JPH081979B2 - Partial gold specification Solder plating printed wiring board - Google Patents

Partial gold specification Solder plating printed wiring board

Info

Publication number
JPH081979B2
JPH081979B2 JP18944391A JP18944391A JPH081979B2 JP H081979 B2 JPH081979 B2 JP H081979B2 JP 18944391 A JP18944391 A JP 18944391A JP 18944391 A JP18944391 A JP 18944391A JP H081979 B2 JPH081979 B2 JP H081979B2
Authority
JP
Japan
Prior art keywords
plating layer
solder
gold
solder plating
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP18944391A
Other languages
Japanese (ja)
Other versions
JPH0513934A (en
Inventor
善三 山中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Avionics Co Ltd
Original Assignee
Nippon Avionics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Avionics Co Ltd filed Critical Nippon Avionics Co Ltd
Priority to JP18944391A priority Critical patent/JPH081979B2/en
Publication of JPH0513934A publication Critical patent/JPH0513934A/en
Publication of JPH081979B2 publication Critical patent/JPH081979B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、金めっきの回路パター
ンとはんだめっきの回路パターンとが混在する部分金仕
様はんだめっきプリント配線板に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solder-plated printed wiring board with partial gold specifications in which a gold-plated circuit pattern and a solder-plated circuit pattern are mixed.

【0002】[0002]

【従来の技術】ICテスタや、プローブカードなど特に
高い信頼性が要求される場合や、錆の発生を特に嫌う場
合などに、プリント配線板の全面を金めっきにすること
がある。しかし金の消費量を減らしコストを低減するた
めに、必要最小限の回路パターンだけを金めっき仕様と
し、残りの回路パターンははんだめっきしてフュージン
グ仕上げすることが考えられている。ここにフュージン
グとは、はんだめっきをエッチングレジストとして回路
形成後、加熱処理によりはんだを溶融、均質合金化する
処理であり、オーバーハングになったソルダーフィレッ
トによる短絡防止、はんだあがり性の改良などの目的で
行われるものである。
2. Description of the Related Art When an IC tester, a probe card or the like is required to have particularly high reliability, or when rusting is particularly disliked, the entire surface of a printed wiring board may be plated with gold. However, in order to reduce the consumption of gold and reduce the cost, it is considered that only the minimum necessary circuit pattern is gold-plated and the remaining circuit patterns are solder-plated for fusing finish. Here, fusing is a process of forming a circuit by using solder plating as an etching resist and then melting the solder by heat treatment to homogenize the alloy. Is done in.

【0003】この場合従来は先に金めっきによる回路パ
ターンを形成し、その後所定のパターンにはんだめっき
を行っていた。図6はこの従来の製造工程図、図7〜9
は各製造工程途中の説明図、図10と11は仕上り状態
の説明図である。
In this case, conventionally, a circuit pattern was first formed by gold plating, and then a predetermined pattern was solder-plated. FIG. 6 is a drawing of this conventional manufacturing process, and FIGS.
Is an explanatory diagram during each manufacturing process, and FIGS. 10 and 11 are explanatory diagrams of a finished state.

【0004】図7において符号10は絶縁材からなる基
板であり、その上面には銅めっき層12が全面に亘って
形成されている(図6のステップ100)。この銅めっ
き層12の表面は研磨され洗浄された後(ステップ10
2)、レジスト14が金めっきの回路パターンのみを残
してその他の領域を全て覆うように塗布される(ステッ
プ104)。そして金めっき液に浸漬すれば、図8に示
すようにレジスト14が塗布されていない部分に金めっ
き層16が形成される(ステップ106)。
In FIG. 7, reference numeral 10 is a substrate made of an insulating material, and a copper plating layer 12 is formed over the entire surface of the substrate (step 100 in FIG. 6). The surface of the copper plating layer 12 is polished and washed (step 10
2) The resist 14 is applied so as to cover all the other regions, leaving only the gold-plated circuit pattern (step 104). Then, by immersing in the gold plating solution, the gold plating layer 16 is formed on the portion where the resist 14 is not applied, as shown in FIG. 8 (step 106).

【0005】このレジスト14を剥離した後(ステップ
108)、金めっき層16の部分を覆うようにレジスト
18を塗布してマスキングをする(ステップ110)。
この時金めっき層16の後記はんだめっき層20との接
合部にはレジスト18が付着しないようにする。このよ
うにレジスト18で金めっき層16のパターンをマスキ
ングして、はんだめっき液に浸漬し、レジスト18で覆
われていない部分にはんだめっき層20を形成する(ス
テップ112)。そしてレジスト18を剥離した後(ス
テップ114)、このはんだめっき層20自身をエッチ
ングレジストとしてエッチングを行い回路を形成する
(ステップ116)。次にフュージングを行う(ステッ
プ118)。この行程は全体を加熱してはんだめっき層
20を溶融させるものである。
After removing the resist 14 (step 108), a resist 18 is applied so as to cover the gold plating layer 16 and masking is performed (step 110).
At this time, the resist 18 is prevented from adhering to the joint portion with the later-described solder plating layer 20 of the gold plating layer 16. In this way, the pattern of the gold plating layer 16 is masked with the resist 18 and immersed in the solder plating solution to form the solder plating layer 20 on the portion not covered with the resist 18 (step 112). Then, after removing the resist 18 (step 114), etching is performed using the solder plating layer 20 itself as an etching resist to form a circuit (step 116). Next, fusing is performed (step 118). In this step, the entire solder plating layer 20 is melted by heating the whole.

【0006】[0006]

【従来技術の問題点】以上のような製造工程において、
ステップ110におけるマスキング用レジスト18は、
金めっき層16との密着が弱く、レジスト18が剥離し
易い。このためはんだめっき層20を形成する際にはん
だめっき液がこのレジスト18と金めっき層16との間
に浸入し、図9に示すように金めっき層16の端部がは
んだめっきされてしまう。この結果このレジスト18を
剥離しフュージングを行う際に、はんだめっき層20の
溶融はんだが図10に矢印Aで示すように金めっき層1
6の上に流出する。またはんだめっき層20の流出によ
って図11に矢印Bで示すようにはんだめっき層20の
一部が陥没することになる。このため金めっき層16や
はんだめっき層20が平滑でなくなったり、金めっきの
回路パターン寸法の精度が悪くなるという問題が生じ
る。
[Problems of the prior art] In the above manufacturing process,
The masking resist 18 in step 110 is
The adhesion with the gold plating layer 16 is weak and the resist 18 is easily peeled off. Therefore, when the solder plating layer 20 is formed, the solder plating solution penetrates between the resist 18 and the gold plating layer 16, and the end portion of the gold plating layer 16 is solder-plated as shown in FIG. As a result, when the resist 18 is peeled off and the fusing is performed, the molten solder of the solder plating layer 20 is changed to the gold plating layer 1 as shown by an arrow A in FIG.
Overflows to 6. Further, due to the outflow of the solder plating layer 20, a part of the solder plating layer 20 is depressed as shown by an arrow B in FIG. For this reason, there arise problems that the gold plating layer 16 and the solder plating layer 20 are not smooth, and that the precision of the gold plating circuit pattern dimension is deteriorated.

【0007】[0007]

【発明の目的】本発明は以上のような事情に鑑みなされ
たものであり、フュージング時にはんだめっき層が金め
っき層の上に流れ出たり、はんだめっき層の表面が陥没
したりして、両めっき層の平滑性が悪化したり、回路パ
ターンの寸法精度の低下を招くことがない部分金仕様は
んだめっきプリント配線板を提供することを目的とす
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and the solder plating layer flows out onto the gold plating layer during fusing, or the surface of the solder plating layer is dented. It is an object of the present invention to provide a solder-plated printed wiring board with partial gold specifications, which does not deteriorate the smoothness of layers or reduce the dimensional accuracy of circuit patterns.

【0008】[0008]

【発明の構成】本発明によればこの目的は基材に形成し
た銅めっき層と、この銅めっき層の上に形成した部分金
めっき層と、この金めっき層の上に一部が重なるように
接合されたはんだめっき層とを有する部分金仕様はんだ
めっきプリント配線板において、前記はんだめっき層の
下には下地銅めっきが形成されていることを特徴とする
部分金仕様はんだめっきプリント配線板により達成され
る。
According to the present invention, the purpose is to provide a copper plating layer formed on a substrate, a partial gold plating layer formed on the copper plating layer, and a part of the gold plating layer overlapping the gold plating layer. In a partial gold-spec solder-plated printed wiring board having a solder-plated layer joined to, a partial-gold-spec solder-plated printed wiring board is characterized in that an underlying copper plating is formed under the solder plating layer. To be achieved.

【0009】[0009]

【実施例】図1は本発明の一実施例の製造工程図、図2
〜4はその工程途中の説明図、図5は仕上り状態の説明
図である。これらの図で符号10は基板、12は銅めっ
き層、16は金めっき層であり、ここまでのステップ1
00〜108は前記図6、7、8と同じである。この発
明ではこの金めっき層16を形成した後、基板10の表
面全体に薄く下地銅めっき処理を行い(ステップ20
0)、下地銅めっき層30を形成する。この下地銅めっ
き層30の表面を研磨・洗浄した後(ステップ20
2)、はんだめっき層にする回路パターンを除く部分を
レジスト32でマスキングする(ステップ204)。そ
してはんだめっき液に入れてはんだめっき処理を行えば
(ステップ206)、図3のようにはんだめっき層34
が形成される。
FIG. 1 is a manufacturing process diagram of an embodiment of the present invention, FIG.
4 to 4 are explanatory views during the process, and FIG. 5 is an explanatory view of the finished state. In these figures, reference numeral 10 is a substrate, 12 is a copper plating layer, and 16 is a gold plating layer.
00 to 108 are the same as those in FIGS. In the present invention, after the gold plating layer 16 is formed, a thin base copper plating process is performed on the entire surface of the substrate 10 (step 20).
0), the base copper plating layer 30 is formed. After polishing and cleaning the surface of the underlying copper plating layer 30 (step 20
2), the portion other than the circuit pattern to be the solder plating layer is masked with the resist 32 (step 204). Then, when the solder plating process is performed by placing the solder plating solution in the solder plating solution (step 206), as shown in FIG.
Is formed.

【0010】この図3の状態からレジスト32を剥離し
(ステップ208)、エッチングを行えば、はんだめっ
き層34がレジストとして作用し、図4のようになる
(ステップ210)。ここに下地銅めっき層30のエッ
チングは、はんだめっき層34の縁よりもはんだめっき
層34の内側まで進入する。すなわちはんだめっき層3
4が下地銅めっき層30の上にオーバーハングすること
になる。このオーバーハング部Cは、フュージング処理
により(ステップ212)溶融すると、はんだ自身の表
面張力が大きいために金めっき層16表面に広がること
なく図5のように下地銅めっき層30の縁に止まる。
When the resist 32 is peeled from the state of FIG. 3 (step 208) and etching is performed, the solder plating layer 34 acts as a resist, resulting in the state shown in FIG. 4 (step 210). Here, the etching of the base copper plating layer 30 penetrates to the inside of the solder plating layer 34 rather than the edge of the solder plating layer 34. That is, the solder plating layer 3
4 overhangs on the underlying copper plating layer 30. When the overhanging portion C is melted by the fusing treatment (step 212), the surface tension of the solder itself is large, so that the overhanging portion C does not spread on the surface of the gold plating layer 16 and stops at the edge of the underlying copper plating layer 30 as shown in FIG.

【0011】[0011]

【発明の効果】【The invention's effect】

【0012】本発明は以上のように、部分金めっき処理
をした後に、基板の全面を薄い銅めっきすなわち下地銅
めっき処理をしたものであるから、その後形成されるは
んだめっき層がフュージング時に金めっき層に流出する
ことがない。このためはんだめっき層および金めっき層
の平滑性が良好になり、回路パターン寸法の精度を高く
することができる。
As described above, according to the present invention, after the partial gold plating process is performed, the entire surface of the substrate is subjected to the thin copper plating, that is, the base copper plating process. It does not flow into the layer. Therefore, the smoothness of the solder plating layer and the gold plating layer becomes good, and the accuracy of the circuit pattern dimension can be increased.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の製造工程図FIG. 1 is a manufacturing process diagram of an embodiment of the present invention.

【図2】その製造工程途中の説明図FIG. 2 is an explanatory view during the manufacturing process.

【図3】同じく製造工程途中の説明図[FIG. 3] Similarly, an explanatory view during the manufacturing process.

【図4】同じく製造工程途中の説明図[FIG. 4] Similarly, an explanatory view during the manufacturing process.

【図5】仕上がり状態を示す説明図FIG. 5 is an explanatory view showing a finished state.

【図6】従来の製造工程図FIG. 6 is a conventional manufacturing process diagram.

【図7】その製造工程途中の説明図FIG. 7 is an explanatory view during the manufacturing process.

【図8】同じく製造工程途中の説明図FIG. 8 is an explanatory diagram of the same manufacturing process

【図9】同じく製造工程途中の説明図FIG. 9 is an explanatory view of the same manufacturing process

【図10】仕上がり状態説明図FIG. 10 Illustration of the finished state

【図11】仕上がり状態説明図FIG. 11 is an explanatory diagram of a finished state

【符号の説明】 10 基板 12 銅めっき層 16 金めっき層 30 下地銅めっき層 34 はんだめっき層[Explanation of reference numerals] 10 substrate 12 copper plating layer 16 gold plating layer 30 base copper plating layer 34 solder plating layer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 基材に形成した銅めっき層と、この銅め
っき層の上に形成した部分金めっき層と、この金めっき
層の上に一部が重なるように接合されたはんだめっき層
とを有する部分金仕様はんだめっきプリント配線板にお
いて、前記はんだめっき層の下には下地銅めっきが形成
されていることを特徴とする部分金仕様はんだめっきプ
リント配線板。
1. A copper plating layer formed on a base material, a partial gold plating layer formed on the copper plating layer, and a solder plating layer joined so as to partially overlap the gold plating layer. A solder plating printed wiring board having partial gold specifications, wherein a copper undercoat is formed under the solder plating layer.
JP18944391A 1991-07-04 1991-07-04 Partial gold specification Solder plating printed wiring board Expired - Fee Related JPH081979B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18944391A JPH081979B2 (en) 1991-07-04 1991-07-04 Partial gold specification Solder plating printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18944391A JPH081979B2 (en) 1991-07-04 1991-07-04 Partial gold specification Solder plating printed wiring board

Publications (2)

Publication Number Publication Date
JPH0513934A JPH0513934A (en) 1993-01-22
JPH081979B2 true JPH081979B2 (en) 1996-01-10

Family

ID=16241339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18944391A Expired - Fee Related JPH081979B2 (en) 1991-07-04 1991-07-04 Partial gold specification Solder plating printed wiring board

Country Status (1)

Country Link
JP (1) JPH081979B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3758197B2 (en) * 1994-06-16 2006-03-22 ソニー株式会社 Manufacturing method of multilayer printed wiring board
CN109788653B (en) 2017-11-15 2022-05-27 奥特斯奥地利科技与系统技术有限公司 Component carrier with different surface finishes and method for manufacturing the same

Also Published As

Publication number Publication date
JPH0513934A (en) 1993-01-22

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