JPH10250032A - Metal mask for printing - Google Patents
Metal mask for printingInfo
- Publication number
- JPH10250032A JPH10250032A JP7658097A JP7658097A JPH10250032A JP H10250032 A JPH10250032 A JP H10250032A JP 7658097 A JP7658097 A JP 7658097A JP 7658097 A JP7658097 A JP 7658097A JP H10250032 A JPH10250032 A JP H10250032A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- metal mask
- mask
- nickel
- dry film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1216—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by screen printing or stencil printing
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、配線基板などに印
刷を行うためのメタルマスクに関する。The present invention relates to a metal mask for printing on a wiring board or the like.
【0002】[0002]
【従来の技術】従来、配線基板の大部分は腐蝕によって
作られており、絶縁基板に銅メッキを施し、印刷や写真
系の乳剤を利用して回路部分となる以外のメッキ部分を
溶解除去することによって所望の配線基板を作るもの
が、電子回路キットとして広く市販されている。量産完
成品ではICなど集積度が高いもので回路が構成されて
いるため、配線基板はメタルマスクによるハンダ印刷に
よるものが多い。2. Description of the Related Art Conventionally, most wiring boards are made by corrosion, and copper plating is applied to an insulating substrate, and a plating portion other than a circuit portion is dissolved and removed using a printing or photographic emulsion. Those which make a desired wiring board by this are widely marketed as electronic circuit kits. In a mass-produced product, a circuit is composed of a highly integrated device such as an IC, and therefore, a wiring substrate is often formed by solder printing using a metal mask.
【0003】メタルマスクの製造法は腐蝕によるもの
と、電鋳によるものとがある。ステンレス基板にドライ
フィルム乳剤を貼り付けその上にパターンのフィルム原
板を密着させて光を照射させ感光または未感光部のいず
れかを溶解除去する。ここまでの工程は腐蝕,電鋳によ
るものはいずれも同じである。腐蝕による場合には図4
に示すような工程で作られる。上記工程で図4(a)に
示すようにメタルマスクの開口部となるところは、ドラ
イフィルム乳剤6が付いていないドライフィルム除去部
分7であり、腐蝕液によってこの部分のステンレス基板
5が溶解される。腐蝕の進行は図4(b)に示すように
なり、腐蝕の進行部分7aが裏面に達した時点で開口部
が形成される。腐蝕は点線で示すように上下方向に大き
な勾配を残す。[0003] There are two methods of manufacturing a metal mask: one by corrosion and one by electroforming. A dry film emulsion is stuck on a stainless steel substrate, and a film base plate of a pattern is brought into close contact therewith and irradiated with light to dissolve and remove either the exposed or unexposed portions. The processes up to this point are the same for both the processes by corrosion and electroforming. Fig. 4 in case of corrosion
It is made by a process as shown in FIG. In the above process, as shown in FIG. 4A, an opening of the metal mask is a dry film removing portion 7 where no dry film emulsion 6 is attached, and the stainless substrate 5 in this portion is dissolved by the corrosive liquid. You. The progress of the corrosion is as shown in FIG. 4 (b), and the opening is formed when the corrosion progressing portion 7a reaches the back surface. Corrosion leaves a large gradient in the vertical direction as shown by the dotted line.
【0004】したがって、精密さが要求される場合に
は、図4(c)に示すようにステンレス基板8の表裏両
面にドライフィルム9a,9bを貼り付け、両面側から
腐蝕の進行を図っている。メタルマスクの完成品は図4
(d)に示すように開口部の厚みの中心付近が最も狭く
なり、図4(a)(b)に示す片面の腐蝕方法に比較し
開口部の寸法精度は表面と裏面の条件が変わらないため
向上する。この両面からの腐蝕方法は、両面に密着させ
る写真原板のパターンが正確に位置合わせされなければ
ならず、要求される寸法精度を出す上で位置合わせ作業
がかなり困難なものとなる。また、完成したメタルマス
クを印刷用マスクに使用する場合、開口部の内壁断面は
図4(d)に示すように傾斜形状となっているため、こ
の部分に印刷インクが残り易く、印刷の繰り返し作業に
適さない。よってマスクの清掃回数を頻繁にしなければ
ならない。[0004] Therefore, when precision is required, dry films 9a and 9b are stuck on the front and back surfaces of the stainless steel substrate 8 as shown in Fig. 4 (c) to promote corrosion from both sides. . Figure 4 shows the finished metal mask
As shown in FIG. 4D, the vicinity of the center of the thickness of the opening becomes the narrowest, and the dimensional accuracy of the opening is the same as that of the single-sided corrosion method shown in FIGS. To improve. In this method of corroding from both sides, the pattern of the photographic original plate to be brought into close contact with both sides must be accurately aligned, and the positioning operation is considerably difficult in obtaining the required dimensional accuracy. When the completed metal mask is used as a printing mask, since the inner wall cross section of the opening has an inclined shape as shown in FIG. 4D, printing ink easily remains in this portion, and printing is repeated. Not suitable for work. Therefore, the frequency of cleaning the mask must be increased.
【0005】一方、電鋳によるメタルマスクを作る場合
は図5に示す工程で行われる。ステンレス基板10上の
ドライフィルム11の上に写真原板13を密着させ、露
光し、未露光部分のドライフィルムを取り除きマスクの
開口部12となる部分のドライフィルムが残存部15と
してステンレス基板10上に残る(図5(a)
(b))。そして、図5(c)に示すようにドライフィ
ルムが除去されたステンレス基板10の上にニッケル電
鋳を行い所定の厚みのニッケルメッキ層14を形成す
る。ニッケルメッキ層14の厚みは実際のメタルマスク
では0.15mm前後のものが多い。この後、ステンレ
ス基板10を剥離し、さらにドライフィルム残存部15
を取り除いて図5(d)に示すようなメタルマスクが完
成する。On the other hand, when a metal mask is formed by electroforming, it is performed in a process shown in FIG. The photographic original plate 13 is brought into close contact with the dry film 11 on the stainless steel substrate 10, exposed to light, the dry film of the unexposed portion is removed, and the dry film of the portion that becomes the opening 12 of the mask is left on the stainless steel substrate 10 as the remaining portion 15. Remains (Fig. 5 (a)
(B)). Then, as shown in FIG. 5C, nickel electroforming is performed on the stainless substrate 10 from which the dry film has been removed to form a nickel plating layer 14 having a predetermined thickness. The thickness of the nickel plating layer 14 is often about 0.15 mm in an actual metal mask. Thereafter, the stainless substrate 10 is peeled off, and the dry film remaining portion 15 is further removed.
Is removed to complete a metal mask as shown in FIG.
【0006】腐蝕による場合と電鋳による場合では、写
真原板,露光,ドライフィルムの溶解除去の後の工程
は、ネガとポジ逆の応用となる。すなわち、電鋳では開
口部に相当する部分にドライフィルムを残し、開口部以
外のドライフィルムを溶解除去してステンレス基板の地
肌にニッケルメッキを成長させることとなる。図5
(a)の露光では、ドライフィルムの受ける光化学変化
は一般に表面から裏面に向けて少し先細りとなるテーパ
形状となる。したがって、図5(d)で示すメタルマス
クの完成品の開口部は表面側から裏面側に向かって先細
りになるテーパを有するのが一般的である。このように
して形成された電鋳メタルマスクは、腐蝕によるメタル
マスクより寸法精度で数段勝り、また開口部の内壁も例
えばハンダ印刷の残存物が付着・粘着しずらい形状とな
っている。In the case of corrosion and the case of electroforming, the steps after the photographic original plate, exposure, and dissolution and removal of the dry film are applied in the reverse of negative and positive applications. That is, in the electroforming, a dry film is left in a portion corresponding to an opening, and the dry film other than the opening is dissolved and removed to grow nickel plating on the surface of the stainless steel substrate. FIG.
In the exposure in (a), the photochemical change received by the dry film generally has a tapered shape that slightly tapers from the front surface to the back surface. Therefore, the opening of the finished metal mask shown in FIG. 5D generally has a taper that tapers from the front side to the back side. The electroformed metal mask formed in this manner has several dimensions higher than the metal mask formed by corrosion, and the inner wall of the opening has a shape in which, for example, a residue of solder printing is hard to adhere and stick.
【0007】[0007]
【発明が解決しようとする課題】しかしながら、反復使
用回数が増加すれば、やはりハンダ印刷などの残滓が付
着・粘着することは避けることができず、寸法精度が低
下し、洗浄も必要となる。本発明の課題は、印刷作業に
おいて、メタルマスクに付着・粘着してマスクの機能を
低下させる要因となる印刷用インク類の残滓を排除し、
印刷の精度を低下させることなくメタルマスクの継続反
復使用回数を大幅に増大させるとともに洗浄を要する頻
度とその清掃作業の工数を従来に比較し著しく少なくす
ることができる印刷用メタルマスクを提供することにあ
る。However, if the number of times of repeated use increases, it is still unavoidable that the residue such as solder printing adheres and adheres, the dimensional accuracy decreases, and cleaning is required. The object of the present invention is to eliminate the residue of printing inks that cause the function of the mask to deteriorate by adhering and sticking to the metal mask in a printing operation,
To provide a printing metal mask capable of significantly increasing the number of continuous repetitive use of the metal mask without deteriorating the printing accuracy, and significantly reducing the frequency of cleaning and the number of man-hours of the cleaning work as compared with the conventional method. It is in.
【0008】[0008]
【課題を解決するための手段】前記課題を解決するため
に本発明による印刷用メタルマスクは、金属基板上にド
ライフィルムを貼付して写真原板を密着して露光し、感
光または未感光部のいずれかを溶解除去した後、所定の
工程により形成される印刷用メタルマスクにおいて、印
刷対象物に密着させる面を除くメタルマスクの他の部分
に、ニッケル/PTFE(ポリテトラフルオロエチレ
ン、通称テフロン)メッキを行うように構成されてい
る。According to the present invention, there is provided a metal mask for printing according to the present invention, wherein a dry film is adhered to a metal substrate, a photographic original plate is brought into close contact with the metal film, and exposed to light. After dissolving and removing any of them, nickel / PTFE (polytetrafluoroethylene, commonly known as Teflon) is applied to the other parts of the metal mask except for the surface to be in close contact with the printing object in the printing metal mask formed by a predetermined process. It is configured to perform plating.
【0009】上記構成によれば、ニッケル/PTFE複
合メッキ皮膜の有する潤滑性,耐磨性,非粘着性,揆出
性に優れた特性によって高品質の印刷を生産性の向上と
ともに実現することができる。[0009] According to the above configuration, the high quality printing can be realized with the improvement of the productivity by the lubricating property, the abrasion resistance, the non-adhesiveness, and the repellency of the nickel / PTFE composite plating film. it can.
【0010】[0010]
【発明の実施の形態】以下、図面を参照して本発明の実
施の形態を詳しく説明する。図1は本発明による印刷用
メタルマスクの実施の形態を説明するための部分断面図
である。この図は、図5(a)の電鋳メタルマスクにニ
ッケル/PTFE複合メッキ皮膜を施したものである。
印刷インキ供給側と印刷部3を形成する開口部の内壁部
分に複合メッキが施される。Embodiments of the present invention will be described below in detail with reference to the drawings. FIG. 1 is a partial cross-sectional view illustrating an embodiment of a printing metal mask according to the present invention. In this figure, a nickel / PTFE composite plating film is applied to the electroformed metal mask of FIG.
Composite plating is applied to the printing ink supply side and the inner wall portion of the opening forming the printing section 3.
【0011】図2は、本発明による印刷用メタルマスク
の一例を示す図である。例えば700mm×600mm
寸法の電鋳メタルマスクに3〜6μm程度のニッケル/
PTFE複合メッキが施される。図3は、電鋳メタルマ
スクによって配線基板にハンダ印刷を施している状態を
示す断面図である。絶縁基板4に図2に示す電鋳メタル
マスクを密着させ、表面側よりハンダ印刷を行う。FIG. 2 is a diagram showing an example of a printing metal mask according to the present invention. For example, 700mm x 600mm
Nickel of about 3-6 μm /
PTFE composite plating is applied. FIG. 3 is a cross-sectional view showing a state in which solder printing is performed on a wiring board using an electroformed metal mask. The electroformed metal mask shown in FIG. 2 is brought into close contact with the insulating substrate 4, and solder printing is performed from the front side.
【0012】電鋳メタルマスクは半導体,IC等の接点
を印刷する目的のものであるので、インキはペーストと
ハンダの微粒子を混合したものである。印刷工程が終了
した時点でマスクを絶縁基板4から剥がす。絶縁基板4
のマスクの開口部にハンダが印刷されて配線基板が完成
する。この後、配線基板の上にICなどの足を合わせて
乗せ、加熱などによって印刷部と半導体とのハンダ付け
を行い回路が完成する。Since the electroformed metal mask is for printing contacts such as semiconductors and ICs, the ink is a mixture of paste and fine particles of solder. When the printing process is completed, the mask is peeled off from the insulating substrate 4. Insulating substrate 4
Solder is printed on the opening of the mask to complete the wiring board. Thereafter, the foot of an IC or the like is put on the wiring board together, and the printed portion and the semiconductor are soldered by heating or the like to complete the circuit.
【0013】電鋳メタルマスクの表面および開口部の内
壁にニッケル/PTFE複合メッキ皮膜を施してあるの
で、ハンダの付着・貼着残留物が少なく、耐磨性が増大
する。したがって、マスク表面のハンダの残留物の付着
は少なくなるとともに開口部の内壁へのハンダ残留物の
付着・貼着や磨耗による寸法精度の変化は、著しく少な
くなる。よって継続反復印刷回数は増大し、例えば、ニ
ッケル/PTFE複合メッキを施していない従来のマス
クに比較し、数倍(最低でも3倍以上)の使用回数を確
保でき、かつその間のマスクの洗浄頻度も減少させるこ
とができる。Since the nickel / PTFE composite plating film is applied to the surface of the electroformed metal mask and the inner wall of the opening, there is little residue of solder adhesion and sticking, and the abrasion resistance is increased. Therefore, the adhesion of solder residue on the mask surface is reduced, and the change in dimensional accuracy due to the adhesion / sticking of the solder residue to the inner wall of the opening and the wear is significantly reduced. Therefore, the number of times of continuous repetition printing increases, for example, as compared with a conventional mask not coated with nickel / PTFE composite plating, the number of times of use can be secured several times (at least three times or more), and the cleaning frequency of the mask during that time. Can also be reduced.
【0014】以上の実施の形態は、印刷用メタルマスク
として電鋳メタルマスクにニッケル/PTFE複合メッ
キを施し絶縁基板に密着させてハンダ印刷を行う例を説
明したが、他のメタルマスクおよびハンダ印刷以外の印
刷全般においても同様に適用できるものである。In the above-described embodiment, an example has been described in which nickel / PTFE composite plating is applied to an electroformed metal mask as a metal mask for printing, and solder printing is performed by closely contacting the metal substrate with an insulating substrate. The same applies to printing other than the above.
【0015】[0015]
【発明の効果】以上、説明したように本発明は、印刷用
メタルマスクの表面および開口部の内壁にニッケル/P
TFE複合メッキ皮膜を施すことにより、印刷作業にお
いてマスクの機能を低下させる要因となる印刷用インク
類等の残滓を排除できる。したがって、印刷の仕上がり
精度を保持しつつメタルマスクの継続反復使用回数を大
幅に増大させ、洗浄を要する頻度とその清掃作業の工数
を従来に比較し著しく少なくでき耐久性を向上させるこ
とができる。これによって、配線基板などを高品質で製
造できるとともに生産性の向上を図ることができる。As described above, according to the present invention, nickel / P is applied to the surface of the printing metal mask and the inner wall of the opening.
By applying the TFE composite plating film, it is possible to eliminate residues such as printing inks and the like, which cause deterioration of the function of the mask in the printing operation. Therefore, the number of continuous repetitive uses of the metal mask can be greatly increased while maintaining the finishing accuracy of printing, and the frequency of cleaning and the number of man-hours for the cleaning work can be significantly reduced as compared with the related art, so that the durability can be improved. Thus, it is possible to manufacture a wiring board or the like with high quality and improve productivity.
【図1】本発明による印刷用メタルマスクの実施の形態
を説明するための部分断面図である。FIG. 1 is a partial sectional view illustrating an embodiment of a printing metal mask according to the present invention.
【図2】本発明による印刷用メタルマスクの一例を示す
図である。FIG. 2 is a view showing an example of a printing metal mask according to the present invention.
【図3】電鋳メタルマスクによって配線基板にハンダ印
刷を施している状態を示す断面図である。FIG. 3 is a cross-sectional view showing a state in which solder printing is performed on a wiring board using an electroformed metal mask.
【図4】腐蝕法によりメタルマスクを作る工程を説明す
るための図である。FIG. 4 is a view for explaining a step of forming a metal mask by a corrosion method.
【図5】電鋳によってメタルマスクを作る工程を説明す
るための図である。FIG. 5 is a view for explaining a step of forming a metal mask by electroforming.
1…電鋳メタルマスク 2…ニッケル/PTFE複合メッキ 3…印刷部 4…絶縁基板 5,8,10…ステンレス基板 6…ドライフィルム乳剤 7…ドライフィルム除去部分 9a,9b,11…ドライフィルム 12,12a…開口部 13…写真原板 14…ニッケルメッキ層 15…ドライフィルム残存部 DESCRIPTION OF SYMBOLS 1 ... Electroformed metal mask 2 ... Nickel / PTFE composite plating 3 ... Printing part 4 ... Insulating substrate 5, 8, 10 ... Stainless steel substrate 6 ... Dry film emulsion 7 ... Dry film removal part 9a, 9b, 11 ... Dry film 12, 12a Opening 13 Photographic plate 14 Nickel plating layer 15 Dry film remaining portion
Claims (1)
写真原板を密着して露光し、感光または未感光部のいず
れかを溶解除去した後、所定の工程により形成される印
刷用メタルマスクにおいて、 印刷対象物に密着させる面を除くメタルマスクの他の部
分に、ニッケル/PTFEメッキを施すことを特徴とす
る印刷用メタルマスク。1. A printing metal mask formed by a predetermined process after a dry film is stuck on a metal substrate, a photographic original plate is brought into close contact and exposed, and either the exposed or unexposed portion is dissolved and removed. A metal mask for printing, characterized in that nickel / PTFE plating is applied to other parts of the metal mask except for a surface to be in close contact with a printing object.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7658097A JPH10250032A (en) | 1997-03-11 | 1997-03-11 | Metal mask for printing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7658097A JPH10250032A (en) | 1997-03-11 | 1997-03-11 | Metal mask for printing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH10250032A true JPH10250032A (en) | 1998-09-22 |
Family
ID=13609222
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7658097A Pending JPH10250032A (en) | 1997-03-11 | 1997-03-11 | Metal mask for printing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH10250032A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1027993A1 (en) * | 1999-02-12 | 2000-08-16 | Eastman Kodak Company | A mandrel for forming a nozzle plate having a non-wetting surface of uniform thickness and an orifice wall of tapered contour, and method of making the mandrel |
JP2006175700A (en) * | 2004-12-22 | 2006-07-06 | Process Lab Micron:Kk | Mask for stencil printing and its manufacturing method |
WO2007011567A1 (en) | 2005-07-15 | 2007-01-25 | 3M Innovative Properties Company | Coating agent and metal mask |
CN103205702A (en) * | 2012-01-16 | 2013-07-17 | 昆山允升吉光电科技有限公司 | A metal mask plate for vapor deposition produced from a nickel-iron alloy |
CN103358662A (en) * | 2012-03-29 | 2013-10-23 | 昆山允升吉光电科技有限公司 | Ferro-nickel alloy screen plate and preparation method thereof |
CN103374680A (en) * | 2012-04-17 | 2013-10-30 | 昆山允升吉光电科技有限公司 | Electroforming nickel-ferrum alloy screen with high ferrum content for printing and preparation method |
CN103373045A (en) * | 2012-04-17 | 2013-10-30 | 昆山允升吉光电科技有限公司 | Electroforming nickel-ferrum alloy screen for printing and preparation method |
-
1997
- 1997-03-11 JP JP7658097A patent/JPH10250032A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1027993A1 (en) * | 1999-02-12 | 2000-08-16 | Eastman Kodak Company | A mandrel for forming a nozzle plate having a non-wetting surface of uniform thickness and an orifice wall of tapered contour, and method of making the mandrel |
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