JPH08215971A - Substrate fitting stage - Google Patents

Abstract

PURPOSE: To improve the cooling effect of a substrate fitting part, in the substrate fitting stage of an ion beam etching device and the like. CONSTITUTION: When a case 5 is rotated, a substrate fitting part 6 makes a planetary motion. The case 5 is provided with a water feed body 51 rotatably surrounding a fitting shaft 39, and a flow passage 43 formed within the substrate fitting part 6 and the fitting shaft 39 is communicated to the inflow passage 53 and the outflow passage 54 of the water feed body 51. An upper union 33 is provided on the center of the case 5. This union 33 is rotatably connected to a lower union 22. The upper union 33 is connected to the water feed body 51 through pipings 55, 56. Cooling water fed to the lower union 22 flows in the substrate fitting part 6 through the upper union 33 and the water feed body 51, and directly cools the substrate fitting part 6.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum chamber for forming a thin film on a substrate (wafer) by sputtering or etching the film formed on the substrate with an ion beam in a semiconductor manufacturing process or the like. The present invention relates to a substrate mounting stage for holding the substrate therein.

[0002]

2. Description of the Related Art Various substrate mounting stages have been proposed for holding a substrate so that the substrate is subjected to sputtering or etching in a chamber. In FIG. 2, (A) shows an example of the vacuum chamber (1).
A substantially L-shaped frame (4) is provided on the inner surface of the lid (2) for rotation by the motor (3) outside the chamber, and the case (5) is rotatably mounted on the frame (4). A substrate mounting portion (6) for supporting the substrate is formed on the upper portion. The substrate mounting portion (6) is planetarily moved through a motor (7), a chain (8) and the like provided outside the chamber so that the substrate uniformly faces a target (not shown) or an ion source. Is configured. Appropriate sealing members are provided at various places so that vacuum leakage does not occur in the chamber.

FIG. 3 shows an enlarged cross-sectional view of the case (5) and the like in the chamber according to the prior art.
Is a sprocket (9) that engages with the chain (8).
A board mounting portion (6) for holding the board is rotatably mounted on the front base (10) on the front surface thereof by a bearing (11). A planetary gear (12) is attached to the lower end of the board mounting portion (6), and the planetary gear (1)
2) engages a sun gear (13) fixed to the frame. Further, the lower surface of the planetary gear (12) contacts a cooling plate (14) fixed to the frame, and the cooling plate (14) has a water supply pipe (15) and a drain pipe (1).
Cooling water is circulating through 6).

Since the planetary gear (12) is pressed against the cooling plate (14) by the spring (17),
When the case (5) revolves under the action of the motor (7) and the board mounting part (6) makes a planetary motion, it contacts the cooling plate (14) and revolves while rotating. And
At the time of the above-mentioned sputtering treatment or particularly the etching treatment,
The heat generated in the substrate (not shown) supported on the substrate mounting portion (6) is cooled by the cooling plate (14) through the planetary gear (12) and the like.

[0005]

As described above, in the conventional substrate mounting stage, the heat generated in the substrate or the like is indirectly cooled through the cooling plate, so that the cooling efficiency is not good and the substrate is operated for a long time. It was difficult to make them. Therefore, an object of the present invention is to provide a novel substrate mounting stage in which the substrate mounting portion can be directly cooled in the substrate mounting stage in which the substrate mounting portion is caused to make a planetary motion as described above. is there.

[0006]

According to the present invention, a flow path of cooling water is formed in a substrate mounting portion rotatably mounted on the case so as to make a planetary motion with the revolution of the case, and a mounting shaft of the substrate mounting portion. A water supply body is provided surrounding the water supply body, the water supply body is fixed to the case, and an upper union is attached to the center of the case. The water supply body and the upper union are connected to the inflow passage and the outflow passage, There is provided a substrate mounting stage in which a lower union fixed to a frame is rotatably connected, and cooling water is directly circulated to the substrate mounting portion through a water supply pipe and a drain pipe connected to the lower union. Is achieved.

[0007]

When the case revolves, the water supply body fixed to the case revolves and the upper union also rotates together at the center of the case. The board mounting portion rotates and revolves with the mounting shaft surrounded by the water supply body. When cooling water is supplied from the lower union rotatably connected to the upper union, the cooling water flows to the mounting shaft through the upper union and the water supply body, flows in the board mounting portion, and then the water supply body and Drains from the lower union via the upper union.

[0008]

Embodiments will be described in detail below with reference to embodiments. The structure of the drive source, frame, etc. of the substrate mounting stage of the present invention is basically the same as that of the conventional device shown in FIG. FIG. 1 shows an essential part of the present invention, in which a frame (4) provided in a vacuum chamber includes:
An inner ring (20) of the magnetic seal is attached through an insulating washer (18) and an insulating flange (19), and a sun gear (21) and a lower union (22) are attached to the upper part of the inner ring (20) of the magnetic seal. Has been. An inflow passage (25) and an outflow passage (26) are formed in the lower union (22) so as to respectively communicate with a water supply pipe (23) and a drain pipe (24) communicating with the outside of the chamber, and an inflow passage (25) is formed at a tip thereof. The inflow pipe (27) of () is projected, and the outflow pipe (28) of the outflow passage (26) is provided around the inflow pipe (27).

A flanged outer ring (29) of the magnetic seal is rotatably provided around the inner ring (20) of the magnetic seal, and an insulating washer (30) and an insulating spacer are attached to the outer ring (29) of the magnetic seal. The sprocket (9) is fixedly mounted via (31), and the case (5) is fixed to the upper part of the flanged outer ring (29) of the magnetic seal. As mentioned above, the sprocket (9).
Communicates with a motor (7) outside the vacuum chamber (1) via a chain (8), and the case (5) revolves around the motor (7).

A top base (32) is provided on the upper surface of the case (5), and a beam shield plate (not shown) is provided on the surface of the top base (32). An upper union (33) is attached to the center of the top base (32). The upper union (33)
Includes an outflow passage (34) communicating with an inflow passage (25) of the lower union (22) and an inflow pipe (27) and an outflow pipe (28) of the lower union (22) rotatably engaged with each other. It has an inflow channel (35) communicating with the outflow channel (26) of the lower union (22). Around the inflow pipe (27) and the outflow pipe (28), a rolling, an oil seal (36) and the like are provided and sealed, and a plate (37) is attached to the lower surface of the upper union (33). ing.

A plurality of board mounting portions (6) are provided around the top base (32) of the case (5). The substrate mounting portion (6) includes a top portion (38) for supporting a substrate (wafer) (not shown) and the top portion (3).
8) is provided with a mounting shaft (39) mounted below, and a planetary gear (40) is provided at a lower end of the mounting shaft (39) so as to engage with the sun gear (21), and an inner ring of the magnetic seal is provided. (41) and a magnetic seal outer ring (42) rotatably combined therewith, are rotatably attached to the top base (32).

The top portion (38) of the board mounting portion (6)
The mounting shaft (39) is hollow, and the water diversion pipe (44) is internally provided in the hollow portion so as to form the cooling water passage (43). The diversion pipe (44) is provided with a flange (4
5) and (46), the lower end flange (46) is inscribed in the hollow portion of the mounting shaft (39), and holes (47), (48) are provided in the mounting shaft (39) above and below the inscribed portion. ) Is opened.

A water supply body (51) is attached to a lower portion of the outer ring (42) of the magnetic seal so as to rotatably surround the attachment shaft (39) via oil seals (49) and (50). The oil seals (49), (50)
Between the flanges (46) at the lower end of the diversion pipe (44)
A partition plate (52) is provided at a position corresponding to the partition plate (52), and the water supply body (51) has an inflow passage (53) opening to one side of the partition plate (52) and an outflow passage (53) opening to the other side. 54)
The inflow passage (53) and the outflow passage (54) communicate with the flow passage (43) of the mounting shaft (39) through the holes (47) and (48).

Inflow channel (53) of the water supply body (51)
The outflow passage (54) and the outflow passage (54) are connected to the outflow passage (34) and the inflow passage (3) of the upper union (33) by the pipes (55) and (56).
It communicates with 5). In addition, these pipes (54),
In (55), the water supply bodies (51) provided on the plurality of board mounting portions (6) are connected in series one after another so that the first and last parts are connected to the upper unit.

A bearing (57) is provided between the lower end of the water supply body (51) and the planetary gear (40), and an O-ring is provided at an appropriate position where a rail is required. The oil seal, magnetic seal and the like may be replaced with an appropriate seal member.

When the case (5) is rotated by the motor (7) provided outside the chamber, the substrate mounting portion (6) is rotated and revolved by the planetary gear (40) and the sun gear (21). It makes a planetary motion, but the board mounting part (6)
Since the water supply body (51) surrounding the mounting shaft (39) and the upper union (33) rotate together with the case (5), their relative positions do not change. Therefore, when cooling water is supplied to the upper union (33) from the lower union (22), the cooling water is supplied to the mounting shaft (39) through the upper union (33) and the water supply body (51) to mount the board. The substrate mounting part is directly cooled by circulating the flow path (43) in the part (6), and then returns to the lower union (22) through the water supply body (51) and the upper union (33) and goes out of the chamber. Be drained.

[0017]

The present invention is configured as described above, and since the cooling effect can be enhanced by directly cooling the mounting portions of the substrates that individually rotate and revolve in the chamber, the cooling effect can be increased particularly in ion beam etching. It is possible to prevent the temperature rise of the substrate when performing a process that generates a large amount of heat, and it is possible to perform a long-time etching process, etc., which can improve work efficiency, and in addition to the conventional substrate mounting stage. Since it can be replaced, the existing ion beam etching apparatus or the like can be used as it is, which is economical.

[Brief description of drawings]

FIG. 1 is a partial sectional view showing an embodiment of the present invention.

FIG. 2 is an explanatory view of an ion beam etching apparatus or the like that uses a substrate mounting stage.

FIG. 3 is a partial cross-sectional view of a conventional substrate mounting stage.

[Description of References] A ... Substrate mounting stage 1 ... Vacuum chamber 4 ... Frame 5 ... Case 6 ... Substrate mounting portion 9 ... Sprocket 21 ... Sun gear 22 ... Lower union 32 ... Top base 33 ... Upper union 39 ... Mounting shaft 40 … Planetary gear 43… Flow path 51… Water supply body

Claims (1)

[Claims] 1. A substrate mounting portion for supporting a substrate on a frame (4) formed in the chamber (1) so as to be revolved by a driving source outside the chamber and supporting the substrate on the upper part of the case (5). (6) is rotatably provided, and when the case (5) revolves, a planetary gear () is attached to the lower end of the mounting shaft (39) of the board mounting part (6) so that the board mounting part (6) makes a planetary motion. 40) and the above case (5)
A sun gear (21) that engages with the planetary gear (40) is fixed to the frame (4) in the central portion, and water is communicated to the outside of the chamber in the frame (4) corresponding to approximately the central position of the case (5). A pipe (23) and a drainage pipe (24) are provided, and the frame (4) also has an inflow passage (25) and an outflow passage (26) communicating with the water supply pipe (23) and the drainage pipe (24), respectively. The union (22) is fixed, and the lower union (2
An upper union (33) having an inflow path (35) and an outflow path (34) communicating with the outflow path (25) and the outflow path (26) of 2) and rotatably connected to the lower union (22). ) Is the top base (3) of the above case (5)
2) is attached to the central portion of the mounting shaft (39), and a flow path (43) that flows through the mounting shaft (39) in the board mounting portion (6) is formed and communicates with the flow path (43) of the mounting shaft (39). Has an inflow passage (53) and an outflow passage (54) for
9) A water supply body (51) rotatably engaged with the water supply body (51) is fixedly attached to the case (5), and the inflow path (53) and the outflow path (54) of the water supply body (51) are connected to the upper union (5). 33) The cooling water is directly circulated from the outside of the chamber (1) to the substrate mounting portion (6) by communicating with the inflow path (35) and the outflow path (34) of 33) by a pipe. A substrate mounting stage.