element 2 as shown in FIG. Also, the incident angle of light is narrowly limited, and the light that is dispersed and spread is not irradiated.

【0007】[0007]

【実施例】以下に、本発明の実施例を図面に基づいて説
明する。図1は、本発明の半導体試験装置の基本構成図
であり、光源4と半導体光電素子2との間に挿入した棒
状のレンズからなるレンズ群1によって光源4からの光
を半導体光電素子2の実使用状態に近い、狭い角度で照
射できるようにしたものである。なお、図2は図1の部
分Aの拡大図であり、半導体光電素子2の中央から離れ
た位置に存在する受光素子3に対する光の入射角度が狭
く限定され、分散して広がった光は照射されないという
ことを示している。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a basic configuration diagram of a semiconductor testing device of the present invention, in which light from a light source 4 is emitted from a semiconductor photoelectric device 2 by a lens group 1 including a rod-shaped lens inserted between the light source 4 and the semiconductor photoelectric device 2. It is designed so that irradiation can be performed at a narrow angle, which is close to the state of actual use. Note that FIG. 2 is an enlarged view of the portion A of FIG. 1, and the incident angle of light to the light receiving element 3 existing at a position away from the center of the semiconductor photoelectric element 2 is limited to a narrow range, and the light that is dispersed and spread is irradiated. It means that it will not be done.

【0008】図3は本発明に係わる半導体試験装置の実
施例の1つを示すもので、レンズ群1と光源4をプロー
ブカード5の上面に立てた支柱6によって固定したもの
である。
FIG. 3 shows one of the embodiments of the semiconductor testing apparatus according to the present invention, in which the lens group 1 and the light source 4 are fixed by a column 6 standing on the upper surface of a probe card 5.

【0009】[0009]

【発明の効果】以上説明したように、本発明は光源の光
を半導体光電素子に対して狭角で照射し、分散して広が
った光は照射されないので、半導体光電素子の実使用に
近い状態で電気的特性試験を行うことができるという効
果がある。
As described above, according to the present invention, the light from the light source is applied to the semiconductor photoelectric element at a narrow angle, and the light which is dispersed and spread is not applied. There is an effect that the electrical characteristic test can be performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の半導体試験装置の基本構成図である。FIG. 1 is a basic configuration diagram of a semiconductor test apparatus of the present invention.

【図2】図1の点線で囲まれた部分Aの拡大図である。FIG. 2 is an enlarged view of a portion A surrounded by a dotted line in FIG.

【図3】本発明に係わる半導体試験装置の実施例の構成
図である。
FIG. 3 is a configuration diagram of an embodiment of a semiconductor test apparatus according to the present invention.

【図4】従来の半導体試験装置の基本構成図である。FIG. 4 is a basic configuration diagram of a conventional semiconductor test apparatus.

【図5】図4の点線で囲まれた部分Bの拡大図である。 1 レンズ群 2 半導体光電素子 3 受光素子 4 光源 5 プローブカード 6 支柱5 is an enlarged view of a portion B surrounded by a dotted line in FIG. 1 lens group 2 semiconductor photoelectric element 3 light receiving element 4 light source 5 probe card 6 support

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光源から発する光を被試験物である半導
体光電素子に照射して半導体光電素子の特性試験を行う
半導体光電素子の評価試験方法において、 前記光源から発する光を複数の光路に分割して受光し、
前記分割した各行光路に対応する半導体光電素子のそれ
ぞれの位置に、前記光路からの光が照射するようにした
ことを特徴とする半導体光電素子の電気的特性試験を行
う半導体光電素子の評価試験方法。
1. A semiconductor photoelectric device evaluation test method for irradiating a semiconductor photoelectric device, which is a device under test, with light emitted from a light source to perform a characteristic test of the semiconductor photoelectric device, wherein the light emitted from the light source is divided into a plurality of optical paths. To receive light,
The semiconductor photoelectric device evaluation test method for performing an electrical characteristic test of the semiconductor photoelectric device, characterized in that light from the optical path is irradiated to each position of the semiconductor photoelectric device corresponding to each of the divided row optical paths. .
JP7329035A 1995-12-18 1995-12-18 Evaluation test method for semiconductor photoelectric element Pending JPH08227923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7329035A JPH08227923A (en) 1995-12-18 1995-12-18 Evaluation test method for semiconductor photoelectric element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7329035A JPH08227923A (en) 1995-12-18 1995-12-18 Evaluation test method for semiconductor photoelectric element

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP1331821A Division JPH06101508B2 (en) 1989-12-20 1989-12-20 Semiconductor test equipment

Publications (1)

Publication Number Publication Date
JPH08227923A true JPH08227923A (en) 1996-09-03

Family

ID=18216878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7329035A Pending JPH08227923A (en) 1995-12-18 1995-12-18 Evaluation test method for semiconductor photoelectric element

Country Status (1)

Country Link
JP (1) JPH08227923A (en)

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