JPH0820721A - Polyimide film and its production - Google Patents

Polyimide film and its production

Info

Publication number
JPH0820721A
JPH0820721A JP17597894A JP17597894A JPH0820721A JP H0820721 A JPH0820721 A JP H0820721A JP 17597894 A JP17597894 A JP 17597894A JP 17597894 A JP17597894 A JP 17597894A JP H0820721 A JPH0820721 A JP H0820721A
Authority
JP
Japan
Prior art keywords
polyimide
film
added
polyamic acid
polyimide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17597894A
Other languages
Japanese (ja)
Inventor
Atsushi Sugitani
厚志 杉谷
Ichiro Kaneko
一郎 金子
Masahiro Yuyama
昌弘 湯山
Kiyoshi Motoumi
清 本海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP17597894A priority Critical patent/JPH0820721A/en
Publication of JPH0820721A publication Critical patent/JPH0820721A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0373Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers

Abstract

PURPOSE:To obtain a polyimide film whose surface has fine projections and which is excellent in surface lubricity and heat resistance and suitable for a flexible printed circuit substrate by mixing specific polyimides. CONSTITUTION:This film contains 5-20wt.% fine polyimide particles dispersed therein and having repeating units of the formula and has projections formed by the particles on its surface. The film is obtd. by reacting an arom. tetracarboxylic dianhydride with an arom. diamine in an org. solvent contg. the polyimide dissolved therein and forming the resultant polyamic acid into film. The polyimide having repeating units of the formula is obtd. by reacting bis [4-(4-aminophenoxy)phenyl]] sulfone with 3,3'4,4'- diphenylsulfonetetracarboxylic dianhydride in an org. polar solvent and subjecting the resultant product to imidization by dehydration.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ファインパターン化フ
レキシブルプリント配線基板等の基板フィルムとして好
適に用いられる表面滑性に優れたポリイミドフィルム及
びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polyimide film having excellent surface smoothness, which is preferably used as a substrate film for a fine patterned flexible printed wiring board or the like, and a method for producing the same.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来、
ポリイミドフィルムは、耐熱性、耐薬品性、機械的強
度、電気特性等に優れていることから、耐熱性材料や積
層板、フレキシブルプリント基板等に好適に使用されて
きた。
2. Description of the Related Art Conventionally, the problems to be solved by the invention
Since the polyimide film is excellent in heat resistance, chemical resistance, mechanical strength, electrical characteristics, etc., it has been suitably used as a heat resistant material, a laminated plate, a flexible printed circuit board and the like.

【0003】しかしながら、表面処理されていないポリ
イミドフィルムは、銅箔とラミネートする際にロール等
との摩擦が大きく、皺ができ、ロールに巻き付いたりす
る等のトラブルを生じることがあり、それ故ポリイミド
フィルムの表面滑性を改善する必要があった。
However, a polyimide film that has not been surface-treated has a large friction with a roll or the like when laminated with a copper foil, and wrinkles may occur, which may cause troubles such as winding around the roll. There was a need to improve the surface lubricity of the film.

【0004】従来、ポリイミドフィルムの表面活性への
改善手段として、サンドブラスト、エンボス加工等によ
る表面処理や、ポリイミドフィルムにリン酸カルシウム
(特開昭62−68852号公報)やシリカ(特開昭6
2−68853号公報)等の無機微粒子を混合し、フィ
ルム表面に微細な突起を生じさせて表面摩擦を減らす方
法が採用されてきた。
Conventionally, as a means for improving the surface activity of a polyimide film, surface treatment such as sand blasting or embossing, or a polyimide film having calcium phosphate (JP-A-62-68852) or silica (JP-A-6-68852).
No. 2-68853) and the like are mixed to form fine protrusions on the film surface to reduce surface friction.

【0005】しかしながら、前者の表面処理の方法は、
フィルム表面に過度の凹凸をつくり、フィルムの外観が
損なわれ易いという欠点があった。また、後者の方法で
は、上述の無機微粒子がポリアミド酸溶液に均一に分散
し難く、分散せずに塊となって残る上、無機微粒子が不
純物を含むことからフィルムの電気特性等に悪影響を及
ぼすといった欠点があった。更に、これら無機微粒子と
ポリイミド重合体との間には、全く反応性がなく、直接
的な結合も無いため、過度に配合すると機械的強度が低
下することもあった。
However, the former method of surface treatment is
It has a drawback that the film surface is excessively roughened and the appearance of the film is easily damaged. In the latter method, the above-mentioned inorganic fine particles are difficult to uniformly disperse in the polyamic acid solution and remain as a lump without being dispersed, and the inorganic fine particles contain impurities, which adversely affect the electrical properties of the film. There was a drawback. Further, since there is no reactivity between the inorganic fine particles and the polyimide polymer and there is no direct bond, the mechanical strength may be lowered if they are blended excessively.

【0006】本発明は上記事情に鑑みなされたもので、
フィルムの表面滑性に優れ、耐熱性、機械的強度、電気
特性等の諸特性が良好なポリイミドフィルム及びその製
造方法を提供することを目的とする。
The present invention has been made in view of the above circumstances.
An object of the present invention is to provide a polyimide film having excellent properties such as heat resistance, mechanical strength, and electrical properties, which is excellent in surface smoothness of the film, and a method for producing the same.

【0007】[0007]

【課題を解決するための手段及び作用】本発明者らは上
記目的を達成するために鋭意検討を重ねた結果、ポリイ
ミドフィルム中に下記式(A)の繰り返し単位を持つポ
リイミドを混合することにより、フィルム表面に微細な
突起を生じさせることができ、フィルムの表面滑性に優
れ、なおかつ耐熱性にも優れたポリイミドフィルムが得
られることを見い出した。
Means and Actions for Solving the Problems As a result of intensive studies for achieving the above object, the present inventors have found that a polyimide film having a repeating unit represented by the following formula (A) is mixed in the polyimide film. It has been found that a polyimide film can be obtained in which fine projections can be generated on the film surface, the surface smoothness of the film is excellent, and the heat resistance is also excellent.

【0008】[0008]

【化2】 Embedded image

【0009】更に、このようなポリイミドフィルムの製
造方法として、ビス(4−(4−アミノフェノキシ)フ
ェニル)スルホン(BAPS)と3,3’,4,4’−
ジフェニルスルホンテトラカルボン酸二無水物(DSD
A)とを有機極性溶媒中で反応させて脱水イミド化を行
うことにより得られる、フィルムの突起となる上記式
(A)の繰り返し単位を有するポリイミドを有機極性溶
媒中に溶解した中で、芳香族テトラカルボン酸二無水物
と芳香族ジアミンとを反応させてポリアミド酸溶液を調
製し、これを成膜イミド化することによって、上述の優
れた特性を有するポリイミドフィルムを工業的に有利に
製造できることを見い出した。
Further, as a method for producing such a polyimide film, bis (4- (4-aminophenoxy) phenyl) sulfone (BAPS) and 3,3 ', 4,4'-
Diphenyl sulfone tetracarboxylic acid dianhydride (DSD
A) is dissolved in an organic polar solvent to obtain a polyimide having a repeating unit of the above formula (A) to be a protrusion of the film, which is obtained by performing a dehydration imidization by reacting with A) in an organic polar solvent. A polyamic acid solution is prepared by reacting a group tetracarboxylic acid dianhydride and an aromatic diamine, and by imidizing the polyamic acid solution into a film, a polyimide film having the above-mentioned excellent properties can be industrially advantageously produced. Found out.

【0010】この場合、上記式(A)のポリイミドは溶
剤可溶性であり、この式(A)のポリイミドを有機極性
溶媒に溶解し、このポリイミド(A)を溶解含有する有
機極性溶媒中で芳香族テトラカルボン酸二無水物と芳香
族ジアミンとを反応させて得られたポリアミド酸を成膜
イミド化する際、フィルム表面に上記式(A)の突起が
生じる理由は定かではないが、上記方法によりポリイミ
ドフィルム表面に微細な突起を形成し、フィルム表面の
滑り性が良くなる上、機械的強度が落ちず、無機微粒子
等を含まず、フィルムの透明性に優れ、しかも突起の剥
落もなく、更に耐熱性にも優れていることを知見し、本
発明をなすに至った。
In this case, the polyimide of the formula (A) is soluble in a solvent, the polyimide of the formula (A) is dissolved in an organic polar solvent, and the aromatic compound is dissolved in an organic polar solvent containing the polyimide (A). When polyamic acid obtained by reacting tetracarboxylic dianhydride and aromatic diamine is subjected to film formation imidization, the reason why the protrusion of the above formula (A) occurs on the film surface is not clear, but by the above method Forming fine protrusions on the polyimide film surface, improving the slipperiness of the film surface, mechanical strength does not decrease, does not contain inorganic fine particles, etc., excellent in transparency of the film, and there is no protrusion of protrusions. The inventors have found that they also have excellent heat resistance, and have completed the present invention.

【0011】従って、本発明は、下記式(A)で示され
る繰り返し単位を有するポリイミドの微粒子が5〜20
重量%分散され、表面に該ポリイミド微粒子の突起を有
してなるポリイミドフィルム、及び下記式(A)で示さ
れる繰り返し単位を有するポリイミドを溶解した有機極
性溶媒中で芳香族テトラカルボン酸二無水物と芳香族ジ
アミンとを反応させてポリアミド酸を得、次いでこれを
成膜イミド化することを特徴とする上記のポリイミドフ
ィルムの製造方法を提供する。
Therefore, in the present invention, the fine particles of polyimide having a repeating unit represented by the following formula (A) are 5 to 20.
Aromatic tetracarboxylic acid dianhydride in a polar organic solvent in which a polyimide film having a protrusion of fine polyimide particles dispersed on the surface and a polyimide having a repeating unit represented by the following formula (A) is dissolved. And a aromatic diamine are reacted to obtain a polyamic acid, which is then imidized to form a film.

【0012】[0012]

【化3】 Embedded image

【0013】以下、本発明につき更に詳しく説明すると
本発明のポリイミドフィルムは、下記式(A)で示され
る繰り返し単位を有するポリイミドが均一に分散含有
し、該ポリイミドにより表面に微小突起が形成されてな
るものである。ここで、式(A)で示されるポリイミド
のポリイミドフィルム中の含有量は、5〜20%(重量
%、以下同様)であることが好ましい。5%より少ない
とフィルム表面の突起が少なく、表面滑性が十分得られ
ない場合があり、20%より多いとフィルム物性が低下
することがある。
The present invention will be described in more detail below. In the polyimide film of the present invention, a polyimide having a repeating unit represented by the following formula (A) is uniformly dispersed and contained, and fine protrusions are formed on the surface by the polyimide. It will be. Here, the content of the polyimide represented by the formula (A) in the polyimide film is preferably 5 to 20% (% by weight, the same applies hereinafter). If it is less than 5%, the projections on the surface of the film are few and the surface smoothness may not be obtained in some cases, and if it is more than 20%, the physical properties of the film may deteriorate.

【0014】[0014]

【化4】 [Chemical 4]

【0015】本発明において上記式(A)の繰り返し単
位を有するポリイミドは重合体であり、分子量として
0.5g/100mlDMF(N,N−ジメチルホルム
アミド)中、30℃での対数粘度が0.1〜1.5であ
ることが好ましい。
In the present invention, the polyimide having the repeating unit of the above formula (A) is a polymer and has a logarithmic viscosity of 0.1 at 30 ° C. in a molecular weight of 0.5 g / 100 ml DMF (N, N-dimethylformamide). It is preferably ˜1.5.

【0016】なお、対数粘度はポリイミド濃度が0.5
g/100mlDMFの溶液を使用し、30℃の測定条
件で測定した結果より、次式で求めることができる。
The logarithmic viscosity is such that the polyimide concentration is 0.5.
It can be determined by the following formula from the result of measurement using a solution of g / 100 ml DMF under measurement conditions of 30 ° C.

【0017】[0017]

【数1】 [Equation 1]

【0018】上記ポリイミドフィルムを製造する場合、
上記式(A)のポリイミドを有機極性溶媒に溶解し、こ
の溶媒中で芳香族テトラカルボン酸二無水物と芳香族ジ
アミンとを反応させてポリアミド酸を得、次いでこれを
成膜イミド化する方法を採用することができる。
When manufacturing the above-mentioned polyimide film,
A method of dissolving the polyimide of the above formula (A) in an organic polar solvent, reacting the aromatic tetracarboxylic dianhydride and the aromatic diamine in this solvent to obtain a polyamic acid, and then subjecting this to film formation imidization Can be adopted.

【0019】この場合、まず式(A)のポリイミドを得
る方法につき説明すると、このポリイミドを得る方法と
しては、(1)ビス(4−(4−アミノフェノキシ)フ
ェニル)スルホン(BAPS)と3,3’,4,4’−
ジフェニルスルホンテトラカルボン酸二無水物(DSD
A)とを常温で有機極性溶媒中において反応させ、更に
この反応系を60〜80℃に昇温し、脱水剤及び触媒を
加え、脱水イミド化させる方法、(2)ビス(4−(4
−アミノフェノキシ)フェニル)スルホン(BAPS)
と3,3’,4,4’−ジフェニルスルホンテトラカル
ボン酸二無水物(DSDA)とを常温で有機極性溶媒中
において反応させ、更にこの反応系にトルエンを加え、
140〜200℃に昇温して熱的に閉環させ、生じてく
る水をトルエンと共沸させて反応系外に除去してポリイ
ミド溶液を得、次にこのポリイミド溶液をメタノールに
再沈させて瀘過し、乾燥することによる方法等、種々の
方法により得ることができる。
In this case, first, the method for obtaining the polyimide of the formula (A) will be described. As the method for obtaining the polyimide, (1) bis (4- (4-aminophenoxy) phenyl) sulfone (BAPS) and 3, 3 ', 4, 4'-
Diphenyl sulfone tetracarboxylic acid dianhydride (DSD
(2) Bis (4- (4), in which the reaction system (A) is reacted in an organic polar solvent at room temperature, the temperature of the reaction system is further raised to 60 to 80 ° C, and a dehydrating agent and a catalyst are added to dehydrate imidize.
-Aminophenoxy) phenyl) sulfone (BAPS)
And 3,3 ′, 4,4′-diphenylsulfone tetracarboxylic acid dianhydride (DSDA) are reacted in an organic polar solvent at room temperature, and toluene is further added to this reaction system,
The temperature was raised to 140 to 200 ° C. to thermally close the ring, and the generated water was azeotropically distilled with toluene to remove it from the reaction system to obtain a polyimide solution, and then the polyimide solution was reprecipitated in methanol. It can be obtained by various methods such as a method of filtering and drying.

【0020】ここで、(1)の方法において用いられる
脱水剤としては、脂肪族酸無水物の無水酢酸、無水プロ
ピオン酸、無水酪酸等が好ましく、また、触媒として
は、トリエチルアミン、トリメチルアミン、ジ−n−ブ
チルアミン、ピリジン、α−,β−,γ−ピコリン、イ
ソキノリン、ジメチルアニリン、トリエチレンジアミ
ン、ジメチルアミン等の三級アミンが好ましい。
Here, the dehydrating agent used in the method (1) is preferably an aliphatic acid anhydride such as acetic anhydride, propionic acid, butyric anhydride, and the catalyst is triethylamine, trimethylamine, di- Tertiary amines such as n-butylamine, pyridine, α-, β-, γ-picoline, isoquinoline, dimethylaniline, triethylenediamine and dimethylamine are preferable.

【0021】また、式(A)のポリイミドは、比較的、
低重合度であることが成膜用のポリアミド酸溶液に均一
に溶解する上で好ましい。従って、重合する際のBAP
SとDSDAとのモル比としては、全量を100とする
と、BAPS30〜49に対してDSDA70〜51、
またはBAPS70〜51に対してDSDA30〜49
の範囲内での使用が好ましい。
Further, the polyimide of the formula (A) is relatively
A low degree of polymerization is preferred for uniform dissolution in the polyamic acid solution for film formation. Therefore, when polymerizing BAP
As for the molar ratio of S and DSDA, assuming that the total amount is 100, DSDA 70 to 51 relative to BAPS 30 to 49,
Or BAPS 70-51 for DSDA 30-49
Use within the range is preferred.

【0022】本発明においては、このようにして得られ
る式(A)で示されるポリイミドを有機極性溶媒中に溶
解し、芳香族ジアミンと芳香族テトラカルボン酸二無水
物とを添加し、ポリアミド酸溶液を得るものであるが、
ここで使用する有機極性溶媒としては、N,N−ジメチ
ルアセトアミド、N,N−ジメチルホルムアミド、N−
メチル−2−ピロリドン、ジメチルスルホキシド等を挙
げることができる。
In the present invention, the thus obtained polyimide represented by the formula (A) is dissolved in an organic polar solvent, and an aromatic diamine and an aromatic tetracarboxylic acid dianhydride are added to the polyamic acid. To get a solution,
As the organic polar solvent used here, N, N-dimethylacetamide, N, N-dimethylformamide, N-
Methyl-2-pyrrolidone, dimethyl sulfoxide and the like can be mentioned.

【0023】また、式(A)のポリイミドの配合量は、
得られるポリアミド酸溶液中のポリアミド酸固形分に対
して5〜20%となるような量とすることが好ましい。
Further, the compounding amount of the polyimide of the formula (A) is
The amount is preferably 5 to 20% with respect to the polyamic acid solid content in the obtained polyamic acid solution.

【0024】また、ポリイミドフィルムの原料となる芳
香族ジアミンとして例えば4,4’−ジアミノジフェニ
ルエーテル、4,4’−ジアミノジフェニルメタン、
4,4’−ジアミノジフェニルプロパン、4,4’−ジ
アミノジフェニルスルホン、3,3’−ジアミノジフェ
ニルスルホン、4,4’−ジアミノジフェニルスルフィ
ド、m−フェニレンジアミン、p−フェニレンジアミ
ン、m−トルイレンジアミン、p−トルイレンジアミ
ン、ベンジジン、1,5−ジアミノナフタレン、1,3
−ビス(4−アミノフェノキシ)ベンゼン、1,4−ビ
ス(4−アミノフェノキシ)ベンゼン、4,4’−ビス
(4−アミノフェノキシ)ビフェニル、2,2−ビス
(4−(4−アミノフェノキシ)フェニル)プロパン、
2,2−ビス(4−(4−アミノフェノキシ)フェニ
ル)へキサフルオロプロパン、4,4’−ジアミノベン
ズアニリド、3,3’−ジヒドロキシ−4,4’−ジア
ミノビフェニル、1,4−ジアミノアントラキノン、
2,6−ジアミノアントラキノン、2,6−ジアミノピ
リジンなどが挙げられる。
As the aromatic diamine used as the raw material for the polyimide film, for example, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane,
4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfide, m-phenylenediamine, p-phenylenediamine, m-toluylenediene Amine, p-toluylene diamine, benzidine, 1,5-diaminonaphthalene, 1,3
-Bis (4-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene, 4,4'-bis (4-aminophenoxy) biphenyl, 2,2-bis (4- (4-aminophenoxy) ) Phenyl) propane,
2,2-bis (4- (4-aminophenoxy) phenyl) hexafluoropropane, 4,4'-diaminobenzanilide, 3,3'-dihydroxy-4,4'-diaminobiphenyl, 1,4-diamino Anthraquinone,
2,6-diaminoanthraquinone, 2,6-diaminopyridine and the like can be mentioned.

【0025】一方、芳香族テトラカルボン酸二無水物と
しては、例えばピロメリット酸二無水物、3,3’,
4,4’−ビフェニルテトラカルボン酸二無水物、ジフ
ェニルエーテルテトラカルボン酸二無水物、ベンゾフェ
ノンテトラカルボン酸二無水物、2,3,6,7−ナフ
タレンテトラカルボン酸二無水物などが挙げられる。
On the other hand, examples of the aromatic tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3 ′,
4,4'-biphenyl tetracarboxylic dianhydride, diphenyl ether tetracarboxylic dianhydride, benzophenone tetracarboxylic dianhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride and the like can be mentioned.

【0026】これらフィルム原料の芳香族テトラカルボ
ン酸二無水物及び芳香族ジアミンの仕込割合としては、
特に制限されないが、ほぼ等モルとすることができる。
The charging ratio of the aromatic tetracarboxylic dianhydride and the aromatic diamine of these film raw materials is as follows.
Although it is not particularly limited, it can be approximately equimolar.

【0027】更に、フィルム原料のポリアミド酸溶液を
得るための反応手順としては、先に芳香族ジアミンをポ
リイミドが懸濁した有機極性溶媒に溶解し、後から酸二
無水物を添加する方法や、逆に酸二無水物を有機極性溶
媒に溶解してからジアミンを添加する方法、両者を混合
してから溶媒に添加する方法など何れでも可能である。
なお、反応条件は、特に限定されないが、発熱を抑え
て、40℃以下で、ポリアミド酸が溶液中で10〜20
%濃度となるように行うことが好ましい。
Further, as a reaction procedure for obtaining a polyamic acid solution as a film raw material, a method of first dissolving an aromatic diamine in an organic polar solvent in which polyimide is suspended, and then adding an acid dianhydride, On the contrary, any of a method of dissolving the acid dianhydride in an organic polar solvent and then adding the diamine, a method of mixing both and then adding to the solvent is possible.
In addition, the reaction conditions are not particularly limited, but the heat generation is suppressed and the polyamic acid is contained in the solution at 10 to 20 ° C. for 10 to 20 ° C. or less.
It is preferable to perform it so that the concentration becomes%.

【0028】上記式(A)で示されるポリイミドを含有
したポリアミド酸溶液からポリイミドフィルムを得る方
法としては、通常のポリアミド酸溶液からのポリイミド
フィルムの製造方法と同様の方法で行うことができ、ポ
リアミド酸溶液をガラス板等の平らな板に流延し、予備
乾燥し、剥離してから両端を保持して150〜250℃
で脱溶剤、300〜450℃で加熱イミド化する方法、
成膜時に脱水剤、触媒を加えて脱水閉環する化学イミド
化等の方法を挙げることができる。ここで、化学イミド
化に使用する脱水剤としては、脂肪族酸無水物の無水酢
酸、無水プロピオン酸、無水酪酸等が好ましい。触媒と
しては、ピリジン、α−,β−,γ−ピコリン、イソキ
ノリン、ジメチルアニリン、トリエチレンジアミン、ジ
メチルアミン等の三級アミンが好ましい。
As a method for obtaining a polyimide film from a polyamic acid solution containing the polyimide represented by the above formula (A), a method similar to the method for producing a polyimide film from a usual polyamic acid solution can be used. The acid solution is cast on a flat plate such as a glass plate, pre-dried, peeled off, and then both ends are held at 150 to 250 ° C.
Desolvation with a method of heating and imidization at 300 ~ 450 ℃
A method such as chemical imidization in which a dehydrating agent and a catalyst are added at the time of film formation to effect dehydration ring closure can be mentioned. Here, as the dehydrating agent used for the chemical imidization, acetic anhydride, propionic anhydride, butyric anhydride, etc., which are aliphatic acid anhydrides, are preferable. As the catalyst, tertiary amines such as pyridine, α-, β-, γ-picoline, isoquinoline, dimethylaniline, triethylenediamine and dimethylamine are preferable.

【0029】上記の方法のようにして得られたポリイミ
ドフィルムは、上記式(A)で示されるポリイミドを含
有していることにより、透明性に優れ、異物感がなく、
表面に微細な突起を有するために、ポリイミドフィルム
の表面活性に優れ、また、ポリイミドフィルム本来の特
性である機械的強度、耐熱性を保持し得るものであるた
め、ファインパターン化フレキシブルフィルム等のフレ
キシブルプリント基板等に好適に用いられる。
Since the polyimide film obtained by the above method contains the polyimide represented by the above formula (A), it has excellent transparency and is free from the feeling of foreign matter.
Since it has fine protrusions on the surface, it is excellent in the surface activity of the polyimide film, and because it can retain the mechanical strength and heat resistance that are the original properties of the polyimide film, it is flexible such as a fine patterned flexible film. It is preferably used for printed circuit boards and the like.

【0030】[0030]

【実施例】以下、実施例と比較例を示し、本発明を具体
的に説明するが、本発明は下記の実施例に制限されるも
のではない。なお、下記例において、%は重量%を示
す。
EXAMPLES The present invention will be described below in detail with reference to examples and comparative examples, but the present invention is not limited to the following examples. In the following examples,% means% by weight.

【0031】[実施例1]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
0g(0.02312mol)、DSDAを12.42
5g(0.03468mol)仕込み、窒素ガスを流し
ながら25℃で30分間反応させた。次に系内を60℃
に上げて、3時間攪拌を続けた。このポリアミド酸溶液
に無水酢酸12ml、トリエチルアミン1.6mlを加
え、60℃で5時間反応させ、ポリアミド酸を脱水して
ポリイミドとした。このポリイミド溶液を多量のメタノ
ールに加え、再沈し、瀘過後、乾燥してポリイミドを得
た。
[Example 1] N, N in a 500 ml flask
-Take 200 g of dimethylformamide and add BAPS to 1
0g (0.02312 mol), 12.42 of DSDA
5 g (0.03468 mol) was charged, and the mixture was reacted at 25 ° C. for 30 minutes while flowing nitrogen gas. Next, the system temperature is 60 ℃
And continued to stir for 3 hours. To this polyamic acid solution, 12 ml of acetic anhydride and 1.6 ml of triethylamine were added and reacted at 60 ° C. for 5 hours to dehydrate the polyamic acid to obtain a polyimide. This polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0032】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上述のポリイミド
を4.59g加え、良く攪拌して溶解した。これにジア
ミノジフェニルエーテル10.012g(0.05mo
l)を投入して溶解し、更にピロメリット酸二無水物1
0.906g(0.05mol)を発熱を抑えながら徐
々に添加してポリアミド酸溶液を調製した。
Next, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, and 4.59 g of the above-mentioned polyimide was added and dissolved by stirring well. Diaminodiphenyl ether 10.12g (0.05mo
l) is added and dissolved, and pyromellitic dianhydride 1 is further added.
0.906 g (0.05 mol) was gradually added while suppressing heat generation to prepare a polyamic acid solution.

【0033】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察すると、フ
ィルム表面に直径0.5〜1μmの微小突起が多数観察
された。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and kept at 200 ° C., 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, many fine protrusions having a diameter of 0.5 to 1 μm were observed on the film surface.

【0034】[実施例2]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
5g(0.03468mol)、DSDAを8.283
g(0.02312mol)仕込み、窒素ガスを流しな
がら25℃で30分間反応させた。次に系内を60℃に
上げて、3時間攪拌を続けた。このポリアミド酸溶液に
無水酢酸12ml、トリエチルアミン1.6mlを加
え、60℃で5時間反応させ、ポリアミド酸を脱水して
ポリイミドとした。このポリイミド溶液を多量のメタノ
ールに加え、再沈し、瀘過後、乾燥してポリイミドを得
た。
[Example 2] N, N in a 500 ml flask
-Take 200 g of dimethylformamide and add BAPS to 1
5 g (0.03468 mol), DSDA 8.283
g (0.02312 mol) was charged, and the mixture was reacted at 25 ° C. for 30 minutes while flowing nitrogen gas. Next, the temperature inside the system was raised to 60 ° C., and stirring was continued for 3 hours. To this polyamic acid solution, 12 ml of acetic anhydride and 1.6 ml of triethylamine were added and reacted at 60 ° C. for 5 hours to dehydrate the polyamic acid to obtain a polyimide. This polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0035】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上のポリイミドを
3.69g加え、良く攪拌して溶解し、これにジアミノ
ジフェニルエーテル10.012g(0.05mol)
を投入して溶解し、更にピロメリット酸二無水物10.
906g(0.05mol)を発熱を抑えながら徐々に
添加してポリアミド酸溶液を調製した。
Next, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, and 3.69 g of the above polyimide was added and dissolved by stirring well, and 10.12 g (0.05 mol) of diaminodiphenyl ether was added thereto.
Is added and dissolved, and further pyromellitic dianhydride 10.
A polyamic acid solution was prepared by gradually adding 906 g (0.05 mol) while suppressing heat generation.

【0036】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察すると、実
施例1と同様な突起が観察された。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and kept at 200 ° C., 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, the same protrusions as in Example 1 were observed.

【0037】[実施例3]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
0g(0.02312mol)、DSDAを9.112
g(0.02543mol)仕込み、窒素ガスを流しな
がら25℃で30分間反応させた。次に系内を60℃に
上げて、3時間攪拌を続けた。このポリアミド酸溶液に
無水酢酸12ml、トリエチルアミン1.6mlを加
え、60℃で5時間反応させ、ポリアミド酸を脱水して
ポリイミドとした。このポリイミド溶液を多量のメタノ
ールに加え、再沈し、瀘過後、乾燥してポリイミドを得
た。
[Example 3] N, N in a 500 ml flask
-Take 200 g of dimethylformamide and add BAPS to 1
0g (0.02312 mol), DSDA 9.112
g (0.02543 mol) was charged, and the reaction was carried out at 25 ° C. for 30 minutes while flowing a nitrogen gas. Next, the temperature inside the system was raised to 60 ° C., and stirring was continued for 3 hours. To this polyamic acid solution, 12 ml of acetic anhydride and 1.6 ml of triethylamine were added and reacted at 60 ° C. for 5 hours to dehydrate the polyamic acid to obtain a polyimide. This polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0038】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上述のポリイミド
を2.324g加え、良く攪拌して溶解し、これにジア
ミノジフェニルエーテル10.012g(0.05mo
l)を投入して溶解し、更にピロメリット酸二無水物1
0.906g(0.05mol)を発熱を抑えながら徐
々に添加してポリアミド酸溶液を調製した。
Next, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, 2.324 g of the above-mentioned polyimide was added, and the mixture was stirred well to dissolve it, and 10.12 g of diaminodiphenyl ether (0.05 mo) was added thereto.
l) is added and dissolved, and pyromellitic dianhydride 1 is further added.
0.906 g (0.05 mol) was gradually added while suppressing heat generation to prepare a polyamic acid solution.

【0039】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察すると、フ
ィルム表面に直径0.5〜2μmの微小突起が多数観察
された。
This polyamic acid solution was spread thinly on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and kept at 200 ° C., 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, many fine protrusions having a diameter of 0.5 to 2 μm were observed on the surface of the film.

【0040】[実施例4]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
0g(0.02312mol)、DSDAを8.698
g(0.02428mol)仕込み、窒素ガスを流しな
がら25℃で30分間反応させた。次に系内を60℃に
上げて、3時間攪拌を続けた。このポリアミド酸溶液に
無水酢酸12ml、トリエチルアミン1.6mlを加
え、60℃で5時間反応させ、ポリアミド酸を脱水して
ポリイミドとした。このポリイミド溶液を多量のメタノ
ールに加え、再沈し、瀘過後、乾燥してポリイミドを得
た。
Example 4 N, N was added to a 500 ml flask.
-Take 200 g of dimethylformamide and add BAPS to 1
0 g (0.02312 mol), DSDA 8.698
g (0.02428 mol) was charged, and the reaction was carried out at 25 ° C. for 30 minutes while flowing a nitrogen gas. Next, the temperature inside the system was raised to 60 ° C., and stirring was continued for 3 hours. To this polyamic acid solution, 12 ml of acetic anhydride and 1.6 ml of triethylamine were added and reacted at 60 ° C. for 5 hours to dehydrate the polyamic acid to obtain a polyimide. This polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0041】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上述のポリイミド
を1.101g加え、良く攪拌して溶解し、これにジア
ミノジフェニルエーテル10.012g(0.05mo
l)を投入して溶解し、更にピロメリット酸二無水物1
0.906g(0.05mol)を発熱を抑えながら徐
々に添加してポリアミド酸溶液を調製した。
Then, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, 1.101 g of the above-mentioned polyimide was added, and the mixture was dissolved by stirring well, and 10.12 g of diaminodiphenyl ether (0.05 mo) was added.
l) is added and dissolved, and pyromellitic dianhydride 1 is further added.
0.906 g (0.05 mol) was gradually added while suppressing heat generation to prepare a polyamic acid solution.

【0042】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察すると、フ
ィルム表面に直径0.5〜1μmの微小突起が多数観察
された。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and 200 ° C. at 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, many fine protrusions having a diameter of 0.5 to 1 μm were observed on the film surface.

【0043】[実施例5]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
0g(0.02312mol)、DSDAを8.698
g(0.02428mol)仕込み、窒素ガスを流しな
がら25℃で30分間反応させた。次にトルエン80m
lを加え、1時間加熱しながら系内を140℃まで昇温
し、留出してくる水をトルエンと共に系外に排除してい
き、更に還流下で8時間加熱し、留出してくる水分を除
いてポリイミドとした。この反応系を25℃まで冷却
し、このポリイミド溶液を多量のメタノールに加え、再
沈し、瀘過後、乾燥してポリイミドを得た。
Example 5 N, N was added to a 500 ml flask.
-Take 200 g of dimethylformamide and add BAPS to 1
0 g (0.02312 mol), DSDA 8.698
g (0.02428 mol) was charged, and the reaction was carried out at 25 ° C. for 30 minutes while flowing a nitrogen gas. Next, 80 m of toluene
1 was added and the temperature in the system was raised to 140 ° C. while heating for 1 hour, and distilled water was removed from the system together with toluene, and further heated under reflux for 8 hours to remove the distilled water. Except for polyimide. The reaction system was cooled to 25 ° C., the polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0044】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上述のポリイミド
を2.324g加え、良く攪拌して溶解し、これにジア
ミノジフェニルエーテル10.012g(0.05mo
l)を投入して溶解し、更にピロメリット酸二無水物1
0.906g(0.05mol)を発熱を抑えながら徐
々に添加してポリアミド酸溶液を調製した。
Next, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, 2.324 g of the above-mentioned polyimide was added, and the mixture was stirred well to dissolve it. Then, 10.12 g of diaminodiphenyl ether (0.05 mo) was added.
l) is added and dissolved, and pyromellitic dianhydride 1 is further added.
0.906 g (0.05 mol) was gradually added while suppressing heat generation to prepare a polyamic acid solution.

【0045】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察するとフィ
ルム表面に直径0.5μm程度の微小突起が多数観察さ
れた。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and 200 ° C. at 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, many fine protrusions having a diameter of about 0.5 μm were observed on the surface of the film.

【0046】[実施例6]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
0g(0.02312mol)、DSDAを9.526
g(0.02659mol)仕込み、窒素ガスを流しな
がら25℃で30分間反応させた。次にトルエン80m
lを加え、1時間加熱しながら系内を140℃まで昇温
し、留出してくる水をトルエンと共に系外に排除してい
き、更に還流下で8時間加熱し、留出してくる水分を除
いてポリイミドとした。この反応系を25℃まで冷却
し、このポリイミド溶液を多量のメタノールに加え、再
沈し、瀘過後、乾燥しポリイミドを得た。
[Example 6] N, N in a 500 ml flask
-Take 200 g of dimethylformamide and add BAPS to 1
0g (0.02312 mol), DSDA 9.526
g (0.02659 mol) was charged, and the mixture was reacted at 25 ° C. for 30 minutes while flowing nitrogen gas. Next, 80 m of toluene
1 was added and the temperature in the system was raised to 140 ° C. while heating for 1 hour, and distilled water was removed from the system together with toluene, and further heated under reflux for 8 hours to remove the distilled water. Except for polyimide. This reaction system was cooled to 25 ° C., and this polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0047】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上述のポリイミド
を3.3691g加え、良く攪拌して溶解し、これにジ
アミノジフェニルエーテル10.012g(0.05m
ol)を投入して溶解し、更にピロメリット酸二無水物
10.906g(0.05mol)を発熱を抑えながら
徐々に添加してポリアミド酸溶液を調製した。
Then, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, 3.3691 g of the above-mentioned polyimide was added, and the mixture was stirred well to dissolve it. Then, 10.12 g of diaminodiphenyl ether (0.05 m) was added.
Ol) was added and dissolved, and 10.906 g (0.05 mol) of pyromellitic dianhydride was gradually added while suppressing heat generation to prepare a polyamic acid solution.

【0048】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察すると、フ
ィルム表面に直径0.5〜1μmの微小突起が多数観察
された。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, then peeled off, fixed on an iron frame, and kept at 200 ° C., 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, many fine protrusions having a diameter of 0.5 to 1 μm were observed on the film surface.

【0049】[比較例1]500mlフラスコにN,N
−ジメチルホルムアミド153.4gを取り、窒素ガス
を流しながら、ジアミノジフェニルエーテル10.01
2g(0.05mol)を投入して溶解し、次にピロメ
リット酸二無水物10.906g(0.05mol)を
発熱を抑えながら12%のポリアミド酸溶液を調製し
た。
[Comparative Example 1] N, N was added to a 500 ml flask.
Taking 153.4 g of dimethylformamide, dinitrodiphenyl ether 10.01 while flowing nitrogen gas.
2 g (0.05 mol) was added and dissolved, and then 10.906 g (0.05 mol) pyromellitic dianhydride was prepared to prepare a 12% polyamic acid solution while suppressing heat generation.

【0050】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and kept at 200 ° C., 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm.

【0051】[比較例2]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
0g(0.02312mol)、DSDAを12.42
5g(0.03468mol)仕込み、窒素ガスを流し
ながら25℃で30分間反応させた。次に系内を60℃
に上げて、3時間攪拌を続けた。このポリアミド酸溶液
に無水酢酸12ml、トリエチルアミン1.6mlを加
え、60℃で5時間反応させ、ポリアミド酸を脱水し、
ポリイミドとした。このポリイミド溶液を多量のメタノ
ールに加え、再沈し、瀘過後、乾燥してポリイミドを得
た。
[Comparative Example 2] N, N was added to a 500 ml flask.
-Take 200 g of dimethylformamide and add BAPS to 1
0g (0.02312 mol), 12.42 of DSDA
5 g (0.03468 mol) was charged, and the mixture was reacted at 25 ° C. for 30 minutes while flowing nitrogen gas. Next, the system temperature is 60 ℃
And continued to stir for 3 hours. To this polyamic acid solution, 12 ml of acetic anhydride and 1.6 ml of triethylamine were added, and the mixture was reacted at 60 ° C. for 5 hours to dehydrate the polyamic acid,
Polyimide was used. This polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0052】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上述のポリイミド
を0.647g加え、良く攪拌して溶解した。これにジ
アミノジフェニルエーテル10.012g(0.05m
ol)を投入して溶解し、更にピロメリット酸二無水物
10.906g(0.05mol)を発熱を抑えながら
徐々に添加してポリアミド酸溶液を調製した。
Next, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, 0.647 g of the above-mentioned polyimide was added, and the mixture was stirred well and dissolved. Diaminodiphenyl ether 10.12g (0.05m
Ol) was added and dissolved, and 10.906 g (0.05 mol) of pyromellitic dianhydride was gradually added while suppressing heat generation to prepare a polyamic acid solution.

【0053】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察すると、フ
ィルム表面に直径0.5μm未満の微小突起がまばらに
見られた。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and kept at 200 ° C., 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, minute projections having a diameter of less than 0.5 μm were sparsely seen on the film surface.

【0054】[比較例3]500mlフラスコにN,N
−ジメチルホルムアミド200gを取り、BAPSを1
0g(0.02312mol)、DSDAを12.42
5g(0.03468mol)仕込み、窒素ガスを流し
ながら25℃で30分間反応させた。次に系内を60℃
に上げて、3時間攪拌を続けた。このポリアミド酸溶液
に無水酢酸12ml、トリエチルアミン1.6mlを加
え、60℃で5時間反応させ、ポリアミド酸を脱水し、
ポリイミドとした。このポリイミド溶液を多量のメタノ
ールに加え、再沈し、瀘過後、乾燥してポリイミドを得
た。
[Comparative Example 3] N, N was added to a 500 ml flask.
-Take 200 g of dimethylformamide and add BAPS to 1
0g (0.02312 mol), 12.42 of DSDA
5 g (0.03468 mol) was charged, and the mixture was reacted at 25 ° C. for 30 minutes while flowing nitrogen gas. Next, the system temperature is 60 ℃
And continued to stir for 3 hours. To this polyamic acid solution, 12 ml of acetic anhydride and 1.6 ml of triethylamine were added, and the mixture was reacted at 60 ° C. for 5 hours to dehydrate the polyamic acid,
Polyimide was used. This polyimide solution was added to a large amount of methanol, reprecipitated, filtered, and dried to obtain a polyimide.

【0055】次いで、500mlフラスコにN,N−ジ
メチルホルムアミド200gを取り、上述のポリイミド
を6.973g加え、良く攪拌して溶解した。これにジ
アミノジフェニルエーテル10.012g(0.05m
ol)を投入して溶解し、更にピロメリット酸二無水物
10.906g(0.05mol)を発熱を抑えながら
徐々に添加してポリアミド酸溶液を調製した。
Then, 200 g of N, N-dimethylformamide was placed in a 500 ml flask, and 6.973 g of the above-mentioned polyimide was added, and the mixture was stirred well and dissolved. Diaminodiphenyl ether 10.12g (0.05m
Ol) was added and dissolved, and 10.906 g (0.05 mol) of pyromellitic dianhydride was gradually added while suppressing heat generation to prepare a polyamic acid solution.

【0056】このポリアミド酸溶液をガラス板上にアプ
リケーターで薄く延ばし、オーブン中110℃、60分
で乾燥してから剥離し、鉄枠に固定して、200℃、6
0分、次いで350℃に昇温後、60分で脱溶剤イミド
化して25μm厚のポリイミドフィルムとした。このポ
リイミドフィルムを走査型電子顕微鏡で観察すると、フ
ィルム表面に直径2〜3μmの微小突起が観察された
が、機械的強度が低下していた。
This polyamic acid solution was thinly spread on a glass plate with an applicator, dried in an oven at 110 ° C. for 60 minutes, peeled off, fixed on an iron frame, and kept at 200 ° C., 6 ° C.
The temperature was raised to 0 ° C. for 3 minutes, and then the temperature was raised to 350 ° C., and the solvent was imidized in 60 minutes to obtain a polyimide film having a thickness of 25 μm. When this polyimide film was observed with a scanning electron microscope, minute protrusions with a diameter of 2 to 3 μm were observed on the film surface, but the mechanical strength was reduced.

【0057】上記実施例、比較例で得られたポリイミド
フィルムの物性を下記の方法で測定した。結果を表1に
示す。 動摩擦係数:JIS K7125に基づきフィルム表面
摩擦係数を測定した。 機械的強度(引張強度、弾性率、引張り伸び):AST
M D882−88に基づきTENSILON型試験機
を用いて測定した。
The physical properties of the polyimide films obtained in the above Examples and Comparative Examples were measured by the following methods. The results are shown in Table 1. Dynamic friction coefficient: The film surface friction coefficient was measured based on JIS K7125. Mechanical strength (tensile strength, elastic modulus, tensile elongation): AST
It was measured using a TENSILON type tester based on MD882-88.

【0058】[0058]

【表1】 [Table 1]

【0059】[0059]

【発明の効果】本発明のポリイミドフィルムは、ポリイ
ミドフィルム本来の物性や外観、透明性が損なわれるこ
となく、しかもその表面は、易滑性に優れ、フレキシブ
ルプリント基板等に好適に使用することができる。
INDUSTRIAL APPLICABILITY The polyimide film of the present invention does not impair the original physical properties, appearance and transparency of the polyimide film, and the surface thereof is excellent in slipperiness, and can be suitably used for flexible printed circuit boards and the like. it can.

【0060】更に、本発明の製造方法によれば、上述の
優れたポリイミドフィルムを工業的に有利に製造するこ
とができる。
Further, according to the production method of the present invention, the above-mentioned excellent polyimide film can be produced industrially advantageously.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 湯山 昌弘 茨城県鹿島郡神栖町大字東和田1番地 信 越化学工業株式会社高分子機能性材料研究 所内 (72)発明者 本海 清 茨城県鹿島郡神栖町大字東和田1番地 信 越化学工業株式会社高分子機能性材料研究 所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Masahiro Yuyama, Inventor Masahiro Yuyama 1 Towada, Kamisu-cho, Kashima-gun, Ibaraki Shin-Etsu Chemical Co., Ltd., Polymer Functional Materials Research Center (72) Inventor Kiyoshi Motoumi Kashima-gun, Ibaraki Prefecture No. 1 Towada, Kamisu Town, Shin-Etsu Chemical Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 下記式(A)で示される繰り返し単位を
有するポリイミドの微粒子が5〜20重量%分散され、
表面に該ポリイミド微粒子の突起を有してなるポリイミ
ドフィルム。 【化1】
1. Fine particles of polyimide having a repeating unit represented by the following formula (A) are dispersed in an amount of 5 to 20% by weight,
A polyimide film having protrusions of the fine polyimide particles on the surface. Embedded image
【請求項2】 上記式(A)で示される繰り返し単位を
有するポリイミドを溶解した有機極性溶媒中で芳香族テ
トラカルボン酸二無水物と芳香族ジアミンとを反応させ
てポリアミド酸を得、次いでこれを成膜イミド化するこ
とを特徴とする請求項1記載のポリイミドフィルムの製
造方法。
2. A polyamic acid is obtained by reacting an aromatic tetracarboxylic dianhydride and an aromatic diamine in an organic polar solvent in which a polyimide having a repeating unit represented by the above formula (A) is dissolved. The method for producing a polyimide film according to claim 1, wherein the film is imidized.
JP17597894A 1994-07-05 1994-07-05 Polyimide film and its production Pending JPH0820721A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17597894A JPH0820721A (en) 1994-07-05 1994-07-05 Polyimide film and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17597894A JPH0820721A (en) 1994-07-05 1994-07-05 Polyimide film and its production

Publications (1)

Publication Number Publication Date
JPH0820721A true JPH0820721A (en) 1996-01-23

Family

ID=16005568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17597894A Pending JPH0820721A (en) 1994-07-05 1994-07-05 Polyimide film and its production

Country Status (1)

Country Link
JP (1) JPH0820721A (en)

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