JPH08250577A - Planetary type wafer holder - Google Patents

Abstract

PURPOSE: To improve the characteristics of a thin film by directly cooling a wafer chuck and suitably holding a wafer temperature in a planetary type wafer holder applied to a film forming apparatus. CONSTITUTION: The planetary type wafer holder comprises a wafer chuck 17c disposed in a vacuum chamber 1 included in a film forming apparatus to hold a wafer 8 of an object on which a film is to be formed, and power transmission mechanisms 13, 17, 26 for causing the member 17c to be planetary movement by a drive force given externally of the chamber 1. Accordingly, cooling water passages communicating with one another are respectively formed in the revolution member 13 of the power transmission mechanism and a rotation member 17 including the chuck 17c, a cooling water supply unit 29 connected to the exit and entrance of the passage of the revolution member is provided outside the chamber 1, and cooling water is supplied in a circulating manner to the members 13 and 17 from a cooling water supply unit 29 to cool the chuck 17c.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotation-type substrate holding apparatus, and more particularly to a rotation-type substrate holding apparatus suitable for a film forming apparatus for forming a thin film on the surface of a substrate with a vacuum inside.

[0002]

2. Description of the Related Art An example of a conventional rotation-type substrate holding device is shown in FIG.
Shown in Reference numeral 1 denotes a vacuum container, and a part of the vacuum container 1 is shown in the illustrated example. The inside of the vacuum container 1 is maintained in a required reduced pressure state. The self-revolving type substrate holding device 2 is arranged inside the vacuum container 1. Reference numeral 3 is a revolving member, and its shaft portion 3a is rotatably supported by a bearing 5 on a cylindrical body portion 4b of a fixed gear 4a mounted inside the wall portion of the vacuum container 1.
The shaft portion 3a is drawn out from a hole 1a formed in the wall portion of the vacuum container 1 and is connected to a rotation shaft of a rotation drive device (not shown). The rotation driving device imparts a revolution motion to the revolution member 3. The bearing 5 also has a sealing function of keeping the inside of the vacuum container 1 airtight.

Reference numeral 6 is a rotation member. The rotation member 6 includes a planetary gear 6a that meshes with the fixed gear 4a, a shaft portion 6b, and a substrate holder 6c. Shaft 6b of rotation member 6
Are rotatably supported by bearings 7 around the radially extending portion 3b of the revolution member 3. In the illustrated example, the substrate 8 is fixed to the lower surface of the substrate holder 6c by a fixture 9 and a screw 9a. Although one rotating member 6 is shown in FIG. 2, a plurality of rotating members 6 are usually provided in the radially extending portion 3b.

According to the self-revolving type substrate holding device, the substrate 8 is set on the substrate holder 6c of the rotating member 6,
When the shaft portion 3a is rotated, the substrate holder 6c revolves while revolving, based on the meshing relationship between the fixed gear 4a and the planetary gear 6a and the rotating operation of the radially extending portion 3b. In FIG. 2, a is a line representing the revolution axis, and b is a line representing the rotation axis. When the above-described rotation-type substrate holding device is applied to, for example, a vapor deposition device that forms a thin film on the substrate 8 in a depressurized environment in the vacuum container 1, the position of the substrate changes best in the vacuum container 1, and thus the substrate Compared with the static type, the rotation type, and the revolution type, the uniformity of the film thickness distribution of the thin film can be made higher.

[0005]

In the conventional auto-revolution type substrate holding device, it was considered impossible to supply the cooling water to the substrate holder 6c due to its mechanical limitation. However, in a vapor deposition apparatus or the like, it is important to suppress the temperature generated on the substrate and control the substrate temperature to an optimum temperature in order to produce a thin film having the required characteristics. In this sense, the conventional rotation-type substrate holding device has a problem that the substrate temperature cannot be cooled so as to be optimal and the characteristics of the thin film to be manufactured are not sufficiently good.

SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide a rotation-type substrate holding device capable of supplying a cooling water to a substrate holder to cool the substrate.

[0007]

A rotation-type substrate holding apparatus according to the present invention is provided in a vacuum container included in a film forming apparatus and holds a substrate to be film-formed, a substrate holder, and a vacuum. It has a power transmission mechanism that is given a driving force from the outside of the container to cause the substrate holder to revolve and rotate, and the revolution member of the power transmission mechanism and the inside of each of the rotating members including the substrate holder. , A cooling water supply device that forms a cooling water passage communicating with each other and is connected to the inlet / outlet of the cooling water passage of the revolution member is provided outside the vacuum container, and the cooling water supply device circulates the revolution member and the rotation member. Cooling water was supplied to the substrate holder to cool it.

Further, preferably, the revolving member may be attached to the vacuum container via a bellows and moved up and down by the expansion and contraction action of the bellows, thereby changing the position of the substrate holder.

[0009]

In the rotation / revolution type substrate holding apparatus according to the present invention, the cooling water can be directly supplied to the substrate holder which is arranged in the vacuum container and which is rotated and rotated by the rotation / revolution power transmission mechanism. When performing film formation on the substrate held by the substrate holder using vapor deposition or the like, the temperature of the substrate can be cooled and held at an appropriate substrate temperature.

[0010]

Embodiments of the present invention will be described below with reference to the accompanying drawings. In FIG. 1, the same elements as those explained in FIG. 2 are designated by the same reference numerals. Reference numeral 1 denotes, for example, a part of a wall portion of a vacuum container constituting the vapor deposition apparatus, and 1a is a hole formed in the wall portion of the vacuum container 1. Reference numeral 8 is a substrate, and 9 is a substrate holder.

A support plate 11 is provided on the outer peripheral portion of the hole 1a.
The bellows 12 to which is attached is fixed. The bellows 12 is vertically expandable and contractable in FIG. Support plate 11
The internal space formed by the bellows 12 communicates with the internal space of the vacuum container 1 and is formed airtight. That is, the outside air does not enter the inside from the peripheral portions of the bellows 12 and the support plate 11.

Reference numeral 13 is a revolving member, 13a is a revolving shaft portion, and 13b provided at the lower end of the revolving shaft portion 13a is a radially extending portion. The upper portion of the revolution shaft portion 13a is inserted through the support plate 11 and extends outward. Revolution shaft portion 13a of the support plate 11
A bearing (not shown) having a sealing property is provided at the insertion portion of the. The revolution shaft portion 13a is connected to a rotation shaft of a rotation drive device 16 that applies a rotation force 15 for revolution. The revolution shaft portion 13a is formed of a tubular body, and further has an inner pipe 14 inside. Therefore, inside the revolving shaft portion 13a, a space inside the inner tube 14 and a space between the inner tube 14 and the revolving shaft portion 13a form an inner and outer double inner space. The radially extending portion 13b also has an internal space, and includes a partition plate 13c that divides the internal space vertically. Revolution shaft part 1
The inner space on the outer side in 3a communicates with the inner space on the upper side of the radially extending portion 13b, and the inner space on the inner side of the revolution shaft portion 13a (the space inside the inner pipe 14) is the radially extending portion 13b. It leads to the inner space below. The planar shape of the radially extending portion 13b can be any shape.

A rotating member 17 is rotatably attached to an appropriate position on the periphery of the radially extending portion 13b. The rotation member 17 includes a planetary gear 17a provided on the upper portion, a substrate holder 17c for attaching the substrate 8 to the lower surface, and a planetary gear 17a.
And a shaft portion 17b connecting the substrate holder 17c. The shaft member 17b of the rotation member 17 has a radially extending portion 1b.
It is attached so as to pass through 3b in the vertical direction, and is rotatably attached by bearings 20 and 21, while maintaining sealing performance by the seal members 18 and 19.

A partition member 22 having a tubular portion and a flat plate portion is provided inside the rotating member 17, and the internal space is formed in a double structure. However, the internal space inside and outside the rotation member 17 is connected at the lower side position of the partition member 22. Furthermore, the internal space inside the rotation member 17 is
Radial extension member 1 through hole 17d formed in 7b
It communicates with the internal space above 3b. The internal space outside the rotation member 17 communicates with the internal space below the radial extension member 13b through a hole 17e formed in the shaft portion 17b.

The planetary gear 17a of the rotation member 17 has bearings 23 and 24 around the revolution shaft portion 13a of the revolution member 13.
Lower gear 25a of intermediate gear 25 rotatably supported by
Meshes with.

Reference numeral 26 is a first stage gear. The first gear 26 is
The shaft portion 26a is rotatably attached to the support plate 11. The first-stage gear 26 meshes with the upper gear 25b of the intermediate gear 25. The shaft portion 26a is extended to the outside and is connected to the rotation shaft of another rotation drive device 27. The first-stage gear 26 has a rotational force 28 applied from a rotary drive device 27.
Is transmitted to the planetary gear 17a via the intermediate gear 25.

Reference numeral 29 is a water supply device.
Cooling water for cooling the substrate is circulated to the auto-revolution type substrate holding device. The water supply port of the water supply device 29 is connected to the internal space outside the revolution shaft portion 13a. The inlet for the cooling water of the water supply device 29 is connected to the inner space inside the revolution shaft portion 13a. In FIG. 1, an arrow 30
Shows the flow of cooling water supplied from the water supply device 29 to the rotation-type substrate holding device.

In the rotation-type substrate holding device having the above-mentioned structure, the rotation member 17 revolves on the basis of the fact that the revolution drive device 16 revolves the revolution shaft portion 13a and the rotation drive device 27 rotates the first stage gear 26. While rotating, the rotational force is transmitted via the first-stage gear 26 and the intermediate gear 25 to rotate on its axis. The number of rotation members 17 to be installed is arbitrary.

While the self-revolving substrate holding device performs a self-revolving operation to form a thin film on the surface of the substrate 8, the water supply device 2
Cooling water is supplied from 9. The cooling water supplied to the self-revolving type substrate holding device flows along the route indicated by the arrow 30 and is supplied to the position of the substrate holder 17c to cool the substrate 8. After that, the cooling water flows according to the arrow 30 and returns to the water supply device 29 as drainage.

In the configuration of the above embodiment, the support plate 1 provided via the expandable bellows 12 provided in the vacuum container 1
1, a revolution shaft portion 13a and a rotation shaft portion 26a are rotatably and airtightly attached, and cooling water flows in or out by utilizing the inside of the revolution shaft portion 13a. In addition, the revolution shaft part 1
By adjusting the position of 3a in the vertical direction, the first gear 26 and the upper gear 25b of the intermediate gear 25 are always meshed with each other. Therefore, the upper gear 25b of the intermediate gear 25 is configured to have a predetermined width in the axial direction. According to this configuration, the intermediate gear 25 and the rotation member 17 can be moved up and down, and the substrate holder 17
It is possible to change the position of c up and down.

Further, since the revolution shaft portion 13a of the revolution member 13 and the shaft portion 26a for transmitting the rotation force for rotation to the rotation member 17 are configured to rotate independently of each other, the rotation of the rotation member 17 and The number of revolutions of each revolution can be freely set. This is advantageous in improving the uniformity of the thin film formed on the substrate 8.

[0022]

As is apparent from the above description, according to the present invention, in the rotation-revolution type substrate holding device applied to a device for forming a thin film in a vacuum container, a substrate holder that rotates while revolving. Since the cooling water is directly supplied to the substrate, the temperature of the substrate can be maintained at an appropriate temperature, and the characteristics of the thin film formed on the substrate can be improved.

[Brief description of drawings]

FIG. 1 is a vertical cross-sectional view showing an embodiment of a self-revolving type substrate holding device of the present invention.

FIG. 2 is a vertical cross-sectional view showing the structure of a conventional rotation-type substrate holding device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Vacuum container 8 Base plate 11 Support plate 12 Bellows 13 Revolution member 13a Revolution shaft part 13b Radial extension part 13c Partition plate 14 Inner tube 16 Rotation drive device 17 Rotation member 17c Substrate holder 25 Intermediate gear 26 First stage gear 27 Rotation drive device 29 Water supply device

Claims (1)

[Claims] 1. A substrate holder that is disposed in a vacuum container included in a film forming apparatus and holds a substrate to be film-formed, and a driving force applied from the outside of the vacuum container to hold the substrate holder. In a revolving-type substrate holding device having a power transmission mechanism for revolving and rotating, a cooling water passage communicating with each other is formed inside each of the revolution member of the power transmission mechanism and the rotation member including the substrate holder. A cooling water supply device connected to an inlet / outlet of a cooling water passage of the revolution member is provided outside the vacuum container, and the cooling water is supplied from the cooling water supply device to the revolution member and the rotation member in a circulating manner. A self-revolving substrate holding device, wherein the substrate holder is cooled.